Devices, systems, and methods for high resolution photolithography
The high-resolution photolithography system addresses the limitations of existing technologies by integrating a beam pen lithography tip array and advanced alignment protocols to achieve precise and multiplexed patterning of organic materials, enhancing the fidelity of nanoscale features and reagent application.
Patent Information
- Application Number
- PCT/US2025/058363
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-12-05
- Filing Date
- 2025-12-05
- Publication Date
- 2026-06-11
AI Technical Summary
Existing photolithography technologies face limitations in achieving high-resolution, precise, and multiplexed patterning of organic materials, particularly in generating nanoscale features below the diffraction limit and ensuring accurate alignment and control of reagent application.
A high-resolution photolithography system incorporating a mounting stage, light-processing system with a beam pen lithography tip array, positioning system, and reagent system, along with a control system for coordinated control of these components, enabling high-resolution patterned illumination and reagent application, including spatially patterned projected light and reagent materials for organic material synthesis, and advanced alignment protocols like autofocusing and tip-tilt adjustment.
Enables high-resolution, multiplexed patterning of organic materials with nanoscale features, reducing errors and improving fidelity in photochemistry processes, allowing for precise control of light dose and reagent application, and supporting diverse applications such as DNA/RNA synthesis and microarray fabrication.