A low-temperature plasma concentration soft measurement method and device based on emission spectrum
By employing a low-temperature plasma concentration soft measurement method based on emission spectra, utilizing spectral data preprocessing and mass spectrometry data reconstruction, combined with partial least squares regression model and process parameter correction, an inert gas soft measurement model is established. This enables rapid, real-time, and in-situ concentration detection of multiple components in plasma mixtures, solving the problems of difficult characteristic spectral line extraction and slow detection speed in existing technologies.
CN115524323BActive Publication Date: 2026-07-10ZHEJIANG UNIV
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ZHEJIANG UNIV
- Filing Date
- 2022-09-01
- Publication Date
- 2026-07-10
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Figure CN115524323B_ABST
Abstract
The application discloses a low-temperature plasma concentration soft measurement method and device based on emission spectrum, and the method comprises the following steps: a soft measurement model establishing and calibrating stage, a soft measurement model correction stage under general working conditions, and a model actual application and calibration stage; data is collected by a mass spectrometer and a spectrometer and is pretreated, the pretreated data is used for training a partial least square model with dimension reduction capacity, the model is corrected based on an instrument sampling mechanism, and finally the soft measurement model is applied to a general reactor by means of a method for calibrating the model by using inert gas.
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