Fluid supply system, processing apparatus, program, and method of manufacturing semiconductor device
The fluid supply system addresses phase change issues in semiconductor manufacturing by using a regulating unit and control unit to maintain pressure balance, enhancing gas distribution and reducing particle generation for improved substrate processing.
KR102993234B1Active Publication Date: 2026-07-21KOKUSAI DENKI KK
Patent Information
- Application Number
- KR1020230027726
- Authority / Receiving Office
- KR · KR
- Patent Type
- Patents
- Current Assignee / Owner
- Priority Date
- 2023-01-23
- Filing Date
- 2023-03-02
- Publication Date
- 2026-07-21
- Estimated Expiration
- 2043-03-02
AI Technical Summary
Technical Problem
Existing semiconductor manufacturing processes face issues with phase change of processing gases due to adiabatic expansion, leading to particle generation in the reaction tube.
Method used
A fluid supply system with a regulating unit and control unit that supplies a regulating gas to the secondary side of the flow controller, maintaining pressure balance to prevent phase change during adiabatic expansion.
Benefits of technology
The system effectively suppresses phase change of gases, reducing particle generation and ensuring uniform gas distribution for improved substrate processing quality.
✦ Generated by Eureka AI based on patent content.
Smart Images
Figure 112023024048614-PAT00003_ABST
Abstract
The present invention provides a technology for supplying a treatment gas without causing a phase change. The technology includes a flow controller for controlling the flow rate of a fluid flowing through a pipe, a supply unit for supplying a regulating gas to at least a secondary side of the flow controller, and a control unit configured to suppress a phase change of the fluid accompanied by a temperature drop due to adiabatic expansion by supplying a regulating gas from the supply unit according to the difference between the internal pressure of the flow controller and the secondary side pressure of the flow controller while the opening and closing unit is in a closed state.
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
Liquid material vaporization method and device
KR100386217B1
Gas supply device equipped with carburetor
KR1020100118583A