Pattern recognition device and method for manufacturing the same, color filter substrate and method for manufacturing the same

Abstract

A texture recognition device and its manufacturing method, a color filter substrate and its manufacturing method. The texture recognition device has a touch side and includes a light source array, a light valve structure, and an image sensor array. The light valve structure is disposed on a side of the light source array close to the touch side and includes a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, configured to be able to respond to a control signal to control a first area to be in a light-transmitting state, so as to allow the light emitted by the light source array to pass through the first area in the light-transmitting state to form a first photosensitive light source. The second substrate of the light valve structure is closer to the touch side than the first substrate, and the image sensor array is disposed on the second substrate. The texture recognition device can form a photosensitive light source in a corresponding area through the light valve structure to achieve the function of under-screen texture recognition.

Description

Technical Field

[0001] Embodiments of the present disclosure relate to a texture recognition device and a manufacturing method thereof, a color filter substrate and a manufacturing method thereof. Background Art

[0002] With the increasing popularity of mobile terminals, more and more users use mobile terminals for operations such as identity authentication and electronic payment. Due to the uniqueness of skin textures such as fingerprint patterns or palm print patterns, fingerprint recognition technology combined with optical imaging has gradually been adopted by mobile electronic devices for identity authentication, electronic payment, etc. How to design a more optimized texture recognition device is a focus issue in this field. Summary of the Invention

[0003] At least one embodiment of the present disclosure provides a texture recognition device having a touch side, including a light source array, a light valve structure, and an image sensor array; the light valve structure is disposed on a side of the light source array close to the touch side, and includes a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, configured to be capable of responding to a control signal to control a first region to be in a light-transmitting state, so as to allow light emitted by the light source array to pass through the first region to form a first photosensitive light source in the light-transmitting state; the image sensor array is configured to receive light emitted from the light source array and reflected by a texture to the image sensor array for texture acquisition; wherein, the second substrate of the light valve structure is closer to the touch side than the first substrate, and the image sensor array is disposed on the second substrate.

[0004] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the light valve structure is a liquid crystal panel, the first substrate is an array substrate, the second substrate is a counter substrate, and the light adjustment layer includes a liquid crystal layer; the liquid crystal panel includes a pixel array, the pixel array includes a plurality of pixel units, the control signal includes a scan signal and a data signal, each pixel unit includes at least one sub-pixel unit, and each sub-pixel unit is configured to control a light-transmitting state in a pixel region corresponding to the sub-pixel unit according to the scan signal and the data signal.

[0005] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the image sensor array includes a plurality of image sensors, and each of the plurality of image sensors is disposed between pixel regions corresponding to adjacent pixel units.

[0006] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the image sensor array includes a plurality of image sensors, and each of the plurality of image sensors is disposed between pixel regions corresponding to adjacent sub-pixel units.

[0007] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the counter substrate includes a substrate and a black matrix layer, and the image sensor array is disposed between the substrate and the black matrix layer. Wherein, the side of the substrate away from the image sensor array is closer to the touch side.

[0008] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the black matrix layer includes an occlusion area and a plurality of opening areas respectively exposing a plurality of the sub-pixel units. A color film pattern is disposed in the opening areas, and the color film pattern is used to form monochromatic light. The orthographic projection of each of the plurality of image sensors on the substrate is located within the orthographic projection of the occlusion area on the substrate.

[0009] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the counter substrate further includes a filter pattern configured to filter light with a wavelength greater than 600 nm; each of the image sensors includes a photosensitive element and a switching element. The filter pattern is disposed between the substrate and the photosensitive element, and the orthographic projection of the filter pattern on the substrate at least partially overlaps with the orthographic projection of the photosensitive element on the substrate.

[0010] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the light source array is also multiplexed as the backlight source of the light valve structure; or the texture recognition device further includes a second light source array, and the second light source array serves as the backlight source of the light valve structure.

[0011] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the light source array includes a plurality of sub-light sources and is configured to allow one or a plurality of continuously arranged sub-light sources to be lit for forming the first photosensitive light source.

[0012] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, the light valve structure is further configured to allow controlling a second area different from the first area to be in the light-transmitting state, so that the light emitted by the light source array can pass through the second area in the light-transmitting state to form a second photosensitive light source, and is configured to allow the first area and the second area to be in the light-transmitting state simultaneously or differently.

[0013] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, when the first area and the second area are simultaneously in the light-transmitting state, the imaging range of the first photosensitive light source on the image sensor array is a first ring shape, and the imaging range of the second photosensitive light source on the image sensor array is a second ring shape, and the first ring shape and the second ring shape are tangent to each other.

[0014] For example, in the texture recognition device provided by at least one embodiment of the present disclosure, when the first region and the second region are not simultaneously in the light-transmitting state, the imaging range of the first photosensitive light source on the image sensor array is a first ring shape, and the imaging range of the second photosensitive light source on the image sensor array is a second ring shape, and the second ring shape covers the center of the first ring shape.

[0015] At least one embodiment of the present disclosure provides a method for manufacturing a texture recognition device, wherein the texture recognition device has a touch side, and the manufacturing method includes: providing a light source array; providing a light valve structure on a side of the light source array close to the touch side, the light valve structure including a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, and the light valve structure being configured to be capable of responding to a control signal to control the first region to be in a light-transmitting state, so as to allow the light emitted by the light source array to pass through the first region to form a first photosensitive light source in the light-transmitting state; providing an image sensor array, the image sensor array being configured to receive the light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition; wherein, the second substrate is closer to the touch side than the first substrate, and the image sensor array is formed on the second substrate.

[0016] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, the light valve structure is a liquid crystal panel, the first substrate is an array substrate, the second substrate is a counter substrate, and the light adjustment layer includes a liquid crystal layer; providing the light valve structure includes forming the counter substrate of the liquid crystal panel, including: providing a substrate, forming an image sensor array on the substrate, and forming a black matrix layer on a side of the image sensor array away from the substrate.

[0017] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, forming the black matrix layer includes: forming an occlusion region and a plurality of opening regions respectively exposing a plurality of sub-pixel units of the liquid crystal panel, wherein the occlusion region is formed to cover the image sensor array.

[0018] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, forming the counter substrate of the liquid crystal panel further includes: forming a color filter layer; wherein, the color filter layer is formed on the same layer as the black matrix layer, and the color filter layer includes a plurality of color filter patterns arranged in an array, and the plurality of color filter patterns are respectively formed in the plurality of opening regions.

[0019] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, the image sensor array includes a plurality of image sensors, and each image sensor includes a photosensitive element and a switching element. Forming the image sensor includes: forming the switching element on the substrate and forming the photosensitive element on the switching element.

[0020] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, the switching element is a single-crystalline silicon thin-film transistor, an oxide semiconductor thin-film transistor, or a polycrystalline silicon thin-film transistor.

[0021] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, forming the photosensitive element on the switching element includes: sequentially forming a first electrode, a semiconductor layer, and a second electrode of the photosensitive element. The first electrode is electrically connected to the source or drain of the switching element. A first insulating layer is formed to cover the switching element. The first insulating layer includes a first opening that exposes the second electrode. A first trace is formed on the first insulating layer, and the first trace is electrically connected to the second electrode through the first opening.

[0022] For example, the manufacturing method provided by at least one embodiment of the present disclosure further includes: forming a shielding layer on the photosensitive element.

[0023] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, forming the switching element includes: sequentially forming a gate, a gate insulating layer, an active layer, a source, and a drain of the switching transistor on the substrate. A second insulating layer is formed. The second insulating layer includes a second opening that exposes the source or the drain. The first electrode of the photosensitive element is electrically connected to the source or the drain through the second opening.

[0024] For example, in the manufacturing method provided by at least one embodiment of the present disclosure, forming the switching element includes: sequentially forming a light-shielding pattern and a buffer layer on the substrate, where the buffer layer covers the light-shielding pattern. An active layer, a gate insulating layer, a gate, an interlayer insulating layer, a source, and a drain of the switching transistor are sequentially formed on the buffer layer. The gate insulating layer and the interlayer insulating layer have a first via and a second via that expose the active layer. The source and the drain are electrically connected to the active layer through the first via and the second via, respectively, and at least a part of the orthographic projection of the active layer on the substrate overlaps with the orthographic projection of the light-shielding pattern on the substrate. The first electrode of the photosensitive element is electrically connected to the source or the drain.

[0025] At least one embodiment of the present disclosure provides a color filter substrate, which includes a substrate, a color filter layer, and an image sensor array; the image sensor array is configured to receive light emitted from a light source array and reflected by a texture to the image sensor array for texture acquisition; the color filter layer includes a plurality of color filter patterns arranged in an array, and the image sensor array includes a plurality of image sensors, and the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the interval between adjacent color filter patterns on the substrate.

[0026] For example, the color filter substrate provided by at least one embodiment of the present disclosure further includes a black matrix layer; the black matrix layer is disposed on the same layer as the color filter layer, the black matrix layer includes an occlusion area and a plurality of opening areas arranged in an array, and the plurality of color filter patterns are respectively located in the plurality of opening areas, so that the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the occlusion area on the substrate; the image sensor array is disposed between the substrate and the occlusion area.

[0027] At least one embodiment of the present disclosure provides a method for manufacturing a color filter substrate, including: providing a substrate; forming an image sensor array, the image sensor array is configured to receive light emitted from a light source array and reflected by a texture to the image sensor array for texture acquisition, and the image sensor array includes a plurality of image sensors; forming a color filter layer, the color filter layer includes a plurality of color filter patterns arranged in an array; the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the interval between adjacent color filter patterns on the substrate.

[0028] For example, the method for manufacturing a color filter substrate provided by at least one embodiment of the present disclosure may further include forming a black matrix layer; the black matrix layer is formed on the same layer as the color filter layer, the black matrix layer includes an occlusion area and a plurality of opening areas arranged in an array, and the plurality of color filter patterns are respectively formed in the plurality of opening areas, so that the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the occlusion area on the substrate; the image sensor array is formed between the substrate and the occlusion area. Description of the Drawings

[0029] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure and do not limit the present disclosure.

[0030] Figure 1A It is a schematic diagram of fingerprint imaging principle;

[0031] Figure 1B It is a schematic diagram of the imaging range of a point light source;

[0032] Figure 1C Schematic diagram of the imaging range of a line light source

[0033] Figure 2 Cross-sectional schematic diagram of a texture recognition device provided by at least one embodiment of the present disclosure

[0034] Figure 3A Schematic diagram of a texture recognition device provided by at least one embodiment of the present disclosure being touched by a texture

[0035] Figure 3B Schematic diagram of a texture recognition device provided by at least one embodiment of the present disclosure forming a photosensitive light source

[0036] Figure 4 Cross-sectional schematic diagram of a liquid crystal display device provided by at least one embodiment of the present disclosure

[0037] Figure 5 Another cross-sectional schematic diagram of a liquid crystal display device provided by at least one embodiment of the present disclosure

[0038] Figure 6A Schematic diagram of the arrangement of a pixel array and an image sensor in a liquid crystal display device provided by at least one embodiment of the present disclosure

[0039] Figure 6B Another schematic diagram of the arrangement of a pixel array and an image sensor in a liquid crystal display device provided by at least one embodiment of the present disclosure

[0040] Figure 7A Schematic diagram of the structure and connection relationship of an image sensor in a texture recognition device provided by at least one embodiment of the present disclosure

[0041] Figure 7B Schematic diagram of the structure and connection relationship of another image sensor in a texture recognition device provided by at least one embodiment of the present disclosure

[0042] Figure 8 Schematic diagram of the structure of an image sensor provided by at least one embodiment of the present disclosure

[0043] Figure 9 Schematic diagram of the structure of another image sensor provided by at least one embodiment of the present disclosure

[0044] Figure 10A Schematic diagram of a liquid crystal display device provided by at least one embodiment of the present disclosure forming a photosensitive light source

[0045] Figure 10B For Figure 10A Schematic diagram of the imaging range of the photosensitive light source in

[0046] Figure 10C Another schematic diagram of the imaging range of the photosensitive light source in Figure 10A ;

[0047] Figure 11 Schematic diagram of the photosensitive light sources formed in an array arrangement by the texture recognition device provided by at least one embodiment of the present disclosure;

[0048] Figure 12 Manufacturing flowchart of the counter substrate provided by at least one embodiment of the present disclosure;

[0049] Figure 13 Schematic diagram of the color filter substrate provided by at least one embodiment of the present disclosure;

[0050] Figure 14 Manufacturing flowchart of the color filter substrate provided by at least one embodiment of the present disclosure. Detailed implementation manners

[0051] To make the objectives, technical solutions, and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. Apparently, the described embodiments are some, but not all, of the embodiments of the present disclosure. All other embodiments obtained by those of ordinary skill in the art based on the described embodiments of the present disclosure without creative efforts shall fall within the scope of protection of the present disclosure.

[0052] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure shall have the ordinary meanings understood by those of ordinary skill in the art to which the present disclosure pertains. The "first", "second", and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are only used to distinguish different components. The terms such as "include" or "comprise" mean that the elements or items appearing before the term cover the elements or items listed after the term and their equivalents, without excluding other elements or items. The terms such as "connect" or "couple" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The terms such as "upper", "lower", "left", and "right" are only used to represent relative positional relationships, and when the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0053] Currently, narrow bezels are gradually becoming the mainstream in the design and manufacturing of display devices, especially for portable display devices such as mobile phones. One of the means to achieve narrow bezels is to integrate an image sensor with fingerprint recognition function into the display device, implement the under-screen fingerprint recognition method, increase the display area of the display device, and thus increase the screen-to-body ratio.

[0054] For example, a point light source, a line light source, or a light source with a certain pattern can be used as the photosensitive light source of the image sensor for fingerprint recognition. Moreover, there are various ways to arrange the light source and the image sensor. For example, the light source can be arranged on the side of the image sensor close to the fingerprint touch, or the light source and the image sensor can be arranged in the same plane, or the light source can also be arranged on the side of the image sensor far from the fingerprint touch. The arrangement of the light source and the image sensor can be selected according to different requirements.

[0055] Taking a point light source as the photosensitive light source of the image sensor and the light source being arranged on the side of the image sensor close to the fingerprint touch as an example, the fingerprint recognition principle will be introduced below, but this does not limit the embodiments of the present disclosure.

[0056] In a reflective optical fingerprint recognition device, during the fingerprint recognition process, as Figure 1A shown, when the point light source L1 emits light, the light it emits irradiates the fingerprint pressing interface (such as the outer surface of the glass screen) at different angles. Due to the total reflection of the fingerprint pressing interface, the part of the light with an incident angle greater than or equal to the critical angle θ of total reflection will undergo total reflection, resulting in this part of the light not being able to exit from the fingerprint pressing interface, thereby generating a total reflection area. Correspondingly, the part of the light with an incident angle less than the critical angle θ of total reflection exits from the fingerprint pressing interface. Therefore, the light reflected by the total reflection area can be used to collect the texture image. For example, a clear texture image is formed at B1 on the fingerprint imaging interface where the image sensor is located, and this texture image corresponds to the part of the fingerprint at F1, F1 is the total reflection area, and B1 is the imaging area.

[0057] Specifically, when, for example, the fingerprint of the user's finger presses on the total reflection area F1, the ridges of the fingerprint touch the surface of the total reflection area F1. Therefore, the total reflection condition at the position corresponding to the ridges of the fingerprint is destroyed, and thus the light will exit at this corresponding position, changing the original reflection path. While the valleys of the fingerprint do not touch the surface of the total reflection area F1, so the total reflection condition at the position corresponding to the valleys of the fingerprint is not destroyed, and thus the light will still be totally reflected at this corresponding position, keeping the original reflection path unchanged. In this way, due to the different effects of the valleys and ridges of the fingerprint on the total reflection condition, the light incident on the fingerprint imaging interface forms a light and dark textured image at different positions.

[0058] In addition, due to interference caused by light emitted from the fingerprint pressing interface and reflected by fingerprints or the like, or light emitted from the light source being reflected by other functional layers to the fingerprint imaging interface before reaching the fingerprint pressing interface, the area marked by A1 on the fingerprint imaging interface becomes an area where detection is invalid, and no effective texture image can be formed in this area. In the invalid area A1, the part of the light emitted by the light source L1 that is reflected by other functional layers to the fingerprint imaging interface before reaching the fingerprint pressing interface and the part that is reflected almost perpendicularly by the fingerprint pressing interface have relatively high brightness and are basically located at the center of the invalid area A1, thus forming a high-brightness area. Since the light brightness in this high-brightness area is relatively high, a large photoelectric signal is generated in the corresponding part of the image sensing array, which easily forms an afterimage, and can also be called an afterimage area.

[0059] For example, Figure 1B shows an imaging range diagram of a point light source. As Figure 1B shown, in the photosensitive range of the point light source, the effective imaging range is annular, that is, in Figure 1B , the annular area between the inner circle 11 and the outer circle 12 is the effective imaging range, corresponding to Figure 1A the imaging area B1 corresponding to the total reflection area F1 in Figure 1A ; the area within the inner circle 11 of this annulus (hereinafter referred to as the ring center 10) is the invalid imaging area, corresponding to

[0060] the invalid area A1 in Figure 1C ; a partial area (shaded area) 13 inside the ring center 10 is the high-brightness area (afterimage area) that easily causes afterimages in the image sensor array during the imaging process. Figure 1C Similarly,

[0061] shows an imaging range diagram of a line light source. As

[0062] shown, for a line light source, the effective imaging range is a racetrack-shaped annular area or an oblong annular area between the inner circle 21 and the outer circle 22, the ring center 20 is the invalid imaging area, and a partial area (shaded area) 23 inside the ring center 10 is the high-brightness area (afterimage area) that easily causes afterimages in the image sensor array during the imaging process.

[0061] Currently, the display panels of display devices (such as mobile phones, etc.) that adopt under-screen fingerprint recognition are usually self-emitting display panels such as organic light-emitting diode (OLED) display panels and quantum dot light-emitting diode (QLED) display panels. For non-self-emitting display panels such as liquid crystal display panels (LCDs) that rely on light emitted by a backlight for display, due to the differences in their structures and display methods, the setting method of the image sensor also needs to be adjusted accordingly.

[0062] At least one embodiment of the present disclosure provides a texture recognition device, which has a touch side and includes a light source array, a light valve structure, and an image sensor array; the light valve structure is disposed on a side of the light source array close to the touch side and includes a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, and is configured to be able to respond to a control signal to control a first region to be in a light-transmitting state, so as to allow the light emitted by the light source array to pass through the first region to form a first photosensitive light source in the light-transmitting state; the image sensor array is configured to receive the light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition; wherein, the second substrate of the light valve structure is closer to the touch side than the first substrate, and the image sensor array is disposed on the second substrate.

[0063] At least one embodiment of the present disclosure provides a color filter substrate, which includes a substrate, a color filter layer, and an image sensor array; the image sensor array is configured to receive the light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition; the color filter layer includes a plurality of color filter patterns arranged in an array, and the image sensor array includes a plurality of image sensors, and the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the interval between adjacent color filter patterns on the substrate.

[0064] Next, the texture recognition device and its manufacturing method, and the color filter substrate and its manufacturing method provided by the embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

[0065] For example, Figure 2 is a cross-sectional schematic diagram of a texture recognition device provided by at least one embodiment of the present disclosure. As Figure 2 shown, the texture recognition device 100 includes a light source array, an image sensor array, and a light valve structure. The light source array includes a plurality of sub-light sources 101, and these sub-light sources 101 are arranged in an array within a predetermined area. The image sensor array includes a plurality of image sensors 102, and these image sensors 102 are arranged in an array within a predetermined area. The image sensor array is configured to receive the light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition.

[0066] The texture recognition device 100 has a touch side 103. The light valve structure is arranged on one side of the light source array close to the touch side 103, and includes a first substrate 110, a second substrate 130, and a light adjustment layer 120 between the first substrate 110 and the second substrate 130. The light valve structure is configured to be able to respond to a control signal to control the first area to be in a light-transmitting state, so as to allow the light emitted by the light source array to pass through the first area in the light-transmitting state to form a first photosensitive light source. The second substrate 130 of the light valve structure is closer to the touch side 103 than the first substrate 110, and the image sensor array is arranged on the second substrate 130. Thus, in the manufacturing process, the manufacturing process of the image sensor array can be combined with the manufacturing process of the second substrate 130, improving the integration of the device and being more conducive to realizing a thin and light design.

[0067] For example, when an operating body with texture such as a finger touches the surface of the touch side 103 of the texture recognition device 100, the light emitted by the sub-light source 101 can be reflected by the operating body and reach the image sensor 102, and the image sensor 102 can collect the texture image of the operating body. For example, the operating body with texture can be a hand. At this time, the texture recognized by the image sensor 102 is skin texture, such as fingerprint, palm print, etc.; in addition, the operating body with texture can also be a non-biological body with certain texture, such as an object made of resin and other materials with certain texture. The embodiments of the present disclosure do not make specific limitations on this.

[0068] For example, the light valve structure can be a liquid crystal light valve, an electrochromic light valve, an electronic ink light valve, etc., which can achieve different light transmittances at different positions under control. For example, when the light valve structure is a liquid crystal light valve, the light adjustment layer 120 of the light valve structure includes a liquid crystal material, and at least one of the first substrate 110 and the second substrate 130 includes a plurality of electrodes for driving the liquid crystal material at different positions to deflect. Therefore, by applying different voltages to the electrodes, the liquid crystal material can be deflected correspondingly to change its light transmittance and realize the function of the light valve. For example, a first polarizer is arranged on the light incident side (for example, the side close to the light source array) of the liquid crystal light valve, and a second polarizer is arranged on the light exit side. The polarization directions of the first polarizer and the second polarizer are perpendicular to each other. Combining the above first polarizer and second polarizer, for example, when the molecular arrangement direction of the liquid crystal material is parallel to the light propagation direction, the corresponding position of the liquid crystal light valve is light-transmitting, and when the molecular arrangement direction of the liquid crystal material is perpendicular to the light propagation direction, the corresponding position of the liquid crystal light valve is light-blocking.

[0069] For example, when the light valve structure is an electrochromic light valve, the light modulation layer 120 of the light valve structure includes an electrochromic material, and at least one of the first substrate 110 and the second substrate 130 includes a plurality of electrodes for driving the electrochromic material at different positions to change color. Therefore, by applying different voltages to the electrodes, the electrochromic material can change color to change its light transmittance and achieve the function of the light valve. For example, the electrochromic material can transition between a transparent state and a dark state under different voltage drives. When the electrochromic material is in the transparent state, the corresponding position is light-transmissive, and when the electrochromic material is in the dark state, the corresponding position is light-opaque.

[0070] For example, when the light valve structure is an electronic ink light valve, the light modulation layer 120 of the light valve structure includes an electronic ink layer (e.g., including electronic ink microcapsules), and at least one of the first substrate 110 and the second substrate 130 includes a plurality of electrodes for driving the movement of particles (e.g., black particles) in the electronic ink layer. Therefore, by applying different voltages to the electrodes, the particles in the electronic ink can move to change the light transmittance of the electronic ink layer and achieve the function of the light valve. For example, the electronic ink layer can transition between a transparent state and a dark state under different voltage drives. When the electronic ink layer is in the transparent state, the corresponding position is light-transmissive, and when the electronic ink layer is in the dark state, the corresponding position is light-opaque.

[0071] The working process of the texture recognition device 100 is as described below. During the process of an operating body with texture such as an operator's finger touching the touch side 103 of the texture recognition device 100, as Figure 3A shown, the texture recognition device 100 starts texture acquisition. During the process of the texture recognition device 100 performing texture acquisition, as Figure 3B shown, the light valve structure responds to the control signal to control the first region 1 to be in a light-transmissive state, allowing the light emitted by the light source array to pass through the first region 1 to form the first photosensitive light source 201.

[0072] For example, in some embodiments, as Figure 2 shown, the texture recognition device 100 further includes a controller 104, which can be directly installed on the texture recognition device 100 or communicate (signal connection) with the installed texture recognition device 100 through, for example, a flexible printed circuit board (FPC). As Figure 3A and Figure 3B shown, for example, in at least one embodiment, the controller 104 can determine the position of the first region 1 according to the touch position of the texture on the touch side 103 and control the light valve structure to make the first region 1 in a light-transmissive state to provide the first photosensitive light source 201.

[0073] For example, the first photosensitive light source 201 may include one or more sub-light sources 101. For example, the controller 104 may also be configured to obtain the touch area of the texture on the touch side 103 to determine the size and quantity of the first region 1, thereby also determining the quantity of the sub-light sources 101 corresponding to the first region 1 (i.e., the quantity of the sub-light sources 101 included in the first photosensitive light source 201) and the quantity of the first photosensitive light sources 201 (detailed later). For example, the texture recognition device 100 may further include a touch control structure, and the touch position and touch area of the texture on the touch side 103 may be obtained through the touch control structure.

[0074] For example, the touch control structure may be disposed on one side of the cover plate 140 close to the image sensor array, or may also be disposed on one side of the cover plate 140 away from the image sensor array. For example, the touch control structure includes a plurality of touch control electrodes, for example, implemented as a self-capacitance type or mutual-capacitance type touch control structure. For example, when the touch control structure is of the self-capacitance type, the touch control structure includes a plurality of block-shaped touch control electrodes arranged in an array; when the touch control structure is of the mutual-capacitance type, the touch control structure includes a plurality of strip-shaped driving electrodes and sensing electrodes arranged crosswise. The embodiments of the present disclosure do not make specific limitations on the form and structure of the touch control structure.

[0075] For example, referring to Figure 2 , the texture recognition device 100 may further include a cover plate 140. The cover plate 140 is, for example, a glass cover plate, which can encapsulate and protect the texture recognition device 100. For example, the surface of the cover plate 140 is the touch side 103. When an operating body with texture such as a finger touches the touch side 103 of the texture recognition device 100, the light emitted by the sub-light source 101 can be reflected by the operating body and reach the image sensor 102, and the image sensor 102 can collect the texture image of the operating body.

[0076] For example, in some embodiments, as Figure 4 shown, the light valve structure is a liquid crystal panel. At this time, the texture recognition device 100 is implemented as a liquid crystal display device. Hereinafter, the liquid crystal panel is taken as an example of the light valve structure for description, but the embodiments of the present disclosure do not limit this.

[0077] As Figure 4 shown, in the liquid crystal panel, the first substrate 110 is an array substrate, the second substrate 130 is a counter substrate, and the light modulation layer 120 includes a liquid crystal layer, and the liquid crystal layer includes a liquid crystal material 121. The liquid crystal panel includes a pixel array. For example, Figure 6A shows a planar schematic diagram of a pixel array. As Figure 6AAs shown, the pixel array includes a plurality of pixel units, each pixel unit including at least one sub-pixel unit (shown as three sub-pixel units R, G, and B in the figure). The control signals include a scan signal and a data signal, and each sub-pixel unit is configured to control the light-transmitting state in the pixel region corresponding to the sub-pixel unit according to the scan signal and the data signal. For example, the first region 1 includes the pixel regions 122 corresponding to at least one sub-pixel unit.

[0078] For example, in some embodiments, among the plurality of image sensors 102 included in the image sensor array, each image sensor 102 is disposed between the pixel regions 122 corresponding to adjacent pixel units.

[0079] For example, in some examples, the distance between the pixel regions 122 corresponding to adjacent rows of pixel units is greater than the distance between the pixel regions 122 corresponding to adjacent columns of pixel units. At this time, for the convenience of device layout, the image sensor 102 can be disposed between the pixel regions 122 corresponding to adjacent rows of pixel units. For example, as Figure 6A shown, each pixel unit of the liquid crystal panel includes a plurality of sub-pixel units (shown as three sub-pixel units R, G, and B in the figure). Each image sensor 102 is disposed between the pixel regions 122 corresponding to adjacent rows of pixel units, and one image sensor 102 is disposed between every two adjacent pixel regions 122 corresponding to pixel units (at this time, the pixel region corresponding to each pixel unit includes the pixel regions 122 corresponding to the three sub-pixel units R, G, and B).

[0080] For example, in some embodiments, among the plurality of image sensors 102 included in the image sensor array, each image sensor 102 is disposed between the pixel regions 122 corresponding to adjacent sub-pixel units.

[0081] For example, in some examples, each pixel unit includes a red sub-pixel unit R, a green sub-pixel unit G, and a blue sub-pixel unit B. At this time, the image sensor can be disposed between the pixel regions 122 corresponding to two adjacent red sub-pixel units R, or between the pixel regions 122 corresponding to two adjacent green sub-pixel units G, or between the pixel regions 122 corresponding to two adjacent blue sub-pixel units B.

[0082] For example, in one example, compared with the red sub-pixel unit R and the green sub-pixel unit G, the change of the blue sub-pixel unit B has the least influence on the display effect of the liquid crystal panel. At this time, the image sensor 102 can be disposed between the pixel regions 122 corresponding to the blue sub-pixel units B of adjacent pixel units. For example, as Figure 6BAs shown, an image sensor 102 is disposed between the pixel regions 122 corresponding to the blue sub-pixel units B of every two adjacent pixel units. In this case, the effective light-emitting area of the blue sub-pixel unit B can be designed to be relatively small, or during the manufacturing process, when forming the image sensor 102 between the pixel regions 122 corresponding to the blue sub-pixel units B of adjacent pixel units, even if it affects the structural arrangement of the blue sub-pixel unit B, it will not affect the display effect of the liquid crystal panel.

[0083] For example, in some examples, the image sensor 102 can also be disposed between the pixel regions 122 corresponding to two adjacent columns of pixel units, or between the pixel regions 122 corresponding to two adjacent columns of sub-pixel units. For example, in some examples, one row of image sensors can be disposed between the pixel regions 122 corresponding to two adjacent rows of pixel units, or two rows of image sensors can be disposed, or image sensors may not be disposed between the pixel regions 122 corresponding to some adjacent two rows of pixel units. The present disclosure does not specifically limit the number of image sensors disposed, the arrangement method, etc.

[0084] In addition, it should be noted that the above definitions of rows and columns can be interchanged. For example, when the liquid crystal panel in the figure rotates within its plane, the rows and columns of the pixel array also change.

[0085] For example, in some embodiments, as Figure 4 shown, the counter substrate includes a substrate 131 and a black matrix layer 132. The image sensor array is disposed between the substrate 131 and the black matrix layer 132, and the side of the substrate 131 away from the image sensor array (shown as the upper side in the figure) is closer to the touch side 103. Or, in some embodiments, the image sensor array can also be disposed on the side of the substrate away from the black matrix layer.

[0086] For example, the black matrix layer 132 includes an occlusion region 132A and a plurality of opening regions 132B that respectively expose a plurality of sub-pixel units. Color film patterns 132C are disposed in the opening regions 132B, and the color film patterns 132C are used to form monochromatic light, such as red light, green light, or blue light, etc., so as to form sub-pixel units that can emit different colors of light. For example, the orthographic projection of each image sensor 102 on the substrate 131 is located within the orthographic projection of the occlusion region 132A on the substrate 131. Thus, the arrangement of the image sensor 102 will not affect the display effect of the liquid crystal display device, and the occlusion region 132A can also occlude part of the light emitted from the light source array to prevent the light emitted from the light source array from directly entering the image sensor 102 and affecting the acquisition of the texture pattern.

[0087] It should be noted that, in the embodiments of the present disclosure, a black matrix layer may not be provided on the counter substrate, or a color filter layer may not be provided, or neither the black matrix layer nor the color filter layer may be provided. Correspondingly, a black matrix is formed on the array substrate, or a color filter layer is further formed, thereby obtaining a color filter on array (COA) array substrate. At this time, the image sensor may be disposed in the non-pixel region of the counter substrate, for example, between the pixel regions corresponding to adjacent pixel units or between the pixel regions corresponding to adjacent sub-pixel units, for example, corresponding to the black matrix formed on the array substrate. The above settings can all achieve the function of in-screen texture recognition without affecting the display effect of the liquid crystal display device.

[0088] For example, in some embodiments, the light source array is also multiplexed as the backlight of the light valve structure. For example, when the light valve structure is a liquid crystal panel, as Figure 4 shown, the liquid crystal display device further includes a backlight 170, and the backlight 170 includes a plurality of second sub-light sources 171 arranged in an array. At this time, the plurality of second sub-light sources 171 arranged in an array are multiplexed as the sub-light sources 101 of the light source array. Thereby, the structure of the liquid crystal display device can be simplified.

[0089] For example, in some other embodiments, the texture recognition device further includes a second light source array, and the second light source array is used as the backlight of the light valve structure. For example, when the light valve structure is a liquid crystal panel, as Figure 5 shown, the liquid crystal display device further includes a backlight 180, and the backlight 180 includes a plurality of second sub-light sources 181 arranged in an array. At this time, the backlight 180 is used to provide backlight for the liquid crystal display device for display, and the light source array is used to provide photosensitive light sources for the liquid crystal display device for texture recognition.

[0090] For example, the backlight 170 / 180 is disposed on the non-display side of the liquid crystal panel to provide a planar light source for the liquid crystal panel. For example, the backlight 170 / 180 is a direct-lit backlight, and may further include a diffusion plate (not shown) as required. After the light emitted by the second sub-light sources 171 / 181 is homogenized by the diffusion plate, it is then incident into the liquid crystal panel for display.

[0091] For example, the second sub-light sources 171 / 181 may be light-emitting diodes (LEDs). For example, in the backlight 170 / 180, a plurality of second sub-light sources 171 / 181 are arranged in an array and can be controlled in regions or independently. For example, the direct-lit backlight can be controlled by combining local dimming technology (LD), thereby improving the display quality of the display device. The local dimming technology divides the entire backlight into multiple independently drivable backlight zones, each backlight zone including one or more LEDs. According to the gray levels required to be displayed in different parts of the display screen, the drive current of the LEDs in the backlight zones corresponding to these parts is automatically adjusted, realizing the individual adjustment of the brightness of each zone in the backlight unit, thereby improving the contrast of the display screen. For example, the local dimming of the backlight can be achieved through a control circuit.

[0092] For example, the multiple sub-light sources 101 of the light source array may also be light-emitting diodes (LEDs), and the multiple sub-light sources 101 may also be controlled in regions or independently. For example, the emission state of the multiple sub-light sources 101 of the light source array can also be controlled by combining local dimming technology (LD), thereby controlling the light source array to provide a photosensitive light source in a certain shape, such as dot-shaped, line-shaped, or patterned. For example, the light source array is configured to allow one or a plurality of continuously arranged sub-light sources 101 to be lit for forming a first photosensitive light source.

[0093] It should be noted that in addition to the pixel unit array, the liquid crystal panel may also include other functional structures, for example. Figure 4 and Figure 5 As shown, the array substrate includes a second substrate 111 and a driving circuit layer 112 on the second substrate 111. The driving circuit layer 112 includes driving circuits for driving each pixel unit and signal lines (including gate lines, data lines, detection lines, etc.) for providing electrical signals (including scan signals, data signals, detection signals, etc.). For example, the array substrate further includes a first polarizer 160 disposed on the side of the second substrate 111 away from the driving circuit layer 112. The counter substrate further includes a second polarizer 150 disposed on the side of the substrate 131 away from the image sensor. The polarization directions of the first polarizer 160 and the second polarizer 150 are perpendicular to each other. The liquid crystal material of the liquid crystal layer deflects under the drive of an electric field and controls the light transmittance in cooperation with the first polarizer 160 and the second polarizer 150, thereby realizing gray-scale display. For example, the counter substrate further includes an insulating layer 133 disposed between the image sensor array and the black matrix layer 132 and spacers 134 disposed on the side of the black matrix layer 132 close to the liquid crystal layer, etc. The embodiments of the present disclosure do not specifically limit other structures of the liquid crystal panel.

[0094] For example, the specific structure and working process of the image sensor 102 are described as follows. For example, Figure 7A shows the structure and circuit connection relationship of an exemplary image sensor. As Figure 7A shown, each image sensor 102 includes a photosensitive element 1026 and a switching element 1024. In some examples, the image sensor 102 may further include a capacitor 1029. The first end (anode end) 1027 of the photosensitive element 1026 is connected to the bias line BL, the second end (cathode end) 1028 of the photosensitive element 1026 is connected to the first electrode of the switching element 1024, the second electrode of the switching element 1024 is connected to the signal readout line RL, the control electrode G of the switching element 1024 is connected to the scan signal for the image sensor array, and the readout line RL is connected to the readout integrated circuit ROIC. The first pole of the capacitor 1029 is electrically connected to the first end 1023 of the photosensitive element 1026, and the second pole of the capacitor 1029 is electrically connected to the second end 1028 of the photosensitive element 1026.

[0095] The working process of the above exemplary image sensor including the capacitor 1029 includes: in the reset stage, by inputting a scan signal to the control electrode G, the switching element 1024 is turned on, and the ROIC writes a reset signal to the capacitor 1029 via the switching element 1024 to reset the capacitor 1029 and also reset the photosensitive element 1026; in the photosensitive stage, the switching element 1024 is turned off, the photosensitive element 1026 is in a negatively biased state, and the photosensitive element 1026 generates photo-generated carriers and charges the capacitor 1029 under the irradiation of the reflected light, so that the capacitor 1029 generates and stores an electrical signal; in the detection stage, the switching element 1024 is turned on, and the ROIC reads the electrical signal stored in the capacitor 1029 through the switching element 1024, and then forms a texture image.

[0096] Figure 7B shows the structure and circuit connection relationship of another exemplary image sensor that does not include a capacitor. The working process of the exemplary image sensor that does not include a capacitor includes: in the reset stage, by inputting a scan signal to the control electrode G, the switching element 1024 is turned on, and the ROIC writes a reset signal to the cathode of the photosensitive element 1026 via the switching element 1024 to reset the photosensitive element 1026; in the photosensitive stage, the switching element 1024 is turned off, the photosensitive element 1026 is in a negatively biased state, and the photosensitive element 1026 generates photo-generated carriers to generate photo-generated leakage current under the irradiation of the reflected light; in the detection stage, the switching element 1024 is turned on, and the ROIC reads the electrical signal corresponding to the photo-generated leakage current through the switching element 1024, and then forms a texture image.

[0097] For example, as Figure 8As shown, the photosensitive element of the image sensor can be a photodiode, including a first electrode 1021, a second electrode 1022, and a semiconductor layer 1023 between the first electrode 1021 and the second electrode 1022. For example, the photodiode can be of PN type, PIN type, etc. When the photodiode is of PN type, the semiconductor layer 1023 includes a stacked P-type semiconductor layer and an N-type semiconductor layer; when the photodiode is of PIN type, the semiconductor layer 1023 includes a stacked P-type semiconductor layer, an intrinsic semiconductor layer, and an N-type semiconductor layer. For example, the semiconductor material used for the semiconductor layer 1023 can be silicon, germanium, selenium, gallium arsenide, etc., and the embodiments of the present disclosure do not limit this.

[0098] For example, as Figure 8 shown, the switching element of the image sensor can be a thin-film transistor, such as a single-crystalline silicon thin-film transistor, an oxide semiconductor (such as indium gallium tin oxide (IGZO)) thin-film transistor, or a polysilicon thin-film transistor (such as a low-temperature polysilicon thin-film transistor LTPS-TFT), etc.

[0099] For example, in one example, the thin-film transistor includes a gate 1311, a gate insulating layer 1312, an active layer 1313, and a source 1314A and a drain 1314B that are sequentially disposed on a substrate 131. The first electrode 1021 of the photosensitive element is electrically connected to the source 1314A or the drain 1314B (shown as the drain 1314B in the figure) through a first opening 1315A in the second insulating layer 1315. For example, a first insulating layer (such as including a protective insulating layer 1124, a planarizing layer 1125, and an insulating layer 1126) is covered on the photosensitive element, and a first trace 1127 (such as a bias line BL) is electrically connected to the second electrode 1022 of the photosensitive element through a second opening 1125A in the first insulating layer. For example, a shielding layer 1129 is further disposed on the first trace 1127, and the shielding layer 1129 can play an electromagnetic shielding role and can avoid signal crosstalk between the texture recognition circuit and the display circuit. The shielding layer 1129 is, for example, a metal layer or a metal oxide layer (such as an ITO layer), etc., and the embodiments of the present disclosure do not limit this.

[0100] For example, in another example, as Figure 9 shown, the switching element of the image sensor is a thin-film transistor, and this thin-film transistor is different from the Figure 8 thin-film transistor structure shown. For example, as Figure 9As shown, the thin film transistor includes an active layer 2313, a gate insulating layer 2312, a gate 2311, an interlayer insulating layer 2316, and a source 2314A and a drain 2314B, which are sequentially disposed on a substrate 231. The first electrode 1021 of the photosensitive element is electrically connected to the source 2314A or the drain 2314B (shown as the drain 2314B in the figure). For example, a light-shielding pattern 2310 is disposed below the active layer 2313, and the orthographic projection of the light-shielding pattern 2310 on the substrate 131 at least partially overlaps with the orthographic projection of the active layer 2313 on the substrate 131. The light-shielding pattern 2310 can prevent the light incident from the substrate 231 from irradiating the active layer 2313, so as to avoid adverse effects on the operation of the thin film transistor.

[0101] It should be noted that only two structures of the image sensor are exemplarily given above. In other examples, the image sensor may also have other structures (such as capacitors, etc.), and the embodiments of the present disclosure do not limit this.

[0102] During the fingerprint recognition process, in addition to the light emitted by the light source array that can be sensed by the image sensor array, the image sensor array may also sense the ambient light incident through the finger. Since the image sensor receives light passively and does not actively distinguish the light emitted by the light source array from the ambient light, the ambient light may interfere with the fingerprint recognition of the image sensor. For example, when the ambient light irradiates directly above the finger, the ambient light can pass through the finger and excite the biological tissue in the finger to emit pigment light, which may interfere with the fingerprint recognition. Through detection, the pigment light mainly includes light with a wavelength above 600nm.

[0103] For example, as Figure 8 shown, the counter substrate further includes a light filtering pattern 1310 configured to filter light with a wavelength greater than 600nm. For example, the light filtering pattern is disposed between the substrate 131 and the photosensitive element, and the orthographic projection of the photosensitive element on the substrate 131 at least partially overlaps with the orthographic projection of the light filtering pattern 1310 on the substrate 131. For example, the orthographic projection of the photosensitive element on the substrate 131 is located within the orthographic projection of the light filtering pattern 1310 on the substrate 131.

[0104] For example, as Figure 9 shown, the counter substrate further includes a light filtering pattern 2310 disposed between the substrate 231 and the photosensitive element, and the orthographic projection of the photosensitive element on the substrate 231 at least partially overlaps with the orthographic projection of the light filtering pattern 2310 on the substrate 231. For example, the orthographic projection of the photosensitive element on the substrate 231 is located within the orthographic projection of the light filtering pattern 2310 on the substrate 231.

[0105] For example, inFigure 8 and Figure 9 In Figure 8 , the filter pattern is disposed on a side of the substrate close to the image sensor. In other embodiments, the filter pattern may also be disposed at other positions as long as its functions can be achieved. Embodiments of the present disclosure do not limit the specific position of the filter pattern.

[0106] For example, the filter pattern 1310 / 2310 can absorb light with a wavelength greater than 600 nm. Thus, the filter pattern can absorb the ambient light / pigment light to prevent the ambient light / pigment light from hitting the image sensor array and interfering with image acquisition.

[0107] For example, the filter pattern may be formed of an organic resin material, and a colored dye may be incorporated into the organic resin material to form a certain filtering effect on light with a wavelength greater than 600 nm. The colored dye includes, for example, bromoamino acid derivatives, etc. For example, the filter pattern may also include an inorganic material, specifically, an inorganic layer formed by alternately laminating titanium trioxide (Ti3O5) with a high refractive index and silicon dioxide (SiO2) with a low refractive index. Embodiments of the present disclosure do not limit the specific material of the filter pattern.

[0108] During the process of the texture recognition device 100 collecting textures, the imaging range formed by a single photosensitive light source is often limited. When the area of the texture is large, the imaging range formed by a single photosensitive light source may not be sufficient to meet the requirements of texture recognition. At this time, multiple photosensitive light sources may be simultaneously lit or lit in a time-sharing manner to form multiple effective imaging ranges, and these effective imaging ranges are superimposed and spliced to obtain a larger texture image.

[0109] For example, in some embodiments, during the texture collection process of the texture recognition device 100, as Figure 3B shown, the light valve structure is further configured to allow the second region 2 different from the first region 1 to be in a light-transmitting state, so that the light emitted by the light source array can pass through the second region 2 in the light-transmitting state to form a second photosensitive light source 202. And the light valve structure is configured to allow the first region 1 and the second region 2 to be in the light-transmitting state simultaneously or at different times.

[0110] For example, the size of the second region 2 is equal to the size of the first region 1. For example, as Figure 10A shown, when the texture recognition device 100 is a liquid crystal display device, the number of pixel units (or sub-pixel units) corresponding to the second region 2 is equal to the number of pixel units (or sub-pixel units) corresponding to the first region 1. For example, the first photosensitive light source 201 and the second photosensitive light source 202 correspond to a plurality of continuously arranged pixel units to form a dot-shaped photosensitive light source. For example, the first photosensitive light source 201 and the second photosensitive light source 202 correspond to an array of 6×6 pixel units, 7×7 pixel units, or 8×8 pixel units, etc.

[0111] For example, in one example, when the first region 1 and the second region 2 are both in a light-transmitting state, as Figure 10B shown, the imaging range of the first photosensitive light source 201 on the image sensor array forms a first ring 301, and the imaging range of the second photosensitive light source 202 on the image sensor array forms a second ring 302. The first ring 301 and the second ring 302 are tangent to each other. Thus, the effective imaging ranges of the first photosensitive light source 201 and the second photosensitive light source 202 can be jointly used for imaging the texture. For example, in some examples, the simultaneously lit photosensitive light sources can also be more, such as four, six, eight, etc. The imaging ranges of these photosensitive light sources on the image sensor array are tangent to each other in sequence, so as to be jointly used for imaging the texture.

[0112] For example, in another example, when the first region 1 and the second region 2 are not both in a light-transmitting state, for example, when the first region 1 is in a light-transmitting state at a first moment and the second region 2 is in a light-transmitting state at a second moment different from the first moment, as Figure 10C shown, the imaging range of the first photosensitive light source 201 on the image sensor array forms a first ring 301, and the imaging range of the second photosensitive light source 202 on the image sensor array forms a second ring 302. The second ring 302 covers the center 3011 of the first ring 301. At this time, the first ring 301 will also overlap with the center 3021 of the second ring 302. Since the centers 3011 and 3021 are the ineffective imaging areas of the first photosensitive light source 201 and the second photosensitive light source 202 respectively, the imaging ranges of the first photosensitive light source 201 and the second photosensitive light source 202 can complement each other, so that the effective imaging ranges of the first photosensitive light source 201 and the second photosensitive light source 202 are superimposed and spliced, and a larger imaging range can be obtained.

[0113] For example, in some embodiments, when the size of the texture is large, as Figure 11 shown, the light valve structure can also be configured to allow control of a plurality of first regions 1 arranged in an array to be light-transmitting at a first moment to form a plurality of first photosensitive light sources 201 arranged in an array (two are shown in the figure), and allow control of a plurality of second regions 2 arranged in an array to be light-transmitting at a second moment to form a plurality of second photosensitive light sources 202 arranged in an array (two are shown in the figure). Thus, the imaging ranges of these photosensitive light sources can be superimposed and spliced to form a larger imaging range. For example, in other embodiments, according to the situation (such as the size of the texture, etc.), the provided first photosensitive light source 201 and second photosensitive light source 202 can also be more. The embodiments of the present disclosure do not limit this.

[0114] For example, the controller 104 detects the contact area between the texture and the touch side through the touch structure. When the contact area is greater than the threshold area, the light valve structure performs the above operation. For example, the threshold area can be set according to the operating body (such as a finger) that provides the texture, for example, set to 1cm×1cm, etc., and the embodiments of the present disclosure are not limited to this. Therefore, the texture recognition device 100 can selectively provide a light-sensitive light source according to the contact area of the texture to obtain a texture image of a corresponding size for texture recognition.

[0115] It should be noted that the above embodiments are described by taking the photosensitive light source as a point light source as an example. In other embodiments, the photosensitive light source may also be a line light source or other patterned light sources, and the embodiments of the present disclosure do not specifically limit this. In addition, the point-shaped photosensitive light source can be obtained by adjusting the shape of the light-transmitting area (first area 1, second area 2, etc.), for example, the light-transmitting area can be approximately square or approximately circular, and in some cases the light-transmitting area can also be formed into an irregular shape, and the embodiments of the present disclosure do not specifically limit this.

[0116] In addition, in the embodiments of the present disclosure, the controller 104 may be various types of controllers, such as various types of integrated circuit chips with processing functions, which may have various computing architectures, such as a complex instruction set computer (CISC) structure, a reduced instruction set computer (RISC) structure, or a structure that implements a combination of multiple instruction sets. In some embodiments, the controller 230 may be a microprocessor, such as an X86 processor or an ARM processor, or may be a digital signal processor (DSP), etc. The embodiments of the present disclosure do not limit the type of the controller 104.

[0117] For example, in some embodiments, the controller 104 may further include a memory, which is used to store a control program for forming a light-transmitting area in time-sharing manner and a control program for forming multiple light-transmitting areas simultaneously or in time-sharing manner, etc. For example, the storage unit may be a storage medium in any form, such as a volatile memory or a non-volatile memory, such as a semiconductor memory or a magnetic medium memory, etc., and the embodiments of the present disclosure are not limited thereto.

[0118] At least one embodiment of the present disclosure further provides a manufacturing method of a texture recognition device, the texture recognition device having a touch side, and the manufacturing method includes: providing a light source array; providing a light valve structure on a side of the light source array close to the touch side, the light valve structure including a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, and the light valve structure being configured to be able to respond to a control signal to control a first area to be in a light-transmitting state, so as to allow the light emitted by the light source array to pass through the first area to form a first photosensitive light source in the light-transmitting state; providing an image sensor array, the image sensor array being configured to receive the light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition. For example, in the light valve structure, the second substrate is closer to the touch side than the first substrate, and the image sensor array is formed on the second substrate.

[0119] For example, in some embodiments, the light valve structure is a liquid crystal panel, the first substrate is an array substrate, the second substrate is a counter substrate, and the light adjustment layer includes a liquid crystal layer. Providing the light valve structure includes forming the counter substrate of the liquid crystal panel, as Figure 12 shown, forming the counter substrate includes steps S101 - step S103.

[0120] Step S101: Provide a substrate.

[0121] For example, the substrate can be a transparent substrate such as a glass substrate or a plastic substrate, and the specific form of the substrate in the embodiments of the present disclosure is not limited.

[0122] Step S102: Form an image sensor array on the substrate.

[0123] For example, the image sensor array includes a plurality of image sensors, and each image sensor includes a photosensitive element and a switching element. For example, forming the image sensor includes: forming a switching element on the substrate, and forming a photosensitive element on the switching element.

[0124] For example, the functional patterns of the switching element and the photosensitive element can be formed in sequence by a patterning process. For example, the patterning process can be a photolithography process, including processes such as the formation of a material layer to be etched, the coating of a photoresist, exposure, development, and the etching of the material layer to be etched. For example, the material layer to be etched can be formed by evaporation, sputtering, inkjet printing, coating, etc. according to the properties of the material.

[0125] For example, referring to Figure 8 and Figure 9, forming a photosensitive element on a switching element includes: sequentially forming a first electrode 1021, a semiconductor layer 1022, and a second electrode 1023 of the photosensitive element, electrically connecting the first electrode 1021 to the source or drain of the switching element, forming a first insulating layer (for example, including a protective insulating layer 1124, a planarizing layer 1125, and an insulating layer 1126) to cover the switching element, the first insulating layer including a first opening 1125A that exposes the second electrode 1023; forming a first trace 1127 on the first insulating layer, the first trace 1127 being, for example, a bias line BL, and the first trace 1127 being electrically connected to the second electrode 1023 through the first opening 1125A.

[0126] For example, the materials of the protective insulating layer 1124, the planarizing layer 1125, and the insulating layer 1126 can be an inorganic insulating material, an organic insulating material, and an inorganic insulating material respectively, so as to provide protection for the switching element and the photosensitive element and planarize them.

[0127] For example, the manufacturing method provided in this embodiment further includes forming a shielding layer 1129 on the photosensitive element, and an insulating layer 1128 is further formed between the shielding layer 1129 and the first trace 1127. The shielding layer 1129 can play an electromagnetic shielding role to avoid signal crosstalk between the fingerprint recognition circuit and the display circuit.

[0128] For example, the switching element is a single-crystalline silicon thin-film transistor, an oxide semiconductor thin-film transistor, or a polycrystalline silicon thin-film transistor (such as a low-temperature polycrystalline silicon thin-film transistor LTPS-TFT), etc.

[0129] For example, in one example, referring to Figure 8 , forming the switching element includes: sequentially forming a gate 1311, a gate insulating layer 1312, an active layer 1313, a source 1314A, and a drain 1314B of a switching transistor on a substrate 131, and then forming a second insulating layer 1315. The second insulating layer 1315 includes a second opening 1315A that exposes the source 1314A or the drain 1314B (in the figure, the second opening 1315A is shown to expose the drain 1314B), and the first electrode 1021 of the photosensitive element is electrically connected to the source or the drain (shown as the drain 1314B in the figure) through the second opening 1315A. This manufacturing process can be used, for example, to form a single-crystalline silicon thin-film transistor or an oxide semiconductor thin-film transistor.

[0130] For example, in another example, referring to Figure 9, forming a switching element includes: sequentially forming a light-shielding pattern 2310 and a buffer layer 2315 on a substrate 231, the buffer layer 2315 covering the light-shielding pattern 2310. Then, an active layer 2313, a gate insulating layer 2312, a gate 2311, an interlayer insulating layer 2316, a source electrode 2314A, and a drain electrode 2314B of a switching transistor are sequentially formed on the buffer layer 2315. The gate insulating layer 2312 and the interlayer insulating layer 2316 have a first via 2316A and a second via 2316B that expose the active layer 2313. The source electrode 2314A and the drain electrode 2314B are electrically connected to the active layer 2313 through the first via 2316A and the second via 2316B, respectively, and the orthographic projection of the active layer 2313 on the substrate 2313 at least partially overlaps with the orthographic projection of the light-shielding pattern 2310 on the substrate 231. The first electrode 1021 of the photosensitive element is electrically connected to the source electrode 2314A or the drain electrode 2314B. In the figure, it is shown that the first electrode 1021 of the photosensitive element is electrically connected to the drain electrode 2314B. This manufacturing process can be used, for example, to form a polysilicon thin film transistor, such as a low-temperature polysilicon thin film transistor LTPS-TFT.

[0131] Step S103: Form a black matrix layer on a side of the image sensor array away from the substrate.

[0132] For example, referring to Figure 4 , forming the black matrix layer 132 includes: forming a black material layer on a substrate component, patterning the black material layer to form a shielding region 132A and a plurality of opening regions 132B that respectively expose a plurality of sub-pixel units of the liquid crystal panel. The shielding region 132A is formed to cover the image sensor array. The black material layer is prepared, for example, using a resin material mixed with carbon black or a dark metal oxide.

[0133] For example, forming the counter substrate of the liquid crystal panel further includes forming a color filter layer. For example, the color filter layer is formed on the same layer as the black matrix layer. The color filter layer includes a plurality of color filter patterns 132C arranged in an array, and the plurality of color filter patterns 132C are respectively formed in the plurality of opening regions 132B. The color filter layer is prepared, for example, using a color resin layer.

[0134] For example, an insulating layer 133 is further formed between the black matrix layer 132 and the image sensor array. For example, the insulating layer 133 is formed on a side of the shielding layer 1129 close to the black matrix layer 132.

[0135] It should be noted that the materials of the insulating layers provided in the embodiments of the present disclosure, such as gate insulating layers, interlayer insulating layers, etc., can be inorganic insulating materials (such as silicon oxide, silicon nitride, or silicon oxynitride, etc.) or organic insulating materials (such as resin materials like polyimide, etc.). The materials of the electrodes provided in the embodiments of the present disclosure, such as gates, sources, drains, the first electrode and the second electrode of photosensitive elements, etc., can be metal materials (such as copper, aluminum, titanium, etc.), alloy materials (such as alloys of copper, aluminum, titanium, etc.) or metal oxides (such as ITO, IZO), etc. The black matrix layer 132 and the color filter layer can, for example, use a resin material as the matrix and be doped with corresponding colored dyes therein to form corresponding colors. The embodiments of the present disclosure do not limit the specific materials of each functional layer.

[0136] In addition, in the embodiments of the present disclosure, the steps of providing a light valve structure may further include forming an array substrate of a liquid crystal panel and aligning the array substrate with a counter substrate to form a liquid crystal cell, etc. These steps can refer to conventional techniques, and the embodiments of the present disclosure do not limit this.

[0137] At least one embodiment of the present disclosure also provides a color filter substrate, which can be used, for example, in a liquid crystal display panel, an electronic paper display panel, etc. As Figure 13 shown, the color filter substrate includes a substrate 401, a color filter layer 404, and an image sensor array 402. The image sensor array 402 includes a plurality of image sensors configured to receive light emitted from a light source array and reflected by the texture to the image sensor array 402 for texture acquisition. The color filter layer 404 includes a plurality of color filter patterns 404A arranged in an array. The image sensor array 402 includes a plurality of image sensors, and the orthographic projection of each image sensor on the substrate 401 is located within the orthographic projection of the interval 404B between adjacent color filter patterns 404A on the substrate 401.

[0138] For example, in some embodiments, the color filter substrate further includes a black matrix layer. For example, the black matrix layer is provided on the same layer as the color filter layer 404. The black matrix layer includes an occlusion area 404B and a plurality of opening areas 404C arranged in an array. The plurality of color filter patterns 404A are respectively located in the plurality of opening areas 404C, so that the orthographic projection of each image sensor on the substrate 401 is located within the orthographic projection of the occlusion area 404B on the substrate 401. The image sensor array 402 is provided between the substrate 401 and the occlusion area 404B.

[0139] For example, in some embodiments, the color filter substrate further includes an insulating layer 403, and the insulating layer 403 is provided between the image sensor array 402 and the color filter layer 404.

[0140] For example, in some embodiments, the color filter substrate further includes a touch electrode 405. For example, the touch structure 405 may be disposed on a side of the substrate 401 away from the image sensor. For example, the touch structure 405 includes a plurality of touch electrodes, which are implemented as a self-capacitance type or a mutual-capacitance type touch structure. For example, when the touch structure is of the self-capacitance type, the touch structure includes a plurality of block-shaped touch electrodes arranged in an array; when the touch structure is of the mutual-capacitance type, the touch structure includes a plurality of strip-shaped driving electrodes and sensing electrodes arranged in a cross pattern. The embodiments of the present disclosure do not specifically limit the form and structure of the touch structure.

[0141] The color filter substrate can be used, for example, to be mated with an array substrate to form a display panel. In this display panel, the image sensor array is integrated in the color filter substrate, and the function of under-screen texture recognition can be achieved without affecting the display function of the display panel.

[0142] At least one embodiment of the present disclosure provides a method for manufacturing a color filter substrate, as Figure 14 shown, including steps S201 - S203.

[0143] Step S201: Provide a substrate.

[0144] For example, the substrate is a transparent substrate such as a glass substrate. The embodiments of the present disclosure do not limit the specific form of the substrate.

[0145] Step S202: Form an image sensor array.

[0146] The image sensor array is configured to receive light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition, and the image sensor array includes a plurality of image sensors.

[0147] For the specific structure and formation method of the image sensor, reference can be made to the above embodiments and will not be elaborated here.

[0148] Step S203: Form a color filter layer.

[0149] The color filter layer includes a plurality of color filter patterns arranged in an array. The orthographic projection of each image sensor on the substrate is located within the orthographic projection of the interval between adjacent color filter patterns on the substrate.

[0150] For example, in some embodiments, the method for manufacturing the color filter substrate may further include forming a black matrix layer.

[0151] For example, the black matrix layer is formed on the same layer as the color filter layer. For example, the black matrix layer can be formed before the color filter layer is formed. The black matrix layer includes an occlusion area and a plurality of opening areas arranged in an array, and a plurality of color filter patterns are respectively formed in the plurality of opening areas, so that the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the occlusion area on the substrate, and the image sensor array is formed between the substrate and the occlusion area.

[0152] The manufacturing method of the color filter substrate combines the manufacturing process of the image sensor into the manufacturing process of the color filter substrate. The obtained color filter substrate can be used to pair with the array substrate to form a display panel, so that the display panel can realize the function of under-screen pattern recognition.

[0153] There are also the following points to note:

[0154] (1) The drawings of the embodiments of the present disclosure only relate to the structures involved in the embodiments of the present disclosure, and other structures can refer to the general design.

[0155] (2) For clarity, in the drawings used to describe the embodiments of the present disclosure, the thickness of the layer or region is enlarged or reduced, that is, these drawings are not drawn according to the actual scale. It can be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "under" another element, the element can be "directly" on or under the other element or there can be an intermediate element.

[0156] (3) Without conflict, the embodiments of the present disclosure and the features in the embodiments can be combined with each other to obtain new embodiments.

[0157] The above is only the specific implementation manner of the present disclosure, but the protection scope of the present disclosure is not limited thereto. The protection scope of the present disclosure shall be subject to the protection scope of the claims.

Claims

1. A texture recognition device having a touch side, comprising: A light source array; A light valve structure disposed on a side of the light source array closer to the touch side, the light valve structure including a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, configured to be capable of responding to a control signal to control a first region to be in a light-transmitting state, so as to allow light emitted by the light source array to pass through the first region to form a first photosensitive light source in the light-transmitting state; An image sensor array configured to receive light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition; Wherein, the second substrate of the light valve structure is closer to the touch side than the first substrate, and the image sensor array is disposed on the second substrate.

2. The texture recognition device according to claim 1, wherein, The light valve structure is a liquid crystal panel, the first substrate is an array substrate, the second substrate is a counter substrate, and the light adjustment layer includes a liquid crystal layer; The liquid crystal panel includes a pixel array, the pixel array includes a plurality of pixel units, the control signal includes a scan signal and a data signal, each pixel unit includes at least one sub-pixel unit, and each sub-pixel unit is configured to control the light-transmitting state in a pixel region corresponding to the sub-pixel unit according to the scan signal and the data signal.

3. The texture recognition device according to claim 2, wherein, The image sensor array includes a plurality of image sensors, and each of the plurality of image sensors is disposed between pixel regions corresponding to adjacent pixel units.

4. The texture recognition device according to claim 2, wherein, The image sensor array includes a plurality of image sensors, and each of the plurality of image sensors is disposed between pixel regions corresponding to adjacent sub-pixel units.

5. The texture recognition device according to claim 2, wherein, The counter substrate includes a substrate and a black matrix layer, the image sensor array is disposed between the substrate and the black matrix layer, wherein, a side of the substrate away from the image sensor array is closer to the touch side.

6. The texture recognition device according to claim 5, wherein, The black matrix layer includes an occlusion region and a plurality of opening regions respectively exposing a plurality of the sub-pixel units, A color filter pattern is disposed in the opening region, and the color filter pattern is used to form monochromatic light, The orthographic projection of each of the plurality of image sensors on the substrate is located within the orthographic projection of the occlusion region on the substrate.

7. The texture recognition device according to claim 6, wherein, The counter substrate further includes a filter pattern configured to filter light with a wavelength greater than 600 nm; Each image sensor includes a photosensitive element and a switching element, the filter pattern is disposed between the substrate and the photosensitive element, and the orthographic projection of the filter pattern on the substrate at least partially overlaps with the orthographic projection of the photosensitive element on the substrate.

8. The texture recognition device according to any one of claims 1-7, wherein The light source array is also multiplexed as a backlight for the light valve structure; or The texture recognition device further includes a second light source array, and the second light source array is used as a backlight for the light valve structure.

9. The texture recognition device according to claim 8, wherein, The light source array includes a plurality of sub-light sources and is configured to allow one or a plurality of continuously arranged sub-light sources to be lit for forming the first photosensitive light source.

10. The texture recognition device according to any one of claims 1-7, wherein, The light valve structure is further configured to allow a second region different from the first region to be in the light-transmitting state, so that in the light-transmitting state, the light emitted by the light source array can pass through the second region to form a second photosensitive light source, and is configured to allow the first region and the second region to be in the light-transmitting state simultaneously or non-simultaneously.

11. The texture recognition device according to claim 10, wherein, In the case where the first region and the second region are simultaneously in the light-transmitting state, the imaging range of the first photosensitive light source on the image sensor array is a first ring, the imaging range of the second photosensitive light source on the image sensor array is a second ring, and the first ring and the second ring are tangent to each other.

12. The texture recognition device according to claim 10, wherein, In the case where the first region and the second region are not simultaneously in the light-transmitting state, the imaging range of the first photosensitive light source on the image sensor array is a first ring, the imaging range of the second photosensitive light source on the image sensor array is a second ring, and the second ring covers the center of the first ring.

13. A manufacturing method of a texture recognition device, wherein, The texture recognition device has a touch side and includes: providing a light source array; providing a light valve structure on a side of the light source array close to the touch side, the light valve structure including a first substrate, a second substrate, and a light adjustment layer between the first substrate and the second substrate, and the light valve structure being configured to be able to respond to a control signal to control a first region to be in the light-transmitting state, so that in the light-transmitting state, the light emitted by the light source array can pass through the first region to form a first photosensitive light source; providing an image sensor array configured to receive the light emitted from the light source array and reflected by the texture to the image sensor array for texture acquisition; wherein, the second substrate is closer to the touch side than the first substrate, and the image sensor array is formed on the second substrate.

14. The manufacturing method according to claim 13, wherein, The light valve structure is a liquid crystal panel, the first substrate is an array substrate, the second substrate is a counter substrate, and the light adjustment layer includes a liquid crystal layer; providing the light valve structure, including forming the counter substrate of the liquid crystal panel, including: providing a substrate; forming an image sensor array on the substrate; forming a black matrix layer on a side of the image sensor array away from the substrate.

15. The manufacturing method according to claim 14, wherein, Forming the black matrix layer includes: forming an occlusion area and a plurality of opening areas respectively exposing a plurality of sub-pixel units of the liquid crystal panel, wherein the occlusion area is formed to cover the image sensor array.

16. The manufacturing method according to claim 15, wherein, Forming the counter substrate of the liquid crystal panel further includes: forming a color filter layer; wherein, the color filter layer is formed on the same layer as the black matrix layer, and the color filter layer includes a plurality of color filter patterns arranged in an array, and the plurality of color filter patterns are respectively formed in the plurality of opening areas.

17. The manufacturing method according to claim 14, wherein, The image sensor array includes a plurality of image sensors, and each image sensor includes a photosensitive element and a switching element. Forming the image sensor includes: forming the switching element on the substrate and forming the photosensitive element on the switching element.

18. The manufacturing method according to claim 17, wherein, The switching element is a single-crystalline silicon thin-film transistor, an oxide semiconductor thin-film transistor, or a polycrystalline silicon thin-film transistor.

19. The manufacturing method according to claim 17, wherein, Forming the photosensitive element on the switching element includes: Sequentially forming a first electrode, a semiconductor layer, and a second electrode of the photosensitive element, where the first electrode is electrically connected to the source or drain of the switching element; Forming a first insulating layer to cover the switching element, where the first insulating layer includes a first opening that exposes the second electrode; Forming a first trace on the first insulating layer, where the first trace is electrically connected to the second electrode through the first opening.

20. The manufacturing method according to claim 19 further includes: Forming a shielding layer on the photosensitive element.

21. The manufacturing method according to claim 19, wherein, Forming the switching element includes: Sequentially forming a gate, a gate insulating layer, an active layer, a source, and a drain of the switching transistor on the substrate; Forming a second insulating layer, where the second insulating layer includes a second opening that exposes the source or the drain, and the first electrode of the photosensitive element is electrically connected to the source or the drain through the second opening.

22. The manufacturing method according to claim 19, wherein, Forming the switching element includes: Sequentially forming a light-shielding pattern and a buffer layer on the substrate, where the buffer layer covers the light-shielding pattern; Sequentially forming an active layer, a gate insulating layer, a gate, an interlayer insulating layer, a source, and a drain of the switching transistor on the buffer layer, where the gate insulating layer and the interlayer insulating layer have a first via and a second via that expose the active layer, the source and the drain are respectively electrically connected to the active layer through the first via and the second via, and the orthographic projection of the active layer on the substrate at least partially overlaps with the orthographic projection of the light-shielding pattern on the substrate; The first electrode of the photosensitive element is electrically connected to the source or the drain.

23. A color filter substrate includes a substrate, a color filter layer, and an image sensor array; The image sensor array is configured to receive light emitted from a light source array and reflected by a texture to the image sensor array for texture acquisition; The color filter layer includes a plurality of color filter patterns arranged in an array, and the image sensor array includes a plurality of image sensors, and the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the interval between adjacent color filter patterns on the substrate.

24. The color filter substrate according to claim 23 further includes a black matrix layer; The black matrix layer is provided on the same layer as the color filter layer, and the black matrix layer includes an occlusion area and a plurality of opening areas arranged in an array, and the plurality of color filter patterns are respectively located in the plurality of opening areas, so that the orthographic projection of each image sensor on the substrate is located within the orthographic projection of the occlusion area on the substrate; The image sensor array is provided between the substrate and the occlusion area.

25. A method for manufacturing a color filter substrate includes: Providing a substrate; Forming an image sensor array; where the image sensor array is configured to receive light emitted from a light source array and reflected by a texture to the image sensor array for texture acquisition, and the image sensor array includes a plurality of image sensors; Forming a color filter layer; where the color filter layer includes a plurality of color filter patterns arranged in an array; Among them, the orthographic projection of each of the image sensors on the substrate is located within the orthographic projection of the interval between adjacent color filter patterns on the substrate.

26. The manufacturing method according to claim 25 further comprises: Form a black matrix layer; Among them, the black matrix layer is formed on the same layer as the color filter layer. The black matrix layer includes an occlusion area and a plurality of opening areas arranged in an array, and the plurality of color filter patterns are respectively formed in the plurality of opening areas, so that the orthographic projection of each of the image sensors on the substrate is located within the orthographic projection of the occlusion area on the substrate; The image sensor array is formed between the substrate and the occlusion area.

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