Substrate processing apparatus, reactor mover, and maintenance method

Abstract

The present disclosure relates to a substrate processing apparatus for processing a plurality of substrates. The apparatus includes a reactor mounted in the apparatus and configured for processing substrates, and a reactor mover for moving the reactor for maintenance. The reactor mover is constructed and arranged with an elevator to move the reactor to a lower height to allow a maintenance worker to access the reactor.

Description

Technical Field

[0001] This disclosure generally relates to substrate processing apparatus for processing multiple substrates. More specifically, this disclosure relates to substrate processing apparatus for processing multiple substrates, comprising: a reactor installed in the apparatus and configured for processing the substrates, and a reactor mover for moving the reactor for maintenance. Background Technology

[0002] To transport cassettes containing multiple substrates to a substrate processing apparatus, a cassette transporter can move substrate cassettes between cassette in / out ports, substrate transport locations, and / or storage devices. Storage devices may include cassette storage turntables for storing multiple cassettes. A substrate transport robot can be configured and arranged to transport substrates between cassettes at substrate transport locations and substrate supports in the lower region of the apparatus.

[0003] The lower region may optionally be equipped with a support conveying device, which may include a turntable or rotatable arm on which the support can be positioned. By rotating the turntable or rotatable arm, the support can be carried from an unloading and / or loading position to a processing position below the first or second reactor.

[0004] A lift can be installed in the lower area to raise the support with the substrate into the reactor, or lower the support with the processed substrate from the reactor. During processing in the reactor, the support and the substrate housed therein can be heated. The substrate support can be removed from the reactor using a lift, turntable, or rotatable arm for cooling after processing.

[0005] Substrate processing equipment may have reactors that require maintenance. For example, a reactor may include various components such as insulation, heating elements, temperature sensors, tubes, liners, syringes, venting devices, flanges, supports, and / or bases, which may be contaminated, damaged, or require only alteration during maintenance. Because these components can be very heavy and mounted at considerable height within the equipment, maintenance workers may find them difficult to access for maintenance. Summary of the Invention

[0006] This synopsis is provided to introduce some concepts in a simplified form. These concepts are further described in detail in the following detailed description of exemplary embodiments disclosed. This synopsis is not intended to identify key or essential features of the claimed subject matter, nor is it intended to limit the scope of the claimed subject matter.

[0007] Depending on the purpose, it may be desirable to provide a device that is easier for maintenance workers to maintain.

[0008] Therefore, a substrate processing apparatus for processing multiple substrates can be provided, comprising:

[0009] A reactor, which is installed in the device and configured to process the substrate; and

[0010] A reactor mover is used to move a reactor for maintenance. The reactor mover can be constructed and arranged with a lift to move the reactor to a lower height, thus allowing maintenance workers to access the reactor.

[0011] According to another embodiment, a reactor mover for maintaining a reactor in a movable substrate processing apparatus can be provided, wherein the reactor mover includes a lift and an offset device, the offset device being configured and arranged as follows:

[0012] The reactor was moved to a maintenance area outside the equipment using an offset device; and

[0013] The reactor was lowered to a maintenance area outside the shell using a lift.

[0014] According to another embodiment, a method for maintaining the reactor of a substrate processing apparatus can be provided by the following steps:

[0015] The reactor was moved to a maintenance area outside the equipment using an offset device;

[0016] The reactor was lowered to a maintenance area outside the shell using a lift; and

[0017] Provide maintenance for the reactor.

[0018] To summarize the invention and its advantages over the prior art, certain objects and advantages of the invention have been described above. It should be understood, of course, that not all of these objects or advantages may necessarily be achieved according to any particular embodiment of the invention. Therefore, for example, those skilled in the art will recognize that the invention may be practiced or performed in a manner that achieves or optimizes one or more advantages as taught or suggested herein, without necessarily achieving other objects or advantages as taught or suggested herein.

[0019] All of these embodiments are within the scope of the invention disclosed herein. These and other embodiments will become apparent to those skilled in the art from the following detailed description of certain embodiments with reference to the accompanying drawings, and the invention is not limited to any particular embodiment disclosed. Attached Figure Description

[0020] Although this specification concludes with claims, which specifically point out and clearly claim protection for what are considered embodiments of the invention, the advantages of the embodiments of this disclosure can be more readily determined from the description of certain examples of embodiments when read in conjunction with the accompanying drawings, wherein:

[0021] Figure 1A schematic top view of an example of a substrate processing apparatus according to an embodiment is shown.

[0022] Figure 2A This shows the process during reactor maintenance. Figure 1 A schematic top view of a portion of a substrate processing apparatus.

[0023] Figure 2B This shows the process during reactor replacement. Figure 1 A schematic top view of a portion of a substrate processing apparatus.

[0024] Figure 2C A schematic top view of a reactor mover for moving a reactor for maintenance, according to an embodiment, is shown.

[0025] Figure 2D A perspective side view of a reactor mover for moving a reactor for maintenance, according to an embodiment, is shown.

[0026] Figure 2E A perspective side view of a reactor mover for moving a reactor for maintenance, according to an embodiment, is shown.

[0027] Figure 3A and 3B A side view of the reactor being removed from the substrate processing equipment during maintenance, according to an embodiment, is shown.

[0028] Figure 4 Figures A) to C) show side views of a reactor removed from a substrate processing apparatus during maintenance, according to an embodiment.

[0029] Figure 5 Figures A) and B) show side views of a reactor removed from a substrate processing apparatus during maintenance, according to an embodiment.

[0030] Figure 6 Figures A) to C) show side views of a reactor removed from a substrate processing apparatus during maintenance, according to an embodiment. Detailed Implementation

[0031] Although certain embodiments and examples are disclosed below, those skilled in the art will understand that the invention extends beyond the specific disclosed embodiments and / or uses of the invention, as well as obvious modifications and equivalents thereof. Therefore, it is intended that the scope of the disclosed invention should not be limited to the specific disclosed embodiments described below. The illustrations provided herein are not intended to be actual views of any particular material, structure, or device, but are merely idealized representations used to describe embodiments of this disclosure.

[0032] As used herein, the terms “substrate” or “wafer” can refer to any underlying material that can be used, or a material on which devices, circuits, or films can be formed. The term “semiconductor device structure” can refer to any portion of a semiconductor structure that is, includes, or defines at least a portion of the active or passive components of a semiconductor device to be formed on or in a semiconductor substrate. For example, a semiconductor device structure can include active and passive components of an integrated circuit, such as transistors, memory elements, transducers, capacitors, resistors, wires, conductive vias, and conductive pads.

[0033] Figure 1 A schematic top view of an example of a substrate processing apparatus 1 according to an embodiment is shown. The substrate processing apparatus 1 includes a housing 2 having a front wall 4 and a rear wall 6.

[0034] The substrate processing apparatus 1 may include a storage device, such as a cartridge storage turntable 3 for storing multiple wafer cassettes C, each wafer cassette accommodating multiple substrates. The cartridge storage turntable 3 may include multiple platform stages for supporting the cassettes. The platform stages may be connected to a central support mounted to be rotatable about a vertical axis 5. Each platform stage may be configured to accommodate multiple cassettes C. A drive assembly may be operatively connected to the central support for rotating the central support together with the platform stages about the vertical axis 5.

[0035] The substrate processing apparatus 1 may have a cassette transporter 7 including a cassette transporter arm 9 configured to transport cassettes C between a cassette storage turntable 3, a cassette in / out port 11 adjacent to the front wall 4 of the housing 2 of the substrate processing apparatus 1, and / or a substrate transfer position 15. The cassette transporter 7 may include a lifting mechanism to reach cassettes at different heights. Each platform stage for storing cassettes may have a cutout therein, the size and shape of which allows the cassette transporter arm 9 to pass vertically through it and allows the platform stage to support the cassette C thereon.

[0036] An inner wall 19 may be provided to separate the cassette transporter 7 and the substrate transport robot 35. This wall may have a closable substrate entry opening 33 adjacent to the substrate transport position 15, which may be constructed and arranged to also open the cassette. Further information regarding the closable substrate entry opening 33 for opening the cassette is available from US Patent No. 6,481,945, which is incorporated herein by reference. The substrate transport position 15 may be provided with a cassette that is rotatable to rotate the cassette C and / or press it against the closable substrate entry opening 33.

[0037] The substrate processing equipment may include a substrate handling robot 35 equipped with a substrate handling arm 36 for transferring substrates from a cassette C located at a substrate transfer position 15 through a closable substrate entry opening 33 to a substrate holder, and vice versa. The substrate processing equipment may include a substrate handling chamber 37, in which the substrate handling robot 35 is housed.

[0038] The housing 2 may have first and second sidewalls 47 extending along the entire length of the substrate processing apparatus 1. The distance between the sidewalls 47 of the substrate processing apparatus, which may define the width of the apparatus, may be between 190 and 250 cm, preferably between 210 and 230 cm, and most preferably around 220 cm. Maintenance of the substrate processing apparatus 1 can be performed from the rear 6 or the front 4 of the substrate processing apparatus, thus eliminating the need for doors in the sidewalls 47.

[0039] By utilizing the construction of the sidewall 47 without doors, multiple substrate processing devices 1 can be placed side-by-side in a semiconductor manufacturing plant. Therefore, the sidewalls of adjacent substrate processing devices can be placed very close together, or even opposite each other. Advantageously, multiple substrate processing devices can form a wall, wherein the front side 4 of the substrate processing device 1 is connected to a cartridge transport device in a very clean environment, a so-called "cleanroom," where particle requirements are very stringent. The back side 6 of the substrate processing device 1 can be connected to a maintenance channel, which may have less stringent particle requirements than the front side 4.

[0040] The substrate processing apparatus 1 may be provided with first and second reactors 45 for processing multiple substrates. Using two reactors can improve the productivity of the substrate processing apparatus 1. The reactor 45 may include various components such as insulating materials, heating elements, temperature sensors, tubes, liners, syringes, exhaust devices, flanges, supports, and / or bases.

[0041] The substrate processing apparatus in the top view can be configured in a generally U-shape. First and second reactors 45 can be constructed and arranged within the legs. The first and second reactors 45 can be located at the lower part of the U-shaped legs.

[0042] The maintenance area 43 can be constructed and arranged between the U-shaped legs. The distance between the two legs of the U-shape can be between 60 and 120 cm, more preferably between 80 and 100 cm, and most preferably around 90 cm, to allow maintenance workers sufficient space. A rear door 42 can be provided between the U-shaped legs to close the maintenance area 43 when not in use. The general U-shape can also include a V-shape.

[0043] Figure 2A This shows maintenance during which rear door 42 is open. Figure 1A schematic top view of the rear of the substrate processing equipment. The equipment can be constructed and arranged to allow maintenance workers M to access the first and second reactors from maintenance area 43 to maintain reactor 45. For example, it is used for maintenance workers M to maintain heating elements, heating sensors, and / or process gas interfaces 65 (outlets and / or inlets). The two reactors 45 can be constructed and arranged adjacent to the same maintenance area 43 to allow maintenance of both reactors 45 from the same maintenance area 43. Reactor doors 41 can be opened to allow maintenance of reactor 45.

[0044] Therefore, maintenance worker M cannot enter the housing 2 of the substrate processing equipment 1 to perform maintenance work on the reactor 45. This minimizes the risk of injury to maintenance worker M and / or contamination of the lower area and / or reactor 45. Maintenance from outside the housing also improves the speed and / or accuracy of maintenance. By using the same maintenance area for both reactors 45, the total footprint of the equipment can be reduced.

[0045] Reactor 45 can be housed within processing module 49, which may further include a lower region of substrate processing equipment 1. This lower region is equipped with a lift configured to transport a support or boat containing substrates between the lower region and reactor 45. The lift may also be constructed and arranged within U-shaped legs. Gate valve 63 can be positioned between substrate transporter 35 and the lower region of processing module 49, thereby creating a microenvironment in the lower region.

[0046] A support conveyor 55 for transporting supports may be disposed in the lower region of the substrate processing apparatus. The support conveyor 55 may include two receiving portions 57 for the supports. Alternatively, the support conveyor may include three or four receiving portions for the supports. The support conveyor 55 may be constructed and arranged in U-shaped legs and a bottom. The support conveyor 55 may be constructed and arranged to horizontally transport supports between multiple support locations in the lower region.

[0047] The receiving section 57 can be a cooling receiving section for cooling the support of the hot substrate that has just been processed. The cooling receiving section may be provided with a gas inlet and an outlet. The gas inlet and outlet may be fluidly connected to a pump to generate an airflow through the microenvironment in the lower region.

[0048] Module 49 may be equipped with a lift configured to transport a support with substrates between the lower region of the substrate processing apparatus and the reactor 45. The lift may include a support arm having a support surface configured to support the substrate support. The support conveyor 55 may have a support platform with a cutout. The size and shape of the cutout allow the support surface of the support arm to translate vertically through it and allow the platform to support the substrate support. The support conveyor 55 may be rotatable to transport the support horizontally from a position near the substrate handling robot 35 to a position below the reactor 45.

[0049] Processing module 49 may be provided with a reactor door 41 that can be opened in the direction of maintenance area 43. Two processing modules 49 may be provided with separate reactor doors 41 to allow maintenance workers M to maintain each reactor 55 from the same maintenance area 43. The reactor doors 41 of processing modules 49 may also allow maintenance of the lower area of ​​the substrate processing equipment from the same maintenance area 43 for maintenance of the support conveyor 55, gas inlet, gas outlet, gate valve 63, elevator and / or support.

[0050] Alternatively, each processing module may be equipped with two reactor doors: a first reactor door for entering reactor 45 and a second reactor door for entering the lower region of the substrate processing equipment. For example, maintenance may be required for the support conveyor 55, gas inlet, gas outlet, gate valve 63, elevator, and / or support for entering the lower region of the substrate processing equipment.

[0051] Therefore, maintenance worker M may not need to enter the housing 2 of the substrate processing equipment 1 to perform maintenance work inside the processing module 49. This minimizes the risk of injury to maintenance worker M and / or contamination inside the processing module.

[0052] Gate valve 63 can be disposed between substrate processing chamber 37 and processing module 49. Gate valve 63 can be closed during maintenance of substrate handling robot 35, allowing processing module to continue operating while substrate handling robot 35 is being maintained.

[0053] Maintenance of one of reactors 45 will not interfere with the other reactor 45, as they are constructed as independent units. Gate valve 63 can be closed during maintenance of one reactor, allowing the other reactor and the substrate handling robot 35 to continue operating.

[0054] Reactor 45 may have a process gas interface 65 (outlet and / or inlet) which can be connected to an exhaust pipe or a process gas delivery system. The process gas interface 65 may be located adjacent to maintenance area 43 for easy access during maintenance.

[0055] The process gas delivery system may be (partially) housed in a gas holder 67, which is configured and arranged to supply process gas to the first and / or second reactor 45. The gas holder may be positioned near the top of the legs of the U-shape. Positioning the gas holder near the top of the U-shape facilitates maintenance. Furthermore, this location provides flexibility should the gas holder require adjustment or expansion, as there is space at the rear of the equipment where critical components such as substrate transporters or box transporters are not located.

[0056] The exhaust pipe can be constructed and arranged to remove process gas from at least one of the first and second reactors, and can also be located near the top of the U-shaped leg. Positioning the exhaust pipe within the U-shaped leg facilitates maintenance. The exhaust pipe can be equipped with a pump and scrubber, which may require regular maintenance. Furthermore, this location offers flexibility should the exhaust pipe need adjustment or extension, as there is space at the rear of the equipment where critical components such as substrate handling robots and / or box handlers are not located.

[0057] Figure 2B This shows maintenance during which rear door 42 is open. Figure 1 A schematic top view of the rear of the substrate processing equipment. Reactor maintenance may include replacing large components such as the reactor, reactor tubing, substrate support, heating elements, doors, pumps, and / or valves.

[0058] A maintenance worker M, standing in maintenance area 43 outside the casing 2, can remove reactor 45 from the equipment, for example. Such large components (including the tools used for their safe transport) may require a large maintenance area 43. Because the same maintenance area 43 can be used for two reactors 45, the footprint of maintenance area 43 can be reduced. An opening at the rear 6 of the equipment facilitates the transport of larger components, such as reactor 45, out of the equipment.

[0059] Figure 2C A mobile reactor 45 is shown. Figure 1 and 2A A schematic top view of a reactor mover 69 for maintenance (2B). The reactor mover 69 can be mounted to the substrate processing device 1 at the first end 71. Figure 1 The frame at one end is attached to the reactor 45 by a suspension frame, such as a C-shaped frame 92, at the other end. The C-shaped frame 92 may be constructed and arranged to at least partially surround the reactor 45.

[0060] The reactor mover 69 may be configured and equipped with an offset 73 to move the reactor 45 to the maintenance area 43 in a substantially horizontal direction. Figure 2A (Middle). The maintenance area 43 can be located outside the equipment housing, and the offset device 73 can move the reactor 45 there. The offset device 73 may be equipped with a swing mechanism 94.

[0061] The oscillating mechanism 94 can be configured and arranged to oscillate the reactor about a fundamental vertical axis. The oscillating mechanism 94 may include a first hinge 76 and an oscillating arm 77 oscillating about a first fundamental vertical axis. The oscillating mechanism 94 may include a second hinge 78, through which the reactor may be supported by the oscillating arm 77 via the second hinge 78 oscillating about a second fundamental vertical axis. The oscillating mechanism 94 may include a third hinge 79, through which the reactor 45 may be supported by the oscillating arm 77 via the third hinge oscillating about a third fundamental vertical axis.

[0062] The construction with three hinges 76, 78, and 79 and their respective vertical axes allows the reactor to move relatively freely in the horizontal plane, enabling it to be positioned correctly on the flange 25. This movement can be accomplished manually or by a motor.

[0063] Figure 2D A mobile reactor 45 is shown. Figure 1 and 2A (2B) A perspective side view of a reactor mover 69 for maintenance. The reactor mover 69 may be constructed and arranged with a lift 80 for moving the reactor up and down. The lift 80 can be used to bring the reactor to a lower height to allow maintenance workers to access the reactor.

[0064] The elevator 80 can be configured as a linear guide mechanism, which includes a linear guide 81 in the second hinge 78. The linear guide mechanism can guide the reactor in a substantially vertical direction on the substantially vertical linear guide 81. The C-shaped frame 92 can form part of a bracket movable along the linear guide 81 via a third hinge 79.

[0065] The bracket, and therefore the C-shaped frame 92, can be driven up and down by the threaded pin 82 in the rotatable nut 83. A motor or hand crank 84 can rotate the rotatable nut 83 via a transmission device and move the C-shaped frame up and down on the linear guide 81. In this way, the elevator 80 can be formed in the swing mechanism 94 to move the reactor in a substantially vertical direction in a compact design.

[0066] A portion of the swing arm 77 connects to a first hinge 76 and a second hinge 78. The elevator 80 can be constructed and arranged to move the second hinge 78 relative to the first hinge 76.

[0067] The reactor mover 69 can use the elevator 80 to move the reactor upward within the housing of the equipment 1, can use the offset device 73 to move the reactor to the maintenance area 43 outside the housing of the equipment 1, and can use the elevator 80 to lower the reactor 45 into the maintenance area 43 outside the housing.

[0068] Alternatively, a linear guide mechanism that forms part of the offset can move the reactor in a basic horizontal direction to a maintenance area on a basic horizontal linear guide.

[0069] The substrate processing apparatus 1 may be provided with two reactors 45, and a single reactor mover 69 may be configured and arranged to move each reactor 45 to a maintenance area 43. For both reactors 45, the maintenance area 43 may be the same. The maintenance area may be located between the first and second reactors. The apparatus may be provided with two reactor movers 69, each configured and arranged to move one of the first and second reactors 45 to the maintenance area 43.

[0070] Figure 2E A mobile reactor 45 is shown. Figure 1 and 2A (2B and 2C) A perspective side view of the reactor mover 69 for maintenance. The reactor bottom support 87 may be part of the reactor 45 (not shown). The reactor bottom support 87 may support the rest of the reactor 45 located on top of it. The reactor bottom support 87 may be provided with an air circulation duct 86.

[0071] The reactor mover may be equipped with a suspension frame, and the reactor 45 may be suspended from the suspension frame by elongated suspension members 85. During lifting and moving of the reactor 45, the reactor bottom support 87 may be suspended from the reactor mover 69 by the elongated suspension members 85. More specifically, the bottom support 87 may be suspended from the reactor mover 69 by a suspension frame, such as a C-frame 92, and three elongated suspension members 85, which may be cables or rods. The elongated suspension members 85 may be equipped with cable tensioners 89, such as screw clips, to adjust the position of the reactor 45 in the reactor mover during lifting.

[0072] The C-shaped frame 92 and three elongated suspension members 85 create space between them for the majority of the reactor 45 to be suspended. The center of gravity of the reactor 45 can be between the suspension members 85. For this purpose, the C-shaped frame can therefore surround the reactor 45 by more than 180 degrees, for example, about 200 degrees. The C-shaped frame 92 may still have an opening on the open side of the C-shaped frame 92, which allows the reactor 45 (partially) to be moved into and mounted on the bottom support member 87. The elongated suspension members can be aligned vertically. The suspension members 85 may only bear tensile stress.

[0073] when Figure 2DWhen the lift 80 lowers the reactor on the flange, the three suspension members 85 allow the reactor 45 to rest itself on the flange 25. Tension on the suspension members 85 can then be released by slightly lowering the C-frame 92 using the lift. The suspension members 85 can be flexibly connected to the C-frame 92 and the reactor bottom support 87.

[0074] Figure 3A and 3B A side view of reactor 45 being removed from the substrate processing equipment during maintenance is shown. Figure 3A In step 93, reactor 45 can be moved from a position above the microenvironment 70 in the lower region into maintenance area 43 for maintenance. This can be accomplished, for example, by a reactor mover equipped with a lift and offset mechanism. As shown, a common cable 29, for example for power or cooling water, can connect reactor 45 to the rest of the equipment, and this movement can be permitted by having additional length.

[0075] The lift can be used to move reactor 45 to a lower height to allow maintenance worker M to access the reactor, such as... Figure 3B As shown. Before removing the reactor from the equipment, a lift can also be used to move the reactor higher, detaching it from its supports. The offset may include a linear guide mechanism or a swing mechanism (not shown) to move the reactor 45 horizontally to the maintenance area 43. The maintenance area 43 may be outside the housing of the processing equipment. A door in the housing can be opened to allow the reactor 45 to be removed from the housing.

[0076] like Figure 3B As shown, maintenance worker M can perform maintenance actions, such as removing insulation material, heating element 23, temperature sensor, pipe 24, and flange 26 from reactor 45. To assist maintenance workers in maintaining the equipment, a lift can be used to lower reactor 45 94 to a height suitable for maintenance.

[0077] Maintenance worker M can remove support 96 from the microenvironment 70 at 95. Obviously, to remove support 96, reactor 45 may not need to be in the removed position, but can remain in its treatment position above the microenvironment 70. Another tool can be used to remove tube 24. It is clear that not only tube 24 can be removed, but also flange 25 and optional heating element 23.

[0078] Figure 4 Figures A) to C) show side views of a reactor removed from a substrate processing apparatus during maintenance, according to an embodiment. Figure 4 It can be shown in more detail that they can be combined Figure 1 The maintenance operations performed by the system described in section 2.

[0079] exist Figure 4 In A), reactor 45 is in the processing position and, for simplicity, is shown without heating element 23. In this embodiment, reactor 45 may be provided with tube 24a and liner 24b. Tube 24a and liner 24b may be supported on one or more flanges 25.

[0080] This configuration can be used in low-pressure applications, where the process gas flows upward in the inner tube 24a and downward in the space between the inner process tube 24b and the outer process tube 24a toward the exhaust device. The exhaust device 68 can be configured to communicate with a vacuum pump for discharging the process gas.

[0081] The bracket 26, supported on the base 27, door panel 28, and lower plate 72, can be positioned within a miniature environment 70 enclosed by the housing 70a. A lift (not shown) can raise the lower plate 72, including the door panel 28, base 27, and bracket 26, to its highest position, where the lower plate 72 seals the top and back surfaces 74 of the miniature environment 70, while the door panel 28 seals the flange 25, as... Figure 4 As shown in B). In addition, the door panel 28 can be secured to the flange 25 by a locking device (not shown).

[0082] Then, as Figure 4 As shown in C), reactor 45 can be raised as a whole 97a, optionally after disconnecting gas, vacuum, and other piping and connections, as required by a lift (not shown). Finally, reactor 45 can be moved horizontally 97b away from the microenvironment 70 via an offset device (not shown) together with one or more of the flange 25, pipe 24a and liner 24b, exhaust device 68, support 26, base 27, and door panel 28 to allow for maintenance operations. The lift and offset device can be part of a reactor mover. During reactor removal, microenvironment 70 can be sealed by lower plate 72, and pipe 24 can be sealed by door panel 28, thus preventing contamination during maintenance operations.

[0083] Moving the reactor 45, which includes the support 26, base 27, and door panel 28, makes it possible to replace the support 26 and base 27 at an external location. This may be advantageous if access to the microenvironment 70 is limited, or if the microenvironment is preferably not opened to keep it clean.

[0084] Figure 5 A side view of the reactor being removed from the substrate processing equipment during maintenance, according to an embodiment, is shown. Figure 5 In embodiment A), reactor 45 is in the processing position and, for simplicity, is shown without heating element 23. In this embodiment, reactor 45 is provided with tube 24a and liner 24b. Tube 24a and liner 24b may be supported on one or more flanges 25a, 25b.

[0085] like Figure 5 As shown in B), reactor 45 can be lifted together with the first flange 25a using a lift (not shown), and the first flange 25a can be mounted to pipe 24a via a mounting mechanism (not shown). This mounting mechanism can be provided by a maintenance worker, or a permanent mounting for connecting the first flange to the pipe can exist. The second flange 25b can be retained on the microenvironment 70.

[0086] Moving the reactor 45 with the first flange 25a makes it possible to replace the first flange 25a at an external location. Maintenance can also be provided for components supported on the first flange 25a, such as the liner 24b and / or the syringe (not shown). The second flange 25b can remain in the device in a miniature environment, so that the venting device connected to the second flange 25b does not need to be disconnected to remove the reactor 45.

[0087] Figure 6 A side view of the reactor being removed from the substrate processing equipment during maintenance, according to an embodiment, is shown. Figure 6 In A), reactor 45 is in the processing position, and for simplicity, it is again shown without heating element 23. In this embodiment, reactor 45, provided with tube 24a and liner 24b, may also be supported on one or more flanges 25a, 25b.

[0088] like Figure 6 As shown in B), reactor 45 can be lifted by a lift along with flanges 25a and 25b. A clamping mechanism can be used to clamp one or more flanges onto reactor 45. More specifically, the second flange 25b can be clamped to the first flange 25a by a clamp 30 acting as the clamping mechanism. For this purpose, the clamp 30 can be provided by a maintenance worker for removing the second flange 25b. The clamp 30 can also be permanently installed in the equipment such that if the first flange 25a needs to be removed separately from the second flange 25b, as... Figure 5 As shown, it can be released by maintenance workers.

[0089] like Figure 6 As shown in C), the reactor 45 with flanges 25a and 25b is moved using an offset device (not shown) so that maintenance of the second flange 25b can be performed outside the equipment. For example, the second flange 25b and the exhaust device attached thereto can be cleaned or even completely replaced. If the second flange 25b is removed, the exhaust device may need to be disconnected from the rest of the equipment. The elevator and offset device can be part of the reactor mover.

[0090] Although illustrative embodiments of the invention have been described above in part with reference to the accompanying drawings, it should be understood that the invention is not limited to these embodiments. By studying the drawings, the disclosure, and the appended claims, those skilled in the art will understand and implement variations of the disclosed embodiments in practicing the claimed invention.

[0091] Throughout this specification, references to "an embodiment" or "one embodiment" mean that a particular feature, structure, or characteristic described in connection with that embodiment is included in at least one embodiment of the invention. Therefore, the phrases "in one embodiment" or "in one embodiment" appearing in different places throughout the specification do not necessarily refer to the same embodiment. Furthermore, note that specific features, structures, or characteristics of one or more embodiments can be combined in any suitable manner to form new embodiments not explicitly described.

Claims

1. A substrate processing apparatus for processing multiple substrates, comprising: A reactor, which is installed in the device and configured to process substrates; as well as A reactor mover for moving a reactor for maintenance, wherein the reactor mover is constructed and arranged to have a lift to move the reactor to a lower height, thereby allowing maintenance workers to access the reactor; The reactor mover is constructed and arranged to have an offset device to move the reactor to the maintenance area in a substantially horizontal direction. The offset device is provided with a swing mechanism, which is constructed and arranged to swing the reactor about a substantially vertical axis. The swing mechanism includes a first hinge and a swing arm, which can swing around a substantially vertical axis by the first hinge while supporting the reactor.

2. The substrate processing apparatus according to claim 1, wherein, The offset device is constructed and arranged to move the reactor to a maintenance area outside the housing of the equipment.

3. The substrate processing apparatus according to claim 1, wherein, The reactor is installed in the equipment at a first height, and the elevator is constructed and arranged to move the reactor to a height lower than the first height to allow maintenance workers to access the reactor.

4. The substrate processing apparatus according to claim 1, wherein, The swing mechanism includes a second hinge, and the reactor is supported by the swing arm via the second hinge, which is oscillating about a second fundamental vertical axis.

5. The substrate processing apparatus according to claim 4, wherein, The swing mechanism includes a third hinge, and the reactor is supported by the swing arm via the third hinge, which is oscillating about a third fundamental vertical axis.

6. The substrate processing apparatus according to claim 1, wherein, The reactor mover is provided with a linear guide mechanism, which includes a linear guide, a bracket, a motor and / or a hand crank to support and move the reactor on the linear guide.

7. The substrate processing apparatus according to claim 6, wherein, The linear guide mechanism forms part of the offset to move the reactor to the maintenance area along a generally horizontal direction on a generally horizontal linear guide.

8. The substrate processing apparatus according to claim 6, wherein, The linear guide mechanism forms part of the elevator to move the reactor in a substantially vertical direction on a substantially vertical guide.

9. The substrate processing apparatus of claim 8, wherein the elevator is formed in the swing mechanism to move the reactor in a substantially vertical direction.

10. The substrate processing apparatus according to claim 9, wherein, The swing mechanism includes first and second hinges, and a portion of the swing arm is connected to the first and second hinges, and the elevator is configured and arranged to move at least one of the first and second hinges relative to the other of the first and second hinges.

11. The substrate processing apparatus according to claim 3, wherein, The equipment is equipped with the reactor mover to: The reactor is lifted within the housing of the equipment using the elevator; The reactor is moved to a maintenance area outside the housing of the equipment using the offset device; as well as The reactor is lowered to a maintenance area outside the shell using the elevator.

12. The substrate processing apparatus according to claim 1, wherein, The reactor is mounted on a flange in the device, and the device is configured and arranged to clamp the flange to the reactor, and the reactor mover is configured and arranged to move the reactor together with the flange for maintenance.

13. The substrate processing apparatus according to claim 1, wherein, The device is provided with first and second reactors, and the reactor mover is constructed and arranged to move the reactors to a maintenance area located between the first and second reactors.

14. The substrate processing apparatus according to claim 13, wherein, The device is equipped with a first reactor mover and a second reactor mover, the first reactor mover being configured and arranged to move the first reactor to a maintenance area, and the second reactor mover being configured and arranged to move the second reactor to the same maintenance area.

15. The substrate processing apparatus according to claim 1, wherein, The reactor mover is provided with a suspension frame, and the reactor is suspended from the suspension frame by slender suspension members.

16. The substrate processing apparatus according to claim 15, wherein, At least one slender suspension element is aligned with the vertical direction.

17. A reactor mover for moving a reactor in a substrate processing apparatus for maintenance, wherein the reactor mover includes a lift and an offset device, the offset device being configured and arranged such that: The reactor was moved to a maintenance area outside the equipment using an offset device; and The reactor was lowered to a maintenance area outside the shell using a lift; in, The offset device is provided with a swinging mechanism, which is constructed and arranged to swing the reactor about a substantially vertical axis. The swing mechanism includes a first hinge and a swing arm, which can swing around a substantially vertical axis by the first hinge while supporting the reactor.

18. A method for maintaining a reactor in a substrate processing apparatus using the reactor mover as described in claim 17 through the following steps: The reactor was moved to a maintenance area outside the equipment using an offset device; The reactor was lowered to a maintenance area outside the shell using a lift; and Provide maintenance for the reactor.

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