Etching device and etching method
An etching device and etching technology, which are applied in the direction of removing conductive materials by chemical/electrolytic methods, can solve the problems of fast flow speed, fast update, uneven etching of circuit substrates, etc. The effect of the pool effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2012-10-17
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to the technical field of etching, in particular to an etching device and an etching method used in a circuit board etching process. Background technique
[0002] The etching process is the basic process of circuit board production, which refers to the process of using etching solution to etch away the copper that is not protected by the resist layer on the circuit board, and finally forms a conductive line.
[0003] With the rapid development of electronic technology, the integration of circuit boards is getting higher and higher, and the conductive lines of the circuit board are made more and more finely, which requires the dimensional tolerance of the conductive lines of the same circuit board to be as small as possible, that is, the etching process in the etching process The effect needs to be as consistent as possible.
[0004] The horizontal wet process production line has a high degree of automation and low cost, and is wi...
Examples
Embodiment Construction
[0015] The etching device and etching method provided by the technical solution will be described in detail below with reference to the accompanying drawings and embodiments.
[0016] refer to figure 1 The etching device 100 provided by the first embodiment of the technical solution includes two infusion tubes 10 , four nozzle tubes 20 , pumps 11 a, 11 b, valves 12 a, 12 b, a liquid scraping device 30 and a control device 40 .
[0017] The two infusion tubes 10 are opposite and arranged parallel to each other. Each infusion pipe 10 communicates with a liquid storage tank (not shown in the figure), and delivers etching liquid to the four spray pipes 20 through pumps 11a and 11b respectively.
[0018] The four nozzles 20 are arranged parallel to each other, and the two ends of each nozzle 20 communicate with one infusion tube 10 , so that the etching solution can flow from the liquid storage tank to the nozzle 20 through the infusion tube 10 . Each nozzle 20 is provided with a...