Display panel, manufacturing method therefor, and electronic device

Abstract

Embodiments of the present application provide a display panel, a manufacturing method thereof and an electronic device. The display panel comprises: a substrate; a functional structure located above the substrate, an edge of the functional structure having a slope, the slope having a slope surface; a dielectric layer, the dielectric layer being in contact with at least part of the slope surface, and the dielectric layer having a different refractive index from the slope; a display area of the display panel comprising a first display area and a second display area, the first display area having a higher light transmittance than the second display area; and the edge of the functional structure in the first display area having a first slope, the first slope being manufactured by a specific process to enhance the scattering effect of the slope surface of the first slope on light. The present application can improve the influence of light deflection on imaging quality when light penetrates the slope, improve the phenomenon of ghost images during imaging, and improve the imaging effect.

Description

Technical Field

[0001] This invention belongs to the field of display technology, and more specifically relates to a display panel, its manufacturing method, and an electronic device. Background Technology

[0002] In recent years, full-screen design technology has become a highly sought-after element by major manufacturers. Currently, the screen-to-body ratio of mainstream display products has reached over 80%. In current full-screen technology, the necessity of using a front-facing camera means this function cannot be eliminated, leading to various types of punch-hole technologies used in existing screens, resulting in designs such as "notch screens," "waterdrop screens," and "punch-hole screens." However, these punch-holes disrupt the consistency of the display and hinder further improvements in screen-to-body ratio. To further improve screen-to-body ratio, researchers are considering under-display optical components, such as cameras, placed below the display area.

[0003] Placing optical elements below the display area ensures proper display when needed; light penetrates the display panel to reach and be utilized by the optical elements when required. However, with under-display optical elements, light must penetrate the display panel's film layer structure to be used. The wiring and film layer structure above the optical elements affect the light path through the display panel, thus impacting the optical performance of the under-display optical elements. When used in under-display camera solutions, this results in poorer image quality, failing to meet user needs. Summary of the Invention

[0004] In view of this, this application provides a display panel, a method for manufacturing the same, and an electronic device to solve the problem of poor imaging quality of under-display optical elements.

[0005] In a first aspect, embodiments of this application provide a display panel characterized in that the display panel includes:

[0006] Substrate;

[0007] A functional structure is located on a substrate, and the edges of the functional structure have slopes with sloping surfaces.

[0008] A medium layer that is in contact with at least a portion of the slope surface, and the refractive index of the medium layer is different from that of the slope.

[0009] The display panel includes a first display area and a second display area, wherein the light transmittance of the first display area is greater than that of the second display area; wherein,

[0010] The edge of the functional structure located in the first display area has a first slope, which is made using a specific process to enhance the scattering effect of the slope surface on light.

[0011] In one embodiment, the edge of the functional structure located in the second display area has a second slope; wherein the second slope and the first slope are manufactured using the same specific process.

[0012] Specifically, the display panel includes a pixel definition layer and multiple light-emitting devices located on a substrate. The pixel definition layer is used to space adjacent light-emitting devices, and the light-emitting devices include an anode layer, a light-emitting layer and a cathode layer stacked in sequence.

[0013] The pixel definition layer is a functional structure with multiple openings. The edges of the pixel definition layer near the openings are slopes, and the sidewalls of the openings are the slope surfaces.

[0014] Specifically, the display panel includes a pixel definition layer, multiple light-emitting devices, and multiple support pillars located on a substrate. The pixel definition layer is used to space adjacent light-emitting devices. The light-emitting devices include an anode layer, a light-emitting layer, and a cathode layer stacked in sequence. The pixel definition layer has multiple openings, and the support pillars are located on the side of the pixel definition layer away from the substrate.

[0015] The support column is a functional structure, with its edges being slopes and its sidewalls forming the slope surface.

[0016] Furthermore, the display panel also includes a light-shielding unit located in the first display area. The light-shielding unit is located on the side of the first slope close to the substrate. In the direction perpendicular to the display panel, the orthographic projection of the first slope onto the substrate is a first projection. The orthographic projection of the light-shielding unit onto the substrate is a second projection, and the second projection covers the first projection.

[0017] Furthermore, the distance between the edge of the first projection and the edge of the second projection is d, where 0≤d≤7μm.

[0018] In one embodiment, the display panel further includes a light-shielding unit located in the first display area, the light-shielding unit being located on the side of the pixel definition layer near the substrate; in a direction perpendicular to the display panel, the orthographic projection of the first ramp onto the plane where the light-shielding unit is located is a first projection; the orthographic projection of the light-shielding unit onto the substrate is a second projection, the second projection covering the first projection; the light-shielding unit is made of the same layer and material as the anode layer.

[0019] Optionally, the shape of the opening of the pixel definition layer can be circular or elliptical.

[0020] Secondly, embodiments of the present invention provide another display panel, the display panel comprising:

[0021] Substrate;

[0022] A functional structure is located on a substrate, and the edges of the functional structure have slopes with sloping surfaces.

[0023] A medium layer that is in contact with at least a portion of the slope surface, and the refractive index of the medium layer is different from that of the slope.

[0024] The display panel includes a first display area and a second display area, wherein the light transmittance of the first display area is greater than that of the second display area; wherein,

[0025] The edge of the functional structure located in the first display area has a first slope;

[0026] The display panel also includes a light-shielding unit located on the side of the first slope closer to the substrate.

[0027] In the direction perpendicular to the display panel, the orthogonal projection of the first ramp onto the substrate is the first projection; the orthogonal projection of the light-shielding unit onto the substrate is the second projection, and the second projection covers the first projection.

[0028] Furthermore, the distance between the edge of the first projection and the edge of the second projection is d, where 0≤d≤7μm.

[0029] Thirdly, embodiments of this application provide a method for manufacturing a display panel, the display panel comprising: a substrate;

[0030] A functional structure is located on a substrate, and the edges of the functional structure have slopes with sloping surfaces.

[0031] A medium layer that is in contact with at least a portion of the slope surface, and the refractive index of the medium layer is different from that of the slope.

[0032] The display panel includes a first display area and a second display area, wherein the light transmittance of the first display area is greater than that of the second display area; the edge of the functional structure located in the first display area has a first slope; the manufacturing method includes:

[0033] A functional structure is fabricated using a first mask in a photolithography process. The first mask includes a first mask area, which is used to form the functional structure within a first display area. The first mask area includes a first light-shielding area, a first pattern area, and a first transition area. The first transition area is located between the first pattern area and the first light-shielding area. The transmittance of the first transition area is less than that of the first pattern area, and the transmittance of the first transition area is greater than that of the first light-shielding area. The photolithography process includes:

[0034] A functional material layer is fabricated on one side of a substrate. The functional material layer is divided into a retention area and an etched area. The retention area is used to form a functional structure. The retention area also includes an edge area, which is adjacent to the etched area. The edge area is used to form a ramp of the functional structure.

[0035] Photoresist is coated on top of the functional material layer;

[0036] The first mask is aligned with the substrate, wherein the first transition region corresponds to the edge region located in the first display region.

[0037] Furthermore, the first mask also includes a second mask area, which is used to form a functional structure in the second display area. The second mask area includes a second light-shielding area, a second pattern area, and a second transition area. The second transition area is located between the second pattern area and the second light-shielding area. The light transmittance of the second transition area is less than that of the second pattern area, and the light transmittance of the second transition area is greater than that of the second light-shielding area.

[0038] Aligning the first mask with the substrate further includes: the second transition region corresponding to the edge region located in the second display region.

[0039] Fourthly, embodiments of this application also provide an electronic device, which includes a display panel provided in any embodiment of this application. The electronic device also includes an optical component located on one side of the display panel and overlapping with a first display area in a direction perpendicular to the display panel.

[0040] The display panel, its manufacturing method, and electronic device provided in this application have the following beneficial effects: When applied to an under-display optical element solution, the optical element overlaps with the first display area. By employing a specific process to fabricate the first slope of the functional structure located in the first display area, the scattering effect of the slope surface on light is enhanced. When light penetrates the interface formed by the slope surface and the dielectric layer, the light is deflected in multiple different directions, effectively scattering the deflected light and preventing the concentration of deflection energy caused by light deflecting in the same direction. This improves the impact of light deflection on image quality when light penetrates the slope, reduces the phenomenon of ghosting images during imaging, and enhances the imaging effect. Alternatively, a light-shielding unit can be set below the first slope within the first display area. By setting the light-shielding unit, the deflected light generated when penetrating the first slope is blocked, preventing the deflected light from participating in imaging, thereby improving the phenomenon of ghosting images during imaging and enhancing the imaging effect. Attached Figure Description

[0041] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0042] Figure 1 A schematic diagram of the slope inside the display panel in related technologies;

[0043] Figure 2 A simplified cross-sectional diagram of an organic light-emitting display panel;

[0044] Figure 3 A schematic diagram showing the refraction direction of light as it passes through a slope;

[0045] Figure 4 A top view of the display panel provided in the embodiment of the application;

[0046] Figure 5 for Figure 4 A schematic diagram of a cross-section at the position of the tangent AA′;

[0047] Figure 6 for Figure 4 Another cross-sectional view at the location of the tangent AA′;

[0048] Figure 7 for Figure 4 Another cross-sectional view at the location of the tangent AA′;

[0049] Figure 8 for Figure 4 Another cross-sectional view at the location of the tangent AA′;

[0050] Figure 9 for Figure 4 Another cross-sectional view at the location of the tangent AA′;

[0051] Figure 10 for Figure 4 Another cross-sectional view at the location of the tangent AA′;

[0052] Figure 11 A simplified schematic diagram of a ramp in a display panel provided in an embodiment of this application;

[0053] Figure 12 This is another top view schematic diagram of the pixel definition layer in the display panel provided in the embodiments of this application;

[0054] Figure 13 This is another top view schematic diagram of the pixel definition layer in the display panel provided in the embodiments of this application;

[0055] Figure 14 This is a partial schematic diagram of a mask used in the pixel definition layer etching process in the prior art;

[0056] Figure 15 This is a schematic diagram of a mask used in the etching process of the functional structure in the embodiments of this application;

[0057] Figure 16 A flowchart illustrating a method for manufacturing a display panel according to an embodiment of this application;

[0058] Figure 17 This is a schematic diagram of another structure of the mask plate used in the etching process of the functional structure in the embodiments of this application;

[0059] Figure 18 This is a schematic diagram of another structure of the mask plate used in the etching process of the functional structure in the embodiments of this application;

[0060] Figure 19 This is a schematic diagram of another structure of the mask plate used in the etching process of the functional structure in the embodiments of this application;

[0061] Figure 20 This is a cross-sectional schematic diagram of an electronic device provided in an embodiment of this application. Detailed Implementation

[0062] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0063] The terminology used in the embodiments of this invention is for the purpose of describing particular embodiments only and is not intended to limit the invention. The singular forms “a,” “the,” and “the” as used in the embodiments of this invention and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise.

[0064] This application provides a display panel, which includes a first display area and a second display area, wherein the light transmittance of the first display area is greater than that of the second display area. The display panel can be used in under-display optical element solutions, such as when the optical element is a camera. When assembling an electronic device, placing the camera below the corresponding area of ​​the first display area can improve the screen-to-body ratio. When the camera function is not enabled, the first display area can display normally, ensuring the integrity of the image. When the camera function is enabled, due to the higher light transmittance of the first display area, ambient light can penetrate the first display area and be captured by the camera, thereby achieving image capture. In other words, when applied to an under-display optical element solution, when the optical element is enabled, it receives light penetrating the first display area of ​​the display panel to achieve its optical performance.

[0065] Currently, the imaging effect of under-display optical components is poor and fails to meet user needs. To improve the imaging effect of under-display optical components, the inventors of this application analyzed the factors affecting the imaging effect of under-display optical components. Currently, display panels are all multi-layer stacked structures. Due to the influence of the display panel manufacturing process (material exposure and development, deposition, evaporation or sputtering processes, etc.), there are slopes at the edges of some functional structures inside the display panel. Figure 1 A schematic diagram of the slope inside the display panel in related technologies. (e.g.) Figure 1 As shown, a functional structure 1 is illustrated. The edge of the functional structure 1 has a ramp 10, and the ramp 10 has a slope surface 11. The slope surface forms an angle with the substrate 101, meaning it is not parallel to the substrate 101. A dielectric layer 20 is also covered above the slope surface 11. When ambient light penetrates the area containing the ramp 10, the refractive indices of the ramp 10 and the dielectric layer 20 differ due to their different materials. Light rays are refracted at the interface between the slope surface 11 and the dielectric layer 20, causing light deflection and thus affecting the imaging quality of the optical element.

[0066] Based on the above ideas, the inventors conducted analysis and experiments using organic light-emitting display panels as an example. Figure 2 A simplified cross-sectional diagram of an organic light-emitting display panel. (See diagram below.) Figure 2 As shown, in the organic light-emitting display panel, the pixel definition layer 30 has an opening (not shown in the figure), and the sidewall 32 of the opening is a slope, meaning that the edge of the pixel definition layer 30 near the opening is a ramp 10. The light-emitting device 40 includes an anode layer 41, a light-emitting layer 42, and a cathode layer 43. The light-emitting layer 42 is deposited within the opening, and the cathode layer 43 of the light-emitting device 40 covers the sidewall 32 of the opening. Figure 2 As illustrated, when light passes through the side wall 32 of the opening, it is refracted at the interface where the side wall 32 and the cathode layer 43 meet, changing the direction of the light path.

[0067] Among them, the direction of light refraction and the distribution of light energy after light passes through the slope are related to the distribution direction of the slope in the display area. Figure 3 This is a schematic diagram showing the refraction direction of light as it passes through a slope. (Example:) Figure 3 As shown, when viewed from a top-down angle, the opening 31 of the pixel definition layer 30 is hexagonal. The six sidewalls of the hexagonal opening 31 are all slopes. When light passes through the area around an opening 31, the deflection directions are the six directions indicated by the arrows in the figure.

[0068] When applied in under-display optical element solutions, as light penetrates the slope of the pixel definition layer, it is refracted at the interface between the sidewall of the opening and the dielectric layer (such as the cathode layer). This refraction causes the light energy to be distributed around the slope, i.e., dispersed around the opening of the pixel definition layer. In practical applications, this dispersed light energy around the opening can cause ghosting during imaging. The ghosting around the real image can severely affect the imaging effect.

[0069] Based on the above analysis, this application provides a display panel with an improved structure to improve the image quality by reducing the impact of light deflection caused by light passing through a slope when applied in an under-display optical element solution.

[0070] Figure 4 A top view of the display panel provided in the embodiment of the application, as shown below. Figure 4 As shown, the display panel display area 2 includes a first display area 21 and a second display area 22, where the light transmittance of the first display area 21 is greater than that of the second display area 22. In one embodiment, when the display panel is an organic light-emitting display panel, the light transmittance of the first display area is increased by setting the size of the light-emitting devices in the first display area to be smaller than the size of the light-emitting devices in the second display area. In another embodiment, the light transmittance of the first display area is increased by setting the density of the light-emitting devices in the first display area to be less than the density of the light-emitting devices in the second display area.

[0071] In this embodiment, the display panel includes a functional structure located on a substrate. The functional structure is fabricated using photolithography and has a ramp at its edge, with a slope surface. A dielectric layer is applied over the ramp surface, wherein the refractive index of the dielectric layer differs from that of the ramp. In this embodiment, the first ramp of the functional structure located in the first display area is fabricated using a specific process to enhance the light scattering effect of the ramp surface. For example, the ramp surface fabricated using a specific process has a larger roughness, thereby enhancing the light scattering effect. Roughness, also known as surface roughness, is understood as the degree of unevenness of the surface. The rougher the ramp surface, the greater the roughness; the smoother the ramp surface, the smaller the roughness. The ramp surface fabricated using a specific process has a larger roughness, meaning that the unevenness of the ramp surface increases after fabrication using the specific process.

[0072] In one embodiment, the specific process refers to the design of the mask used in fabricating the functional structure. In related technologies, the functional structure is fabricated using an etching process, and the slope of the actual functional structure also has a certain roughness. However, in this embodiment, the first slope located in the first display area is fabricated using a specific process, which increases the roughness of the first slope's surface compared to related technologies. When applied in an under-display optical element solution, when light penetrates the interface formed by the slope of the first slope and the dielectric layer, the light is deflected in multiple different directions due to the scattering effect of the slope. This effectively disperses the deflected light, preventing the concentration of deflection energy caused by light deflecting in the same direction. This improves the phenomenon of ghosting images during imaging and enhances the imaging effect. The functional structure in the display panel can be a pixel definition layer or a support pillar. The structure of the display panel in this application and the process used to fabricate the first slope will be described in detail below with specific embodiments.

[0073] Specifically, in one embodiment, Figure 5 for Figure 4 A schematic diagram of a cross-section at the location of the tangent AA′. (See diagram below.) Figure 5 As shown, the display panel includes a substrate 101, an array layer 102, and a display layer 103. The array layer 102 includes a plurality of transistors T. The display layer 103 includes a pixel definition layer 30 and a plurality of light-emitting devices 40. Figure 5 (Only two are shown in the diagram). The pixel definition layer 30 is used to space adjacent light-emitting devices 40. The light-emitting device 40 includes an anode layer 41, a light-emitting layer 42, and a cathode layer 43 stacked sequentially. The pixel definition layer 30 is a functional structure with multiple openings. The edge of the pixel definition layer 30 near the opening is a slope (not shown), and the sidewall of the opening is the slope surface 11. The light-emitting layer 42 of the light-emitting device 40 is deposited within the opening, and the cathode layer 43 covers the slope surface 11 and extends to the outside of the opening. That is, the cathode layer 43 is the dielectric layer in contact with the slope surface, and the refractive index of the cathode layer 43 is different from that of the pixel definition layer 30.

[0074] Figure 5 The image also shows an encapsulation structure 104 located above the display layer 103. The encapsulation structure 104 is used to encapsulate and protect the light-emitting device 40 to improve its lifespan. The encapsulation structure 104 can be a thin-film encapsulation, comprising at least one organic encapsulation layer and one inorganic encapsulation layer. In another embodiment, the encapsulation structure 104 is a rigid encapsulation, including an encapsulation cover and a sealing adhesive, the encapsulation cover being bonded to the array layer by the sealing adhesive.

[0075] The slope formed by the edge of the pixel definition layer near the opening includes a first slope 10-1 and a second slope 10-2, as shown below. Figure 5 As illustrated, the pixel definition layer 30 located in the first display area 21 has a first slope 10-1 at its edge, and the pixel definition layer 30 located in the second display area 22 has a second slope 10-2 at its edge; wherein, the first slope, after being manufactured using a specific process, has a relatively large surface roughness. Due to the increased roughness of the slope surface 11-1 of the first slope 10-1, the scattering effect of the slope surface on light is enhanced. Therefore, light passing through the slope surface 11-1 of the first slope 10-1 and the dielectric layer (… Figure 5 When the interface is formed by the cathode layer 43, the light is deflected in multiple different directions, which is equivalent to scattering the deflected light and avoiding the concentration of deflection energy caused by the light being deflected in the same direction. When applied to under-display optical element solutions, it can improve the impact of light deflection caused by light passing through the slope on the image quality, improve the phenomenon of ghosting images during imaging, and enhance the imaging effect.

[0076] Figure 5 In this embodiment, the slope surface of the second slope can be a rough surface or a plane. In this embodiment, the relationship between the roughness of the first slope surface and the roughness of the second slope surface is not limited. In one embodiment, the roughness of the slope surface 11-1 of the first slope 10-1 is a first roughness, and the roughness of the slope surface of the second slope is a second roughness, where the first roughness is greater than the second roughness. In this embodiment, only the slope within the first display area is manufactured using a specific process to enhance the light scattering effect of the first slope surface within the first display area; the manufacturing process of the slope within the second display area does not need to be changed.

[0077] Specifically, the manufacturing process of the pixel definition layer can be designed to create a first slope with a relatively large surface roughness within the first display area. During display panel fabrication, the pixel definition layer is created using photolithography. First, a single organic material layer is fabricated, and then the organic material layer is etched to form multiple openings, thus forming the pixel definition layer. In the etching process, the transmittance of the patterned area of ​​the photomask is designed to create a sidewall with a relatively large roughness for the openings within the first display area. This embodiment will be described in the following manufacturing method embodiments.

[0078] In another embodiment, after the pixel definition layer is fabricated, the sidewalls of the opening of the pixel definition layer in the first display area are roughened by adding a layer of atomizing material or roughening material to the sidewalls of the opening of the pixel definition layer in the first display area to increase the roughness of the sidewalls of the opening of the pixel definition layer in the first display area.

[0079] Specifically, in another embodiment, Figure 6 for Figure 4 Another cross-sectional diagram at the location of the tangent AA′. (See diagram below.) Figure 6 As shown, the pixel definition layer 30 located in the first display area 21 has a first slope 10-1 at its edge, and the pixel definition layer 30 located in the second display area 22 has a second slope 10-2 at its edge. The first slope 10-1 is manufactured using a specific process to enhance the light scattering effect of its slope surface. The second slope 10-2 is manufactured using the same specific process as the first slope 10-1, meaning that the light scattering effect of the second slope 10-2 is also enhanced. Figure 6 As illustrated, after fabrication using a special process, the roughness of the slope surface 11-1 of the first slope 10-1 and the roughness of the slope surface 11-2 of the second slope 10-2 both increase. That is, the roughness of the slope surface of the functional structure located in the second display area is also increased compared to existing technologies. Optionally, the roughness of the slope surface 11-1 of the first slope 10-1 and the roughness of the slope surface 11-2 of the second slope 10-2 are approximately the same. When applied in an under-display optical element solution, the optical element corresponds to the first display area 21. When light penetrates the interface between the edge of the pixel definition layer and the cathode layer in the first display area, it is deflected in multiple different directions, improving the phenomenon of ghosting images during imaging and enhancing the imaging effect. Although the under-display optical element solution does not limit the transmittance of the second display area 22 or the strength of the scattering effect of the slope surface within the second display area 22 on light. However, in this embodiment, the second slope and the first slope are made using the same specific process. That is, the edge of the pixel definition layer in the first display area and the edge of the pixel definition layer in the second display area are made using the same specific process. In this case, the mask used in the etching process of the functional structure (pixel definition layer in this embodiment) can adopt a uniform design, which simplifies the design of the mask.

[0080] In organic light-emitting display panels, the film structure also includes support pillars. These pillars are made of organic materials and are typically fabricated using etching processes. The edges of the support pillars are also sloped. In other words, the support pillars are also a functional structure.

[0081] In one embodiment, Figure 7 for Figure 4 Another cross-sectional diagram at the location of the tangent AA′. (See diagram below.) Figure 7As shown, the display panel also includes multiple support pillars 50, which are located on the side of the pixel definition layer 30 away from the substrate 101. The edges of the support pillars 50 are slopes 10, and the sidewalls of the support pillars 50 are the slope surfaces of the slopes 10. A cathode layer 43 is covered on the sidewalls of the support pillars 50. The slopes formed by the edges of the support pillars 50 include a first slope 10-1 and a second slope 10-2. The first slope 10-1 is located in the first display area 21, and the second slope 10-2 is located in the second display area 22. The first slope, after being manufactured using a specific process, has a larger surface roughness, thus enhancing the scattering effect of the slope surface on light.

[0082] Figure 7 In this embodiment, the slope surface of the second slope can be a rough surface or a plane. In this embodiment, the relationship between the roughness of the first slope surface and the roughness of the second slope surface is not limited. In one embodiment, the roughness of the slope surface 11-1 of the first slope 10-1 is a first roughness, and the roughness of the slope surface of the second slope is a second roughness, where the first roughness is greater than the second roughness. In this embodiment, only the slope within the first display area is manufactured using a specific process to enhance the light scattering effect of the slope surface of the first slope within the first display area; the manufacturing process of the slope within the second display area does not need to be changed. During the manufacturing of the display panel, the anode layer 41 of the light-emitting device 40 is first manufactured, forming multiple mutually insulated anode layers 41. Then, a pixel definition layer 30 is manufactured, which has multiple openings, one opening corresponding to one anode layer 41, meaning the opening exposes the anode layer 41. Then, a support pillar 50 is manufactured on the pixel definition layer 30, with the support pillar 50 located between two adjacent openings. Then, the light-emitting layer 42 of the light-emitting device 40 is deposited by vapor deposition. In the vapor deposition process, the support pillar 50 can be used to support the mask used in the vapor deposition process. Then, the cathode layer 43 of the light-emitting device 40 is fabricated. The cathode layer 43 is fabricated as a single layer, so it covers the sidewall of the support pillar 50. In this embodiment, the cathode layer 43 is a dielectric layer in contact with the sidewall of the support pillar 50. Ambient light is refracted when it passes through the interface between the cathode layer 43 and the sidewall of the support pillar 50.

[0083] In this embodiment, by increasing the roughness of the sidewall of the support column in the first display area, the scattering effect of the sidewall on light is enhanced. When light passes through the interface between the sidewall of the support column and the cathode layer in the first display area, it is deflected in multiple different directions, effectively scattering the deflected light and preventing the concentration of deflection energy caused by light deflecting in the same direction. When applied to under-display optical element solutions, this can improve the impact of light deflection caused by light passing through a slope on image quality, reduce the phenomenon of ghosting images during imaging, and improve the imaging effect.

[0084] In another embodiment, Figure 8for Figure 4 Another cross-sectional diagram at the location of the tangent AA′. (See diagram below.) Figure 8 As shown, the sidewall of the support column 50 located in the first display area 21 has a first slope 10-1, and the sidewall of the support column 50 located in the second display area 22 has a second slope 10-2. The first slope 10-1 is manufactured using a specific process to enhance the light scattering effect of its slope surface. The second slope 10-2 is manufactured using the same specific process as the first slope 10-1, meaning that the light scattering effect of the second slope 10-2 is also enhanced. Figure 8 As illustrated, after fabrication using a special process, the roughness of the slope surface 11-1 of the first slope 10-1 and the roughness of the slope surface 11-2 of the second slope 10-2 both increase. That is, the roughness of the slope surface of the functional structure located in the second display area is also increased compared to existing technologies. Optionally, the roughness of the sidewall of the support column 50 located in the first display area 21 and the roughness of the sidewall of the support column 50 located in the second display area 22 are approximately the same. When applied in an under-display optical element solution, the optical element corresponds to the first display area 21. When light penetrates the interface between the sidewall of the support column and the cathode layer in the first display area, it will be deflected in multiple different directions, improving the phenomenon of ghosting images during imaging and enhancing the imaging effect. Although the under-display optical element solution does not limit the transmittance of the second display area 22 or the strength of the scattering effect of the slope surface within the second display area 22 on light. However, in this embodiment, the second slope and the first slope are made using the same specific process. That is, the edges of the support pillars located in the first display area and the edges of the support pillars located in the second display area are made using the same specific process. Thus, the support pillars located in the first display area and the support pillars located in the second display area can be made in the same process, and the mask used in the support pillar etching process can adopt a uniform design for the entire surface, which simplifies the design of the mask.

[0085] In another embodiment, this application also provides a passively driven organic light-emitting display panel. Figure 9 for Figure 4 Another cross-sectional diagram at the location of the tangent AA′. (See diagram below.) Figure 9 The shape of the central support column and Figure 7 The shapes of the support columns differ in the embodiments. Figure 7 In the cross-sectional view of the embodiment, the support pillar is a regular trapezoid, meaning the area of ​​the surface of the support pillar closer to the substrate is greater than the area of ​​the surface of the support pillar farther from the substrate. Figure 9In the schematic cross-sectional view, the support pillar 50 is an inverted trapezoid, meaning that the area of ​​the surface of the support pillar 50 closest to the substrate 101 is smaller than the area of ​​the surface of the support pillar 50 furthest from the substrate 101. The figure also shows the display layer 103, which includes light-emitting devices 40 and pixel definition layers 30. The light-emitting device 40 includes an anode layer 41, a light-emitting layer 42, and a cathode layer 43. A common electrode 107 is also shown, wherein the anode layers 41 of the light-emitting devices 40 are all electrically connected to the common electrode 107, while the cathode layers 43 of the light-emitting devices 40 are independent of each other. In the manufacturing process of the display panel provided in this embodiment, the anode layers 41 of the light-emitting devices 40 are first fabricated, then the pixel definition layers 30 are fabricated, then the support pillar 50 is fabricated, then the light-emitting layers 42 of the light-emitting devices 40 are deposited by vapor deposition, and then the cathode layers 43 of the light-emitting devices 40 are fabricated. Because the support pillar 50 is an inverted trapezoid, the cathode layer 43 is interrupted at the sidewall of the support pillar 50 during fabrication. That is, Figure 9 In this embodiment, the sidewall of the support column 50 is not covered with the cathode layer 43. After the cathode layer 43 is fabricated, an optical-grade dielectric material 1041 is coated to form a flat surface. Then, an encapsulation cover 1042 is fabricated on the dielectric material 1041 to form an encapsulation protection for the light-emitting device 40. The dielectric material 1041 is also shown between the display layers 103 in the encapsulation cover 1042. The sidewall of the support column 50 is in contact with the dielectric material 1041, which is the dielectric layer in contact with the slope surface of the ramp.

[0086] like Figure 9 As illustrated, the ramp formed by the edges of the inverted trapezoidal support column 50 includes a first ramp 10-1 and a second ramp 10-2. The first ramp 10-1 is located in the first display area 21, and the second ramp 10-2 is located in the second display area 22. The first ramp 10-1 is manufactured using a specific process to enhance the scattering effect of its slope on light. By increasing the roughness of the sidewalls of the support column in the first display area, light rays are deflected in multiple different directions when passing through the interface between the sidewalls of the support column and the dielectric layer in the first display area, avoiding the concentration of deflection energy caused by light rays deflecting in the same direction. When applied to under-display optical element solutions, this can improve the impact of light deflection caused by the ramps on image quality, reduce ghosting during imaging, and enhance the imaging effect.

[0087] Figure 9 In this embodiment, the surface of the second slope can be a rough surface or a plane. In this embodiment, the relationship between the roughness of the first slope surface and the roughness of the second slope surface is not limited.

[0088] In another embodiment, the passively driven organic light-emitting display panel includes inverted trapezoidal support pillars. The sidewalls of the support pillars located in the first display area and the sidewalls of the support pillars located in the second display area are fabricated using the same specific process. That is, compared to existing technologies, the roughness of the sidewalls of the support pillars located in the first and second display areas is increased. In this embodiment, since the sidewalls of the support pillars located in the first and second display areas are fabricated using the same specific process, the support pillars in the first and second display areas can be fabricated in the same process, and the mask used in the support pillar etching process can adopt a uniform design across the entire surface, simplifying the mask design. No further illustrations are provided here.

[0089] Figures 7 to 9 In all embodiments, the support pillars are fabricated using photolithography. In one embodiment, the mask used in the support pillar etching process is designed to fabricate the sidewalls of the support pillars in the first display area using a specific process, resulting in a higher roughness on the sidewalls of the support pillars within the first display area. In another embodiment, after the support pillars are fabricated, the sidewalls of the support pillars within the first display area are roughened by adding a layer of atomizing or texturing material to the sidewalls, thereby increasing the roughness of the sidewalls of the support pillars within the first display area.

[0090] In another embodiment, a light-shielding unit is used to block the deflected light rays that penetrate the slope. Figure 10 for Figure 4 Another cross-sectional diagram at the location of the tangent AA′. (See diagram below.) Figure 10 As shown, the edge of the pixel definition layer 30 near the opening is a slope (not shown), and the sidewall of the opening is the slope surface 11 of the slope. The edge of the pixel definition layer 30 near the opening in the first display area 21 forms a first slope 10-1, and a cathode layer 43 covers the first slope 10-1. The display panel also includes a light-shielding unit 90 located in the first display area 21. The light-shielding unit 90 is located on the side of the first slope 10 near the substrate 101. In the direction perpendicular to the display panel e, the orthographic projection of the first slope 10-1 onto the substrate 101 is the first projection; the orthographic projection of the light-shielding unit 90 onto the substrate 101 is the second projection. The second projection covers the first projection, that is, the area of ​​the second projection is greater than or equal to the area of ​​the first projection. The orthographic projection is not shown in the figure. This is equivalent to the light-shielding unit 90 being located directly below the first slope 10-1, as shown in the figure. Figure 10The light-shielding unit 90, as illustrated, blocks the deflected light rays penetrating the ramp. In under-display optical element solutions, the light-shielding structure can block the deflected light rays generated when ambient light penetrates the ramp, preventing these deflected rays from participating in imaging. This improves the imaging effect by reducing ghosting and enhancing the overall imaging performance.

[0091] In this embodiment, the position of the light-shielding unit in the film layer of the display panel is not limited. It is applied to an organic light-emitting display panel, which includes a gate metal layer, source / drain metal layers, capacitor metal layers, and an anode metal layer. The light-shielding unit can be fabricated using any of the aforementioned metal layers. Alternatively, an additional metal layer can be added during the display panel manufacturing process to fabricate the light-shielding unit.

[0092] Specifically, in one embodiment, such as Figure 10 As shown, the light-shielding unit 90 and the anode layer 41 are located on the same layer, meaning that the light-shielding unit 90 and the anode layer 41 are made of the same material and on the same layer. Optionally, the light-shielding unit is connected to the anode layer. When fabricating the anode layer, only the shape of the mask used to etch the anode layer needs to be designed, which allows the light-shielding unit and the cathode layer to be fabricated in the same process without adding any additional processes, making the process relatively simple.

[0093] In the embodiments of this application, the relationship between the refractive index of the slope and the medium layer in contact with it is not limited. Figure 11 This is a simplified schematic diagram of a ramp in a display panel provided in an embodiment of this application.

[0094] like Figure 11As shown in (a), the refractive index of the first ramp 10-1 is n1, and the refractive index of the dielectric layer 20 is n2, where n1 > n2. When light travels from the dielectric layer 20 to the first ramp 10-1, according to the law of refraction, since n1 > n2, then sinθ1 < sinθ2, that is, the incident angle is greater than the refraction angle. A light-shielding unit 90 is provided below the first ramp 10-1. In the direction e perpendicular to the display panel, the orthographic projection of the first ramp 10-1 on the substrate 101 is the first projection; the orthographic projection of the light-shielding unit 90 on the substrate 101 is the second projection. The distance between the edge of the first projection and the edge of the second projection is d, where 0 ≤ d ≤ 7 μm. The first projection and the second projection are not shown in the figure, but the projection direction is the direction e示意 in the figure. It can be understood that the first ramp 10-1 and the light-shielding unit 90 overlap in the direction e. As shown in (a), on the left side, the edge of the first ramp 10-1 and the edge of the light-shielding unit 90 are substantially aligned; on the right side, the length that the edge of the light-shielding unit 90 extends beyond the edge of the first ramp 10-1 is d. The first ramp includes a first end and a second end. Among them, in the direction perpendicular to the substrate, the thickness of the first end is less than the thickness of the second end. When the refractive index of the first ramp is greater than the refractive index of the dielectric layer, the light penetrating the ramp is deflected towards the first end. Accordingly, the light-shielding unit is designed to extend a length of d beyond the first end, and 0 ≤ d ≤ 7 μm, to ensure that the light-shielding unit can block the deflected light penetrating the ramp.

[0095] As Figure 11 As shown in (b), the refractive index of the first ramp 10-1 is n1, and the refractive index of the dielectric layer is n2, where n1 < n2. When light travels from the dielectric layer to the first ramp 10-1, according to the law of refraction, since n1 < n2, then sinθ1 > sinθ2, that is, the incident angle is less than the refraction angle. A light-shielding unit 90 is provided below the first ramp 10-1. In the direction e perpendicular to the display panel, the orthographic projection of the first ramp 10-1 on the substrate 101 is the first projection; the orthographic projection of the light-shielding unit 90 on the substrate 101 is the second projection. The distance between the edge of the first projection and the edge of the second projection is d, where 0 ≤ d ≤ 7 μm. In the direction e, the first ramp 10-1 and the light-shielding unit 90 overlap. As shown in (a), on the right side, the edge of the first ramp 10-1 and the edge of the light-shielding unit 90 are substantially aligned; on the left side, the length that the edge of the light-shielding unit 90 extends beyond the edge of the first ramp 10-1 is d. The first ramp includes a first end and a second end. Among them, in the direction perpendicular to the substrate, the thickness of the first end is less than the thickness of the second end. When the refractive index of the first ramp is less than the refractive index of the dielectric layer, the light penetrating the ramp is deflected towards the second end. Accordingly, the light-shielding unit is designed to extend a length of d beyond the second end, and 0 ≤ d ≤ 7 μm, to ensure that the light-shielding unit can block the deflected light penetrating the ramp.

[0096] The above Figure 11 The configuration of the light-shielding unit under different conditions is given. Refer to the above for specific structural applications. Figure 11 The description states that the light-shielding unit is designed based on the refractive index of the first slope and the size relationship between the dielectric layers.

[0097] Figure 10 The above illustration only uses the slope formed by the edge of the pixel definition layer near the opening. Figures 5 to 9 Any embodiment is applicable Figure 10 The proposed solution will not be elaborated upon here.

[0098] In another embodiment, the display panel includes a functional structure with a ramped edge. The edge of the functional structure located in the first display area has a first ramp, which is fabricated using a specific process to increase the scattering effect of the ramp surface on light. Simultaneously, a light-shielding unit is provided on the side of the first ramp closer to the substrate. In a direction perpendicular to the display panel, the orthographic projection of the first ramp onto the substrate is a first projection; the orthographic projection of the light-shielding unit onto the substrate is a second projection, which overlaps the first projection. This embodiment combines increasing the scattering effect of the ramp surface in the first display area on light with blocking light penetrating the ramp using a light-shielding unit to mitigate the impact of light deflection caused by light penetrating the ramp on image quality, reduce ghosting during imaging, and improve the overall imaging effect.

[0099] To improve the imaging performance of organic light-emitting display panels when used in under-display optical element solutions, embodiments of this application further design the shape of the openings in the pixel definition layer. As described above... Figure 3 As illustrated, the openings 31 of the pixel definition layer are hexagonal and regularly arranged. The six sidewalls of each hexagonal opening 31 are sloped surfaces. When light passes through an opening 31, it is deflected in the six directions indicated by the arrows in the diagram. This results in a concentration of deflected light between adjacent openings, causing ghosting in the image. Therefore, this application further designs the shape of the pixel definition layer openings, designing that at least some of the adjacent openings have non-parallel sides, or designing the opening shape as a circle or ellipse. This improves the problem of concentrated deflected light between adjacent openings, reducing the intensity of ghosting and improving the imaging effect.

[0100] Specifically, in one embodiment, Figure 12 This is another top view schematic diagram of the pixel definition layer in the display panel provided in an embodiment of this application. (See diagram below.) Figure 12As shown, the shape of the opening 31 in the pixel definition layer is hexagonal, and at least some of the adjacent two sides of two adjacent openings 31 are not parallel. That is, in two adjacent openings 31, the pattern of one opening is equivalent to the pattern of the other opening after a certain angle rotation.

[0101] In another embodiment, Figure 13 This is another top view schematic diagram of the pixel definition layer in the display panel provided in an embodiment of this application. (See diagram below.) Figure 13 As illustrated, the opening 31 of the pixel definition layer is circular. When light passes through the side wall of the circular opening, the propagation direction of the deflected light is evenly distributed around the circular opening, reducing the concentration of deflected light energy, thereby reducing the intensity of image ghosting and improving the imaging effect.

[0102] This application also provides a method for manufacturing a display panel, which can be used to manufacture the display panel provided in the above embodiments of this application. The manufacturing method includes: using a first mask to fabricate a functional structure in a photolithography process, wherein the first mask includes a first mask area, which is used to form a functional structure within a first display area; the first mask area includes a first light-shielding area, a first pattern area, and a first transition area, the first transition area being located between the first pattern area and the light-shielding area, the transmittance of the first transition area being less than the transmittance of the first pattern area, and the transmittance of the first transition area being greater than the transmittance of the first light-shielding area. In the embodiments of this application, the functional structure can be a pixel definition layer or a support pillar. In the manufacturing of the display panel, different masks are required for the pixel definition layer and the support pillar. However, in order to increase the scattering effect of the slope of the edge slope of the pixel definition layer or the edge slope of the support pillar located in the first display area on light, the design concept of the mask structure is the same.

[0103] Figure 14 This is a partial schematic diagram of a mask used in the pixel definition layer etching process in the prior art, such as... Figure 14 As shown, the photomask includes a patterned area S and a light-shielding area Z. The light-shielding area Z is opaque, while the patterned area S has a certain transmittance. Taking the etching process using positive photoresist as an example, the shape of the pixel definition layer formed by the final etching is the same as the shape of the light-shielding area Z. Therefore, an opening of the pixel definition layer is formed at the position corresponding to the patterned area S. Figure 14The diagram also shows a pixel definition layer 30 formed using a mask in the prior art, and the slope at the edge of the pixel definition layer 30. The slope at the edge corresponds to the boundary between the pattern area S and the light-shielding area Z. The slope at the edge is formed because, during the exposure step in the photolithography process, there is light diffusion at the boundary between the pattern area S and the light-shielding area Z. The exposure degree of the photoresist illuminated by the diffused light is less than that of the photoresist corresponding to the central area of ​​the pattern area. Therefore, after the development step, a slope forms at the edge of the photoresist, which in turn causes a slope to form at the edge of the functional structure during the etching step.

[0104] Figure 15 This is a schematic diagram of a mask used in the etching process of the functional structure in the embodiments of this application. Figure 15 As shown, the first mask area M1 of the photomask is illustrated. The first mask area M1 is used to form a functional structure within the first display area. The first mask area M1 includes a first light-shielding area Z1, a first pattern area X1, and a first transition area G1. The first transition area G1 is located between the first pattern area X1 and the first light-shielding area Z1. The transmittance of the first transition area G1 is less than that of the first pattern area X1, and the transmittance of the first transition area G1 is greater than that of the first light-shielding area Z1. When positive photoresist is used for etching, Figure 15 The illustrated mask can be used to create pixel definition layers. The shape of the first graphic area X1 in the figure is for illustrative purposes only.

[0105] Figure 16 A flowchart illustrating a method for manufacturing a display panel according to an embodiment of this application. Figure 16 The examples use Figure 15 The diagram illustrates the functional structure of a mask fabrication process. For example... Figure 16 As shown, the photolithography process includes:

[0106] Step S101: A functional material layer 300 is fabricated on one side of the substrate 101. The functional material layer 300 is divided into a retention area 310 and an etched area 320. The retention area 310 is used to form a functional structure. The retention area 310 also includes an edge area 311. The edge area 311 is adjacent to the etched area 320 and is used to form a ramp of the functional structure.

[0107] Step S102: Coat the functional material layer 300 with photoresist 400;

[0108] Step S103: Align the first mask M with the substrate 101, and turn on the UV light source to irradiate the photoresist 400 from one side of the first mask M. The first transition region G1 corresponds to the edge region 311 located in the first display region 21. As can be seen from the schematic optical path diagram, light will diffuse at the boundary positions of regions with different transmittance.

[0109] Step S104: Development, removing the photoresist in the UV-irradiated area to form a photoresist pattern; due to the existence of diffusion, the photoresist in the area irradiated by diffused light has a lower exposure level, resulting in photoresist residue after development. Since a first transition region G1 is set in the photomask, the roughness of the slope surface at the edge of the photoresist pattern increases after development.

[0110] Step S105: The functional material layer 300 is etched using a photoresist pattern as a hard mask. Due to the increased roughness of the slope surface at the edge of the photoresist pattern, the penetration of the etching solution used in the etching process is affected, resulting in a change in the degree of edge etching of the functional structure compared to related technologies. After the etching process, the shape of the slope surface at the edge of the functional structure is approximately the same as the shape of the slope surface at the edge of the photoresist pattern. That is, the roughness of the slope surface located in the first display area increases, thereby enhancing the scattering effect of the slope surface on light.

[0111] Figure 15 This illustration only depicts one type of mask structure; in another embodiment, Figure 17 This is a schematic diagram of another mask structure used in the etching process of the functional structure in the embodiments of this application. For example... Figure 17 As shown, the first mask area M1 includes a first shading area Z1, a first pattern area X1, and a first transition area G1. The first transition area G1 is located between the first pattern area X1 and the first shading area Z1. The transmittance of the first transition area G1 is less than that of the first pattern area X1, and the transmittance of the first transition area G1 is greater than that of the first shading area Z1. The first transition area G1 includes a first region G11 and a second region G12, wherein the transmittances of the first region G11 and the second region G12 are different. That is, regions with different transmittances are set within the first transition area G1. This allows for further increases in the surface roughness of the slope in applications.

[0112] In another embodiment, Figure 18 This is a schematic diagram of another mask structure used in the etching process of the functional structure in the embodiments of this application. For example... Figure 18 As shown, the first mask area M1 includes a first light-shielding area Z1, a first pattern area X1, and a first transition area G1. The first transition area G1 is located between the first pattern area X1 and the first light-shielding area Z1. The transmittance of the first transition area G1 is less than that of the first pattern area X1, and the transmittance of the first transition area G1 is greater than that of the first light-shielding area Z1. The first transition area G1 includes a first region G11 and a second region G12. The transmittances of the first region G11 and the second region G12 are different. The first region G11 can have the same transmittance as the first light-shielding area Z1, meaning that the first region G11 can be essentially opaque.

[0113] In another embodiment, Figure 19 This is a schematic diagram of another mask structure used in the etching process of the functional structure in the embodiments of this application. For example... Figure 19 As shown, the first mask area M1 includes a first light-shielding area Z1, a first pattern area X1, and a first transition area G1. The first transition area G1 is located between the first pattern area X1 and the first light-shielding area Z1. The transmittance of the first transition area G1 is less than that of the first pattern area X1, and the transmittance of the first transition area G1 is greater than that of the first light-shielding area Z1. The first transition area G1 includes a first region G11 and a second region G12. The transmittance of the first region G11 and the second region G12 are different. The first region G11 can have the same transmittance as the first light-shielding area Z1, meaning that the first region G11 can be essentially opaque. Optionally, the boundary between the first region G11 and the second region G12 is wavy or serrated.

[0114] The above Figures 17 to 19 The mask in this embodiment can be used to create a pixel definition layer, wherein the shape of the first graphic area is only schematically shown. The mask used to create the support pillars can be designed accordingly with reference to the above description and the accompanying drawings, and will not be elaborated further here.

[0115] Furthermore, the first mask also includes a second mask region, which is used to form a functional structure within the second display area. The second mask region includes a second light-shielding region, a second pattern region, and a second transition region. The second transition region is located between the second pattern region and the second light-shielding region. The light transmittance of the second transition region is less than that of the second pattern region, and the light transmittance of the second transition region is greater than that of the second light-shielding region. Aligning the first mask with the substrate further includes: the second transition region corresponding to the edge region located in the second display area.

[0116] In other words, the second mask area used to form the functional structure within the second display area can adopt the same design as the first mask area, with a transition area between the pattern area and the light-shielding area to increase the roughness of the slope surface. That is, since the slopes in the first and second display areas are manufactured using the same specific process, the functional structures in the first and second display areas can be fabricated in the same process. Furthermore, the mask used in the functional structure etching process can adopt a uniform design across the entire surface, simplifying the mask design.

[0117] This application also provides an electronic device, which includes the display panel provided in any embodiment of this application. The electronic device can be any electronic device with display functionality, such as a mobile phone, tablet computer, laptop computer, e-reader, television set, or smartwatch. Figure 20 This is a cross-sectional schematic diagram of an electronic device provided in an embodiment of this application. For example... Figure 20As shown, the electronic device also includes an optical component 200, which is located on one side of the display panel 100 and overlaps with the first display area 21 in a direction e perpendicular to the display panel 100. Optionally, the optical component 200 is a camera.

[0118] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

[0119] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A display panel, characterized in that, The display panel includes: Substrate; A functional structure is located on the substrate, the edge of the functional structure has a slope, and the slope has a sloping surface; A medium layer that is in contact with at least a portion of the slope surface, and the refractive index of the medium layer is different from that of the slope. The display panel includes a first display area and a second display area, wherein the light transmittance of the first display area is greater than that of the second display area; wherein, The edge of the functional structure located in the first display area has a first slope. The first slope is made using a specific process to increase the roughness of the slope surface, thereby enhancing the scattering effect of the slope surface on light. The specific process includes using a mask to fabricate the functional structure in a photolithography process. The mask includes a light-shielding area, a pattern area, and a transition area. The transition area is located between the pattern area and the light-shielding area. The light transmittance of the transition area is less than that of the pattern area, and the light transmittance of the transition area is greater than that of the light-shielding area. The transition area is used to fabricate the first slope. The display panel includes a pixel definition layer and a plurality of support pillars located on the substrate. The support pillars are located on the side of the pixel definition layer away from the substrate. The functional structure includes the support pillars, the edge of the support pillars being the first slope, and the sidewall of the support pillars being the slope surface of the first slope.

2. The display panel according to claim 1, characterized in that, The edge of the functional structure located in the second display area has a second slope; wherein, The second ramp and the first ramp are manufactured using the same specific process.

3. The display panel according to claim 1, characterized in that, The display panel includes a plurality of light-emitting devices located on the substrate. The pixel definition layer is used to space adjacent light-emitting devices. The light-emitting devices include an anode layer, a light-emitting layer and a cathode layer stacked in sequence. The functional structure includes the pixel definition layer, which has a plurality of openings. The edge of the pixel definition layer near the opening is a first slope, and the sidewall of the opening is the slope surface of the first slope.

4. The display panel according to claim 1, characterized in that, The display panel includes a plurality of light-emitting devices located on the substrate, and the pixel definition layer is used to space adjacent light-emitting devices. The light-emitting devices include an anode layer, a light-emitting layer and a cathode layer stacked in sequence.

5. The display panel according to any one of claims 1 to 4, characterized in that, The display panel further includes a light-shielding unit located in the first display area, the light-shielding unit being located on the side of the first slope closer to the substrate; In the direction perpendicular to the display panel, the orthogonal projection of the first ramp onto the substrate is a first projection; the orthogonal projection of the light-shielding unit onto the substrate is a second projection, and the second projection covers the first projection.

6. The display panel according to claim 5, characterized in that, The distance between the edge of the first projection and the edge of the second projection is d, where 0 ≤ d ≤ 7 μm.

7. The display panel according to claim 3 or 4, characterized in that, The display panel further includes a light-shielding unit located in the first display area, the light-shielding unit being located on the side of the pixel definition layer closer to the substrate; In the direction perpendicular to the display panel, the orthographic projection of the first slope onto the plane where the light-shielding unit is located is the first projection; the orthographic projection of the light-shielding unit onto the substrate is the second projection, and the second projection covers the first projection. The light-shielding unit is made of the same material as the anode layer.

8. The display panel according to claim 3, characterized in that, The opening is circular or elliptical in shape.

9. An electronic device, characterized in that, The electronic device includes the display panel according to any one of claims 1 to 8. The electronic device further includes an optical component located on one side of the display panel, and the optical component overlaps with the first display area in a direction perpendicular to the display panel.

Images