An electrochromic aperture, a preparation method thereof and a lens module containing the same

Abstract

The present invention provides an electrochromic aperture, a preparation method thereof, and a lens module including the same, wherein the voltage at which the electrochromic aperture starts to brighten gradually increases from the inside to the outside, or the voltage at which the electrochromic aperture starts to darken gradually decreases from the inside to the outside. The present invention can ensure multi-level control of the aperture while avoiding the problem of light leakage or opacity caused by etching grooves through the design of the aperture structure. By further setting the thickness of the electrochromic layer to gradually increase from the inside to the outside, the aperture can have different color change ranges from the inside to the outside, thereby achieving greater differences in aperture level adjustment. By selecting the materials of each layer of the aperture, the obtained aperture can have the characteristics of flexibility and bendability, so that the aperture can be designed as a curved surface structure, combined with an achromatic lens, and the lens module can be thinned.

Description

[0001] This invention patent application is a divisional application based on a Chinese patent application with an application date of November 29, 2019, an invention name of “An electrochromic aperture, a preparation method thereof and a lens module comprising the same” and an application number of 201911205739.5. Technical Field

[0002] The present invention belongs to the technical field of color-changing apertures, and in particular relates to an electrochromic aperture, a preparation method thereof, and a lens module comprising the same. Background Art

[0003] With the technological development of mobile terminals such as mobile phones and tablet computers, most mobile terminals are equipped with lens modules. Lens modules can be divided into two types: fixed aperture type and adjustable aperture type. Lens modules with adjustable aperture are usually mechanical apertures, which require the installation of aperture adjustment devices with more complex structures, resulting in a larger lens module size and higher requirements for the manufacturing and assembly processes. Lens modules with fixed apertures have the advantage of simple structure. Mobile terminals usually use lens modules with fixed apertures due to size limitations. However, the light transmittance of lens modules with fixed apertures is fixed, which has a very bad effect on the clarity of photos taken under strong light and weak light, and it is impossible to effectively control the depth of field, and the background blur effect cannot be achieved.

[0004] CN 104903788A discloses an electro-optical aperture, comprising a stack of a front transparent conductor medium, an electrolyte medium, an active electrochromic medium and a rear transparent conductor medium, wherein the front transparent conductor medium and the rear transparent conductor medium are directly connected to each other through a conductive section located in an imaging path. CN 108519657A discloses a lens module and a mobile terminal, wherein the lens module comprises a voltage applying element, the voltage applying element is electrically connected to an electrochromic film, and the electrochromic film comprises a first light-transmitting conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer and a second light-transmitting conductive layer sequentially arranged on a light-transmitting substrate. The above-mentioned electro-optical aperture or electrochromic film can realize a change in transmittance according to different applied electric fields, thereby realizing the adjustment of the luminous flux; and its thickness is small, and the Z-axis height of the lens module will not be significantly increased, and it is suitable for use in a camera module of a portable consumer electronic device.

[0005] However, existing electrochromic apertures still have many defects. For example, for an aperture that can be adjusted in multiple levels, its conductive layer is usually etched with grooves, which will cause the electrochromic layer or ion storage layer coated on the conductive layer to be uneven and the aperture to change color unevenly; the groove area is a non-color-changing area, which will cause light leakage or opacity, thereby affecting the imaging quality; the color change range of the aperture from the inside to the outside is the same, and the difference in the number of adjustable levels of the aperture is not obvious; the aperture is relatively thick, which limits its application in camera modules of portable consumer electronic devices, etc., which need to be further resolved. Summary of the invention

[0006] In view of the shortcomings of the prior art, the purpose of the present invention is to provide an electrochromic aperture, a preparation method thereof and a lens module containing the same. The preparation method provided by the present invention can ensure that the aperture can achieve multi-level regulation while effectively avoiding problems such as uneven discoloration caused by traditional etching methods. The electrochromic apertures of different structures provided by the present invention can achieve multi-level regulation of the aperture while avoiding light leakage or opacity caused by etching grooves, or achieve greater differences in aperture level adjustment. The electrochromic aperture with a curved surface structure can be combined with an achromatic lens combination to thin the lens module.

[0007] To achieve this object, the present invention adopts the following technical solutions:

[0008] The existing electrochromic aperture usually has an annular groove etched in the transparent conductive layer, which is divided into multiple areas from the inside to the outside. Each area can be independently controlled by applying voltage to achieve multi-level regulation of the electrochromic aperture; the ion storage layer and the electrochromic layer are coated after the transparent conductive layer is etched. However, this will cause the ion storage layer and the electrochromic layer to be uneven at the groove, and the aperture will change color unevenly, affecting the imaging quality. It should be noted that "from the inside to the outside" in the present invention refers to the radial direction from the center to the edge of the membrane layer.

[0009] To solve this problem, the present invention proposes a first preparation method, which performs etching after the ion storage layer and the electrochromic layer are coated. Therefore, while ensuring that the aperture can achieve multi-level regulation, it effectively avoids problems such as uneven discoloration caused by traditional etching methods.

[0010] In a first aspect, the present invention provides a method for preparing an electrochromic aperture, the method comprising the following steps:

[0011] (1) forming a first transparent conductive layer on a first transparent substrate, and forming a second transparent conductive layer on a second transparent substrate;

[0012] (2) forming an ion storage layer on the first transparent conductive layer, and forming an electrochromic layer on the second transparent conductive layer;

[0013] (3) etching a plurality of annular grooves centered on the central axis of the electrochromic aperture on the ion storage layer and the first transparent conductive layer, and / or on the electrochromic layer and the second transparent conductive layer;

[0014] (4) Compounding the ion storage layer and the electrochromic layer with an ion transfer layer, wherein the ion transfer layer is disposed between the ion storage layer and the electrochromic layer, to obtain the electrochromic aperture;

[0015] Alternatively, the method comprises the following steps: (1) forming a first transparent conductive layer on a first transparent substrate and forming a second transparent conductive layer on a second transparent substrate;

[0016] (2) forming an ion storage layer on the first transparent conductive layer, and forming an electrochromic layer on the second transparent conductive layer;

[0017] (3) compounding the ion storage layer and the electrochromic layer with an ion transfer layer, wherein the ion transfer layer is disposed between the ion storage layer and the electrochromic layer;

[0018] (4) etching from the first transparent substrate side to etch a plurality of annular grooves centered on the central axis of the electrochromic aperture on the first transparent substrate and the first transparent conductive layer, or on the first transparent substrate, the first transparent conductive layer and the ion storage layer;

[0019] And / or etching is performed from the second transparent substrate side to etch a plurality of annular grooves centered on the central axis of the electrochromic aperture on the second transparent substrate and the second transparent conductive layer, or on the second transparent substrate, the second transparent conductive layer and the electrochromic layer.

[0020] The present invention has no particular limitation on the etching method. For example, laser etching may be used.

[0021] In a second aspect, the present invention provides an electrochromic aperture, which is prepared by the preparation method described in the first aspect. The structure of the electrochromic aperture includes a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate stacked in sequence;

[0022] Wherein, in one embodiment of the present invention, a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the first transparent conductive layer and the ion storage layer;

[0023] In one embodiment of the present invention, a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the second transparent conductive layer and the electrochromic layer;

[0024] In one embodiment of the present invention, a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the first transparent substrate and the first transparent conductive layer;

[0025] In one embodiment of the present invention, a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the second transparent substrate and the second transparent conductive layer;

[0026] In one embodiment of the present invention, a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the first transparent substrate, the first transparent conductive layer and the ion storage layer;

[0027] In one embodiment of the present invention, a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the second transparent substrate, the second transparent conductive layer and the electrochromic layer.

[0028] Although the preparation method described in the first aspect effectively avoids the problems of color change uniformity caused by the traditional etching method, the method of etching grooves will produce non-color change areas in the groove area while realizing the multi-level color change of the electrochromic aperture, resulting in light leakage or opacity, thereby affecting the imaging quality. Therefore, further improvement is still needed.

[0029] To solve this problem, the present invention proposes the following third aspect of the electrochromic aperture. Since the projections of the electrochromic layers in different electrochromic units of the electrochromic aperture along the central axis direction of the electrochromic aperture are seamlessly connected, and the color change processes of different electrochromic units can be independently controlled, while realizing multi-level regulation of the aperture, the problem of light leakage or opacity caused by etching grooves is avoided.

[0030] In a third aspect, the present invention provides an electrochromic aperture, the electrochromic aperture comprising at least two stacked and mutually independent electrochromic units, the electrochromic unit comprising a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer and a second transparent conductive layer stacked in sequence; adjacent electrochromic units are separated by a transparent substrate;

[0031] The shape of the electrochromic layer and the ion storage layer is a circle or annular shape centered on the central axis of the electrochromic aperture, and the ion storage layer and the electrochromic layer in the same electrochromic unit are aligned with each other, and the projections of the electrochromic layers in different electrochromic units along the central axis direction of the electrochromic aperture do not overlap and the boundaries are aligned with each other.

[0032] It should be noted that, the “ion storage layer and the electrochromic layer in the same electrochromic unit are aligned with each other” in the present invention means that in the same electrochromic unit, the projections of the ion storage layer and the electrochromic layer along the central axis direction of the electrochromic aperture overlap with each other.

[0033] The present invention has no particular limitation on the method for preparing the ion storage layer and the electrochromic layer of the above-mentioned shape. Exemplarily, the following two methods can be cited:

[0034] 1. First, a hollowed-out annular shielding substrate is used to cover the transparent conductive layer, and an electrochromic layer or an ion storage layer is coated on the transparent conductive layer. After removing the shielding substrate, a ring-shaped electrochromic layer or an ion storage layer can be obtained.

[0035] 2. On the transparent conductive layer coated with the electrochromic layer or the ion storage layer, a ring-shaped electrochromic layer or the ion storage layer is formed by laser etching, chemical corrosion or physical wiping.

[0036] In order to solve the problem of light leakage or opacity caused by etching grooves, the present invention proposes the following fourth aspect of the electrochromic aperture. Taking the electrochromic aperture as an example, which is divided into three areas from the inside to the outside, and the voltages at which it starts to brighten are 0.4, 0.8, and 1.2V, respectively, when the voltage is between 0.4-0.8V, only the innermost area starts to brighten; when the voltage is between 0.8-1.2V, the innermost and middle areas start to brighten; when the voltage is greater than 1.2V, the innermost, middle, and outermost areas all start to brighten. When the voltage at which the aperture starts to darken gradually decreases from the inside to the outside, applying a reverse voltage can make the outer ring of the aperture darker than the inner ring. Since the areas of the aperture from the inside to the outside are continuous, while realizing multi-level regulation of the aperture, the problem of light leakage or opacity caused by etching grooves is avoided.

[0037] In a fourth aspect, the present invention provides an electrochromic aperture, comprising a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate stacked in sequence;

[0038] The voltage at which the electrochromic aperture starts to brighten gradually increases from the inside to the outside, or the voltage at which the electrochromic aperture starts to darken gradually decreases from the inside to the outside.

[0039] In the present invention, there is no particular limitation on the method for achieving “the voltage at which the electrochromic aperture starts to brighten gradually increases from the inside to the outside or the voltage at which the electrochromic aperture starts to darken gradually decreases from the inside to the outside”. For example, the following two methods can be cited:

[0040] 1. Before the ion transfer layer is UV-cured, different areas are shielded with materials with different UV transmittances, so that the degree of cross-linking of the ion transfer layer gradually increases from the inside to the outside;

[0041] 2. Coat the transparent conductive layer with electrochromic materials having different voltages for starting to brighten or darken, ensuring that the voltage for the electrochromic material to start to brighten gradually increases or the voltage for the electrochromic material to start to darken gradually decreases from the inside to the outside.

[0042] In order to solve the problem of light leakage or opacity caused by etching grooves, the present invention proposes the following fifth aspect of the electrochromic aperture. By using the electrochromic aperture described in the fifth aspect and applying a high voltage to its center and a low voltage to its edge, the voltage on the aperture can be gradually reduced from the inside to the outside. Since there are no grooves etched on the aperture, and the transmittance of any point on the aperture is related to the voltage at that point, when the voltage of the aperture gradually decreases from the inside to the outside, its transmittance will gradually decrease from the inside to the outside. By changing the voltage, the change control of the different transmittances of the aperture can be achieved, thereby achieving multi-level regulation of the aperture while avoiding the problem of light leakage or opacity caused by etching grooves.

[0043] In a fifth aspect, the present invention provides an electrochromic aperture, comprising a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate stacked in sequence;

[0044] The material of the electrochromic aperture is the same from the inside to the outside, and there is no groove on the electrochromic aperture.

[0045] In a sixth aspect, the present invention provides a method for multi-level regulation of the electrochromic aperture described in the fifth aspect, wherein the method uses the electrochromic aperture described in the fifth aspect, applies different voltages at the center and edge of the electrochromic aperture, and the voltage at the center is greater than the voltage at the edge, to achieve multi-level regulation.

[0046] It should be noted that the voltage applied to the aperture in the present invention refers to the potential difference between the electrochromic layer and the ion storage layer. When the potential difference is positive, the applied voltage is a positive voltage, and when the potential difference is negative, the applied voltage is a negative voltage. The "voltage at the center is greater than the voltage at the edge" means that the voltage value at the center is greater than the voltage value at the edge, for example, the center may be a positive voltage and the edge may be a negative voltage; or both the center and the edge may be positive voltages, and the absolute value of the voltage at the center may be greater than the absolute value of the voltage at the edge; or both the center and the edge may be negative voltages, and the absolute value of the voltage at the center may be less than the absolute value of the voltage at the edge.

[0047] The excessive thickness of the aperture has always been the reason that limits the application of the aperture in the camera module of portable consumer electronic devices. The electrochromic aperture provided in the seventh and eighth aspects of the present invention can be made flexible and bendable by selecting the materials of each layer. The aperture can be designed as a curved surface structure with the same curvature as the convex lens or concave lens in the achromatic lens combination, and the aperture can be attached to the surface of the concave lens or convex lens of the achromatic lens combination, thereby realizing the merging of the aperture and the lens in the lens module, and further thinning the lens module. Alternatively, the aperture can also be designed as a structure with the same shape as the concave lens or convex lens in the achromatic lens combination, thereby replacing the concave lens or convex lens, realizing the merging of the aperture and the lens in the lens module, and further thinning the lens module. Since the refractive index of the electrochromic aperture changes very little during the color change process, it will not affect the achromatic function.

[0048] In a seventh aspect, the present invention provides an electrochromic aperture, comprising a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate stacked in sequence;

[0049] The electrochromic aperture is a curved surface structure, and the curvature is the same as the curvature of the surface of the concave lens or the convex lens in the achromatic lens combination.

[0050] In an eighth aspect, the present invention provides an electrochromic aperture, comprising a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate stacked in sequence;

[0051] The shape of the electrochromic aperture is the same as the shape of the concave lens or the convex lens in the achromatic lens combination.

[0052] The existing electrochromic aperture is basically a two-level regulation, that is, there are only two aperture levels of change. Even if it can achieve three levels, if the color change range of the three rings is consistent (assuming that the color change range of each ring is 20-90%), then the overall transmittance of its minimum pupil is still large, which will not only affect the imaging effect, but also the difference in the adjustable levels of the aperture is not obvious, that is, the ratio of the maximum pupil transmittance to the minimum pupil transmittance is small, which needs to be improved.

[0053] To address this problem, the present invention proposes the following ninth aspect of the electrochromic aperture. By changing the thickness of the electrochromic layer in different regions, the color change range of each region is changed (for example, the electrochromic layer is divided into three regions from the inside to the outside, and the color change range of each region is 20-90%, 10-80%, and 5-70% respectively), the ratio of the maximum pupil transmittance to the minimum pupil transmittance can be greatly increased, and a greater difference in aperture adjustment can be achieved to meet the needs of various shooting scenes.

[0054] In a ninth aspect, the present invention provides an electrochromic aperture, which has the following structure: on the basis of the electrochromic aperture described in the second, third, fourth, fifth, seventh and eighth aspects of the present invention, the thickness of the electrochromic layer, or the electrochromic layer and the ion storage layer is further set to gradually increase from the inside to the outside.

[0055] The thickness ratio at the edge and the center may be 1.1-10:1; for example, it may be 1.1:1, 2:1, 3:1, 4:1, 5:1, 6:1, 7:1, 8:1, 9:1, 10:1, etc.

[0056] It should be noted that, since the thickness of the ion transfer layer is in the micrometer order, and the thickness change of the electrochromic layer is in the nanometer order, the actual thickness change of the ion transfer layer can be ignored.

[0057] The present invention sets the thickness of the electrochromic layer to gradually increase from the inside to the outside, so that the aperture has different color change ranges from the inside to the outside, thereby achieving greater aperture level adjustment and meeting the needs of various shooting scenes.

[0058] The present invention has no particular limitation on the method for achieving the above-mentioned thickness change. For example, a film layer with uniform thickness can be prepared first and then laser etched; or the thickness of the film layer can be controlled when the film layer is prepared (such as by controlling it through layered coating).

[0059] In one embodiment of the present invention, the materials of the first transparent conductive layer and the second transparent conductive layer are independently formed of ITO (indium-tin oxide), AZO (aluminum zinc oxide), FTO (fluorine doped tin oxide), silver nanowires, graphene, carbon nanotubes, metal grids or silver nanoparticles.

[0060] In one embodiment of the present invention, the thickness of the first transparent conductive layer and the second transparent conductive layer are each independently 5-250 μm; for example, they can be 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm, 50 μm, 55 μm, 60 μm, 65 μm, 70 μm, 75 μm, 80 μm, 100 μm, 120 μm, 150 μm, 180 μm, 200 μm or 220 μm, etc.

[0061] The first transparent conductive layer and the second transparent conductive layer are electrodes of the electrochromic aperture. In practical applications, leads can be connected to lead out the electrodes.

[0062] In one embodiment of the present invention, the material of the ion storage layer is one or a combination of at least two of the oxides or complexes formed by metal elements in groups IIIB, IVB, VB, VIB, VIIB, VIII, IB and IIB that can store ions during electrochemical reactions. For example, it can be a certain metal oxide, or a combination of two or more metal oxides, or a certain metal complex, or a combination of two or more metal complexes, or a combination of a metal complex and a metal oxide. If two or more metal oxides are selected, it refers to the doping form, such as Nb2O5 doped with 5wt% TiO2.

[0063] Preferably, the metal is selected from Ti, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ir, Ni, Cu and Zn.

[0064] Preferably, the complex is selected from Prussian green, Prussian white, Prussian brown, Prussian blue, KFeFe(CN)6, FeNiHCF, FeHCF, NiHCF or an iron compound X m Y n {Fe(CN)6} or a combination of at least two thereof, wherein X is Na + or K + Or other metal ions mentioned in the literature, Y is Fe 3+ 、Co 3+ 、Ni + , Mn 2+ 、Zn 2+ Cu 2+ , or other metal ions mentioned in the literature.

[0065] Preferably, the material of the ion storage layer further includes a polymer having redox activity.

[0066] The redox-active polymer may be a polymer formed by pyrrole and pyrrole derivatives, a polymer formed by thiophene and thiophene derivatives, a polymer containing TEMPO (tetramethylpiperidinium N-oxide) and its derivatives, a polymer containing viologen and its derivatives, and the like.

[0067] In one embodiment of the present invention, the ion storage layer can be a mixed system of a transition metal complex and a metal oxide, a mixed system of a transition metal complex and a polymer having redox activity, or a mixed system of a metal oxide and a polymer having redox activity, etc.

[0068] In one embodiment of the present invention, the thickness of the ion storage layer is 1-10000nm; for example, it can be 1nm, 3nm, 5nm, 10nm, 20nm, 50nm, 80nm, 100nm, 200nm, 300nm, 400nm, 500nm, 600nm, 800nm, 1000nm, 2000nm, 5000nm, 8000nm or 10000nm, etc.

[0069] The ion storage layer is mainly used to store ions. When power is applied, the ions in the ion storage layer are transferred to the electrochromic layer, and the electrochromic layer absorbs these ions and changes color.

[0070] In one embodiment of the present invention, the ion transfer layer is a gel electrolyte layer, a liquid electrolyte layer or a solid electrolyte layer, more preferably a solid electrolyte layer, and even more preferably a solid flexible electrolyte layer.

[0071] In one embodiment of the present invention, the weight percentage of the neutral organic small molecules contained in the ion transfer layer is ≤30wt%, for example, 25wt%, 20wt%, 15wt%, 10wt%, 5wt%, etc.; the molecular weight of the neutral organic small molecules is ≤3000, for example, 2500, 2000, 1500, 1000, 500, etc.

[0072] In one embodiment of the present invention, the polymer in the solid electrolyte layer is a solid electrolyte polymer having plasticizing groups connected by covalent bonds.

[0073] In one embodiment of the present invention, the solid electrolyte polymer is a copolymer of a monomer or oligomer and an ion conductive polymer, the side chain of the monomer or oligomer has a plasticizing group, and further, the components of the solid electrolyte layer also include monomer or oligomer fragments having a cross-linking group on the side chain.

[0074] The "further" mentioned in the present invention means that, in the above definition, the components of the solid electrolyte layer include a copolymer of a monomer or oligomer and an ion-conductive polymer, and preferably the copolymer also includes a monomer or oligomer fragment having a cross-linking group on the side chain; the same explanation shall apply to the "further" mentioned below.

[0075] The plasticizing group and plasticizable group refer to a group that can weaken the interaction between polymers and reduce the crystallinity of polymers.

[0076] In one embodiment of the present invention, the solid electrolyte polymer is a plasticized linear polymer and an ion conductive polymer, which are connected by chemical bonds, and the glass transition temperature of the plasticized linear polymer is lower than -20°C. Furthermore, the components of the solid electrolyte layer also include monomers or polymers having cross-linking groups on the side chains, and the monomers or polymers having cross-linking groups on the side chains are chemically bonded to the plasticized linear polymer and the ion conductive polymer.

[0077] In one embodiment of the present invention, the solid electrolyte polymer is a polymer having a plasticizing group on the side chain and a glass transition temperature below -20°C and an ion conductive polymer, and the two are connected by chemical bonds. Furthermore, the components of the solid electrolyte layer also include a monomer or polymer having a cross-linking group on the side chain, and the monomer or polymer having a cross-linking group on the side chain and the polymer having a plasticizing group on the side chain and a glass transition temperature below -20°C and the ion conductive polymer are connected by chemical bonds.

[0078] In one embodiment of the present invention, the solid electrolyte polymer is a brush polymer having a flexible polymer main chain, ion conductive side chains and non-mixable side chains. Furthermore, the components of the solid electrolyte layer also include monomers or oligomers having cross-linking groups on the side chains, and the monomers or oligomers having cross-linking groups on the side chains are chemically bonded to the brush polymer in the form of block copolymers.

[0079] The non-mixable side chains described in the present invention refer to side chains that are very different from other side chains or polymer properties and cannot be effectively blended, while the brush polymer provided by the present invention refers to a polymer whose main chain is a flexible polymer, and there are two types of side chains, one side chain is used for ion conduction, and the other side chain is other types of side chains that are very different from the ion-conducting side chains and cannot be effectively blended. The present invention introduces such non-mixable side chains to reduce the crystallinity of the polymer, making the polymer in a random state, thereby improving the overall ion-conducting ability and transparency of the polymer.

[0080] In one embodiment of the present invention, the ion transfer layer is a solid flexible electrolyte layer. The polymer of the solid flexible electrolyte layer can be selected from the following four categories of polymers.

[0081] Wherein, x, y, and z are each independently selected from integers greater than 0. The rectangle shown in the formula represents a polymer block having an ion-conducting effect (ion-conducting polymer block), and the oval represents a monomer or polymer with side chains such as PR (plasticizing group), CL (cross-linking group), NM (immiscible group), or IC (ion-conducting group).

[0082]

[0083] PEGPRCL or PEGPR

[0084] A block copolymer (represented by PEGPRCL) formed by copolymerizing a polymer block y having an ion-conducting effect (such as polyethylene glycol or other materials reported in the literature) with a monomer or polymer block x having a plasticizing group (PR) on the side chain, and a monomer or polymer block z having a cross-linking group (CL) on the side chain. Or a block copolymer (represented by PEGPR) formed by copolymerizing a polymer block y having an ion-conducting effect (such as polyethylene glycol or other materials reported in the literature) with a monomer or polymer block x having a plasticizing group (PR) on the side chain.

[0085]

[0086] PEGSPCL or PEGSP

[0087] A block copolymer (represented by PEGSPCL) formed by copolymerizing a polymer block y having an ion-conducting effect (such as polyethylene glycol or other materials reported in the literature) with a linear plasticizing polymer (SP) block x having a glass transition temperature below -20°C (such as polyethylene, polybutylene, polyisobutylene, siloxane, or other materials reported in the literature), and a monomer or polymer block z having a cross-linking group (CL) on the side chain. Or a block copolymer (represented by PEGSP) formed by connecting a polymer block y having an ion-conducting effect (such as polyethylene glycol or other materials reported in the literature) with a linear plasticizing polymer (SP) block x having a glass transition temperature below -20°C (such as polyethylene, polybutylene, polyisobutylene, siloxane, or other materials reported in the literature) through a chemical reaction.

[0088]

[0089] PEGSP-PRCL or PEGSP-PR

[0090] A block copolymer (represented by PEGSP-PRCL) is formed by connecting an ion-conducting polymer block y (such as polyethylene glycol or other materials reported in the literature) with a plasticizing polymer (SP-PR) block x having a plasticizing side chain through a chemical reaction, and then copolymerizing with a monomer or oligomer (CL) block z having a cross-linking group on the side chain. Alternatively, a block copolymer (represented by PEGSP-PR) is formed by connecting an ion-conducting polymer block y (such as polyethylene glycol or other materials reported in the literature) with a plasticizing polymer (SP-PR) block x having a plasticizing side chain through a chemical reaction.

[0091]

[0092] ICNMCL or ICNM

[0093] A comb-shaped block copolymer (ICNMCL) is formed by connecting a flexible polymer block x with an oligomer or polymer (such as polyethylene glycol or other materials reported in the literature) as a side chain and a flexible polymer block y with a side chain that is not mixed with the ion-conducting polymer (such as an alkyl, aromatic or alkyl, aromatic mixed side chain) through a chemical reaction, and then copolymerizing with a monomer or oligomer (CL) block z with a cross-linking group on the side chain. Or a comb-shaped block copolymer (ICNM) is formed by connecting a flexible polymer block x with an oligomer or polymer (such as polyethylene glycol or other materials reported in the literature) as a side chain and a flexible polymer block y with a side chain that is not mixed with the ion-conducting polymer (such as an alkyl, aromatic or alkyl, aromatic mixed side chain) through a chemical reaction.

[0094] The polymer material used for the ion transfer layer needs to be blended with a certain amount of organic salt and / or inorganic salt to form an electrolyte precursor. The inorganic salt includes but is not limited to lithium salt, sodium salt, potassium salt, magnesium salt, calcium salt, aluminum salt; the organic salt includes but is not limited to ionic liquids, such as EMITFSI, EMIOTF. Sometimes, an initiator needs to be introduced to blend to form an electrolyte precursor, and the electrolyte precursor is cross-linked by heating, photoinitiation and other methods to form the final all-solid electrolyte.

[0095] In the present invention, the plasticizing group (PR) includes but is not limited to the following structures:

[0096]

[0097] Crosslinking groups (CL) include but are not limited to the following structures:

[0098]

[0099] The main chain of the comb-like block copolymer includes but is not limited to the following structures:

[0100]

[0101] Ion-conducting groups (ICs) include but are not limited to the following structures:

[0102]

[0103] In one embodiment of the present invention, the thickness of the ion transfer layer is 0.1-200 μm; for example, it can be 0.1 μm, 0.2 μm, 0.5 μm, 0.8 μm, 1 μm, 2 μm, 5 μm, 8 μm, 10 μm, 20 μm, 30 μm, 40 μm, 50 μm, 60 μm, 70 μm, 80 μm, 90 μm, 100 μm, 110 μm, 120 μm, 130 μm, 150 μm, 160 μm, 180 μm or 200 μm, etc. The ion transfer layer is a transfer channel for ions.

[0104] In one embodiment of the present invention, the material of the electrochromic layer is selected from one or a combination of at least two of electrochromic metal oxides such as tungsten oxide, polydecyl viologen and its derivatives, polyaniline and its derivatives, polypyrrole and its derivatives, polythiophene and its derivatives, poly(3,4-ethylenedioxythiophene) and its derivatives, polythieno[3,4-b][1,4]dioxepane and its derivatives, polyfuran and its derivatives, polyfluorene and its derivatives, polycarbazole and its derivatives, and / or copolymers formed by monomers or oligomers of the above polymers and electron-deficient monomers.

[0105] In one embodiment of the present invention, the electron-deficient monomer includes, but is not limited to, one or a combination of at least two selected from benzothiadiazole, benzoselenadiazole, benzoxazole, benzotriazole, benzimidazole, quinoxaline and dione pyrrolopyrrole.

[0106] The color change of the electrochromic layer can be adjusted according to the type of electrochromic material, for example, it can be a change between black and transparent, a change between black and red, a change between black and yellow, etc.

[0107] In one embodiment of the present invention, the thickness of the electrochromic layer is 1-10000nm; for example, it can be 1nm, 3nm, 5nm, 10nm, 20nm, 50nm, 80nm, 100nm, 200nm, 300nm, 400nm, 500nm, 600nm, 800nm, 1000nm, 2000nm, 5000nm, 8000nm or 10000nm, etc.

[0108] In one embodiment of the present invention, the materials of the first transparent substrate and the second transparent substrate are independently glass or a flexible substrate material.

[0109] The flexible substrate material includes but is not limited to PET, cycloolefin copolymer, triacetyl cellulose and the like.

[0110] In one embodiment of the present invention, the total thickness of the electrochromic aperture is less than 1 mm.

[0111] The total thickness of the electrochromic aperture provided by the present invention can be controlled to be below 5 mm, and the lower thickness (or Z-axis height) is beneficial to the zoom and regulation of the camera.

[0112] In a tenth aspect, the present invention provides an aperture lens combination, comprising a concave lens and a convex lens combination for achromatization, and an electrochromic aperture as described in the seventh aspect attached to the surface of the concave lens or the convex lens;

[0113] Alternatively, the aperture lens combination includes a concave lens and a convex lens combination for achromatization, and the concave lens is the electrochromic aperture described in the eighth aspect.

[0114] In an eleventh aspect, the present invention provides a lens module, comprising an achromatic lens assembly, the electrochromic aperture described in the second, third, fourth, fifth, seventh, eighth or ninth aspect of the present invention, an exposure controller, an image sensor, a pulse voltage controller, a light intensity sensor, a photosensitive element, a circuit board and a chip;

[0115] The centers of the achromatic lens assembly, electrochromic aperture, exposure controller and image sensor are on the same optical axis;

[0116] Or it includes the aperture lens combination, exposure controller, image sensor, pulse voltage controller, light intensity sensor, photosensitive element, circuit board and chip described in the tenth aspect;

[0117] The centers of the aperture lens assembly, the electrochromic aperture, the exposure controller and the image sensor are on the same optical axis.

[0118] The achromatic lens combination includes a front lens and a rear lens, and the front lens and the rear lens each independently include one or more lenses. The lens material is one or more resins that can be processed by UV curing, thermal curing or room temperature curing, such as polycarbonate, polyester or polyurethane. The combination of the front lens and the rear lens is mainly used to eliminate chromatic aberration.

[0119] The electrochromic aperture is mainly used to adjust the size of the aperture through which light can pass, thereby adjusting the amount of light entering the lens module.

[0120] The pulse voltage controller is mainly used to change the light transmittance of the electrochromic aperture by applying a pulse voltage to the electrochromic aperture. The pulse voltage controller is affected by the light intensity sensor, exposure controller, lens movement button, etc.

[0121] The image sensor controls the pulse voltage controller to adjust the aperture of the electrochromic aperture through environmental parameters, and controls the exposure controller to control the exposure parameters and exposure time. Environmental parameters include factors such as pixel integration time, ambient illumination, flash, and whether the flash is available. The image sensor can be any conventional solid-state imaging sensor capable of capturing a focused optical image, such as a complementary metal oxide semiconductor (CMOS) sensor chip.

[0122] The photosensitive element can convert light into electric charges, which are converted into digital signals through the analog-to-digital converter chip. After being compressed, the digital signals are saved in the camera's internal flash memory or built-in hard disk card (including charge-coupled device (CCD) and complementary metal oxide semiconductor (CMOS)).

[0123] In the present invention, the entire manufacturing process of the lens module for adjusting the amount of light entering and the shooting effect can be summarized into the following steps:

[0124] (1) Preparation of electrochromic aperture;

[0125] (2) Molding and curing of achromatic lens assembly, and forming an electrochromic aperture lens with an electrochromic aperture;

[0126] (3) Debugging and installation of image sensor, pulse voltage controller and photosensitive element:

[0127] Through precise debugging, the electrochromic aperture, achromatic lens combination and image sensor are controlled to be located on the same optical axis. The image sensor detects the ambient light intensity, converts it into an electrical signal and outputs it to the control chip, which then adjusts the pulse voltage controller to output the corresponding current to change the transmittance of the electrochromic aperture. At the same time, the voice coil motor changes the corresponding focal length to achieve the optimal shooting parameters. Then the exposure controller controls the exposure. The image signal is converted by the CCD into an electrical signal and then processed and output as an image.

[0128] (4) Combining the electrochromic aperture lens with other components to form a lens module:

[0129] The electrochromic aperture lens and other components, such as exposure controller, CCD, voice coil motor, etc., are installed together after precise debugging to form a lens module.

[0130] Compared with the prior art, the present invention has the following beneficial effects:

[0131] The method for preparing the electrochromic aperture provided in the first aspect of the present invention effectively avoids problems such as uneven color change caused by traditional etching methods while ensuring that the aperture can achieve multi-level regulation.

[0132] The electrochromic aperture provided in the third aspect and the fourth aspect of the present invention can achieve multi-level adjustment of the aperture while avoiding the problem of light leakage or opacity caused by etching the grooves.

[0133] The electrochromic aperture provided in the fifth aspect of the present invention and the method for multi-level regulation of the electrochromic aperture provided in the sixth aspect achieve multi-level regulation of the aperture while avoiding the problem of light leakage or opacity caused by etching grooves.

[0134] The electrochromic aperture provided in the seventh aspect of the present invention is a curved structure, and its curvature is the same as the curvature of the surface of the concave lens or convex lens in the achromatic lens combination. It can be attached to the surface of the concave lens or convex lens of the achromatic lens combination, thereby realizing the merging of the aperture and the lens in the lens module and further thinning the lens module.

[0135] The electrochromic aperture provided in the eighth aspect of the present invention is a curved structure, and its shape is the same as that of the concave lens or convex lens in the achromatic lens combination. It can replace the concave lens or convex lens in the achromatic lens combination, thereby realizing the merging of the aperture and the lens in the lens module and further thinning the lens module.

[0136] The electrochromic aperture provided in the ninth aspect of the present invention has different color change ranges from the inside to the outside, which can achieve a larger difference in aperture level adjustment to meet the needs of various shooting scenes. BRIEF DESCRIPTION OF THE DRAWINGS

[0137] Figure 1 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Example 1-1 of the present invention;

[0138] Among them, 11 is a first transparent substrate, 12 is a first transparent conductive layer, 13 is an ion storage layer, 14 is an ion transfer layer, 15 is an electrochromic layer, 16 is a second transparent conductive layer, and 17 is a second transparent substrate.

[0139] Figure 2 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Embodiment 1-2 of the present invention;

[0140] Among them, 21 is a first transparent substrate, 22 is a first transparent conductive layer, 23 is an ion storage layer, 24 is an ion transfer layer, 25 is an electrochromic layer, 26 is a second transparent conductive layer, and 27 is a second transparent substrate.

[0141] Figure 3 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Embodiments 1-3 of the present invention;

[0142] Among them, 31 is a first transparent substrate, 32 is a first transparent conductive layer, 33 is an ion storage layer, 34 is an ion transfer layer, 35 is an electrochromic layer, 36 is a second transparent conductive layer, and 37 is a second transparent substrate.

[0143] Figure 4 A schematic cross-sectional structure diagram of the electrochromic aperture provided in Embodiments 1-4 of the present invention;

[0144] Among them, 41 is a first transparent substrate, 42 is a first transparent conductive layer, 43 is an ion storage layer, 44 is an ion transfer layer, 45 is an electrochromic layer, 46 is a second transparent conductive layer, and 47 is a second transparent substrate.

[0145] Figure 5 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Embodiments 1-5 of the present invention;

[0146] Among them, 51 is a first transparent substrate, 52 is a first transparent conductive layer, 53 is an ion storage layer, 54 is an ion transfer layer, 55 is an electrochromic layer, 56 is a second transparent conductive layer, and 57 is a second transparent substrate.

[0147] Figure 6 A schematic diagram of the cross-sectional structure of an electrochromic aperture provided in Example 2 of the present invention;

[0148] Among them, 61, 62, and 63 are transparent substrates; 61-1, 61-5, 62-1, and 62-5 are transparent conductive layers; 61-2 and 62-2 are ion storage layers; 61-3 and 62-3 are ion transfer layers; and 61-4 and 62-4 are electrochromic layers.

[0149] Figure 7 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Example 3-1 of the present invention;

[0150] Among them, 71 is a first transparent substrate, 72 is a first transparent conductive layer, 73 is an ion storage layer, 74 is an ion transfer layer, 75 is an electrochromic layer, 76 is a second transparent conductive layer, and 77 is a second transparent substrate.

[0151] Figure 8 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Example 3-2 of the present invention;

[0152] Among them, 81 is a first transparent substrate, 82 is a first transparent conductive layer, 83 is an ion storage layer, 84 is an ion transfer layer, 85 is an electrochromic layer, 86 is a second transparent conductive layer, and 87 is a second transparent substrate.

[0153] Fig. 9 Schematic diagram of a method for multi-level control of an electrochromic aperture in Embodiment 4 of the present invention.

[0154] Fig.10 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Example 5-1 of the present invention;

[0155] Among them, 101 is a first transparent substrate, 102 is a first transparent conductive layer, 103 is an ion storage layer, 104 is an ion transfer layer, 105 is an electrochromic layer, 106 is a second transparent conductive layer, and 107 is a second transparent substrate.

[0156] Fig.11 A schematic diagram of the cross-sectional structure of the electrochromic aperture provided in Example 5-2 of the present invention;

[0157] Wherein, 111 is a first transparent substrate, 112 is a first transparent conductive layer, 113 is an ion storage layer, 114 is an ion transfer layer, 115 is an electrochromic layer, 116 is a second transparent conductive layer, and 117 is a second transparent substrate.

[0158] Fig.12 A schematic diagram of the cross-sectional structure of the curved electrochromic aperture provided in Example 6-1 of the present invention;

[0159] Among them, 121 is a first transparent substrate, 122 is a first transparent conductive layer, 123 is an ion storage layer, 124 is an ion transfer layer, 125 is an electrochromic layer, 126 is a second transparent conductive layer, and 127 is a second transparent substrate.

[0160] Fig.13 A schematic diagram of the structure of the aperture lens combination provided in Example 6-1 of the present invention;

[0161] Among them, 131 is a convex lens, 132 is the curved electrochromic aperture provided in Example 6-1, and 133 is a concave lens.

[0162] Fig.14 A schematic diagram of the structure of the aperture lens combination provided in Example 6-2 of the present invention;

[0163] Among them, 141 is a convex lens, 142 is the curved electrochromic aperture provided in Example 6-2, and 143 is a concave lens.

[0164] Fig.15 A schematic diagram of the structure of the aperture lens combination provided in Example 6-3 of the present invention;

[0165] Among them, 151 is a convex lens, 152 is the curved electrochromic aperture provided in Example 6-3, and 153 is a bracket.

[0166] Fig.16 A schematic structural diagram of an aperture lens assembly provided in Example 6-4 of the present invention;

[0167] Among them, 161 is a bracket, 162 is the curved electrochromic aperture provided by Example 6-4, and 163 is a concave lens. DETAILED DESCRIPTION

[0168] The technical solution of the present invention is further described below with reference to the accompanying drawings and through specific implementations. It should be understood by those skilled in the art that the specific implementations are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0169] In the embodiment of the present invention, the preparation method of polymer A (a solid electrolyte polymer belonging to PEGPRCL) is as follows:

[0170]

[0171] Add PEG (polyethylene glycol) capped with bromoisobutyric acid, acrylate with a plasticizing group, a cross-linking group with two acrylic acids, a monovalent copper catalyst, and PMDETA (N,N,N',N",N"-pentamethyldiethylenetriamine) ligand to a suitable organic solvent. The mixed solution (the mixture without solvent can also be used as an electrolyte precursor directly for device preparation) is reacted at 100°C for 12 hours, and the polymer A is obtained by diatomaceous earth filtration and decompression to remove the solvent.

[0172] The preparation method of polymer B (a solid electrolyte polymer belonging to PEGPR) is as follows:

[0173]

[0174] PEG diamine (polyethylene glycol diamine) and phthaloyl chloride are added to a suitable organic solvent, and polymerized directly under alkaline conditions to obtain a polymer electrolyte (the mixture without solvent can also be used as an electrolyte precursor for device preparation). After water washing, separation, drying, and removal of the solvent, polymer B is obtained.

[0175] The preparation method of polymer C (a type of solid electrolyte polymer belonging to PEGSPCL) is as follows:

[0176]

[0177]

[0178] Add PEG (polyethylene glycol), polysiloxane diamine, crosslinking agent tetraamine, condensation agent CDI (carbonyl diimidazole) to a suitable organic solvent (the mixture without solvent can also be used as an electrolyte precursor directly for device preparation). Reaction at 90°C to obtain a polymer. After water washing, separation, drying, and removal of the solvent, polymer C is obtained.

[0179] The preparation method of polymer D (a solid electrolyte polymer belonging to PEGSP) is as follows:

[0180]

[0181] PEG (polyethylene glycol), polysiloxane diamine, and condensing agent CDI (carbonyl diimidazole) are added to a suitable organic solvent (the mixture without solvent can also be used as an electrolyte precursor for device preparation). The polymer obtained by reaction at 120° C. is washed with water, separated, dried, and the solvent is removed to obtain polymer D.

[0182] The preparation method of polymer E (a type of solid electrolyte polymer belonging to PEGSP-PRCL) is as follows:

[0183]

[0184] PEG (polyethylene glycol), polysiloxane diol, crosslinking agent tetraol, condensation agent CDI (carbonyl diimidazole) (the mixture without solvent can also be used as an electrolyte precursor for device preparation) is added to a suitable organic solvent and reacted at 100°C to obtain a polymer. After water washing, separation, drying, and removal of the solvent, polymer E is obtained.

[0185] The preparation method of polymer F (a solid electrolyte polymer belonging to PEGSP-PR) is as follows:

[0186]

[0187] Add PEG (polyethylene glycol), polysiloxane diol, and condensation agent CDI (carbonyl diimidazole) to a suitable organic solvent (the mixture without solvent can also be used as an electrolyte precursor for device preparation). Reaction at 100°C to obtain a polymer. After water washing, separation, drying, and removal of the solvent, polymer F is obtained.

[0188] The preparation method of polymer G (a type of solid electrolyte polymer belonging to ICNMCL) is as follows:

[0189]

[0190] Alkyl acrylate, polyethylene glycol acrylate, ethylene glycol diacrylate, AIBN (azobisisobutyl cyanide) are added to a suitable organic solvent (the mixture without solvent can also be used as an electrolyte precursor for device preparation). The polymer is obtained by light irradiation reaction. After water washing, separation, drying and removal of solvent, polymer G is obtained.

[0191] The preparation method of polymer H (a type of solid electrolyte polymer belonging to ICNM) is as follows:

[0192]

[0193] Alkyl acrylate, polyethylene glycol acrylate, and AIBN (azobisisobutyl cyanide) are added to a suitable organic solvent (the mixture without solvent can also be used as an electrolyte precursor for device preparation). The polymer is obtained by light irradiation reaction. After water washing, separation, drying, and removal of the solvent, a polymer H is obtained.

[0194] Example 1-1

[0195] This embodiment provides an electrochromic aperture that realizes multi-level control through partitioning and a method for preparing the same.

[0196] The structure of the electrochromic aperture is as follows Figure 1 As shown, it includes a first transparent substrate 11, a first transparent conductive layer 12, an ion storage layer 13, an ion transfer layer 14, an electrochromic layer 15, a second transparent conductive layer 16 and a second transparent substrate 17 which are stacked in sequence;

[0197] There are multiple annular grooves etched on the electrochromic layer 15 and the second transparent conductive layer 16 with the central axis of the electrochromic aperture as the center.

[0198] The preparation method of the electrochromic aperture in this embodiment is as follows:

[0199] (1) Preparation of electrochromic layer 15:

[0200] 500 mg of poly (3-hexylthiophene) (P3HT) was dissolved in 10 mL of o-xylene and magnetically stirred for 10 h. The obtained solution was then dropped onto the ITO layer (second transparent conductive layer 16) coated on the glass substrate (second transparent substrate 17) and spin-coated to form a P3HT coating. Figure 1 In the structure shown, a plurality of annular grooves are laser etched on the P3HT coating and the second transparent conductive layer to obtain the electrochromic layer 15 .

[0201] (2) Preparation of the ion storage layer 13:

[0202] 500 mg of tungsten trioxide was dissolved in 20 mL of deionized water. After stirring and filtering, the obtained solution was dropped onto the ITO layer (first transparent conductive layer 12) plated on the glass substrate (first transparent base 11) and spin-coated to form a tungsten trioxide coating to obtain an ion storage layer 13.

[0203] (3) Preparation of electrochromic aperture:

[0204] 10wt% lithium perchlorate, 89.9wt% polymer H precursor and 0.1wt% perazobisisobutyronitrile are mixed and coated on the above-mentioned ion storage layer 13 to form an electrolyte coating; then the above-mentioned electrochromic layer 15 (together with the ITO layer and the glass substrate) is covered on the electrolyte coating, and the electrolyte coating is UV-cured to form a fully solid polymer electrolyte layer (ion transfer layer 14) to obtain an electrochromic aperture.

[0205] Example 1-2

[0206] This embodiment provides an electrochromic aperture that realizes multi-level control through partitioning and a method for preparing the same.

[0207] The structure of the electrochromic aperture is as follows Figure 2 As shown, it includes a first transparent substrate 21, a first transparent conductive layer 22, an ion storage layer 23, an ion transfer layer 24, an electrochromic layer 25, a second transparent conductive layer 26 and a second transparent substrate 27 which are stacked in sequence;

[0208] Wherein, a plurality of annular grooves centered on the central axis of the electrochromic aperture are simultaneously etched on the ion storage layer 23 and the first transparent conductive layer 22 .

[0209] The difference between the method for preparing the electrochromic aperture in this embodiment and that in Embodiment 1-1 is that after the ion storage layer 23 is coated, the ion storage layer 23 and the first transparent conductive layer 22 are laser etched.

[0210] Examples 1-3

[0211] This embodiment provides an electrochromic aperture that realizes multi-level control through partitioning and a method for preparing the same.

[0212] The structure of the electrochromic aperture is as follows Figure 3 As shown, it includes a first transparent substrate 31, a first transparent conductive layer 32, an ion storage layer 33, an ion transfer layer 34, an electrochromic layer 35, a second transparent conductive layer 36 and a second transparent substrate 37 which are stacked in sequence;

[0213] There are a plurality of annular grooves etched on the second transparent substrate 37 , the second transparent conductive layer 36 and the electrochromic layer 35 , with a central axis of the electrochromic aperture as the center.

[0214] The difference between the preparation method of the electrochromic aperture in this embodiment and that in embodiment 1-1 is that in step (3), the laser etching operation is performed only after the UV curing of the ion transfer layer is completed, and the etching is performed from the side of the second transparent substrate 37, and an annular groove is etched on the second transparent substrate 37, the second transparent conductive layer 36 and the electrochromic layer 35 at the same time.

[0215] Examples 1-4

[0216] This embodiment provides an electrochromic aperture that realizes multi-level control through partitioning and a method for preparing the same.

[0217] The structure of the electrochromic aperture is as follows Figure 4 As shown, it includes a first transparent substrate 41, a first transparent conductive layer 42, an ion storage layer 43, an ion transfer layer 44, an electrochromic layer 45, a second transparent conductive layer 46 and a second transparent substrate 47 which are stacked in sequence;

[0218] There are a plurality of annular grooves etched on the first transparent substrate 41 , the first transparent conductive layer 42 and the ion storage layer 43 , with a central axis of the electrochromic aperture as the center.

[0219] The difference between the preparation method of the electrochromic aperture in this embodiment and that in embodiment 1-1 is that in step (3), the laser etching operation is performed only after the UV curing of the ion transfer layer is completed, and the etching is performed from the side of the first transparent substrate 41, and an annular groove is etched on the three layers of the first transparent substrate 41, the first transparent conductive layer 42 and the ion storage layer 43 at the same time.

[0220] Examples 1-5

[0221] This embodiment provides an electrochromic aperture that realizes multi-level control through partitioning and a method for preparing the same.

[0222] The structure of the electrochromic aperture is as follows Figure 5 As shown, it includes a first transparent substrate 51, a first transparent conductive layer 52, an ion storage layer 53, an ion transfer layer 54, an electrochromic layer 55, a second transparent conductive layer 56 and a second transparent substrate 57 which are stacked in sequence;

[0223] There are multiple annular grooves etched on the second transparent substrate 57 and the second transparent conductive layer 56 with the central axis of the electrochromic aperture as the center.

[0224] The difference between the preparation method of the electrochromic aperture in this embodiment and that in embodiment 1-1 is that in step (3), the laser etching operation is performed only after the UV curing of the ion transfer layer is completed, and the etching is performed from the side of the second transparent substrate 57, and annular grooves are etched on both the second transparent substrate 57 and the second transparent conductive layer 56.

[0225] Since the preparation methods adopted in Examples 1-1 to 1-5 perform etching operations after the ion storage layer and the electrochromic layer are coated, while ensuring that the aperture can be adjusted in multiple levels, problems such as uneven discoloration caused by traditional etching methods are effectively avoided.

[0226] Example 2

[0227] This embodiment provides an electrochromic aperture that realizes multi-level control by superimposing multiple layers of electrochromic units, such as Figure 6 As shown, it is formed by stacking two independent electrochromic units, including a transparent substrate 61, a transparent conductive layer 61-1, an ion storage layer 61-2, an ion transfer layer 61-3, an electrochromic layer 61-4, a transparent conductive layer 61-5, a transparent substrate 62, a transparent conductive layer 62-1, an ion storage layer 62-2, an ion transfer layer 62-3, an electrochromic layer 62-4, a transparent conductive layer 62-5 and a transparent substrate 63 which are stacked in sequence;

[0228] Among them, the shapes of the ion storage layers 61-2, 62-2 and the electrochromic layers 61-4, 62-4 are circular rings centered on the central axis of the electrochromic aperture; the ion storage layer 61-2 and the electrochromic layer 61-4 have the same shape and are aligned with each other; the ion storage layer 62-2 and the electrochromic layer 62-4 have the same shape and are aligned with each other; and the outer diameter of the electrochromic layer 61-4 is the same as the inner diameter of the electrochromic layer 62-4.

[0229] In this embodiment, since the projections of the electrochromic layer 61-4 and the electrochromic layer 62-4 along the central axis of the electrochromic aperture are seamlessly connected, the problem of light leakage or opacity caused by etching grooves is avoided while achieving multi-level adjustment of the aperture.

[0230] In this embodiment, there are two methods for preparing the annular electrochromic layer and the annular ion storage layer: one is to first use a hollowed-out annular blocking substrate to cover the transparent conductive layer, and then coat the electrochromic layer or the ion storage layer on the transparent conductive layer. After removing the blocking substrate, the annular electrochromic layer or the ion storage layer can be obtained; the other is to laser etch, chemically corrode or physically wipe out the annular electrochromic layer and the ion storage layer on the transparent conductive layer that has been coated with the electrochromic layer or the ion storage layer.

[0231] The stacking method of each layer is as follows: firstly, the corresponding transparent conductive layer is coated on three transparent substrates, then the annular electrochromic layer and the annular ion storage layer covering the transparent conductive layer are prepared, and then the ion transfer layer material is coated, and then UV curing is performed after compounding. The materials of each layer are the same as those in Example 1.

[0232] Example 3-1

[0233] This embodiment provides an electrochromic aperture that can achieve multi-level regulation by controlling the voltage at which the color starts to change. Figure 7 As shown, it includes a first transparent substrate 71, a first transparent conductive layer 72, an ion storage layer 73, an ion transfer layer 74 with different crosslinking degrees, an electrochromic layer 75, a second transparent conductive layer 76 and a second transparent substrate 77 which are stacked in sequence;

[0234] The ion transfer layer 74 is divided into three circular or annular regions from the inside to the outside, with the central axis of the electrochromic aperture as the center, and the cross-linking degree of the ion transfer layer 74 gradually increases from the inside to the outside.

[0235] Specific implementation method: Before the ion transfer layer is UV-cured, different areas are shielded with materials with different UV transmittances, so that the cross-linking degree of the ion transfer layer materials in different areas is inconsistent, thereby achieving different voltages for different layers to start brightening or darkening. The specific steps are as follows:

[0236] (1) Preparation of electrochromic layer 75:

[0237] 500 mg of poly (3-hexylthiophene) (P3HT) was dissolved in 10 mL of o-xylene and magnetically stirred for 10 hours. The obtained solution was then dropped onto the ITO layer (second transparent conductive layer 76) coated on the glass substrate (second transparent base 77) and spin-coated to form a P3HT coating to obtain an electrochromic layer.

[0238] (2) Preparation of ion storage layer 73:

[0239] 500 mg of tungsten trioxide was dissolved in 20 mL of deionized water. After stirring and filtering, the obtained solution was dropped onto the ITO layer (first transparent conductive layer 72) plated on the glass substrate (first transparent base 71) and spin-coated to form a tungsten trioxide coating to obtain an ion storage layer 73.

[0240] (3) Preparation of electrochromic aperture:

[0241] 10wt% of lithium bis(trifluoromethanesulfonyl)imide, 89.9wt% of the precursor of polymer G and 0.1wt% of perazobis(isobutyronitrile) are mixed and coated on the above-mentioned ion storage layer to form an electrolyte coating; then the above-mentioned electrochromic layer 75 (together with the ITO layer and the glass substrate) is covered on the electrolyte coating, and on the outside of the transparent substrate, the outermost ring of the ion transfer layer 74 is covered and blocked by a surface-coated PET film with a 10% ultraviolet transmittance that is consistent with the shape of the outermost ring of the ion transfer layer 74; the middle ring of the ion transfer layer 74 is covered and blocked by a surface-coated PET film with a 50% ultraviolet transmittance that is consistent with the shape of the middle ring; the innermost ring of the ion transfer layer 74 is covered and blocked by a PET film with a 90% ultraviolet transmittance that is consistent with the shape of the innermost ring, and after heating and curing, an electrochromic aperture is obtained.

[0242] Since the cross-linking degree of the ion transfer layer material gradually increases from the inside to the outside, the voltage at which the light starts to brighten gradually increases from the inside to the outside. Therefore, when a forward voltage is applied, the inner ring of the aperture brightens earlier than the outer ring. Since the areas of the aperture from the inside to the outside are continuous, the multi-level adjustment of the aperture is achieved while avoiding the problem of light leakage or opacity caused by etching grooves.

[0243] Example 3-2

[0244] This embodiment provides an electrochromic aperture that can achieve multi-level regulation by controlling the voltage at which the color starts to change. Figure 8 As shown, it includes a first transparent substrate 81, a first transparent conductive layer 82, an ion storage layer 83, an ion transfer layer 84, an electrochromic layer 85, a second transparent conductive layer 86 and a second transparent substrate 87 which are stacked in sequence;

[0245] Among them, the electrochromic layer 85 is divided into three circular or annular areas from the inside to the outside with the central axis of the electrochromic aperture as the center. The electrochromic material of each area is different, and the voltage at which the electrochromic material starts to brighten gradually increases from the inside to the outside, and the voltage at which it starts to darken gradually decreases.

[0246] Specific implementation method: coating the transparent conductive layer with electrochromic materials with different starting voltages for brightening or darkening, such as WO3, polydecyl viologen and its derivatives, polyaniline and its derivatives, poly(3-hexylthiophene) and its derivatives, poly(3,4-ethylenedioxythiophene) and its derivatives, polythieno[3,4-b][1,4]dioxepane and its derivatives, so as to achieve different starting voltages for brightening or darkening in different layers. The specific steps are as follows:

[0247] (1) Preparation of electrochromic layer 85:

[0248] Dissolve 500 mg of poly(3,4-ethylenedioxythiophene) with alkyl side chain ethylhexyl in 10 ml of chloroform and stir magnetically for 10 h; dissolve 500 mg of polythieno[3,4-b][1,4]dioxepane with alkyl side chain ethylhexyl in chlorobenzene and stir magnetically for 10 h; dissolve 500 mg of poly(3-hexylthiophene) (P3HT) in 10 mL of o-xylene and stir magnetically for 10 h. By inkjet printing, a poly(3,4-ethylenedioxythiophene) solution is printed on the ITO layer (second transparent conductive layer 86) on the glass substrate (second transparent substrate 87) to form an innermost circle of a poly(3,4-ethylenedioxythiophene) coating; by inkjet printing, a polythiophene[3,4-b][1,4]dioxepane solution is printed on the ITO layer (second transparent conductive layer 86) on the glass substrate (second transparent substrate 87) to form a second circle of a polythiophene[3,4-b][1,4]dioxepane coating; by inkjet printing, a poly(3-hexylthiophene) solution is printed on the ITO layer (second transparent conductive layer 86) on the glass substrate (second transparent substrate 87) to form an outermost circle of a poly(3-hexylthiophene) coating, thereby completing the preparation of the electrochromic layer 85.

[0249] (2) Preparation of ion storage layer 83:

[0250] 500 mg of tungsten trioxide was dissolved in 20 mL of deionized water. After stirring and filtering, the obtained solution was dropped onto the ITO layer (first transparent conductive layer 82) plated on the glass substrate (first transparent base 81) and spin-coated to form a tungsten trioxide coating to obtain an ion storage layer 83.

[0251] (3) Preparation of electrochromic aperture:

[0252] 10wt% lithium perchlorate, 79.9wt% precursor of polymer G and 0.1wt% perazobisisobutyronitrile are mixed and coated on the above-mentioned ion storage layer to form an electrolyte coating; then the above-mentioned electrochromic layer 85 (together with the ITO layer and the glass substrate) is covered on the electrolyte coating, and after heating and curing at 80°C, an electrochromic aperture is obtained.

[0253] The three layers of materials in the electrochromic layer 85 mentioned above are such that the voltage at which the light starts to brighten gradually increases from the inside to the outside, but the voltage at which the light starts to darken also gradually increases. When a positive voltage is applied, the inner ring of the aperture becomes brighter than the outer ring. Since the areas of the aperture from the inside to the outside are continuous, while realizing multi-level regulation of the aperture brightening, the problem of light leakage or opacity caused by etching grooves is avoided. When darkening, it is only necessary to short-circuit two transparent conductive layers or apply a negative voltage with an absolute value less than 2V to make the three layers of materials return to a dark state at the same time. Although there is no multi-level regulation of darkening, it can also meet the requirements of the aperture.

[0254] Example 4

[0255] This embodiment provides a method for performing multi-level regulation of an electrochromic aperture.

[0256] The electrochromic aperture comprises a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate which are stacked in sequence;

[0257] The material of the electrochromic aperture is the same from the inside to the outside, and there is no groove on the electrochromic aperture.

[0258] The method of multi-level regulation is: using the electrochromic aperture provided in this embodiment, applying different voltages at the center and edge thereof, and the voltage at the center is greater than the voltage at the edge, to achieve multi-level regulation.

[0259] Fig. 9 Schematic diagram of the method for multi-level control of the electrochromic aperture in this embodiment (the electrochromic layer is on the top and the ion storage layer is on the bottom), as shown in FIG. Fig. 9As shown in the figure, the voltage at the center is +2V, and the voltage at the edge is -2V. Under the action of this voltage, the voltage from the center to the edge changes gradually, forming a distribution in which the voltage gradually decreases from the inside to the outside. By changing the voltage at the center and the edge, the change control of different transmittances of the aperture can be achieved. Since the aperture is continuous from the inside to the outside, while realizing multi-level adjustment of the aperture, the problem of light leakage or opacity caused by etching grooves is avoided.

[0260] Example 5-1

[0261] This embodiment provides an electrochromic aperture that realizes multi-level regulation through an electrochromic layer with varying thickness, such as Fig.10 As shown, it includes a first transparent substrate 101, a first transparent conductive layer 102, an ion storage layer 103, an ion transfer layer 104, an electrochromic layer 105, a second transparent conductive layer 106 and a second transparent substrate 107 which are stacked in sequence;

[0262] The second transparent conductive layer 106 is etched with a plurality of annular grooves centered on the central axis of the electrochromic aperture, and the thickness of the electrochromic layer 105 and the ion storage layer 103 gradually increases from the inside to the outside (the thickness ratio at the edge to the center is 1.1:1).

[0263] Since the thickness of the electrochromic layer of the electrochromic aperture provided in this embodiment gradually increases from the inside to the outside, the aperture has different color change ranges from the inside to the outside. Compared with the aperture whose electrochromic layer thickness remains unchanged from the inside to the outside, the electrochromic aperture provided in this embodiment can achieve a larger difference in aperture level adjustment to meet the needs of various shooting scenes.

[0264] Preparation method:

[0265] The difference from Example 1-1 is that after the electrochromic layer is coated, the electrochromic layer is first laser etched so that its thickness gradually increases from the inside to the outside, and then a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the second transparent conductive layer; after the ion storage layer is coated, the ion storage layer is laser etched so that its thickness gradually increases from the inside to the outside (since the thickness of the ion transfer layer is in the micron level, while the thickness changes of the electrochromic layer and the ion storage layer are in the nanometer level, the actual thickness change of the ion transfer layer can be ignored).

[0266] Example 5-2

[0267] This embodiment provides an electrochromic aperture that realizes multi-level regulation through an electrochromic layer with varying thickness, such as Fig.11As shown, it includes a first transparent substrate 111, a first transparent conductive layer 112, an ion storage layer 113, an ion transfer layer 114, an electrochromic layer 115, a second transparent conductive layer 116 and a second transparent substrate 117 which are stacked in sequence;

[0268] The second transparent conductive layer 116 is etched with a plurality of annular grooves centered on the central axis of the electrochromic aperture, and the thickness of the electrochromic layer 115 gradually increases from the inside to the outside (the thickness ratio at the edge to the center is 1.1:1).

[0269] Since the thickness of the electrochromic layer of the electrochromic aperture provided in this embodiment gradually increases from the inside to the outside, the aperture has different color change ranges from the inside to the outside. Compared with the aperture whose electrochromic layer thickness remains unchanged from the inside to the outside, the electrochromic aperture provided in this embodiment can achieve a larger difference in aperture level adjustment to meet the needs of various shooting scenes.

[0270] Preparation method:

[0271] The difference from Example 1-1 is that after the electrochromic layer is coated, the electrochromic layer is first laser etched so that its thickness gradually increases from the inside to the outside, and then a plurality of annular grooves centered on the central axis of the electrochromic aperture are etched on the second transparent conductive layer (since the thickness of the ion transfer layer is in the micron level, and the thickness variation of the electrochromic layer is in the nanometer level, the actual thickness variation of the ion transfer layer can be ignored).

[0272] Example 6-1

[0273] This embodiment provides a curved electrochromic aperture and an aperture lens combination.

[0274] Among them, the structure of the curved electrochromic aperture is as follows Fig.12 As shown, it includes a first transparent substrate 121, a first transparent conductive layer 122, an ion storage layer 123, an ion transfer layer 124, an electrochromic layer 125, a second transparent conductive layer 126 and a second transparent substrate 127 which are stacked in sequence;

[0275] The curvature of the electrochromic aperture is the same as the curvature of the convex lens surface in the achromatic lens combination. The second transparent conductive layer 126 is etched with multiple annular grooves centered on the central axis of the electrochromic aperture. The thickness of the electrochromic layer 125 gradually increases from the inside to the outside.

[0276] The structure of the aperture lens combination is as follows Fig.13 As shown, it includes an achromatic lens combination and a curved electrochromic aperture 132 provided in this embodiment. The achromatic lens combination includes a convex lens 131 and a concave lens 133. The curved electrochromic aperture 132 is attached to the surface of the convex lens 131 by optical adhesive such as OCA and LOCA.

[0277] The preparation method of the curved electrochromic aperture in this embodiment is as follows:

[0278] (1) Preparation of electrochromic layer 125:

[0279] 500 mg of poly (3-dodecyl) thiophene (PDT) was dissolved in 10 mL of o-xylene and magnetically stirred for 10 hours. The obtained solution was then dropped onto the ITO layer (second transparent conductive layer 126) plated on the PET substrate (second transparent substrate 127) and spin coated to form a PDT coating (electrochromic layer 125). The electrochromic layer 125 was etched with a laser, and the etching degree gradually decreased from the inside to the outside, forming a structure with a thickness gradually increasing from the inside to the outside; then, 9 annular grooves centered on the central axis of the electrochromic aperture were laser etched on the electrochromic layer 125 and the second transparent conductive layer 126.

[0280] (2) Preparation of ion storage layer 123:

[0281] 500 mg of tungsten trioxide was dissolved in 20 mL of deionized water. After stirring and filtering, the obtained solution was dropped onto the ITO layer (first transparent conductive layer 122) plated on PET (first transparent substrate 121) and spin-coated to form a tungsten trioxide coating, which is the ion storage layer 123.

[0282] (3) Preparation of electrochromic aperture:

[0283] 5wt% lithium perchlorate, 94.9wt% polymer G and 0.1wt% tert-butyl peroxyneodecanoate are mixed and coated on the above-mentioned ion storage layer 13 to form an electrolyte coating; then the above-mentioned electrochromic layer 125 (together with the ITO layer and the glass substrate) is covered on the electrolyte coating, and the electrolyte coating is UV-cured to form an all-solid-state polymer electrolyte (ion transfer layer 124) to obtain an electrochromic aperture.

[0284] (4) Preparation of curved electrochromic aperture

[0285] A layer of OCA is attached to the surface of the convex lens, and then the electrochromic aperture is attached and fixed on the OCA to obtain a curved electrochromic aperture.

[0286] Since the electrochromic aperture provided in this embodiment is flexible and bendable, it can be designed as a curved surface structure with the same curvature as the convex lens in the achromatic lens combination, thereby realizing the merging of the aperture and the lens in the lens module and thinning the lens module.

[0287] Example 6-2

[0288] This embodiment provides a curved electrochromic aperture and an aperture lens combination.

[0289] Among them, the difference between the curved electrochromic aperture and Example 6-1 is that its curvature is the same as the curvature of the concave lens surface in the achromatic lens combination, and the difference between the preparation method and Example 6-1 is that in step (4), the electrochromic aperture is attached to the surface of the concave lens with OCA to obtain the curved electrochromic aperture.

[0290] The structure of the aperture lens combination is as follows Fig.14 As shown, it includes an achromatic lens combination and a curved electrochromic aperture 142 provided in this embodiment. The achromatic lens combination includes a convex lens 141 and a concave lens 143. The curved electrochromic aperture 142 is attached to the surface of the concave lens 143 by OCA optical adhesive.

[0291] Since the electrochromic aperture provided in this embodiment is flexible and bendable, it can be designed as a curved surface structure with the same curvature as the concave lens in the achromatic lens combination, thereby realizing the merging of the aperture and the lens in the lens module and thinning the lens module.

[0292] Example 6-3

[0293] This embodiment provides a curved electrochromic aperture and an aperture lens combination.

[0294] The difference between the curved electrochromic aperture and Example 6-1 is that its shape is the same as the concave lens in the achromatic lens combination.

[0295] The structure of the aperture lens combination is as follows Fig.15 As shown, it includes a combination of a convex lens 151 and a concave lens 152 for achromatization, and a bracket 153, on which the concave lens 152 is clamped; and the concave lens 152 is the curved electrochromic aperture provided in this embodiment.

[0296] Since the electrochromic aperture provided in this embodiment is flexible and bendable, it can be designed to have the same shape as the concave lens in the achromatic lens combination, replacing the concave lens in the achromatic lens combination, thereby realizing the merging of the aperture and the lens in the lens module and thinning the lens module.

[0297] Example 6-4

[0298] This embodiment provides a curved electrochromic aperture and an aperture lens combination.

[0299] The difference between the curved electrochromic aperture and Example 6-1 is that its shape is the same as the shape of the convex lens in the achromatic lens combination.

[0300] The structure of the aperture lens combination is as follows Fig.15As shown, it includes a combination of a convex lens 162 and a concave lens 163 for achromatization, and a bracket 161, on which the convex lens 162 is clamped; and the convex lens 162 is the curved electrochromic aperture provided in this embodiment.

[0301] Since the electrochromic aperture provided in this embodiment is flexible and bendable, it can be designed to have the same shape as the convex lens in the achromatic lens combination, replacing the convex lens in the achromatic lens combination, thereby realizing the merging of the aperture and lens in the lens module and thinning the lens module.

[0302] It should be noted that the function of the voltage driver in the drawings of the present invention is to provide a driving voltage, which is only for the convenience of explaining the working principle of the electrochromic aperture and should not be understood as a component of the electrochromic aperture.

[0303] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. An electrochromic aperture, characterized in that: The electrochromic aperture comprises a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate which are stacked in sequence; The voltage at which the electrochromic aperture starts to brighten gradually increases from the inside to the outside, or the voltage at which the electrochromic aperture starts to darken gradually decreases from the inside to the outside, and when a forward voltage is applied, the electrochromic aperture starts to brighten from the inside to the outside; The crosslinking degree of the ion transfer layer increases gradually from the inside to the outside, or the electrochromic material of the electrochromic layer is different from the inside to the outside, and the voltage at which the electrochromic material starts to brighten gradually increases or the voltage at which it starts to darken gradually decreases.

2. The electrochromic aperture according to claim 1, characterized in that: The thickness of the electrochromic layer, or the electrochromic layer and the ion storage layer, gradually increases from the inside to the outside.

3. An electrochromic aperture, characterized in that: The electrochromic aperture comprises at least two superimposed and mutually independent electrochromic units, wherein the electrochromic unit comprises a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer and a second transparent conductive layer superimposed in sequence; adjacent electrochromic units are separated by a transparent substrate; The shape of the electrochromic layer and the ion storage layer is a circle or annular shape centered on the central axis of the electrochromic aperture, and the ion storage layer and the electrochromic layer in the same electrochromic unit are aligned with each other, the projections of the electrochromic layers in different electrochromic units along the central axis direction of the electrochromic aperture do not overlap and the boundaries are aligned with each other, and when a forward voltage is applied, the electrochromic aperture begins to brighten from the inside to the outside.

4. The electrochromic aperture according to claim 3, characterized in that: The thickness of the electrochromic layer, or the electrochromic layer and the ion storage layer, gradually increases from the inside to the outside.

5. An electrochromic aperture, characterized in that: The electrochromic aperture comprises a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate which are stacked in sequence; The material of the electrochromic aperture is the same from the inside to the outside, and there is no groove on the electrochromic aperture; and when a forward voltage is applied, the electrochromic aperture starts to brighten from the inside to the outside; during the color change process of the electrochromic aperture, the voltage at the center and the edge of the electrochromic aperture is different, and the voltage at the center is greater than the voltage at the edge.

6. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The electrochromic aperture comprises a first transparent substrate, a first transparent conductive layer, an ion storage layer, an ion transfer layer, an electrochromic layer, a second transparent conductive layer and a second transparent substrate which are stacked in sequence; The electrochromic aperture is a curved structure, and the curvature is the same as the curvature of the surface of the concave lens or convex lens in the achromatic lens combination; or the shape of the electrochromic aperture is the same as the shape of the concave lens or convex lens in the achromatic lens combination.

7. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The first transparent conductive layer and the second transparent conductive layer are each independently formed of indium tin oxide, aluminum zinc oxide, fluorine-doped tin oxide, silver nanowires, graphene, carbon nanotubes, metal mesh transparent conductive electrodes or silver nanoparticles.

8. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The material of the ion storage layer is one or a combination of at least two of oxides or complexes formed by metal elements in groups IIIB, IVB, VB, VIB, VIIB, VIII, IB and IIB that can store ions during electrochemical reactions.

9. The electrochromic aperture according to claim 8, characterized in that: The metal is selected from Ti, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ir, Ni, Cu and Zn.

10. The electrochromic aperture according to claim 8, characterized in that: The complex is selected from Prussian green, Prussian white, Prussian brown, Prussian blue, KFeFe(CN)6, FeNiHCF, FeHCF, NiHCF or an iron compound X m Y n {Fe(CN)6} or a combination of at least two thereof, wherein X is Na + or K + , Y is Fe 3+ 、Co 3+ 、Ni + , Mn 2+ 、Zn 2+ Cu 2+ .

11. The electrochromic aperture according to claim 8, characterized in that: The material of the ion storage layer also includes a macromolecule having redox activity.

12. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The thickness of the ion storage layer is 1-10000 nm.

13. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The components of the ion transfer layer include organic salt and / or inorganic salt, and polymer.

14. The electrochromic aperture according to claim 13, characterized in that: The inorganic salt is selected from one or a combination of at least two of lithium salts, sodium salts, potassium salts, magnesium salts, calcium salts and aluminum salts.

15. The electrochromic aperture according to claim 13, characterized in that: The organic salt is an ionic liquid.

16. The electrochromic aperture according to claim 13, characterized in that: The ion transfer layer is a gel electrolyte layer, a liquid electrolyte layer or a solid electrolyte layer.

17. The electrochromic aperture according to claim 16, characterized in that: The ion transfer layer is a solid electrolyte layer.

18. The electrochromic aperture according to claim 17, characterized in that: The ion transfer layer is a solid flexible electrolyte layer.

19. The electrochromic aperture according to claim 17, characterized in that: The weight percentage of the neutral organic small molecules contained in the ion transfer layer is ≤30wt%, and the molecular weight of the neutral organic small molecules is ≤3000.

20. The electrochromic aperture according to claim 17, characterized in that: The polymer in the solid electrolyte layer is a solid electrolyte polymer having plasticizing groups connected by covalent bonds.

21. The electrochromic aperture according to claim 20, characterized in that: The solid electrolyte polymer is a copolymer of a monomer or oligomer and an ion conductive polymer, and the side chain of the monomer or oligomer has a plasticizing group.

22. The electrochromic aperture according to claim 20, characterized in that: The components of the solid electrolyte layer also include monomers or oligomer fragments with cross-linking groups on the side chains.

23. The electrochromic aperture according to claim 21, characterized in that: The solid electrolyte polymer is a plasticized linear polymer and an ion conductive polymer, which are connected by chemical bonds, and the glass transition temperature of the plasticized linear polymer is lower than -20°C.

24. The electrochromic aperture according to claim 23, characterized in that: The components of the solid electrolyte layer also include monomers or polymers with cross-linking groups on the side chains, and the monomers or polymers with cross-linking groups on the side chains are chemically bonded to the plasticized linear polymer and the ion conductive polymer.

25. The electrochromic aperture according to claim 23, characterized in that: The solid electrolyte polymer is a polymer with a plasticizing group on the side chain and a glass transition temperature lower than -20°C and an ion conductive polymer, and the two are connected by chemical bonds.

26. The electrochromic aperture according to claim 25, characterized in that: The components of the solid electrolyte layer also include monomers or polymers with cross-linking groups on the side chains, and the monomers or polymers with cross-linking groups on the side chains, the polymers with plasticizing groups on the side chains and a glass transition temperature below -20°C, and the ion conductive polymers are chemically bonded.

27. The electrochromic aperture according to claim 20, characterized in that: The solid electrolyte polymer is a brush polymer having a flexible polymer main chain, ion-conductive side chains and immiscible side chains.

28. The electrochromic aperture according to claim 27, characterized in that: The components of the solid electrolyte layer also include monomers or oligomers with cross-linking groups on the side chains, and the monomers or oligomers with cross-linking groups on the side chains are chemically bonded to the brush polymer in the form of block copolymerization.

29. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The thickness of the ion transfer layer is 0.1-200 μm.

30. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The material of the electrochromic layer includes one or a combination of at least two of electrochromic metal oxides, polydecyl viologen and its derivatives, polyaniline and its derivatives, polypyrrole and its derivatives, polythiophene and its derivatives, poly(3,4-ethylenedioxythiophene) and its derivatives, polythieno[3,4-b][1,4]dioxepane and its derivatives, polyfuran and its derivatives, polyfluorene and its derivatives, and polycarbazole and its derivatives, and / or a copolymer formed by monomers or oligomers of the above polymers and electron-deficient monomers.

31. The electrochromic aperture according to claim 30, characterized in that: The electron-deficient monomer is selected from one or a combination of at least two of benzothiadiazole, benzoselenadiazole, benzoxazole, benzotriazole, benzimidazole, quinoxaline and dione pyrrolopyrrole.

32. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The thickness of the electrochromic layer is 1-10000 nm.

33. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The materials of the first transparent substrate and the second transparent substrate are each independently glass or a flexible substrate material.

34. The electrochromic aperture according to claim 33, characterized in that: The flexible substrate material is PET, cycloolefin copolymer or triacetyl cellulose.

35. The electrochromic aperture according to any one of claims 1 to 5, characterized in that: The total thickness of the electrochromic aperture is less than 5 mm.

36. An aperture lens combination, characterized in that: The aperture lens combination comprises a concave lens and a convex lens combination for achromatization, and an electrochromic aperture as described in any one of claims 1 to 35 attached to the surface of the concave lens or the convex lens; Alternatively, the aperture lens combination includes a concave lens and a convex lens combination for achromatization, and the concave lens or the convex lens is the electrochromic aperture as described in any one of claims 1-35.

37. A method for multi-level control of an electrochromic aperture, characterized in that: The method is to use the electrochromic aperture described in any one of claims 1 to 35, apply different voltages at the center and edge of the electrochromic aperture, and the voltage at the center is greater than the voltage at the edge, so as to achieve multi-level regulation.

38. A lens module, characterized in that: The lens module comprises an achromatic lens assembly, an electrochromic aperture as claimed in any one of claims 1 to 35, an exposure controller, an image sensor, a pulse voltage controller, a light intensity sensor, a photosensitive element, a circuit board and a chip; The centers of the achromatic lens assembly, electrochromic aperture, exposure controller and image sensor are on the same optical axis; Alternatively, the lens module comprises the aperture lens assembly as claimed in claim 36, an exposure controller, an image sensor, a pulse voltage controller, a light intensity sensor, a photosensitive element, a circuit board and a chip; The centers of the aperture lens assembly, the electrochromic aperture, the exposure controller and the image sensor are on the same optical axis.

Images