Nitride-based semiconductor devices and their manufacturing methods

By introducing diodes and transistors of specific specifications into nitride-based semiconductor devices, the problem of overvoltage breakdown during the miniaturization of HEMTs was solved, thereby improving the reliability and stability of the devices.

CN115966566BActive Publication Date: 2026-05-26INNOSCIENCE (ZHUHAI) TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
INNOSCIENCE (ZHUHAI) TECH CO LTD
Filing Date
2022-11-21
Publication Date
2026-05-26

AI Technical Summary

Technical Problem

In the miniaturization of high electron mobility transistors (HEMTs), how to maintain the reliability of the device, especially to avoid the risk of transistor overvoltage breakdown in high power and high frequency applications.

Method used

In a nitride-based semiconductor device, first and second diodes are introduced and connected to the gate and drain of a transistor, respectively. This ensures that the breakdown voltage of the diodes is different from that of the transistor, thereby clamping the transistor under overvoltage conditions and preventing overvoltage breakdown.

Benefits of technology

By using the clamping effect of the diode, the risk of transistor breakdown under overvoltage conditions is effectively reduced, ensuring that the device operates within a safe voltage range and improving the device's reliability and stability.

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Abstract

A nitride-based semiconductor device and its manufacturing method are disclosed. The nitride-based semiconductor device includes a first nitride semiconductor layer, a second nitride semiconductor layer, a transistor, a first diode, and a second diode. The second nitride semiconductor layer is disposed on the first nitride semiconductor layer, and the band gap of the second nitride semiconductor layer is larger than that of the first nitride semiconductor layer. The transistor is disposed on the second nitride semiconductor layer. The first diode is disposed on the second nitride semiconductor layer, and the cathode of the first diode is connected to the gate of the transistor. The second diode is disposed on the second nitride semiconductor layer, and the cathode of the second diode is connected to the drain of the transistor, and the anode of the first diode is connected to the anode of the second diode, wherein the breakdown voltage of the second diode is less than the breakdown voltage of the transistor.
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