Deposition mask and method for manufacturing the same

Abstract

The present invention provides a deposition mask and a method for manufacturing the same. The deposition mask includes: a blocking portion comprising a main blocking component and an auxiliary blocking component; and a plurality of openings arranged inside the blocking portion, including a first opening and a second opening; wherein the blocking portion includes: a first surface; another surface facing the first surface; an inner surface exposed to the opening; a first end located at the intersection of the first surface and the inner surface and including an acute-angled tip; and another end located at the intersection of the other surface and the inner surface, wherein the first end of the blocking portion surrounding the first opening includes a first end comprising the auxiliary blocking component.

Description

Technical Field

[0001] The present invention relates to a deposition mask and a manufacturing method thereof. Background Art

[0002] Among display devices, organic light-emitting display devices are self-luminous display elements that have a wide viewing angle and excellent contrast. In addition, they also have the advantage of fast response speed, and therefore are attracting attention as next-generation display devices.

[0003] Such an organic light emitting display device includes an intermediate layer, such as a light emitting layer, between electrodes facing each other. The electrodes and the intermediate layer can be formed by various methods, one of which is a deposition method.

[0004] In order to manufacture an organic light-emitting display device using a deposition method, a deposition mask (for example, a fine metal mask (FMM)) having a pattern opening identical to the pattern of a thin film to be formed on the substrate is placed in close contact with the substrate, and then a deposition material is deposited on the substrate through the deposition mask to form a thin film with a desired pattern.

[0005] The deposition mask can be generally manufactured by forming a pattern opening in a metal substrate using a wet etching method, or can be manufactured by forming a pattern opening in a metal substrate using a laser irradiation method. Summary of the Invention

[0006] During the deposition process or during cleaning, the ramp portion of a fabricated deposition mask may become damaged. This damaged portion may cause a shadow effect, resulting in poor deposition. Therefore, if the ramp portion is damaged, the deposition mask is typically scrapped.

[0007] The problem to be solved by the present invention is to provide a deposition mask that can repair the damaged ramp portion, thereby preventing the shadow effect, and the deposition mask can be reused by restoring the damaged portion.

[0008] Another problem to be solved by the present invention is to provide a method for manufacturing a deposition mask that can repair a damaged ramp portion, thereby preventing a shadow effect, and can be reused by restoring the damaged portion.

[0009] The problems of the present invention are not limited to the problems mentioned above, and those skilled in the art can clearly understand other technical problems not mentioned through the following description.

[0010] A deposition mask according to one embodiment for solving the above-mentioned problem includes: a blocking portion, which is composed of a main blocking part and an auxiliary blocking part; and a plurality of openings, which are arranged inside the blocking portion, including a first opening and a second opening; wherein the blocking portion includes: one side; the other side, which is opposite to the one side; an inner side surface, which is exposed to the opening; a one side end, which is located at the intersection of the one side and the inner side surface and includes a tip shape with an acute angle; and the other side end, which is located at the intersection of the other side and the inner side surface, and the one side end of the blocking portion around the first opening includes a first end composed of the auxiliary blocking part.

[0011] The auxiliary blocking member of the first end portion may be arranged on the main blocking member.

[0012] The one end portion of the blocking portion around the second opening may include a second end portion including the main blocking member without the auxiliary blocking member.

[0013] The shape of the main blocking member at the first end portion may be different from the shape of the main blocking member at the second end portion.

[0014] A shape formed by combining the auxiliary blocking member and the main blocking member at the first end portion may be the same as a shape of the main blocking member at the second end portion.

[0015] The auxiliary blocking component and the main blocking component at the first end portion are in direct contact with each other and may form an interface at a contact surface.

[0016] The auxiliary blocking component and the main blocking component may be made of the same material.

[0017] The auxiliary blocking part of the first end portion may include a plurality of sub-auxiliary blocking parts distinguished by interfaces.

[0018] The auxiliary blocking sub-components may be made of the same material.

[0019] The inner side surface may have a shape that is concave toward the other side.

[0020] The inner side surface of the blocking portion may be composed of an auxiliary inner side surface of the auxiliary blocking member and a main inner side surface of the main blocking member.

[0021] In order to solve the above-mentioned problem, a method for manufacturing a deposition mask according to one embodiment includes the following steps: supplying a mask component including a main blocking component and a plurality of openings arranged inside the main blocking component; and forming an auxiliary blocking component on the main blocking component around at least a portion of the openings.

[0022] The opening portion may include a normal opening portion and a damaged opening portion, and the step of forming the auxiliary blocking member may be a step of forming the auxiliary blocking member on the main blocking member around the damaged opening portion.

[0023] The step of forming the auxiliary blocking member may be a step of forming the damaged opening portion in the same shape as the normal opening portion.

[0024] The step of forming the auxiliary blocking member may include placing the mask member on a support table and supplying ink including a substance for the auxiliary blocking member into the damaged opening.

[0025] The step of forming the auxiliary blocking component may further include: after the step of supplying the ink, the step of pressurizing the opening to which the ink is supplied using a pressurizing structure having a three-dimensional shape of the opening and including an elastic material; and the step of solidifying the auxiliary blocking component with a material.

[0026] The auxiliary blocking component material may include metal, and the step of solidifying the auxiliary blocking component material may be performed through a metal plating process.

[0027] Before the step of forming the auxiliary blocking member, the method may further include a step of classifying the opening portion of the mask member into the normal opening portion and the damaged opening portion.

[0028] The step of classifying the damaged opening may include the step of detecting a missing position and a missing amount of the damaged opening.

[0029] The step of forming the auxiliary blocking member on the main blocking member around the damaged opening may include the step of determining the amount and placement position of the auxiliary blocking member material according to the missing position and the missing amount of the damaged opening.

[0030] Details of other embodiments are included in the detailed description and drawings.

[0031] According to one embodiment, a deposition mask can be provided that can repair a damaged deposition mask by forming an auxiliary blocking member and an interface at the damaged terrace portion, thereby suppressing the shadow effect. Therefore, since the damaged deposition mask can be reused, manufacturing time and costs can be saved.

[0032] The effects according to the embodiments are not limited to those exemplified above, and more diverse effects are included in this specification. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 FIG. 1 is a diagram showing the configuration of a deposition apparatus for illustrating a deposition process using a deposition mask according to an embodiment.

[0034] Figure 2 is a plan view of a display device according to an embodiment.

[0035] Figure 3 is a plan view illustrating a portion of a deposition mask according to an embodiment.

[0036] Figure 4 It is along Figure 3 Cross-sectional view taken along line IV-IV'.

[0037] Figure 5 It will Figure 3 Magnified image of area A.

[0038] Figure 6 It is along Figure 5 Cross-sectional view taken along line VI-VI'.

[0039] Figure 7 is a plan view illustrating a portion of a mask member according to an embodiment.

[0040] Figure 8 The present invention is to illustrate a method for manufacturing a deposition mask according to an embodiment. Figure 7 Cross-sectional view taken along line VIII–VIII’.

[0041] Figure 9 yes Figure 7 Floor plan of area B.

[0042] Figure 10 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment.

[0043] Figure 11 It is amplified after being put into solution Figure 7 Floor plan of area B.

[0044] Figure 12 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment.

[0045] Figures 13 to 15 The solution is shown in sequence from Figure 12 Cross-sectional view showing the morphology of the C region moving to the missing part.

[0046] Figure 16 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment.

[0047] Figures 17 to 19 It will Figure 16 Magnified view of area D.

[0048] Figure 20 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment.

[0049] Figures 21 to 24 1 is a cross-sectional view of a mask member according to another embodiment and a cross-sectional view showing an enlarged portion around a missing portion.

[0050] Figures 25 to 27 is a cross-sectional view of a mask member according to yet another embodiment.

[0051] Explanation of symbols

[0052] 100: Deposition mask 100R: Mask member

[0053] 130: Main blocking component

[0054] 140: Opening 150: Interface

[0055] 160: Auxiliary blocking member 200: Target substrate

[0056] 300: Solution 400: Pressurized structure

[0057] BL: Blocking part S1: One side

[0058] S2: The other side S3: The inner side DETAILED DESCRIPTION

[0059] The advantages and features of the present invention, as well as methods for achieving these advantages and features, will be more readily apparent with reference to the accompanying drawings and the embodiments described in detail below. However, the present invention can be implemented in a variety of different forms and is not limited to the embodiments disclosed below. These embodiments are provided solely to fully disclose the present invention and to fully inform those skilled in the art of the present invention of the scope of the invention. The present invention is defined solely by the scope of the claims.

[0060] When an element or layer is mentioned as being "on" another element or layer, it includes all situations where the element is immediately above the other element or where other layers or elements are interposed therebetween. Throughout the specification, the same reference numerals refer to the same constituent elements.

[0061] Although the terms "first," "second," and so on are used to describe various components, it is obvious that these components are not limited to these terms. These terms are only used to distinguish one component from other components. Therefore, the first component mentioned below can also be the second component within the technical concept of the present invention.

[0062] Hereinafter, specific embodiments will be described with reference to the accompanying drawings.

[0063] Figure 1 FIG. 1 is a diagram showing the configuration of a deposition apparatus for illustrating a deposition process using a deposition mask according to an embodiment.

[0064] In the figure, a first direction DR1 represents the lateral direction of the deposition mask 100 in a plan view, and a second direction DR2 represents the longitudinal direction of the deposition mask 100 in a plan view. Furthermore, a third direction DR3 represents the thickness direction of the deposition mask 100. The first direction DR1 and the second direction DR2 intersect perpendicularly with each other. The third direction DR3, being a direction intersecting the plane in which the first and second directions DR1 and DR2 lie, intersects perpendicularly with both the first and second directions DR1 and DR2. However, the directions mentioned in the embodiments should be understood as referring to relative directions, and the embodiments are not limited to the mentioned directions.

[0065] Reference Figure 1 The deposition device for the deposition process may include a crucible 3, a support member 1, a mask frame 5, a deposition mask 100, and a magnet unit 2. The crucible 3 may contain a deposition material for deposition on a substrate and may heat the deposition material. The heated deposition material may sublime and pass through an exhaust port of the crucible 3 toward the outside.

[0066] The deposition mask 100 includes a blocking portion BL and a plurality of openings 140 formed inside the blocking portion BL. The blocking portion BL can serve to block the movement of the deposition material. The blocking portion BL can be composed of a blocking component. The blocking component can be composed of a metal including nickel (Ni), a nickel alloy, a nickel-cobalt alloy, etc. Although the blocking component can be composed of a metal film, it is not limited to this. The opening 140 is formed inside the blocking portion BL and has a shape that passes through the blocking component in the thickness direction. The opening 140 allows the deposition material to pass through to form a pattern corresponding to the shape of the opening 140 on the target substrate 200. Specifically, the deposition material supplied from the crucible 3 can be deposited on the target substrate 200 through the opening 140 of the deposition mask 100, and a thin film of a desired pattern can be formed on the target substrate 200 according to the shape of the opening 140 of the deposition mask 100.

[0067] The deposition mask 100 may be composed of a plurality of separate masks, but is not limited thereto. The deposition mask 100 may be composed of a single mask having a size obtained by combining a plurality of separate masks.

[0068] The deposition mask 100 (i.e., the blocking portion BL) may include one surface S1 and another surface S2. One surface S1 may be the surface facing the substrate, and the other surface S2 may be the opposite surface thereof and may be the surface facing the crucible 3. When the deposition mask 100 is in close contact with the target substrate 200, one surface S1 may be in physical contact with the target substrate 200. When the deposition mask 100 is located on the mask frame 5, the other surface S2 of the deposition mask 100 may be in physical contact with the mask frame 5.

[0069] The mask frame 5 may support the deposition mask 100 and may be combined with the deposition mask 100 by welding. The combined deposition mask 100 and mask frame 5 may be arranged on the support member 1. The support member 1 may support the combined deposition mask 100 and mask frame 5.

[0070] The magnet unit 2 may be disposed on an upper portion of the deposition mask 100. The target substrate 200 may be disposed between the deposition mask 100 and the magnet unit 2. The magnet unit 2 may function to bring the target substrate 200 and the deposition mask 100 into close contact.

[0071] The deposition mask 100 can be used when forming an organic light emitting layer pattern of an organic light emitting display device. Figure 2 A display device including an organic light emitting layer formed using the deposition mask 100 is shown.

[0072] Figure 2 is a plan view of a display device according to an embodiment.

[0073] Reference Figure 2 The display device may include a plurality of pixels 201, 202, and 203. The plurality of pixels may include a first color pixel 201, a second color pixel 202, and a third color pixel 203. The first color pixel 201 may be a red pixel including a red organic light-emitting layer, the second color pixel 202 may be a blue pixel including a blue organic light-emitting layer, and the third color pixel 203 may be a green pixel including a green organic light-emitting layer.

[0074] In one embodiment, although not limited thereto, the first color pixel 201 and the second color pixel 202 may have substantially the same shape and size, and the third color pixel 203 may be smaller than the first color pixel 201 and the second color pixel 202 .

[0075] The pixels may be arranged in an array. The direction of movement of the rows 220 may be a first direction DR1, and the direction of movement of the columns 210 may be a second direction DR2. The pixels 201, 202, and 203 may be in a rhombus (shown as an example in the figure), hexagonal, octagonal, circular, or other shapes. When the pixels are rhombus-shaped, the edges of the pixels 201, 202, and 203 are arranged in a direction that is inclined relative to the first direction DR1 and the second direction DR2.

[0076] The pixel rows 220 may include rows 221 and 223 in which first-color pixels 201 and second-color pixels 202 are alternately arranged, and rows 222 and 224 in which third-color pixels 203 are arranged. For example, the odd-numbered rows 221 and 223 may be rows in which first-color pixels 201 and second-color pixels 202 are alternately arranged, and the even-numbered rows 222 and 224 may be rows in which third-color pixels 203 are arranged. The pixels in the odd-numbered rows 221 and 223 and the even-numbered rows 222 and 224 may be arranged in an interleaved manner. That is, the third-color pixels 203 may be arranged between the first-color pixels 201 and the second-color pixels 202 in adjacent rows. Similarly, the first-color pixels 201 and the second-color pixels 202 may be arranged in the spaces between the third-color pixels 203 in adjacent rows.

[0077] Figure 3 is a plan view illustrating a portion of a deposition mask according to an embodiment. Figure 3 The deposition mask 100 is shown for forming Figure 2 The planar shape of the mask 100 used for depositing the red organic light emitting layer.

[0078] Reference Figure 2 and Figure 3 The blocking portion BL of the deposition mask 100 can be defined as a portion filled with a substance constituting the deposition mask 100, and the opening portion 140 can be defined as a portion where the substance is not present. In a plan view, the opening portion 140 can be arranged inside the blocking portion BL. The opening portion 140 can be surrounded by the blocking portion BL and can have an island shape in a plan view. The opening portion 140 can have a shape that penetrates the material layer (e.g., the mask substrate) constituting the blocking portion BL in the thickness direction.

[0079] The openings 140 may have a planar shape and arrangement corresponding to the pattern shape of the deposition object. In the case where the deposition object is a red organic light emitting layer of a display device, the openings 140 of the deposition mask 100 may have a planar shape and arrangement corresponding to the pattern shape of the deposition object. Figure 2The red pixels of the display device have substantially the same shape and arrangement. The opening 140 may have a substantially rhombus-shaped planar shape. In a plan view, each side of the opening 140 may extend in a direction inclined relative to the first direction DR1 and the second direction DR2. Figure 2 The blue pixel and green pixel regions of the display device may not be formed with the opening 140 but may be blocked by the blocking portion BL.

[0080] Figure 4 It is along Figure 3 Cross-sectional view taken along line IV-IV'. Figure 4 The cross-sectional structure of the deposition mask around the opening is shown. Figure 3 and Figure 4 The overall shape of the blocking portion BL in the area surrounding the opening 140 will be described.

[0081] The area around the opening 140 of the blocking portion BL is an area arranged relatively adjacent to the opening 140 in the blocking portion BL, for example, it can be an area located within 3 times the horizontal distance from the edge of the opening 140 to one side end 131 and the other side end 132.

[0082] The blocking portion BL may include an inner side surface S3 arranged around each opening portion 140 and a side end 131 and another side end 132 as corners facing each opening portion 140. The inner side surface S3 may be a surface facing the opening portion 140 from the blocking portion BL. The side end 131 may be a boundary where the inner side surface S3 and one surface S1 intersect, and the other side end 132 may be a boundary where the inner side surface S3 and another surface S2 intersect. The side end 131 may include a first end (refer to Figure 6 "131_1") and the second end (refer to Figure 6 This will be described later.

[0083] The opening portion 140 may include: a first surface opening 140a, which is a portion located on one side S1 of the blocking portion BL (i.e., a portion surrounded by one side end 131); and a second surface opening 140b, which is a portion located on the other side S2 of the blocking portion BL (i.e., a portion surrounded by the other side end 132).

[0084] The size of the first surface opening 140a and the size of the second surface opening 140b may be different. For example, the size of the second surface opening 140b may be larger than the size of the first surface opening 140a. Figure 1In the deposition apparatus shown, since the first surface opening 140a is arranged at the upper portion of the deposition mask 100 and the second surface opening 140b is arranged at the lower portion of the deposition mask 100, the deposition material supplied from the crucible 3 can pass through the second surface opening 140b before the first surface opening 140a during deposition on the target substrate 200. Therefore, by making the second surface opening 140b relatively large, the mask shadow phenomenon can be prevented, thereby allowing the deposition material to be uniformly deposited on the target substrate 200.

[0085] One end portion 131 may protrude further toward the center of opening 140 than the other end portion 132. The inner side surface S3 connecting one end portion 131 and the other end portion 132 may have a shape that is inclined relative to surface S1 in a cross-sectional view. The cross-sectional shape of inner side surface S3 may be generally concave downward, but is not limited thereto and may be variously modified to have an upwardly protruding shape, a straight line, or the like.

[0086] The thickness of the blocking portion BL is generally uniform in the area outside the periphery of the opening 140, but its thickness may decrease toward the side of the one side end 131 in the interval between the other side end 132 and the one side end 131. In the cross-sectional view, at the one side end 131, the angle formed by the surface S1 and the inner side surface S3 is an acute angle, and at the other side end 132, the angle formed by the other surface S2 and the inner side surface S3 may be 90° or an obtuse angle. Therefore, the one side end 131 may have a tip shape. However, this is not limiting, and both the one side end 131 and the other side end 132 may have an acute angle or an obtuse angle at the boundary intersecting with the inner side surface S3.

[0087] Figure 5 It will Figure 3 Magnified image of area A. Figure 6 It is along Figure 5 Cross-sectional view taken along line VI-VI'.

[0088] The blocking components constituting the blocking portion BL may include a main blocking component 130 and an auxiliary blocking component 160. The main blocking component 130 occupies the majority of the blocking portion BL. The blocking portion BL surrounding several openings 140 may be comprised solely of the main blocking component 130, without the auxiliary blocking component 160. In the surrounding areas of the remaining openings 140, the main blocking component 130 may have a shape with the tip of one end 131 missing. The auxiliary blocking component 160 is disposed on the main blocking component 130 with the missing tip, thereby allowing the auxiliary blocking component 160, together with the main blocking component 130, to assume the tip of one end 131 of the blocking portion BL.

[0089] The side end portion 131 may include a first end portion 131_1 and a second end portion 131_2. The first end portion 131_1 refers to the side end portions 131 in the area surrounding the opening 140 where at least a portion of the side end portion 131 is formed by the auxiliary blocking member 160, and the second end portion 131_2 refers to the remaining side end portions 131 in the area surrounding the opening 140 where only the main blocking member 130 is formed. The tip shape of the first end portion 131_1 may be substantially the same as the tip shape of the second end portion 131_2, but is not limited thereto.

[0090] The opening 140 can be divided into a first opening 141 and a second opening 142 according to the type of blocking member constituting the blocking portion BL in the surrounding area thereof. The first opening 141 refers to an opening 140 in which the tip shape of one side end portion 131 around the corresponding opening 140 is formed by the auxiliary blocking member 160 and / or the main blocking member 130, and the second opening 142 refers to an opening 140 in which the tip shape of one side end portion 131 around the corresponding opening 140 is formed only by the main blocking member 130 without the auxiliary blocking member 160.

[0091] One end portion 131 of the first opening 141 may be a first end portion 131_1 at least partially formed of the auxiliary blocking member 160. The remaining portion of one end portion 131 of the first opening 141 may be formed of the main blocking member 130. One end portion 131 of the second opening 142 may be a second end portion 131_2 formed only of the main blocking member 130 without the auxiliary blocking member 160.

[0092] The auxiliary blocking part 160 in the area surrounding the first opening 141 contacts the main blocking part 130. An interface 150 may be formed on the contact surface between the auxiliary blocking part 160 and the main blocking part 130. In the case where the auxiliary blocking part 160 is formed of a material different from that of the main blocking part 130, the contact surface of the two parts will form an interface 150 between different substances. In several embodiments, the auxiliary blocking part 160 may be made of the same material as the main blocking part 130. In this case, depending on the different processes for forming the two parts, an interface 150 between the same substances may also be observed on the contact surface of the two parts. However, this is not limited to this. An interface 150 may also be formed on the contact surface between the sub-auxiliary blocking parts 160a, 160b, 160c and the auxiliary blocking part 160, or on the contact surface between multiple sub-auxiliary blocking parts 160a, 160b, 160c. A detailed description of this will be given later.

[0093] In one embodiment, the auxiliary blocking member 160 may be formed to restore a portion of the tip portion of the deposition mask 100 that is damaged during use of the deposition mask 100. For example, if a deposition process is performed using the deposition mask 100 in which the blocking portion BL is composed only of the main blocking member 130, the tip portion around the opening portion 140 having a relatively thin thickness may be lost due to a collision between the deposition mask 100 and the target substrate 200. In this way, if the tip portion is lost, the opening shape of the opening portion 140 may be changed, thereby changing the shape of the deposition pattern. If an auxiliary blocking member 160 having substantially the same shape as the missing main blocking member 130 is formed on the missing main blocking member 130 of the existing deposition mask 100 to restore the original tip portion image of the blocking member BL, the phenomenon of poor deposition pattern as described above can be prevented. The method of forming the auxiliary blocking member 160 on the missing main blocking member 130 will be described later.

[0094] Reference Figures 5 and 6 The blocking portion BL around the second opening 142 may have the shape of the blocking portion BL described above, but may not include the auxiliary blocking component 160 and may be substantially composed of only the main blocking component 130. The blocking portion BL around the first opening 141 may also have the shape of the blocking portion BL described above as a whole. However, the blocking portion BL around the first opening 141 may include not only the main blocking component 130, but also the auxiliary blocking component 160 arranged to contact the main blocking component 130 in a portion of the area around the opening 140. The auxiliary blocking component 160 may be arranged around at least a portion of the opening 140.

[0095] like Figure 3 As shown, a deposition mask 100 according to one embodiment may be arranged with a plurality of openings 140. Auxiliary blocking members 160 may be formed around a portion of the openings 140 among the plurality of openings 140, and no auxiliary blocking members 160 may be formed around the remaining openings 140. The position and shape of the auxiliary blocking members 160 formed around each opening 140 including the auxiliary blocking members 160 may be varied. For example, the auxiliary blocking member 160 may be formed only in a portion of the blocking portion BL around the opening 140, or may be formed in the entire area of the blocking portion BL around the opening 140, or may be formed in multiple positions of the blocking portion BL around one opening 140. Furthermore, the position, shape, and size of the auxiliary blocking members 160 may be different. Furthermore, even for the same auxiliary blocking member 160, the shape of the auxiliary blocking member 160 in the cross-sectional view may be different depending on the position and direction of the line cut in the plan view.

[0096] Regardless of the shape and size of the auxiliary blocking member 160, the shape of the blocking portion BL around the opening 140 including the auxiliary blocking member 160 and the shape of the blocking portion BL around the opening 140 not including the auxiliary blocking member 160 may be substantially the same. In one embodiment, the shape of the blocking portion BL around the first opening 141 and the shape of the blocking portion BL around the second opening 142 may be substantially the same.

[0097] According to one embodiment, the auxiliary blocking member 160 may be formed in a region at the tip (or one side end 131) of the blocking portion BL and may have a pointed shape. Furthermore, the auxiliary blocking member 160 may completely or partially overlap the inner side surface S3 and the one side S1 in the thickness direction. According to one embodiment, the auxiliary blocking member 160 may include a one side S1 and a one side end 131 that contacts the inner side surface S3, and may be formed around the one side end 131.

[0098] The auxiliary blocking member 160 may include an auxiliary surface 160-O, an auxiliary inner surface 160-I and an auxiliary facing surface (not shown). Figure 1 The auxiliary inner side surface 160-I may be a portion of the auxiliary blocking part 160 that defines a portion of the opening 140. The auxiliary inner side surface 160-I and the auxiliary one side 160-O may be in contact with each other, and may have an acute angle at the boundary where the auxiliary inner side surface 160-I and the auxiliary one side 160-O intersect. The auxiliary opposing surface (not shown) is located between the auxiliary blocking part 160 and the main blocking part 130, and may be a portion of the auxiliary blocking part 160 that is in physical contact with the main blocking part 130. Therefore, the auxiliary blocking part 160 may be surrounded by the auxiliary inner side surface 160-I, the auxiliary one side 160-O, and the auxiliary opposing surface (not shown).

[0099] The main blocking component 130 may include a main surface 130a, a main other surface S2, a main inner side surface 130b and a main facing surface (not shown). The main surface 130a may be the main blocking component 130. Figure 1 The deposition device of the deposition mask 100 faces the substrate and is in physical contact with the substrate when the substrate and the deposition mask 100 are in close contact. The main inner side surface 130b can be the portion of the main blocking member 130 that faces the opening 140. The main other side S2 can be substantially the same as the other side S2 of the deposition mask 100. The main facing surface (not shown) is located between the main blocking member 130 and the auxiliary blocking member 160 and can be the portion of the main blocking member 130 that is in physical contact with the auxiliary blocking member 160.

[0100] When the blocking portion BL includes the auxiliary blocking member 160 around the opening 140, the inner side surface S3 may include the auxiliary inner side surface 160-I of the auxiliary blocking member 160 and the main inner side surface 130b of the main blocking member 130, and one side S1 may include the auxiliary one side 160-O of the auxiliary blocking member 160 and the main one side 130a of the main blocking member 130. Since the main blocking member 130 may occupy a majority of the blocking portion BL, the main inner side surface 130b may occupy a majority of the inner side surface S3 other than the auxiliary inner side surface 160-I, and the main one side 130a may occupy a majority of the one side S1 other than the auxiliary one side 160-O. However, since the auxiliary inner side surface 160-I can be formed in various shapes, the ratio of the auxiliary inner side surface 160-I to the main inner side surface 130b, and the ratio of the auxiliary one side 160-O to the main one side 130a, may vary in the area around each opening 140.

[0101] When the blocking portion BL does not include the auxiliary blocking member 160 around the opening 140 , the one surface S1 may be substantially the same as the main surface 130 a , and the inner surface S3 may be substantially the same as the main inner surface 130 b .

[0102] As described above, regardless of the presence or absence of auxiliary blocking members 160 around the opening 140 and the shape of the auxiliary blocking members 160, the shapes of the blocking portion BL including the auxiliary blocking members 160 and the blocking portion BL not including the auxiliary blocking members 160 can be substantially identical. Therefore, around all openings 140, the shapes of the side surface S1 including the auxiliary side surface 160-O and the side surface S1 not including the auxiliary side surface 160-O can be substantially identical. Furthermore, around all openings 140, the shapes of the inner side surface S3 including the auxiliary inner side surface 160-I and the inner side surface S3 not including the auxiliary inner side surface 160-I can be substantially identical. However, this is not limiting. A step difference may exist between the auxiliary inner side surface 160-I and the main inner side surface 130b at the boundary where the auxiliary inner side surface 160-I intersects. Furthermore, a step difference may exist between the auxiliary side surface 160-O and the main side surface 130a at the boundary where the auxiliary side surface 160-O intersects the main side surface 130a.

[0103] In the deposition mask 100, the auxiliary blocking part 160 and the main blocking part 130 can be distinguished from each other in appearance. Figure 5As shown, when observing the other side S2 of the deposition mask 100 from above, the second boundary 150b of the interface 150 can be observed on the inner side surface S3. Therefore, even if the auxiliary blocking member 160 and the main blocking member 130 are formed of the same composition and have the same properties, the portion surrounded by the second boundary 150b can be distinguished as the auxiliary blocking member 160. In the case where the auxiliary blocking member 160 is formed of a composition different from that of the main blocking member 130, since the auxiliary blocking member 160 has different properties such as surface roughness and color from the main blocking member 130, the auxiliary blocking member 160 and the main blocking member 130 can be distinguished. Furthermore, in the case where the auxiliary blocking member 160 is formed of a composition different from that of the main blocking member 130, the interface 150 can exist between the main blocking member 130 and the auxiliary blocking member 160, and the second boundary 150b of the interface 150 can be observed in a plan view, so the portion surrounded by the second boundary 150b can be distinguished as the auxiliary blocking member 160.

[0104] As described above, in the case of forming the auxiliary blocking member 160, an interface 150 may be arranged between the auxiliary facing surface (not shown) of the auxiliary blocking member 160 and the main facing surface (not shown) of the main blocking member 130. The auxiliary facing surface (not shown) of the auxiliary blocking member 160 may be in physical contact with the main blocking member 130, and the auxiliary facing surface (not shown) of the main blocking member 130 may be in physical contact with the auxiliary blocking member 160, so the auxiliary facing surface (not shown), the main facing surface (not shown), and the interface 150 may have substantially the same shape, size, and position as each other.

[0105] According to one embodiment, the interface 150 can overlap with the main inner side 130b in the thickness direction. However, it is not limited to this. The interface 150 can overlap with the main inner side 130b of the main blocking component 130 in the thickness direction while overlapping with the auxiliary inner side 160-I of the auxiliary blocking component 160 in the thickness direction, or overlap with the auxiliary inner side 160-I of the auxiliary blocking component 160 in the thickness direction while not overlapping with the main inner side 130b of the main blocking component 130. A portion of the interface 150 can overlap with the main inner side 130b in the thickness direction, and the remaining portion can overlap with the auxiliary inner side 160-I in the thickness direction. Moreover, when the interface 150 is formed perpendicularly along the thickness direction, it can not overlap with either the main inner side 130b or the auxiliary inner side 160-I in the thickness direction. Depending on the method for forming the auxiliary blocking component 160, two or more interfaces 150 can be formed in one auxiliary blocking component 160 in the case where it needs to be repeated more than twice.

[0106] According to one embodiment, the interface 150 may be formed in the shape of a curve that convexly projects upward in a cross-sectional view, but the present invention is not limited thereto. The cross-sectional shape of the interface 150 may be various. For example, it may be a straight line, a curve that concavely projects downward in a cross-sectional view, or a curve having one or more inflection points. Furthermore, when two or more interfaces 150 are formed, the shapes of the interfaces 150 may be different, partially identical, or entirely identical.

[0107] Reference Figure 5 and Figure 6 , the first boundary 150a may be the portion where the interface 150 is in contact with one surface S1, and the second boundary 150b may be the portion where the interface 150 is in contact with the inner surface S3. In the blocking portion BL according to one embodiment, the first boundary 150a may be arranged to be further away from the center side of the opening portion 140 than the second boundary 150b, and the first boundary 150a and the second boundary 150b may be connected. Furthermore, the first boundary 150a may be arranged closer to the center side of the opening portion 140 than the other side end portion 132. However, this is not limited to this. Below, a case where the first boundary 150a is arranged to be further away from the center side of the opening portion 140 than the second boundary 150b is described.

[0108] The following reference Figures 7 to 20 against Figures 1 to 6 A method for manufacturing the deposition mask 100 will be described. Figures 7 to 20 There are shown a step of supplying the mask member 100R and a step of forming the auxiliary blocking member.

[0109] Figure 7 is a plan view illustrating a portion of a mask member according to an embodiment. Figure 8 The present invention is to illustrate a method for manufacturing a deposition mask according to an embodiment. Figure 7 Cross-sectional view taken along line VIII–VIII’. Figure 9 yes Figure 7 Floor plan of area B. Figure 7 There is shown a step of supplying a mask member 100R including a main blocking member and a plurality of opening portions arranged inside the main blocking member. Figure 8 and Figure 9 The steps of classifying the damaged opening portion 141R and the normal opening portion 142R are shown.

[0110] Reference Figures 7 to 9 , although the mask part 100R and Figures 1 to 6 The deposition mask 100 is similar to the deposition mask 100 , but does not include the auxiliary blocking member 160 and is composed only of the main blocking member 130 , and may include damaged portions in surrounding areas of several openings 140R.

[0111] The mask part 100R may include a blocking portion BL (or a main blocking portion 130) and a plurality of openings 140R surrounded by the main blocking portion 130. The main blocking portion 130 of the mask part 100R may include a missing portion 160R that is not an auxiliary blocking portion 160, a main facing surface (not shown), a first boundary 150a and a second boundary 150b, a missing end surface 150R, a third boundary 150Ra, and a fourth boundary 150Rb. However, the damaged portion of the mask part 100R may be filled with the auxiliary blocking portion 160, in which case the shape of the mask part 100R may be different from that of the auxiliary blocking portion 160. Figures 1 to 6 The shapes of the deposition masks 100 are substantially the same.

[0112] The opening 140R can be divided into a damaged opening 141R and a normal opening 142R based on whether there is a missing portion in the surrounding area. The damaged opening 141R refers to the opening 140R that includes a missing portion in the surrounding area of the corresponding opening 140R, and the normal opening 142R refers to the opening 140R that does not include a missing portion in the surrounding area of the corresponding opening 140R.

[0113] The missing portion 160R may be a portion missing due to damage to the main blocking component 130 of the deposition mask 100. As described above, the thickness of the deposition mask 100 may decrease from the other side end face to the one side end face in the interval between the one side end face and the other side end face, and the smaller the thickness, the more likely it is to be damaged by external force. Therefore, the missing portion 160R may be formed in the portion where the inner side surface S3 and the one side S1 overlap in the thickness direction (that is, the interval between the one side end 131 and the other side end 132), and in the interval, it may be mainly formed around the one side end 131. An auxiliary blocking component 160 may be formed in the missing portion 160R, and the shape, size and position of the auxiliary blocking component 160 may be substantially the same as the shape, size and position of the missing portion 160R.

[0114] A missing end face 150R may be formed at the portion having the missing portion 160R. The missing end face 150R may be formed due to a portion of the tip portion of the main blocking member 130 being damaged and falling off. Figures 1 to 6 The missing end surface 150R can connect the main inner side surface 130b of the main blocking component 130 and the surface S1. Therefore, the shape, size and position of the missing end surface 150R can be substantially the same as the main opposite surface (not shown) (or interface 150).

[0115] The third boundary 150Ra may be a portion where one surface S1 and the missing end surface 150R meet, and the fourth boundary 150Rb may be a portion where the main inner side surface 130b and the missing end surface 150R meet. Figures 1 to 6 The auxiliary blocking member 160 and the interface 150 of the deposition mask 100 shown are substantially identical in shape, size, and position. Therefore, the shape and size of the third boundary 150Ra of the mask member 100R may be substantially identical to the shape and size of the first boundary 150a of the deposition mask 100. Furthermore, the shape and size of the fourth boundary 150Rb of the mask member 100R may be substantially identical to the shape and size of the second boundary 150b of the deposition mask 100.

[0116] Below, refer to Figure 8 and Figure 9 A method of measuring the position and amount of the missing portion 160R for each opening 140R will be described.

[0117] like Figure 8 As shown, the mask member 100R can be placed on a support table, which can be, for example, a magnetic chuck MC. Hereinafter, the support table will be described as a magnetic chuck, but the present invention is not limited thereto. The mask member 100R can be maintained on the magnetic chuck MC during the process of forming the auxiliary blocking member 160.

[0118] The magnetic chuck MC may fix the mask member 100R between the pressurizing structure 400 and the magnetic chuck MC and support the mask member 100R when performing pressurization with the pressurizing structure 400. The magnetic chuck MC according to an embodiment may be a non-conductive body, but is not limited thereto and may be a conductive body.

[0119] Reference Figure 8 and Figure 9 The first detector DT1 and the second detector DT2 can be used to measure the position and amount of the damaged missing portion 160R. The first detector DT1 can be arranged at a distance above the other surface S2, and the second detector DT2 can be arranged at a distance below the one surface S1.

[0120] In some embodiments, the first detector DT1 and the second detector DT2 may include an image acquisition unit. For example, the image acquisition unit may include a CCD camera, etc. The first detector DT1 may detect the missing portion 160R by acquiring an image of the mask member 100R, generating data based on the acquired image, and comparing the generated data with stored reference data, or comparing the acquired image with a stored reference image, etc. However, this is not limiting.

[0121] To elaborate, the planar shape of the opening 140R including the missing portion 160R, as sensed by the first detector DT1, may be different from the planar shape of the opening 140R not including the missing portion 160R. In the planar shape of the opening 140R including the missing portion 160R, not only the other side end 132 and the one side end 131 but also the fourth boundary 150Rb can be observed. However, in the planar shape of the opening 140R not including the missing portion 160R, only the other side end 132 and the one side end 131 can be observed. Therefore, when the planar shapes of the opening 140R including the missing portion 160R and the opening 140R not including the missing portion 160R are compared, their shapes are different, and the opening 140R including the missing portion 160R can be found.

[0122] The first detector DT1 can emit light, such as laser light, toward the mask member 100R while moving along the first direction DR1 and the second direction DR2. The light emitted from the first detector DT1 can be reflected back to the first detector DT1, and the amount of the reflected light can be measured to sense the other surface S2, the main inner surface 130b, or the magnetic chuck MC. Because the other surface S2 can be relatively flat, the amount of reflected light sensed by the first detector DT1 may be relatively greater than the amount of reflected light that can be sensed from the main inner surface 130b, which will be described later. In contrast, the main inner surface 130b of the blocking portion BL can be convex downward from the other side end 132 to the fourth boundary 150Rb. When the first detector DT1 emits light on the main inner surface 130b toward the main inner surface 130b, the amount of reflected light that can be sensed by the first detector DT1 may be relatively less than the amount of reflected light that can be sensed from the other surface S2. Furthermore, the magnetic chuck MC attached to the lower portion of the mask member 100R may be partially exposed through the opening 140R. Because the exposed surface of the magnetic chuck MC may be relatively flat, when light is emitted toward the magnetic chuck MC from the upper portion exposed through the opening 140R, the amount of reflected light reflected from the magnetic chuck MC and sensed by the first detector DT1 may be greater than the amount of reflected light sensed on the main inner side surface 130b. Therefore, based on the amount of reflected light sensed by the first detector DT1, the main inner side surface 130b and the magnetic chuck MC can be distinguished, and the horizontal distance of the sensing area can be measured based on the movement distance of the first detector DT1.

[0123] In one embodiment, the above method can be used to measure the horizontal distance from the other side end 132 to the one side end 131 in a portion without the missing portion 160R, and to measure the horizontal distance from the other side end 132 to the fourth boundary 150Rb in a portion with the missing portion 160R. However, this is not limiting. Depending on the shape of the missing portion 160R, the horizontal distance from the other side end 132 to the fourth boundary 150Rb or the third boundary 150Ra can be measured in a portion with the missing portion 160R.

[0124] Taking the horizontal distance from the other side end 132 to the one side end 131 as a reference, comparing the horizontal distance from the other side end 132 to the fourth boundary 150Rb measured by the first detector DT1, the horizontal distance of the missing part can be calculated based on the difference in distance. Moreover, since the thickness of the blocking part BL near the opening part 140R is essentially the same in each opening part 140R, the volume of the missing part can be measured using the measured horizontal distance and the thickness of the blocking part BL.

[0125] However, in the case where the missing portion 160R is measured using only one probe, the actual amount of breakage and missing and the measured amount of the missing portion 160R may differ from each other. Figure 8 and Figure 9As shown, when the missing end surface 150R overlaps with the main inner surface 130b in the thickness direction of the mask member 100R, the first detector DT1 can only sense the portion from the other side end 132 to the fourth boundary 150Rb, and may not be able to sense the portion from the fourth boundary 150Rb to the third boundary 150Ra. Therefore, a second detector DT2 is further used, spaced apart below one surface S1, to allow sensing from the fourth boundary 150Rb to the third boundary 150Ra. However, in this case, the magnetic chuck MC can be made of a highly light-transmitting material, so that light emitted from the second detector DT2 can be reflected from the fourth boundary 150Rb to the third boundary 150Ra, that is, reflected at the missing end surface 150R and re-sensed by the second detector DT2. Furthermore, when the second detector DT2 moves horizontally from the third boundary 150Ra toward the fourth boundary 150Rb, since there is no structure outside the fourth boundary 150Rb that reflects the light emitted by the second detector DT2, the reflected light outside the fourth boundary 150Rb may not be detected by the second detector DT2. Therefore, similar to the first detector DT1, the second detector DT2 can distinguish the sensing area by the amount of reflected light. The thickness distance between a surface and the missing end surface 150R can be calculated by measuring the distance between the second detector DT2 and the surface or missing end surface 150R. The calculated thickness distance and the horizontal distance of the missing end surface 150R can then be used to calculate the volume of the missing portion 160R. However, the method for calculating the volume of the missing portion 160R is not limited to this.

[0126] Figure 10 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment. Figure 11 It shows the enlarged image after the solution is added (or coated) Figure 7 Floor plan of area B. Figure 10 and Figure 11 FIG. 1 shows a step of supplying a solution 300 (or ink) containing a substance for auxiliary blocking members to the area around the damaged opening 141R. Figure 10 and Figure 11 The injection position and appropriate amount of the solution 300 for forming the auxiliary blocking member 160 will be described.

[0127] exist Figure 10 and Figure 11 , can include Figure 8 and Figure 9The solution 300 is injected into the opening 140R of the missing portion 160R sensed by the method. The injected solution 300 may be located on the magnetic chuck MC. The dropper DP may be used to inject the solution 300 only into the opening 140R including the missing portion 160R (i.e., the damaged opening 141R). The dropper DP may be used to inject the solution 300 along the Figure 10 However, the present invention is not limited thereto, and other components capable of injecting the solution 300 according to the position may be used in addition to the dispenser DP.

[0128] The solution 300 to be injected may include Figures 1 to 6 The auxiliary blocking member 160 is an auxiliary blocking member material. As will be described later, the auxiliary blocking member 160 can be formed in various ways. Depending on the method of forming the auxiliary blocking member 160, the type of auxiliary blocking member material included in the solution 300 can also be various. The solution 300 can be, for example, a metal plating solution 310, an electroless metal plating solution 320, a thermosetting solution 330, or a UV curable solution 340.

[0129] Figure 10 and Figure 11 The amount of solution 300 to be injected into the opening 140R may vary depending on the size of the missing portion 160R. The size of the missing portion 160R can be measured according to the method described above, and the appropriate amount of solution 300 to be injected into each opening 140R can be calculated based on the measured size. Therefore, the larger the size of the missing portion 160R, the greater the amount of solution 300 to be injected into the opening 140R including the corresponding missing portion 160R.

[0130] The solution 300 can be introduced into the opening 140R adjacent to the portion of the opening 140R where the damaged missing portion 160R is located. Specifically, the solution 300 can be introduced into the opening 140R including the missing portion 160R at a position offset toward the missing portion 160R relative to the centerline CT passing through the center of the opening 140R. When the solution 300 is introduced adjacent to the damaged missing portion 160R, the solution 300 can easily move toward the missing portion 160R during the step of bringing the pressurized structure 400 and the mask member 100R into close contact, described later. This facilitates the formation of the auxiliary blocking member 160. However, this is not limiting; the solution 300 can be introduced into any position on the magnetic chuck MC within the opening 140R including the damaged missing portion 160R, even if not adjacent to the damaged missing portion 160R. Furthermore, a missing portion 160R may be formed at multiple locations within an opening 140R, or a missing portion 160R may be formed passing through the sides of more than two openings 140R. In this case, the solution 300 may be respectively injected into the areas adjacent to each missing portion 160R or the areas adjacent to each side where the missing portion 160R is formed, or an amount of solution 300 corresponding to the entire volume of the missing portion 160R may be injected into the center of the opening 140R.

[0131] Figure 12 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment. Figures 13 to 15 The solution is shown in sequence from Figure 12 Cross-sectional view showing the morphology of the C region moving to the missing part. Figures 12 to 15 The step of pressurizing the opening to which the solution 300 is supplied using the pressurizing structure is shown. Figures 12 to 15 A method for moving the solution 300 injected into the opening 140R to the missing portion 160R will be described in detail.

[0132] exist Figure 12 , the upper part of the mask part 100R may be arranged with pressurized structures 400 at intervals. According to one embodiment, the pressurized structure 400 may include a main body 410 and a protrusion 420. A part or the entirety of the pressurized structure 400 may be made of an elastic material. The pressurized structure 400 may have a size that is capable of covering all the openings 140R of the mask part 100R. However, it is not limited to this, and may also have a size that is capable of covering only a part of the openings 140R of the mask part 100R. In this case, two or more pressurized structures 400 are arranged to cover all the openings 140R of the mask part 100R, thereby not repeating the process detailed below, or repeating the process detailed below using one pressurized part, thereby restoring all the missing parts 160R of the mask part 100R.

[0133] In the pressurized structure 400 according to one embodiment, the main body 410 and the protrusion 420 can be integrally formed of the same material, but are not limited thereto. The main body 410 and the protrusion 420 can be formed of materials having different properties. The pressurized structure 400 according to one embodiment can be a conductor, but is not limited thereto and can be a non-conductor. Furthermore, if the main body 410 and the protrusion 420 are formed of materials having different properties, the main body 410 can be a non-conductor and the protrusion 420 can be a conductor.

[0134] The main body 410 may have a substantially uniform thickness in the pressurized structure 400 and may be provided with the protrusion 420. The upper surface of the main body 410, i.e., the surface opposite to the surface facing the mask member 100R, may be flat, and the protrusion 420 may be provided on the lower surface of the main body 410, i.e., the surface facing the mask member 100R.

[0135] The protrusion 420 is arranged on the lower surface of the main body 410 of the pressurized structure 400 and may be a portion that protrudes toward the opening 140R of the mask part 100R in the thickness direction. According to one embodiment, the protrusion 420 may be made of an elastic material and may have elasticity. According to one embodiment, the shape of the protrusion 420 may correspond to the shape of the opening 140R of the mask part 100R, and the size of the protrusion 420 may be slightly larger than the size of the opening 140R of the mask part 100R. For example, if the shape of the opening 140R of the mask part 100R is a shape that is generally convex downward and has a curvature, the protrusion 420 of the pressurized structure 400 may also be a shape that is convex downward and has a curvature.

[0136] To elaborate, when the mask member 100R and the magnetic chuck MC are combined, the lower portion of the opening 140R may include a straight line. Even if the lower portion of the opening 140R includes a straight line, the protrusion 420 according to one embodiment may not have this straight line. Instead, the lower portion of the protrusion 420 may protrude most toward the opening 140R and may be convex downward as a whole. In this case, while the portion of the protrusion 420 that contacts the main inner side surface 130b of the mask member 100R may have a shape corresponding to the main inner side surface 130b of the mask member 100R, the dimensions of the protrusion 420 in the first direction DR1 and the second direction DR2 may be slightly larger than or substantially the same as the radius of the opening 140R. Furthermore, the length of the protrusion 420 extending along the thickness direction of the mask member 100R may be longer than the thickness of the mask member 100R. However, the shape of the protrusion 420 of the pressurized structure 400 is not limited to this. As described above, in the case where the pressurizing structure 400 has elasticity, the shape of the protrusion 420 may not correspond to the shape of the opening 140R of the mask member 100R.

[0137] Reference Figures 13 to 15 The process in which the solution 300 moves toward the missing portion 160R as the pressurizing structure 400 pressurizes the mask member 100R will be described in detail.

[0138] exist Figures 13 to 15 As the pressurized structure 400 moves toward the mask member 100R, the protrusion 420 of the pressurized structure 400 can be inserted into the opening 140R of the mask member 100R. In this case, since the pressurized structure 400 according to one embodiment can be made of a stretchable material, the shape and size of a portion or the entire protrusion 420 inserted into the opening 140R can be deformed to match the shape of the opening 140R. Therefore, in the opening 140R without the missing portion 160R, the protrusion 420 of the pressurized structure 400 and the opening 140R can be in close contact with each other without any floating space. However, for the opening 140R including the missing portion 160R, even if the pressurized structure 400 is stretchable, the pressurized structure 400 and the mask member 100R may not be in close contact at the missing portion 160R, but may have a free space. This free space can be surrounded by the protrusion 420, the mask member 100R, and the magnetic chuck MC. When the solution 300 is poured into the opening 140R including the missing portion 160R, the solution 300 may move toward the empty space of the missing portion 160R and fill the empty space while the pressurizing structure 400 and the mask member 100R are pressed and brought into close contact.

[0139] exist Figure 14As the elastic protrusion 420 according to one embodiment is inserted into the opening 140R and the pressurizing structure 400 continues to be pressurized, the lower portion of the curved protrusion 420 begins to contact the magnetic chuck MC. The protrusion 420 in contact with the magnetic chuck MC can then be deformed into a flat shape, similar to the flat magnetic chuck MC. As a result, the lower portion of the protrusion 420 and the magnetic chuck MC can be tightly attached to each other without any floating space in the contact area.

[0140] As the protrusion 420 and magnetic chuck MC come into close contact, the solution 300 introduced into the magnetic chuck MC may move from the point of introduction. Since there is no floating space in the area where the protrusion 420 and magnetic chuck MC are in close contact, the solution 300 introduced into the area where the protrusion 420 and magnetic chuck MC are in close contact can move to areas where the protrusion 420 and magnetic chuck MC are not in close contact. Since the protrusion 420 of the pressurized structure 400 according to one embodiment has a downwardly convex and curvature shape, the middle portion of the pressurized structure 400 in the first direction DR1 and the second direction DR2 can protrude most downward. Therefore, the protrusion 420 and magnetic chuck MC can begin to contact and closely contact the magnetic chuck MC near the center of the opening 140R, thereby allowing the introduced solution 300 to move from the center of the opening 140R toward the outside of the opening 140R.

[0141] exist Figure 15 In the process, as the pressurizing structure 400 and the magnetic chuck MC are continuously pressurized, the protrusion 420 of the pressurizing structure 400 and the magnetic chuck MC in the opening 140R can be completely in close contact with each other. At this time, according to one embodiment, the size of the protrusion 420 can be slightly larger than or the same as the size of the opening 140R of the mask part 100R, and the protrusion 420 can be elastic, so that not only the protrusion 420 and the magnetic chuck MC, but also the protrusion 420 and the inner side surface S3 of the mask part 100R are completely in close contact, so that there is no empty space between the protrusion 420 and the inner side surface S3. Accordingly, as described above, the solution 300 injected into the opening 140R will move toward the outside of the opening 140R, and can move toward the missing portion 160R of the mask part 100R. Figure 15 When the protrusion 420 is in complete contact with the magnetic chuck MC and the inner side surface S3 of the mask member 100R, the missing portion 160R can be filled with the injected solution 300 .

[0142] exist Figure 15Even if the pressurizing structure 400 and the mask part 100R are completely squeezed and cannot be squeezed further by pressurization, according to one embodiment, the main body 410 of the pressurizing structure 400 and the other surface S2 of the mask part 100R can also be separated from each other, but it is not limited to this. As the pressurizing structure 400 and the mask part 100R are squeezed, the main body 410 of the pressurizing structure 400 and the other surface S2 of the mask part 100R can physically abut each other.

[0143] Figure 16 It is a cross-sectional view for explaining a method for manufacturing a deposition mask according to one embodiment. Figures 17 to 19 It will Figure 16 Enlarged cross-sectional view of area D. Figures 16 to 19 The step of solidifying the auxiliary blocking member with the material is shown. Figures 16 to 19 , a process and method for forming the auxiliary blocking component 160 according to an embodiment are described in detail.

[0144] exist Figure 16 , the pressurized structure 400, the mask member 100R, and the magnetic chuck MC can be maintained under pressure and in a squeezed state. As described above, when the protrusion 420 having a shape corresponding to the opening 140R is inserted into the opening 140R including the missing portion 160R and an appropriate amount of the solution 300 is poured into the corresponding opening 140R, the pressurized structure 400, the mask member 100R, and the magnetic chuck MC are completely squeezed, and the solution 300 can move to the space of the missing portion 160R and fill the corresponding space. When the pressurized structure 400, the mask member 100R, and the magnetic chuck MC are squeezed, the solution 300 filling the missing portion 160R can form the auxiliary blocking member 160 by the above-mentioned auxiliary blocking member 160 forming method, and the formed auxiliary blocking member 160 can have the same shape and size as the missing portion 160R. Therefore, the opening 140R including the formed auxiliary blocking member 160 can have the same shape as the opening 140R without the missing portion 160R. As the solution 300 is injected into the auxiliary blocking member 160, the interface 150 can be located between the missing end surface 150R and the auxiliary facing surface (not shown) of the auxiliary blocking member 160. The method of forming the auxiliary blocking member 160 is described in detail below.

[0145] Figures 16 to 19A method for forming the auxiliary blocking member 160 by electroplating according to one embodiment is shown. In one embodiment, the solution 300 introduced into the opening 140R including the missing portion 160R is a metal plating solution 310, which can be a liquid or resin containing metal particles. The metal particles contained in the metal plating solution 310 can be, for example, gold, silver, chromium, zinc, tin, cadmium, nickel, or the like. According to one embodiment, the magnetic chuck MC can be a non-conductive material, and the pressurized structure 400 can be a conductive material. Furthermore, in one embodiment, the portion of the pressurized structure 400 (which is a conductive material) that physically contacts the mask member 100R can be coated with a non-conductive material. The coating layer CL coated with the non-conductive material according to one embodiment can be located on the protrusion 420. In this case, even if a voltage is applied to the pressurized structure 400 and the mask member 100R for metal plating, a short circuit can be prevented at the portion of the pressurized structure 400 and the mask member 100R that physically contacts the mask member 100R.

[0146] In one embodiment, a metal plating voltage may be applied to the mask member 100R and the pressurized structure 400. In this case, a (-) voltage may be applied to the mask member 100R, and a (+) voltage may be applied to the pressurized structure 400, around the missing portion 160R filled with the metal plating solution 310. This allows a current to flow between the mask member 100R and the pressurized structure 400. Because the metal particles contained in the metal plating solution 310 have a (+) voltage, they can move toward the mask member 100R, to which the (-) voltage is applied. The metal particles moving toward the mask member 100R can receive electrons from the mask member 100R and metal-plate the missing end surface 150R of the mask member 100R, thereby forming the auxiliary blocking member 160.

[0147] Reference Figure 18 and Figure 19In the case where the auxiliary blocking part 160 is formed by the electroplating method according to an embodiment, the auxiliary blocking part 160 may include a plurality of sub-auxiliary blocking parts 160a, 160b, and 160c. The auxiliary blocking part 160 according to an embodiment may include a first sub-auxiliary blocking part 160a, a second sub-auxiliary blocking part 160b, and a third sub-auxiliary blocking part 160c. However, this is not limited to this, and there may be more than two sub-auxiliary blocking parts. Although each sub-auxiliary blocking part 160a, 160b, and 160c is formed in the missing portion 160R, it may be smaller than the size of the auxiliary blocking part 160. Moreover, the shape of each sub-auxiliary blocking part 160a, 160b, and 160c may be different from the shape of the auxiliary blocking part 160. Therefore, in order to form an auxiliary blocking part 160 having the same size and shape as the missing portion 160R, more than two metal plating processes may be performed. After performing the metal plating process twice or more, the missing portion 160R can be completely filled with multiple sub-auxiliary blocking components 160a, 160b, and 160c. In this case, the overall shape of the multiple sub-auxiliary blocking components 160a, 160b, and 160c can be substantially the same as the shape of the auxiliary blocking component 160. The metal plating performed after the initial metal plating can use a new metal plating solution 310 instead of the metal plating solution 310 used in the initial metal plating. In the case of using a new metal plating solution 310, the missing portion 160R can be repeatedly filled with multiple sub-auxiliary blocking components 160a, 160b, and 160c. Figures 8 to 15 process.

[0148] The material and composition of the metal plating solution 310 used in the multiple metal plating processes can be different from each other, and the substances forming each sub-auxiliary blocking component 160a, 160b, and 160c can be different from each other. When forming multiple sub-auxiliary blocking components 160a, 160b, and 160c, part or all of each sub-auxiliary blocking component 160a, 160b, and 160c can be formed from the same substance. Furthermore, since the auxiliary blocking component 160 can be formed from the same substance as the main blocking component 130, part or all of the multiple sub-auxiliary blocking components 160a, 160b, and 160c can be formed from the same substance as the main blocking component 130. However, this is not limited to this.

[0149] When a plurality of sub-auxiliary blocking members 160a, 160b, and 160c are formed in the missing portion 160R, there may be two or more interfaces 150 included in the opening portion 140R. The plurality of interfaces 150 (the first boundary 150a and the second boundary 150b) may be formed not only between the mask member 100R and the sub-auxiliary blocking members 160a, 160b, and 160c, but also between adjacent sub-auxiliary blocking members 160a, 160b, and 160c.

[0150] Figure 20 1 is a cross-sectional view for explaining a method for manufacturing a deposition mask according to an embodiment. Figure 20 A process of separating the deposition mask 100 in which the auxiliary blocking member 160 is formed and the missing portion 160R is restored from the magnetic chuck MC and the pressurizing structure 400 and subsequent steps will be described.

[0151] exist Figure 20 , showing the Figure 8 The mask member 100R is formed by restoring the opening 140R and the missing portion 160R by using the auxiliary blocking member 160. Figures 8 to 19 In a case where all the processes are restored with the auxiliary blocking member 160 , the pressurizing structure 400 and the magnetic chuck MC pressed against the mask member 100R may be separated.

[0152] If necessary, it can be cleaned. Figures 13 to 15 In the process of moving the solution 300, the solution 300 may be moved to other parts outside the missing part 160R, and after Figures 16 to 19 In the process of forming the auxiliary blocking member 160, it is possible to perform metal plating on the portion other than the missing portion 160R. In the case where metal plating is performed on the portion other than the missing portion 160R, it can be removed by laser or the like.

[0153] Hereinafter, other embodiments related to the deposition mask 100 and the method for manufacturing the deposition mask 100 will be described. In the following embodiments, descriptions of the same configurations as those of the previously described embodiments will be omitted or simplified, and the description will focus on the differences.

[0154] Figures 21 to 24 1 is a cross-sectional view of a mask member according to another embodiment and a cross-sectional view showing an enlarged portion around a missing portion. Figures 21 to 24 For example, the magnetic chucks MC_21 and MC_23 may be conductive, and the pressurizing structure 400 may be conductive or non-conductive.

[0155] Figure 21 and Figure 22 For example, the magnetic chuck MC_21 coupled to the mask member 100R may be a conductor, and the pressurizing structure 400 may also be a conductor. That is, unlike the first embodiment, the magnetic chuck MC_21 according to another embodiment may be a conductor, thereby varying the configuration of the applied voltage and the coated area.

[0156] In another embodiment, a metal plating voltage may be applied between the pressurizing structure 400 and the mask member 100R, and between the mask member 100R and the magnetic chuck MC_21. Between the pressurizing structure 400 and the mask member 100R, a (+) voltage may be applied to the pressurizing structure 400, and a (-) voltage may be applied to the mask member 100R. Furthermore, between the mask member 100R and the magnetic chuck MC_21, a (+) voltage may be applied to the magnetic chuck MC, and a (-) voltage may be applied to the mask member 100R.

[0157] In another embodiment, since the pressurized structure 400, mask member 100R, and magnetic chuck MC_21 are all electrically conductive, the portions where the pressurized structure 400 and mask member 100R, the mask member 100R and magnetic chuck MC_21, and the pressurized structure 400 and magnetic chuck MC_21 physically contact each other can be coated with a non-conductive material. The coating layer CL_21 can be located on the protrusion 420 and magnetic chuck MC_21. In this case, short circuits caused by physical contact between the pressurized structure 400 and mask member 100R, the mask member 100R and magnetic chuck MC_21, and the pressurized structure 400 and magnetic chuck MC_21 can be prevented.

[0158] Figure 23 and Figure 24 For example, the magnetic chuck MC_23 attached to the mask member 100R can be a conductor, while the pressurizing structure 400_23 can be a non-conductor. Unlike one embodiment, the magnetic chuck MC_23 can be a conductor, while the pressurizing structure 400_23 can be a non-conductor. This allows the location where voltage is applied and the area to be coated to be varied.

[0159] In another embodiment, a voltage may be applied between the mask part 100R and the magnetic chuck MC_23. In this case, a (+) voltage is applied to the magnetic chuck MC_23, and a (-) voltage is applied to the mask part 100R.

[0160] In another embodiment, since the mask member 100R and the magnetic chuck MC_23 are conductive, the portion where the mask member 100R and the magnetic chuck MC_23 physically contact each other can be coated with a non-conductive material. The coating layer CL_21 can be located on the magnetic chuck MC_23. In this case, a short circuit caused by physical contact between the mask member 100R and the magnetic chuck MC_23 can be prevented.

[0161] Figures 25 to 27 is a cross-sectional view of a mask member according to yet another embodiment. Figures 25 to 27The embodiment shows that the solution 300 injected into the opening 140R may not be the metal plating solution 310 including metal particles.

[0162] Figure 25 As an example, the solution 300 introduced into the opening 140R may be an electroless metal plating solution 320. Unlike one embodiment, the electroless metal plating solution 320 may include nickel, copper, or the like. Furthermore, the electroless metal plating solution 320 may include a reducing agent such as formaldehyde or hydrazine. In this case, no voltage may be applied between the pressurized structure 400, the mask member 100R, and the magnetic chuck MC. The reducing agent may supply electrons, reducing metal ions to metal molecules. This reaction may occur at the missing end surface 150R of the mask member 100R. Although not limited to this, when the auxiliary blocking member 160 is formed using an electroless plating process, multiple auxiliary blocking sub-members may be formed. This has already been described in detail, so a repetitive description will be omitted.

[0163] Figure 26 and Figure 27 For example, the solution 300 injected into the opening 140R may be a thermosetting solution 330 or a UV curing solution 340. The thermosetting solution 330 or the UV curing solution 340 may include a thermosetting substance and a UV curing substance, respectively. Unlike one embodiment, when injecting the thermosetting solution 330 or the UV curing solution 340, no voltage may be applied between the pressurized structure 400, the mask part 100R, and the magnetic chuck MC. Therefore, according to another embodiment, the mask part 100R, the pressurized structure 400, and the magnetic chuck MC may not include a coating for preventing short circuits. Moreover, when the auxiliary blocking part 160 is formed using the thermosetting solution 330 or the UV curing solution 340, it can be formed by a single process without repeated execution.

[0164] exist Figure 26As in one embodiment, the pressurized structure 400 and mask member 100R can be heated while being squeezed. Since the thermosetting solution 330 is surrounded by the pressurized structure 400, mask member 100R, and magnetic chuck MC, it may not be directly heated. Therefore, the magnetic chuck MC may be made of a material with high thermal conductivity. In this case, externally supplied heat can be transferred to the thermosetting solution 330 through the magnetic chuck MC, allowing the thermosetting solution 330 to solidify in a state consistent with the size and shape of the missing portion 160R. Furthermore, if the pressurized structure 400, magnetic chuck MC, and mask member 100R are heated and their shapes are altered, the auxiliary blocking member 160 may not be formed to have the same shape as the missing portion 160R. Therefore, the pressurized structure 400, magnetic chuck MC, and mask member 100R may be made of materials whose shapes are not altered by heat. In this case, the thermosetting material may be cured in a state having the same size and shape as the missing portion 160R to form the auxiliary blocking member 160 and repair the missing portion 160R.

[0165] exist Figure 27 As one embodiment, while the pressurized structure 400 and the mask member 100R are squeezed, UV light can be irradiated onto the UV-curable solution 340. Since the UV-curable solution 340 is surrounded by the pressurized structure 400, the magnetic chuck MC, and the mask member 100R, the magnetic chuck MC and / or the pressurized structure 400 can be made of a light-transmitting material when the UV light is irradiated. If the magnetic chuck MC and / or the pressurized structure 400 are made of a light-transmitting material, the UV light can reach the UV-curable solution 340 located within the missing portion 160R. Consequently, the UV-curable solution 340 can be cured in a state having the same size and shape as the missing portion 160R, forming the auxiliary blocking member 160, thereby repairing the missing portion 160R.

[0166] While the embodiments of the present invention have been described above with reference to the accompanying drawings, it will be understood by those skilled in the art that the present invention may be implemented in other specific forms without changing the technical concept or essential technical features of the present invention. Therefore, the embodiments described above should be understood to be illustrative in all respects and not restrictive.

Claims

1. A method for manufacturing a deposition mask, comprising the following steps: supplying a mask member including a main blocking member and a plurality of openings arranged inside the main blocking member; as well as An auxiliary blocking member is formed on the main blocking member around at least a portion of the opening. in, The opening portion includes a normal opening portion and a damaged opening portion, and the step of forming the auxiliary blocking member is a step of forming the auxiliary blocking member on the main blocking member around the damaged opening portion. The step of forming the auxiliary blocking member is a step of forming the damaged opening into the same shape as the normal opening. The step of forming the auxiliary blocking component includes the following steps: placing the mask component on a support table; detecting a missing amount of a damaged portion of the damaged opening; determining the input amount of ink including the auxiliary blocking component material according to the missing amount; supplying ink in an amount corresponding to the missing amount into the damaged opening; pressurizing the damaged opening using a pressurizing structure having the three-dimensional shape of the normal opening and comprising an elastic material so that the supplied ink fills the damaged portion; as well as The auxiliary blocking member is cured with a substance.

2. The method for manufacturing a deposition mask according to claim 1, wherein: The auxiliary blocking component comprises a metal. The step of curing the auxiliary blocking member material is performed through a metal plating process.

3. The method for manufacturing a deposition mask according to claim 1, wherein: The blocking portion including the main blocking component and the auxiliary blocking component includes: one side; another side, facing the one side; an inner side surface exposed toward the opening; a side end portion located at the intersection of the one side and the inner side surface and including a sharp-angled tip shape; and The other end portion is located at the intersection of the other surface and the inner surface, The one end portion of the blocking portion around the damaged opening includes a first end portion including the auxiliary blocking member. The auxiliary blocking component of the first end is arranged on the main blocking component, The auxiliary blocking component at the first end portion includes a plurality of sub-auxiliary blocking components that are distinguished by interfaces. The plurality of auxiliary blocking sub-parts include metal.

4. The method for manufacturing a deposition mask according to claim 3, wherein: The one end portion of the blocking portion around the normal opening includes a second end portion including the main blocking member without the auxiliary blocking member. The shape of the main blocking member at the first end is different from the shape of the main blocking member at the second end. A shape formed by combining the auxiliary blocking member and the main blocking member at the first end portion is the same as a shape of the main blocking member at the second end portion.

5. The method for manufacturing a deposition mask according to claim 3, wherein: The auxiliary blocking component and the main blocking component at the first end portion are in direct contact with each other, forming an interface at a contact surface.

6. The method for manufacturing a deposition mask according to claim 3, wherein: The inner side surface of the blocking portion is formed by the auxiliary inner side surface of the auxiliary blocking member and the main inner side surface of the main blocking member.

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