Display panel and display device

Abstract

The present application provides a display panel and a display device, and relates to the field of display technology. The display panel includes a substrate, a first conductive layer, and a second conductive layer. The substrate is divided into a display area, a hole-digging area, and a non-display area between the display area and the hole-digging area. The substrate includes at least one isolation column, and the isolation column is located in the non-display area and surrounds the hole-digging area. The first conductive layer is located in the display area and the non-display area and is arranged on the side of the isolation column away from the substrate. The second conductive layer is located in the non-display area and is arranged between the substrate and the first conductive layer, and the second conductive layer includes at least one test wire arranged around the hole-digging area. A test wire is provided on the side of at least one isolation column away from the substrate, and a notch is provided on at least one side wall of the isolation column provided with the test wire, and the first conductive layer is disconnected at the notch. The setting of the notch in the display panel can improve the problem of black spots at the edge of the hole-digging area.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a display device having the display panel. Background Art

[0002] As users' requirements for high screen-to-body ratios of display devices increase, full-screen display technology is developing rapidly. In order to increase the screen-to-body ratio of display panels, the mainstream technology is to open holes inside the display panel as light-transmitting areas for functional components such as cameras and fingerprint recognition. However, during product reliability testing, display devices with holes are more likely to have black spots in the display area around the hole area, which cannot meet the user's usage requirements. Summary of the invention

[0003] The first aspect of the present application provides a display panel, which includes a substrate, a first conductive layer, and a second conductive layer. The substrate is divided into a display area, a hole-digging area, and a non-display area between the display area and the hole-digging area. The substrate includes at least one isolation column, which is located in the non-display area and surrounds the hole-digging area. The first conductive layer is located in the display area and the non-display area and is arranged on the side of the isolation column away from the substrate. The second conductive layer is located in the non-display area and is arranged between the substrate and the first conductive layer. The second conductive layer includes at least one test wire arranged around the hole-digging area. A test wire is provided on the side of at least one isolation column away from the substrate, and a notch is provided on at least one side wall of the isolation column provided with the test wire, and the first conductive layer is disconnected at the notch.

[0004] In the above scheme, on the one hand, the setting of all the isolation columns reduces the risk of black spots at the edge of the hole area due to cutting stress. On the other hand, the notch on the side wall of the isolation column provided with the test conductor reduces the risk of the first conductive layer overlapping with the test wire, thereby reducing the risk of the electric field strength being enhanced due to the overlap when the test wire is energized, and further reducing the probability of black spots at the edge of the hole area.

[0005] In combination with the first aspect, in some embodiments, the base further includes a substrate and a functional film layer located on the substrate, and the notch is arranged on the substrate and / or the functional film layer.

[0006] In the above solution, the flexible setting of the notch increases the applicability of the solution. Meanwhile, setting a plurality of notches or setting the notch on the substrate can more effectively reduce the risk of overlap between the first conductive layer and the test wire.

[0007] In combination with the first aspect, in some embodiments, the functional film layer includes at least two sub-film layers, and the notch is provided on at least one of the sub-film layers. Further, the functional film layer includes a buffer layer, a gate insulating layer, a capacitor insulating layer, an interlayer dielectric layer, and a passivation layer stacked in sequence in a thickness direction perpendicular to the substrate.

[0008] In the above solution, the design of multiple sub-film layers of the functional film layer enables the isolation column to have a higher stacking solution, which is more conducive to reducing the risk of overlapping between the wires in the first conductive layer and the second conductive layer.

[0009] In combination with the first aspect, in some embodiments, the cross-sectional shape of the notch in the direction perpendicular to the thickness of the substrate is an arc and / or a broken line. Further, the slope angle formed by the notch is 30° to 90°.

[0010] In the above solution, the shape of the notch and the setting of the climbing angle increase the difficulty of the first conductive layer climbing over the notch, thereby effectively improving the problem of overlapping between the first conductive layer and the test wire.

[0011] In combination with the first aspect, in some embodiments, the notches are arranged continuously or at intervals in the circumferential direction of the isolation column.

[0012] In the above solution, the design of the notch can take into account both maintaining the strength of the isolation column and isolating the first conductive layer, thereby improving the overall performance of the display panel.

[0013] In combination with the first aspect, in some embodiments, the second conductive layer further includes at least one blocking wire disposed around the hole-digging area, the blocking wire is disposed on a side of at least one isolation column away from the substrate, and the isolation column with the blocking wire is spaced from the isolation column with the test wire. Furthermore, at least one side wall of the isolation column with the blocking wire is provided with a notch.

[0014] In the above solution, the design of the blocking wire and the corresponding notch on the side wall of the isolation column can further reduce the risk of overlapping between the first conductive layer and the blocking wire.

[0015] In combination with the first aspect, in some implementations, the second conductive layer includes a plurality of test wires, and the blocking wire is located between two of the test wires.

[0016] In the above solution, the spacing between the blocking wire and the test wire can not only further improve the problem of black spots appearing at the edge of the hole area, but also improve the efficiency of product reliability testing of the display panel.

[0017] In combination with the first aspect, in some embodiments, a limiting groove is provided on the side wall of the test wire and / or the blocking wire. Further, the test wire and / or the blocking wire includes at least two sub-metal layers, and the materials of the at least two sub-metal layers are different. Further, the test wire and / or the blocking wire includes three sub-metal layers stacked in sequence, and the limiting groove is provided in the sub-metal layer of the middle layer.

[0018] In the above solution, the design of the limiting groove improves the firmness between the new film layer provided on some settings of the first conductive layer facing away from the substrate and the second conductive layer, thereby improving the quality of the display panel.

[0019] In combination with the first aspect, in some embodiments, it further includes a packaging layer located on the side of the first conductive layer facing away from the substrate. The packaging layer includes an inorganic film layer, and the inorganic film layer fills the limiting groove and / or the notch.

[0020] In the above solution, the inorganic film layer in the packaging layer fills the limiting groove and / or the notch of the test wire and / or the blocking wire, which can not only enhance the packaging effect and improve the water and oxygen resistance of the display panel, but also reduce the probability of problems affecting the display effect of the display panel caused by the peeling off of the inorganic film layer after corrosion, thereby improving the quality of the display panel.

[0021] The second aspect of the present application provides a display device. The display device includes the display panel of any one provided in the first aspect above. Description of the Drawings

[0022] Figure 1 It is a schematic structural diagram of a top view of a display panel according to an embodiment of the present application.

[0023] Figure 2 It is an embodiment of the present application Figure 1 The enlarged view at S.

[0024] Figure 3 It is a cross-sectional view of a partial area of a display panel according to an embodiment of the present application, which includes Figure 2 The cross-sectional view of the display panel shown along M1N1.

[0025] Figure 4 It is a cross-sectional view of a partial area of a display panel according to another embodiment of the present application, which includes Figure 2 The cross-sectional view of the display panel shown along M1N1.

[0026] Figure 5 It is a cross-sectional view of a partial area of a display panel according to another embodiment of the present application, which includes Figure 2 The cross-sectional view of the display panel shown along M1N1.

[0027] Figure 6 It is a partial cross-sectional view of the display area of a display panel according to an embodiment of the present application.

[0028] Figure 7 It is a cross-sectional view of a partial area of a display panel in an embodiment of the present application, which includes Figure 2 The cross-sectional view of the display panel shown along M1N1.

[0029] Figure 8It is of another embodiment of the present application Figure 1 An enlarged view of the position S in

[0030] Figure 9 It is a cross-sectional view of a partial area of a display panel according to an embodiment of the present application, which includes Figure 8 The cross-sectional view of the display panel shown along M2N2.

[0031] Figure 10 It is a cross-sectional view of a partial area of a display panel according to another embodiment of the present application, which includes Figure 8 The cross-sectional view of the display panel shown along M2N2.

[0032] Figure 11 It is a cross-sectional view of a partial area of a display panel according to another embodiment of the present application, which includes Figure 8 The cross-sectional view of the display panel shown along M2N2. Detailed implementation manners

[0033] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present application without creative efforts shall fall within the protection scope of the present invention.

[0034] Setting a dug hole area inside the display panel is a common means to improve the screen-to-body ratio of the display panel. However, problems such as black spots and packaging failure will occur at the edge of the dug hole area. Currently, the commonly used method is to set a side-etched structure outside the dug hole area to block the cutting stress and the extension of water and oxygen to the display area. However, this requires a high precision for the groove depth of the side-etched structure. If the groove depth is too deep, other metals involved in other processes will remain in the groove, resulting in display anomalies. If the groove depth is too shallow, the cutting stress generated during the preparation of the opening by cutting is likely to extend to the display area, causing black spots at the edge of the dug hole area and resulting in display anomalies, and the problem of packaging failure has not been well improved.

[0035] To this end, a new solution is proposed, which is to set an isolation column structure around the hole area. The isolation column structure can improve the problem of black spots and packaging failure at the edge of the hole area. However, in actual production, during the product reliability test of the display panel with the hole area, GDSH (Growing DarkSpot) black spot failure will occur after power-on operation for a period of time, while the display panel does not have GDSH failure when the storage test (i.e., power-off test) is performed for the same time under the same test conditions. It is found that the first conductive layer (such as a common cathode) overlaps the test wire in the edge area of the hole area, and / or the first conductive layer overlaps the test wire with other wires (such as a blocking wire), and / or the first conductive layer overlaps other wires, which makes the electric field strength around the test wire strengthened after the power-on test, and the strengthened electric field will cause the metal ions (such as potassium ions, sodium ions, etc.) in the cross section of the film layer (such as a polarizer) of the display panel at the edge of the hole area to move to other film layers of the display panel (such as a common cathode, an inorganic film layer in the packaging layer facing the common cathode) under the action of the enhanced electric field. In order to maintain charge balance, when potassium ions, sodium ions and other ions exist in other film layers of the display panel (such as the common cathode, the inorganic film layer in the encapsulation layer facing the common cathode), hydrogen ions will gather in the areas where the potassium ions, sodium ions and other ions exist in these film layers to ensure positive charge neutralization. Therefore, the leaked potassium and sodium elements react electrochemically with these film layers located at the edge of the hole area (such as the common cathode, the inorganic film layer in the encapsulation layer facing the common cathode). The reaction equation includes:

[0036] SiO2+2OH - =SiO3 2- +H2O (the inorganic film layer in the encapsulation layer facing the common cathode includes SiO2);

[0037] e - +H2O=OH - +H2↑ (the common cathode has a large number of electrons).

[0038] Furthermore, due to these electrochemical reactions, the aging of the inorganic film layer in the cathode and the encapsulation layer facing the common cathode is accelerated, which in turn causes the encapsulation layer to fail and also causes GDSH black spot defects in the display panel.

[0039] To this end, the present application provides a display panel in which a notch is set on the side wall of the isolation column so that the first conductive layer is disconnected at the notch, reducing the risk of overlapping of the wires in the first conductive layer and the second conductive layer, thereby improving the problem of black spots appearing at the edge of the hole area.

[0040] Embodiments of the present application provide a display panel, which includes a substrate, a first conductive layer, and a second conductive layer. The substrate is divided into a display area, a dug hole area, and a non-display area located between the display area and the dug hole area. The substrate includes isolation pillars, and the isolation pillars are located in the non-display area and surround the dug hole area. The first conductive layer is located in the display area and the non-display area and is disposed on the side of the isolation pillar away from the substrate. The second conductive layer is located in the non-display area and is disposed between the substrate and the first conductive layer. The second conductive layer includes at least one test wire disposed around the dug hole area. The isolation pillar includes a first isolation pillar and a second isolation pillar disposed at intervals. A test wire is provided on the side of the first isolation pillar away from the substrate, and a notch is provided on at least one side wall of the first isolation pillar.

[0041] It should be understood that the test wire realizes the quality detection of the display panel by passing an electric current. Contacts are respectively provided on both sides of the dug hole area for connecting leads to introduce external current. The design of the leads can be designed according to specific test conditions and will not be elaborated here.

[0042] In this display panel, on the one hand, the isolation pillar on the side of the second conductive layer facing the substrate blocks the cutting stress generated during the cutting of the display panel during the formation of the dug hole area from extending to the display area through the inorganic film layer, reducing the probability of black spots at the edge of the dug hole area due to cutting stress. On the other hand, the notch on the side wall of the first isolation pillar makes it easy for the first conductive layer to break when passing through the notch, reducing the risk of the first conductive layer overlapping with the test wire in the second conductive layer. Thus, when the test wire is energized, the electric field intensity is increased due to the overlap of the test wire and the first conductive layer, and further reduces the probability that ions in the film layer of the display panel diffuse into other film layers and accelerate the aging of other film layers, that is, further reduces the probability of black spots at the edge of the dug hole area.

[0043] Exemplarily, as Figure 1 and Figure 2 shown, the display panel includes a substrate 10, a first conductive layer 20, and a second conductive layer 30. The display panel is divided into a display area AA, a dug hole area DA, and a non-display area NA located between the display area AA and the dug hole area DA. The non-display area NA surrounds the dug hole area DA. Correspondingly, the substrate 10 is also divided into three areas: a display area AA, a dug hole area DA, and a non-display area NA. The substrate 10 includes a first isolation pillar 11 and a second isolation pillar 12 disposed at intervals, and each isolation pillar is located in the non-display area NA and surrounds the dug hole area DA. The first conductive layer 20 is located in the display area AA and the non-display area NA and is disposed on the side of the isolation pillar away from the substrate 10. The second conductive layer 30 is located in the non-display area NA and is disposed between the substrate 10 and the first conductive layer 20. The second conductive layer 30 includes at least one test wire 31 disposed around the dug hole area DA. And, as Figure 3As shown, on the side of the first isolation pillar 11 facing away from the substrate 10, a test wire 31 is provided, and on the side wall of the first isolation pillar 11 provided with the test wire 31 and away from the dug hole area DA, a notch 13 is provided. This notch 13 increases the probability of the first conductive layer 20 extending from the display area AA breaking here, thereby reducing the risk of the first conductive layer 20 overlapping with the test wire 31.

[0044] There are various schemes for arranging the notch 13 on the side wall of the first isolation pillar 11. Exemplarily, as Figure 4 shown, on the side wall of the first isolation pillar 11 provided with the test wire 31 and away from the dug hole area DA and on the side wall close to the dug hole area DA, notches 13 are both provided. This can further reduce the risk of the wire in the first conductive layer 20 overlapping with the second conductive layer 30.

[0045] It should be understood that the notch can also be provided on the side of the first isolation pillar close to the dug hole area. In addition, when notches are provided on both side walls of the first isolation pillar, the relative positions of the notches on the two side walls, the depth of each, and the shape of the notch can be designed according to the requirements of the display panel, which will not be elaborated here. At the same time, the dug hole area is the position where other photosensitive devices such as the front camera module are provided, and its position and shape are not limited to Figure 1 the scheme shown, and can be designed according to the specific functional requirements of the display panel. And, this display panel further includes other non-display areas, such as non-display areas provided around the display area and away from the dug hole area, which can be used as other functional areas such as the bonding area and the bending area.

[0046] The specific scheme of the notch provided on the side wall of the isolation pillar has a direct relationship with the film layer of the isolation pillar. The relationship between the two is introduced in detail below.

[0047] In some embodiments, the substrate 10 further includes a substrate 14 and a functional film layer 15 located on the substrate 14, and the notch 13 is provided on the substrate 14 and / or the functional film layer 15. The notch 13 can be provided in any one or more of the multiple film layers included in the substrate 10. That is, the flexible setting of the notch 13 increases the applicability of this scheme. At the same time, setting multiple notches 13 or setting the notch 13 on the substrate 14 can more efficiently reduce the risk of the electric field strength being strengthened due to overlap when the test wire 31 is energized.

[0048] Exemplarily, as Figure 5 shown, in this display panel, the substrate 10 includes a substrate 14 and a functional film layer 15, and notches 13 are provided on both side walls of the first isolation pillar 11. The notch 13 provided on the side wall of the first isolation pillar 11 close to the dug hole area DA is located in the substrate 14, and the notch 13 provided on the side wall of the first isolation pillar 11 away from the dug hole area DA, that is, close to the display area AA, is located in the functional film layer 15.

[0049] It should be understood that the design of the notch is not limited to the scheme of the above example. The notches on the two side walls of the first isolation column can be both set at the same film layer position, for example, both in the functional film layer or both on the substrate. Moreover, the same notch can be simultaneously set in the functional film layer and the substrate, and these can all be designed according to actual production requirements and will not be elaborated here.

[0050] In addition, the notch can be formed during the preparation process of forming the isolation column. Specifically, the substrate can be subjected to three dry etching processes. After the first dry etching, part of the functional film layer is etched away to form the opening of the partition groove, and the cross-sectional diameter of the opening of the partition groove gradually decreases. After the second dry etching, most of the functional film layer is etched away to expose the end face of the film layer close to the substrate in the functional film layer, that is, the buffer layer, to form the middle part of the partition groove. The cross-sectional diameter of the middle part also gradually decreases, and since the minimum cross-sectional diameter of the opening is larger than the maximum cross-sectional diameter of the middle part, a step is formed at the connection between the opening and the middle part. For example, a ring-shaped structure notch (opening and middle part) formed by dry etching is symmetric on both sides with the ring-shaped structure notch as the center. The maximum cross-sectional diameter of the opening is 10 um, the maximum cross-sectional diameter of the middle part is 5 um, and the Taper angle of the middle part is 70° - 80°. The length of the projection of the step at the connection between the opening and the middle part on the substrate is 2.5 um, that is, the length of the wire on the second conductive layer from the edge of the middle part is 2.5 um. After the third dry etching, the step at the connection between the opening and the middle part is etched away to make the two smoothly connected, that is, the minimum cross-sectional diameter of the opening is equal to the maximum cross-sectional diameter of the middle part, and part of the substrate is also etched away to form the bottom of the partition groove, finally forming the isolation column. And during the first dry etching and / or the second dry etching and / or the third dry etching process, notches can be formed on the side walls of the isolation groove.

[0051] When taking into account the size requirements of the display panel and the production process, adjusting the thickness of the functional film layer can also alleviate the problem of stress transfer during cutting and improve the problem of wire overlap between the first conductive layer and the second conductive layer. In some embodiments, the functional film layer includes at least two sub-film layers, and the notch is set on at least one sub-film layer. In at least some embodiments, the functional film layer includes a buffer layer, a gate insulating layer, a capacitive insulating layer, an interlayer dielectric layer, and a passivation layer stacked in sequence in the thickness direction perpendicular to the substrate. The design of multiple sub-film layers of the functional film layer enables the isolation column to have a higher stacking scheme. Whether considering increasing the height of the isolation column or setting notches farther from the first conductive layer or more notches on the side wall of the first isolation column, it is more beneficial to reduce the risk of overlap between the wires in the first conductive layer and the second conductive layer.

[0052] Exemplarily, such asFigure 6 and Figure 7 As shown, the display panel includes a substrate 14, a functional film layer 15, a second conductive layer 30 and a first conductive layer 20 stacked in sequence. The functional film layer 15 includes five sub-film layers, a buffer layer 151, a gate insulating layer 152, a capacitor insulating layer 153, an interlayer dielectric layer 154 and a passivation layer 155, which are stacked in sequence from the substrate 14 to the second conductive layer 30. The functional film layer 15 is located in the display area AA and the non-display area NA display area AA, the first isolation column 11 and the second isolation column 12 both include all the sub-film layers of the functional film layer 15, and the notch 13 set on the first isolation column 11 is located in a sub-film layer of the functional film layer 15, namely, the capacitor insulating layer 153. Based on the consideration that etching is performed on the same material, it is convenient to control the etching speed and effect. This solution facilitates the production of the notch 13 and saves production costs.

[0053] It should be understood that the functional film layer included in the display panel is not limited to the above-mentioned five-layer sub-film layer structure, and may also include two, three, four or more, for example, six sub-film layers, and the thickness of the first isolation column and the second isolation column in the direction from the substrate to the first conductive layer may be equal or unequal as in the above example. For example, the thickness of the first isolation column is greater than the thickness of the second isolation column, which is conducive to improving the problem of metal residue in the gap between the isolation columns. In addition, the scheme of setting the notch in the functional film layer is not limited to the above-mentioned exemplary scheme. The notch can be set in other sub-film layers, or in different sub-film layers at the same time. These can be selected according to the functional requirements of the display panel and the actual production process, which will not be elaborated here.

[0054] In some embodiments, the second conductive layer further includes at least one blocking wire disposed around the hole-digging area, and the blocking wire is disposed on a side of the second isolation column away from the substrate. The blocking wire can further prevent the stress generated by the inorganic film layer during cutting from extending to the display area, thereby further improving the problem of black spots at the edge of the hole-digging area.

[0055] Based on the blocking wires provided in the display panel, in some embodiments, a notch is provided on at least one side wall of the second isolation column, which reduces the risk of overlapping of the first conductive layer and the blocking wires, thereby reducing the probability of black spots appearing at the edge of the hole area.

[0056] In some embodiments, the second conductive layer includes a plurality of test wires, and the blocking wire is located between two of the test wires. Between the blocking wire and the test wire, this can not only reduce the risk of the cutting stress extending to the display area, but also further improve the problem of black spots appearing at the edge of the hole-digging area. In addition, the two test wires are arranged at intervals, which can effectively detect the impact of the cutting stress on the display panel, thereby improving the efficiency of the product reliability test of the display panel.

[0057] Exemplarily, as Figure 8 and Figure 9 shown, in this display panel, the second conductive layer 30 includes a test wire 31 disposed on a side of the first isolation column 11 away from the substrate 10 and a blocking wire 32 disposed on a side of the second isolation column 12 away from the substrate 10. Specifically, there are two test wires 31, and there is one blocking wire 32 disposed between the two test wires 31, and the distance between adjacent wires is 10 μm, which can reduce the risk of the test wire 31 breaking due to cutting stress and improve the reliability of the product reliability test of the display panel. In addition, the two test wires 31 are not adjacent to each other, which can efficiently detect the influence of the cutting stress generated by the setting of the cutout area DA on the display panel, that is, detect whether cracks occur in the area of the display panel close to the cutout area DA, improve the efficiency of the product reliability test of the display panel, and improve its production efficiency. Specifically, when testing the display panel, if the test wire 31 close to the cutout area DA cannot work, it proves that stress cracks have been generated around the cutout area DA due to the cutting stress generated by the cutout area DA. If the test wire 31 close to the display area AA cannot work, it proves that the cutting stress has extended to the display area AA of the display panel, affecting the quality of the display panel. That is to say, as long as the outermost test wire 31 closest to the display area AA can work, it proves that the setting of the cutout area DA has no impact on the normal use of the display panel.

[0058] It should be understood that the solution regarding the test wire and the blocking wire included in the second conductive layer is not limited to the above exemplary solution. For example, the second conductive layer may only include test wires, and each test wire is disposed on the isolation columns arranged at intervals, or there may be multiple blocking wires, and there may be more than two test wires, and the blocking wire is disposed between two adjacent test wires. These can all be selected and designed according to the requirements of the product, and will not be elaborated here.

[0059] In some embodiments, the cross-sectional shape of the notch in the thickness direction perpendicular to the substrate is arc-shaped and / or polyline-shaped. In at least one embodiment, the climbing angle formed by the notch is 30° to 90°. The shape of the notch and the setting of the climbing angle increase the difficulty of the first conductive layer climbing over the notch, thereby efficiently improving the problem of the first conductive layer overlapping with the test wire. In at least one embodiment, the notches are continuously or intermittently arranged in the circumferential direction of the isolation column. The notch can cut off the first conductive layer while not affecting the strength of the isolation column, improving the comprehensive performance of the display panel.

[0060] Exemplarily, as Figure 9As shown, in the display panel, the adjacent and spaced first isolation column 11 and the second isolation column 12 are respectively provided with a notch 13 located on the substrate 14, and the cross-sectional shape of the notch 13 arranged on the first isolation column 11 in the direction perpendicular to the thickness of the substrate 10 is an arc-shaped, and the angle between the arc and the plane where the substrate 14 is located is a climbing angle α, and the cross-sectional shape of the notch 13 arranged on the second isolation column 12 in the direction perpendicular to the thickness of the substrate 10 is a fold line-shaped, and the angle between the fold line and the plane where the substrate 14 is located is a climbing angle α, and the climbing angle α is an acute angle, and is greater than or equal to 30° and less than or equal to 90°. In addition, the notches 13 arranged on the second isolation column 12 arranged away from the hole-digging area DA are arranged at intervals, and the second isolation column 12 arranged close to the hole-digging area DA, and the notches 13 on the first isolation column 11 located between the two second isolation columns 12 are arranged continuously.

[0061] It should be understood that the cross-sectional view of the notch in the display panel in the direction of the substrate thickness is not limited to the above-mentioned exemplary structure, but may also be other shapes such as an inverted "U" shape, and the shapes of the notches on the same isolation column may be equal or unequal. These can all be designed according to the actual production process and the functional requirements of the display panel, and will not be elaborated here.

[0062] In addition to improving the black spot problem of the display panel and improving the quality of the display panel, in some embodiments, a limiting groove is provided on the side wall of the test wire and / or the blocking wire. The design of the limiting groove improves the firmness between some new film layers set away from the substrate in the first conductive layer and the second conductive layer, thereby improving the quality of the display panel. In at least one embodiment, the test wire and / or the blocking wire includes at least two sub-metal layers, and the materials of at least two sub-metal layers are different. In at least one embodiment, the test wire and / or the blocking wire includes three sub-metal layers stacked in sequence, and the limiting groove is provided in the sub-metal layer of the middle layer.

[0063] For example, Figure 8 and Figure 10As shown, the test lead 31 includes a first sub-metal layer 311, a second sub-metal layer 312 and a third sub-metal layer 313 stacked in sequence, and the first sub-metal layer 311 and the third sub-metal layer 313 are made of the same material, for example, titanium material, and the second sub-metal layer 312 is made of a different material from the first and third sub-metal layers, for example, aluminum material. The corrosion resistance of aluminum material is lower than that of titanium material, so in the same corrosion operation, the first sub-metal layer 311 and the third sub-metal layer 313 are corroded to the same extent, while the corrosion degree of the second sub-metal layer 312 is greater than that of the first sub-metal layer 311 and the third sub-metal layer 313, thereby forming a first limiting groove 314 on the side wall of the test lead 31. Similarly, the blocking guide includes a fourth sub-metal layer 321, a fifth sub-metal layer 322 and a sixth sub-metal layer 323 stacked in sequence. The fourth sub-metal layer 321 and the sixth sub-metal layer 323 are respectively made of titanium materials, and the fifth sub-metal layer 322 is made of aluminum material. The different corrosion resistance of different sub-metal layers is utilized to form a second limiting groove 324 on the side wall of the blocking wire 32.

[0064] In some embodiments, the display panel further includes an encapsulation layer located on the side of the first conductive layer away from the substrate, the encapsulation layer includes an inorganic film layer, and the inorganic film layer is filled in the limiting groove and / or the gap. The inorganic film layer in the encapsulation layer fills the limiting groove and / or the gap of the test wire and / or the blocking wire, which can not only enhance the encapsulation effect, but also further prevent the invasion of water and oxygen, improve the water and oxygen resistance of the display panel, and can also improve the second inorganic film layer of the encapsulation layer and the free ions in other film layers in the display panel through the limiting effect of the limiting groove, such as ions such as potassium ions and sodium ions leaked at the cross section of the polarizer, and the problem of easy falling off after electrochemical reaction, thereby improving the display effect and service life of the display panel.

[0065] For example, Figure 6 and Figure 11 As shown, the display panel further includes an encapsulation layer 40 located on the side of the first conductive layer 20 away from the substrate 10. The encapsulation layer 40 includes a first inorganic film layer 41, an organic film layer 42, and a second inorganic film layer 43 stacked in sequence, and the first inorganic film layer 41 fills the first limiting groove 314, the second limiting groove 324, and the gap 13 on the side wall of the first isolation column and the second isolation column 12.

[0066] In some embodiments, Figure 6 and Figure 11 As shown, the display panel further includes a polarizer 50 located on a side of the encapsulation layer 40 away from the substrate 10. In at least one embodiment, the display panel is a flexible display panel, and no cover plate is provided between the encapsulation layer 40 and the polarizer 50 or on the side of the polarizer 50 away from the encapsulation layer 40, thereby improving the flexibility of the polarizer 50 and further improving the flexibility of the display panel.

[0067] The embodiment of the present application also provides a display device. The display device includes a display panel of any one of the above embodiments.

[0068] For example, the display device provided by at least one embodiment of the present application further includes a touch sensor, a touch chip, and a flexible circuit board for realizing touch. In order to realize the thinning of the touch display device, the touch sensor is disposed in the encapsulation layer, the touch chip is disposed on the flexible circuit board, and signals are transmitted to the touch sensor through touch signal lines.

[0069] For example, the display device in the embodiment of the present application can be any product or component with a display function, such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, a circular wearable product, etc.

[0070] As mentioned above, the above are only specific embodiments of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art can think of changes or substitutions within the technical scope disclosed by the present application, and all of them should be covered by the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A display panel, characterized in that, include: A substrate, divided into a display area, a hole-digging area, and a non-display area between the display area and the hole-digging area, wherein the substrate comprises at least one isolation column, the isolation column is located in the non-display area and surrounds the hole-digging area; A first conductive layer is located in the display area and the non-display area and is disposed on a side of the isolation column away from the substrate; A second conductive layer, located in the non-display area and disposed between the substrate and the first conductive layer, the second conductive layer comprising at least one test wire disposed around the hole-digging area; The test wire is provided on a side of at least one of the isolation columns facing away from the substrate, and a notch is provided on at least one side wall of the isolation column provided with the test wire, and the first conductive layer is disconnected at the notch.

2. The display panel according to claim 1, wherein The base also includes a substrate and a functional film layer located on the substrate, and the notch is arranged on the substrate and / or the functional film layer.

3. The display panel according to claim 2, wherein The functional film layer includes at least two sub-film layers, and the notch is arranged on at least one of the sub-film layers.

4. The display panel according to claim 3, wherein The functional film layer comprises a buffer layer, a gate insulating layer, a capacitor insulating layer, an interlayer dielectric layer and a passivation layer which are sequentially stacked in a thickness direction perpendicular to the substrate.

5. The display panel according to claim 2, wherein The cross-sectional shape of the notch in a direction perpendicular to the thickness of the substrate is an arc shape and / or a broken line shape.

6. The display panel according to claim 5, wherein The climbing angle formed by the notch is 30° to 90°.

7. The display panel according to claim 2, characterized in that, The notches are arranged continuously or at intervals in the circumferential direction of the isolation column.

8. The display panel according to any one of claims 1-7, characterized in that, The second conductive layer further includes at least one blocking wire arranged around the hole area, the blocking wire is arranged on a side of at least one of the isolation columns away from the substrate, and the isolation column with the blocking wire is spaced apart from the isolation column with the test wire.

9. The display panel according to claim 8, wherein The notch is provided on at least one side wall of the isolation column provided with the blocking wire.

10. The display panel according to claim 8, wherein, The second conductive layer includes a plurality of the test wires, and the blocking wire is located between two of the test wires.

11. The display panel according to claim 8, wherein, A limiting groove is provided on the side wall of the test wire and / or the blocking wire.

12. The display panel according to claim 11, wherein The test wire and / or the blocking wire includes at least two sub-metal layers, and the materials of the at least two sub-metal layers are different.

13. The display panel according to claim 12, wherein The test wire and / or the blocking wire comprises three sub-metal layers stacked in sequence, and the limiting groove is arranged in the sub-metal layer of the middle layer.

14. The display panel according to claim 11, wherein, It also includes a packaging layer located on a side of the first conductive layer away from the substrate, the packaging layer includes an inorganic film layer, and the inorganic film layer is filled in the limiting groove and / or the gap.

15. A display device, characterized in that, A display panel comprising any one of claims 1-14.

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