Exhaust assembly, liquid processing apparatus and substrate processing apparatus provided with the same

Abstract

Embodiments of the present invention provide an exhaust assembly capable of stably forming a gas flow during an exhaust process of discharging a gas to the outside, a liquid processing apparatus provided with the same, and a substrate processing apparatus. According to the exhaust assembly of the present invention for discharging a gas generated in a substrate processing process, the exhaust assembly includes at least two gas inlets through which the gas flows, a main body portion communicating with the gas inlets and providing a symmetrical path for discharging the gas, a guide portion provided in the main body portion for guiding a flow of the gas, and a gas outlet discharging the gas. The guide portion includes a flow guide provided adjacent to at least one of the gas inlets and guiding a direction of the gas so that the flow of the gas is evenly divided, and a flow rate guide provided around a periphery of a gas inlet most adjacent to the gas outlet and formed to reduce a cross-sectional area of a flow path of the gas.

Description

Technical Field

[0001] The present invention relates to an exhaust assembly and a liquid handling apparatus and a substrate processing apparatus having the same, and more particularly to an exhaust assembly for exhausting gases generated in a basic processing process and a liquid handling apparatus and a substrate processing apparatus having the same. Background Technology

[0002] Semiconductor (or display) manufacturing processes are processes used to manufacture semiconductor devices on a substrate (e.g., a wafer), including processes such as exposure, evaporation, etching, ion implantation, and cleaning. In particular, liquid processing processes can be performed, such as processes that supply a processing solution to the substrate to remove particles from the substrate or processes that form a liquid film on the substrate.

[0003] In such liquid processing techniques, gases may be generated due to chemical reactions on the substrate, and residual gases after a particular process may affect the next process. Therefore, an exhaust system can be constructed to remove the residual gases to the outside.

[0004] On the other hand, if the airflow is unstable and the air pressure is too high or the airflow is stagnant in a certain range during the process of expelling gas to the outside, the overall gas expulsion process may not be able to be carried out smoothly, such as the generation of smoke (Fume). Summary of the Invention

[0005] Therefore, embodiments of the present invention provide an exhaust assembly capable of stably forming an airflow during an exhaust process that discharges gas to the outside, as well as a liquid processing apparatus and a substrate processing apparatus having the same.

[0006] The problems solved by the present invention are not limited to those mentioned above, and those skilled in the art can clearly understand other problems not mentioned from the following description.

[0007] According to the present invention, an exhaust assembly is used to exhaust gases generated during a substrate processing process. The exhaust assembly includes: at least two inlets into which the gas flows; a main body communicating with the inlets and providing a symmetrical path for exhausting the gas; a guide portion disposed in the main body to guide the flow of the gas; and an exhaust port for exhausting the gas. The guide portion includes: a flow guide disposed adjacent to at least one of the inlets and guiding the direction of the gas to uniformly disperse the gas flow; and a flow rate guide disposed around the periphery of the inlet adjacent to the exhaust port to reduce the cross-sectional area of ​​the gas flow path.

[0008] According to an embodiment of the present invention, the air inlet may be asymmetrically arranged around the periphery of the space where the substrate processing process is performed.

[0009] According to an embodiment of the present invention, the main body may be configured such that gas flowing in through the air inlet can flow bidirectionally toward the exhaust outlet.

[0010] According to an embodiment of the present invention, the main body portion may be formed as a circular opening at the center to provide a circular path at the center.

[0011] According to an embodiment of the present invention, the flow guide may include: a first flow guide that guides the flow of gas toward a first direction of the main body around the air inlet; and a second flow guide that guides the flow of gas toward a second direction of the main body around the air inlet.

[0012] According to an embodiment of the present invention, the first flow guide and the second flow guide may be composed of partition walls spaced apart from each other by a certain interval.

[0013] According to an embodiment of the present invention, the flow guide may be formed by a partition wall that narrows the path of the gas flow around the air inlet adjacent to the exhaust port in the air inlet.

[0014] A liquid handling apparatus according to an embodiment of the present invention includes: a chuck for holding a substrate; a bowl for recovering liquid spilled from the substrate; and an exhaust assembly for discharging gases generated during the processing of the substrate. The exhaust assembly includes: at least two inlets into which the gas flows; a main body communicating with the inlets and providing a symmetrical path for discharging the gas; a guide portion disposed in the main body for guiding the flow of the gas; and an exhaust port for discharging the gas. The guide portion may include: a flow guide disposed adjacent to at least one of the inlets and guiding the direction of the gas to uniformly disperse the gas flow; and a flow rate guide disposed around the periphery of the inlet adjacent to the exhaust port to reduce the cross-sectional area of ​​the gas flow path.

[0015] A substrate processing apparatus according to an embodiment of the present invention includes: an indexing unit including a loading port for holding a carrier containing a substrate and an indexing robotic arm for transporting the substrate; and a process processing unit including a transition chamber for temporarily loading the substrate, a transfer chamber for transporting the substrate from the transition chamber, and a liquid processing apparatus for performing a liquid processing process on the substrate. The liquid processing apparatus includes: a chuck for holding the substrate; a bowl for recovering liquid spilled from the substrate; and an exhaust assembly for discharging gases generated during the substrate processing. The exhaust assembly includes: at least two inlets into which the gas flows; a main body communicating with the inlets and providing a symmetrical path for discharging the gas; a guide portion provided in the main body for guiding the flow of the gas; and an exhaust port for discharging the gas. The guide portion may include: a flow guide disposed adjacent to at least one of the air inlets and guiding the direction of the gas so that the gas flow is evenly separated; and a flow rate guide disposed around the air inlet adjacent to the exhaust port to reduce the cross-sectional area of ​​the gas flow path.

[0016] According to the present invention, by providing a main body portion for a symmetrical path for discharging gas, a flow guide for guiding the direction of airflow so that the flow of airflow is evenly separated, and a flow guide for guiding the flow rate of the airflow by being disposed around the air inlet most adjacent to the exhaust port, a constant airflow can be formed during the exhaust process.

[0017] The effects of the present invention are not limited to those mentioned above, and those skilled in the art can clearly understand other effects not mentioned from the following description. Attached Figure Description

[0018] Figure 1 A schematic structure of a substrate processing apparatus to which the present invention can be applied is shown.

[0019] Figure 2 A general structure of a liquid processing apparatus to which the present invention can be applied is shown.

[0020] Figure 3 as well as Figure 4 A schematic structure of an exhaust assembly according to an embodiment of the present invention is shown.

[0021] (Explanation of reference numerals in the attached image)

[0022] 1: Substrate processing equipment

[0023] 10: Index Section

[0024] 20: Processing Department

[0025] 260: Liquid handling chamber

[0026] 310: Chuck

[0027] 320: Bowl

[0028] 400: Exhaust assembly

[0029] 410: Air Inlet

[0030] 420: Main body

[0031] 430: Guiding section

[0032] 432: Flow guide

[0033] 434: Flow guide

[0034] 440: Exhaust port Detailed Implementation

[0035] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings, so that those skilled in the art to which this invention pertains can readily implement it. The present invention can be implemented in various different ways and is not limited to the embodiments described herein.

[0036] To clearly illustrate the invention, irrelevant parts have been omitted, and the same or similar components are marked with the same reference numerals throughout the specification.

[0037] Furthermore, in multiple embodiments, the same reference numerals are used to describe only representative embodiments of the constituent elements having the same structure, while in other embodiments only structures different from the representative embodiments are described.

[0038] In the specification as a whole, when a part is described as being "connected (or combined)" with other parts, it includes not only the case of "direct connection (or combination)" but also the case of "indirect connection (or combination)" through other components. Furthermore, when a part is described as "including" a constituent element, unless otherwise stated otherwise, it means that other constituent elements may be included, rather than excluding them.

[0039] Unless otherwise defined, all terms used herein, including technical or scientific terms, shall have the same meaning as commonly understood by one of ordinary knowledge in the art to which this invention pertains. Terms such as those defined in commonly used dictionaries shall be interpreted as having the same meaning as in the relevant technical context, and shall not be ideally or excessively interpreted as having a formal meaning unless explicitly defined in this application.

[0040] Figure 1 A general structure of the substrate processing apparatus 1 to which the present invention can be applied is shown. (Refer to...) Figure 1The substrate processing apparatus 1 includes an indexing unit 10 and a process processing unit 20.

[0041] The indexing unit 10 may include a loading port 120 and an indexing chamber 140. The loading port 120, the indexing chamber 140, and the process processing unit 20 may be arranged in a row. Hereinafter, the direction in which the loading port 120, the indexing chamber 140, and the process processing unit 20 are arranged will be referred to as the first direction 12. Furthermore, the direction perpendicular to the first direction 12 when viewed from above will be referred to as the second direction 14, and the direction perpendicular to the plane including the first direction 12 and the second direction 14 will be referred to as the third direction 16.

[0042] A carrier 18 containing a substrate is placed in the loading port 120. Alternatively, multiple loading ports 120 may be provided, arranged in a row along the second direction 14. Figure 1 The diagram shows four loading ports 120. However, the number of loading ports 120 can be increased or decreased depending on factors such as the process efficiency of the process unit 20 and space requirements. The carrier 18 can use a front-opening unified pod (FOUP).

[0043] The indexing chamber 140 is located between the loading port 120 and the processing section 20. The indexing chamber 140 has a cuboid shape including a front plate, a rear plate, and two side plates, and provides an indexing robotic arm 144 inside for transporting substrates between the carrier 18 placed at the loading port 120 and the transition chamber 220. Although not shown, to prevent particles from flowing into the internal space, the indexing chamber 140 may include a controlled airflow system such as vents or a laminar flow system.

[0044] The process unit 20 may include a transition chamber 220, a transfer chamber 240, and a liquid processing chamber 260. The transfer chamber 240 may be arranged parallel to the first direction 12 in its length direction. The liquid processing chamber 260 may be arranged on one side and the other side of the transfer chamber 240 along the second direction 14.

[0045] A portion of the liquid processing chamber 260 may be configured along the length of the transfer chamber 240. Additionally, a portion of the liquid processing chambers 260 may be stacked on top of each other.

[0046] That is, on one side of the transmission chamber 240, the liquid processing chambers 260 can be arranged in an array of A×B (A and B are natural numbers greater than 1). Here, A is the number of liquid processing chambers 260 provided in a row along the first direction 12, and B is the number of liquid processing chambers 260 provided in a row along the third direction 16.

[0047] A transition chamber 220 is disposed between the index chamber 140 and the transfer chamber 240. The transition chamber 220 provides space between the transfer chamber 240 and the index chamber 140 for temporarily loading the substrate before transporting it. The transition chamber 220 provides slots (not shown) for placing the substrate within it, with multiple slots (not shown) spaced apart from each other along a third direction 16. The transition chamber 220 may be provided with an open surface facing both the index chamber 140 and the transfer chamber 240.

[0048] The transfer chamber 240 can transport the basic material between the transition chamber 220 and the liquid handling chamber 260. A guide rail 242 and a main robotic arm 244 can be provided in the transfer chamber 240. The guide rail 242 is arranged parallel to the first direction 12 along its length. The main robotic arm 244 is disposed on the guide rail 242 and configured to move linearly along the first direction 12 on the guide rail 242. The main robotic arm 244 may include a drive unit 244a configured to move along the guide rail 242, a robotic arm body 244b configured to move in conjunction with the drive unit 244a, and a robotic arm hand 244c connected to the robotic arm body 244b and supporting the underside of a substrate for transport.

[0049] A liquid processing chamber 260 may be provided with means for performing liquid processing processes on a substrate, such as a cleaning process. The liquid processing apparatus according to embodiments of the present invention may include a structure as the liquid processing chamber 260. For example, the cleaning process may be a process of cleaning, stripping, and removing organic residues using a processing fluid including an alcohol component. The substrate processing apparatus provided in each liquid processing chamber 260 may have different structures depending on the type of cleaning process performed. Optionally, the substrate processing apparatus in each liquid processing chamber 260 may have the same structure. Optionally, the liquid processing chamber 260 may be divided into multiple groups, with substrate processing apparatus provided in liquid processing chambers 260 belonging to the same group having the same structure, and substrate processing apparatus provided in liquid processing chambers 260 belonging to different groups having different structures.

[0050] The liquid processing apparatus according to the invention includes a chuck 310 for placing a substrate, a bowl 320 for collecting liquid spilled from the substrate, and an exhaust assembly 400 for discharging gases generated during the substrate processing. Although not specifically illustrated, the liquid processing chamber 260 may also include a nozzle for supplying liquid to the substrate and a discharge section for discharging liquid.

[0051] The chuck 310 can be provided in the form of a circular plate, supporting the substrate below to perform substrate processing. The chuck 310 can be configured to rotate, so that if the substrate rotates together with the chuck 310 and the liquid is supplied to the center of the substrate, the liquid can be supplied from the center to the periphery of the substrate by centrifugal force. A support pin 312 supporting the substrate below and a chuck pin 314 contacting the outer periphery of the substrate to prevent the substrate from detaching can be formed on the upper side of the chuck 310.

[0052] The bowl 320 can cut off other devices from the liquid medicine supplied to the substrate that spills into the liquid processing chamber 260, and can collect and discharge the liquid medicine. The bowl 320 can be provided as a cylindrical shape open at the top, and can be configured to rise and fall for liquid medicine collection. On the other hand, an air inlet 410 can be arranged along the periphery of the bowl 320. The air inlet 410 can guide gases, including residual gases generated during the processing of the substrate in the chuck 310, to... Figure 3 as well as Figure 4 The exhaust device shown.

[0053] like Figure 2 As shown, the air inlet 410 can be configured along the periphery of the bowl 320, and asymmetrically. For example... Figure 2 As shown, a first air inlet 410-1 can be positioned on one side (9 o'clock position) of the bowl 320, a second air inlet 410-2 on the lower side (6 o'clock position) of the bowl 320, and a third air inlet 410-3 on the opposite side (3 o'clock position) of the first air inlet 410-1, centered on the bowl 320. Such asymmetrical configuration of the air inlets 410 is frequently seen in the durable construction of the liquid handling chamber 260. Furthermore, the area of ​​each air inlet 410 can also be different.

[0054] On the other hand, a typical exhaust system can be configured as a simple pipe that guides gas from the inlet to the outlet. For space efficiency, asymmetrical pipe configurations are common. However, such asymmetrical configurations can lead to stagnation of gas in specific areas due to inconsistent gas flow. Furthermore, when... Figure 2 When the air inlets are asymmetrically formed, the pressure of the inflowing gas varies at each inlet, especially as the gas tends to concentrate at the inlet closest to the exhaust outlet, potentially causing excessively high pressure in certain areas. This asymmetrical pressure distribution leads to a decrease in overall exhaust efficiency and the accumulation of foreign matter such as fumes in the exhaust system. Therefore, this invention aims to guide the gas pressure in the path of the flowing gas within the exhaust system to maintain a constant pressure.

[0055] The exhaust assembly 400 discharges gas, including residues generated during substrate processing, to the outside. According to the invention, the exhaust assembly 400 includes at least two inlets 410 for gas inflow, a main body 420 communicating with the inlets 410 and providing a symmetrical path for gas discharge, a guide portion 430 provided in the main body 420 for guiding gas flow, and an exhaust port 440 for discharging gas.

[0056] According to the present invention, the guide portion 430 may include: a flow guide 432, which is disposed adjacent to at least one of the air inlets and guides the direction of airflow so that the flow of gas is evenly separated; and a flow guide 434, which is disposed around the air inlet 410 adjacent to the exhaust port 440 (e.g., the third air inlet 410-3) and is formed to reduce the flow path of gas.

[0057] As in the embodiments of the present invention, in the main body 420 that provides a symmetrical path for discharging gas, the flow guide 432 that guides the direction of airflow is configured to evenly separate the gas flow, thereby maintaining a constant airflow in both directions. Furthermore, around the air inlet 410 adjacent to the exhaust port 440 (e.g., the third air inlet 410-3), a flow guide 434 is configured to reduce the gas flow path, thereby preventing gas from accumulating at a specific air inlet and causing a pressure increase.

[0058] As explained above, the air inlet 410 can be asymmetrically positioned around the periphery of the space where the substrate processing is performed (chuck 310 and bowl 320). For example, it could be, as... Figure 2 As shown, a first air inlet 410-1 is located on one side (9 o'clock position) of the bowl 320, a second air inlet 410-2 is located on the lower side (6 o'clock position) of the bowl 320, and a third air inlet 410-3 is located on the opposite side (3 o'clock position) of the first air inlet 410-1 with the bowl 320 as the center. This asymmetrical arrangement of the air inlets 410 is frequently seen in the durable construction of the liquid handling chamber 260. Furthermore, the area of ​​each air inlet 410 can also be different.

[0059] According to the present invention, the main body 420 can be configured such that gas flowing in through the air inlet 410 can flow bidirectionally toward the exhaust port. (See reference...) Figure 3 as well as Figure 4 The main body 420 is formed as a circular opening at the center, providing a circular path at the center. The main body 420 is configured to communicate with each air inlet 410, and the gas flowing in through the air inlet 410 can flow in a circular manner. The main body 420 is configured to provide a bidirectional exhaust path, and the gas flowing in through the air inlet 410 can flow in a clockwise or counterclockwise direction.

[0060] According to the present invention, the flow guide 432 may include a first flow guide 432A that guides the flow of gas toward the main body 420 in a first direction (e.g., clockwise) around the air inlet (e.g., the second air inlet 410-2) and a second flow guide 432B that guides the flow of gas toward the main body 420 in a second direction (e.g., counterclockwise) around the air inlet (e.g., the second air inlet 410-2). For example, the first flow guide 432A and the second flow guide 432B may be constructed from partitions spaced apart from each other.

[0061] Figure 3 as well as Figure 4 The partitions of the first flow guide 432A and the second flow guide 432B shown can guide the gas flowing in through the second air inlet 410-2 to flow uniformly in both directions. Preferably, the first flow guide 432A and the second flow guide 432B can be configured around the central air inlet, such as the second air inlet 410-2. Preferably, the partitions of the first flow guide 432A and the second flow guide 432B can be formed by curved guide vanes to allow the airflow to flow without stagnation.

[0062] According to the present invention, the flow guide 434 may be formed by a partition wall that narrows the gas flow path around the air inlet 410 adjacent to the exhaust port 440 (e.g., the third air inlet 410-3). When there is no such partition wall... Figure 3 as well as Figure 4 When the flow guide 434 is in the form of a partition wall, a higher pressure may be maintained because more gas flows into the third inlet 410-3, which is adjacent to the exhaust port 440, than into the first inlet 410-1, which has the same area. In this case, flow balance may be lost in the exhaust assembly 400. Therefore, by means of... Figure 3 as well as Figure 4 The flow guide 434, which forms a partition wall, reduces the gas flow into the third air inlet 410-3, thereby maintaining the flow balance between the first air inlet 410-1 and the third air inlet 410-3.

[0063] The exhaust assembly 400 according to the invention may include components of the liquid handling apparatus described above. The liquid handling apparatus according to the invention includes: a chuck 310 for holding a substrate; a bowl 320 for recovering liquid spilled from the substrate; and an exhaust assembly 400 for discharging gases generated during the substrate processing. The exhaust assembly 400 according to the invention includes: at least two inlets 410 into which gas flows; a main body 420 communicating with the inlets 410 and providing a symmetrical path for discharging gas; a guide portion 430 provided in the main body 420 for guiding gas flow; and an exhaust port 440 for discharging gas. The guide portion 430 may include: a flow guide 432 disposed adjacent to at least one of the inlets 410 and guiding the direction of the gas to uniformly separate the gas flow; and a flow guide 434 disposed around the periphery of the inlet 410 most adjacent to the exhaust port 440 to reduce the cross-sectional area of ​​the gas flow path.

[0064] On the other hand, the liquid processing apparatus and exhaust assembly 400 according to the present invention may include components of the substrate processing apparatus described above. The substrate processing apparatus 1 according to the present invention includes: an indexing section 10, including a loading port 120 for holding a carrier 18 containing a substrate and an indexing robotic arm 144 for transporting the substrate; a transition chamber 220 for temporarily loading the substrate; a transfer chamber for transporting the substrate from the transition chamber 220; and a process processing section 20, including a liquid processing apparatus for performing a basic liquid processing process. The liquid processing apparatus includes: a chuck 310 for holding the substrate; a bowl 320 for recovering liquid spilled from the substrate; and an exhaust assembly 400 for discharging gases generated during the substrate processing. The exhaust assembly 400 according to the present invention includes: at least two air inlets 410 into which gas flows; a main body 420 communicating with the air inlets 410 and providing a symmetrical path for discharging gas; a guide section 430 provided in the main body 420 for guiding the flow of gas; and an exhaust port 440 for discharging gas. The guide portion 430 may include: a flow guide 432, disposed adjacent to at least one of the air inlets 410, and guiding the direction of the gas so that the gas flow is evenly separated; and a flow guide 434, disposed around the air inlet 410 adjacent to the exhaust port 440, and formed to reduce the cross-sectional area of ​​the gas flow path.

[0065] This embodiment and the accompanying drawings are merely a part of the technical concept explicitly illustrated in this invention. As the name suggests, all variations and specific embodiments that can be easily deduced by those skilled in the art within the scope of the technical concept included in the specification and drawings of this invention are included within the scope of the claims of this invention.

[0066] Therefore, the concept of the present invention should not be limited to the illustrated embodiments, not only to the appended claims, but all concepts that are equivalent or modified to the claims should be included within the scope of the present invention.

Claims

1. A venting assembly for venting gases generated during substrate processing, characterized in that, The exhaust assembly includes: At least two air inlets are through which the gas flows; The main body is connected to the air inlet and provides a symmetrical path for discharging the gas; A guide section, provided in the main body for guiding the flow of the gas; and The exhaust port discharges the gas. The guide section includes: A flow guide, disposed adjacent to at least one of the air inlets except the one most adjacent to the exhaust port, and guides the direction of the gas to ensure that the gas flow is evenly dispersed; and A flow guide is disposed around the air inlet adjacent to the exhaust port in the air inlet, thereby reducing the cross-sectional area of ​​the gas flow path.

2. The exhaust assembly according to claim 1, characterized in that, The air inlet is asymmetrically positioned around the periphery of the space where the substrate processing process is performed.

3. The exhaust assembly according to claim 1, characterized in that, The main body is configured such that gas flowing in through the air inlet can flow bidirectionally toward the exhaust outlet.

4. The exhaust assembly according to claim 3, characterized in that, The main body is formed as a circular opening at the center to provide a circular path at the center.

5. The exhaust assembly according to claim 1, characterized in that, The flow guide includes: A first flow guide member guides the flow of gas towards the main body in a first direction around the air inlet; and The second flow guide directs the flow of gas toward a second direction of the main body around the air inlet.

6. The exhaust assembly according to claim 5, characterized in that, The first flow guide and the second flow guide are composed of partition walls that are spaced apart from each other by a certain interval.

7. The exhaust assembly according to claim 1, characterized in that, The flow guide is formed by a partition wall that narrows the path of the gas flow around the air inlet adjacent to the exhaust port.

8. A liquid processing apparatus, characterized in that, include: The chuck is where the base plate is placed; A bowl for collecting the liquid medicine that has spilled from the substrate; as well as An exhaust assembly is used to discharge gases generated during the processing of the substrate. The exhaust assembly includes: At least two air inlets are through which the gas flows; The main body is connected to the air inlet and provides a symmetrical path for discharging the gas; A guide section, provided in the main body for guiding the flow of the gas; and The exhaust port discharges the gas. The guide section includes: A flow guide, disposed adjacent to at least one of the air inlets except the one most adjacent to the exhaust port, and guides the direction of the gas to ensure that the gas flow is evenly dispersed; and A flow guide is disposed around the air inlet adjacent to the exhaust port in the air inlet, thereby reducing the cross-sectional area of ​​the gas flow path.

9. The liquid handling apparatus according to claim 8, characterized in that, The air inlets are asymmetrically positioned around the periphery of the bowl.

10. The liquid handling apparatus according to claim 8, characterized in that, The main body is configured such that gas flowing in through the air inlet can flow bidirectionally toward the exhaust outlet.

11. The liquid handling apparatus according to claim 10, characterized in that, The main body is formed as a circular opening at the center to provide a circular path at the center.

12. The liquid handling apparatus according to claim 8, characterized in that, The flow guide includes: A first flow guide member guides the flow of gas towards the main body in a first direction around the air inlet; and The second flow guide directs the flow of gas toward a second direction of the main body around the air inlet.

13. The liquid handling apparatus according to claim 12, characterized in that, The first flow guide and the second flow guide are composed of partition walls that are spaced apart from each other by a certain interval.

14. The liquid handling apparatus according to claim 8, characterized in that, The flow guide is formed by a partition wall that narrows the path of the gas flow around the air inlet adjacent to the exhaust port.

15. A substrate processing apparatus, characterized in that, include: The indexing unit includes a loading port on which a carrier containing a substrate is placed and an indexing robotic arm for transporting the substrate. as well as The process unit includes a transition chamber for temporarily loading the substrate, a transfer chamber for conveying the substrate from the transition chamber, and a liquid processing apparatus for performing liquid processing on the substrate. The liquid processing device includes: The chuck is on which the substrate is placed; A bowl for collecting the liquid medicine spilled from the substrate; and An exhaust assembly is used to discharge gases generated during the processing of the substrate. The exhaust assembly includes: At least two air inlets are through which the gas flows; The main body is connected to the air inlet and provides a symmetrical path for discharging the gas; A guide section, provided in the main body for guiding the flow of the gas; and The exhaust port discharges the gas. The guide section includes: A flow guide, disposed adjacent to at least one of the air inlets except the one most adjacent to the exhaust port, and guides the direction of the gas to ensure that the gas flow is evenly dispersed; and A flow guide is disposed around the air inlet adjacent to the exhaust port in the air inlet, thereby reducing the cross-sectional area of ​​the gas flow path.

16. The substrate processing apparatus according to claim 15, characterized in that, The air inlets are asymmetrically positioned around the periphery of the bowl.

17. The substrate processing apparatus according to claim 15, characterized in that, The main body is configured such that gas flowing in through the air inlet can flow bidirectionally toward the exhaust outlet.

18. The substrate processing apparatus according to claim 17, characterized in that, The main body is formed as a circular opening at the center to provide a circular path at the center.

19. The substrate processing apparatus according to claim 15, characterized in that, The flow guide includes: A first flow guide member guides the flow of gas towards the main body in a first direction around the air inlet; and The second flow guide directs the flow of gas towards the main body in a second direction around the air inlet. The first flow guide and the second flow guide are composed of partition walls that are spaced apart from each other by a certain interval.

20. The substrate processing apparatus according to claim 15, characterized in that, The flow guide is formed by a partition wall that narrows the path of the gas flow around the air inlet adjacent to the exhaust port.

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