A device for preventing frictional dust from existing on the surface of a substrate

Abstract

The present invention relates to a device for preventing frictional dust from existing on the surface of a substrate, comprising: a table plate, on which a raised placement platform is provided, the top surface of the placement platform is used for placing the substrate, and the area of the top surface of the placement platform is larger than the area of the substrate, and the table plate can reciprocate in the vertical direction; a support block, the support block is arranged on the table plate and distributed around the placement platform, a clamping space is arranged on the support block, and the height of the support block is lower than the height of the placement platform; a mask frame, the end face of the mask frame close to the table plate is a groove structure, the projection of the bottom surface of the groove of the mask frame on the table plate covers the placement platform, and the side wall of the groove of the mask frame is fixed in the clamping space.

Description

Technical Field

[0001] The present invention relates to the field of display technologies, and in particular, to a device for preventing frictional dust from existing on the surface of a substrate. Background Art

[0002] For an OLED (Organic Light-Emitting Diode) display panel or a TFT-LCD (Thin Film Transistor Liquid Crystal Display) display panel, a CVD (Chemical Vapor Deposition) process is required to deposit a film layer on a substrate during the manufacturing process. Before CVD, the substrate needs to be placed on a liftable platen. After the substrate is placed on the platen, the platen rises a certain distance until the platen contacts a shadow frame. The platen and the shadow frame cooperate to clamp the substrate to prevent the substrate from being displaced when the platen moves. Then, the platen and the shadow frame move together to the CVD station so that the substrate can deposit the film layer.

[0003] However, the technical problem existing in the prior art is that the existing platen and shadow frame are both made of aluminum or aluminum alloy materials. Therefore, during the process of the substrate moving to the CVD station, the platen and the shadow frame will generate frictional dust due to factors such as impact and friction. As a result, there is a situation where the frictional dust falls on the edge of the substrate. If the substrate with frictional dust undergoes CVD, then there will be in-film ash on the substrate after the film layer is deposited. The in-film ash will cause defects such as missing pens and bright spots in the product. Once these occur, the product has to be scrapped. Summary of the Invention

[0004] In view of the technical problems existing in the prior art, the present invention provides a device for preventing frictional dust from existing on the surface of a substrate, and the device includes:

[0005] A platen, on which a raised placement platform is provided. The top surface of the placement platform is used to place the substrate, and the area of the top surface of the placement platform is larger than the area of the substrate. The platen can reciprocally move in the vertical direction;

[0006] Support blocks, which are arranged on the platen and distributed around the placement platform. A clamping space is provided on the support blocks, and the height of the support blocks is lower than the height of the placement platform;

[0007] A shadow frame, the end face of the shadow frame close to the platen is a groove structure. The bottom surface of the groove of the shadow frame projects onto the platen to cover the placement platform, and the side walls of the groove of the shadow frame are fixed in the clamping space.

[0008] The clamping space includes: a first side wall and a second side wall.

[0009] The side walls of the groove of the mask frame are located between the first side wall and the second side wall, and the side walls of the groove of the mask frame are respectively in contact with the first side wall and the second side wall.

[0010] In an embodiment of the present invention, the clamping space is a receiving groove, and the bottom of the receiving groove is located on the support block. And the receiving groove extends in a direction parallel to the side of the substrate closest to it.

[0011] In an embodiment of the present invention, the support block is of an integral structure.

[0012] In an embodiment of the present invention, multiple support blocks are independent of each other.

[0013] The device of the present invention fixes the side walls of the groove of the mask frame in the clamping space, so as to increase the fixing effect of the support block on the mask frame and prevent friction dust from being generated by the direct contact between the protection platen and the mask frame.

[0014] If the support block needs to achieve the above technical effects, the support block needs to meet: 1. The material for preparing the support block needs to have excellent friction resistance and a low wear rate; 2. The ratio of the dynamic friction coefficient to the static friction coefficient of the support block needs to be as high as possible; 3. The support block needs to have a high hardness and as high a stiffness as possible. When the support block meets the above requirements, the support block will not slip during the contact with the mask frame, and at the same time, it can avoid the generation of friction dust due to factors such as impact and friction.

[0015] Therefore, the material for preparing the support block includes the following components in parts by weight: 20-30 parts of acrylate; 3-9 parts of molybdenum disulfide; 0.5-1.3 parts of magnesium oxide; 1-3 parts of silicon oxide; 2-7 parts of calcium carbonate; 3-5 parts of zirconium oxide; 3-7 parts of graphite; 5-9 parts of acrylic carboxyethanol ester; 1-3 parts of kaolin; 0.3-0.7 parts of hydroxybutyronitrile rubber.

[0016] Compared with the prior art, the beneficial effect of the present invention is: a device for preventing friction dust on the surface of the substrate provided by the present invention. The placement platform on the platen moves into the inside of the groove of the mask frame, and the outer side wall of the placement platform does not contact the inner side wall of the groove of the mask frame. The placement platform moves until the bottom surface of the groove of the mask frame contacts the substrate. At this time, the substrate is clamped between the placement platform and the bottom surface of the groove of the mask frame. At the same time, the side walls of the groove of the mask frame are fixed in the clamping space, and the mask frame contacts the support block on the platen. Therefore, even if there is slight friction or impact between the mask frame and the support block during the movement of the platen, it is not easy to generate dust, and further prevent friction dust from falling on the substrate. Description of the Drawings

[0017] The accompanying drawings further illustrate the present invention, but the embodiments in the drawings do not constitute any limitation to the present invention.

[0018] Figure 1 The top view of the existing platen provided for the comparative example of the present invention;

[0019] Figure 2 The front view of the existing platen provided for the comparative example of the present invention;

[0020] Figure 3 The bottom view of the existing mask frame provided for the comparative example of the present invention;

[0021] Figure 4 The front view of the existing mask frame provided for the comparative example of the present invention;

[0022] Figure 5 The top view of the platen provided for Embodiment 1 of the present invention;

[0023] Figure 6 The top view of the platen provided for Embodiment 2 of the present invention;

[0024] Figure 7 The structural schematic diagram of a device for preventing frictional dust on the surface of a substrate provided for Embodiment 2 of the present invention.

[0025] Among them, the reference numerals are: 10, platen; 20, placement platform; 30, support block; 31, clamping space; 311, first side wall; 312, second side wall; 40, mask frame; 50, groove body. Detailed implementation manners

[0026] Typical embodiments embodying the features and advantages of the present invention will be described in detail in the following description. It should be understood that the present invention can have various variations in different embodiments, all of which do not depart from the scope of the present invention, and the descriptions and drawings therein are for illustrative purposes in essence and not for limiting the present invention.

[0027] In the following description of different exemplary embodiments of the present invention, reference is made to the accompanying drawings, which form a part of the present invention, and in which different exemplary structures, systems, and steps for implementing multiple aspects of the present invention are shown by way of example. It should be understood that other specific solutions of components, structures, exemplary devices, systems, and steps can be used, and structural and functional modifications can be made without departing from the scope of the present invention. Moreover, although terms such as "above", "between", "inside", etc. may be used in this specification to describe different exemplary features and elements of the present invention, these terms are used herein only for convenience, for example, according to the directions in the examples of the drawings. Nothing in this specification should be construed as requiring a specific three-dimensional direction of the structure to fall within the scope of the present invention.

[0028] In the present invention, for a TFT-LCD display panel, the material of the substrate is glass. During the process of manufacturing a TFT-LCD display panel, a thin film deposition layer is formed on the surface of the substrate by means of a CVD (chemical vapor deposition) process, and then a lithography process and an etching process for patterning the deposited thin film are carried out. For an OLED display panel, the substrate includes a carrier and a base layer disposed on the carrier. The material of the carrier plate can be glass, stainless steel, or other applicable materials, and the material of the base layer can be polyimide. During the process of manufacturing an OLED display panel, a packaging layer is formed on the surface of the substrate by means of a CVD process.

[0029] In the present invention, the support block can be prepared by the following steps:

[0030] Step 1: Mix molybdenum disulfide, magnesium oxide, silicon oxide, calcium carbonate, zirconium oxide, graphite, and kaolin according to the ratio, and then place the mixture in an environment with a temperature of 500 - 800 °C for pretreatment for 1 - 3 minutes to obtain a mixture;

[0031] Step 2: Place the mixture in a grinder for grinding and sieve it through a 100-mesh sieve, and then mix it with acrylate and acrylic carboxyethanol ester under stirring to obtain slurry A. Place the slurry in an environment with a temperature of 60 - 90 °C for static treatment for 10 - 30 minutes;

[0032] Step 3: After cooling slurry A to room temperature, add hydroxybutyronitrile rubber to slurry A and stir for 30 - 60 minutes to obtain slurry B, and the stirring speed is 1000 - 3000 r / min;

[0033] Step 4: Fill slurry B into the mold cavity and form a blank by casting;

[0034] Step 5: Bake the blank, degrease it at 220 - 350 °C, remove the binder at 440 - 650 °C, and sinter it into shape at 880 - 980 °C to obtain the support block.

[0035] The static and dynamic friction coefficient ratio of the prepared support block is 95.78 - 97.89%, and the wear rate is almost zero when the support block is in contact with aluminum or aluminum alloy material and there is no deformation during the contact process.

[0036] Comparative example

[0037] The structure of the existing platen is as Figure 1 and Figure 2 shown. A raised placement platform 20 is provided on the platen 10, and the top surface of the placement platform 20 is used for placing the substrate, and the platen 10 can move reciprocally in the vertical direction.

[0038] The structure of the existing mask frame is as shown in Figure 3 and Figure 4 . The end face of the mask frame 40 close to the platen 10 is a groove structure, and the projection of the bottom surface of the groove 50 of the mask frame 40 on the platen 10 covers the placement platform 20.

[0039] After placing a substrate (not shown in the drawings) on the existing placement platform 20, the platen 10 moves in the direction of the mask frame 40. At this time, the top surface of the placement platform 20 enters the groove 50 until the substrate contacts the bottom surface of the groove 50. At this time, the substrate is clamped and fixed, and the side wall of the groove of the mask frame 40 contacts the platen 10. During the process of moving the substrate to the CVD station, friction dust will be generated between the platen 10 and the mask frame 40 due to factors such as impact and friction. Therefore, there is a situation where the friction dust falls on the edge of the substrate.

[0040] Embodiment 1

[0041] As shown in Figure 5 , this embodiment provides a device for preventing friction dust on the surface of the substrate, including: a platen 10, on which a raised placement platform 20 is provided, the top surface of the placement platform 20 is used for placing the substrate, and the platen 10 can move reciprocally in the vertical direction; a support 30, the support block 30 is arranged on the platen 10 and forms an annular structure, the placement platform 20 is arranged at the inner hole of this annular structure, a clamping space 31 is arranged on the support block 30, and the height of the support block 30 is lower than the height of the placement platform 20; a mask frame 40, the specific structure of the mask frame 40 is the same as that of the mask frame in the comparative example, the projection of the bottom surface of the groove of the mask frame 40 on the platen 10 covers the placement platform 20, and the side wall of the groove of the mask frame 40 is fixed in the clamping space 31, so as to increase the fixing effect of the support 30 on the mask frame 40 and prevent the displacement of the mask frame 40.

[0042] Embodiment 2

[0043] As shown in Figure 6 , the difference between the device for preventing friction dust on the surface of the substrate provided in this embodiment and the device for preventing friction dust on the surface of the substrate in Embodiment 1 is only that: in this embodiment, the support block 30 is a split structure, and the four support blocks 30 are respectively arranged at the four corners of the placement platform 20, that is, the clamping space 31 is arranged around the circumferential edge of the placement platform 20.

[0044] As shown in Figure 7As shown, a part of the side wall of the groove of the mask frame 40 is fixed within the clamping space 31. A plurality of support blocks 30 can be arranged in the circumferential direction of the placement platform 20, and the entire mask frame 40 is fixed to the platen 10 through the plurality of support blocks 30. The clamping space 31 includes: a first side wall 311; a second side wall 312, and the side wall of the groove of the mask frame 40 is located between the first side wall 311 and the second side wall 312; wherein, no gap is formed between both the first side wall 311 and the second side wall 312 and the side wall of the groove of the mask frame 40, and the side wall of the groove of the mask frame 40 and the clamping space 31 are detachably connected.

[0045] In this embodiment, the clamping space 31 is a receiving groove, and the bottom of the receiving groove is located within the support block 30, that is, a groove is formed within the frame 30, and this groove is used to receive the side wall of the groove of the mask frame 40. The clamping space 31 is a receiving groove, and the receiving groove extends in two directions that are perpendicular to each other. The edge of the mask frame 40 forms a bent section (a 90-degree bend), and this bent section is located within the clamping space 31. It should be noted that the mask frame 40 can be in contact with the bottom of the receiving groove, or the mask frame 40 can be separated from the bottom of the receiving groove, which is not limited herein.

[0046] This embodiment also provides a method of using a device for preventing frictional dust on the surface of a substrate, including:

[0047] S1, provide a substrate;

[0048] S2, place the substrate on the top surface of the placement platform 20, and then the platen 10 moves upward into the interior of the groove of the mask frame 40. The support block 30 is provided with a clamping space 31, and at this time, the side wall of the groove of the mask frame 40 enters the clamping space 31;

[0049] S3, the substrate is clamped between the top surface of the placement platform 20 and the bottom surface of the groove of the mask frame 40. The edge of the mask frame 40 is located within the clamping space 31, and the mask frame 40 is fixed to the platen 10 through the support block 30. During the whole process, the mask frame 40 does not contact the placement platform 20, the mask frame 40 contacts the support block 30 without generating frictional dust, and the mask frame 40 covers the substrate to ensure that dust particles do not fall onto the surface of the substrate.

[0050] Those skilled in the art will readily conceive of other embodiments of the present invention after considering the specification and practicing the invention disclosed herein. The present invention is intended to cover any variations, uses, or adaptations of the present invention that follow the general principles of the present invention and include known common knowledge or conventional technical means in the technical field not disclosed in the present invention. The specification and the exemplary embodiments are only regarded as exemplary, and the true scope and spirit of the present invention are pointed out by the claims that follow.

[0051] It should be understood that the present invention is not limited to the exact structures described above and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present invention is only limited by the appended claims.

Claims

1. A device for preventing frictional dust on the surface of a substrate, characterized in that, Comprising: A platen, on which a raised placement platform is provided. The top surface of the placement platform is used to place the substrate, and the area of the top surface of the placement platform is larger than the area of the substrate. The platen can move reciprocally in the vertical direction; Support blocks, which are arranged on the platen and distributed around the placement platform. A clamping space is provided on the support blocks, and the height of the support blocks is lower than the height of the placement platform; A mask frame, the end face of the mask frame close to the platen is a groove structure. The projection of the bottom surface of the groove of the mask frame on the platen covers the placement platform, and the side walls of the groove of the mask frame are fixed in the clamping space; The clamping space includes a first side wall and a second side wall. The side walls of the groove of the mask frame are located between the first side wall and the second side wall, and the side walls of the groove of the mask frame are respectively in contact with the first side wall and the second side wall. The clamping space is a receiving groove, and the bottom of the receiving groove is located on the support block; The support block is prepared by the following steps: Step 1, mix molybdenum disulfide, magnesium oxide, silicon oxide, calcium carbonate, zirconium oxide, graphite, and kaolin according to the ratio, and then place them in an environment with a temperature of 500 - 800 °C for pretreatment for 1 - 3 minutes to obtain a mixture; Step 2, place the mixture in a grinder, grind it and pass through a 100 - mesh sieve, and then mix it with acrylate and carboxyethyl acrylate under stirring to obtain slurry A. Place the slurry in an environment with a temperature of 60 - 90 °C for static treatment for 10 - 30 minutes; Step 3, after cooling slurry A to room temperature, add hydroxybutyronitrile rubber to slurry A and stir for 30 - 60 minutes to obtain slurry B, and the stirring speed is 1000 - 3000 r / min; Step 4, fill slurry B into the mold cavity and form a green body by casting; Step 5, fire the green body, degrease it at 220 - 350 °C, remove the binder at 440 - 650 °C, and sinter it into shape at 880 - 980 °C to obtain the support block. The static - dynamic friction coefficient ratio of the prepared support block is 95.78 - 97.89%; 2. The device according to claim 1, characterized in that The support blocks surround an annular structure, and the placement platform is arranged at the inner hole of the annular structure.

3. The device according to claim 1, characterized in that, The support block is a split - type structure.

4. The device according to claim 3, characterized in that, Four of the support blocks are respectively arranged at the four corners of the placement platform.

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