Substrate holding hand and substrate transfer robot

Abstract

The substrate holding hand of the present invention is provided with: a support plate provided with a circular reference capture range; a plurality of pads arranged in the reference capture range; at least one fixed stopper arranged along the outer circumference of the reference capture range; at least one movable stopper having a portion with the same height from the support plate as the fixed stopper; and a stopper actuator configured to move the movable stopper from a retreat position outside the reference capture range to an entry position closer to the fixed stopper than the retreat position. A circular reduced capture range is defined by the movable stopper in the entry position and the front stopper, and the diameter of the reduced capture range is greater than the diameter of the substrate and less than the diameter of the capture range.

Description

TECHNICAL FIELD

[0001] The present application relates to a substrate holding hand for holding a substrate such as a semiconductor wafer, a glass substrate, and the like, and a substrate transfer robot provided with the same. BACKGROUND

[0002] Conventionally, a substrate transfer robot that carries a substrate such as a semiconductor wafer, a glass substrate, and the like is known. The substrate transfer robot generally has a robot hand and a substrate holding hand mounted to a front end portion thereof. As a holding method of a substrate by the substrate holding hand, a plurality of methods such as a gripping method, a suction method, a placement method, and the like are known. Among them, the placement method substrate holding hand has an advantage of suppressing the generation amount of particles from the substrate on the basis of a simple configuration. Patent Document 1 discloses one example of the placement method substrate holding hand.

[0003] Fig. 13 is a plan view of a conventional placement method substrate holding hand 100. The conventional placement method substrate holding hand 100 shown in Fig. 13 has a thin plate-shaped support plate 110 and a plurality of pads 120 dispersedly arranged on the support plate 110. The support plate 110 defines a circular capture range RO, and the plurality of pads 120 are arranged along an outer circumferential circle PO of the capture range RO. Each pad 120 has a pad that supports a substrate W, and the pad has a gradient that decreases toward a center of the capture range RO. Thus, movement of the substrate W supported by the plurality of pads 120 in a horizontal direction from the capture range RO to the outer circumferential side is restricted.

[0004] Patent Document 1: Japanese Patent Application Publication No. 2020-9819

[0005] In the conventional placement method substrate holding hand 100, a diameter φP0 of the outer circumferential circle PO of the capture range RO is sufficiently larger than a diameter φW of the substrate W. Therefore, when the substrate W is received by the substrate holding hand 100, even if the center of the capture range RO and the center of the substrate W do not coincide due to an error or the like, the substrate W can be accommodated in the capture range RO. However, because the capture range RO is sufficiently larger than the substrate W, it is difficult to perform precise positioning of the substrate W with respect to the substrate holding hand 100. SUMMARY

[0006] The present application was achieved in view of the above circumstances, and an object thereof is to improve positioning accuracy of a substrate with respect to a substrate holding hand in a placement method substrate holding hand and a substrate transfer robot provided with the same.

[0007] A substrate holding hand according to one aspect of the present application is characterized by comprising:

[0008] a support plate that defines a circular reference capture range;

[0009] a plurality of pads arranged on the support plate within the reference capture range;

[0010] at least one fixed stopper disposed along an outer periphery of the reference capture range, which restricts movement of the substrate supported on the plurality of pads toward the outer periphery side of the reference capture range;

[0011] at least one movable stopper having a portion with a height from the support plate identical to that of the fixed stopper; and

[0012] a stopper actuator configured to move the movable stopper from a retreat position outside or on the outer periphery of the reference capture range to an entry position closer to the fixed stopper than the retreat position,

[0013] a reduced capture range in a circular shape is defined by the movable stopper in the entry position and the fixed stopper, the diameter of the reduced capture range being larger than that of the substrate and smaller than that of the reference capture range.

[0014] In addition, a substrate transfer robot according to one aspect of the present application includes an arm and a substrate holding hand mounted to a front end portion of the arm.

[0015] In the substrate holding hand and the substrate transfer robot including the same, after the substrate is placed in the reference capture range, the movable stopper is advanced from the retreat position to the entry position, so that the placement range (capture range) of the substrate can be reduced to the reduced capture range.

[0016] By reducing the placement range of the substrate to the reduced capture range, the position of the substrate on the hand is determined within the reduced capture range. That is, the presence range of the substrate on the hand is narrowed. Thus, in the substrate holding hand according to the above-described structure, the holding form of the substrate is the placement type, but the substrate can be positioned more strictly with respect to the hand. Thus, the substrate can be transferred from the hand to a jig or the like as a transfer object with good positional accuracy.

[0017] Further, the substrate placed in the reduced capture range is placed on the plurality of pads without being held by the movable stopper and the fixed stopper. Thus, the substrate is not held by the hand, so that contamination caused by fine powder generated by friction between the hand and the substrate when the substrate is held is avoided.

[0018] According to the present application, in the substrate holding hand of the placement type and the substrate transfer robot including the same, the positioning accuracy of the substrate with respect to the substrate holding hand can be improved. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 is a perspective view showing a substrate transfer robot including a substrate holding hand according to one embodiment of the present application.

[0020] Figure 2is a diagram showing the configuration of a control system of a substrate transfer robot.

[0021] Figure 3 is a plan view of a substrate holding hand.

[0022] Figure 4 is a schematic side view of a substrate holding hand.

[0023] Figure 5 is a plan view of a substrate holding hand showing a state where a substrate is placed on a second stage substrate support section.

[0024] Figure 6 is a schematic side view of a substrate holding hand showing a state where a substrate is placed on a second stage substrate support section.

[0025] Figure 7 is a block diagram showing a schematic configuration of a control device.

[0026] Figure 8 is a flowchart of a process when a substrate is transferred.

[0027] Figure 9 is a plan view of a substrate holding hand showing a state where a first capturing range is narrowed.

[0028] Figure 10 is a plan view of a substrate holding hand showing a state where a second capturing range is narrowed.

[0029] Figure 11 is a plan view of a substrate holding hand according to Modification 1.

[0030] Figure 12 is a plan view of a substrate holding hand according to Modification 2.

[0031] Fig. 13 is a plan view of a conventional substrate placing hand. DETAILED DESCRIPTION

[0032] Hereinafter, an embodiment of the present application will be described with reference to the drawings. Figure 1 is a perspective view showing a substrate transfer robot 2 equipped with a substrate holding hand according to one embodiment of the present application (hereinafter simply referred to as "hand 1"). Figure 1The substrate transfer robot 2 shown is a robot that transfers a substrate W, such as a robot equipped in a semiconductor processing apparatus. The substrate W is a thin plate used in a semiconductor process or the like. The substrate includes, for example, a semiconductor wafer, a glass wafer, a sapphire (single-crystal aluminum oxide) wafer, and the like. The semiconductor wafer includes, for example, a silicon wafer, a semiconductor single-crystal wafer other than silicon, a compound semiconductor wafer, and the like. The glass wafer includes, for example, a glass substrate for FPD (Flat Panel Display), a glass substrate for MEMS (Micro Electro Mechanical Systems), and the like.

[0033] Outline configuration of substrate transfer robot 2

[0034] The substrate transfer robot 2 according to the present embodiment includes a base 3, an arm 4 supported by the base 3, a hand 1 mounted to a front end of the arm 4, and a control device 8. The arm 4 according to the present embodiment is a horizontal multi-joint robot arm, but the form of the arm 4 is not limited thereto.

[0035] The arm 4 includes a lifting shaft 40 provided to the base 3, a first link 41, and a second link 42. The base end of the first link 41 is connected to the upper end of the lifting shaft 40 via a first joint J1. The base end of the second link 42 is connected to the front end of the first link 41 via a second joint J2. The base end of the hand 1 is connected to the front end of the second link 42 via a wrist joint J3.

[0036] Figure 2 is a diagram showing the configuration of the control system of the substrate transfer robot 2. As shown in FIG. 1, the substrate transfer robot 2 includes the arm 4, the hand 1, and the control device 8. Figure 1 and Figure 2As shown, the lifting shaft 40 is driven to move up and down relative to the base 3 via a lifting drive device 51. The lifting drive device 51 includes, for example, a servo motor; a rotary position sensor to detect the rotational position of the servo motor's output shaft; and a direct-acting mechanism that operates via the output of the servo motor. A first joint J1 connects a first link 41 relative to the lifting shaft 40, enabling it to rotate about a vertical first axis L1. The first joint J1 is driven by a first joint drive device 52. The first joint drive device 52 includes, for example, a servo motor; a rotary position sensor to detect the rotational position of the servo motor's output shaft; and a power transmission mechanism that transmits the servo motor's output to the first joint J1. A second joint J2 connects a second link 42 relative to the first link 41, enabling it to rotate about a vertical second axis L2. The second joint J2 is driven by a second joint drive device 53. The second joint drive device 53 includes, for example, a servo motor; a rotary position sensor to detect the rotational position of the servo motor's output shaft; and a power transmission mechanism that transmits the servo motor's output to the second joint J2. Wrist joint J3 connects hand 1 relative to second link 42 so that it can rotate about a vertical third axis L3. Wrist joint J3 is driven by wrist joint drive device 54. Wrist joint drive device 54 includes, for example: a servo motor; a rotational position sensor for detecting the rotational position of the output shaft of the servo motor; and a power transmission mechanism for transmitting the output of the servo motor to wrist joint J3.

[0037] [Structure of Hand 1]

[0038] Figure 3 This is a top view of hand 1. (Example) Figure 1 as well as Figure 3 As shown, a horizontal hand axis L4 is defined in the hand 1, connecting the base end and the front end of the hand 1. The hand 1 includes: a base 9, forming the base end portion; and a support plate 11, forming the front end portion. The base 9 has a housing 90 connected to a second link 42 via a wrist joint J3. The housing 90 has an opening 90a on the side facing the front end. The support plate 11 is fixed to the base end of the housing 90, and the support plate 11 protrudes from the opening 90a of the housing 90 toward the front end of the hand.

[0039] The support plate 11 is shaped as a thin plate divided into two strands at its front end. However, the shape of the support plate 11 is not limited to this. At least one pair of front support blocks 12 are provided at the front end portion of the support plate 11. In this embodiment, the pair of front support blocks 12 are distributed on each of the two strands of the front end portion of the support plate 11. In addition, at least one first rear support block 13 is provided at the base end portion of the support plate 11. In this embodiment, the pair of first rear support blocks 13 are disposed at the base end portion of the support plate 11.

[0040] A pair of second rear supporting blocks 14 is provided in the housing 90. The pair of second rear supporting blocks 14 is capable of moving in and out in parallel with the hand axis L4. The pair of second rear supporting blocks 14 is in the housing 90 in the most retracted state. The pair of second rear supporting blocks 14 is capable of entering outside the housing 90 through the opening portion 90a and is in the most advanced state in front of the opening portion 9a.

[0041] The pair of second rear supporting blocks 14 is attached to a supporting member 141. The supporting member 141 is a channel-shaped plate-like member whose front end portion is divided into two, and the second rear supporting blocks 14 are provided in each of the front end portions divided into two. The supporting member 141 is driven to move in and out in parallel with the hand axis L4 by a block actuator 15. The block actuator 15 according to the present embodiment includes a cylinder 151 and a control valve 153 thereof (refer to Figure 2 ) connected to the piston rod 152 of the cylinder 151. The supporting member 141 is connected to the piston rod 152 of the cylinder 151.

[0042] Between the pair of second rear supporting blocks 14 retracted into the housing 90, first and second movable limiters 23 and 24 are provided when viewed from above. The first and second movable limiters 23 and 24 have a surface perpendicular to the main surface of the supporting plate 11. The first and second movable limiters 23 and 24 are capable of moving in and out in parallel with the hand axis L4. The first and second movable limiters 23 and 24 are in the housing 90 in the most retracted state. The first and second movable limiters 23 and 24 are capable of entering outside the housing 90 through the opening portion 90a and are in the most advanced state in front of the opening portion 9a.

[0043] The first movable limiter 23 moves (reciprocates) in and out in parallel with the hand axis L4 by a first limiter actuator 25. The first limiter actuator 25 according to the present embodiment includes a cylinder 251 and a control valve 253 thereof (refer to Figure 2 ). The first movable limiter 23 is connected to the piston rod 252 of the cylinder 251.

[0044] The second movable limiter 24 is driven to move in and out in parallel with the hand axis L4 by a second limiter actuator 26. The second limiter actuator 26 according to the present embodiment includes a cylinder 261 and a control valve 263 thereof (refer to Figure 2 ). The second movable limiter 24 is connected to the piston rod 262 of the cylinder 261.

[0045] In order to avoid interference of the pair of second rear supporting blocks 14, the first and second movable limiters 23 and 24 entered in front of the opening portion 90a of the housing 90, and the supporting plate 11, an opening portion 11a is formed in the base end portion of the supporting plate 11.

[0046] Figure 4 is a schematic side view of the hand 1. As shown, the front support block 12 appears in at least 3 steps when viewed from the side. The front support block 12 is formed with a first front pad 12a at the first step from the bottom, and a second front pad 12b at the upper step from the first front pad 12a. The first front pad 12a and the second front pad 12b have upward faces that become the placement surface of the substrate W. The height of the support plate 11 to the second front pad 12b is higher than the height of the support plate 11 to the first front pad 12a. Further, the "height" from the support plate 11 is defined as the distance in the direction perpendicular to the height reference surface, from the height reference surface, with the main face of the support plate 11 as the height reference surface. Figure 4 The first front stopper 12c is formed at the step surface between the first step and the second step of the front support block 12 from the bottom. In addition, the second front stopper 12d is formed at the step surface between the second step and the third step of the front support block 12 from the bottom. In the front support block 12, the first front pad 12a, the first front stopper 12c, the second front pad 12b, and the second front stopper 12d are arranged in this order toward the front end of the hand. The first front stopper 12c and the second front stopper 12d have faces perpendicular to the main face of the support plate 11. The first movable stopper 23 has a portion having a height from the support plate 11 identical to that of the pair of first front stoppers 12c, and is opposed to the pair of first front stoppers 12c with the first capture range R1 (corresponding to the "first reference capture range" of the present application) therebetween. The second movable stopper 24 has a portion having a height from the support plate 11 identical to that of the pair of second front stoppers 12d, and is opposed to the pair of second front stoppers 12d with the second capture range R2 (corresponding to the "second reference capture range" of the present application) therebetween. The pair of first front stoppers 12c and the pair of second front stoppers 12d are fixed stoppers whose relative positions to the support plate 11 are fixed. The hand 1 according to the present embodiment has the pair of first front stoppers 12c, but the first front stopper 12c can be at least one. Similarly, the hand 1 according to the present embodiment has the pair of second front stoppers 12d, but the second front stopper 12d can be at least one.

[0047] The first rear support block 13 appears in at least 2 steps when viewed from the side. The first rear support block 13 is formed with a first rear pad 13a at the first step from the bottom. The first rear pad 13a has an upward face that becomes the placement surface of the substrate W. The first rear stopper 13c is formed at the step surface between the first step and the second step of the first rear support block 13 from the bottom. The first rear stopper 13c has a face perpendicular to the main face of the support plate 11. The first rear stopper 13c is on the base end side of the hand 1 with respect to the first rear pad 13a.

[0048]

[0049] ​The second rear support block 14 has a stepped shape of at least two stages when viewed in the side surface. The second rear support block 14 is formed with a second rear pad 14a at the first stage from the bottom. The second rear pad 14a has an upward face that becomes a placement surface of the substrate W. The height of the support plate 11 to the second rear pad 14a is higher than the height of the support plate 11 to the first rear pad 13a. A second rear stopper 14c is formed at the step face of the second stage from the bottom of the second rear support block 14. The second rear stopper 14c has a face perpendicular to the main face of the support plate 11. The second rear stopper 14c is on the hand base end side with respect to the second rear pad 14a.

[0050] As shown in FIG. 1, the hand 1 defines a circular first capture range R1 centered on a prescribed first support plate center C1. The diameter φP1 of the outer circumferential circle P1 of the first capture range R1 is slightly larger (about several mm) than the diameter φW of the substrate W. Along the outer circumferential circle P1 of the first capture range R1, a pair of first front stoppers 12c and a pair of first rear stoppers 13c are disposed. The faces of these stoppers 12c, 13c generally face the first support plate center C1. Figure 3 As shown in FIG. 2, the first stage substrate support portion is formed by a pair of first front pads 12a and a pair of first rear pads 13a. The pair of first front pads 12a and the pair of first rear pads 13a are at almost the same height from the support plate 11. At least one of the pair of first front pads 12a and the pair of first rear pads 13a can have a face with a gradient that declines toward the first support plate center C1. Alternatively, at least one of the pair of first front pads 12a and the pair of first rear pads 13a can have a face parallel to the main face of the support plate 11.

[0051] Figure 4 As shown in FIG. 2, the first stage substrate support portion is formed by a pair of first front pads 12a and a pair of first rear pads 13a. The pair of first front pads 12a and the pair of first rear pads 13a are at almost the same height from the support plate 11. At least one of the pair of first front pads 12a and the pair of first rear pads 13a can have a face with a gradient that declines toward the first support plate center C1. Alternatively, at least one of the pair of first front pads 12a and the pair of first rear pads 13a can have a face parallel to the main face of the support plate 11.

[0052] As shown in FIG. 2, the first stage substrate support portion is formed by a pair of first front pads 12a and a pair of first rear pads 13a. The pair of first front pads 12a and the pair of first rear pads 13a are at almost the same height from the support plate 11. At least one of the pair of first front pads 12a and the pair of first rear pads 13a can have a face with a gradient that declines toward the first support plate center C1. Alternatively, at least one of the pair of first front pads 12a and the pair of first rear pads 13a can have a face parallel to the main face of the support plate 11. Figure 2

[0053] Figure 5 is a plan view of the hand 1 showing the state in which the substrate W is placed on the second stage substrate support portion, Figure 6 is a schematic side view of the hand 1 showing the state in which the substrate W is placed on the second stage substrate support portion. As shown in FIG. 3, the second stage substrate support portion is formed by the second rear support block 14 and the second front support block 15. The second front support block 15 is formed with a second front pad 15a at the first stage from the bottom. The second front pad 15a has an upward face that becomes a placement surface of the substrate W. The height of the support plate 11 to the second front pad 15a is higher than the height of the support plate 11 to the first front pad 12a. A second front stopper 15c is formed at the step face of the second stage from the bottom of the second front support block 15. The second front stopper 15c has a face perpendicular to the main face of the support plate 11. The second front stopper 15c is on the hand base end side with respect to the second front pad 15a. Figure 5 ​​As shown, a second capture range R2 is defined in the hand 1, centered on the center C2 of the second support plate. The center C2 of the second support plate is located closer to the front end of the hand than the center C1 of the first support plate, and the second capture range R2 is located offset from the first capture range R1 towards the front end of the hand. The diameter φP2 of the outer circumference P2 of the second capture range R2 is slightly larger (approximately a few mm) than the diameter φW of the substrate W. The diameter φP2 of the second capture range R2 can be the same as the diameter φP1 of the first capture range R1.

[0054] Along the outer perimeter P2 of the second capture range R2, a pair of second front limiters 12d and a pair of second rear support blocks 14 in the advanced position are configured with second rear limiters 14c. Limiters 12d and 14c have surfaces generally facing the center C2 of the second support plate.

[0055] like Figure 5 as well as Figure 6 As shown, a second-stage substrate support is defined by a pair of second front pads 12b and a pair of second rear pads 14a in an advanced position. The pair of second front pads 12b and the pair of second rear pads 14a are at approximately the same height from the support plate 11. At least one of the pair of second front pads 12b and the pair of second rear pads 14a may have a surface with an inclination that descends toward the center C2 of the second support plate. Alternatively, at least one of the pair of second front pads 12b and the pair of second rear pads 14a may have a surface parallel to the main surface of the support plate 11.

[0056] The edge of the substrate W, which is placed on the second-level substrate support, abuts or opposes a pair of second front limiters 12d and a pair of second rear limiters 14c. For the substrate W placed on the second-level substrate support, movement toward the front end of the hand is limited by a pair of second front limiters 12d, and movement toward the base end of the hand is limited by a pair of second rear pads 14a.

[0057] [Control device 8]

[0058] Figure 7is a block diagram showing the schematic configuration of the control device 8. The control device 8 of the substrate transfer robot 2 is provided with a computer 80. The computer 80 is provided with a processor 81, a memory 82 such as a ROM and a RAM, an input / output section 83, and the like. The memory 82 stores a program to be executed by the processor 81. The program includes an operation program, an application program. The processor 81 reads and executes the program, whereby the control device 8 realizes the functions constituted by the program. The processor 81 is connected to the input device 86, the output device 87, the storage device 88, various meters, sensors, and control objects via the input / output section 83. The control objects involved in the present embodiment include the robot controller 21 and the control valves 153, 253, 263. The input device 86 includes, for example, at least one of a keyboard, a mouse, a touch panel, and the like, which accept inputs to the control device 8. The output device 87 includes, for example, at least one of a display, a speaker, and the like, which output information from the control device 8. Various information required for processing of the control device 8 can be stored in the storage device 88.

[0059] The control device 8 controls the position and the posture of the hand 1 by causing the arm 4 of the substrate transfer robot 2 to act. In more detail, as shown in FIG. 1, the control device 8 is connected to the robot controller 21, and the robot controller 21 is connected to the lift driving device 51, the first joint driving device 52, the second joint driving device 53, and the wrist joint driving device 54. The control device 8 calculates the current position and the current posture of the hand 1 based on the detection values of the rotation position sensors included in the driving devices 51 to 54, calculates the target position and the target posture of the hand 1 based on the teaching data stored in advance, and transmits a position command to the robot controller 21 such that the hand 1 becomes the target position and the target posture. The robot controller 21 controls the actions of the driving devices 51 to 54 based on the position command and the detection values of the rotation position sensors included in the driving devices 51 to 54. In this way, the lift shaft 40 and the joints J1 to J3 of the arm 4 move, and the hand 1 reaches the target position and the target posture. Figure 2

[0060] The control device 8 is connected to the block actuator 15, the first stopper actuator 25, and the second stopper actuator 26, and controls their actions.

[0061] The air supply device 18 such as a compressor is connected to the cylinder 151 of the block actuator 15. A control valve 153 controlled by the control device 8 is provided between the air supply device 18 and the cylinder 151. Further, the flow rate and the direction of the air passing through the control valve 153 are switched by the control device 8, whereby the piston rod 152 is extended to advance the pair of second rear supporting blocks 14, or the piston rod 152 is retracted to retreat the pair of second rear supporting blocks 14.

[0062] ​An air supply device 18 is connected to the cylinder 251 of the first stopper actuator 25. A control valve 253 controlled by the control device 8 is provided between the air supply device 18 and the cylinder 251. Further, the flow rate and direction of air passing through the control valve 253 are controlled by the control device 8, whereby the piston rod 252 is extended to advance the first movable stopper 23, or the piston rod 252 is retracted to retreat the first movable stopper 23.

[0063] An air supply device 18 is connected to the cylinder 261 of the second stopper actuator 26. A control valve 263 controlled by the control device 8 is provided between the air supply device 18 and the cylinder 261. Further, the flow rate and direction of air passing through the control valve 263 are switched by the control device 8, whereby the piston rod 262 is extended to advance the second movable stopper 24, or the piston rod 262 is retracted to retreat the second movable stopper 24.

[0064] The first in-place sensor 31 detects the presence or absence of the substrate W in the first stage substrate support section. The second in-place sensor 32 detects the presence or absence of the substrate W in the second stage substrate support section. However, the first in-place sensor 31 and the second in-place sensor 32 can be one sensor. The first in-place sensor 31 and the second in-place sensor 32 are connected to the control device 8. The control device 8 acquires the detection signals of the first in-place sensor 31 and the second in-place sensor 32 to detect the presence or absence of the substrate W in the substrate support section.

[0065] [Control method of the hand 1]

[0066] The operation of the hand 1 in the substrate transfer robot 2 having the above-described structure will be described. Further, the movement of the hand 1 described below is achieved by the driving of the elevating shaft 40 and the joints J1 to J3 of the arm 4 controlled by the control device 8. In addition, the operation of the pair of second rear support blocks 14 described below is achieved by the block actuator 15 controlled by the control device 8, the operation of the first movable stopper 23 is achieved by the first stopper actuator 25 controlled by the control device 8, and the operation of the second movable stopper 24 is achieved by the second stopper actuator 26 controlled by the control device 8.

[0067] Hereinafter, the operation of the hand 1 when transferring the substrate W held by the first gripper (not shown) to the second gripper (not shown) located at a position away from the first gripper will be described with reference to Figure 8 Figure 8 is a flowchart of the process when transferring the substrate W.

[0068] (First example)

[0069] ​In the first case, the first stage support unit U1 is used, which includes a combination of the plurality of pads 12a, 13a forming the first stage substrate support section, the front stopper 12c, the movable stopper 23, and the stopper actuator 25. First, the hand 1 is moved to a prescribed ascending standby position (step S1). In the hand 1 in the ascending standby position, the support plate 11 is positioned directly below the substrate W held by the first gripper, and the substrate W is accommodated within the first capture range R1 in plan view.

[0070] Next, the hand 1 is moved from the ascending standby position to the ascending position above by a prescribed amount (step S2). Thereby, the substrate W is transferred from the first gripper to the hand 1. The substrate W is supported by the first stage substrate support section, namely, the pair of first front pads 12a and the pair of first rear pads 13a.

[0071] If the in-position of the substrate W to the first stage substrate support section is confirmed with the first in-position sensor 31, the hand 1 starts moving from the ascending position to a prescribed descending standby position (step S3). At a prescribed timing during the movement of the hand 1, the first movable stopper 23 advances from a prescribed retreat position to a prescribed entry position, so that the placement range (capture range) of the substrate W is reduced (step S4). The retreat position of the first movable stopper 23 is not limited to the retreated position within the housing 90, but can be on the circumference of the outer circumferential circle P1 of the first capture range R1 (not on the inner side of the first capture range R1) or outside the first capture range R1.

[0072] Figure 9 is a plan view of the hand 1 showing the reduced first capture range R1'. As shown in Figure 9 , at least a portion of the first movable stopper 23 in the entry position is on the inner side of the outer circumferential circle P1 of the first capture range R1. The reduced first capture range R1' of a circular shape is defined by the first movable stopper 23 in the entry position and the pair of first front stoppers 12c. Further, during the advancement of the first movable stopper 23, the first movable stopper 23 and the edge of the substrate W sometimes abut, but in this case, the substrate W is moved toward the hand tip while maintaining the state of being supported by the pair of first front pads 12a and the pair of first rear pads 13a.

[0073] The diameter φP1' of the outer circumferential circle P1' of the reduced first capture range R1' is larger than the diameter φW of the substrate W and smaller than the diameter φP1 of the outer circumferential circle P1 of the first capture range R1 (φW < φP1' < φP1). Therefore, the substrate W accommodated in the reduced first capture range R1' is supported by the first stage substrate support section, but is not gripped by the first movable stopper 23 and the pair of first front stoppers 12c.

[0074] The diameter φP1 of the outer circumferential circle P1 and the diameter φP1' of the outer circumferential circle P1' are determined in accordance with the diameter φW of the substrate W. The diameter φW of the substrate W is known to have a plurality of kinds. For example, in the case where the diameter φW of the substrate W is 300 mm, the diameter φP1 of the outer circumferential circle P1 of the first capture range R1 can be set to 304 mm, and the diameter φP1' of the outer circumferential circle P1' of the reduced first capture range R1' can be set to 301 mm. In this case, the diameter φP1' can be a value larger than 300 mm and smaller than 304 mm, but from the viewpoint of improving the positioning accuracy of the substrate W with respect to the hand 1, it is preferable that the diameter φP1' be a smaller value. On the other hand, if the diameter φP1' is a value close to the diameter φW of the substrate W, there is a concern that the substrate W can be held by the first movable stopper 23 and the pair of first front stoppers 12c, and thus the diameter φP1' is determined taking into account the dimensional error of the substrate W and the stroke error of the first movable stopper 23.

[0075] The substrate W received by the first substrate support portion in the above step S2 is within the first capture range R1, but the accurate position of the substrate W with respect to the hand 1 is not determined. In the above step S4, the capture range is reduced to the first capture range R1' by the advancement of the first movable stopper 23, and thus the range of the presence of the substrate W on the hand 1 is narrowed. Thereby, the position of the substrate W on the hand 1 is determined within the reduced first capture range R1'. That is, the substrate W is more strictly positioned with respect to the hand 1.

[0076] If the hand 1 reaches the lowered standby position (step S5), the first movable stopper 23 is retracted to the retracted position (or the retreated position), and thus the capture range is expanded to the first capture range R1 (step S6).

[0077] In the hand 1 in the lowered standby position, the support plate 11 is positioned directly above the second gripper, and the substrate W corresponds to the holding position of the second gripper when viewed from above. The hand 1 is lowered by a predetermined amount from the lowered standby position to the lowered position below (step S7). Thereby, the substrate W is transferred from the hand 1 to the second gripper.

[0078] In the above step S6, even if the capture range is expanded, the position of the substrate W on the hand 1 is maintained. Therefore, the substrate W is transferred from the hand 1 to the second gripper in a state where the substrate W is more strictly positioned with respect to the hand 1. Thereby, the substrate W is transferred to the second gripper with a high positional accuracy.

[0079] (Second Example)

[0080] In the second case, a second stage support unit U2 is used, and the second stage support unit U2 includes a combination of a plurality of pads 12b, 14a forming a second stage substrate support portion, the front stopper 12d, the movable stopper 24, and the stopper actuator 26. The first stage substrate support portion and the second stage substrate support portion of the hand 1 can be used in distinction according to the cleanliness of the substrate W to be held. For example, the second stage substrate support portion is used to hold a substrate W of high cleanliness, and the first stage substrate support portion is used to hold a contaminated substrate W.

[0081] In order to prepare the second capture range R2 and the second stage substrate support portion in the hand 1, the second rear support block 14 is advanced to a prescribed entry position. First, the hand 1 is moved to a prescribed raised standby position (step S1). In the hand 1 in the raised standby position, the support plate 11 is positioned directly below the substrate W held by the first gripper, and the substrate W is accommodated within the second capture range R2 when viewed from above.

[0082] Next, the hand 1 is moved from the raised standby position to a raised position located above by a prescribed amount (step S2). Thereby, the substrate W is transferred from the first gripper to the hand 1. The substrate W is supported by the second stage substrate support portion, namely, the pair of second front pads 12b and the pair of second rear pads 14a.

[0083] If the in-position of the substrate W to the second stage substrate support portion is confirmed by the second in-position sensor 32, the hand 1 starts movement from the raised position to a prescribed lowered standby position (step S3). At a prescribed timing during the movement of the hand 1, the second movable stopper 24 is advanced from the retracted position to a prescribed entry position, and thereby the capture range is reduced to a reduced second capture range R2' (step S4).

[0084] Figure 10 FIG. 9 is a plan view of the hand 1 showing the reduced second capture range R2'. As shown in FIG. 9, at least a portion of the second movable stopper 24 in the entry position is inside the outer circumferential circle P2 of the second capture range R2. The reduced second capture range R2' is prescribed by the second movable stopper 24 in the entry position and the pair of second front stoppers 12d. Further, during the advancement of the second movable stopper 24, the second movable stopper 24 and the edge of the substrate W sometimes abut, but in this case, the substrate W is moved toward the hand front end, namely, toward the pair of second front stoppers 12d while maintaining the state of being supported by the pair of second front pads 12b and the pair of second rear pads 14a. Figure 10

[0085] The diameter φP2' of the outer circumferential circle P2' of the reduced second capture range R2' is larger than the diameter φW of the substrate W and smaller than the diameter φP2 of the outer circumferential circle P2 of the second capture range R2 (φW < φP2' < φP2).

[0086] ​If the hand 1 reaches the lowered standby position (step S5), the second movable stopper 24 retreats to a retreated position in the housing 90, and thus the capture range is enlarged to a second capture range R2 (step S6).

[0087] In the hand 1 in the lowered standby position, the support plate 11 is located right above the second gripper, and the substrate W corresponds to the holding position of the second gripper when viewed from above. The hand 1 is lowered from the lowered standby position to a lowered position below by a prescribed amount (step S7). Thus, the substrate W is transferred from the hand 1 to the second gripper.

[0088] Further, in the substrate transfer processes of the first and second examples described above, the step S6 (enlargement of the capture range) can be omitted. However, when the substrate W is transferred from the hand 1 to the gripper (or vice versa), if the capture range is enlarged, the possibility of the substrate W rubbing against the stoppers 12c, 13c, 14c, and the movable stoppers 23, 24 is reduced.

[0089] Further, in the substrate transfer processes of the first and second examples described above, the step S4 (reduction of the capture range) can be performed at a timing before the movement to the lowered standby position from the substrate W being transferred to the hand 1, or before the capture range is enlarged from the hand 1 reaching the lowered standby position. Here, if the capture range is reduced, the movement or vibration of the substrate W on the hand 1 can be suppressed during the movement of the hand 1, and thus it is preferable that the reduction of the capture range be performed at a timing relatively early from the substrate W being transferred to the hand 1.

[0090] As described above, the substrate transfer robot 2 according to the present embodiment is provided with: the arm 4; and the hand 1 mounted to the front end portion of the arm 4.

[0091] Further, the hand 1 according to the embodiment includes: a support plate 11 provided with a circular reference capture range (R1; R2); a plurality of pads (12a, 13a; 12b) disposed on the support plate 11 within the reference capture range (R1; R2); at least one fixed stopper (12c; 12d) disposed along a circumferential circle (P1; P2) of the reference capture range (R1; R2) and limiting movement of the substrate W supported by the plurality of pads (12a, 12b; 12b) toward the circumferential side of the reference capture range (R1; R2); at least one movable stopper (23; 24) having a portion with a height from the support plate 11 that is identical to that of the fixed stopper (12c; 12d); and a stopper actuator (25; 26) configured to move the movable stopper (23; 24) from a retreat position outside or on the circumferential circle (P1; P2) of the reference capture range (R1; R2) to an entry position closer to the fixed stopper (12c; 12d) than the retreat position. A circular reduced capture range (R1'; R2') is defined by the movable stopper (23; 24) in the entry position and the fixed stopper (12c; 12d). The diameter (φR1'; φR2') of the reduced capture range (R1'; R2') is larger than the diameter φW of the substrate W and smaller than the diameter (φR1; φR2) of the reference capture range (R1; R2).

[0092] Further, in the hand 1 according to the embodiment, the fixed stoppers 12c, 12d are provided at the front end portion of the support plate 11, but are not limited thereto and can be disposed along the circumferential circle P1, P2 of the reference capture range R1, R2. The movable stoppers 23, 24 are disposed in positions so as to oppose the fixed stoppers 12c, 12d with the substrate W interposed therebetween, in accordance with the positions of the fixed stoppers 12c, 12d. In addition, in the hand 1 according to the embodiment, the plurality of pads 12a, 12b, 12b have flat upward faces, but can be protrusions that contact the substrate W in points or lines.

[0093] In addition, the hand 1 according to the present embodiment further includes a control device 8 that controls the stopper actuator 25; 26. The control device 8 causes the stopper actuator 25; 26 to act so as to move the movable stopper 23; 24 from the retreat position to the entry position at a prescribed timing after the substrate W is placed on the plurality of pads 12a, 12b; 12b. Here, the hand 1 can further include a sensor 31; 32 that detects the presence or absence of the substrate W placed on the plurality of pads 12a, 12b; 12b. In this case, the control device 8 causes the stopper actuator 25; 26 to act so as to move the movable stopper 23; 24 from the retreat position to the entry position at a prescribed timing after the substrate W is detected by the sensor 31; 32 as having been placed on the plurality of pads 12a, 12b; 12b.

[0094] In the hand 1 described above and the substrate transfer robot 2 including the same, after the substrate W is placed within the reference capture range R1; R2, the movable stopper 23; 24 is caused to advance from the retreat position to the entry position, so that the placement range of the substrate can be reduced to the reduced capture range R1'; R2'.

[0095] By reducing the placement range of the substrate to the reduced capture range R1'; R2', the position of the substrate W on the hand 1 is determined to be within the reduced capture range R1'; R2'. That is, the presence range of the substrate W on the hand 1 is narrowed. In this way, the hand 1 according to the present embodiment is of a placement type in terms of the holding form of the substrate W, but the substrate W is more strictly positioned with respect to the hand 1. Thus, the substrate W can be transferred from the hand 1 to a jig or the like as a transfer target with good positional accuracy.

[0096] The substrate W housed in the reduced capture range R1'; R2' is placed on the plurality of pads 12a, 12b; 12b, but is not held by the movable stopper 23; 24 and the fixed stopper 12c; 12d. In this way, the substrate W is not held by the hand 1, so that contamination caused by fine powder generated by friction between the hand 1 and the substrate W when the substrate W is held is avoided.

[0097] The hand 1 according to the present embodiment further includes at least one rear stopper 13c disposed at the base end portion of the support plate 11 along the outer circumferential circle PI of the reference capture range R1, which restricts movement of the substrate W supported on the plurality of pads 12a, 13a toward the base end side of the hand. Also, the hand 1 according to the present embodiment includes a rear pad 13a disposed on the hand front end side of the rear stopper 13c. The rear stopper 13c is not essential, but adds the following advantages, i.e., the substrate W placed is guided toward the reference capture range R1 by the rear stopper 13c, and movement of the substrate W within the reference capture range R1 toward the base end side of the hand is restricted.

[0098] The hand 1 according to the present embodiment is provided with a plurality of reference capture ranges R1, R2 defined in the support plate 11, a first reference capture range R1 and a second reference capture range R2 offset from the first reference capture range R1 toward the tip side of the hand. The first reference capture range R1 is provided with a first stage support unit U1 including a combination of a plurality of pads 12a, 13a, a fixed stopper 12c, a movable stopper 23, and a stopper actuator 25. The second reference capture range R2 is also provided with a second stage support unit U2 including a combination of a plurality of pads 12b, 14a, a fixed stopper 12d, a movable stopper 24, and a stopper actuator 26. The second stage support unit U2 supports the substrate W at a position higher than the first stage support unit U1 from the support plate 11.

[0099] As such, the two stage support units U1, U2 are provided in one hand 1, and thus it is possible to distinguish the use of the two stage support units U1, U2 according to the cleanliness of the substrate W to be held.

[0100] The above describes the preferred embodiment of the present application, but embodiments obtained by changing the details of the structure and / or function of the above-described embodiment within the scope of the idea of the present application can also be included in the present application. The above-described structure can be changed, for example, in the following manner.

[0101] (Modified Example 1)

[0102] For example, the hand 1 according to the above-described embodiment has a multi-stage substrate support portion, but the substrate support portion can also be single stage. Figure 11 is a plan view of the substrate holding hand 1A according to Modified Example 1. Also, in the description of Modified Example 1, the same or similar components as those of the above-described embodiment are denoted by the same reference numerals in the drawings and the description thereof is omitted. Figure 11 The hand 1A illustrated is the same as the hand 1 according to the above-described embodiment except that the second rear support block 14 and its actuator 15, the second movable stopper 24, and the stopper actuator 26, etc. that constitute the second stage support unit U2 are omitted. Also, the front block 12A omits the second front pad 12b and the second front stopper 12d, and has the first front pad 12a and the first front stopper 12c. In other words, the hand 1A according to Modified Example 1 is provided with: a support plate 11; a plurality of pads 12a, 13a disposed on the support plate 11; a pair of front stoppers 12c provided at the front end portion of the support plate 11; a movable stopper 23; and a stopper actuator 25 that drives the movable stopper 23. The operation of the hand 1A according to Modified Example 1 and the substrate transfer robot 2 provided with it is the same as that of the above-described first example, and thus the description thereof is omitted.

[0103] (Modified Example 2)

[0104] In the substrate holding hand 1A according to the modification 1, the first rear support block 13 fixed to the support plate 11 is provided, but the first rear support block 13 can be omitted. Figure 12 is a plan view of the substrate holding hand 1B according to the modification 2. Figure 12 The substrate holding hand 1B shown in the figure is provided with the movable support blocks 17 having both the functions of the first rear support block 13 and the first movable stopper 23 of the substrate holding hand 1A according to the modification 1 in place of them.

[0105] The pair of movable support blocks 17 is attached to a support member 171. The support member 171 is a channel-shaped member having two stems at the front end portion, and the movable support blocks 17 are provided at each of the two stems. The support member 171 is driven to advance and retreat in parallel with the hand axis L4 by the stopper actuator 16. The stopper actuator 16 is, for example, a cylinder 161, and the support member 171 is connected to the output end of the piston rod 162 of the cylinder 161. Each of the movable support blocks 17 has a movable pad 17a and a movable stopper 17c. The movable pad 17a has an upward face which becomes a placement face of the substrate W. The movable stopper 17c has a face perpendicular to the main face of the support plate 11.

[0106] The hand 1 defines a third capture range R3 in the shape of a circle with a prescribed third support plate center C3 as the center. The diameter φP3 of the outer circumferential circle P3 of the third capture range R3 is slightly larger (about several mm) than the diameter φW of the substrate W. Along the outer circumferential circle P3 of the third capture range R3, the pair of first front stoppers 12c and the pair of movable stoppers 17c are arranged. The movable pads 17a are located inside the third capture range R3. Each of the stoppers 12c and 17c generally faces the third support plate center C3.

[0107] If the pair of movable stoppers 17c is moved to a prescribed entry position toward the hand front end by the action of the stopper actuator 16, the third capture range R3 is reduced to a reduced third capture range R3'. The reduced third capture range R3' is formed by the pair of first front stoppers 12c and the pair of movable stoppers 17c like the third capture range R3. The diameter φP3' of the outer circumferential circle P3' of the reduced third capture range R3' is larger than the diameter φW of the substrate W and smaller than the diameter φP3 of the outer circumferential circle P3 of the third capture range R3 (φW < φP3' < φP3).

[0108] As described above, in the hand 1B related to the modification example 2, the movable pad 17a is provided to the movable stopper 17c. The movable pad 17a is provided to the movable stopper 17c and acts integrally with the movable stopper 17c. When the movable stopper 17c is in the retreat position, the movable stopper 17c is located on the outer circumferential circle P3 of the capture range R3 and the movable pad 17a is located inside the capture range R3. When the movable stopper 17c is in the entry position, at least a part of the movable stopper 17c is located inside the capture range R3 and the movable pad 17a is located inside the capture range R3. In this way, in the hand 1B related to the modification example 2, the components that define the hand base end side portion of the third capture range R3 and the components that define the hand base end side portion of the reduced third capture range R3' are implemented by the same movable stopper 17c.

[0109] BRIEF DESCRIPTION OF REFERENCE NUMERALS

[0110] 1, 1A, 1B … substrate holding hand; 2 … substrate transfer robot; 4 … arm; 8 … control device; 11 … support plate; 12a, 12b … front pad; 12c, 12d … front stopper (fixed stopper); 13a, 14a, 17a … rear pad; 13c, 14c … rear stopper; 16, 25, 26 … stopper actuator; 17c, 23, 24 … movable stopper; 31, 32 … in-position sensor; R1, R2, R3 … reference capture range; R1', R2', R3' … reduced capture range; U1, U2 … support unit; W … substrate.

Claims

1. A substrate holding hand characterized by comprising: Possessing: a support plate, which is provided with a circular reference capture range; a plurality of pads, which are disposed on the support plate within the reference capture range; at least one fixed stopper, which is disposed along the outer circumferential circle of the reference capture range, and which restricts movement of a substrate supported by the plurality of pads to the outer circumferential side of the reference capture range; at least one movable stopper, which has a portion that is identical in height to the fixed stopper from the support plate; and a stopper actuator, which is configured to move the movable stopper from a retreat position on or outside the outer circumferential circle of the reference capture range to an entry position that is closer to the fixed stopper than the retreat position, a circular reduced capture range is defined by the movable stopper and the fixed stopper in the entry position, the diameter of the reduced capture range being greater than the diameter of the substrate and less than the diameter of the reference capture range, the substrate received in the reduced capture range is held in a state of being placed on the plurality of pads on the support plate without being held by the movable stopper and the fixed stopper on the side surface of the substrate.

2. The substrate holding hand according to claim 1, further comprising: a control device that controls the stopper actuator, the control device causing the stopper actuator to act so that the movable stopper is moved from the retreat position to the entry position at a prescribed timing after the substrate is placed on the plurality of pads. Further comprising:

3. The substrate holding hand of claim 1, wherein a control device that controls the stopper actuator; and a sensor that detects the presence or absence of the substrate placed on the plurality of pads, the control device causing the stopper actuator to act so that the movable stopper is moved from the retreat position to the entry position at a prescribed timing after the substrate is detected by the sensor to be placed on the plurality of pads.

4. The substrate holding hand according to any one of claims 1 to 3, further comprising: at least one rear stopper, which is disposed at the base end portion of the support plate along the outer circumferential circle of the reference capture range, and which restricts movement of the substrate supported by the plurality of pads to the base end side.

5. The substrate holding hand according to any one of claims 1 to 3, further comprising: a movable pad, which is provided on the front end side of the movable stopper, and which acts integrally with the movable stopper, when the movable stopper is in the retreat position, the movable stopper is on the outer circumferential circle of the reference capture range, and the movable pad is on the inner side of the reference capture range.

6. The substrate holding hand according to claim 1, wherein: a plurality of the reference capture ranges are provided on the support plate, including a first reference capture range and a second reference capture range that is offset to the front end side from the first reference capture range, a first-stage support unit is provided for the first reference capture range, the first-stage support unit including a combination of the plurality of pads, the fixed stopper, the movable stopper, and the stopper actuator, ​ A second stage support unit is provided for the second reference capture range, the second stage support unit including a combination of the plurality of pads, the fixed stopper, the movable stopper, and the stopper actuator, and supports the substrate at a position higher than the first stage support unit from the support plate.

7. A substrate transfer robot, characterized by, Possessing: an arm; and The substrate holding hand of any one of claims 1 to 6 is installed to a front end portion of the arm.

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