Method of controlling an exposure system and exposure system

Abstract

This invention discloses a control method and an exposure system for an exposure system. The control method includes: acquiring the operating parameters of the exposure system and the exposure dose input value of the photosensitive material of the exposure system; obtaining the single-pulse emission energy of the pulsed laser based on the operating parameters and the exposure dose input value; acquiring the position synchronization signal of the motion platform; controlling the pulsed laser to emit laser light based on the position synchronization signal and the single-pulse emission energy; and controlling the flip state of the spatial light modulator based on the position synchronization signal. This method solves the problem of excessively thick horizontal lines caused by the increased scanning speed of the motion platform by controlling the output laser pulses of the pulsed laser, effectively improving the productivity of the exposure system, ensuring the accuracy of the exposed pattern, and improving the accuracy of the exposed pattern and the utilization rate of laser energy due to the use of a pulsed laser.

Description

Technical Field

[0001] This invention relates to the field of exposure system technology, and in particular to a control method and an exposure system for an exposure system. Background Technology

[0002] Most existing exposure systems use continuous lasers. When the motion platform speeds up, the continuous laser in continuous light output mode will cause the horizontal lines exposed perpendicular to the scanning direction to be too thick, making it difficult to balance the production capacity of the exposure system with the accuracy of the exposed pattern.

[0003] In related technologies, to address the issue of excessively thick horizontal lines during the acceleration of the motion platform and to improve the productivity of the exposure system, the scanning step size of the motion platform is increased when the flipping frequency of the DMD (Digital Micro Mirror Device) is constant. However, this method is limited by the operating mode of the exposure system; directly increasing the scanning step size leads to excessively wide horizontal lines, thus affecting the improvement of the exposure system's productivity. Another approach is to modulate the laser's output by adjusting the flipping of the DMD within one scan cycle of the motion platform's movement. During periods when the laser does not need to emit light, the DMD deflects the emitted laser light. Since the ultimate flipping frequency of the DMD is fixed, it is difficult to further change the DMD's flipping state within one scan cycle using conventional methods. Since the time it takes for the DMD to load to a zero state is one-quarter of the time it takes to load a normal image, excess laser light can be deflected by zeroing the DMD. However, this method increases the scanning cycle time by adding all zero states to the DMD within a scan cycle, thus increasing the complexity of exposure data processing. Furthermore, since the scanning speed is positively correlated with the DMD's flip frequency, the exposure speed of the exposure system is sacrificed to some extent. Additionally, deflecting excess laser light by zeroing the DMD wastes laser energy and increases the cost of the exposure system. Summary of the Invention

[0004] This invention aims to at least solve one of the technical problems existing in the prior art. To this end, one objective of this invention is to propose a control method for an exposure system. This method, by controlling the output of laser pulses from a pulsed laser, solves the problem of excessively thick horizontal lines caused by increased scanning speed of the motion platform, effectively improving the productivity of the exposure system, ensuring the accuracy of the exposed pattern, and, due to the use of a pulsed laser, improving the precision of the exposed pattern and the utilization rate of laser energy.

[0005] The second objective of this invention is to provide an exposure system.

[0006] To address the aforementioned problems, a first aspect of the present invention provides a control method for an exposure system. The exposure system includes a pulsed laser, a spatial light modulator, an imaging objective, a motion platform, and an exposure substrate. The control method includes: acquiring operating parameters of the exposure system and an exposure dose input value of the photosensitive material of the exposure system; obtaining the single-pulse emission energy of the pulsed laser based on the operating parameters and the exposure dose input value; acquiring a position synchronization signal of the motion platform; controlling the pulsed laser to emit laser light based on the position synchronization signal and the single-pulse emission energy; and controlling the flip state of the spatial light modulator based on the position synchronization signal.

[0007] According to the control method of the exposure system of the present invention, the computer calculates the single-pulse emission energy of the pulsed laser based on the user-inputted working parameters and the exposure dose input value. After the pulsed laser receives the position synchronization signal of the motion platform, the pulsed laser generates a laser pulse within one scanning cycle of the spatial light modulator. At the same time, after receiving the position synchronization signal of the motion platform, the spatial light modulator controls the spatial light modulator to flip, thereby transferring the exposure pattern to the exposure substrate mounted on the motion platform. Thus, in this application, the pulsed laser is triggered to emit a laser pulse by the position synchronization signal, thereby solving the problem of excessively thick horizontal lines caused by the increase in the scanning speed of the motion platform, effectively improving the productivity of the exposure system, and ensuring the accuracy of the exposure pattern.

[0008] In some embodiments, obtaining the operating parameters of the exposure system includes: obtaining the scanning width, scanning speed, current tilt angle of the spatial light modulator, flip frequency of the spatial light modulator, and mirror spacing of the spatial light modulator; determining the grid precision of the spatial light modulator based on the current tilt angle and mirror spacing of the spatial light modulator; and determining the required number of grid precisions of the spatial light modulator in one scanning cycle based on the grid precision, the scanning speed, and the flip frequency.

[0009] In some embodiments, obtaining the single-pulse emission energy of the pulsed laser based on the operating parameters and the exposure dose input value includes: determining the scan length of the exposure system in one scan cycle based on the grid accuracy and the required number of grid accuracies; and obtaining the single-pulse emission energy of the pulsed laser based on the scan length, the scan width, and the exposure dose input value.

[0010] In some embodiments, determining the scan length of the exposure system within one scan cycle based on the grid precision and the required grid precision quantity includes: obtaining the single-pulse emission energy using the following formula:

[0011] L=m*PW

[0012] Wherein, is the scan length, PW is the grid precision, and m is the required number of grid precisions.

[0013] In some embodiments, obtaining the single-pulse emission energy of the pulsed laser based on the scan length, the scan width, and the exposure dose input value includes obtaining the single-pulse emission energy using the following formula:

[0014] Q = E * d * L

[0015] Where Q is the single-pulse emission energy, E is the exposure dose input value, d is the scan width, and L is the scan length.

[0016] In some embodiments, controlling the pulsed laser to emit laser light according to the position synchronization signal and the single-pulse emission energy includes: obtaining the duty cycle of the position synchronization signal according to the single-pulse emission energy; obtaining the falling edge time of the position synchronization signal according to the duty cycle of the position synchronization signal; and triggering the pulsed laser to emit laser light according to the single-pulse emission energy at the falling edge time of the position synchronization signal.

[0017] In some embodiments, controlling the flip state of the spatial light modulator according to the position synchronization signal includes: controlling the spatial light modulator to flip at the rising edge of the position synchronization signal.

[0018] A second aspect of the present invention provides an exposure system comprising: a pulsed laser, a spatial light modulator, an imaging objective, a motion platform, and an exposure substrate; and a controller connected to the pulsed laser, the spatial light modulator, and the motion platform, for executing the control method of the exposure system described in the above embodiment.

[0019] According to the exposure system of the present invention, the problem of excessively thick horizontal lines caused by the increase in scanning speed of the motion platform can be solved by controlling the output of laser pulses from the pulsed laser, thereby effectively improving the production capacity of the exposure system and ensuring the accuracy of the exposed pattern.

[0020] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0021] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0022] Figure 1 This is a schematic diagram of an exposure system according to an embodiment of the present invention;

[0023] Figure 2 This is a flowchart of a control method for an exposure system according to an embodiment of the present invention;

[0024] Figure 3 This is a schematic diagram of the exposure system control timing according to an embodiment of the present invention.

[0025] Figure label:

[0026] Exposure System 10;

[0027] Controller 1; Pulsed laser 2; Spatial light modulator 3; Imaging objective 4; Motion platform 5; Exposure substrate 6. Detailed Implementation

[0028] The embodiments of the present invention are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present invention are described in detail below.

[0029] To address the aforementioned problems, the first aspect of this invention proposes a control method for an exposure system. This method can control the output of laser pulses from a pulsed laser, thereby solving the problem of excessively thick horizontal lines caused by the increased scanning speed of the motion platform. This effectively improves the productivity of the exposure system, ensures the accuracy of the exposed pattern, and, due to the use of a pulsed laser, enhances the precision of the exposed pattern and the utilization rate of laser energy.

[0030] In an embodiment, such as Figure 1 As shown, the exposure system 10 includes a pulsed laser 2, a spatial light modulator 3, an imaging objective lens 4, a motion platform 5, and an exposure substrate 6. The exposure system completes the transfer of the exposure pattern through the cooperation and precise coordination between the pulsed laser, the spatial light modulator, and the motion platform.

[0031] The following is for reference. Figure 2 A control method for an exposure system according to an embodiment of the present invention is described, such as... Figure 2 As shown, the control method includes steps S1 to S5.

[0032] Step S1: Obtain the operating parameters of the exposure system and the exposure dose input value of the photosensitive material of the exposure system.

[0033] The operating parameters can be understood as the parameters required for the exposure system to operate. For example, the operating parameters may include the flip frequency of the spatial light modulator and the scanning step size of the motion platform, etc., and there are no restrictions on them.

[0034] Specifically, the user inputs the operating parameters of the exposure system and the exposure dose input value of the photosensitive material of the exposure system into the computer, and the computer automatically obtains the operating parameters of the exposure system set by the user and the exposure dose input value of the photosensitive material of the exposure system entered by the user.

[0035] Step S2: Obtain the single-pulse emission energy of the pulsed laser based on the operating parameters and exposure dose input values.

[0036] Specifically, the user inputs the operating parameters and exposure dose values ​​into the computer, and the computer can then calculate the single-pulse emission energy of the pulsed laser based on these parameters and values.

[0037] Step S3: Obtain the position synchronization signal of the motion platform.

[0038] Specifically, the computer sends instructions to control the exposure system to the motion platform controller. The motion platform controller moves the platform carrying the exposure substrate. During this movement, the laser interferometer or grating ruler of the exposure system provides real-time feedback on the position of the motion platform. The motion platform controller outputs a position synchronization signal based on the platform's position. For example, when the laser interferometer or grating ruler detects that the motion platform has moved to a designated position, the motion platform controller outputs the position synchronization signal and sends it to the controllers of the pulsed laser and the spatial light modulator. The pulsed laser and spatial light modulator then obtain the position synchronization signal to facilitate subsequent operation based on it. The trigger distance or trigger frequency of the position synchronization signal can be set according to the operating parameters of the exposure system.

[0039] Step S4: Control the pulsed laser to emit laser light according to the position synchronization signal and the single-pulse emission energy.

[0040] Specifically, most existing exposure systems use continuous-wave lasers. During the acceleration of the motion platform, the continuous-wave laser, in its continuous emission mode, causes excessively thick horizontal lines perpendicular to the scanning direction, making it difficult to balance the production capacity and the accuracy of the exposed pattern. The exposure system in this application uses a pulsed laser instead of a continuous-wave laser. Furthermore, the pulsed laser emits laser pulses controlled by the position synchronization signal of the motion platform, thus solving the problem of excessively thick horizontal lines during accelerated production. In other words, after the motion platform controller outputs a position synchronization signal and sends it to the pulsed laser, the pulsed laser controller generates an RF signal to control the pulsed laser to produce laser light. The single-pulse emission energy of the pulsed laser is adjusted based on the operating parameters and the exposure dose input value. The duty cycle of the position synchronization signal is determined based on the single-pulse emission energy, and the pulsed laser is then controlled to generate laser pulses within one scan cycle of the spatial light modulator. Moreover, the pulse width of the output laser pulse is only tens of nanoseconds, thus fundamentally solving the problem of excessively thick horizontal lines caused by increased scanning speed. Compared to existing exposure systems that use continuous lasers, which address the issue of excessively thick horizontal lines during accelerated production by controlling the intermittent emission of the continuous laser and controlling the output of square-wave lasers, the exposure system in this application uses a pulsed laser. The position synchronization signal of the motion platform is used as a trigger signal to activate the pulsed laser, which emits laser pulses with a pulse width of only tens of nanoseconds. This fundamentally solves the problem of excessively thick horizontal lines caused by increased scanning speed of the motion platform, effectively improving the production capacity of the exposure system while ensuring the accuracy of the exposed pattern, resulting in sharper and clearer edges.

[0041] Step S5: Control the flip state of the spatial light modulator according to the position synchronization signal.

[0042] Specifically, the motion platform controller sends a position synchronization signal to the pulsed laser, causing the pulsed laser to generate a laser pulse within one scan cycle of the spatial light modulator based on the position synchronization signal. Simultaneously, the motion platform controller sends the position synchronization signal to the spatial light modulator. The spatial light modulator receives the position synchronization signal at its rising edge, i.e. Figure 3 The position synchronization signal is received at the rising edge indicated by the dashed arrow to control the flip state of the spatial light modulator, such as... Figure 3The solid arrow in the middle indicates the flip state of the spatial light modulator and loads the next frame of the exposure pattern, thereby transferring the exposure pattern to the exposure substrate mounted on the motion platform. Furthermore, the spatial light modulator includes, but is not limited to, DMDs (Digital Micro Mirror Devices) or acousto-optic modulators, etc., without limitation. The function of a DMD is to transfer the circuit board pattern to be processed onto the dry film of the exposure substrate, or to transfer the exposure pattern to be exposed onto the photoresist.

[0043] In addition, there is a certain time delay between receiving the position synchronization signal and controlling the spatial light modulator to complete the flip.

[0044] According to the control method of the exposure system of the present invention, the computer calculates the single-pulse emission energy of the pulsed laser based on the user-inputted working parameters and the exposure dose input value. After the pulsed laser receives the position synchronization signal of the motion platform, the pulsed laser generates a laser pulse within one scanning cycle of the spatial light modulator. At the same time, after receiving the position synchronization signal of the motion platform, the spatial light modulator controls the spatial light modulator to flip, thereby transferring the exposure pattern to the exposure substrate mounted on the motion platform. Thus, in this application, the pulsed laser is triggered to emit a laser pulse by the position synchronization signal, thereby solving the problem of excessively thick horizontal lines caused by the increase in the scanning speed of the motion platform, effectively improving the productivity of the exposure system, and ensuring the accuracy of the exposure pattern.

[0045] In some embodiments, obtaining the operating parameters of the exposure system includes: obtaining the scanning width, scanning speed, current tilt angle of the spatial light modulator, flip frequency of the spatial light modulator, and mirror spacing of the spatial light modulator; determining the grid precision of the spatial light modulator based on the current tilt angle and mirror spacing of the spatial light modulator; and determining the required number of grid precisions of the spatial light modulator in one scanning cycle based on the grid precision, scanning speed, and flip frequency.

[0046] Specifically, the user inputs the scanning width, scanning speed, current tilt angle of the spatial light modulator, and flip frequency of the spatial light modulator into the exposure system via a computer. The computer transmits these parameters to the exposure system's controller, and the controller obtains the inter-mirror spacing d of the spatial light modulator. Since different current tilt angles of the spatial light modulator correspond to different grid accuracies, the current tilt angle theta and the inter-mirror spacing d are substituted into the formula PW = d * sin(theta) to calculate the grid accuracies PW of the spatial light modulator. Here, the inter-mirror spacing d is the distance between two adjacent micromirrors of the spatial light modulator. Then, the grid accuracies PW, scanning speed v, and flip frequency f are substituted into formula (1) m = v / f * PW to obtain the required grid accuracies m of the spatial light modulator within one scanning cycle. Furthermore, the grid accuracies of the spatial light modulator can also be input by the user via a computer.

[0047] In some embodiments, obtaining the single-pulse emission energy of a pulsed laser based on operating parameters and exposure dose input values ​​includes: determining the scan length of the exposure system within one scan cycle based on the grid accuracy and the required number of grid accuracies; and obtaining the single-pulse emission energy of the pulsed laser based on the scan length, scan width, and exposure dose input values.

[0048] Specifically, the controller calculates the scan length of the exposure system within one scan cycle based on the grid precision and the required number of grid precisions input by the user via computer. Then, based on the scan length, the controller automatically obtains the scan width and exposure dose input values ​​input by the user via computer to calculate the single-pulse emission energy of the pulsed laser. The single-pulse emission energy is then used to control the pulsed laser to emit laser light, thereby generating laser pulses and fundamentally solving the problem of excessively thick horizontal lines caused by increased scanning speed.

[0049] In some embodiments, determining the scan length of the exposure system within one scan cycle based on the grid precision and the required number of grid precision values ​​includes obtaining the single-pulse emission energy using the following formula:

[0050] L=m*PW Formula (2)

[0051] Where is the scan length, PW is the grid precision, and m is the number of grid precisions required.

[0052] Specifically, the user inputs the grid precision PW of the spatial light modulator and the scanning speed v of the exposure system through a computer. The controller automatically obtains the grid precision PW and the scanning speed v of the exposure system input by the user, and substitutes the scanning speed v of the exposure system, the grid precision PW and the flip frequency into formula (1) to obtain the required grid precision number m of the spatial light modulator in one scanning cycle. Then, the grid precision PW and the required grid precision number m are substituted into formula (2) to obtain the scanning length L of the exposure system in one scanning cycle.

[0053] In some embodiments, obtaining the single-pulse emission energy of the pulsed laser based on the scan length, scan width, and exposure dose input values ​​includes obtaining the single-pulse emission energy using the following formula:

[0054] Q=E*d*L Formula (3)

[0055] Where Q is the single-pulse emission energy, E is the exposure dose input value, d is the scan width, and L is the scan length.

[0056] In this context, assuming the exposure dose input value of the photosensitive material is E, the scanning speed of the exposure system is v, the scanning width of the exposure system is d, the grid precision of the spatial light modulator is PW, the flip frequency of the spatial light modulator is f, the required number of grid precisions in one scanning cycle is m, and the average power of the pulsed laser is P, then the exposure dose input value E = P / (d*V) = P / (d*f*m*PW) = (Q*f) / (d*f*m*PW ... rep Since the reversal frequency f of the spatial light modulator is equal to the repetition frequency frep of the pulsed laser, the expression for the exposure dose input value E is E=Q / (d*m*PW). Since the grid precision PW multiplied by the number of grid precisions m required in the scanning period is the scanning length, the expression for the exposure dose input value E is E=Q / (d*L). Therefore, the formula for the single-pulse emission energy Q is Q=E*d*L.

[0057] Specifically, the controller automatically obtains the user's input exposure dose value E and the scanning width d of the exposure system via computer, and calculates the scanning length L of the exposure system in one scanning cycle using formula (2). The exposure dose input value E, scanning width d, and scanning length are substituted into formula (3) to calculate the single-pulse emission energy Q of the pulsed laser. The laser controller sets the driving current to control the pulsed laser to emit laser light through the single-pulse emission energy Q, thereby generating laser pulses and fundamentally solving the problem of excessively thick horizontal lines caused by the increase in scanning speed.

[0058] In some embodiments, controlling a pulsed laser to emit laser light according to a position synchronization signal and a single-pulse emission energy includes: obtaining the duty cycle of the position synchronization signal according to the single-pulse emission energy; obtaining the falling edge time of the position synchronization signal according to the duty cycle of the position synchronization signal; and triggering the pulsed laser to emit laser light according to the single-pulse emission energy at the falling edge time of the position synchronization signal.

[0059] Specifically, after the motion platform controller outputs a position synchronization signal and sends it to the pulsed laser, the pulsed laser receives the position synchronization signal and uses it as a trigger signal for the pulsed laser, which is then loaded into the acousto-optic modulator or electro-optic modulator. The acousto-optic modulator or electro-optic modulator is in the on state when the position synchronization signal is high, at which point the pulsed laser is in the energy accumulation phase. When the position synchronization signal changes from high to low, the acousto-optic modulator or electro-optic modulator is in the off state, controlling the pulsed laser to release its accumulated energy instantaneously. In this application, the falling edge of the position synchronization signal triggers the pulsed laser to emit laser light according to the single-pulse emission energy, thus fundamentally solving the problem of excessively thick horizontal lines caused by increased scanning speed. In other words, the position is first obtained based on the single-pulse emission energy. The duty cycle of the synchronization signal, for example, the maximum preset single-pulse energy of the pulsed laser is Qmax, and the single-pulse emission energy required by the pulsed laser during actual operation is Q, then the duty cycle of the position synchronization signal is D = Q / Qmax. Based on the duty cycle D and the flip frequency f, the falling edge time T of the position synchronization signal is obtained. That is, substituting the duty cycle of the position synchronization signal and the pulsed laser's T into the formula T = 1 / f * D, the falling edge time T of the position synchronization signal is obtained. Therefore, at the falling edge time T of the position synchronization signal, the pulsed laser is controlled to emit laser light according to the single-pulse emission energy, causing the pulsed laser to generate laser pulses. This fundamentally solves the problem of excessively thick horizontal lines caused by increased scanning speed, effectively improves the productivity of the exposure system, and ensures the accuracy of the exposed pattern.

[0060] In some embodiments, controlling the flip state of the spatial light modulator according to the position synchronization signal includes: controlling the spatial light modulator to flip at the rising edge of the position synchronization signal.

[0061] Specifically, the controller of the motion platform sends a position synchronization signal to the pulsed laser, causing the pulsed laser to generate laser pulses within one scan cycle of the spatial light modulator according to the position synchronization signal. At the same time, the controller of the motion platform sends a position synchronization signal to the spatial light modulator. Upon receiving the rising edge of the position synchronization signal, the spatial light modulator controls the spatial light modulator to flip after a certain period of time, so as to transfer the exposure pattern onto the exposure substrate mounted on the motion platform.

[0062] A second aspect of the present invention provides an exposure system 10, such as Figure 1 As shown, the exposure system 10 includes: a pulsed laser 2, a spatial light modulator 3, an imaging objective lens 4, a motion platform 5, an exposure substrate 6, and a controller 1. The controller 1 is connected to the pulsed laser 2, the spatial light modulator 3, and the motion platform 5, and is used to execute the control method of the exposure system described in the above embodiment.

[0063] In addition, the pulsed laser 2, the spatial light modulator 3, and the motion platform 5 can be equipped with independent controllers 1. Controller 1 includes multiple controllers, such as the controller of the motion platform, the controller of the pulsed laser, and the controller of the spatial light modulator, without limitation.

[0064] It should be noted that the specific implementation of the exposure system 10 in this embodiment of the invention is similar to the specific implementation of the control method of the exposure system in any of the above embodiments of the invention. For details, please refer to the description of the method section. To reduce redundancy, it will not be repeated here.

[0065] According to the embodiment of the present invention, the exposure system 10 can control the output of laser pulses from the pulsed laser, thereby solving the problem of excessively thick horizontal lines caused by the increase in the scanning speed of the motion platform, effectively improving the production capacity of the exposure system, and ensuring the accuracy of the exposed pattern.

[0066] In the description of this specification, references to terms such as "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example.

[0067] Although embodiments of the invention have been shown and described, those skilled in the art will understand that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.

Claims

1. A control method for an exposure system, characterized in that, The exposure system includes a pulsed laser, a spatial light modulator, an imaging objective, a motion platform, and an exposure substrate; the control method includes: Obtain the operating parameters of the exposure system and the exposure dose input value of the photosensitive material of the exposure system; The single-pulse emission energy of the pulsed laser is obtained based on the operating parameters and the exposure dose input value. Obtain the position synchronization signal of the motion platform; The pulsed laser is controlled to emit laser light according to the position synchronization signal and the single-pulse emission energy; The flip state of the spatial light modulator is controlled according to the position synchronization signal; The process of obtaining the operating parameters of the exposure system includes: The scanning width, scanning speed, current tilt angle of the spatial light modulator, flip frequency of the spatial light modulator, and mirror spacing of the spatial light modulator of the exposure system are obtained. The grid accuracy of the spatial light modulator is determined based on the current tilt angle and the mirror element spacing of the spatial light modulator. The required number of grid accuracies for the spatial light modulator in one scan cycle is determined based on the grid accuracy, the scan speed, and the flip frequency.

2. The control method for the exposure system according to claim 1, characterized in that, The single-pulse emission energy of the pulsed laser is obtained based on the operating parameters and the exposure dose input value, including: The scan length of the exposure system within one scan cycle is determined based on the grid precision and the required number of grid precision values. The single-pulse emission energy of the pulsed laser is obtained based on the scan length, the scan width, and the exposure dose input value.

3. The control method for the exposure system according to claim 2, characterized in that, Determining the scan length of the exposure system within one scan cycle based on the grid precision and the required grid precision quantity includes: The scan length is obtained using the following formula: in, The scan length is... For the grid precision, The required number of grid precision values.

4. The control method for the exposure system according to claim 2, characterized in that, The single-pulse emission energy of the pulsed laser is obtained based on the scan length, the scan width, and the exposure dose input value, including: The single-pulse emission energy is obtained using the following formula: in, The single-pulse emission energy, Input a value for the exposure dose. The scan width is... The scan length is [the value of the scan length].

5. The control method for the exposure system according to any one of claims 1-4, characterized in that, Controlling the pulsed laser to emit laser light according to the position synchronization signal and the single-pulse emission energy includes: The duty cycle of the position synchronization signal is obtained based on the single-pulse transmission energy; The falling edge time of the position synchronization signal is obtained based on the duty cycle of the position synchronization signal; At the falling edge of the position synchronization signal, the pulsed laser is triggered to emit laser light according to the single-pulse emission energy.

6. The control method for the exposure system according to claim 1, characterized in that, Controlling the flip state of the spatial light modulator according to the position synchronization signal includes: At the rising edge of the position synchronization signal, the spatial light modulator is controlled to flip.

7. An exposure system, characterized in that, include: Pulsed laser, spatial light modulator, imaging objective, motion platform, and exposure substrate; A controller, connected to the pulsed laser, the spatial light modulator, and the motion platform, is used to execute the control method of the exposure system according to any one of claims 1-6.

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