A synthetic texture production process

Abstract

The application discloses a synthetic texture manufacturing process, comprising the following steps: 1) micro-nano texture structure splicing, 2) laser direct writing lithography and 3) development, compared with the prior art, the influence of moire can be avoided and weakened.

Description

Technical Field

[0001] This invention relates to a synthetic texture manufacturing process, which is part of CMFP design and is applicable to the field of appearance decoration technology for 3C electronics, home furnishings, etc. Background Technology

[0002] With societal development and consumption upgrades, products are increasingly demanding emotionally resonant designs. Future designs will focus more on systematic product design, optimizing and integrating aspects such as appearance, structure, function, and interaction. Competition in product details among different brands will escalate to a higher level. Taking mobile phones and other 3C electronics as an example, as people's demands for the visual and tactile effects of mobile phone cover glass have increased, the original single-texture, single-plating process is no longer sufficient to meet customers' pursuit of high-quality results. This has led to the development of the current double-texture, double-plating process; however, this has simultaneously increased labor and production costs.

[0003] The synthetic texture process achieves the fusion of two textured micro / nano structures by calculating the angle between them and then dividing and rearranging the micro / nano unit structures. This allows for the creation of dual-texture, dual-light-and-shadow effects at low cost. However, synthetic textures have historically often been accompanied by moiré patterns. Moiré patterns are typically the visual result of interference between two lines or objects at a constant angle and frequency. When the human eye cannot distinguish between the two lines or objects, it only perceives the interference pattern. The formula for calculating moiré pattern width shows...

[0004] (Appendix) Figure 1 We can avoid and reduce the effects of moiré patterns by controlling the angle θ of the rearranged adjacent structures. Summary of the Invention

[0005] The purpose of this invention is to solve the problems in the prior art and propose a synthetic texture manufacturing process that can avoid and reduce the influence of moiré patterns.

[0006] To achieve the above objectives, this invention proposes a synthetic texture fabrication process, comprising the following steps:

[0007] 1) Micro-nano texture structure splicing

[0008] a) Texture structure arrangement: A hexagonal honeycomb arrangement is adopted. Odd-numbered hexagons are arranged with micro-nano structures with texture one effect inside, and even-numbered hexagons are arranged with micro-nano structures with texture two effect inside.

[0009] b) Angle Calculation Correction: The first step is to extract the vector value based on the orientation of the micro-nano structures within the hexagon; the second step is to calculate the angle between the micro-nano structures within the odd-numbered hexagons and the horizontal direction. 1. The included angle and the even-numbered rows of hexagons, the micro-nano structures formed in the horizontal direction The difference in the included angles is used to calculate the vector angle between adjacent units in the odd-numbered and even-numbered rows. = 1- 2. Odd numbers correspond to texture one, and even numbers correspond to texture two; 3. Based on the smallest size W that the human eye can recognize, calculate the minimum included angle using the moiré pattern width calculation formula. θ The min value is then used to calculate the included angle between adjacent angle vectors in the second step. Value and minimum angle θ Compare the min values, < θ The min portion of the hexagons is selected, and this part is where moiré patterns are prone to occur. The fourth step involves adjusting the spacing (a and b) of the micro-nano structures within the selected hexagons to meet the following requirements. > θ min;

[0010] (ii) Laser direct writing lithography

[0011] A photoresist stencil with a thickness corresponding to the depth of the micro / nano structure design is selected. The laser spot size and exposure dose are set according to the size of the micro / nano structure. Based on the characteristics of colloidal component decomposition in the photoresist stencil's illuminated area, a dissolved area and a non-dissolved textured structure area are formed on the stencil after laser etching.

[0012] III) Development

[0013] The developer dissolves and washes away the decomposed colloidal portion on the lithography plate, leaving the undissolved structure in the unexposed photolithographic areas, thus obtaining the desired texture effect.

[0014] Preferably, the side length of the hexagon is no greater than 25 μm.

[0015] Preferably, W=0.1.

[0016] To achieve the above objectives, this invention proposes a synthetic texture fabrication process, comprising the following steps:

[0017] 1) Exposure of film production

[0018] a) Film design: Using graphic design software to design and create random polygons or graphic films with varying sizes and densities in black and white intervals.

[0019] b) Photoplotting film output: High-resolution photoplotting film printers are used for output; after the film is produced, the dimensional accuracy of the film must be checked to ensure the quality of the film;

[0020] (ii) UV transfer printing

[0021] Texture 1 is flipped onto the PC board using master mold glue, and texture 2 is flipped onto the PET film using interlocking adhesive. Texture 1 and texture 2 are aligned and fixed, and interlocking adhesive is rolled between the PC and PET.

[0022] III) Film Exposure

[0023] The film with the designed pattern is fixed on the PET texture area. After being irradiated by a parallel light source of a specific wavelength, the glue in the white pattern area of ​​the film is cured, while the glue in the black area of ​​the film is not cured. The cured area will fill in the original texture structure of the second texture area, presenting the texture structure of the first texture. In the uncured area, the glue is still in a liquid and viscous state.

[0024] IV) Development

[0025] After the uncured glue was dissolved and washed away with a solvent, the cured area showed texture one, and the dissolved area showed texture two.

[0026] Preferably, the output is from a 25400dpi high-resolution photoplotting film machine.

[0027] Preferably, the illumination is provided by a parallel light source with a wavelength of 365nm.

[0028] The beneficial effects of this invention are: This invention provides a method for controlling the size of segmentation units and the spacing between adjacent units through a programmed design approach. The size of the included angle; another method is to design films with different graphic arrangements and combine the two textures through exposure and development to achieve a dual-texture dual-light and shadow effect. Compared with existing technologies, this can avoid and reduce the influence of moiré patterns.

[0029] The features and advantages of the present invention will be described in detail through embodiments and in conjunction with the accompanying drawings. Attached Figure Description

[0030] Figure 1 The attached diagram explains the formula for calculating moiré pattern width.

[0031] Figure 2 It is a diagram showing the arrangement of textures within hexagons;

[0032] Figure 3 It is a graphic film with a diameter of 0.05-0.1mm, a gradually changing circle, a 0.05mm square with random angles, and a circle with a diameter of 0.05mm within a specific range of random shapes;

[0033] Figure 4 This is a schematic diagram of the principle of texture synthesis. Detailed Implementation

[0034] Example 1

[0035] See Figure 1 ,2 The present invention discloses a synthetic texture manufacturing process, comprising the following steps:

[0036] 1) Micro-nano texture structure splicing

[0037] a) Texture structure arrangement: A hexagonal honeycomb arrangement is adopted. Odd-numbered hexagons are arranged with micro-nano structures with texture one effect inside, and even-numbered hexagons are arranged with micro-nano structures with texture two effect inside.

[0038] b) Angle Calculation Correction: The first step is to extract the vector value based on the orientation of the micro-nano structures within the hexagon; the second step is to calculate the angle between the micro-nano structures within the odd-numbered hexagons and the horizontal direction. 1. The included angle and the even-numbered rows of hexagons, the micro-nano structures formed in the horizontal direction The difference in the included angles is used to calculate the vector angle between adjacent units in the odd-numbered and even-numbered rows. = 1- 2. Odd numbers correspond to texture one, and even numbers correspond to texture two; 3. Based on the smallest size W that the human eye can recognize, calculate the minimum included angle using the moiré pattern width calculation formula. θ The min value is then used to calculate the included angle between adjacent angle vectors in the second step. Value and minimum angle θ Compare the min values, < θ The min portion of the hexagons is selected, and this part is where moiré patterns are prone to occur. The fourth step involves adjusting the spacing (a and b) of the micro-nano structures within the selected hexagons to meet certain requirements. > θ min;

[0039] (ii) Laser direct-write lithography:

[0040] A photoresist stencil with a thickness corresponding to the depth of the micro / nano structure design is selected. The laser spot size and exposure dose are set according to the size of the micro / nano structure. Based on the characteristics of colloidal component decomposition in the photoresist stencil's illuminated area, a dissolved area and a non-dissolved textured structure area are formed on the stencil after laser etching.

[0041] III) Development

[0042] The developer dissolves and washes away the decomposed colloidal portion on the lithography plate, leaving the undissolved structure in the unexposed photolithographic areas, thus obtaining the desired texture effect.

[0043] The side length of the hexagon is no greater than 25 μm.

[0044] The value of W is 0.1.

[0045] Example 2

[0046] See Figure 2 , 3 The present invention discloses a synthetic texture manufacturing process, comprising the following steps:

[0047] 1) Exposure of film production

[0048] a) Film design: Using graphic design software to design and create random polygons or graphic films with varying sizes and densities in black and white intervals.

[0049] b) Photoplotting film output: High-resolution photoplotting film printers are used for output; after the film is produced, the dimensional accuracy of the film must be checked to ensure the quality of the film;

[0050] (ii) UV transfer printing

[0051] Texture 1 is flipped onto the PC board using master mold glue, and texture 2 is flipped onto the PET film using interlocking adhesive. Texture 1 and texture 2 are aligned and fixed, and interlocking adhesive is rolled between the PC and PET.

[0052] III) Film Exposure

[0053] The film with the designed pattern is fixed on the PET texture area. After being irradiated by a parallel light source of a specific wavelength, the glue in the white pattern area of ​​the film is cured, while the glue in the black area of ​​the film is not cured. The cured area will fill in the original texture structure of the second texture area, presenting the texture structure of the first texture. In the uncured area, the glue is still in a liquid and viscous state.

[0054] IV) Development

[0055] After the uncured glue was dissolved and washed away with a solvent, the cured area showed texture one, and the dissolved area showed texture two.

[0056] The output is from a high-resolution 25400dpi optical plotting film machine.

[0057] The light source used is a parallel light source with a wavelength of 365nm.

[0058] The above embodiments are illustrative of the present invention and are not intended to limit the present invention. Any simple modifications to the present invention are within the scope of protection of the present invention.

Claims

1. A synthetic texture creation process, characterized in that: Includes the following steps: 1) Micro-nano texture structure splicing a) Texture structure arrangement: A hexagonal honeycomb arrangement is adopted. Odd-numbered hexagons are arranged with micro-nano structures with texture one effect inside, and even-numbered hexagons are arranged with micro-nano structures with texture two effect inside. b) Angle Calculation Correction: The first step is to extract the vector value based on the orientation of the micro-nano structures within the hexagon; the second step is to calculate the angle between the micro-nano structures within the odd-numbered hexagons and the horizontal direction.

1. The included angle and the even-numbered rows of hexagons, the micro-nano structures formed in the horizontal direction The difference in the included angles is used to calculate the vector angle between adjacent units in the odd-numbered and even-numbered rows. = 1- 2. Odd numbers correspond to texture one, and even numbers correspond to texture two; 3. Based on the smallest size W that the human eye can recognize, calculate the minimum included angle using the moiré pattern width calculation formula. θ The min value is then used to calculate the included angle between adjacent angle vectors in the second step. Value and minimum angle θ Compare the min values, < θ The min portion of the hexagons is selected, and this part is where moiré patterns are prone to occur. The fourth step involves adjusting the spacing (a and b) of the micro-nano structures within the selected hexagons to meet the following requirements. > θ min; (ii) Laser direct-write lithography: A photoresist stencil with a thickness corresponding to the depth of the micro / nano structure design is selected. The laser spot size and exposure dose are set according to the size of the micro / nano structure. Based on the characteristics of colloidal component decomposition in the photoresist stencil's illuminated area, a dissolved area and a non-dissolved textured structure area are formed on the stencil after laser etching. III) Development The developer dissolves and washes away the decomposed colloidal portion on the lithography plate, leaving the undissolved structure in the unexposed photolithographic areas, thus obtaining the desired texture effect.

2. The synthetic texture fabrication process as described in claim 1, characterized in that: The side length of the hexagon is no greater than 25 μm.

3. The synthetic texture fabrication process as described in claim 1, characterized in that: The value of W is 0.1.

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