Exhaust device for substrate processing

Abstract

The present invention relates to an exhaust device for substrate processing, comprising: a chamber portion; a base portion mounted on the chamber portion; a rotating shaft portion mounted on the base portion; an operation table portion mounted on the rotating shaft portion and capable of rotating, and rotating the substrate placed on the operation table portion; a cup portion mounted on the base portion and guiding the chemical liquid sprayed onto the substrate to be separated and recovered according to each component; and an internal exhaust portion disposed between the rotating shaft portion and the cup portion for exhausting fluid and capable of preventing damage to the substrate caused by floating substances.

Description

Technical Field

[0001] The present invention relates to an exhaust device for substrate processing, and more particularly, to an exhaust device for substrate processing that can quickly exhaust the gas inside the chamber to prevent the substrate from being contaminated. Background Art

[0002] Generally, the wafer processing steps in the semiconductor manufacturing process include the following steps: Photoresist Coating, Develop & Bake, Etching, Chemical Vapor Deposition, Ashing, etc.

[0003] As a process for removing various contaminants adhered to the substrate during the execution of the above-mentioned multiple steps, there is a Wet Cleaning Process using Chemical or Deionized Water (DI water).

[0004] And after the cleaning process, there is also a Drying process for drying the Chemical or Deionized Water remaining on the surface of the semiconductor substrate. As a substrate drying device for performing the drying process, a Spin dry device that uses a mechanical rotational force to dry the semiconductor substrate and an IPA drying device that uses a chemical reaction of IPA (isopropyl alcohol) to dry the semiconductor substrate are used.

[0005] Currently, when each process is performed, gas floats, and there is a problem that impurities contained in the floating gas adhere to the substrate and contaminate the substrate. Therefore, there is a need to improve this problem.

[0006] The background art of the present invention is disclosed in Korean Patent Publication No. 2019-0011472 (published on February 7, 2019, invention title: Wafer Drying Device and Method). Summary of the Invention

[0007] The present invention is proposed to improve the above technical problems, and its purpose is to provide an exhaust device for substrate processing that can quickly exhaust the gas inside the chamber to prevent the substrate from being contaminated.

[0008] The exhaust device for substrate processing according to the present invention is characterized in that it includes: a chamber portion; a base portion installed on the chamber portion; a rotating shaft portion installed on the base portion; an operation table portion installed on the rotating shaft portion and capable of rotating, and rotating the substrate placed on the operation table portion; a cup portion installed on the base portion, guiding the liquid medicine sprayed onto the substrate to be separated and recovered according to each component; and an internal exhaust portion disposed between the rotating shaft portion and the cup portion for exhausting fluid.

[0009] In addition, the exhaust device for substrate processing is characterized in that the internal exhaust portion includes: an internal suction portion formed to surround the outer side of the rotating shaft portion, and the fluid existing between the cup portion and the rotating shaft portion flows into the internal suction portion; an internal guiding portion connected to the internal suction portion for guiding the fluid flowing into the internal suction portion; and an internal discharge portion communicating with the internal guiding portion for discharging the fluid moving through the internal guiding portion to the outside.

[0010] In addition, the exhaust device for substrate processing is characterized in that the internal discharge portion includes: an internal conduit portion connected to the base portion and communicating with the internal guiding portion; an internal opening / closing portion for opening or closing the internal conduit portion; an internal motor portion for starting the internal opening / closing portion; an internal measuring portion installed on the chamber portion for measuring the internal pressure of the chamber portion; and an internal control portion for receiving the measurement signal of the internal measuring portion to control the internal motor portion.

[0011] The exhaust device for substrate processing according to the present invention is characterized in that it further includes: an external exhaust portion disposed outside the cup portion for exhausting fluid.

[0012] In addition, the exhaust device for substrate processing is characterized in that the base portion includes: a base bottom plate portion combined with the chamber portion and disposed below the base upper plate portion, and the internal exhaust portion is installed on the base bottom plate portion; and the base upper plate portion combined with the chamber portion, and the external exhaust portion is installed on the base upper plate portion.

[0013] In addition, the exhaust device for substrate processing is characterized in that the external exhaust portion includes: an external suction portion formed to surround the outside of the cup portion, and the fluid existing between the chamber portion and the cup portion flows into the external suction portion; an external guiding portion connected to the external suction portion for guiding the fluid flowing into the external suction portion; and an external discharge portion communicating with the external guiding portion for discharging the fluid moving through the external guiding portion to the outside.

[0014] In addition, the exhaust device for substrate processing is characterized in that the external suction part includes: a first external suction part configured to surround the outside of the cup part in a ring shape and mounted on the base part, and a space in which fluid can move is formed inside the first external suction part; and a second external suction part formed outside the first external suction part and having a hole into which fluid can flow.

[0015] In addition, the exhaust device for substrate processing is characterized in that the external discharge part includes: a first external discharge part connected to the base part and communicating with the external guide part; a second external discharge part connected to the first external discharge part and having open left and right sides; a third external discharge part connected to the second external discharge part and guiding fluid to a separation discharge part that separates and discharges according to each property; and a fourth external discharge part formed in the third external discharge part and adjusting the fluid discharge amount.

[0016] In the exhaust device for substrate processing according to the present invention, the internal exhaust part can quickly remove the substances floating inside the cup part, and the external exhaust part can quickly remove the substances floating inside the chamber part. Thus, it is possible to prevent the substrate from being contaminated by the floating substances and the substrate from being damaged due to the contamination of the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 FIG. is a schematic view showing an exhaust device for substrate processing according to an embodiment of the present invention.

[0018] Figure 2 FIG. is a schematic cross-sectional view showing an internal exhaust part according to an embodiment of the present invention.

[0019] Figure 3 FIG. is a schematic perspective view showing a cup part for mounting an internal exhaust part according to an embodiment of the present invention.

[0020] Figure 4 FIG. is a schematic view showing an internal discharge part according to an embodiment of the present invention.

[0021] Figure 5 FIG. is a schematic perspective view showing an external exhaust part according to an embodiment of the present invention.

[0022] Figure 6 FIG. is a schematic view showing an external suction part according to an embodiment of the present invention.

[0023] Figure 7 FIG. is a schematic view showing an external discharge part according to an embodiment of the present invention.

[0024] DESCRIPTION OF THE REFERENCE NUMERALS

[0025] 10: Chamber part; 20: Base part; 21: Base bottom plate part; 22: Base upper plate part; 30: Rotating shaft part; 40: Operation table part; 50: Cup part; 60: Internal exhaust part; 61: Internal suction part; 62: Internal guiding part; 63: Internal discharge part; 70: External exhaust part; 71: External suction part; 72: External guiding part; 73: External discharge part; 100: Substrate. Detailed implementation manners

[0026] Next, an embodiment of an exhaust device for substrate processing according to the present invention will be described with reference to the accompanying drawings. When describing, for the sake of clarity and convenience of description, sometimes the width of the lines shown in the drawings or the size of the constituent elements, etc. are exaggeratedly shown. Also, the terms described later are terms defined in view of the functions in the present invention, and may vary according to the will or habit of the user or operator. Therefore, these terms should be defined based on the overall content of this specification.

[0027] Figure 1 is a diagram schematically showing an exhaust device for substrate processing according to an embodiment of the present invention. Refer to Figure 1 , an exhaust device 1 for substrate processing according to an embodiment of the present invention includes a chamber part 10, a base part 20, a rotating shaft part 30, an operation table part 40, a cup part 50, and an internal exhaust part 60. Such an exhaust device 1 for substrate processing may further include an external exhaust part 70.

[0028] An operation space is formed inside the chamber part 10, and the substrate 100 can be taken in and out by opening or closing the door. The chamber part 10 is provided with a base part 20. Such a base part 20 can be arranged inside the chamber part 20.

[0029] The rotating shaft part 30 is installed on the base part 20, and the operation table part 40 is installed on the rotating shaft part 30 so as to be able to rotate. As the rotating shaft part 30 is driven, such an operation table part 40 rotates, and accordingly, the substrate 100 placed on the operation table part 40 rotates.

[0030] The cup part 50 is installed on the base part 20, and guides the chemical solution sprayed onto the substrate 100 in a manner of separating and recovering according to each component. As an example, when any one of the three cups of the cup part 50 moves upward, it surrounds the substrate 100, and can guide the alkaline chemical solution, acidic chemical solution, and organic chemical solution to be separated and discharged.

[0031] The internal exhaust part 60 is arranged between the rotating shaft part 30 and the cup part 50 and is used for exhausting fluid. As an example, the internal exhaust part 60 can forcibly discharge the gas existing between the rotating shaft part 30 and the cup part 50 and the substances contained in the gas to the outside. Such an internal exhaust part 60 uniformly and quickly sucks in the internal substances floating between the rotating shaft part 30 and the cup part 50, thereby preventing the substrate 100 from being damaged by contaminants.

[0032] The external exhaust part 70 is disposed outside the cup part 50 and is used to discharge fluid. As an example, the external exhaust part 70 can forcibly discharge the gas existing between the cup part 50 and the chamber part 10 and the substances contained in the gas to the outside. Such an external exhaust part 70 uniformly and rapidly sucks the internal substances of the chamber part 10, thereby preventing the substrate 100 from being damaged by contaminants.

[0033] The chamber part 10 according to an embodiment of the present invention includes a lower chamber part 11 and an upper chamber part 12. The lower chamber part 11 can cover the lower part of the base part 20, and the upper chamber part 12 can cover the upper part of the base part 20. At this time, the lower chamber part 11 can cover the mechanical chamber 90, and various mechanical devices for processing the substrate 100 are disposed at the mechanical chamber 90. In addition, the upper chamber part 12 surrounds the rotating shaft part 30, the operation table part 40, and the cup part 50, and can be enclosed in a manner of incorporating these components as needed, thereby stably maintaining the working environment of the substrate 100.

[0034] The base part 20 according to an embodiment of the present invention includes a base bottom plate part 21 and a base upper plate part 22.

[0035] The base bottom plate part 21 is coupled to the chamber part 10, and the internal exhaust part 60 is installed on the base bottom plate part 21. As an example, the base bottom plate part 21 may include a lower plate seat part 211 for installing the rotating shaft part 30 and a lower plate support part 212 extending upward from the lower plate seat part 211. The lower plate seat part 211 is coupled to the lower chamber part 11 and can be supported by a separate structure, and a mechanical chamber 90 can be formed below the lower plate seat part 211.

[0036] The base upper plate part 22 is coupled to the chamber part 10, and the external exhaust part 70 is installed on the base upper plate part 22. As an example, the base upper plate part 22 is disposed above the lower plate seat part 211 and can be supported by the lower plate support part 212. The side surface part of such a base upper plate part 22 can be covered by the upper chamber part 12.

[0037] Figure 2 It is a cross-sectional view schematically showing an internal exhaust part according to an embodiment of the present invention, Figure 3 It is a perspective view schematically showing a cup part for installing an internal exhaust part according to an embodiment of the present invention, Figure 4 It is a view schematically showing an internal discharge part according to an embodiment of the present invention. Referring to Figures 2 to 4 , the internal exhaust part 60 according to an embodiment of the present invention includes an internal suction part 61, an internal guide part 62, and an internal discharge part 63.

[0038] The inner suction part 61 is formed to surround the outside of the rotating shaft part 30, and the fluid existing between the cup part 50 and the rotating shaft part 30 flows into the inner suction part 61. As an example, the inner suction part 61 can be installed on the cup part 50.

[0039] More specifically, the cup part 50 can include: a cup base bottom part 51 installed on the lower plate seat part 211; and three cup covering parts 52 installed on the cup base bottom part 51 and capable of moving up and down.

[0040] In addition, the cup base bottom part 51 can include: a first cup base bottom part 511 placed on the lower plate seat part 211; a second cup base bottom part 512 extending upward from the inner circumferential surface of the first cup base bottom part 511 and through which the rotating shaft part 30 passes; and a third cup base bottom part 513 extending upward from the outer circumferential surface of the first cup base bottom part 511 to surround the cup covering parts 52. At this time, the inner suction part 61 can be configured to surround the second cup base bottom part 512, and a fourth cup base bottom part 514 protruding inward toward the inner suction part 61 is formed on the first cup base bottom part 511.

[0041] More specifically, the inner suction part 61 can include a first inner suction part 611, a second inner suction part 612, and a third inner suction part 613.

[0042] The lower end part of the first inner suction part 611 is in close contact with the lower plate seat part 211, and surrounds the second cup base bottom part 512 in such a way that the fourth cup base bottom part 514 contacts the inner side surface of the first inner suction part 611.

[0043] The second inner suction part 612 can extend inward from the upper end part of the first inner suction part 611 and be in close contact with the outer circumferential surface of the second cup base bottom part 512.

[0044] A plurality of third inner suction parts 613 are formed along the circumferential direction of the first inner suction part 611, and holes through which the fluid can pass can be formed. Such third inner suction parts 613 can be configured to have a uniform spacing distance, and according to needs, a plurality of third inner suction parts 613 can be concentratedly arranged or the sizes of the holes can be designed to be different.

[0045] The inner guiding part 62 is connected to the inner suction part 62 and guides the fluid flowing into the inner suction part 61. As an example, the inner guiding part 62 extends from a partial outer circumferential surface of the first inner suction part 611, and can guide the fluid to a fifth cup base bottom part 515 formed on the first cup base bottom part 511 to discharge the fluid to the outside. The lower end part of such an inner guiding part 62 can be in close contact with the first cup base bottom part 511, and the fourth cup base bottom part 514 can be arranged in a relative manner on the inner side surface.

[0046] The internal discharge part 63 communicates with the internal guiding part 62 and discharges the fluid moving through the internal guiding part 62 to the outside. As an example, the internal discharge part 63 can be directly connected to the first cup base part 511 or to the base part 20 and communicate with the fifth cup base part 515 to guide the movement of the fluid.

[0047] The internal discharge part 63 according to an embodiment of the present invention includes an internal conduit part 631, an internal opening / closing part 632, an internal motor part 633, an internal measurement part 634, and an internal control part 635.

[0048] The internal conduit part 631 is connected to the base part 20 and communicates with the internal guiding part 62. Such an internal conduit part 631 discharges the fluid moving through the internal guiding part 62 to the inside. As an example, one end part of the internal conduit part 631 can be connected to the bottom surface of the base bottom plate part 21, and the other end part can be connected to the separation discharge part 200. On the other hand, the cup covering part 52 moves up and down according to each property, and the alkaline fluid, acidic fluid, and organic fluid can be separated and discharged according to each property in the separation discharge part 200. At this time, the separation discharge part 200 can sense the working state of the cup covering part 52 to implement property separation.

[0049] The internal opening / closing part 632 opens or closes the internal conduit part 631. As an example, the internal conduit part 631 has a cylindrical shape. In addition, the internal opening / closing part 632 can have a disc shape and is rotatably installed on the internal conduit part 631 to open or close the internal conduit part 631.

[0050] The internal motor part 633 starts the internal opening / closing part 632. As an example, the internal motor part 633 can be installed outside the internal conduit part 631 and connected to the rotation shaft of the internal opening / closing part 632 to rotate the rotation shaft.

[0051] The internal measurement part 634 is installed in the chamber part 10 to measure the internal pressure of the chamber part 10. As an example, the internal measurement part 634 is installed inside the chamber part 10, and multiple ones can be evenly arranged at the upper and lower parts of the chamber part 10 as needed and can be arranged inside the cup part 50. Such an internal measurement part 634 can measure various atmospheric environments such as the temperature and humidity inside the chamber part 10.

[0052] The internal control part 635 receives the measurement signal of the internal measurement part 54 to control the internal motor part 633. Through such an internal control part 635, when the internal pressure of the chamber part 10 deviates from the set range, the internal motor part 633 is driven to guide the internal pressure of the chamber part 10 to maintain within the set range.

[0053] Figure 5is a perspective view schematically showing an external exhaust part according to an embodiment of the present invention. Refer to Figure 5 , the external exhaust part 70 according to an embodiment of the present invention includes an external suction part 71, an external guide part 72, and an external discharge part 73.

[0054] The external suction part 71 is formed to surround the outside of the cup part 50, and the fluid existing between the chamber part 10 and the cup part 50 flows into the external suction part 71. As an example, the external suction part 71 can be installed on the base upper plate part 22.

[0055] The external guide part 72 is connected to the external suction part 71 and guides the fluid flowing into the external suction part 71. As an example, the external guide part 72 can extend from a partial outer peripheral surface of the external suction part 71 and communicate with a hole formed in the base upper plate part 22.

[0056] The external discharge part 73 communicates with the external guide part 72 and discharges the fluid that has moved through the external guide part 72 to the outside. As an example, the external discharge part 73 can be coupled to the bottom surface of the base upper plate part 22.

[0057] Figure 6 is a view schematically showing an external suction part according to an embodiment of the present invention. Refer to Figure 6 , the external suction part 71 according to an embodiment of the present invention includes a first external suction part 711 and a second external suction part 712.

[0058] The first external suction part 711 is configured to surround the outside of the cup part 50 in a ring shape, is installed on the base part 20, and forms a space inside where the fluid can move. As an example, the first external suction part 711 can have a conduit shape with a cross-section forming a closed section or its lower end is open and is installed on the upper side of the base upper plate part 22.

[0059] The second external suction part 712 is formed outside the first external suction part 711 and forms a hole into which the fluid can flow. Such a second external suction part 712 can be configured to have a uniform spacing distance, and multiple can be concentratedly arranged as needed or the sizes of the holes can be designed to be different sizes.

[0060] Figure 7 is a view schematically showing an external discharge part according to an embodiment of the present invention. Refer to Figure 7 , the external discharge part 73 according to an embodiment of the present invention can include a first external discharge part 731, a second external discharge part 732, a third external discharge part 733, and a fourth external discharge part 734.

[0061] The first external discharge part 731 is connected to the base part 20 and communicates with the external guide part 72. As an example, the first external discharge part 731 can be joined to the bottom surface of the base upper plate part 22 and can extend rearward through the base lower plate part 21 to the machine room 90.

[0062] The second external discharge part 732 is connected to the first external discharge part 731 and is open on both the left and right sides. As an example, the second external discharge part 732 has a pipe shape for guiding fluid in three directions, and the upper part is connected to the first external discharge part 731, and the left end part is open, so that the fluid inside the machine room 90 can be discharged to the outside.

[0063] The third external discharge part 733 is connected to the second external discharge part 732 and guides fluid to the separation discharge part 200 that separates and discharges according to each property. As an example, the cup covering part 52 moves up and down according to each property, and the alkaline fluid, acidic fluid, and organic fluid can be separated and discharged according to each property in the separation discharge part 200. At this time, the separation discharge part 200 can sense the working state of the cup covering part 52 to perform property separation.

[0064] The fourth external discharge part 734 is formed on the third external discharge part 733 and is used to adjust the fluid discharge amount. As an example, the fourth external discharge part 734 can be a valve body capable of adjusting the fluid amount passing through the third external discharge part 733. Such a fourth external discharge part 734 can sense the internal state of the chamber part 10 or the state of the separation discharge part 200 and automatically adjust the discharge amount.

[0065] Next, an exhaust device for substrate processing according to an embodiment of the present invention having the above configuration will be described.

[0066] If the operation table part 40 rotates by the drive of the rotation shaft part 30, the substrate 100 loaded on the operation table part 40 rotates, and a chemical solution is sprayed onto the substrate 100 through various spray nozzles to perform the substrate 100 processing process.

[0067] At this time, the substrate 100 is disposed inside the cup part 50, and the chemical solution sprayed onto the substrate 100 can be divided into an alkaline chemical solution, an acidic chemical solution, and an organic chemical solution.

[0068] On the other hand, the internal exhaust part 60 is disposed between the rotation shaft part 30 and the cup part 50. Since such an internal exhaust part 60 forms a plurality of holes along the periphery of the internal suction part 61, floating substances floating between the rotation shaft part 30 and the cup part 50 can be uniformly and quickly sucked in, thereby preventing damage to the substrate 100 caused by the floating of contaminants. In addition, according to the process signal according to each property of the chemical solution, floating substances including the alkaline chemical solution, acidic chemical solution, and organic chemical solution can be distinguished and recovered.

[0069] In addition, the external exhaust portion 70 is disposed outside the cup portion 50. Since such an external exhaust portion 70 forms a plurality of holes along the periphery of the cup portion 50, it is possible to uniformly and rapidly suck in the floating substances floating inside the chamber portion 10, thereby preventing damage to the substrate 100 caused by the floating of contaminants.

[0070] In the exhaust apparatus 1 for substrate processing according to an embodiment of the present invention, the internal exhaust portion 60 can rapidly remove the substances floating inside the cup portion 50, and the external exhaust portion 70 rapidly removes the substances floating inside the chamber portion 10. Thereby, it is possible to prevent the substrate 100 from being contaminated by the floating substances and damage to the substrate caused by the contamination of the substrate 100.

[0071] The embodiments shown with reference to the accompanying drawings illustrate the present invention, but these embodiments are merely exemplary, and those skilled in the art should understand that various modifications and equivalent other embodiments can be obtained therefrom. Therefore, the true technical protection scope of the present invention should be defined based on the claims.

Claims

1. An exhaust device for substrate processing, characterized in that, Comprising: A chamber part; A base part, mounted on the chamber part; A rotating shaft part, mounted on the base part; An operation table part, mounted on the rotating shaft part and capable of rotating, and rotating the substrate placed on the operation table part; A cup part, mounted on the base part, guiding the liquid medicine sprayed onto the substrate in a manner of separating and recovering according to each component; An internal exhaust part, disposed between the rotating shaft part and the cup part, for exhausting fluid; And An external exhaust part, disposed outside the cup part, for exhausting fluid, The internal exhaust part includes an internal suction part, the internal suction part is formed to surround the outside of the rotating shaft part, and the fluid existing between the cup part and the rotating shaft part flows into the internal suction part, The cup part includes: a cup base bottom part, mounted on the lower plate seat for mounting the rotating shaft part; And a cup covering part, mounted on the cup base bottom part and capable of moving up and down according to the properties of the liquid medicine, The external exhaust part includes an external discharge part for discharging fluid to the outside.

2. The exhaust device for substrate processing according to claim 1, wherein The internal exhaust part further includes: An internal guiding part, connected to the internal suction part, guiding the fluid flowing into the internal suction part; and An internal discharge part, communicating with the internal guiding part, discharging the fluid moving through the internal guiding part to the outside.

3. The exhaust device for substrate processing according to claim 2, wherein The internal discharge part includes: An internal conduit part, connected to the base part and communicating with the internal guiding part; An internal opening / closing part, opening or closing the internal conduit part; An internal motor part, for starting the internal opening / closing part; An internal measuring part, mounted on the chamber part, measuring the internal pressure of the chamber part; and An internal control part, receiving the measurement signal of the internal measuring part to control the internal motor part.

4. The exhaust device for substrate processing according to claim 1, wherein The base part includes: A base lower plate part, combined with the chamber part and disposed below the base upper plate part, the internal exhaust part is mounted on the base lower plate part; and The base upper plate part, combined with the chamber part, the external exhaust part is mounted on the base upper plate part.

5. The exhaust device for substrate processing according to claim 1, wherein The external exhaust part further includes: An external suction part, formed to surround the outside of the cup part, and the fluid existing between the chamber part and the cup part flows into the external suction part; and An external guiding part, connected to the external suction part, guiding the fluid flowing into the external suction part, The external discharge part communicates with the external guiding part and discharges the fluid moving through the external guiding part to the outside.

6. The exhaust device for substrate processing according to claim 5, wherein The external suction part includes: A first external suction part, configured to surround the outside of the cup part in a ring shape and mounted on the base part, a space where the fluid can move is formed inside the first external suction part; and A second external suction part is formed on the outside of the first external suction part and forms a hole through which fluid can flow in.

7. The exhaust device for substrate processing according to claim 5, wherein: The external discharge part includes: A first external discharge part is connected to the base part and communicates with the external guiding part; A second external discharge part is connected to the first external discharge part and is open on both left and right sides; A third external discharge part is connected to the second external discharge part and guides fluid to a separation discharge part that separates and discharges according to each property; and A fourth external discharge part is formed on the third external discharge part to adjust the fluid discharge amount.

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