A mask layout correction method

Abstract

The present application relates to the field of photolithography friendly technology, particularly relates to a mask layout correction method, comprising the following steps: providing an initial mask layout, the mask layout obtains the graphic point information in the initial mask layout; the graphic point information in the initial mask layout is matched with the bad point information in the preset mask layout matching library, the mask layout matching library includes mask layout bad point information and the correction point information corresponding to the mask layout bad point information; if there is bad point information and the certain graphic point information in the initial mask layout is matched, then the initial mask layout is corrected using the correction point information corresponding to the mask layout bad point; in order to solve the problem that the existing mask layout correction method needs to consume huge computing resources, the present application provides a kind of mask layout repair method.

Description

Technical Field

[0001] This invention relates to the field of graphic restoration technology, and in particular to a method for correcting mask layouts. Background Technology

[0002] Simulation models can simulate the optical processes in a lithography machine, allowing designers to observe the imaging results of their designs without actual production, and to make corrections to the design patterns to improve yield and production stability.

[0003] However, correcting mask layouts using existing methods requires enormous computational resources and time. Summary of the Invention

[0004] To address the problem that existing mask layout correction methods require enormous computational resources, this invention provides a mask layout repair method.

[0005] To solve the above-mentioned technical problems, the present invention provides the following technical solution: a mask layout correction method, comprising the following steps: providing an initial mask layout, the initial mask layout including multiple graphic points, each graphic point having corresponding graphic point information; matching the graphic point information in the initial mask layout with bad point information in a preset mask layout matching library, the matching library including bad point information of the mask layout and correction point information corresponding to the bad point of the mask layout; if bad point information matches a certain graphic point information in the initial mask layout, then using the correction point information corresponding to the bad point of the mask layout to correct the initial mask layout.

[0006] Preferably, the step of providing the initial mask layout further includes: establishing a bad pixel library containing bad pixels of the mask layout; correcting each bad pixel of the mask layout in the bad pixel library to obtain a correction point corresponding to the bad pixel of the mask layout, and storing the correction point corresponding to the bad pixel of the mask layout in a correction library; and combining the bad pixel library and the correction library to form the matching library.

[0007] Preferably, the method for correcting each mask layout defect in the defect library is as follows: input each mask layout defect into a preset simulation correction model; the simulation correction model simulates and corrects the mask layout defect to obtain the correction point corresponding to the mask layout defect.

[0008] Preferably, matching the graphic point information in the initial mask layout with the bad point information in the preset bad point library includes: performing graphic matching between the graphic points in the initial mask layout and at least a portion of the bad points in the mask layout in the bad point library.

[0009] Preferably, the graphic matching includes: matching the graphic point information in the initial mask layout with the bad point information in the preset bad point library according to preset matching rules.

[0010] Preferably, the preset matching rules include fuzzy matching and precise matching.

[0011] Preferably, the precise matching includes the following steps: locating the target line segment in the graphic point information and calculating the verification value of the target graphic; searching for the line segment to be matched in the matching library; based on the positioning, rotation, and mirroring information of the line segment to be matched, taking the graphic within the rectangular area formed by the line segment to be matched as the target graphic to be matched, and converting it in reverse to the shape of the target graphic; calculating the verification value based on the length of the line segment in the target graphic, and if the verification value is the same as the verification value of the target graphic, the matching is successful.

[0012] Preferably, the precise matching includes the following steps: locating the target line segment in the graphic point information and calculating the verification value of the target graphic; searching for the line segment to be matched in the matching library; based on the positioning, rotation, and mirroring information of the line segment to be matched, taking the graphic within the rectangular area formed by the line segment to be matched as the target graphic to be matched, and converting it in reverse to the shape of the target graphic; calculating the verification value based on the length of the line segment in the target graphic, and if the verification value is the same as the verification value of the target graphic, the matching is successful.

[0013] Preferably, the preset bad pixel library is formed by selecting some or all of the bad pixel information in the bad pixel library.

[0014] Preferably, if a match is successful, the correction point information corresponding to the bad points in the mask layout is used to replace the graphic point information in the initial mask layout for correction.

[0015] Preferably, the above method further includes the following steps after correction: continuing to match the graphic point information in the initial mask layout with the bad point information in the bad point library; if the match is successful, then continuing to correct the initial mask layout; if the match fails, then outputting the corrected mask layout.

[0016] Another technical solution of the present invention to solve the above-mentioned technical problem is: a computer-readable storage medium having computer program instructions thereon, wherein the computer program instructions, when executed by a processor, implement the above-mentioned mask layout correction method.

[0017] Another technical solution of the present invention to solve the above-mentioned technical problem is: a graphic repair device, including a device body and a device running program, wherein the device body implements the above-mentioned mask layout correction method when executing the device running program.

[0018] Compared with the prior art, the mask pattern repair method provided by the present invention has the following beneficial effects:

[0019] 1. A mask layout correction method provided by the present invention includes the following steps: providing an initial mask layout; acquiring graphic point information in the initial mask layout; matching the graphic point information in the initial mask layout with bad point information in a preset mask layout matching library, the matching library including bad point information of the mask layout and correction point information corresponding to the bad points of the mask layout; if bad point information matches a certain graphic point information in the initial mask layout, then the initial mask layout is corrected using the correction point information corresponding to the bad point of the mask layout. Matching the initial mask layout with bad points in the matching library allows for better bad point detection of the initial mask layout. Directly replacing the parts of the initial mask layout that successfully match bad points in the matching library with the correction points corresponding to those bad points reduces the time required for repair. For the overall design graphics, we simulate key areas and match the graphics with a database of defective pixels. Then, we use the correction points corresponding to the defective pixels to replace and correct the graphics. This significantly saves time and requires only a small amount of computation, conserving resources. It solves the problem of correcting design graphics with minimal resources.

[0020] 2. The mask layout repair method provided by this invention includes: providing an initial mask layout, and prior to that: establishing a bad point library containing bad points of the mask layout; correcting each bad point in the bad point library to obtain a correction point corresponding to the bad point, and storing the correction points corresponding to the bad points in the correction library; combining the bad point library and the correction library to form a matching library. The bad point library is established based on the required bad points or past experience. This bad point library mainly contains bad points specific to the initial mask layout. Using the required bad points eliminates unnecessary matching in subsequent matching processes, reducing time and saving resources. Using simulation software to correct bad points and obtain correction points corresponding to each bad point to establish the correction library allows for direct replacement and correction of bad points in the corrected mask layout without further simulation, saving time, reducing computation, and conserving resources. The matching library formed by the established bad point library and correction library ensures that subsequently matched bad points can find their corresponding correction points in the matching library for direct replacement and correction, without error in correction, saving time, reducing computation, and conserving resources.

[0021] 3. The mask layout repair method provided by this invention corrects each bad pixel in the bad pixel library as follows: Each bad pixel is input into a simulation correction model; the simulation correction model simulates and corrects the bad pixel to obtain the correction point corresponding to the bad pixel. This method allows for simulation repair only on bad pixels, facilitating direct replacement of bad pixels later without requiring redundant simulation calculations, thus saving resources.

[0022] 4. The mask layout repair method provided by this invention, which matches graphic point information in an initial mask layout with bad point information in a preset bad point library, includes: performing graphic matching between points in the initial mask layout and at least a portion of bad points in the bad point library. Selecting the required bad points from the bad point library for matching allows for specific selection of bad points from the bad point library to match the initial mask layout after confirming the type of bad points in the initial mask layout that needs to be addressed. This reduces the computational load required for matching, saves time, and conserves resources.

[0023] 5. The mask layout repair method provided by this invention includes image matching, which involves matching image point information in the initial mask layout with bad point information in a preset bad point library according to preset matching rules. By setting matching rules for image matching, different matching rules can be set according to the needs, thereby achieving the optimal matching effect while reducing unnecessary calculations.

[0024] 6. The mask pattern repair method provided by this invention includes preset matching rules for fuzzy matching and precise matching. Selecting different matching rules based on different situations allows for better achievement of the desired effect without wasting resources. When it is necessary to accurately identify defective pixels in the initial mask pattern, precise matching can be used to perform accurate pattern matching and avoid errors. When a large number of defective pixels need to be detected, fuzzy matching can be used, thereby reducing the matching time.

[0025] 7. The mask layout repair method provided by this invention selects some or all bad pixel information from a bad pixel library to form a preset bad pixel library. Bad pixels can be selected from the bad pixel library based on the initial mask layout or the type of bad pixels in the mask layout to be repaired, thereby selecting the required bad pixels from the bad pixel library for matching with the mask layout to be repaired. This can better reduce unnecessary calculations, save time, and conserve resources.

[0026] 8. The mask layout repair method provided by this invention, if a match is successful, uses the correction point information corresponding to the bad points in the mask layout to replace the initial mask layout information for correction. After the initial mask layout and the bad points in the bad point library are successfully matched, the correction points corresponding to the bad points in the correction library are used to replace the corresponding positions on the initial mask layout. This allows the initial mask layout to be directly corrected for bad points without separate simulation correction, reducing the time for repairing bad points on the initial mask layout, reducing the need for re-simulation, and saving resources.

[0027] 9. The mask layout repair method provided by this invention further includes the following steps after correction: matching the graphic point information in the initial mask layout with the bad point information in the bad point library; if the match is successful, continuing to correct the initial mask layout; if the match fails, outputting the corrected mask layout. After completing the initial graphic bad point replacement correction, the corrected mask layout is output, eliminating the need for simulation calculations on the initial mask layout; thus, the corrected mask layout can be directly output. This saves time in mask layout repair and reduces resource usage.

[0028] 10. The present invention provides a computer-readable storage medium having computer program instructions thereon, which, when executed by a processor, implement the above-described method. This computer-readable storage medium has the same beneficial effects as the above-described mask layout correction method, and will not be elaborated upon here.

[0029] 11. The graphic restoration device provided by the present invention includes a device body and a device operating program. When the device body executes the device operating program, it implements the above-mentioned mask layout correction method. This graphic restoration device has the same beneficial effects as the above-mentioned mask layout correction method, and will not be described in detail here. Attached Figure Description

[0030] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0031] Figure 1 This is a flowchart of a mask pattern repair method provided in the first embodiment of the present invention.

[0032] Figure 2 This is a flowchart of step S0 of a mask pattern repair method provided in the first embodiment of the present invention.

[0033] Figure 3 This is a flowchart of step S0b of a mask pattern repair method provided in the first embodiment of the present invention.

[0034] Figure 4 This is a flowchart of step S1 of a mask pattern repair method provided in the first embodiment of the present invention.

[0035] Figure 5 This is a flowchart of step S12 of a mask pattern repair method provided in the first embodiment of the present invention.

[0036] Figure 6 This is a schematic diagram of the target graphic of a mask pattern repair method provided in the first embodiment of the present invention.

[0037] Figure 7 This is a schematic diagram illustrating the search for candidate locations in a mask pattern repair method provided in the first embodiment of the present invention.

[0038] Figure 8 This is a schematic diagram of the tolerance value of a mask pattern repair method provided in the first embodiment of the present invention.

[0039] Figure 9 This is a schematic diagram of four cases when the target line segment 1 of the mask pattern repair method provided in the first embodiment of the present invention is horizontal.

[0040] Figure 10 This is a schematic diagram of four cases when the target line segment 1 of a mask pattern repair method provided in the first embodiment of the present invention is vertical.

[0041] Figure 11 This is a schematic diagram of the ignored box in a mask layout repair method provided in the first embodiment of the present invention.

[0042] Figure 12 This is a flowchart of global graphical repair provided in the second embodiment of the present invention.

[0043] Figure 13 This is a 20um*20um circuit design pattern provided in the second embodiment of the present invention.

[0044] Figure 14 This is a 1um*1um bad pixel pattern provided in the second embodiment of the present invention.

[0045] Figure 15 This is a 1um*1um corrected pattern provided in the second embodiment of the present invention.

[0046] Figure 16 This is the global graphic provided in the second embodiment of the present invention.

[0047] Figure 17This is a partial cropping of the global graphic with bad pixels provided in the second embodiment of the present invention.

[0048] Figure 18 This is the modified global graphic provided in the second embodiment of the present invention.

[0049] Figure 19 It is a partial cutout of the corrected global graphic with correction points provided in the second embodiment of the present invention.

[0050] Figure 20 This is a schematic diagram of a computer-readable storage medium provided in the third embodiment of the present invention.

[0051] Figure 21 This is a schematic diagram of a graphic restoration device provided in the fourth embodiment of the present invention.

[0052] Explanation of reference numerals in the attached diagram:

[0053] 100. Computer-readable storage media; 200. Graphic restoration equipment;

[0054] 110. Computer program instructions; 210. Equipment body; 220. Equipment operating program. Detailed Implementation

[0055] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention. Please refer to... Figure 1 The first embodiment of the present invention provides a mask layout correction method, comprising the following steps: S1: providing an initial mask layout, the initial mask layout including multiple graphic points, each graphic point having corresponding graphic point information, and obtaining the graphic point information in the initial mask layout; S2: matching the graphic point information in the initial mask layout with bad point information in a preset mask layout matching library, the matching library including bad point information of the mask layout and correction point information corresponding to the bad point information of the mask layout; S3: if bad point information matches a certain graphic point information in the initial mask layout, then the initial mask layout is corrected using the correction point information corresponding to the bad point of the mask layout. It can be understood that in the first embodiment of the present invention, matching the initial mask layout with bad points in the matching library allows for better bad point detection of the initial mask layout through the bad points in the matching library.

[0056] Furthermore, in the first embodiment of the present invention, the portion of the initial mask pattern that successfully matches the bad points in the matching library is directly replaced with the correction point corresponding to the bad point, thereby reducing the time required for repair.

[0057] Furthermore, in the first embodiment of the present invention, for the global design graphic, simulation of key areas is performed, and the graphic is matched with bad points in the matching library. Then, the correction points corresponding to the bad points are used to replace and correct the graphic to be corrected. This can save a significant amount of time and requires only a small amount of computation, thus saving resources. The design graphic can be corrected using minimal resources.

[0058] Please see Figure 2 The first embodiment of the present invention provides a mask layout correction method, which includes step S0 before step S1: S0a: establishing a bad point library containing bad points of the mask layout; S0b: correcting each bad point of the mask layout in the bad point library to obtain the correction point corresponding to the bad point of the mask layout, and storing the correction point corresponding to the bad point of the mask layout in the correction library; S0c: combining the bad point library and the correction library to form a matching library. It can be understood that in the first embodiment of the present invention, the bad point library and the correction library together form a bad point matching library. Specifically, in the first embodiment of the present invention, a bad point library can be established based on the required bad points or past experience. This bad point library mainly contains bad points for the initial mask layout. Using the required bad point library elements can prevent redundant matching in subsequent matching processes, reducing time and saving resources. Specifically, in the first embodiment of the present invention, simulation software is used to correct bad points to obtain correction points corresponding to each bad point and establish a correction library. This allows for direct replacement and correction of bad points in the corrected mask layout without further simulation correction, saving time, reducing computation, and saving resources.

[0059] Furthermore, in the first embodiment of the present invention, the matching library formed by the established bad pixel library and the correction library can ensure that the bad pixels matched subsequently can be directly replaced and corrected by finding their corresponding correction points in the matching library, and there will be no correction error, saving time, reducing computation and saving resources.

[0060] Please see Figure 3 The first embodiment of this invention provides a mask layout correction method. In step S0b, the correction method for each mask layout defective pixel in the defective pixel library is as follows: S0b1: Input each mask layout defective pixel into a simulation correction model; S0b2: The simulation correction model simulates and corrects the mask layout defective pixel to obtain the correction point corresponding to the mask layout defective pixel. It can be understood that in the first embodiment of this invention, each mask layout defective pixel is input into a simulation repair model for simulation and correction to obtain the correction point. This simulation repair of mask layout defective pixels facilitates direct replacement of defective pixels later, eliminating the need for redundant simulation calculations and saving resources.

[0061] Please see Figure 4The first embodiment of the present invention provides a mask layout correction method, wherein step S1 includes: S11: inputting an initial mask layout; S12: performing graphic matching between graphic points in the initial mask layout and at least a portion of bad points in the mask layout from a bad point library. It can be understood that in the first embodiment of the present invention, selecting bad points from the required bad point library for matching allows for the specific selection of bad points from the required bad point library to match the initial mask layout after confirming the type of bad points in the initial mask layout that needs to be addressed. This reduces the computational load required for matching, saves time, and conserves resources.

[0062] Please continue reading. Figure 4 The first embodiment of the present invention provides a mask layout correction method. In step S12, the graphic matching method involves matching graphic point information in the initial mask layout with bad point information in a preset bad point library according to preset matching rules. It can be understood that in the first embodiment of the present invention, graphic matching is performed by setting matching rules. Different matching rules can be set according to the needs, thereby achieving the optimal matching effect while reducing unnecessary computation.

[0063] Furthermore, in the first embodiment of the present invention, the matching method between the graphic points in the initial mask layout and the bad points in the preset bad point library is to match them according to the hash value of the graphic. Specifically, the hash value of the bad points in the bad point library is calculated, and the hash value of the graphic points in the initial mask layout is also calculated. The hash values ​​of the same graphic are equal. That is, if the graphic point in the initial mask layout has the same hash value as the bad point, it means that the graphic point matches the bad point.

[0064] Please see Figure 5 The first embodiment of the present invention provides a mask layout correction method, and step S12 further includes the following step: S12a: setting matching rules, the matching rules including fuzzy matching and precise matching. It can be understood that in the first embodiment of the present invention, graphic matching is performed by setting matching rules. Different matching rules can be set according to the needs, thereby achieving the optimal matching effect while reducing unnecessary calculations.

[0065] Specifically, in the first embodiment of the present invention, when it is necessary to accurately identify defective pixels in the initial mask pattern, precise matching can be used to perform accurate pattern matching to avoid errors. When a large number of defective pixels need to be detected, fuzzy matching can be used to perform matching, thereby reducing the matching time required.

[0066] It should be understood that precise matching uses two line segments with the largest distance and that are perpendicular to each other as target line segments. The graphic within the rectangular area formed by the target line segments is the graphic to be matched, and the matching is determined by whether the graphic to be matched is completely consistent with the feature values ​​of the given graphic. That is, the two parties in precise matching are the graphic in the initial mask layout and the graphic in the mask layout matching library. Precise matching includes the following steps: locating the target line segment in the graphic point information as the subsequent line segment to be matched in the mask layout, and calculating the check value of the target graphic; searching in the mask layout for a combination of line segments with the same length and spatial relationship as the line segment to be matched; obtaining the graphic within the rectangle formed by the combination of line segments as the target to be matched; converting the target to be matched into the shape of the target graphic based on the positioning, rotation, and mirroring information of the line segment to be matched; calculating the check value based on the target to be matched, and if the check value is the same as the check value of the target graphic, the match is successful.

[0067] For example, to locate a target line segment in a target graphic: input the layout file and marker box information, and the target graphic is denoted as the area selected by the marker box. For example... Figure 6 As shown, by sorting the distances of all edges within the marker box to the lower left and lower right corners of the search box, the edges whose midpoints are closest to the vertices of the two search boxes are found, and the lengths of the two edges and the X-axis and Y-axis distances of the midpoints of the two edges are used as the matching criteria.

[0068] Calculate the verification value of the target graphic: Move the lower left corner of the target graphic frame to coincide with the origin of the coordinate system. Calculate the hash values ​​of the X and Y coordinates of the first line segment of the target graphic, and iterate this process until all line segments are calculated. Add the width and height of the marker box to calculate the hash value; this is the final verification value of the target graphic. Hash is a standard verification method that converts data into a unique long integer. For one line segment, perform the following calculation: Set the initial hash value to 0, and recalculate the hash value after adding each new value, sequentially adding the x and y coordinates of the two endpoints of the line segment. The formula is as follows:

[0069]

[0070] For a given shape, traverse all line segments as described above to obtain the final hash value, which is the verification value of the target shape.

[0071] Find the location and transformation information of candidate graphics: Traverse all line segments in the mask layout matching library. When a line segment has the same length as the first target line segment, it is considered that the candidate graphic may exist there. Draw all possible candidate bounding boxes, such as... Figure 7 As shown, subsequent filtering operations are performed. Based on the directional relationship between the two target line segments, the rotation and mirror information of the candidate graphics can be obtained. For example... Figure 8 and Figure 9Eight possible cases are given, including vertical and horizontal scenarios for target line segment 1. Marked boxes are selected, and candidate graphics are reverse-converted into the form of the target graphic for checksum calculation. Checksum calculation and matching: The hash values ​​of all candidate frames are calculated using the above method. If the checksum of a candidate frame matches the checksum of the target graphic, the match is successful, and the coordinate information of the candidate frame is output. Fuzzy matching, on the other hand, is based on precise matching. Before calculating the checksum, the fuzzy parts of the matching graphic are removed to tolerate moderate variations in specific parts. This includes the following steps: Locating the target line segment in the graphic point information, removing the fuzzy parts, and calculating the target graphic checksum; searching for the target line segment in the mask layout matching library to find candidate graphics; based on the rotation and mirror information of the target line segment, reverse-converting it into the form of the target graphic; removing the fuzzy parts, calculating the checksum based on the remaining line segment length; if the checksum is the same as the target graphic, the match is successful. It should be understood that the blurred parts can be divided into two categories: one is the ignored box, which deletes all graphics within the ignored box when calculating the check value; the other is the tolerance line, which deletes the blurred parts and shortens the line segments connected to the tolerance line to the minimum value of the tolerance interval when calculating the check value. When there is information input about blurred edges or ignored boxes, the fuzzy matching function is enabled. The ignored box directly deletes all graphics within the candidate box area for the target graphic. For candidate boxes, such as... Figure 10 As shown (dashed boxes indicate ignored boxes), first obtain its rotation and mirror information using the method described above, then delete all graphics within the corresponding area. The blurred edge is an input edge that can be stretched or shortened; a tolerance value must also be input to set the applicable range of the blurred edge. The line segments connected to the blurred edge are designated as special target line segments, and they are reduced to the minimum tolerance value to calculate the verification value, such as... Figure 11 As shown, the tolerance line is not included in the calculation of the check value.

[0072] Please continue reading. Figure 5 The first embodiment of the present invention provides a mask layout correction method, which further includes the following step after step S12a: S12b: Selecting some or all of the bad pixel information in the bad pixel library to form a preset bad pixel library. It can be understood that in the first embodiment of the present invention, bad pixels in the bad pixel library can be selected based on the initial mask layout or the type of bad pixels in the mask layout to be repaired, thereby selecting the bad pixels in the required bad pixel library for matching with the mask layout to be repaired. This can better reduce unnecessary calculations, save time, and conserve resources. Specifically, steps S12a and S12b are both performed between steps S11 and S12, and the order of steps S12a and S12b is not required in this embodiment of the present invention.

[0073] The first embodiment of the present invention provides a mask layout correction method, wherein step S3 includes: S31: successful matching; S32: using the correction point information corresponding to the bad points in the mask layout to replace the initial mask layout information for correction. It can be understood that in the first embodiment of the present invention, if the matching is successful, the correction point information corresponding to the bad points in the mask layout is used to replace the graphic point information in the initial mask layout for correction. Specifically, after the initial mask layout and the bad points in the bad point library are successfully matched, the correction points corresponding to the bad points in the matching bad point library in the correction library are used to replace the corresponding positions on the initial mask layout. This allows the initial mask layout to be directly corrected for bad points without separate simulation correction, reducing the time spent repairing bad points on the initial mask layout, reducing the need for re-simulation, and saving resources.

[0074] The first embodiment of this invention provides a mask layout correction method, which further includes the following step after step S3: S4: Output the corrected mask layout. It can be understood that in the first embodiment of this invention, after completing the initial defective pixel replacement correction, the corrected mask layout is output. The corrected mask layout can be obtained without performing simulation calculations on the initial mask layout; that is, the corrected mask layout can be directly output. This saves time in repairing the mask layout and reduces resource usage.

[0075] Preferably, outputting the corrected mask layout further includes the following steps: continuing to match the graphic point information in the initial mask layout with the bad point information in the bad point library; if the match is successful, then continuing to correct the initial mask layout; if the match fails, then outputting the corrected mask layout.

[0076] In summary, the first embodiment of the present invention provides a mask layout correction method. First, a bad pixel library, a correction library, and a bad pixel matching library with one-to-one correspondence between bad pixels and correction points are established. Second, an initial mask layout is input, matching rules are set, and bad pixels to be matched are selected. Then, the bad pixels on the initial mask layout that have successfully matched the bad pixels are replaced with the corresponding correction points. Finally, the corrected initial mask layout is output.

[0077] Combination Figures 12 to 19The second embodiment of this invention provides a mask layout correction method. Understandably, the second embodiment uses a 20µm*20µm circuit design pattern as the global design pattern, a bad pixel library containing a 1µm*1µm bad pixel pattern, and a correction library containing a 1µm*1µm correction pattern. The bad pixel pattern in the bad pixel library is matched to the global design pattern, and the correction pattern in the correction library is used to replace it. Specifically, in the second embodiment, the process is as follows: S201: Input the global design pattern; S202: Perform pattern matching; S203: Perform pattern replacement correction; S204: Output the corrected global pattern. Understandably, the second embodiment of this invention uses a mask layout correction method described in the first embodiment, which has the same beneficial effects as the first embodiment, and will not be elaborated further here.

[0078] Please continue reading. Figure 16 and Figure 17 In the second embodiment of this invention, a matching rule is set for matching, that is, a hash value calculation is performed on the global design graphic and the bad pixel graphic. If the hash values ​​of the global design graphic and the bad pixel graphic are the same, the match is successful. It can be understood that... Figure 16 For global graphics, Figure 17 Extract the portion of the image containing defective pixels from the global image.

[0079] Please continue reading. Figure 18 and Figure 19 In the second embodiment of this invention, for the bad points after successful matching, the bad points in the global graphic are corrected and replaced using the correction points in the correction library corresponding to the bad points in the bad point library, resulting in a corrected global graphic. It can be understood that... Figure 18 This is the corrected global graphic. Figure 19 This is a cutoff of the portion of the global graph containing the correction points.

[0080] Please see Figure 20 The third embodiment of the present invention provides a computer-readable storage medium 100 having computer program instructions 110 thereon. When the computer program instructions 110 are executed by a processor, they implement the aforementioned mask layout correction method. It is understood that the computer-readable storage medium 100 in the third embodiment of the present invention stores the computer program instructions 110, which can be called by a processor to execute the mask layout correction method described in the first embodiment. The computer-readable storage medium 100 has the same beneficial effects as the aforementioned mask layout correction method, which will not be elaborated here.

[0081] Specifically, the computer-readable storage medium 100 may be an electronic memory such as flash memory, EEPROM (Electrically Erasable Programmable Read-Only Memory), EPROM, hard disk, or ROM. Optionally, the computer-readable storage medium 100 includes a non-volatile computer-readable medium. Specifically, the computer-readable storage medium 100 has storage space for computer program instructions 110 that perform any of the method steps described above. These program instructions can be read from or written to one or more computer program products. Optionally, the computer program instructions 110 may be compressed in an appropriate form.

[0082] Please see Figure 21 The fourth embodiment of the present invention provides a pattern restoration device 200, including a device body 210 and a device running program 220. When the device body 210 executes the device running program 220, it implements the aforementioned mask layout correction method. It is understood that when the pattern restoration device 200 in the fourth embodiment of the present invention is running, the device body 210, when executing the device running program 220, can implement the method described in the first embodiment. The pattern restoration device 200 has the same beneficial effects as the aforementioned mask layout correction method, which will not be elaborated here.

[0083] In the embodiments provided by this invention, it should be understood that "B corresponding to A" means that B is associated with A, and B can be determined based on A. However, it should also be understood that determining B based on A does not mean that B is determined solely based on A; B can also be determined based on A and / or other information.

[0084] It should be understood that the phrase "one embodiment" or "an embodiment" throughout the specification means that a specific feature, structure, or characteristic related to the embodiment is included in at least one embodiment of the invention. Therefore, "in one embodiment" or "in an embodiment" appearing throughout the specification does not necessarily refer to the same embodiment. Furthermore, these specific features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. Those skilled in the art should also recognize that the embodiments described in the specification are optional embodiments, and the actions and modules involved are not necessarily essential to the invention.

[0085] The flowcharts and block diagrams in the accompanying drawings illustrate the architecture, functionality, and operation of possible implementations of systems, methods, and computer program products according to various embodiments of this application. In this regard, each block in a flowchart or block diagram may represent a module, segment, or portion of code containing one or more executable instructions for implementing a specified logical function. It should also be noted that in some alternative implementations, the functions indicated in the blocks may occur in a different order than those indicated in the drawings. For example, two consecutively indicated blocks may actually be executed substantially in parallel, and they may sometimes be executed in reverse order, depending on the functions involved. It is particularly important to note that each block in the block diagrams and / or flowcharts, and combinations of blocks in the block diagrams and / or flowcharts, can be implemented using a dedicated hardware-based system that performs the specified function or operation, or using a combination of dedicated hardware and computer instructions.

[0086] The above provides a detailed description of a mask layout correction method disclosed in the embodiments of the present invention. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of the present invention. Therefore, the content of this specification should not be construed as a limitation of the present invention. Any modifications, equivalent substitutions, and improvements made within the principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A method for correcting a mask layout, characterized in that: Includes the following steps: Provide an initial mask layout and obtain graphic point information in the initial mask layout; The graphic point information in the initial mask layout is matched with bad point information in a preset mask layout matching library. The mask layout matching library includes bad point information of the mask layout and correction point information corresponding to the bad point information of the mask layout. If a defective pixel matches a certain graphic point in the initial mask layout, the initial mask layout is corrected using the correction point information corresponding to the defective pixel in the mask layout. The step of matching the graphic point information in the initial mask layout with the bad point information in the preset bad point library includes: performing graphic matching between the graphic points in the initial mask layout and at least a portion of the bad points in the mask layout in the bad point library, wherein the graphic matching includes: matching the graphic point information in the initial mask layout with the bad point information in the preset bad point library according to preset matching rules, wherein the preset matching rules include fuzzy matching and precise matching; The precise matching includes the following steps: locating the target line segment in the graphic point information and calculating the verification value of the target graphic; searching for the line segment to be matched in the matching library; based on the positioning, rotation, and mirroring information of the line segment to be matched, taking the graphic within the rectangular area formed by the line segment to be matched as the target graphic to be matched, and converting it in reverse to the shape of the target graphic; calculating the verification value based on the line segment in the target graphic to be matched, and if the verification value is the same as the verification value of the target graphic, the match is successful; The fuzzy matching includes the following steps: locating the target line segment in the graphic point information, removing the fuzzy part and calculating the target graphic verification value; searching the target line segment in the matching library to find candidate graphics; locating the rotation and mirror information of the target line segment and converting it in reverse to the shape of the target graphic; removing the fuzzy part, calculating the verification value based on the remaining line segment, and if the verification value is the same as the target graphic, the match is successful. The target line segments are the two line segments in the target graphic that are the furthest apart and perpendicular to each other; the verification value is obtained by calculating the hash value based on the endpoint coordinates of all line segments in the target graphic or the target graphic to be matched.

2. The mask layout correction method as described in claim 1, characterized in that: The provision of the initial mask layout, preceding the following, also includes: Establish a defect library containing defective pixels from the aforementioned mask layout; Each mask layout defect in the defect library is corrected to obtain the correction point corresponding to the mask layout defect, and the correction point corresponding to the mask layout defect is stored in the correction library; The bad pixel library and the correction library are combined to form the matching library.

3. The mask layout correction method as described in claim 2, characterized in that: The method for correcting each bad pixel in the mask layout in the bad pixel library is as follows: Each defective pixel in the mask layout is input into a preset simulation correction model; The simulation correction model simulates and corrects the bad points in the mask layout to obtain the correction points corresponding to the bad points in the mask layout.

4. The mask layout correction method as described in claim 1, characterized in that: Select some or all of the bad pixel information in the bad pixel library to form the preset bad pixel library.

5. The mask layout correction method as described in claim 4, characterized in that: If a match is successful, the correction point information corresponding to the bad points in the mask layout is used to replace the graphic point information in the initial mask layout for correction.

6. The mask layout correction method as described in claim 1, characterized in that: The above method, after modification, also includes the following steps: Continue to match the graphic point information in the initial mask layout with the bad point information in the bad point library. If the match is successful, continue to correct the initial mask layout. If the match fails, the corrected mask layout will be output.

7. A computer-readable storage medium storing computer program instructions thereon, characterized in that: When the computer program instructions are executed by the processor, they implement the method as described in any one of claims 1-6.

8. A graphic restoration device, characterized in that: It includes a device body and a device operating program, wherein the device body implements the method as described in any one of claims 1-6 when executing the device operating program.

Images