Organic Light Emitting Diode Display

Abstract

An organic light emitting diode (OLED) display includes a first electrode, a pixel defining layer at least partially exposing the first electrode, an organic light emitting layer on the first electrode, a thin film encapsulation layer on the organic light emitting layer, and a light shielding member on the thin film encapsulation layer, the light shielding member overlapping the pixel defining layer. The organic light emitting layer includes a main area that does not overlap with the pixel defining layer and a sub-area that overlaps with the pixel defining layer. The main area includes an opening portion that does not overlap with the light shielding member and a shadow portion that overlaps with the light shielding member around the opening portion.

Description

[0001] Korean Patent Application No. 10-2018-0116734, filed on October 1, 2018 in the Korean Intellectual Property Office, entitled “Organic Light Emitting Diode Display” is hereby incorporated by reference in its entirety. Technical Field

[0002] Embodiments relate to an organic light emitting diode (OLED) display. Background Art

[0003] An organic light emitting diode (OLED) display is a self-luminous display. An OLED display includes an organic light emitting layer inserted between a pixel electrode and a counter electrode. When the two electrodes inject electrons and holes into the organic light emitting layer, the electrons and holes recombine to form excitons, and light is generated when the excitons fall from an excited state to a ground state. Summary of the invention

[0004] An embodiment relates to an organic light emitting diode (OLED) display, the OLED display including a first electrode, a pixel defining layer at least partially exposing the first electrode, an organic light emitting layer on the first electrode, a thin film encapsulation layer on the organic light emitting layer, and a light shielding member on the thin film encapsulation layer, the light shielding member overlapping the pixel defining layer. The organic light emitting layer includes a main area that does not overlap with the pixel defining layer and a sub-area that overlaps with the pixel defining layer. The main area includes an opening portion that does not overlap with the light shielding member and a shadow portion that overlaps with the light shielding member and is arranged around the opening portion.

[0005] The pixel defining layer and the light shielding member may overlap each other so that a cross-sectional center of the pixel defining layer overlaps a cross-sectional center of the light shielding member. A width of the pixel defining layer may be smaller than a width of the light shielding member.

[0006] The width of the pixel defining layer may be about 3 μm to about 5 μm.

[0007] The width of the shaded portion may be about 6.5 μm to about 7.5 μm.

[0008] The organic light emitting layer may include a first organic light emitting layer emitting red light, a second organic light emitting layer emitting green light, and a third organic light emitting layer emitting blue light.

[0009] In the sub-region, any one of the first to third organic light-emitting layers may be on one side surface and the upper surface of the pixel defining layer. The organic light-emitting layer overlapping with any one of the first to third organic light-emitting layers may be on the other side surface and the upper surface of the pixel defining layer.

[0010] In the sub-region, any one of the first to third organic light-emitting layers may be on both side surfaces and the upper surface of the pixel defining layer. The organic light-emitting layer overlapping with any one of the first to third organic light-emitting layers may be on both side surfaces and the upper surface of the pixel defining layer.

[0011] The first to third organic light emitting layers may overlap with each other in the sub-regions.

[0012] The shadowed portions and sub-areas may change to non-luminous areas over time.

[0013] The width of the light blocking member may be increased in proportion to the thickness of the thin film encapsulation layer.

[0014] An embodiment relates to an OLED display, the OLED display comprising a first electrode, a pixel defining layer at least partially exposing the first electrode, an organic light emitting layer on the first electrode, a thin film encapsulation layer on the organic light emitting layer, and a light shielding member on the thin film encapsulation layer and overlapping with the pixel defining layer. The organic light emitting layer comprises a main area that does not overlap with the pixel defining layer and a sub-area that overlaps with the pixel defining layer, the main area comprises an opening portion that does not overlap with the light shielding member and a shadow portion that overlaps with the light shielding member and is located around the opening portion, wherein the opening portion is a strong light emitting area. Each of the shadow portion and the sub-area is a weak light emitting area having a lower emission intensity than the strong light emitting area.

[0015] The emission intensity of the shaded portion may be greater than the emission intensity of the sub-region.

[0016] The emission intensity of each of the shadow portion and the sub-region may decrease as the distance from the opening portion increases.

[0017] Embodiments also relate to an OLED display, the OLED display comprising a first electrode, a pixel defining layer at least partially exposing the first electrode, an organic light-emitting layer on the first electrode, the organic light-emitting layer comprising a first light-emitting layer and a second light-emitting layer, a thin film encapsulation layer on the organic light-emitting layer, and a light shielding member on the thin film encapsulation layer, the light shielding member overlapping the pixel defining layer. The organic light-emitting layer may include a main area that does not overlap with the pixel defining layer and a sub-area that overlaps with the pixel defining layer. The main area may include an opening portion that does not overlap with the light shielding member and a shadow portion that overlaps with the light shielding member and is located around the opening portion.

[0018] The organic light emitting layer may further include a charge generating layer between the first light emitting layer and the second light emitting layer.

[0019] Light emitted from the first light emitting layer and light emitted from the second light emitting layer may have the same color and have different peak wavelength ranges.

[0020] The pixel defining layer and the light shielding member may overlap each other so that a cross-sectional center of the pixel defining layer overlaps a cross-sectional center of the light shielding member. A width of the pixel defining layer may be smaller than a width of the light shielding member.

[0021] The width of the pixel defining layer may be about 3 μm to about 5 μm.

[0022] The width of the shaded portion may be about 6.5 μm to about 7.5 μm.

[0023] The shadowed portions and sub-areas may change to non-luminous areas over time. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Features will become apparent to those skilled in the art by describing in detail exemplary embodiments with reference to the accompanying drawings, in which:

[0025] Figure 1 illustrates a schematic diagram of an organic light emitting diode (OLED) display according to an embodiment;

[0026] Figure 2 The diagram shows Figure 1 A cross-sectional view of an OLED display according to an embodiment, taken along line II';

[0027] Figure 3 and Figure 4 The diagram shows Figure 2 An enlarged view of an OLED display according to an embodiment, taken from area A;

[0028] Figure 5 Pictured Figure 3 or Figure 4 Changes over time in OLED displays;

[0029] Figure 6 and Figure 7 The diagram shows Figure 2 An enlarged view of an OLED display according to an embodiment, taken from area A;

[0030] Figure 8 Pictured Figure 6 or Figure 7 Changes over time in OLED displays;

[0031] Fig. 9 and Fig.10 The diagram shows Figure 2 An enlarged view of an OLED display according to an embodiment, taken from area A;

[0032] Fig.11 Pictured Fig. 9 or Fig.10 changes over time in an OLED display; and

[0033] Fig.12 The diagram shows Figure 1 1 is a cross-sectional view of an OLED display according to an embodiment, taken along line II'. DETAILED DESCRIPTION

[0034] Example embodiments will now be described more fully below with reference to the accompanying drawings; however, they may be embodied in different forms and should not be construed as limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete and fully convey exemplary implementations to those skilled in the art.

[0035] In the accompanying drawings, the size of the layers and regions may be exaggerated for clarity of illustration. It should also be understood that when a layer or element is referred to as being "on" another layer or substrate, it may be directly on another layer or substrate, or there may also be an intermediate layer. When an element is described as being related to another element, such as being "directly" on another element or "directly located" on a different layer or layer, the indicating element is located on another element or layer without an intermediate element or layer between the two. Further, it should be understood that when a layer is referred to as being "under" another layer, it may be directly below, and there may also be one or more intermediate layers. In addition, it should also be understood that when a layer is referred to as being "between" two layers, it may be the only layer between the two layers, or there may also be one or more intermediate layers. The same reference numerals refer to the same elements throughout the text.

[0036] Spatially relative terms such as "below," "below," "below," "above," "on," etc. may be used herein for ease of description to describe the relationship of one element or feature to another element or feature as shown in the figure. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation shown in the figure. For example, if the device is flipped in the accompanying drawings, the elements described as "below" or "below" other elements or features will be "above" the other elements or features. Therefore, the exemplary term "below" can include both the above and below orientations. The device can be oriented otherwise (rotated 90 degrees or in other orientations) and the spatially relative descriptors used herein are interpreted accordingly.

[0037] Figure 1 A schematic diagram of an organic light emitting diode (OLED) display 1 according to an embodiment is illustrated.

[0038] Reference Figure 1, the OLED display 1 may include a display area DA and a non-display area NDA. The display area DA may be in the central portion of the OLED display 1. The display area DA may include a plurality of pixels PX. Each of the pixels PX may emit light of a unique color. In an embodiment, the pixels PX may include a red pixel, a green pixel, and a blue pixel.

[0039] The non-display area NDA may be around the display area DA, for example, in the periphery of the display area DA. The non-display area NDA may include a driver. The driver may provide an electrical signal such as a data signal or a scan signal to the display area DA.

[0040] Figure 2 The diagram shows Figure 1 A cross-sectional view of the OLED display 1 taken along line II'. Figure 3 and Figure 4 The diagram shows Figure 2 An enlarged view of the OLED display 1 according to the embodiment, taken from a region A of FIG. Figure 5 Pictured Figure 3 or Figure 4 Changes of the OLED display 1 over time.

[0041] Reference Figures 2 to 5 The OLED display 1 according to the embodiment may include a substrate 100 having a pixel region and a transistor region, a buffer layer 110 on the substrate 100, a semiconductor layer ACT on the buffer layer 110 in each of the transistor regions, a gate electrode GAT insulated from the semiconductor layer ACT, a gate insulating layer 120 insulating the semiconductor layer ACT from the gate electrode GAT, an interlayer insulating film 130 disposed on the gate electrode GAT, a source / drain electrode SD insulated from the gate electrode GAT and electrically connected to the semiconductor layer ACT through a contact hole CNT1, a planarization layer 150 on the source / drain electrode SD, a first electrode PE on the planarization layer 150 and electrically connected to one of the source / drain electrodes SD, and a pixel defining layer PDL defining each pixel region by a corresponding opening OP formed on the first electrode PE. The pixel defining layer PDL may partially expose the first electrode PE.

[0042] The substrate 100 may be made of SiO 2The substrate 100 may be made of a transparent glass material as its main component. In some embodiments, the substrate 100 may be made of a transparent plastic material. The transparent plastic material may be, for example, an insulating organic material, such as polyphenylene ether sulfone (PES), polyacrylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallyl compound, polyimide, polycarbonate (PC), cellulose triacetate (TAC), or cellulose acetate propionate (CAP).

[0043] The buffer layer 110 may be formed on the substrate 100 to ensure the smoothness of the substrate 100 and to block the penetration of impurities. The buffer layer 110 may be a material such as silicon oxide (SiO x ) layer, silicon nitride (SiN x ) layer or a single layer of a silicon oxynitride layer, or may be a multilayer composed of these layers.

[0044] The semiconductor layer ACT may be on the buffer layer 110. The semiconductor layer ACT may be made of silicon (Si), for example, amorphous silicon (a-Si) or polycrystalline silicon (p-Si). In some embodiments, the semiconductor layer ACT may be made of, for example, germanium (Ge), gallium phosphide (GaP), gallium arsenide (GaAs), or aluminum arsenide (AlAs). In some embodiments, the semiconductor layer ACT may be a silicon semiconductor layer formed by diffusing n-type impurities at a low concentration into a silicon-on-insulator (SOI) substrate. In some embodiments, the semiconductor layer ACT may be formed by doping a portion of a-Si with p-type impurities or n-type impurities.

[0045] The gate insulating layer 120 may be on the semiconductor layer ACT to cover the semiconductor layer ACT and insulate the semiconductor layer ACT from the gate electrode GAT. Similar to the buffer layer 110, the gate insulating layer 120 may be SiO x Layer, SiN x The gate insulating layer 120 may be made of the same material as the buffer layer 110 or may be made of a material different from that of the buffer layer 110.

[0046] The gate electrode GAT may be formed on the gate insulating layer 120. The gate electrode GAT may control the light emission of each pixel PX by transmitting a gate signal. The gate electrode GAT may be a single layer of an aluminum alloy such as aluminum (Al), chromium-aluminum (Cr-Al), molybdenum-aluminum (Mo-Al), or aluminum-neodymium (Al-Nd), or may be in the form of a multilayer including an Al alloy stacked on a Cr or Mo alloy.

[0047] The interlayer insulating film 130 may be on the gate electrode GAT. The interlayer insulating film 130 may electrically insulate the gate electrode GAT from the source / drain electrode SD. Similar to the buffer layer 110, the interlayer insulating film 130 may be SiO x Layer, SiN x A layer or a silicon oxynitride layer, or may be a multilayer including these layers.

[0048] The source / drain electrode SD electrically connected to the semiconductor layer ACT may be formed on the interlayer insulating film 130. The source / drain electrode SD may be made of, for example, any one of Mo, Cr, tungsten (W), molybdenum tungsten (MoW), Al, Al-Nd, titanium (Ti), titanium nitride (TiN), copper (Cu), Mo alloy, Al alloy, and Cu alloy. The source / drain electrodes SD may be electrically connected to each other through the semiconductor layer ACT, and a voltage may be applied to the first electrode PE.

[0049] An additional insulating layer 140 may be provided on the source / drain electrodes SD. A planarization layer 150 for substrate planarization may be provided on the insulating layer 140. The planarization layer 150 may be made of an organic acrylic material.

[0050] The first electrode PE may be located on the planarization layer 150 and may be electrically connected to the source / drain electrode SD. The first electrode PE and one of the source / drain electrodes SD may be connected through a contact hole CNT2 passing through the insulating layer 140 and the planarization layer 150. Therefore, a driving voltage may be applied from the source / drain electrode SD to the first electrode PE.

[0051] The first electrode PE may be made of a transparent conductive material. The transparent conductive material may include one or more of indium tin oxide (ITO), indium zinc oxide (IZO), carbon nanotubes, conductive polymers, and nanowires. The first electrode PE may be made of, for example, a mixture of one or more of the transparent conductive materials.

[0052] A pixel defining layer PDL for defining each pixel area may be formed on the first electrode PE. The pixel defining layer PDL may be formed on the entire substrate 100 to cover the planarization layer 150. An opening OP (each exposing a portion of the first electrode PE) may be formed in the pixel defining layer PDL to define the pixel area. For example, the pixel defining layer PDL may overlap a portion of the first electrode PE including an edge along a thickness direction TD. The pixel defining layer PDL may include at least one organic material selected from benzocyclobutene (BCB), polyimide (PI), polyamide (PA), acrylic resin, and phenolic resin.

[0053] When the planarization layer 150 and the pixel definition layer PDL are made of an organic material, moisture (H 2Outgassing may occur for 20% to 40% of the organic light emitting layer (EDL). Outgassing may oxidize the organic light emitting layer (EDL), and each pixel area may decrease over time. Therefore, this may reduce the brightness and life of the OLED display 1 and increase the color deviation of the OLED display 1.

[0054] The pixel defining layer PDL may be partially overlapped by the light shielding member BM along the thickness direction TD, as will be described below. According to an embodiment, when viewed in cross section, the center of the pixel defining layer PDL may overlap with the center of the light shielding member BM along the thickness direction TD, so that the cross-sectional center of the pixel defining layer PDL overlaps with the cross-sectional center of the light shielding member BM. The width of the pixel defining layer PDL, for example, the width along a direction perpendicular to the thickness direction TD may be smaller than the width of the light shielding member BM. The organic light emitting layer EDL overlapped by the light shielding member BM along the thickness direction TD may include a shadow portion SH that does not overlap with the pixel defining layer PDL in each segment, and a sub-region SB that overlaps with the pixel defining layer PDL in each segment.

[0055] If the pixel defining layer PDL has a large width, it may be difficult to ensure a space for the shadow portion SH. For example, the pixel defining layer PDL may be just wide enough to ensure a space for the shadow portion SH at the edge of each pixel region so that the actual size of each pixel region can be maintained constant. For example, the cross-sectional width of the pixel defining layer PDL may be about 3 μm to about 5 μm, and the cross-sectional width of the shadow portion SH may be about 6.5 μm to about 7.5 μm.

[0056] The OLED display 1 may further include an organic light emitting layer EDL disposed on the first electrode PE of each pixel region, and a second electrode CE and a thin film encapsulation layer TFE formed on the organic light emitting layer EDL.

[0057] The first electrode PE may be an anode or a cathode of the organic light emitting diode. When the first electrode PE is an anode, the second electrode CE may be a cathode. The following will describe an embodiment based on the assumption that the first electrode PE is an anode and the second electrode CE is a cathode. However, in some embodiments, the first electrode PE may be a cathode and the second electrode CE may be an anode.

[0058] The first electrode PE used as an anode may be made of a conductive material having a high work function. When the OLED display 1 is a bottom emission display, the first electrode PE may be made of a conductive material such as ITO, IZO, ZnO, or In 2 O 3 When the OLED display 1 is a top emission display, the first electrode PE may further include a reflective layer made of Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li or Ca.

[0059] The organic light emitting layer EDL may be on the first electrode PE. The organic light emitting layer EDL may overlap the first electrode PE in each opening OP of the pixel defining layer PDL along the thickness direction TD. The organic light emitting layer EDL may be made of a high or low molecular weight organic material that emits any one of red light, green light, and blue light exclusively. In some embodiments, the organic light emitting layer EDL may be made of a mixture of high and low molecular weight materials. In some embodiments, the organic light emitting layer EDL may include a matrix material and a dopant material.

[0060] The second electrode CE may be formed on the pixel defining layer PDL. When the second electrode CE is used as a cathode, the second electrode CE may be made of a conductive material having a low work function. For example, the second electrode CE may be made of Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, Li, or Ca.

[0061] In order to form the organic light emitting layer EDL using a deposition method, a mask (e.g., a fine metal mask (FMM)) having an opening pattern corresponding to the pattern of the organic light emitting layer EDL to be formed on the substrate 100 may be placed near the substrate 100. A deposition material may be deposited on the substrate 100 through the mask to form a desired organic light emitting layer EDL. The organic light emitting layer EDL may include a first organic light emitting layer ED1 emitting red light, a second organic light emitting layer ED2 emitting green light, and a third organic light emitting layer ED3 emitting blue light.

[0062] The first organic light-emitting layer ED1, the second organic light-emitting layer ED2, and the third organic light-emitting layer ED3 may be sequentially stacked on the first electrode PE and the pixel defining layer PDL by FMM. Different organic light-emitting layers adjacent to each other may partially overlap each other along the thickness direction TD on the pixel defining layer PDL. Each organic light-emitting layer may include a main area MA and a sub-area SB. The main area MA of each organic light-emitting layer is a section in which the organic light-emitting layer overlaps with the first electrode PE along the thickness direction TD and directly contacts the first electrode PE. The sub-area SB of each organic light-emitting layer is a section in which the organic light-emitting layer overlaps with the pixel defining layer PDL along the thickness direction TD and directly contacts the pixel defining layer PDL.

[0063] The main area MA may include an opening portion OPN not overlapping the light blocking member BM in the thickness direction TD and a shadow portion SH overlapping the light blocking member BM. The shadow portion SH may change from a light emitting area to a non-light emitting area over time.

[0064] When an electric field is formed between the first electrode PE and the second electrode CE, the organic light emitting layer may receive holes from the first electrode PE and electrons from the second electrode CE. The holes and electrons transmitted to the organic light emitting layer may be combined to form excitons in an excited state. Energy transfer may occur between the matrix and the dopant when the excitons move by diffusion, and light may be emitted when the excitons fall to the ground state.

[0065] However, if the organic light emitting layer is covered with moisture (H) generated by the planarization layer 150 or the pixel definition layer PDL made of an organic material over time, 2 If the organic light emitting layer is oxidized by fluorine (F) or fluorine (O), the light emitted from the organic light emitting layer may gradually decrease. Finally, the organic light emitting layer may be changed into a non-light emitting layer.

[0066] The sub-region SB may include a region in which a single organic light emitting layer is arranged, and a region in which two or more different organic light emitting layers are stacked on each other. Figures 3 to 5 The cross-section of the pixel defining layer PDL shown in is a rectangle. However, in some embodiments, the cross-sectional shape of the pixel defining layer PDL may be another shape, such as a trapezoidal shape. In this case, a single organic light-emitting layer may be arranged on the inclined surface of the trapezoid, and two different organic light-emitting layers may be arranged on the upper surface of the trapezoid to overlap each other. In the sub-region SB, the area in which the single organic light-emitting layer is arranged may change from a weak light-emitting area to a non-light-emitting area over time. In addition, the area in which two or more different organic light-emitting layers overlap each other along the thickness direction TD may be a non-light-emitting area.

[0067] The distance between the first electrode PE and the second electrode CE in the thickness direction TD may be greater in the region in which the single organic light emitting layer is arranged in the sub-region SB than in the pixel region. Therefore, the voltage required for the organic light emitting layer to emit light may be greater in the region in which the single organic light emitting layer is arranged. Therefore, even if the same voltage is applied to the region of the main region MA and the sub-region SB, less light may be emitted from the region in which the single organic light emitting layer is arranged.

[0068] In addition, as described above, if the organic light emitting layer is oxidized by the H generated by the planarization layer 150 or the pixel definition layer PDL made of an organic material over time, 2 If O or F is oxidized, the light emitted from the organic light emitting layer may gradually decrease. Finally, the organic light emitting layer may be changed into a non-light emitting layer.

[0069] In the sub-region SB, a region where two or more different organic light-emitting layers overlap each other along the thickness direction TD may be a non-light-emitting region. When two different organic light-emitting layers overlap each other, holes transmitted from the first electrode PE and electrons transmitted from the second electrode CE cannot be easily recombined, and a larger voltage may be required for light emission. In some cases, no light may be emitted.

[0070] According to an embodiment, mixed light may be emitted from the sub-region SB of each organic light-emitting layer. For example, when the first organic light-emitting layer ED1 emitting red light and the second organic light-emitting layer ED2 emitting green light overlap each other along the thickness direction TD, weak yellow light may be emitted. When the second organic light-emitting layer ED2 emitting green light and the third organic light-emitting layer ED3 emitting blue light overlap each other, weak cyan light may be emitted. When the first organic light-emitting layer ED1 emitting red light and the third organic light-emitting layer ED3 emitting blue light overlap each other, weak magenta light may be emitted.

[0071] In the sub-region SB, two or more different organic light-emitting layers may overlap with each other along the thickness direction TD on the upper surface of the pixel defining layer PDL. In some embodiments, the two or more different organic light-emitting layers may also overlap with each other not only on the upper surface of the pixel defining layer PDL but also on both side surfaces of the pixel defining layer PDL along the thickness direction TD. Figure 4 , the three different organic light emitting layers ED1_1 , ED2_1 , and ED3_1 may overlap with each other in the thickness direction TD not only on the upper surface of the pixel defining layer PDL but also on both side surfaces of the pixel defining layer PDL.

[0072] Each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may include a shadow portion SH and a sub-region SB. The length of each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may be changed according to the aperture ratio of the organic light emitting layer and the resolution of the OLED display 1. For example, the length of each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may decrease as the aperture ratio of the organic light emitting layer and the resolution of the OLED display 1 increase. For example, the length of each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may be about 0.1 μm to about 18 μm.

[0073] When the organic light emitting layer EDL is deposited through a mask, the organic material may not be sufficiently deposited in the edge portion of each organic light emitting layer to be formed. If this phenomenon occurs in the main area MA, the light emitting area may be reduced.

[0074] However, according to an embodiment, the edge portion of the main area MA corresponds to the shadow portion SH. Therefore, the organic material may not be sufficiently deposited in the shadow portion SH, which is a region that is assumed to eventually change into the non-pixel region NPX over time. Therefore, the insufficient deposition of the organic material may be meaningless.

[0075] The thin film encapsulation layer TFE may be disposed on the second electrode CE. The thin film encapsulation layer TFE may encapsulate the organic light emitting layer EDL and may prevent the introduction of impurities such as moisture or air from outside the OLED display 1, thereby damaging the organic light emitting layer EDL or denaturing the organic light emitting layer EDL. In an embodiment, the thin film encapsulation layer TFE may include one or more inorganic encapsulation layers 161 and 163, and one or more organic encapsulation layers 162. The inorganic encapsulation layers 161 and 163 and the organic encapsulation layer 162 may be arranged alternately. For example, the thin film encapsulation layer TFE may include a first inorganic encapsulation layer 161 arranged on the second electrode CE, an organic encapsulation layer 162 arranged on the first inorganic encapsulation layer 161, and a second inorganic encapsulation layer 163 arranged on the organic encapsulation layer 162. The thin film encapsulation layer TFE is Figure 2 In some embodiments, the thin film encapsulation layer TFE may further include an encapsulation layer made of a siloxane material such as hexamethyldisiloxane.

[0076] The substrate 100 may include pixel regions PX1 to PX3 and non-pixel regions NPX. Each of the non-pixel regions NPX may be a non-luminous region that the shaded portion SH and the sub-region SB described above become over time. Each of the pixel regions PX1 to PX3 may be a region where a pixel, which is the minimum unit for displaying an image, is located. A pixel electrode PE may be located in each of the pixel regions PX1 to PX3. A switching element may be located in each of the non-pixel regions NPX. The switching element may be, for example, a thin film transistor.

[0077] The light-shielding member BM may overlap each thin film transistor along the thickness direction TD, each thin film transistor including a gate electrode GAT, a semiconductor layer ACT and a source / drain electrode SD, contact holes CNT1 and CNT2, and a pixel defining layer PDL. The light-shielding member BM may include a light-shielding pigment such as carbon black and may include a photosensitive organic material. In some embodiments, the light-shielding member BM may also include an inorganic reflective / absorptive layer or a metal. For example, the light-shielding member BM may be made of metal Al or Ag having a high reflectivity. The light-shielding member BM formed as a reflective metal layer may cause total reflection of incident light, thereby improving light efficiency compared to when the light-shielding member BM is formed of a light-absorbing material.

[0078] The light shielding member BM may block the mixed light emitted from the sub-region SB until the sub-region SB changes from a weak light-emitting region to a non-light-emitting region. The light shielding member BM may be formed at an angle and distance for blocking the mixed light emitted from the sub-region SB. For example, when the region emitting the mixed light is constant, the viewing angle at which the mixed light can be identified may be constant. When the viewing angle is constant, the width of the light shielding member BM for blocking the mixed light in a direction perpendicular to the thickness direction TD may decrease as the distance between the mixed light-emitting region and the light shielding member BM decreases. For example, the smaller the height of the organic layer in the thickness direction TD, the smaller the width of the light shielding member BM for blocking the mixed light in a direction perpendicular to the thickness direction TD. The viewing angle at which the mixed light can be identified may be defined as the angle θ1 between a line extending in a direction perpendicular to the substrate 100 and an imaginary line connecting the side surface of the mixed light-emitting region and the side surface of the light shielding member BM.

[0079] When the viewing angle is constant, the width of the light blocking member BM for blocking the mixed light can increase as the distance between the mixed light emitting region and the light blocking member BM increases. For example, the greater the height of the organic layer, the greater the width of the light blocking member BM for blocking the mixed light.

[0080] In addition, when the height of the organic layer is constant, if the viewing angle of the recognizable mixed light is widened due to two different organic light-emitting layers not only on the upper surface of the pixel defining layer PDL but also on both side surfaces of the pixel defining layer PDL, the width of the shading member BM can be increased to block the mixed light.

[0081] Hereinafter, the same elements as those of the above-described embodiment will be denoted by the same reference numerals. In addition, any redundant description will not be repeated, and the differences will be mainly described.

[0082] Figure 6 and Figure 7 The diagram shows Figure 2 An enlarged view of the OLED display according to the embodiment, taken from area A of FIG. Figure 8 Pictured Figure 6 or Figure 7 Changes over time in OLED displays.

[0083] Reference Figures 6 to 8 , the current embodiment is different from Figures 3 to 5 In an embodiment, the first organic light-emitting layer ED1, the second organic light-emitting layer ED2 and the third organic light-emitting layer ED3 are stacked on the pixel defining layer PDL. For example, the organic light-emitting layers of adjacent pixels extend along the corresponding side surfaces of the pixel defining layer PDL facing the pixel and along the upper surface of the pixel defining layer PDL.

[0084] For example, in the OLED display according to the current embodiment, the first organic light-emitting layer ED1, the second organic light-emitting layer ED2, and the third organic light-emitting layer ED3 may be sequentially stacked on the pixel electrode and the pixel defining layer PDL by FMM, and two adjacent different organic light-emitting layers may be stacked on the pixel defining layer PDL to partially overlap each other along the thickness direction TD. Another organic light-emitting layer ED1_2, ED2_2, or ED3_2 different from the two organic light-emitting layers overlapping each other may be further stacked on the two organic light-emitting layers.

[0085] Each organic light emitting layer may include a main region MA and a sub-region SB. The main region MA of each organic light emitting layer may be a section where the organic light emitting layer overlaps with the first electrode PE along the thickness direction TD and directly contacts the first electrode PE. The sub-region SB of each organic light emitting layer may be a section that overlaps with the pixel defining layer PDL along the thickness direction TD and directly contacts the pixel defining layer PDL.

[0086] The main area MA may include an opening portion OPN not overlapping the light blocking member BM in the thickness direction TD and a shadow portion SH overlapping the light blocking member BM in the thickness direction TD. The shadow portion SH may change from a light emitting area to a non-light emitting area over time.

[0087] When an electric field is formed between the first electrode PE and the second electrode CE, the organic light emitting layer may receive holes from the first electrode PE and electrons from the second electrode CE. The holes and electrons transmitted to the organic light emitting layer may be combined to form excitons in an excited state. Energy transfer may occur between the matrix and the dopant when the excitons move by diffusion, and light may be emitted when the excitons fall to the ground state.

[0088] However, if the organic light emitting layer is covered with H generated by a planarization layer or a pixel definition layer PDL made of an organic material over time, 2 If O or F is oxidized, the light emitted from the organic light emitting layer may gradually decrease. Finally, the organic light emitting layer may be changed into a non-light emitting layer.

[0089] The sub-region SB may include a region in which a single organic light emitting layer is disposed, and a region in which two or more different organic light emitting layers overlap each other. Figures 6 to 8The cross section of the pixel defining layer PDL shown in FIG. 1 is shown as a rectangle. In some embodiments, the cross section of the pixel defining layer PDL may be other shapes, such as a trapezoidal shape. In this case, a single organic light-emitting layer may be on the inclined surface of the trapezoid, and three different light-emitting layers overlapping each other may be on the upper surface of the trapezoid. In the sub-region SB, the area in which the single organic light-emitting layer is arranged may change from a weak light-emitting area to a non-light-emitting area over time. In addition, the area in which three different organic light-emitting layers overlap each other may be a non-light-emitting area.

[0090] The distance between the first electrode PE and the second electrode CE may be greater in the area where the single organic light emitting layer is located in the sub-area SB than in the pixel area. Therefore, the voltage required for the organic light emitting layer to emit light may be greater in the sub-area SB. Therefore, even if the same voltage is applied to the main area MA and the area of ​​the sub-area SB, less light may be emitted from the sub-area SB.

[0091] If the organic light emitting layer is covered with H generated by a planarization layer or a pixel definition layer PDL made of an organic material over time, 2 If O or F is oxidized, the light emitted from the organic light emitting layer may gradually decrease. Finally, the organic light emitting layer may be changed into a non-light emitting layer.

[0092] In the sub-region SB, a region in which two or more different organic light-emitting layers overlap each other along the thickness direction TD may be a non-light-emitting region. When three different organic light-emitting layers overlap each other along the thickness direction TD, holes transmitted from the first electrode PE and electrons transmitted from the second electrode CE may not be easily recombined, and a larger voltage may be required for light emission. Therefore, no light may be emitted.

[0093] According to an embodiment, mixed light may be emitted from the sub-region SB of each organic light-emitting layer. For example, when the first organic light-emitting layer ED1 emitting red light, the second organic light-emitting layer ED2 emitting green light, and the third organic light-emitting layer ED3 emitting blue light overlap each other along the thickness direction TD, weak white light may be emitted. In the sub-region SB, three different organic light-emitting layers may overlap each other along the thickness direction TD on the upper surface of the pixel defining layer PDL. Figure 7 In some embodiments, three different organic light-emitting layers ED1_1, ED2_1, and ED3_1 may overlap with each other not only on the upper surface of the pixel defining layer PDL but also on both side surfaces of the pixel defining layer PDL in the thickness direction TD. Another organic light-emitting layer ED1_3, ED2_3, or ED3_3 different from the two organic light-emitting layers overlapping with each other may be further stacked on the two organic light-emitting layers.

[0094] Each organic light emitting layer overlapping with the light shielding member BM may include a shadow portion SH and a sub-region SB. The length of each organic light emitting layer overlapping with the light shielding member BM along the thickness direction TD may be changed according to the aperture ratio of the organic light emitting layer and the resolution of the OLED display. For example, the length of each organic light emitting layer overlapping with the light shielding member BM along the thickness direction TD may be reduced as the aperture ratio of the organic light emitting layer and the resolution of the OLED display increase. For example, the length of each organic light emitting layer overlapping with the light shielding member BM along the thickness direction TD in a direction perpendicular to the thickness direction TD may be about 0.1 μm to about 18 μm.

[0095] When the organic light emitting layer EDL is deposited through a mask, the organic material may not be sufficiently deposited in the edge portion of each organic light emitting layer to be formed. If this phenomenon occurs in the main area MA, the light emitting area may be reduced.

[0096] However, in the present disclosure, the edge portion of the main area MA corresponds to the shadow portion SH, and the organic material may not be sufficiently deposited in the shadow portion SH. The shadow portion SH is a region that is assumed to eventually change into the non-pixel area NPX_1 over time. Therefore, insufficient deposition of the organic material may be meaningless.

[0097] The substrate 100 may include pixel regions PX1 to PX3 and a non-pixel region NPX_1. Each of the non-pixel regions NPX_1 may be a non-luminous region in which the above-mentioned shaded portion SH and the sub-region SB are changed over time. Each of the pixel regions PX1 to PX3 may be a region where a pixel as a minimum unit for displaying an image is located. A pixel electrode PE may be located in each of the pixel regions PX1 to PX3. A switching element may be located in each of the non-pixel regions NPX_1. The switching element may be, for example, a thin film transistor.

[0098] The light-shielding member BM may overlap each thin film transistor along the thickness direction TD, each thin film transistor including a gate electrode GAT, a semiconductor layer ACT and a source / drain electrode SD, contact holes CNT1 and CNT2, and a pixel defining layer PDL. The light-shielding member BM may include a light-shielding pigment such as carbon black, and may include a photosensitive organic material. In some embodiments, the light-shielding member BM may include an inorganic reflective / absorptive layer or a metal. For example, the light-shielding member BM may be made of metal Al or Ag having a high reflectivity. The light-shielding member BM formed as a reflective metal layer may cause total reflection of incident light, thereby improving light efficiency compared to when the light-shielding member BM is formed of a light-absorbing material.

[0099] The light shielding member BM may block the mixed light emitted from the sub-region SB until the sub-region SB changes from a weak light-emitting region to a non-light-emitting region. The light shielding member BM may be formed at an angle and distance for blocking the mixed light emitted from the sub-region SB. For example, when the region emitting the mixed light is constant, the viewing angle at which the mixed light can be identified may be constant. When the viewing angle is constant, the width of the light shielding member BM for blocking the mixed light in a direction perpendicular to the thickness direction TD may decrease as the distance between the mixed light-emitting region and the light shielding member BM in the thickness direction TD decreases. For example, the smaller the height of the organic layer in the thickness direction TD, the smaller the width of the light shielding member BM in a direction perpendicular to the thickness direction TD required to block the mixed light. The viewing angle at which the mixed light can be identified is defined as the angle θ2 between a line extending in a direction perpendicular to the substrate 100 and an imaginary line connecting the side surface of the mixed light-emitting region and the side surface of the light shielding member BM.

[0100] When the viewing angle is constant, the width of the light shielding member BM for blocking the mixed light in the direction perpendicular to the thickness direction TD may increase as the distance between the mixed light emitting region and the light shielding member BM in the thickness direction TD increases. For example, the greater the height of the organic layer in the thickness direction TD, the greater the width of the light shielding member BM for blocking the mixed light in the direction perpendicular to the thickness direction TD.

[0101] When the height of the organic layer along the thickness direction TD is constant, if the viewing angle of the identifiable mixed light is widened due to the two different organic light-emitting layers being arranged not only on the upper surface of the pixel defining layer PDL but also on the two side surfaces of the pixel defining layer PDL, the width of the light-shielding member BM along the direction perpendicular to the thickness direction TD can be increased to block the mixed light.

[0102] The sub-region SB in which three different organic light emitting layers overlap each other along the thickness direction TD can emit weak white light. Therefore, the problem of brightness / color deviation caused by color mixing can be reduced.

[0103] Fig. 9 and Fig.10 The diagram shows Figure 2 An enlarged view of the OLED display according to the embodiment, taken from area A of FIG. Fig.11 Pictured Fig. 9 or Fig.10 Changes over time in OLED displays.

[0104] Reference Figures 9 to 11 , the current embodiment is different from Figure 3 and Figure 4 An embodiment of the present invention is characterized in that each organic light emitting layer has a series stacked structure.

[0105] For example, the first organic light emitting layer ED1 of the OLED display according to the current embodiment may further include a charge generation layer CGL on the first light emitting layer ED1_4 and a second light emitting layer ED1_5 on the charge generation layer CGL. The second medium layer may be on the second light emitting layer ED1_5.

[0106] The charge generation layer CGL may inject charges into each light emitting layer. The charge generation layer CGL may adjust the charge balance between the first light emitting layer ED1_4 and the second light emitting layer ED1_5. In some embodiments, the charge generation layer CGL may include an n-type charge generation layer and a p-type charge generation layer. The p-type charge generation layer may be disposed on the n-type charge generation layer.

[0107] The charge generation layer CGL may have a structure in which an n-type charge generation layer and a p-type charge generation layer are bonded to each other. The n-type charge generation layer may be arranged closer to the first electrode PE among the first electrode PE and the second electrode CE. The p-type charge generation layer may be arranged closer to the second electrode CE among the first electrode PE and the second electrode CE. The n-type charge generation layer may supply electrons to the first light-emitting layer ED1_4 adjacent to the first electrode PE, and the p-type charge generation layer may supply holes to the second light-emitting layer ED1_5. When the charge generation layer CGL arranged between the first light-emitting layer ED1_4 and the second light-emitting layer ED1_5 provides charges to each of the first light-emitting layer ED1_4 and the second light-emitting layer ED1_5, the light-emitting efficiency may be improved, and the driving voltage may be reduced.

[0108] Similar to the first light-emitting layer ED1_4, the second light-emitting layer ED1_5 may emit red light. In some embodiments, the red light emitted from the second light-emitting layer ED1_5 and the red light emitted from the first light-emitting layer ED1_4 may have the same peak wavelength range. In some embodiments, the second light-emitting layer ED1_5 may be made of the same material as the first light-emitting layer ED1_4, or may include one or more of the materials exemplified as the material of the first light-emitting layer ED1_4. In some embodiments, the first light-emitting layer ED1_4 and the second light-emitting layer ED1_5 may be made of different materials, and the red light emitted from the first light-emitting layer ED1_5 and the red light emitted from the second light-emitting layer ED1_5 may have different peak wavelength ranges.

[0109] The first organic light-emitting layer ED1 constructed as described above may include two light-emitting layers, for example, a first light-emitting layer ED1_4 and a second light-emitting layer ED1_5. The first light-emitting layer ED1_4 and the second light-emitting layer ED1_5 may be red light-emitting layers. The second light-emitting layer ED2 may include two light-emitting layers, for example, a first light-emitting layer ED2_4 and a second light-emitting layer ED2_5. The first light-emitting layer ED2_4 and the second light-emitting layer ED2_5 may be green light-emitting layers. The third organic light-emitting layer ED3 may include two light-emitting layers, for example, a first light-emitting layer ED3_4 and a second light-emitting layer ED3_5. The first light-emitting layer ED3_4 and the second light-emitting layer ED3_5 may be blue light-emitting layers.

[0110] First, second and third organic light emitting layers ED1, ED2 and ED3 each including two light emitting layers may be sequentially stacked on the pixel electrode and the pixel defining layer PDL by FMM. Two adjacent different organic light emitting layers may partially overlap each other on the pixel defining layer PDL.

[0111] Each organic light emitting layer may include a main region MA and a sub-region SB. The main region MA of each organic light emitting layer may be a section where the organic light emitting layer overlaps with the first electrode PE along the thickness direction TD and directly contacts the first electrode PE. The sub-region SB of each organic light emitting layer may be a section that overlaps with the pixel defining layer PDL along the thickness direction TD and directly contacts the pixel defining layer PDL.

[0112] The main area MA may include an opening portion OPN not overlapping the light blocking member BM in the thickness direction TD and a shadow portion SH overlapping the light blocking member BM in the thickness direction TD. The shadow portion SH may change from a light emitting area to a non-light emitting area over time.

[0113] For example, when an electric field is formed between the first electrode PE and the second electrode CE, the first light emitting layer ED1_4 may receive holes from the first electrode PE and electrons from the charge generation layer CGL. The second light emitting layer ED1_5 may receive holes from the charge generation layer CGL and electrons from the second electrode CE. The holes and electrons transmitted to the first light emitting layer ED1_4 and the second light emitting layer ED1_5 may be combined to form excitons in an excited state. When the excitons move by diffusion, energy transfer may occur between the matrix and the dopant, and light may be emitted when the excitons fall to the ground state.

[0114] If the organic light emitting layer is covered with H generated by a planarization layer or a pixel definition layer PDL made of an organic material over time, 2 If O or F is oxidized, the light emitted from the organic light emitting layer may gradually decrease. Finally, the organic light emitting layer may be changed into a non-light emitting layer.

[0115] The sub-region SB may include a region in which a single organic light emitting layer including two light emitting layers is arranged, and a region in which two different organic light emitting layers each including two light emitting layers overlap each other in the thickness direction TD. Figures 9 to 11 The cross-section of the pixel defining layer PDL shown may be a rectangle. In some embodiments, the cross-sectional shape of the pixel defining layer PDL may be other shapes, such as, for example, a trapezoidal shape. In this case, an organic light-emitting layer including two light-emitting layers may be arranged on an inclined surface of the trapezoid, and two different organic light-emitting layers each including two light-emitting layers may be arranged on the upper surface of the trapezoid to overlap with each other in the thickness direction TD. In the sub-region SB, the region in which a single organic light-emitting layer including two light-emitting layers is arranged may change from a weak light-emitting region to a non-light-emitting region over time. In addition, the region in which two different organic light-emitting layers each including two light-emitting layers overlap with each other may be a non-light-emitting region.

[0116] The distance between the first electrode PE and the second electrode CE may be greater in the region in which a single organic light-emitting layer including two light-emitting layers is arranged in the sub-region SB than in the pixel region. Therefore, the voltage required for the organic light-emitting layer to emit light may be greater in the region in which the sub-region SB is arranged. Therefore, even if the same voltage is applied to the main region MA and the sub-region SB, less light may be emitted from the sub-region SB. In addition, as described above, if the organic light-emitting layer is distorted over time by the H generated by the planarization layer or the pixel definition layer PDL made of an organic material, 2 If O or F is oxidized, the light emitted from the organic light emitting layer may gradually decrease. Finally, the organic light emitting layer may be changed into a non-light emitting layer.

[0117] In the sub-region SB, the region in which two different organic light-emitting layers, each including two light-emitting layers, overlap each other may be a non-light-emitting region. When two different organic light-emitting layers, each including two light-emitting layers, overlap each other along the thickness direction TD, holes and electrons cannot be easily recombined between different organic light-emitting layers, and a larger voltage may be required for light emission. Therefore, no light may be emitted.

[0118] According to an embodiment, mixed light may be emitted from the sub-region SB of each organic light-emitting layer. For example, when the first organic light-emitting layer ED1 emitting red light and the second organic light-emitting layer ED2 emitting green light overlap with each other along the thickness direction TD, weak yellow light may be emitted. When the second organic light-emitting layer ED2 emitting green light and the third organic light-emitting layer ED3 emitting blue light overlap with each other along the thickness direction TD, weak cyan light may be emitted. When the first organic light-emitting layer ED1 emitting red light and the third organic light-emitting layer ED3 emitting blue light overlap with each other along the thickness direction TD, weak magenta light may be emitted. When two different organic light-emitting layers each including two light-emitting layers between the first electrode PE and the second electrode CE are overlapped in the thickness direction TD, weak magenta light may be emitted. Figures 9 to 11 When the sub-regions SB overlap each other in the thickness direction TD, the thickness of the organic light-emitting layers can be increased compared to when two different organic light-emitting layers each including one light-emitting layer overlap each other in the thickness direction TD. Figures 3 to 8 When the sub-regions SB overlap each other in the thickness direction TD, a larger driving voltage is required. Figures 9 to 11 The sub-area SB emits a weaker mixed light. Fig. 9 , the four different organic light emitting layers ED1_4, ED1_5, ED2_4, and ED2_5 may overlap with each other along the thickness direction TD on the upper surface of the pixel defining layer PDL only in the sub-region SB. Fig.10 , the four different organic light emitting layers ED1_6 , ED1_7 , ED2_6 , and ED2_7 may overlap with each other in the thickness direction TD not only on the upper surface of the pixel defining layer PDL but also on both side surfaces of the pixel defining layer PDL.

[0119] Each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may include a shadow portion SH and a sub-region SB. The length of each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may be changed according to the aperture ratio of the organic light emitting layer and the resolution of the OLED display. For example, the length of each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may decrease as the aperture ratio of the organic light emitting layer and the resolution of the OLED display increase. For example, the length of each organic light emitting layer overlapping the light shielding member BM in the thickness direction TD may be about 0.1 μm to about 18 μm.

[0120] When the organic light emitting layer EDL is deposited through a mask, the organic material may not be sufficiently deposited in the edge portion of each organic light emitting layer to be formed. If this phenomenon occurs in the main area MA, the light emitting area may be reduced.

[0121] However, in the present disclosure, the edge portion of the main area MA corresponds to the shadow portion SH. The organic material may not be sufficiently deposited in the shadow portion SH. The shadow portion SH is a region that is assumed to eventually change into the non-pixel area NPX_2 over time. Therefore, insufficient deposition of the organic material may not be a problem.

[0122] The substrate 100 may include pixel regions PX1_1 to PX3_1 and non-pixel regions NPX_2. Each of the non-pixel regions NPX_2 may be a non-luminous region into which the above-mentioned shaded portion SH and sub-region SB change over time. Each of the pixel regions PX1_1 to PX3_1 may be a region where a pixel, which is a minimum unit for displaying an image, is located. A pixel electrode PE may be located in each of the pixel regions PX1_1 to PX3_1. A switching element may be located in each of the non-pixel regions NPX_2. The switching element may be, for example, a thin film transistor.

[0123] The light-shielding member BM may overlap each thin film transistor along the thickness direction TD, each thin film transistor including a gate electrode GAT, a semiconductor layer ACT and a source / drain electrode SD, contact holes CNT1 and CNT2, and a pixel defining layer PDL. The light-shielding member BM may include a light-shielding pigment such as carbon black, and may include a photosensitive organic material. In some embodiments, the light-shielding member BM may also include an inorganic reflective / absorptive layer or a metal. For example, the light-shielding member BM may be made of metal Al or Ag having a high reflectivity. The light-shielding member BM formed as a reflective metal layer can cause total reflection of incident light, thereby improving light efficiency compared to when the light-shielding member BM is formed of a light-absorbing material.

[0124] The light-shielding member BM may block the mixed light emitted from the sub-region SB until the sub-region SB changes from a weak light-emitting region to a non-light-emitting region. The light-shielding member BM may be formed at an angle and distance for blocking the mixed light emitted from the sub-region SB. For example, when the region emitting the mixed light is constant, the viewing angle at which the mixed light can be identified may be constant. When the viewing angle is constant, the width of the light-shielding member BM for blocking the mixed light may decrease as the distance between the mixed light-emitting region and the light-shielding member BM decreases. For example, the smaller the height of the organic layer, the smaller the width of the light-shielding member BM for blocking the mixed light. The viewing angle at which the mixed light can be identified is defined as the angle θ3 between a line extending in a direction perpendicular to the substrate 100 and an imaginary line connecting the side surface of the mixed light-emitting region and the side surface of the light-shielding member BM.

[0125] When the viewing angle is constant, the width of the light blocking member BM for blocking the mixed light can increase as the distance between the mixed light emitting region and the light blocking member BM increases. For example, the greater the height of the organic layer, the greater the width of the light blocking member BM for blocking the mixed light.

[0126] In addition, when the height of the organic layer is constant, if the viewing angle of the recognizable mixed light is widened because two different organic light-emitting layers are arranged not only on the upper surface of the pixel defining layer PDL but also on the two side surfaces of the pixel defining layer PDL, the width of the shading member BM can be increased to block the mixed light.

[0127] The height of the organic light-emitting layer including two light-emitting layers along the thickness direction TD may be greater than the height of the organic light-emitting layer including one light-emitting layer along the thickness direction TD. Therefore, the width of the light-shielding member BM along the direction perpendicular to the thickness direction TD may be increased to block the mixed light emitted from the organic light-emitting layer including two light-emitting layers. However, less light may be emitted from the organic light-emitting layer including two light-emitting layers compared to the organic light-emitting layer including one light-emitting layer. Therefore, the width of the light-shielding member BM along the direction perpendicular to the thickness direction TD may be substantially the same.

[0128] Fig.12 The diagram shows Figure 1 1 is a cross-sectional view of an OLED display according to an embodiment, taken along line II'.

[0129] Fig.12 The embodiment is different from Figure 2 An embodiment of the present invention is that the pixel defining layer PDL includes a first pixel defining layer PDL1 made of an inorganic material and a second pixel defining layer PDL2 made of an organic material.

[0130] For example, in an OLED display according to an embodiment, a first pixel defining layer PDL1 for defining each pixel region may be formed on each first electrode PE. The first pixel defining layer PDL1 may be formed on the entire substrate 100 to cover the planarization layer 150. An opening OP (each exposing a portion of the first electrode PE) may be formed in the first pixel defining layer PDL1 to define a pixel region. The first pixel defining layer PDL1 may overlap a portion including an edge of each first electrode PE in a thickness direction TD. The first pixel defining layer PDL1 may be made of a material such as SiO x Layer, SiN x The present invention may be made of an inorganic material such as a silicon oxynitride layer or a silicon nitride oxide layer, or may be in the form of a multilayer including these layers.

[0131] As described above, when the planarization layer 150 is made of an organic material, outgassing may occur during the baking process. Outgassing may oxidize the first medium layer for transmitting electrons, thereby reducing each pixel area. For example, the life of the OLED display may be reduced. However, if the first pixel defining layer PDL1 made of an inorganic material is arranged on the planarization layer 150 according to an embodiment, outgassing from the planarization layer 150 may be prevented, which in turn may improve the reliability, optical properties, and life dispersion of the OLED display.

[0132] The second pixel defining layer PDL2 may be arranged on an upper surface of the first pixel defining layer PDL1. The second pixel defining layer PDL2 may overlap the first pixel defining layer PDL1 along the thickness direction TD. The portion including the edge of each pixel electrode PE, the first pixel defining layer PLD1, and the second pixel defining layer PDL2 may overlap each other along the thickness direction TD. The second pixel defining layer PDL2 may not be formed in each opening OP of the first pixel defining layer PDL1. Therefore, the organic light emitting layer EDL may be exposed without being covered by the second pixel defining layer PDL2.

[0133] The sidewall of the first pixel defining layer PDL1 on the side of each opening OP and the sidewall of the second pixel defining layer PDL2 on the side of each opening OP may be aligned with each other. The thickness of the first pixel defining layer PDL1 may be constant.

[0134] The second pixel defining layer PDL2 may include at least one organic material selected from the group consisting of BCB, PI, PA, acrylic resin, and phenolic resin.

[0135] By way of summary and review, an OLED display may include a pixel defining layer that surrounds the edge of each pixel electrode to form a boundary separating the corresponding pixel from other pixels. An organic light emitting layer may be arranged on the pixel electrode within each opening of the pixel defining layer. The organic light emitting layer may be easily degraded due to moisture or oxygen, resulting in reduced brightness in some portions or the generation of non-luminous areas.

[0136] The embodiment provides an organic light emitting diode (OLED) display whose pixel structure is changed to minimize reduction in a light emitting area.

[0137] The OLED display according to the embodiment may help prevent a reduction in its brightness and lifespan that may be caused by a reduction in the light emitting area, and may reduce color deviation.

[0138] Example embodiments have been disclosed herein, and although specific terms are employed, they are used and interpreted in a general and descriptive sense only and not for purposes of limitation. In some cases, as would be apparent to one of ordinary skill in the art at the time of filing this application, features, characteristics, and / or elements described in conjunction with a particular embodiment may be used alone or in combination with features, characteristics, and / or elements described in conjunction with other embodiments, unless specifically indicated otherwise. Therefore, it should be understood by those skilled in the art that various changes in form and detail may be made without departing from the spirit and scope of the appended claims.

Claims

1. An organic light emitting diode display, comprising: a first electrode; a pixel defining layer, at least partially exposing the first electrode; an organic light-emitting layer, on the first electrode; A thin film encapsulation layer, on the organic light emitting layer; as well as a light shielding member, on the thin film encapsulation layer, the light shielding member overlapping the pixel defining layer, in: The ends of the organic light emitting layers adjacent to each other overlap each other on the pixel defining layer, The organic light emitting layer includes a main region that does not overlap with the pixel defining layer and a sub-region that overlaps with the pixel defining layer, and The main area includes an opening portion that does not overlap with the light shielding member and a shadow portion that surrounds the opening portion and overlaps with the light shielding member.

2. The organic light emitting diode display according to claim 1, wherein: The pixel defining layer and the light shielding member overlap each other so that the center of the cross section of the pixel defining layer overlaps with the center of the cross section of the light shielding member, and The width of the pixel defining layer is smaller than the width of the light blocking member.

3. The organic light emitting diode display according to claim 2, wherein: The width of the pixel defining layer is 3 μm to 5 μm.

4. The organic light emitting diode display according to claim 1, wherein: The width of the shaded portion is 6.5 μm to 7.5 μm.

5. The organic light emitting diode display according to claim 1, wherein: The organic light emitting layer includes a first organic light emitting layer emitting red light, a second organic light emitting layer emitting green light, and a third organic light emitting layer emitting blue light.

6. The organic light emitting diode display according to claim 5, wherein: In the sub-region, any one of the first to third organic light-emitting layers is on one side surface and the upper surface of the pixel defining layer, and an organic light-emitting layer of the first to third organic light-emitting layers that overlaps with any one of the organic light-emitting layers is on the other side surface and the upper surface of the pixel defining layer.

7. The organic light emitting diode display according to claim 5, wherein: In the sub-region, any one of the first to third organic light-emitting layers is on the two side surfaces and the upper surface of the pixel defining layer, and the organic light-emitting layer of the first to third organic light-emitting layers overlapping with any one of the organic light-emitting layers is on the two side surfaces and the upper surface of the pixel defining layer.

8. The organic light emitting diode display according to claim 5, wherein: The first to third organic light-emitting layers overlap with each other in the sub-region.

9. The organic light emitting diode display according to claim 1, wherein: The shadow portion and the sub-area change into a non-luminous area as time passes.

10. The organic light emitting diode display according to claim 1, wherein: The width of the light shielding member increases in proportion to the thickness of the thin film encapsulation layer.

11. An organic light emitting diode display, comprising: a first electrode; a pixel defining layer, at least partially exposing the first electrode; an organic light-emitting layer, on the first electrode; A thin film encapsulation layer, on the organic light emitting layer; as well as a light shielding member on the thin film encapsulation layer and overlapping the pixel defining layer, in: The ends of the organic light emitting layers adjacent to each other overlap each other on the pixel defining layer, The organic light-emitting layer includes a main area that does not overlap with the pixel defining layer and a sub-area that overlaps with the pixel defining layer, the main area includes an opening portion that does not overlap with the light-shielding member and a shadow portion that overlaps with the light-shielding member and is arranged around the opening portion, wherein the opening portion is a strong light-emitting area, and each of the shadow portion and the sub-area is a weak light-emitting area having an emission intensity lower than that of the strong light-emitting area.

12. The organic light emitting diode display according to claim 11, wherein: The emission intensity of the shaded portion is greater than the emission intensity of the sub-region.

13. The organic light emitting diode display according to claim 11, wherein: The emission intensity of each of the shaded portion and the sub-region decreases as a distance from the opening portion increases.

14. An organic light emitting diode display comprising: a first electrode; a pixel defining layer, at least partially exposing the first electrode; An organic light-emitting layer, on the first electrode, the organic light-emitting layer comprising a first light-emitting layer and a second light-emitting layer; A thin film encapsulation layer, on the organic light emitting layer; as well as a light shielding member, on the thin film encapsulation layer, the light shielding member overlapping the pixel defining layer, in: The ends of the organic light emitting layers adjacent to each other overlap each other on the pixel defining layer, The organic light emitting layer includes a main region that does not overlap with the pixel defining layer and a sub-region that overlaps with the pixel defining layer, and The main area includes an opening portion that does not overlap with the light shielding member and a shadow portion that surrounds the opening portion and overlaps with the light shielding member.

15. The organic light emitting diode display according to claim 14, wherein: The organic light emitting layer further includes a charge generating layer between the first light emitting layer and the second light emitting layer.

16. The organic light emitting diode display according to claim 14, wherein: Light emitted from the first light emitting layer and light emitted from the second light emitting layer have the same color and have different peak wavelength ranges.

17. The organic light emitting diode display according to claim 14, wherein: The pixel defining layer and the light shielding member overlap each other so that the center of the cross section of the pixel defining layer overlaps with the center of the cross section of the light shielding member, and The width of the pixel defining layer is smaller than the width of the light blocking member.

18. The organic light emitting diode display according to claim 17, wherein: The width of the pixel defining layer is 3 μm to 5 μm.

19. The organic light emitting diode display according to claim 14, wherein: The width of the shaded portion is 6.5 μm to 7.5 μm.

20. The organic light emitting diode display according to claim 14, wherein: The shadow portion and the sub-area change into a non-luminous area as time passes.

Images