Wafer carrier device
By setting up main and auxiliary tracks within the reaction chamber and utilizing the synchronous reverse motion of the main and auxiliary stages, the problem of reaction chamber tilting caused by high-speed operation of the wafer stage was solved, thus improving the stability and yield of the equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CHANGXIN MEMORY TECH INC
- Filing Date
- 2019-12-04
- Publication Date
- 2026-07-03
AI Technical Summary
In existing technologies, the high-speed operation of the wafer stage causes the reaction chamber to tilt too much, which can damage the equipment and may trigger the infrared sensor, causing the equipment to shut down. The adjustment process is time-consuming and affects the equipment's output.
A main track and an auxiliary track are set up inside the reaction chamber. The main stage and the auxiliary stage move synchronously in opposite directions. The auxiliary stage counteracts the inertial force of the main stage, keeping the reaction chamber horizontal.
This effectively avoids excessive tilting of the reaction chamber, reduces equipment damage and downtime, and improves the operational stability and output of the equipment.
Smart Images
Figure CN112908925B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of semiconductor manufacturing, and more particularly to a wafer carrier device. Background Technology
[0002] Typically, when wafers undergo epitaxial growth or exposure processes within a reaction chamber, they are required to rotate horizontally at high speed within the chamber, driven by a wafer stage. The high-speed operation of the wafer stage causes tilting and shaking within the reaction chamber, necessitating adjustments to ensure the wafer can rotate horizontally.
[0003] Currently, some equipment uses air switches to level the reaction chamber. The disadvantages are that if the wafer stage moves too much, the reaction chamber will tilt even more, which can damage the air switch and cylinders. Furthermore, excessive tilting of the reaction chamber can trigger the equipment's infrared sensor, causing the equipment to shut down. If the infrared sensor is triggered and causes a shutdown, its position must be adjusted to restart the equipment. However, adjusting the infrared sensor's position is difficult and can take 3 hours or longer, severely impacting the equipment's throughput.
[0004] Therefore, how to avoid excessive tilting of the reaction chamber has become an urgent problem to be solved. Summary of the Invention
[0005] The technical problem to be solved by the present invention is to provide a wafer carrier device that can prevent the reaction chamber from tilting too much and maintain the reaction chamber horizontally.
[0006] To address the aforementioned problems, this invention provides a wafer carrier device disposed within a reaction chamber. The reaction chamber contains a main track and an auxiliary track, with the auxiliary track positioned below the main track. The wafer carrier device includes: a main stage slidably mounted on the main track, capable of movement in one or more directions; an auxiliary stage positioned below the main stage and slidably mounted on the auxiliary track, capable of movement in one or more directions opposite to the main stage's movement direction; a controller for detecting the main stage's movement direction and controlling the auxiliary stage's movement direction based on the main stage's movement direction; and a carrier platform for carrying the wafer, disposed on the main stage and rotatably connected to it. When the carrier platform rotates, causing the main stage to move, the auxiliary stage moves synchronously in the opposite direction to the main stage to level the reaction chamber.
[0007] Furthermore, the main track is parallel to the auxiliary track.
[0008] Furthermore, both the main track and the auxiliary track consist of two parallel tracks.
[0009] Furthermore, the main platform and the support platform share a first center, and the auxiliary platform has a second center, with the first center and the second center on the same straight line.
[0010] Furthermore, the movement stroke of the auxiliary platform is the same as that of the main platform.
[0011] Furthermore, the movement speed of the auxiliary platform is the same as that of the main platform.
[0012] Furthermore, the sum of the weight of the main platform and the weight of the supporting platform is equal to the weight of the auxiliary platform.
[0013] Furthermore, the main platform includes: a first sliding block disposed on the main track and capable of moving along the main track in a first direction, the top surface of the first sliding block having a first sliding track, the extension direction of the first sliding track being different from the extension direction of the main track; a second sliding block disposed on the first sliding track and capable of moving along the first sliding track in a second direction, the first direction being different from the second direction, and the platform being rotatably disposed on the second sliding block.
[0014] Furthermore, the first direction is perpendicular to the second direction.
[0015] Furthermore, the bottom surface of the first sliding block has a first groove, which cooperates with the main track to enable the first sliding block to move along the main track in the first direction.
[0016] Furthermore, the bottom surface of the second sliding block has a second sliding groove, which cooperates with the first sliding track to enable the second sliding block to move along the first sliding track in a second direction.
[0017] Furthermore, the auxiliary platform includes: a third sliding block disposed on the auxiliary track and capable of moving along the auxiliary track in the first direction or the second direction, the top surface of the third sliding block having a second sliding track, the extension direction of the second sliding track being different from the extension direction of the auxiliary track; and a fourth sliding block disposed on the second sliding track and capable of moving along the second sliding track in the second direction or the first direction.
[0018] Furthermore, the bottom surface of the third sliding block has a third sliding groove, which cooperates with the auxiliary track to enable the third sliding block to move along the auxiliary track in the first direction or the second direction.
[0019] Furthermore, the bottom surface of the fourth sliding block has a fourth sliding groove, and the third sliding groove cooperates with the second sliding track so that the fourth sliding block can move along the second sliding track in the second direction or the first direction.
[0020] Furthermore, the first sliding block and the third sliding block have the same weight, and the sum of the weight of the second sliding block and the weight of the support platform is the same as the weight of the third sliding block.
[0021] The advantage of this invention is that a main stage and an auxiliary stage are provided in the reaction chamber. The auxiliary stage moves synchronously and in the opposite direction to the main stage. The auxiliary stage does not carry the wafer; it only counteracts the inertial force exerted on the reaction chamber by the main stage, thereby preventing the reaction chamber from tilting too much and maintaining the horizontal position of the reaction chamber. Attached Figure Description
[0022] Figure 1 This is a schematic diagram of a specific embodiment of the wafer carrier device of the present invention;
[0023] Figure 2 This is a schematic diagram of the wafer carrier device of the present invention installed in the reaction chamber;
[0024] Figure 3 and Figure 4 This is a schematic diagram of the wafer carrier device of the present invention in one working state, wherein Figure 3 This is a top view. Figure 4 This is a side view. Detailed Implementation
[0025] The specific embodiments of the wafer carrier device provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0026] Figure 1 This is a schematic diagram of a specific embodiment of the wafer carrier device of the present invention. Figure 2 This is a schematic diagram of the wafer carrier device of the present invention installed in the reaction chamber.
[0027] Please see Figure 1 and Figure 2 The wafer carrier device 1 of the present invention is disposed in the reaction chamber 2. A main track 10 and an auxiliary track 11 are disposed within the reaction chamber 2.
[0028] The main track 10 is fixed relative to the reaction chamber 2 by means of a support mechanism or other components. Specifically, the main track 10 is along a first direction (e.g., Figure 1 Extending in the X direction.
[0029] The auxiliary track 11 is disposed below the main track 10. The auxiliary track 11 is independent of the main track 10. The auxiliary track 11 is fixed relative to the reaction chamber 2 by means of a support mechanism or other components. In this specific embodiment, the auxiliary track 11 is along the first direction (e.g., Figure 1 (Extends in the X direction).
[0030] In this specific embodiment, the auxiliary track 11 is located directly below the main track 10, and the auxiliary track 11 is parallel to the main track 10, so as to facilitate the leveling of the reaction chamber by the auxiliary platform 13. Furthermore, both the main track 10 and the auxiliary track 11 consist of two parallel tracks. The two tracks of the main track 10 and the two tracks of the auxiliary track 11 are parallel and symmetrically arranged. In other specific embodiments of the present invention, the extending direction of the auxiliary track 11 may also be perpendicular to the extending direction of the main track 10.
[0031] The wafer carrier device 1 includes a main stage 12, an auxiliary stage 13, a controller (not shown in the figure) and a carrier stage 14.
[0032] The main platform 12 is slidably mounted on the main track 10, and the main platform 12 is capable of moving in one or more directions.
[0033] In this specific embodiment, the main platform 12 includes a first sliding block 121 and a second sliding block 122. The first sliding block 121 is disposed below the second sliding block 122, and the two have different directions of movement.
[0034] The first sliding block 121 is disposed on the main track 10 and is capable of moving along the main track 10 in a first direction (e.g., Figure 1 The first sliding block 121 has a first sliding track 123 on its top surface. The extension direction of the first sliding track 123 is different from the extension direction of the main track 10, including but not limited to being perpendicular or forming an acute angle. In this specific embodiment, the extension direction of the main track 10 is the X direction, and the extension direction of the first sliding track 123 is perpendicular to the extension direction of the main track 10, so the extension direction of the first sliding track 123 is the Y direction.
[0035] Furthermore, a first groove 124 is provided on the bottom surface of the first sliding block 121. The first groove 124 cooperates with the main track 10 so that the first sliding block 121 can move along the main track 10 in the first direction (e.g., Figure 1The first sliding block 121 moves along the X direction. Specifically, the main track 10 engages with the first groove 124, allowing the first sliding block 121 to move along the main track 10 without disengaging from it. In other embodiments of the invention, other methods can be used to achieve relative sliding between the first sliding block 121 and the main track 10. For example, a groove can be provided on the main track 10, and a protrusion can be provided on the bottom surface of the first sliding block 121. The protrusion cooperates with the groove to achieve the purpose of the first sliding block 121 moving along the main track 10 in the first direction.
[0036] The second sliding block 122 is disposed on the first sliding track 123 and is capable of moving along the first sliding track 123 in a second direction (e.g., Figure 1 (As shown in the Y direction) movement. Specifically, in this embodiment, the bottom surface of the second sliding block 122 has a second groove 125, which cooperates with the first sliding track 123 to enable the second sliding block 122 to move along the first sliding track 123 in the second direction. In other embodiments of the present invention, other methods can also be used to achieve relative sliding between the second sliding block 122 and the first sliding track 123. For example, a groove can be provided on the first sliding track 123, and a protrusion can be provided on the bottom surface of the second sliding block 122. The protrusion cooperates with the groove to achieve the purpose of the second sliding block 122 moving along the first sliding track 123 in the second direction.
[0037] The auxiliary platform 13 is disposed below the main platform 12 and is slidably mounted on the auxiliary track 11. The auxiliary platform 13 is capable of moving in one or more directions. The direction of movement of the auxiliary platform 13 is opposite to the direction of movement of the main platform. For example, if the main platform 12 moves in the positive X direction, then the auxiliary platform 13 moves in the negative X direction.
[0038] In this specific embodiment, the auxiliary platform 13 includes a third sliding block 131 and a fourth sliding block 132.
[0039] The third sliding block 131 is disposed on the auxiliary track 11 and can move along the auxiliary track 11 in either the first or second direction. In this specific embodiment, the auxiliary track 11 is parallel to the main track 10, so the movement direction of the third sliding block 131 is synchronous with and opposite to the movement direction of the first sliding block 121, that is, the third sliding block 131 moves towards the first direction (e.g., ...). Figure 1The third sliding block 131 moves in the X direction (as shown), but in the opposite direction to the movement of the first sliding block 121. For example, if the first sliding block 121 moves in the negative X direction, then the third sliding block 131 moves in the positive X direction; if the first sliding block 121 moves in the positive X direction, then the third sliding block 131 moves in the negative X direction.
[0040] In other specific embodiments of the present invention, when the auxiliary track 11 is perpendicular to the main track 10, the movement direction of the third sliding block 131 is perpendicular to the movement direction of the first sliding block 121, that is, the third sliding block 131 moves towards the second direction (e.g., Figure 1 (Movement in the Y direction as shown).
[0041] The top surface of the third sliding block 131 has a second sliding track 133. The extending direction of the second sliding track 133 is different from the extending direction of the auxiliary track 11, including but not limited to being perpendicular or forming an acute angle. In this specific embodiment, the extending direction of the auxiliary track 11 is the X direction, and the extending direction of the second sliding track 133 is perpendicular to the extending direction of the auxiliary track 11, so the extending direction of the second sliding track 133 is the Y direction.
[0042] Furthermore, the bottom surface of the third sliding block 131 has a third sliding groove 134, which cooperates with the auxiliary track 11 to allow the third sliding block 131 to move along the auxiliary track 11 in the first direction (e.g., Figure 1 The movement is in the X direction. Specifically, the auxiliary track 11 engages with the third groove 134, allowing the third sliding block 131 to move along the auxiliary track 11 without disengaging from it. In other embodiments of the invention, other methods can be used to achieve relative sliding between the third sliding block 131 and the auxiliary track 11. For example, a groove can be provided on the auxiliary track 11, and a protrusion can be provided on the bottom surface of the third sliding block 131. The protrusion cooperates with the groove to achieve the purpose of the third sliding block 131 moving along the auxiliary track 11 in the first direction.
[0043] The fourth sliding block 132 is disposed on the second sliding track 133 and is capable of moving along the second sliding track 133 in the second direction or the first direction. The direction of movement of the fourth sliding block 132 is different from the direction of movement of the third sliding block 131. Specifically, when the third sliding block 131 moves in the first direction, the fourth sliding block 132 moves in the second direction; when the third sliding block 131 moves in the second direction, the fourth sliding block 132 moves in the first direction.
[0044] In this specific embodiment, the movement direction of the fourth sliding block 132 is synchronous with and opposite to the movement direction of the second sliding block 122. For example, if the second sliding block 122 moves in the positive direction of the Y direction, then the fourth sliding block 132 moves in the negative direction of the Y direction; if the second sliding block 122 moves in the negative direction of the Y direction, then the fourth sliding block 132 moves in the positive direction of the Y direction.
[0045] In this specific embodiment, the bottom surface of the fourth sliding block 132 has a fourth sliding groove 135, which cooperates with the second sliding track 133 to enable the fourth sliding block 132 to move along the second sliding track 133 in a second direction. In other specific embodiments of the present invention, other methods can also be used to achieve the relative sliding between the fourth sliding block 132 and the second sliding track 133. For example, a groove can be provided on the second sliding track 133, and a protrusion can be provided on the bottom surface of the fourth sliding block 132. The protrusion cooperates with the groove to achieve the purpose of the fourth sliding block 132 moving along the second sliding track 133 in the second direction.
[0046] The controller is used to detect the movement direction of the main platform 12 and control the movement direction of the auxiliary platform 13 according to the movement direction of the main platform 12. The controller can detect the movement direction of the main platform 12 through sensors or other devices.
[0047] The support stage 14 is used to support the wafer (not shown in the accompanying drawings). The support stage 14 is disposed on the main support stage 12 and is rotatably connected to the main support stage 12. Specifically, in this embodiment, the support stage 14 is disposed on the second sliding block 122 and is rotatably connected to the second sliding block 122.
[0048] When the support platform 14 rotates at high speed, it drives the main platform 12 to move along the X and Y directions. If the auxiliary platform 13 is not provided, the reaction chamber 2 will oscillate significantly with the movement of the main platform 12. If the auxiliary platform 13 is provided, it moves synchronously and in the opposite direction to the main platform 12. The auxiliary platform 13 can counteract the inertial force of the main platform 12 during high-speed movement, reducing the amplitude of the reaction chamber 2's movement and maintaining it at a stable horizontal position, thus leveling the reaction chamber 2.
[0049] The synchronous reverse movement of the auxiliary platform 13 and the main platform 12 means that when the main platform 12 moves in the positive X direction, the auxiliary platform 13 will simultaneously move in the negative X direction; conversely, when the main platform 12 moves in the positive Y direction, the auxiliary platform 13 will simultaneously move in the negative Y direction. It is understood that the main platform 12 may simultaneously exhibit movement in both the X and Y directions, and the auxiliary platform 13 will also exhibit corresponding movement.
[0050] Furthermore, the main platform 12 and the support platform 14 share a first center, and the auxiliary platform 13 has a second center. The first center and the second center are on the same straight line to further ensure that the auxiliary platform 13 can counteract the inertial force generated by the main platform 12. The first center is the geometric center of the structure formed by the main platform 12 and the support platform 14, and the second center is the geometric center of the auxiliary platform 13. Specifically, in this embodiment, the first sliding block 121, the second sliding block 122, and the support platform 14 are integrated as a whole, which has the first center; the third sliding block 131 and the fourth sliding block 132 are integrated as a whole, which has the second center; and the first center and the second center are on the same vertical line.
[0051] Furthermore, the auxiliary platform 13 has the same travel distance as the main platform 12 to further ensure that the auxiliary platform 13 can counteract the inertial force generated by the main platform 12. Specifically, in this embodiment, if the main platform 12 moves a distance in one direction (e.g., the positive X direction), the auxiliary platform moves the same distance in the opposite direction (e.g., the negative X direction).
[0052] Furthermore, the auxiliary platform 13 moves at the same speed as the main platform 12 to further ensure that the auxiliary platform 13 can counteract the inertial force generated by the main platform 12. The same speed means that they move at the same speed in opposite directions. For example, if the main platform 12 has a speed in the positive X direction, then the auxiliary platform has the same speed in the negative X direction.
[0053] Furthermore, the sum of the weights of the main platform 12 and the support platform 14 is equal to the weight of the auxiliary platform 13, to further ensure that the auxiliary platform 13 can counteract the inertial force generated by the main platform 12. Specifically, in this embodiment, the first sliding block 121 and the third sliding block 131 have the same weight, and the sum of the weights of the second sliding block 122 and the support platform 14 is equal to the weight of the fourth sliding block 132.
[0054] Figure 3 and Figure 4 This is a schematic diagram of the wafer carrier device of the present invention in one working state, wherein Figure 3 This is a top view. Figure 4 This is a side view. Please refer to [link / reference]. Figure 3 and Figure 4 When the support platform 14 rotates and drives the main support platform 12 to move to the left side of the reaction chamber 2, the main support platform 12 exerts an inertial force to the left on the reaction chamber 2, and the reaction chamber 2 will inevitably tilt to the left. At this time, the auxiliary support platform 13 moves to the right side of the reaction chamber 2, and the auxiliary support platform 13 exerts an inertial force to the right on the reaction chamber 2. The two inertial forces cancel each other out, and the reaction chamber 2 remains horizontal.
[0055] The above description is only a preferred embodiment of the present invention. It should be noted that those skilled in the art can make several improvements and modifications without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.
Claims
1. A wafer carrier device, disposed in a reaction chamber, wherein a main track and an auxiliary track are disposed within the reaction chamber, and the auxiliary track is disposed below the main track, characterized in that, The wafer carrier includes: The main platform is slidably mounted on the main track and is capable of moving in one or more directions; An auxiliary platform is disposed below the main platform and is slidably disposed on the auxiliary track. The auxiliary platform is capable of moving in one or more directions, and the direction of movement of the auxiliary platform is opposite to the direction of movement of the main platform. The controller is used to detect the movement direction of the main platform and control the movement direction of the auxiliary platform according to the movement direction of the main platform; A support stage is used to support the wafer. The support stage is disposed on the main support stage and is rotatably connected to the main support stage. When the support stage rotates and drives the main support stage to move, the auxiliary stage moves synchronously in the opposite direction to the main support stage to level the reaction chamber.
2. The wafer carrier device according to claim 1, characterized in that, The main track is parallel to the auxiliary track.
3. The wafer carrier device according to claim 1, characterized in that, Both the main track and the auxiliary track consist of two parallel tracks.
4. The wafer carrier device according to claim 1, characterized in that, The main platform and the support platform share a first center, and the auxiliary platform has a second center. The first center and the second center are on the same straight line.
5. The wafer carrier device according to claim 1, characterized in that, The movement stroke of the auxiliary platform is the same as that of the main platform.
6. The wafer carrier device according to claim 1, characterized in that, The movement speed of the auxiliary platform is the same as that of the main platform.
7. The wafer carrier device according to claim 1, characterized in that, The sum of the weight of the main platform and the weight of the supporting platform is equal to the weight of the auxiliary platform.
8. The wafer carrier device according to any one of claims 1 to 7, characterized in that, The main platform includes: A first sliding block is disposed on the main track and is capable of moving along the main track in a first direction. The top surface of the first sliding block has a first sliding track, and the extension direction of the first sliding track is different from the extension direction of the main track. The second sliding block is disposed on the first sliding track and can move along the first sliding track in a second direction, the first direction being different from the second direction. The support platform is rotatably disposed on the second sliding block.
9. The wafer carrier device according to claim 8, characterized in that, The first direction is perpendicular to the second direction.
10. The wafer carrier device according to claim 8, characterized in that, The bottom surface of the first sliding block has a first groove, which cooperates with the main track to enable the first sliding block to move along the main track in the first direction.
11. The wafer carrier device according to claim 8, characterized in that, The bottom surface of the second sliding block has a second sliding groove, which cooperates with the first sliding track to enable the second sliding block to move along the first sliding track in a second direction.
12. The wafer carrier device according to claim 8, characterized in that, The auxiliary platform includes: A third sliding block is disposed on the auxiliary track and is capable of moving along the auxiliary track in the first direction or the second direction. The top surface of the third sliding block has a second sliding track, and the extension direction of the second sliding track is different from the extension direction of the auxiliary track. The fourth sliding block is disposed on the second sliding track and is capable of moving along the second sliding track in the second direction or the first direction.
13. The wafer carrier device according to claim 12, characterized in that, The bottom surface of the third sliding block has a third sliding groove, which cooperates with the auxiliary track to enable the third sliding block to move along the auxiliary track in the first direction or the second direction.
14. The wafer carrier device according to claim 13, characterized in that, The bottom surface of the fourth sliding block has a fourth sliding groove, and the third sliding groove cooperates with the second sliding track so that the fourth sliding block can move along the second sliding track in the second direction or the first direction.
15. The wafer carrier device according to claim 12, characterized in that, The first sliding block and the third sliding block have the same weight, and the sum of the weight of the second sliding block and the weight of the support platform is the same as the weight of the third sliding block.