Display panel, preparation method thereof and display device

Abstract

The application provides a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, a pixel layer, a mask layer, an optical layer and the like. The pixel layer comprises an opening area and a non-opening area, and further comprises a first electrode layer located in the opening area and the non-opening area. The first electrode layer comprises a first opening in the non-opening area. The mask layer comprises a second opening. The mask layer is located between the substrate and the optical layer, and the optical layer is located between the mask layer and the first electrode layer. The orthographic projection of the second opening on the substrate is located in the orthographic projection of the first opening on the substrate. The optical layer is used for diffusing etching light incident from the second opening, and the diffused etching light is used for etching the first electrode layer to form the first opening. The opening area of the first opening is not less than the opening area of the second opening, the light transmittance of the first electrode layer is improved, the light transmittance of the display panel is improved, and the working requirements of functional elements such as under-screen fingerprint or under-screen camera are met.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of display, more particularly, to a display panel, a preparation method thereof and a display device. BACKGROUND

[0002] With the continuous improvement of life and display technology, users have higher requirements for the screen ratio of display screens, and the pursuit of full-screen display effect has become the common pursuit of users and manufacturers.

[0003] The under-screen fingerprint and / or under-screen camera technology is usually used in the current full-screen display panel, which puts forward higher requirements for the optical transmittance of the display panel in the above-mentioned area. SUMMARY

[0004] Therefore, the embodiments of the present application aim to provide a display panel with good optical transmittance, a preparation method thereof and a display device, so as to achieve the purpose of improving the optical transmittance.

[0005] In a first aspect, the embodiments of the present application provide a display panel, comprising:

[0006] a substrate;

[0007] a pixel layer, the pixel layer comprising an opening area and a non-opening area, the pixel layer further comprising a first electrode layer located in the opening area and the non-opening area, the first electrode layer comprising a first aperture in the non-opening area;

[0008] a mask layer, the mask layer comprising a second aperture;

[0009] an optical layer;

[0010] The mask layer is located between the substrate and the optical layer, the optical layer is located between the mask layer and the first electrode layer, the orthographic projection of the second aperture on the substrate is located within the orthographic projection of the first aperture on the substrate, and the optical layer is used to diffuse etching light rays incident from the second aperture, and the etching light rays after diffusion are used to etch the first electrode layer to form the first aperture.

[0011] Optionally, the display panel further comprises a first display area and a second display area surrounding the first display area.

[0012] The orthographic projection of the first aperture on the substrate is located within the first display area, and the orthographic projection of the second aperture on the substrate is located within the first display area.

[0013] Optionally, the first display area comprises a transparent display area and a transition area surrounding the transparent display area.

[0014] A normal projection of the first opening on the substrate is located in the transparent display area, and a normal projection of the second opening on the substrate is located in the transparent display area.

[0015] Optionally, the optical layer comprises a plurality of diffusion structures corresponding to the second openings, and the display panel further comprises a contact insulating layer covering the diffusion structures.

[0016] The diffusion structure comprises a diffusion surface in contact with the contact insulating layer.

[0017] Optionally, a refractive index of the diffusion structure is less than a refractive index of the contact insulating layer.

[0018] Optionally, the diffusion surface comprises an arc surface convex to the contact insulating layer and / or a broken line surface convex to the contact insulating layer.

[0019] Optionally, the diffusion structure comprises a plano-convex lens and / or a first prism, an arc surface of the plano-convex lens is the diffusion surface, and the first prism comprises a convex surface formed by a first surface and a second surface, the convex surface being the diffusion surface.

[0020] Optionally, a refractive index of the diffusion structure is greater than a refractive index of the contact insulating layer.

[0021] Optionally, the diffusion surface comprises an arc surface concave to the contact insulating layer and / or a broken line surface concave to the contact insulating layer.

[0022] Optionally, the diffusion structure comprises a plano-concave lens and / or a second prism, an arc surface of the plano-concave lens is the diffusion surface, and the second prism comprises a concave surface formed by a third surface and a fourth surface, the concave surface being the diffusion surface.

[0023] In a second aspect, an embodiment of the present application further provides a preparation method of a display panel, comprising:

[0024] providing a substrate;

[0025] forming a mask layer, an optical layer, a pixel layer and a first electrode layer on a first surface of the substrate, the mask layer being located between the substrate and the optical layer, the pixel layer being located on a side of the optical layer away from the substrate, the pixel layer comprising an opening area and a non-opening area, the pixel layer further comprising a first electrode layer located in the opening area and the non-opening area, the first electrode layer comprising a to-be-etched region in the non-opening area, and the mask layer comprising a plurality of second openings corresponding to the to-be-etched region;

[0026] The mask layer is used as a mask, etching light is provided from the second opening, and after the etching light is diffused by the diffusion structure, the etching light is irradiated on a region to be etched of the first electrode layer to remove part of the region to be etched of the first electrode layer, and a first opening is formed.

[0027] Optionally, the optical layer is formed by an organic vapor deposition process.

[0028] In a third aspect, an embodiment of the present application provides a display device, which comprises the display panel as described in any one of the above.

[0029] As can be seen from the above technical solutions, the present application provides a display panel, a preparation method thereof, and a display device. The display panel comprises a substrate, a pixel layer comprising an opening region and a non-opening region, the pixel layer further comprising a first electrode layer located in the opening region and the non-opening region, the first electrode layer comprising a first opening in the non-opening region, a mask layer comprising a second opening, and an optical layer. The mask layer is located between the substrate and the optical layer, and the optical layer is located between the mask layer and the first electrode layer. The orthographic projection of the second opening on the substrate is located within the orthographic projection of the first opening on the substrate. The optical layer is used to diffuse etching light incident from the second opening, and the diffused etching light is used to etch the first electrode layer to form the first opening. The opening area of the first opening is not less than the opening area of the second opening in the mask layer, the light transmittance of the first electrode layer is improved, and thus the light transmittance of the display panel is improved to meet the working requirements of functional elements such as an under-screen fingerprint or an under-screen camera. BRIEF DESCRIPTION OF DRAWINGS

[0030] Figure 1 FIG. 1 is a schematic diagram of a cross-sectional structure of a display panel in the prior art;

[0031] Figure 2 FIG. 2 is a schematic diagram of a top view structure of a display panel according to an embodiment of the present application;

[0032] Figure 3 FIG. 3 is a schematic diagram of a cross-sectional structure of a display panel according to an embodiment of the present application;

[0033] Figure 4 FIG. 4 is a schematic diagram of a cross-sectional structure of a display panel according to another embodiment of the present application;

[0034] Figure 5 FIG. 5 is a schematic diagram of a cross-sectional structure of a display panel according to yet another embodiment of the present application;

[0035] Figure 6 FIG. 6 is a schematic diagram of a cross-sectional structure of a display panel according to still another embodiment of the present application;

[0036] Figure 7A cross-sectional structure schematic diagram of a display panel provided for an optional embodiment of the present application is shown in FIG. 1.

[0037] Figure 8 A flowchart of a preparation method of a display panel provided for an embodiment of the present application is shown in FIG. 2.

[0038] Figure 9 A cross-sectional schematic diagram of a substrate provided for an embodiment of the present application is shown in FIG. 3.

[0039] Figure 10 A cross-sectional schematic diagram of a display panel without etching provided for an embodiment of the present application is shown in FIG. 4.

[0040] Figure 11 A schematic diagram of etching the first electrode layer by etching light provided for an embodiment of the present application is shown in FIG. 5.

[0041] Figure 12 A cross-sectional structure schematic diagram of a display panel provided for another optional embodiment of the present application is shown in FIG. 6.

[0042] Figure 13 A schematic diagram of a display device provided for an embodiment of the present application is shown in FIG. 7. DETAILED DESCRIPTION

[0043] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0044] Summary

[0045] The inventor of the present application has noticed in research that, in order to meet the requirements of a full-screen, one or more high-transmittance display areas need to be arranged in a display panel, and the light transmittance of the high-transmittance display area is greater than that of a normal display area, so as to meet the optical requirements of functional elements such as an under-screen fingerprint or an under-screen camera.

[0046] The high-transmittance display area usually needs to be specially designed, for example, the pixel density in the high-transmittance display area is reduced, the material transparency of the high-transmittance display area is increased, and the number of film layers in the high-transmittance display area is reduced.

[0047] In the technical direction of reducing the number of film layers of the high-transmittance display area, the part of the cathode of the display pixel in the high-transmittance display area can be removed to improve the light transmittance of the high-transmittance display area. The cathode removal area can be an area that does not overlap with the anode of the display pixel, so as to avoid negative effects on the normal operation of the display pixel.

[0048] Reference Figure 1 , 1 represents a substrate, 2 represents a mask plate, 3 represents a planarization layer, 4 represents an anode, 5 represents a light-emitting layer, 6 represents a cathode, 6' represents a part of the cathode to be removed, and 7 represents a pixel definition layer. The inventors have found through further research that when the part of the cathode 6 is removed by laser irradiation, the laser is incident into the display panel through the opening area of the mask plate 2, and the part of the cathode to be removed 6' is removed by using the laser energy. The area of the opening area of the mask plate is a process design parameter. In theory, the area of the opening area of the mask plate should be equal to the area of the part of the cathode to be removed 6', but through actual production practice, it is found that the area of the part of the cathode to be removed 6' is always smaller than the area of the opening area of the mask plate 2, resulting in poor actual cathode removal effect and no obvious improvement in the light transmittance of the high-transmittance display area.

[0049] Therefore, it is necessary to provide a display panel to improve the effect of removing part of the cathode by light irradiation, thereby improving the light transmittance of the display panel.

[0050] The display panel provided by the embodiments of the present application is non-restrictively described below through several examples or embodiments. As described below, different features in these specific examples or embodiments can be combined with each other without mutual contradiction, so as to obtain new examples or embodiments, and these new examples or embodiments also belong to the protection scope of the present application.

[0051] Exemplary display panel

[0052] Reference Figure 2 , Figure 2 is a top view structural schematic diagram of a display panel provided by an exemplary embodiment of the present application, Figure 3 is Figure 2 is a cross-sectional structural schematic diagram of the display panel. For the sake of clear illustration, Figure 3 only part of the cross section of the display panel is shown in the figure. With reference to Figure 2 and Figure 3 , an exemplary embodiment of the present application provides a display panel, comprising:

[0053] a substrate 100. Optionally, in some embodiments of the present application, the substrate 100 can be a substrate or an array substrate. The substrate 100 can include a first surface 110 and a second surface 120 arranged oppositely.

[0054] The pixel layer comprises an opening region 310a and a non-opening region 310b, and further comprises a first electrode layer 310 located in the opening region 310a and the non-opening region 310b, wherein the first electrode layer 310 comprises a first opening 311 in the non-opening region 310b. Optionally, the pixel layer further comprises a light-emitting layer 320 for constituting a display pixel in the pixel layer.

[0055] The optical layer comprises a plurality of diffusion structures 400, which can correspond to the first openings 311 one by one.

[0056] The mask layer 200 is located between the substrate 100 and the optical layer, and the optical layer is located between the mask layer 200 and the first electrode layer 310. The orthographic projection of the second opening 201 on the substrate is located within the orthographic projection of the first opening 311 on the substrate 100. The optical layer is used to diffuse the etching light rays incident from the second opening 201, and the diffused etching light rays are used to etch the first electrode layer 310 to form the first opening 311.

[0057] Generally, as long as the diffusion structures 400 are located between the first electrode layer 310 and the mask layer 200, the diffusion structures 400 can diffuse the etching light rays incident from the second surface 120. For example, referring to FIG. 2, the diffusion structures 400 are located between the first electrode layer 310 and the mask layer 200, and the diffusion structures 400 can diffuse the etching light rays incident from the second surface 120. Figure 4 In the preparation process of the display panel, the first electrode layer 310 is generally an integral layer structure. When it is necessary to remove part of the first electrode layer 310, the first opening 311 can be formed by irradiating the etching light rays from the second surface 120 side to the position of the first opening 311 of the first electrode layer 310, so as to remove the first electrode layer 310 at the position of the first opening 311 by using the energy of the etching light rays. Due to the diffusion structures 400, the incident etching light rays can be diffused, so that the size of the first opening 311 obtained by etching the first electrode layer 310 is not less than the opening area of the second opening 201 of the mask layer 200, and the etching size of the first opening 311 meets the design requirements, thereby avoiding the etching size of the first opening 311 being less than the design size, improving the light transmittance of the display panel in the region of the first opening 311, and meeting the working requirements of functional elements such as a fingerprint module and a camera.

[0058] It can be seen that, as long as the diffusion structures 400 are located between the first electrode layer 310 and the mask layer 200, the above-mentioned purposes can be achieved. The specific settings of the diffusion structures 400 and the mask layer 200 are not limited in the present application, and are determined according to the actual structure of the display panel. Figure 3 and Figure 4 It can be seen that, as long as the diffusion structures 400 are located between the first electrode layer 310 and the mask layer 200, the above-mentioned purposes can be achieved. The specific settings of the diffusion structures 400 and the mask layer 200 are not limited in the present application, and are determined according to the actual structure of the display panel.

[0059] In Figure 3 and Figure 4 , the first insulating layer 210, the second insulating layer 220, the third insulating layer 230 and the second electrode 330 of the display pixel are shown, the second electrode 330, the light-emitting layer 320 and the first electrode layer 310 jointly constitute a pixel layer. The first insulating layer 210 and the second insulating layer 220 are insulating layers for isolating metal layers in the display panel, for example, one of the gate insulating layer, the planarization layer and the interlayer dielectric layer. The third insulating layer 230 can be an insulating layer for defining the area where the display pixel is located, for example, a pixel definition layer. It is not difficult to understand that a large number of display pixels will be arranged in the pixel layer of the display panel, Figure 3 and Figure 4 In order to display clearly, only two display pixels are shown.

[0060] In order to ensure the normal work of each display pixel on the display panel, the orthographic projection of the first opening hole 311 on the substrate 100 is generally not overlapped with the orthographic projection of the light-emitting layer 320 or the second electrode 330 on the substrate, so as to ensure that the first opening hole 311 is located in the non-opening area 310b, so as to avoid the adverse effect of the first opening hole 311 on the normal work of the display pixel.

[0061] Figure 3 and Figure 4 In and, the setting position relationship of the diffusion structure 400 and the mask layer 200 is shown, in some embodiments of the present application, the diffusion structure 400 can be in the same layer as the insulating layer, and can also be in the same layer as the metal layer (for example, the metal layer for forming the second electrode 330), the mask layer 200 can be in the same layer as the insulating layer, and can also be in the same layer as the metal layer (for example, the metal layer for forming the gate or the drain of the thin film transistor), in the present application, unless otherwise specified, “in the same layer” can mean that the distance between the substrate 100 is approximately equal, or can mean that it is formed in the same process. The preparation process of the diffusion structure 400 includes but is not limited to organic vapor phase deposition (Organic Vapor Phase Deposition). The present application does not exhaustively list the feasible relative position relationship between the diffusion structure 400 and the mask layer 200, and the specific situation is determined according to the actual situation.

[0062] The etching light refers to the light used for etching a specific film layer, which can be some light with high energy density, such as laser, etc., which is not limited in the present application.

[0063] Optionally, in an example embodiment of the present application, the projections of the plurality of first openings 311 on the substrate 100 do not overlap with each other. When the first openings 311 do not communicate with each other, the first electrode layer 310 can still be kept as an integral film layer, and only one voltage signal needs to be provided for the first electrode layer 310 to meet the working requirements of all display pixels in operation, without the need to provide a separate voltage signal for the first electrode (e.g. cathode) of each display pixel, which is conducive to simplifying the overall structure of the display panel.

[0064] In other example embodiments of the present application, there can also be two or more first openings 311 communicating with each other, and when the plurality of first openings 311 communicating with each other divide the first electrode layer 310 into two or more parts, the parts of the first electrode layer 310 separated by the first openings 311 can be connected by a bridging electrode.

[0065] Still referring to Figure 2 and Figure 3 , in an example embodiment of the present application, the first surface 110 includes a first display area 111 and a second display area 112 surrounding the first display area 111, the projections of the first openings 311 on the substrate 100 are located within the first display area 111, and the projections of the second openings 201 on the substrate 100 are located within the first display area 111.

[0066] In this embodiment, the first display area 111 can be a display area for setting a functional element such as an under-screen camera or an under-screen fingerprint, and the second display area 112 surrounding the first display area 111 can be partially surrounding, or completely surrounding as shown in Figure 2 and Figure 3 . The first openings 311 are arranged in the first display area 111, which is conducive to improving the light transmittance of the first display area 111, meeting the optical requirements of the functional element such as the under-screen camera or the under-screen fingerprint, and improving the working effect (e.g. improving the success rate of under-screen fingerprint recognition) of the functional element such as the under-screen camera or the under-screen fingerprint. Correspondingly, the mask layer 200 serving as a mask in forming the first display area 111 and the diffusion structure 400 serving as light diffusion can also be arranged in the first display area 111. Since the second display area 112 usually does not have strict light transmittance requirements, the first electrode layer 310 in the second display area 112 can not be provided with the first openings 311, and correspondingly, the second display area 112 can not be provided with the mask layer 200 and the diffusion structure 400. In this way, when the first openings 311 are formed, the illumination range of the etching light can be limited within the first area, reducing the light energy consumption and the number of film layers in the second display area 112, and simplifying the structure and preparation process of the display panel.

[0067] Optionally, in an example embodiment of the present application, still referring toFigure 2 The first display area 111 includes a transparent display area 1112 and a transition area 1111 surrounding the transparent display area 1112.

[0068] The first opening 311 has a projection on the substrate 100 within the transparent display area 1112, and the second opening 201 has a projection on the substrate 100 within the transparent display area 1112.

[0069] Since the transparent display area 1112 needs to be specially designed to meet the optical requirements of functional elements such as cameras, the display pixels in the transparent display area 1112 may be specially designed, which may cause display differences between the transparent display area 1112 and the second display area 112. Therefore, in the embodiment, the first display area 111 is further divided into the transparent display area 1112 and the transition area 1111, and the display pixels in the transition area 1111 can be transitionally designed, so that the transition area 1111 can avoid the too obvious display difference caused by the direct adjacency of the transparent display area 1112 and the transition area 1111.

[0070] In the embodiment, the first opening 311 is arranged in the transparent display area 1112, which is beneficial to improve the light transmittance of the transparent display area 1112, meet the optical requirements of functional elements such as under-screen cameras or under-screen fingerprints, and improve the working effect of functional elements such as under-screen cameras or under-screen fingerprints. The transition area 1111 and the second display area 112 usually do not have strict light transmittance requirements, so the first electrode layer 310 can not be provided with the first opening 311 in the transition area 1111 and the second display area 112. Correspondingly, the transition area 1111 and the second display area 112 can also not be provided with the mask layer 200 and the diffusion structure 400. In this way, when the first opening 311 is formed, the illumination range of the etching light can be limited in the first area, reducing the light energy consumption and reducing the number of film layers in the transition area 1111 and the second display area 112, and simplifying the structure and preparation process of the display panel.

[0071] In an embodiment of the present application, still referring to Figure 3 or Figure 4 The display panel further includes a contact insulating layer covering the diffusion structure 400, and the diffusion structure 400 includes a diffusion surface 410, and the diffusion surface 410 is in contact with the contact insulating layer.

[0072] In the embodiment, the contact insulating layer can be one of the second insulating layer 220 and the third insulating layer 230 described above. For example, in Figure 3 , the contact insulating layer is the third insulating layer 230, and in Figure 4 , the contact insulating layer is the second insulating layer 220.

[0073] The diffusion surface 410 of the diffusion structure 400 and the contact insulating layer in contact with it form an optical surface of an optical device (such as a convex lens or a concave lens). The diffusion of etching light can be achieved by using this optical surface. The structure is simple and helps to simplify the overall structure of the display panel.

[0074] In one embodiment of the present invention, reference is made to... Figure 5 In conjunction with references Figure 3 or Figure 4 The refractive index of the diffusion structure 400 is less than that of the contact insulating layer.

[0075] The diffusion surface 410 includes an arcuate surface convex toward the contact insulation layer (e.g. Figure 3 , Figure 4 ) or folded surfaces that bulge towards the contact insulation layer (such as Figure 5 ).

[0076] When the refractive index of the diffusion structure 400 is less than that of the contact insulating layer, when the etching light rays incident from the diffusion structure 400 onto the contact insulating layer, it is equivalent to moving from an optically less dense medium to an optically denser medium. At this time, the light rays will deflect towards the normal direction. Therefore, the diffusion surface 410 can be designed as an arc-shaped surface convex to the contact insulating layer or a zigzag surface convex to the contact insulating layer to diverge the etching light rays. Figure 3 and Figure 4 In this configuration, the diffusion surface 410 is an arc-shaped surface convex towards the contact insulating layer. At this point, the diffusion structure 400 as a whole functions as a convex lens, achieving the divergence of incident etching light. Figure 5 In this process, the diffusion surface 410 is a folded surface that convex to the contact insulating layer. At this time, the diffusion structure 400 as a whole exists as a prism, realizing the divergence of incident etching light.

[0077] The diffusion surface 410 is used to disperse the etching light, which improves the applicability of the diffusion structure 400. In other words, in different application environments, it is only necessary to design the diffusion surface 410 to bulge towards the side of the contact insulating layer, so as to meet the needs of different application scenarios.

[0078] In one exemplary embodiment of the present invention, reference is still made to... Figures 3-5 The diffusion structure includes a plano-convex lens and / or a first prism, wherein the curved surface of the plano-convex lens is the diffusion surface, and the first prism includes a convex surface formed by a first surface and a second surface, wherein the convex surface is the diffusion surface.

[0079] The diffusion structures included in the same display panel can have the same shape or different shapes. For example, in one embodiment of the present invention, the diffusion structures included in a display panel are all plano-convex lenses or first prisms, while in another embodiment of the present invention, the diffusion structures included in a display panel are partly plano-convex lenses and partly first prisms. The present invention does not limit this.

[0080] Figure 3 and Figure 4 The diffusion structure 400 shown in the figure is similar in overall shape to a plano-convex lens. In other embodiments of the present application, the diffusion structure 400 can also be a convex lens of other shapes, which are not limited in the present application. Figure 5 The diffusion structure 400 shown in the figure is similar in overall shape to a triangular prism. In other embodiments of the present application, the diffusion structure 400 can also be a quadrangular prism or a pentagonal prism, etc., which are not limited in the present application.

[0081] The diffusion function of the diffusion structure 400 is achieved by using a simple plano-convex lens or a first prism, which is beneficial to simplify the structure of the display panel and reduce the preparation difficulty of the display panel.

[0082] In an exemplary embodiment of the present application, with reference to Figure 6 and Figure 7 , the refractive index of the diffusion structure 400 is greater than the refractive index of the contact insulating layer.

[0083] The diffusion surface 410 includes an arc surface concave to the contact insulating layer ( Figure 6 ) or a broken line surface concave to the contact insulating layer ( Figure 7 ).

[0084] Similar to the foregoing, the contact insulating layer here refers to the contact insulating layer covering the diffusion structure 400 and directly contacting the diffusion surface 410.

[0085] When the refractive index of the diffusion structure 400 is greater than the refractive index of the contact insulating layer, the etching light is incident from the diffusion structure 400 to the contact insulating layer covering it, which is equivalent to being incident from a light-dense medium to a light-lean medium, and the light will deviate from the normal direction. Therefore, the diffusion surface 410 is set to an arc surface concave to the contact insulating layer and / or a broken line surface concave to the contact insulating layer, so that the diffusion structure 400 has a light diffusion function, meets the diffusion function of the etching light, has a simple structure, is beneficial to simplify the structure of the display panel, and reduces the preparation difficulty of the display panel.

[0086] Still with reference to Figure 6 and Figure 7 , in an exemplary embodiment of the present application, the diffusion structure 400 includes a plano-concave lens and / or a second prism, the arc surface of the plano-concave lens is the diffusion surface 410, and the second prism includes a concave surface formed by a third surface and a fourth surface, and the concave surface is the diffusion surface 410.

[0087] Figure 6 The diffusion structure 400 shown in the figure is similar in overall shape to a plano-convex lens. In other embodiments of the present application, the diffusion structure 400 can also be a convex lens of other shapes, which are not limited in the present application. Figure 7The diffusion structure 400 shown has a shape similar to a five-sided prism, but in other embodiments of the present application, the diffusion structure 400 can also be other types of prisms, which are not limited in the present application.

[0088] Similarly, the shapes of the diffusion structures included in the same display panel can be the same or different, for example, in an embodiment of the present application, the diffusion structures included in a display panel are all plano-concave lenses or second prisms, while in another embodiment of the present application, the diffusion structures included in a display panel are partially plano-concave lenses and partially second prisms, which are not limited in the present application.

[0089] Using the simple plano-concave lens or second prism to realize the diffusion function of the diffusion structure 400 is conducive to simplifying the structure of the display panel and reducing the difficulty of manufacturing the display panel.

[0090] Exemplary method of manufacture

[0091] The embodiment of the present application also provides a preparation method of a display panel, as shown in Figure 8 The preparation method of the display panel comprises the following steps:

[0092] Step S101: providing a substrate 100, the substrate 100 comprising a first surface 110 and a second surface 120 arranged oppositely. Referring to Figure 9 , Figure 9 is a cross-sectional view of the substrate.

[0093] Step S102: forming a mask layer 200, an optical layer, a pixel layer and a first electrode layer 310 on the first surface 110 of the substrate 100, the mask layer 200 being located between the substrate 100 and the optical layer, the pixel layer being located on the side of the optical layer away from the substrate 100, the pixel layer comprising an opening region and a non-opening region 310b, the pixel layer further comprising a first electrode layer located in the opening region and the non-opening region 310b, the first electrode layer comprising a to-be-etched region in the non-opening region 310b, the first electrode layer 310 comprising a plurality of to-be-etched regions 312 in the non-opening region 310b, the to-be-etched regions 312 and the orthographic projection of the light-emitting layer 320 on the substrate 100 not overlapping each other, the mask layer 200 comprising a plurality of second openings 201 corresponding to the to-be-etched regions 312, and optionally, the optical layer comprising a plurality of diffusion structures 400 corresponding in position to the second openings 201.

[0094] As described above, the diffusion structure 400 can be prepared by an organic vapor deposition method. Referring to Figure 10 , Figure 10 is a cross-sectional view of the substrate 100 and the surface structure thereof after step S102, Figure 10 other film layers shown in the above-mentioned exemplary display panel can be referred to the corresponding description.

[0095] Step S103: taking the mask layer 200 as a mask, providing etching light to the substrate 100 from the second opening 201, the etching light irradiates on the to-be-etched area 312 of the first electrode layer 310 after diffusing through the diffusion structure 400, to remove part of the to-be-etched area 312 of the first electrode layer 310, and form the first opening 311. For reference Figure 11 , Figure 11 The etching light is used to etch the first electrode layer 310.

[0096] The specific structure of the display panel obtained by using the preparation method of the display panel can refer to the related description of the exemplary display panel described above, and the present application will not be repeated here.

[0097] In an exemplary embodiment of the present application, as shown in Figure 12 The display panel further comprises: a counter substrate A300.

[0098] Figure 12 The display panel is a cross-sectional structure schematic diagram, in Figure 12 which A100 represents the substrate 100 and its surface structure (such as the pixel layer, the mask layer 200, the optical layer, and other structures) described above. In addition to the above-mentioned structures, the display panel further comprises a counter substrate A300 located on the light-emitting direction side of the pixel layer. The counter substrate A300 comprises a counter substrate 303, a black matrix 302 located on the counter substrate 303, and a transparent color resistance 304 located in the area defined by the black matrix 302. In addition, it also comprises a protective film layer 301 to isolate water and oxygen from eroding the structures such as the black matrix 302 and the transparent color resistance 304.

[0099] As described above, the orthographic projection of the first opening in the first electrode layer on the substrate coincides with the orthographic projection of the black matrix 302 on the substrate, avoiding the adverse effects of the first opening on the normal operation of the display pixels.

[0100] Of course, in some embodiments of the present application, when the pixel layer is used to emit monochromatic light (such as white light), the transparent color resistance 304 on the counter substrate A300 can be replaced by color resistances of different colors (such as red color resistance, green color resistance, and blue color resistance, etc.), and the present application does not limit this.

[0101] Exemplary display device

[0102] The present application also provides a display device, as shown in Figure 13 , Figure 13 The display device B100 comprises the display panel of any of the above-mentioned embodiments.

[0103] In summary, the display panel and the preparation method thereof and the display device provided by the embodiments of the present application have the following advantages: the display panel substrate; the pixel layer, including an opening area and a non-opening area, the pixel layer further including a first electrode layer located in the opening area and the non-opening area, the first electrode layer including a first opening in the non-opening area; the mask layer, including a second opening; the optical layer; wherein the mask layer is located between the substrate and the optical layer, the optical layer is located between the mask layer and the first electrode layer, the orthographic projection of the second opening on the substrate is located within the orthographic projection of the first opening on the substrate, the optical layer is used to diffuse the etching light rays incident from the second opening, and the etching light rays diffused at the same time are used to etch the first electrode layer to form the first opening. In this way, the opening area of the first opening is not less than the opening area of the second opening in the mask layer, the light transmittance of the first electrode layer is improved, and the light transmittance of the display panel is improved to meet the working requirements of functional elements such as under-screen fingerprint or under-screen camera.

[0104] Exemplary embodiments are described herein with reference to cross-sectional and / or plan view illustrations that are idealized illustrations. In the interest of clarity, not all of the layer and regions are shown in the drawings with the same thickness. Thus, the dimensions of the layers and regions are not necessarily drawn to scale. For example, the thickness of some of the layers can be exaggerated relative to that of other layers (i.e., the thickness of the layers can be heightened in the drawings for clarity). Furthermore, the exemplary embodiments are not to be construed as limited to the precise shapes and configurations shown in the drawings. Accordingly, the shapes and configurations of the regions shown in the drawings are illustrative and do not necessarily correspond to the actual shapes and configurations of the regions in an electronic device. For the sake of presentation, the drawings can show only one of the sides of an integrated device. Dashed lines, dotted lines, and / or dashed-dotted lines can be used in addition to solid lines to demonstrate additional layers or regions.

[0105] Unless otherwise defined, technical terms or scientific terms used in the embodiments of the present application shall have the ordinary meaning used in the art to which the present application belongs. The terms "first", "second", and similar terms used in the embodiments of the present application do not denote any order, quantity, or importance, but are used to avoid confusion between the constituent elements.

[0106] Unless the context clearly requires otherwise, throughout the description, the terms "comprise," "comprising," "attached," "connected," "coupled," and the like are to be construed in an inclusive sense, as opposed to an exclusive or exhaustive sense; that is to say, in the sense of "including, but not limited to." The terms "a" and "an" are defined as one or more unless explicitly indicated to the contrary or otherwise unequivocally limited by context. The terms "another" and "one or more" are defined as at least a second or more unless expressly indicated to the contrary. The term "another" is defined as one or more unless expressly indicated to the contrary. The terms "plurality" and "a plurality" are defined as two or more unless expressly indicated to the contrary or otherwise unequivocally limited by context. The term "another" is defined as one or more unless expressly indicated to the contrary. The term "plurality" is defined as two or more unless expressly indicated to the contrary. The term "some" is defined as one or more unless expressly indicated to the contrary. The terms "coupled" and "coupled with" mean to be directly or indirectly connected so that the entities connected allow intercommunication between each other. The term "coupled" or "coupled with" also means that two or more elements are mutually connected and / or interrelated in such a way that they influence each other's actions or states. The embodiments disclosed herein are not necessarily limited to the details of the description.

[0107] In some embodiments of the present application, the display panel can further include other components, for example, can include a circuit for providing an electrical signal to the display panel to drive the display panel to emit light, which can be referred to as a control circuit, can include a circuit board and / or an IC (Integrated Circuit) electrically connected with the display panel.

[0108] In some embodiments, the display panel is used to realize a display image (i.e., picture) function. The display panel can include a display or a product containing a display. The display can be a FPD (Flat Panel Display), a micro display, etc.

[0109] The above describes the basic principles of the present application in combination with specific embodiments, but it should be noted that the advantages, benefits, effects, etc. mentioned in the present application are only examples and are not limiting, and these advantages, benefits, effects, etc. cannot be considered as necessary for each embodiment of the present application. In addition, the above specific details are only for the purpose of example and understanding, and are not limiting, and the above details do not limit the present application to the above specific details.

[0110] The block diagrams of the devices, apparatuses, equipment, systems involved in the present application are only illustrative examples and are not intended to require or imply that the connections, arrangements, configurations shown in the block diagrams must be connected, arranged, configured. As those skilled in the art will recognize, these devices, apparatuses, equipment, systems can be connected, arranged, configured in any manner.

[0111] It is also necessary to point out that in the devices, apparatuses and methods of the present application the various components or steps can be split and / or recombined. These splits and / or re-combinations are to be considered as equivalent solutions of the present application.

Claims

1. A display panel, characterized by, Comprising: a substrate; a pixel layer, the pixel layer comprising an open region and a non-open region, the pixel layer further comprising a first electrode layer located in the open region and the non-open region, the first electrode layer comprising a first aperture in the non-open region; the pixel layer being provided with a display pixel; a mask layer, the mask layer comprising a second aperture, the mask layer comprising an upper surface facing the first aperture; an optical layer, the optical layer comprising a lower surface facing away from the first aperture, the lower surface being located on a side of a plane in which the upper surface is located away from the substrate; a counter substrate comprising a counter substrate, a black matrix located on the counter substrate, and a transparent color resist located in a defined region of the black matrix, a normal projection of the first aperture on the substrate coinciding with a normal projection of the black matrix on the substrate; wherein the mask layer is located between the substrate and the optical layer, the optical layer is located between the mask layer and the first electrode layer, a normal projection of the second aperture on the substrate is located within a normal projection of the first aperture on the substrate, and the optical layer is used to diffuse etching light rays incident from the second aperture, while the diffused etching light rays etch the first electrode layer to form the first aperture, so that the size of the first aperture is not less than the aperture area of the second aperture.

2. The display panel of claim 1, wherein, Further comprising a first display region and a second display region surrounding the first display region; the normal projection of the first aperture on the substrate is located within the first display region, and the normal projection of the second aperture on the substrate is located within the first display region.

3. The display panel of claim 2, wherein, The first display region comprises a transparent display region and a transition region surrounding the transparent display region; the normal projection of the first aperture on the substrate is located within the transparent display region, and the normal projection of the second aperture on the substrate is located within the transparent display region.

4. The display panel of claim 1, wherein, The optical layer comprises a plurality of diffusion structures corresponding to the second aperture, and the display panel further comprises a contact insulating layer covering the diffusion structures; The diffusion structure comprises a diffusion surface in contact with the contact insulating layer.

5. The display panel of claim 4, wherein, The refractive index of the diffusion structure is less than the refractive index of the contact insulating layer.

6. The display panel of claim 5, wherein, The diffusion surface comprises an arc surface convex to the contact insulating layer or a broken line surface convex to the contact insulating layer.

7. The display panel of claim 5, wherein, The diffusion structure comprises a plano-convex lens and / or a first prism, the arc surface of the plano-convex lens is the diffusion surface, and the first prism comprises a convex surface formed by a first surface and a second surface, the convex surface being the diffusion surface.

8. The display panel of claim 4, wherein, The refractive index of the diffusion structure is greater than the refractive index of the contact insulating layer.

9. The display panel of claim 8, wherein, The diffusion surface comprises an arc surface concave to the contact insulating layer or a broken line surface concave to the contact insulating layer.

10. The display panel of claim 8, wherein, The diffusion structure comprises a plano-concave lens and / or a second prism, the arc surface of the plano-concave lens is the diffusion surface, and the second prism comprises a concave surface formed by a third surface and a fourth surface, the concave surface being the diffusion surface.

11. A method for manufacturing a display panel, characterized by, Comprising: providing a substrate; Forming a mask layer, an optical layer, a pixel layer and a first electrode layer on a first surface of a substrate, the mask layer is between the substrate and the optical layer, the pixel layer is on a side of the optical layer away from the substrate, the pixel layer comprises an open area and a non-open area, the pixel layer further comprises a first electrode layer on the open area and the non-open area, the first electrode layer comprises a to-be-etched region in the non-open area, the mask layer comprises a plurality of second openings corresponding to the to-be-etched region; the pixel layer is provided with display pixels, the mask layer comprises an upper surface facing a first opening; the optical layer comprises a lower surface facing away from the first opening, the lower surface is on a side of a plane where the upper surface is away from the substrate; Taking the mask layer as a mask, etching light is provided from the second openings, after diffusion of the diffusion structure, the etching light irradiates the to-be-etched region of the first electrode layer to remove part of the to-be-etched region of the first electrode layer, forming a first opening, so that the size of the first opening is not less than the opening area of the second opening; Forming an opposite substrate comprising an opposite substrate, a black matrix on the opposite substrate and a transparent color resist in a defined region of the black matrix, the orthographic projection of the first opening on the substrate coincides with the orthographic projection of the black matrix on the substrate.

12. The method of claim 11, wherein, The optical layer is formed by an organic vapor deposition process.

13. A display device comprising: Comprise: The display panel of any one of claims 1-10.

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