A charged particle beam current measuring device

Abstract

The present invention discloses a charged particle beam current measurement device, comprising a box body, one end face of which is a graphite baffle, and the other end face of which is a back plate. The box body is sequentially provided with one or more reflective electrode measuring cups, a connecting plate, and a terminal detection measuring cup, the reflective electrode measuring cup being adjacent to the graphite baffle, and the terminal detection measuring cup being adjacent to the back plate. An insulating block is provided within a groove on the connecting plate, and graphite is contained within the insulating block. The present invention has the advantages of a simple structure, ease of manufacture, and ease of assembly and disassembly.

Description

Technical Field

[0001] The present invention mainly relates to the field of semiconductor manufacturing technology, and in particular to a charged particle beam current measurement device, which is particularly suitable for ion implantation equipment and is a key device for optical path detection in high-energy ion implantation equipment. Background Art

[0002] With the continuous advancement of integrated circuit manufacturing technology, process complexity continues to increase, and the requirements for ion implantation equipment are also increasing. The charged particle beam is screened by the mass analyzer of the high-energy ion implanter and accelerated by the radio frequency barrel to reach energies on the order of hundreds of kiloelectronvolts. After electrical scanning, the ion beam changes horizontally from a spot beam to a ribbon beam. It is injected into the wafer surface, thereby changing the wafer's physical processing properties. Beam uniformity and stability are important parameters reflecting beam quality and are important factors directly affecting the performance of semiconductor components. Controlling beam uniformity and stability requires a beam measurement device to analyze and detect beam status to ensure high-quality and stable operation of the ion implantation process. To ensure measurement accuracy, the beam measurement device must operate stably and accurately.

[0003] At present, there are some technical deficiencies in the beam measurement device of high-energy ion implanters:

[0004] 1. The existing high-energy ion implanter beam current measurement device is based on the low-energy, large-beam ion implanter. The graphite baffle of the beam current measurement device is not designed with limit holes and other structures for measuring the height parameters of the incident ion beam current, making it impossible to accurately understand the height parameters of the incident ion beam current.

[0005] 2. The beam current measurement device is not designed with a magnetic suppression device and lacks magnetic suppression functionality, thus failing to eliminate measurement errors caused by ions backscattered after impacting the electrodes. A magnetic suppression device generates a magnetic field that forces ions to strike the sides of the inner electrode, suppressing the escape of backscattered ions.

[0006] 3. The beam current measurement device measures the one-dimensional distribution of the charged ion beam current by scanning the reflective electrode meter cup in the horizontal direction. Since there is no beam measuring graphite cup designed in the vertical direction, it cannot measure the two-dimensional distribution of the charged ion beam current. Summary of the Invention

[0007] The technical problem to be solved by the present invention is: in view of the technical problems existing in the prior art, the present invention provides a charged particle beam measurement device with a simple structure, simple manufacture and easy assembly and disassembly.

[0008] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0009] A charged particle beam measuring device includes a box body, one end face of the box body is a graphite baffle, and the other end face of the box body is a back plate; one or more reflecting electrode metering cups, a connecting plate and a terminal detection metering cup are sequentially arranged in the box body, the reflecting electrode metering cup is close to the graphite baffle, and the terminal detection metering cup is close to the back plate; an insulating block is provided in a groove on the connecting plate, and graphite is provided in the insulating block.

[0010] As a further improvement of the method of the present invention: the box body is formed by a first cover plate, a second cover plate, a graphite baffle, a support frame, a back plate and a top plate.

[0011] As a further improvement to the method of the present invention: the connecting plate is pressed and fitted by the first cover plate, and is connected and fixed to the support frame and the top plate by screws.

[0012] As a further improvement of the method of the present invention: the insulating block insulates the small rectangular graphite from the connecting plate, and high and low beam detection line interfaces are reserved on the upper and lower top surfaces for fixedly connecting high and low beam detection lines, which are used for signal transmission.

[0013] As a further improvement of the method of the present invention: the reflecting electrode metering cup is fixed in the groove of the first reflecting electrode directional seat and the second reflecting electrode directional seat, with a terminal interface reserved and terminal and connector installed; the first reflecting electrode directional seat and the second reflecting electrode directional seat ensure that the reflecting electrode metering cup is insulated from the top plate and the support frame respectively.

[0014] As a further improvement of the method of the present invention: the terminal detection measuring cup is fixed in the groove of the first terminal directional seat and the second terminal directional seat, and a terminal post interface is reserved; the first terminal directional seat and the second terminal directional seat ensure that the terminal detection measuring cup is insulated from the top plate and the support frame.

[0015] As a further improvement of the method of the present invention: the graphite baffle is connected to the support frame and the top plate by screws.

[0016] As a further improvement to the method of the present invention: the graphite baffle is provided with an elongated slit, and the elongated slit is used for passing the parallel beam.

[0017] As a further improvement to the method of the present invention: the elongated slit is in the shape of an inverted pyramid.

[0018] As a further improvement of the method of the present invention: the graphite baffle is provided with a limiting hole, and the limiting hole is used to measure the height of the parallel ribbon beam and feedback signal.

[0019] Compared with the prior art, the advantages of the present invention are:

[0020] The charged particle beam current measurement device of the present invention features a simple structure, easy fabrication, and ease of assembly and disassembly. The graphite baffle is designed with a limit hole, and supporting structures such as small rectangular graphite and insulating blocks are placed in the connecting plate. These components can be used to measure the height of an incident ion beam. The device can measure ion beam parameters, perform real-time online monitoring and analysis of beam status, and provide data feedback for controlling beam uniformity and stability.

[0021] 2. The charged particle beam current measuring device of the present invention is assembled by fastening various parts with screws, and has a compact structure and is easy to disassemble and maintain.

[0022] 3. The charged particle beam current measuring device of the present invention has a simple installation interface, can be applied to a variety of occasions requiring measurement of ion beam current parameters, and has good interchangeability. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the overall structural principle of the device of the present invention.

[0024] Figure 2 It is a schematic diagram of the decomposition structure principle of the device of the present invention.

[0025] Legend:

[0026] 1. Graphite baffle; 2. Reflecting electrode measuring cup; 3. Second reflector orientation seat; 4. Second terminal orientation seat; 5. Top plate; 6. Connecting plate; 7. Graphite; 8. Insulating block; 9. First cover plate; 10. Support frame; 11. Terminal detection measuring cup; 12. First terminal orientation seat; 13. First reflector orientation seat; 14. Second cover plate; 15. Back plate; 16. Cable cover plate. DETAILED DESCRIPTION

[0027] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0028] In the description of this application, it should be understood that the terms "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on this application.

[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. Throughout the description of this application, "plurality" means two or more, unless otherwise specifically defined.

[0030] In this application, unless otherwise specified or limited, the terms "assemble," "connect," "connect," "fix," and the like should be understood in a broad sense. For example, they may refer to fixed connection, detachable connection, or integration; mechanical connection or electrical connection; direct connection or indirect connection through an intermediate medium; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0031] like Figure 1 and Figure 2 As shown, a charged particle beam current measuring device of the present invention is applicable to ion implantation equipment, and comprises:

[0032] A box body, one end surface of the box body is a graphite baffle 1, and the other end surface of the box body is a back plate 15;

[0033] The box body is sequentially provided with one or more reflective electrode measuring cups 2, a connecting plate 6 and a terminal detection measuring cup 11. The reflective electrode measuring cup 2 is close to the graphite baffle 1, and the terminal detection measuring cup 11 is close to the back plate 15.

[0034] An insulating block 8 is provided in the groove on the connecting plate 6, and graphite 7 is provided in the insulating block 8. The graphite 7 is used to collect incident ion beam signals.

[0035] In a specific application example, the box body is formed by a first cover plate 9 , a second cover plate 14 , a graphite baffle 1 , a support frame 10 , a back plate 15 and a top plate 5 .

[0036] In a specific application example, the terminal detection metering cup 11 is used to collect the incident ion beam, perform incident ion beam state analysis, and convert the beam into an external measurement current output.

[0037] In a specific application example, the three-layer reflective electrode measuring cup 2 can effectively prevent external electrons from entering the Faraday cup, and at the same time effectively suppress the electron overflow generated by the ion beam bombarding the cup body of the terminal detection measuring cup 11, which can effectively improve the accuracy of the charged particle beam measurement.

[0038] In a specific application example, the graphite 7 (eg, a small rectangular graphite) is placed in the groove of the insulating block 8 (eg, an insulating square block), fixed by screws, and placed as a whole in the square groove of the connecting plate 6.

[0039] In a specific application example, the connecting plate 6 is pressed tightly against the first cover plate 9 and fixed to the support frame 10 and the top plate 5 with screws. The insulating block 8 insulates the small rectangular graphite 7 from the connecting plate 6. Its upper and lower top surfaces reserve interfaces for high and low beam current detection lines, which are used to securely connect the high and low beam current detection lines used for signal transmission.

[0040] In a specific application example, the reflecting electrode metering cup 2 is three-layered, and the three-layer reflecting electrode metering cup 2 is fixed in the rectangular groove of the first reflecting electrode directional seat 13 and the second reflecting electrode directional seat 3. It has a reserved terminal interface and is equipped with terminal posts and connectors, and is fastened with nuts and gaskets.

[0041] In a specific application example, the first reflector directional seat 13 and the second reflector directional seat 3 are provided with through holes, which are used to fixedly connect with the reflector electrode measuring cup 2, the top plate 5 and the support frame 10. The first reflector directional seat 13 and the second reflector directional seat 3 ensure that the reflector electrode measuring cup 2 is insulated from the top plate 5 and the support frame 10.

[0042] In a specific application example, the first reflector directional seat 13 is fixed to the support frame 10 by using three positioning pins, and the second reflector directional seat 3 is fixed to the top plate 5 by using springs and screws.

[0043] In a specific application example, the terminal detection measuring cup 11 is fixed in the rectangular groove of the first terminal directional seat 12 and the second terminal directional seat 4, and a terminal interface is reserved.

[0044] The first terminal orientation seat 12 and the second terminal orientation seat 4 have through holes, which are used to fixedly connect the terminal detection metering cup 11, the top plate 5 and the support frame 10. The first terminal orientation seat 12 and the second terminal orientation seat 4 ensure that the terminal detection metering cup 11 is insulated from the top plate 5 and the support frame 10.

[0045] In a specific application example, the first terminal directional seat 12 and the second terminal directional seat 4 keep the terminal detection metering cup 11 insulated from the support frame 10, and the cover plate 9 is connected to the support frame 10 and the top plate 5 by screws.

[0046] In a specific application example, the graphite baffle 1 is connected to the support frame 10 and the top plate 5 by screws.

[0047] In a specific application example, the graphite baffle 1 is designed with an elongated slit and a limiting hole. The elongated slit is used to pass the parallel beam, and the limiting hole is used to measure the height of the parallel ribbon beam and feedback the signal.

[0048] In a specific application example, the elongated slit is in the shape of an inverted pyramid, which facilitates the beam to enter the cup body.

[0049] The above are merely preferred embodiments of the present invention. The scope of protection of the present invention is not limited to the above embodiments. All technical solutions based on the principles of the present invention are within the scope of protection of the present invention. It should be noted that for those skilled in the art, various improvements and modifications that do not depart from the principles of the present invention should be considered within the scope of protection of the present invention.

Claims

1. A charged particle beam current measuring device, characterized in that: The invention comprises a box body, wherein one end face of the box body is a graphite baffle (1), and the other end face of the box body is a back plate (15); one or more reflective electrode measuring cups (2), a connecting plate (6) and a terminal detection measuring cup (11) are arranged in the box body, wherein the reflective electrode measuring cup (2) is close to the graphite baffle (1), and the terminal detection measuring cup (11) is close to the back plate (15); the connecting plate (6) is pressed and fitted by a first cover plate (9), and is connected and fixed to the support frame (10) and the top plate (5) by screws; an insulating block (8) is arranged in a groove on the connecting plate (6), and graphite (7) is arranged in the insulating block (8); The box body is formed by a first cover plate (9), a second cover plate (14), a graphite baffle (1), a support frame (10), a back plate (15) and a top plate (5); The insulating block (8) insulates the small rectangular graphite (7) from the connecting plate (6), and the upper and lower top surfaces of the insulating block (8) reserve high and low beam current detection line interfaces for fixedly connecting the high and low beam current detection lines, which are used for signal transmission; The graphite baffle (1) is provided with a limiting hole, and the limiting hole is used to measure the height of the parallel ribbon beam.

2. The charged particle beam current measuring device according to claim 1, characterized in that: The reflective electrode metering cup (2) is fixed in the grooves of the first reflective electrode directional seat (13) and the second reflective electrode directional seat (3), with a terminal interface reserved and a terminal and a connector installed; the first reflective electrode directional seat (13) and the second reflective electrode directional seat (3) respectively insulate the reflective electrode metering cup (2) from the top plate (5) and the support frame (10).

3. The charged particle beam current measuring device according to claim 1, wherein: The terminal detection metering cup (11) is fixed in the grooves of the first terminal directional seat (12) and the second terminal directional seat (4), with a terminal terminal interface reserved; the first terminal directional seat (12) and the second terminal directional seat (4) ensure that the terminal detection metering cup (11) is insulated from the top plate (5) and the support frame (10).

4. The charged particle beam current measuring device according to any one of claims 1 to 3, characterized in that: The graphite baffle (1) is connected to the support frame (10) and the top plate (5) via screws.

5. The charged particle beam current measuring device according to any one of claims 1 to 3, characterized in that: The graphite baffle (1) is provided with an elongated slit, and the elongated slit is used for passing the parallel beam.

6. The charged particle beam current measuring device according to claim 5, characterized in that: The elongated slit is in an inverted pyramid shape.

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