Wire grid polarizer and method of manufacturing the same

Abstract

A wire grid polarizer includes a substrate layer, a polymer wire grid layer, and a plurality of coating layers. The polymer wire grid layer is disposed on the substrate layer and includes a plurality of wire grid units. The plurality of wire grid units are formed on an upper surface of the substrate layer and extend along a first direction, and each wire grid unit has a top surface and first and second side surfaces on two sides along the first direction. The plurality of coating layers are individually formed on the first side surface of each wire grid unit. The plurality of coating layers are metal or non-metal dielectric materials. The present disclosure further provides a manufacturing method of a wire grid polarizer.

Description

Technical Field

[0001] This invention relates to a wire grid polarizer that can reduce damage to the wire grid structure from external forces and its manufacturing method. Background Technology

[0002] In display backlight modules, virtual reality (VR) headsets, and projectors, wire-grid polarizers are used as reflective polarizers to separate S-wave and P-wave beams with two polarization directions. Traditionally, wire-grid polarizers are made by directly depositing the metal wire-grid structure onto a substrate or by setting the wire-grid structure on a substrate and depositing metal on the top and sides of the wire-grid structure.

[0003] However, wire-grid polarizers made by directly depositing the metal wire grid structure onto a substrate cannot use flexible substrates or be mass-produced, and their metal wire grid structure is also vulnerable to damage from external forces because it is exposed in space. Similarly, wire-grid polarizers made by placing the wire grid structure on a substrate and depositing metal on the top and sides of the wire grid structure also suffer from the problem of the metal on the top of the wire grid structure being exposed in space and vulnerable to damage from external forces, and their effect on separating the two polarized S-wave and P-wave beams is poor. Summary of the Invention

[0004] In one embodiment, a wire-grid polarizer includes a substrate layer, a polymer wire-grid layer, and a plurality of coating layers. The polymer wire-grid layer is disposed on the substrate layer and includes a plurality of wire-grid units. The plurality of wire-grid units are formed on the upper surface of the substrate layer and extend along a first direction. Each wire-grid unit has a top surface and a first side surface and a second side surface on two sides along the first direction, respectively. The plurality of coating layers are individually formed on the first side surface of each wire-grid unit, wherein the plurality of coating layers are made of a metallic or non-metallic dielectric material.

[0005] In one embodiment, a method for manufacturing a wire grid polarizer includes: depositing a polymer layer on a substrate layer; imprinting the polymer layer with a mold to form a polymer wire grid layer, the polymer wire grid layer including a plurality of bottom layers and a plurality of wire grid units extending along a first direction, the plurality of bottom layers being individually located between adjacent wire grid units and in contact with the upper surface of the substrate layer, each wire grid unit having a top surface and having a first side surface and a second side surface on two sides along the first direction, the upper surface of each bottom layer being lower than the top surface of each wire grid unit; depositing a metallic or non-metallic dielectric material on the top surface and the first side surface of each wire grid unit; and removing the metallic or non-metallic dielectric material deposited on the top surface of each wire grid unit.

[0006] In one embodiment, a wire grid polarizer includes a substrate layer and a plurality of coated layers. The substrate layer includes a plurality of wire grid units extending along a first direction. Each wire grid unit has a top surface and a first side surface and a second side surface on two sides along the first direction, respectively. The plurality of coated layers are individually formed on the first side surface of each wire grid unit, wherein the plurality of coated layers are metallic or non-metallic dielectric materials.

[0007] In one embodiment, a method for manufacturing a wire grid polarizer includes: imprinting a mold onto the upper surface of a polymer substrate layer to form a plurality of wire grid units extending along a first direction on the upper surface of the polymer substrate layer, each wire grid unit having a top surface and a first side surface and a second side surface on two sides along the first direction; depositing a metallic or non-metallic dielectric material on the top surface and the first side surface of each wire grid unit; and removing the metallic or non-metallic dielectric material deposited on the top surface of each wire grid unit.

[0008] The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments, but this is not intended to limit the present invention. Attached Figure Description

[0009] Figure 1 This is a perspective view of one embodiment of a wire grid polarizer.

[0010] Figure 2 This is a side view of one embodiment of a wire grid polarizer.

[0011] Figure 3 This is a perspective view of another embodiment of a wire grid polarizer.

[0012] Figure 4 This is a side view of another embodiment of a wire grid polarizer.

[0013] Figures 5A to 5F This is a schematic diagram of the steps in one embodiment of a method for manufacturing a wire grid polarizer.

[0014] Figure 6 This is a flowchart of one embodiment of a method for manufacturing a wire grid polarizer.

[0015] Figures 7A to 7E This is a schematic diagram of the steps in another embodiment of a method for manufacturing a wire grid polarizer.

[0016] Figures 8A to 8G This is a schematic diagram of the steps in another embodiment of a method for manufacturing a wire grid polarizer.

[0017] Figure 9 This is a flowchart of yet another embodiment of a method for manufacturing a wire grid polarizer.

[0018] Figure 10 This is a perspective view of yet another embodiment of a wire grid polarizer.

[0019] Figure 11 This is a side view of yet another embodiment of a wire grid polarizer.

[0020] Figures 12A to 12F This is a schematic diagram of the steps in another embodiment of a method for manufacturing a wire grid polarizer.

[0021] Figure 13 This is a flowchart of another embodiment of a method for manufacturing a wire grid polarizer.

[0022] Figure 14 This is a schematic diagram of an embodiment in which a non-polarized light source is incident on a wire grating polarizer.

[0023] Figures 15A to 15B This is a schematic diagram showing the height of the coating layer, the width of the grid unit, the spacing of the grid unit, the thickness of the substrate, and the width of the coating layer.

[0024] Figure 16 Line graphs showing the transmittance of S-waves and P-waves for wire grid polarizers with different coating widths.

[0025] Figure 17 Line graphs showing the reflectivity of S-waves and P-waves for wire grating polarizers with different coating widths.

[0026] Figure 18 This is a line graph showing the extinction ratio of a wire grating polarizer with different coating widths.

[0027] Figure 19 Line graphs showing the transmittance of S-waves and P-waves of a wire grating polarizer at different incident angles from a non-polarized light source.

[0028] Figure 20 This is a line graph showing the reflectivity of S-waves and P-waves of a linear grating polarizer at different incident angles from a non-polarized light source.

[0029] Figure 21 This is a line graph showing the extinction ratio of a linear grating polarizer at different incident angles from a non-polarized light source.

[0030] Figure 22 This is a schematic diagram of an embodiment of a backlight module that uses a wire grid polarizer as a reflective polarizer.

[0031] Figure 23 This is a schematic diagram of an embodiment of a VR headset that uses a wire grid polarizer as a reflective polarizer.

[0032] Figure 24 This is a side view of another embodiment of a wire grid polarizer.

[0033] Figure 25 This is a side view of another embodiment of a wire grid polarizer.

[0034] Figure 26 This is a side view of another embodiment of a wire grid polarizer.

[0035] Figure 27 This is a side view of another embodiment of a wire grid polarizer.

[0036] Figure 28 This is a side view of another embodiment of a wire grid polarizer.

[0037] In the attached figures, the following labels are used:

[0038] 1: Linear grating polarizer

[0039] 10: Substrate layer

[0040] 20: Polymer wire grid layer

[0041] 30: Coating layer

[0042] 21: Wire grid unit

[0043] S1: First side surface

[0044] S2: Second side surface

[0045] ST: Top surface

[0046] D1: First Direction

[0047] 22: Bottom layer

[0048] 23: Polymer layer

[0049] 40: Mold

[0050] 50: Heater

[0051] 51: Cooler

[0052] 60: Target metal

[0053] 70: Electron Gun

[0054] S11-S14: Steps

[0055] UV: Ultraviolet light

[0056] S15: Steps

[0057] S21-S23: Steps

[0058] S: Wave parallel to the wire grid structure

[0059] P: Wave perpendicular to the wire grid structure

[0060] L: Non-polarized light source

[0061] H: Height of the coating layer

[0062] T: Thickness of the bottom layer

[0063] CT: Width of the coating layer

[0064] GT: Width of the wire grid unit

[0065] D: Spacing of wire grid units

[0066] 100: Backlight Module

[0067] 101: Reflective sheet

[0068] P initial :Wave

[0069] P1-P n :Wave

[0070] S1-S3: Waves

[0071] 200: VR Headset

[0072] 201: Waveplate

[0073] 202: Waveplate

[0074] 203: Semi-reflective, semi-transparent mirror

[0075] 204: Monitor

[0076] 205: Absorbing Polarizer

[0077] P vr1 :P wave

[0078] S vr1 :S wave

[0079] P vr2 :P wave

[0080] GT_1: Upper width of the wire grid unit

[0081] GT_2: Lower width of the wire grid unit

[0082] CT_1: Upper width of the coating layer

[0083] CT_2: Lower width of the coating layer Detailed Implementation

[0084] The structural and working principles of the present invention will be described in detail below with reference to the accompanying drawings:

[0085] Figure 1 This is a perspective view of an embodiment of the wire grid polarizer 1. Figure 2 This is a side view of one embodiment of the wire grid polarizer 1. Please refer to... Figure 1 and Figure 2The wire grid polarizer 1 includes a substrate layer 10, a polymer wire grid layer 20, and a plurality of coating layers 30. The polymer wire grid layer 20 is disposed on the substrate layer 10 and includes a plurality of wire grid units 21. The plurality of wire grid units 21 are formed on the upper surface of the substrate layer 10 and extend along a first direction D1. The plurality of wire grid units 21 have a top surface ST and a first side surface S1 and a second side surface S2 on two sides along the first direction D1, respectively. The plurality of coating layers 30 are individually formed on the first side surface S1 of each wire grid unit 21. In some embodiments, the shape of the cross section of each wire grid unit 21 perpendicular to the first direction D1 is rectangular. In some embodiments, the coating layers 30 of the wire grid polarizer 1 are only formed on the first side surface S1 of each wire grid unit 21, and the coating layers 30 of the wire grid polarizer 1 are not formed on the top surface ST of each wire grid unit 21. Therefore, the coating layers 30 are not easily damaged by external forces due to being exposed in space.

[0086] In some embodiments, the substrate layer 10 may be made of, but is not limited to, glass, silicon, cyclic olefin copolymer (COC), cyclic olefin polymer (COP), polycarbonate (PC), polyethylene terephthalate (PET), polyimide (PI), polyphenylene ether sulfone (PES), polyethylene naphthalate (PEN), cellulose triacetate (TAC), or polymethyl methacrylate (PMMA).

[0087] In some embodiments, the polymer wire grid layer 20 may be made of, but is not limited to, silicone or PMMA.

[0088] In some embodiments, the coating layer 30 may be made of, but is not limited to, metals such as gold, aluminum, silver, tantalum, copper, iridium, and titanium, or non-metallic dielectric materials such as silicon dioxide, silicon pentoxide, titanium dioxide, and silicon.

[0089] In some embodiments, the material of the substrate layer 10 is different from the material of the polymer grid layer 20. For example, if the material of the substrate layer 10 is PMMA, the material of the polymer grid layer 20 is a non-PMMA material, such as silicone.

[0090] Figure 3 This is a perspective view of another embodiment of the wire grid polarizer 1. Figure 4 This is a side view of another embodiment of the wire grid polarizer 1. See also... Figure 3 and Figure 4 In some embodiments, the polymer grid layer 20 further includes a plurality of bottom layers 22. The plurality of bottom layers 22 are individually disposed between adjacent grid units 21 and in contact with the upper surface of the substrate layer 10, and the upper surface of each bottom layer 22 is lower than the top surface ST of each grid unit 21.

[0091] Figures 5A to 5F This is a schematic diagram of the steps in an embodiment of a method for manufacturing a wire grid polarizer 1. Figure 6 This is a flowchart illustrating one embodiment of a method for manufacturing the wire grid polarizer 1. Please refer to [link / reference needed]. Figure 3 , Figure 4 , Figures 5A to 5F and Figure 6 First, a polymer layer 23 is deposited on the substrate layer 10 (step S11). Next, the polymer layer 23 is imprinted using a mold 40 to form a polymer grid layer 20 (step S12). The polymer grid layer 20 includes a plurality of bottom layers 22 and a plurality of grid units 21 extending along a first direction D1. The plurality of bottom layers 22 are individually located between two adjacent grid units 21 and in contact with the upper surface of the substrate layer 10. Each grid unit 21 has a top surface ST and a first side surface S1 and a second side surface S2 on both sides along the first direction D1, respectively. The upper surface of each bottom layer 22 is lower than the top surface ST of each grid unit 21. Then, a metallic or non-metallic dielectric material is deposited on the top surface ST and the first side surface S1 of each grid unit 21 (step S13). Finally, the metallic or non-metallic dielectric material deposited on the top surface ST of each grid unit 21 is removed (step S14). In some embodiments, the polymer layer 23 may be made of, but is not limited to, thermoplastic polymers or thermosetting polymers.

[0092] In some embodiments, the step of forming a polymer grid layer 20 by imprinting a polymer layer 23 with a mold 40 includes heating the polymer layer 23 with a heater 50 during imprinting to cure the polymer layer 23, and cooling the polymer layer 23 with a cooler 51 after the polymer layer 23 has cured to separate the polymer layer 23 from the mold 40 to obtain the polymer grid layer 20.

[0093] In some embodiments, depositing metal or non-metal dielectric material on the top surface ST and the first side surface S1 of each wire grid unit 21 may be, but is not limited to, depositing the target metal 60 on the top surface ST and the first side surface S1 of each wire grid unit 21 by an electron beam emitted from an electron gun 70.

[0094] In some embodiments, removing the metal or non-metal dielectric material deposited on the top surface ST of each wire gate unit 21 may be, but is not limited to, plasma etching of the top surface ST of each wire gate unit 21 to remove the metal or non-metal dielectric material on the top surface ST of each wire gate unit 21.

[0095] Figures 7A to 7E This is a schematic diagram illustrating the steps of another embodiment of the manufacturing method for the wire grid polarizer 1. Please refer to... Figure 1 , Figure 2 , Figure 6 and Figures 7A to 7EIn some embodiments, when the polymer layer 23 is imprinted with a mold 40 to form a polymer grid layer 20, the polymer layer 23 is irradiated with ultraviolet light (UV) to cure it. At this time, the material of the polymer layer 23 may be, but is not limited to, a photocurable polymer.

[0096] Figures 8A to 8G This is a schematic diagram of the steps in another embodiment of the manufacturing method of the wire grid polarizer 1. Figure 9 This is a flowchart illustrating another embodiment of a method for manufacturing the wire grid polarizer 1. Please refer to [link / reference]. Figure 1 , Figure 2 , Figures 8A to 8G and Figure 9 In some embodiments, the method of manufacturing the wire grid polarizer 1 further includes etching the polymer wire grid layer 20 to remove a plurality of underlying layers 22 (step S15). In some embodiments, etching the polymer wire grid layer 20 to remove the plurality of underlying layers 22 may be, but is not limited to, plasma etching of the polymer wire grid layer 20 to remove the plurality of underlying layers 22.

[0097] Figure 10 This is a perspective view of another embodiment of the wire grid polarizer 1. Figure 11 This is a side view of yet another embodiment of the wire grid polarizer 1. Please refer to... Figure 10 and Figure 11 The wire grid polarizer 1 includes a substrate layer 10 and a plurality of coating layers 30. The substrate layer 10 includes a plurality of wire grid units 21 extending along a first direction D1. Each wire grid unit 21 has a top surface ST and a first side surface S1 and a second side surface S2 on two sides along the first direction D1, respectively. The plurality of coating layers 30 are individually formed on the first side surface S1 of each wire grid unit 21, wherein the plurality of coating layers 30 are made of a metallic or non-metallic dielectric material. In some embodiments, the shape of the cross section of each wire grid unit 21 perpendicular to the first direction D1 is rectangular.

[0098] Figures 12A to 12F This is a schematic diagram of the steps in another embodiment of the method for manufacturing the wire grid polarizer 1. Figure 13 This is a flowchart illustrating another embodiment of a method for manufacturing the wire grid polarizer 1. Please refer to... Figure 10 , Figure 11 , Figures 12A to 12F and Figure 13First, the upper surface of the substrate layer 10 is imprinted using a mold 40 to form a plurality of wire grid units 21 extending along a first direction on the upper surface of the substrate layer 10 (step S21). Each wire grid unit 21 has a top surface ST and a first side surface S1 and a second side surface S2 on both sides along the first direction D1, respectively. Next, a metallic or non-metallic dielectric material is deposited on the top surface ST and the first side surface S1 of each wire grid unit 21 (step S22). Finally, the metallic or non-metallic dielectric material deposited on the top surface ST of each wire grid unit 21 is removed (step S23).

[0099] In some embodiments, the substrate layer 10 may be made of, but is not limited to, thermoplastic polymers or thermosetting polymers.

[0100] In some embodiments, the step of pressing the substrate layer 10 with a mold 40 to form a plurality of wire grid units 21 extending in a first direction on the upper surface of the polymer substrate layer 10 includes heating the substrate layer 10 with a heater 50 during pressing to cure the substrate layer 10, and cooling the substrate layer 10 with a cooler 51 after the substrate layer 10 has cured to separate the substrate layer 10 from the mold 40 so that a plurality of wire grid units 21 extending in a first direction are formed on the upper surface of the polymer substrate layer 10.

[0101] In some embodiments, depositing metal or non-metal dielectric material on the top surface ST and the first side surface S1 of each wire grid unit 21 may be, but is not limited to, depositing the target metal 60 on the top surface ST and the first side surface S1 of each wire grid unit 21 by an electron beam emitted from an electron gun 70.

[0102] In some embodiments, removing the metal or non-metal dielectric material deposited on the top surface ST of each wire gate unit 21 may be, but is not limited to, plasma etching of the substrate layer 10 to remove the metal or non-metal dielectric material on the top surface ST of each wire gate unit 21.

[0103] Figure 14 This is a schematic diagram of an embodiment in which a non-polarized light source L is incident on a wire grid polarizer 1. Figures 15A to 15B This is a schematic diagram showing the height H of the coating layer 30, the width GT of the grid unit 21, the spacing D of the grid unit 21, the thickness T of the bottom layer 22, and the width CT of the coating layer 30. Please refer to [link / reference]. Figure 14 and Figures 15A to 15B When a non-polarized light source L is incident on a wire-grid polarizer 1, the electric field of the S-wave, which is parallel to the wire-grid structure, resonates with the free electrons on the multiple coating layers 30, causing most of the S-wave to be reflected. The electric field of the P-wave, which is perpendicular to the wire-grid structure, cannot resonate with the free electrons on the multiple coating layers 30, causing most of the P-wave to be reflected and directly transmitted. The extinction ratio ER is the transmittance T of the P-wave. p Penetration rate T of S-wave sThe extinction ratio (ER) is the ratio of the polarization of the S-wave and P-wave. A higher ER indicates a better separation of the two polarized S-waves and P-waves. The formula for the extinction ratio ER is:

[0104]

[0105] S-wave penetration rate T s The reflectivity R of S-wave s The penetration rate of P-waves (T) p and the reflectivity R of P-wave p The width GT of the grid unit 21, the spacing D of the grid unit 21, the height H of the coating layer 30, the width CT of the coating layer 30, the wavelength of the non-polarized light source L, and the incident angle of the non-polarized light source L are all related. The width GT of the grid unit 21, the spacing D of the grid unit 21, the height H of the coating layer 30, and the width CT of the coating layer 30 can be adjusted during the manufacturing of the grid polarizer 1 by changing the shape of the mold 40 or the degree of etching to meet usage requirements. In some embodiments, the height H of the coating layer 30 may be, but is not limited to, 50–200 nanometers (nm), the width GT of the grid unit 21 may be, but is not limited to, 10–40 nm, the spacing D of the grid unit 21 may be, but is not limited to, less than 150 nm, the width CT of the coating layer 30 may be, but is not limited to, 10–60 nm, and the thickness T of the bottom layer 22 may be, but is not limited to, less than 10 nm.

[0106] Figure 16 The S-wave transmittance T of the wire grid polarizer 1 with different coating layers 30 widths CT s and the penetration rate T of the P wave p A line graph. Figure 17 The reflectivity R of S-waves for wire grid polarizer 1 at different coating layer widths 30. s and the reflectivity R of P-wave p A line graph. Figure 18 This is a line graph showing the extinction ratio ER of the wire grid polarizer 1 for different widths CT of the coating layer 30. Figures 16 to 18 In this embodiment, the spacing D of the wire grid units 21 is 100 nm, the height H of the coating layer 30 is 100 nm, and the width GT of the wire grid units 21 is 20 nm. The wavelength range of the non-polarized light source L is 400–700 nm. The width CT of the coating layer 30 is 25, 30, or 35 nm. Please refer to [link to relevant documentation]. Figures 16 to 18 In some embodiments, when the width CT of the coating layer 30 is 35 nm, the wire grid polarizer 1 has the highest extinction ratio.

[0107] Figure 19 The transmittance T of S-wave at different incident angles of a non-polarized light source L is given by the wire grating polarizer 1. s and the penetration rate T of the P wave p A line graph. Figure 20The reflectivity R of the S-wave at different incident angles of the non-polarized light source L is given by the wire grating polarizer 1. s and the reflectivity R of P-wave p A line graph. Figure 21 This is a line graph showing the extinction ratio ER of the linear grating polarizer 1 at different incident angles to a non-polarized light source L. Figures 19 to 21 In this embodiment, the spacing D of the wire grid units 21 is 100 nm, the height H of the coating layer 30 is 100 nm, the width GT of the wire grid units 21 is 20 nm, and the width CT of the coating layer 30 is 30 nm. The wavelength range of the non-polarized light source L is 400–700 nm. The incident angle of the non-polarized light source L is 0 degrees, 15 degrees, 30 degrees, 45 degrees, or 60 degrees. Please refer to [link to relevant documentation]. Figures 19 to 21 In some embodiments, when the incident angle of the non-polarized light source L is 60 degrees, the wire grid polarizer 1 has the highest extinction ratio.

[0108] Figure 22 This is a schematic diagram of an embodiment of a backlight module 100 that uses a wire grid polarizer 1 as a reflective polarizer. Please refer to... Figure 22 The backlight module 100 uses the wire grid polarizer 1 to direct the P-type light incident on the wire grid polarizer 1 via the reflector 101. initial The S1 wave, which is parallel to the grating structure of the grating polarizer 1, is reflected and P is deflected. initial The P1 wave, perpendicular to the grating structure of the grating polarizer 1, passes through. The S1 wave is reflected by the reflector 101 into an unpolarized wave, which then enters the grating polarizer 1 again. The grating polarizer 1 reflects the S2 wave, which is parallel to the grating structure of the grating polarizer 1, and then transmits the P2 wave, which is perpendicular to the grating structure of the grating polarizer 1. The backlight module 100, through the grating polarizer 1 and the reflector 101, continuously reflects the S wave parallel to the grating structure of the grating polarizer 1 and continuously transmits the P wave perpendicular to the grating structure of the grating polarizer 1, thus achieving the purpose of repeatedly recycling light. The reflectivity of the reflector 101 is denoted as r. The total transmittance T of the grating polarizer 1 used in the backlight module 100 is... BLU The formula is:

[0109]

[0110] In some embodiments, when the width CT of the coating layer 30 is 35 nm, the wire grid polarizer 1 has the highest total transmittance T. BLU .

[0111] In some embodiments, when the width CT of the coating layer 30 is 30 nm, the wire grid polarizer 1 has the highest total transmittance T. BLU .

[0112] Figure 23This is a schematic diagram of an embodiment of a VR headset 200 that uses a wire grid polarizer 1 as a reflective polarizer. Please refer to... Figure 23 The VR headset 200 sends P signals through the display 204. vr1 Wave, P vr1 The wave passes through wave plate 201 to form right-handed circularly polarized light, and then passes through wave plate 202 to form S-polarized light. vr1 The wave is incident on the linear grating polarizer 1. The linear grating polarizer 1 then polarizes the S wave. vr1 The wave is reflected onto waveplate 202, forming right-handed circularly polarized light. vr1 After being reflected by the semi-reflective mirror 203, the light forms left-handed circularly polarized light, which is then converted into P by the waveplate 202. vr2 The wave is re-injected onto the linear grating polarizer 1, P vr2 Waves pass through the wire-grid polarizer 1. The VR headset 200 uses the wire-grid polarizer 1 to increase the optical path. The total transmittance T of the wire-grid polarizer 1 applied to the VR headset 200, without considering the absorption rates between the various materials of the VR headset 200, is... VR The formula is:

[0113] T VR =R s ×T P

[0114] In some embodiments, when the width CT of the coating layer 30 is 25 nm, the wire grid polarizer 1 has the highest total transmittance T. VR .

[0115] In some embodiments, when the width CT of the coating layer 30 is 20 nm, the wire grid polarizer 1 has the highest total transmittance T. VR .

[0116] In some embodiments, when the total transmittance T of the wire grid polarizer 1 VR When the threshold is exceeded, the VR headset 200 does not include the absorbing polarizer 205.

[0117] Figure 24 This is a side view of another embodiment of the wire grid polarizer 1. See also... Figure 24 In some embodiments, the cross-sectional shape of each wire grid unit 21 perpendicular to the first direction D1 is trapezoidal. In some embodiments, the lower width GT_2 of the wire grid unit 21 is intermediate to the upper width GT_1 of the wire grid unit 21. Doubled For example, if the upper width GT_1 of the wire gate unit 21 is 30nm, then the lower width GT_2 of the wire gate unit 21 is between 20nm and 40nm. Experiments show that the lower width GT_2 of the wire gate unit 21 is not more than 30nm than the upper width GT_1 of the wire gate unit 21. Doubled The extinction ratio of the grating polarizer 1, which is twice the size of the standard polarizer, is too low to meet industry requirements. In some embodiments, the lower width CT_2 of the coating layer 30 is between the upper width CT_1 of the coating layer 30 and the lower width CT_2 of the coating layer 30. Doubled For example, if the upper width CT_1 of the coating layer 30 is 40 nm, then the lower width CT_2 of the coating layer 30 is between 30 nm and 50 nm. Experiments show that the lower width CT_2 of the coating layer 30 is not more than 40 nm than the upper width CT_1 of the coating layer 30. Doubled The extinction ratio of the linear grating polarizer 1, which has a range of several times, is too low to meet industry requirements.

[0118] Figure 25 This is a side view of another embodiment of the wire grid polarizer 1. See also... Figure 25 In some embodiments, the coating layer 30 is individually formed on the first side surface S1 of each wire grid unit 21, and the width CT of the coating layer 30 is the spacing D of the wire grid units 21 minus the width GT of the wire grid units 21. In other words, the coating layer 30 fills the space between two adjacent wire grid units 21. For example, if the spacing D of the wire grid units 21 is 100 nm and the width GT of the wire grid units 21 is 40 nm, then the width CT of the coating layer 30 is 60 nm. However, experiments show that... Figure 25 The extinction ratio of the wire grating polarizer 1 shown is less than Figure 1 and Figure 2 The extinction ratio of the linear grating polarizer 1 shown.

[0119] Figure 26 This is a side view of another embodiment of the wire grid polarizer 1. See also... Figure 26 In some embodiments, a plurality of coating layers 30 are individually formed on the first side surface S1 and the second side surface S2 of each wire grid unit 21. However, experiments show that... Figure 26 The extinction ratio of the wire grating polarizer 1 shown is less than Figure 1 and Figure 2 The extinction ratio of the linear grating polarizer 1 shown.

[0120] Figure 27 This is a side view of another embodiment of the wire grid polarizer 1. See also... Figure 27 In some embodiments, the cross-section of each wire grid unit 21 perpendicular to the first direction D1 is triangular. However, experiments show that... Figure 27 The extinction ratio of the wire grating polarizer 1 shown is less than Figure 1 and Figure 2 The extinction ratio of the linear grating polarizer 1 shown.

[0121] Figure 28 This is a side view of another embodiment of the wire grid polarizer 1. See also... Figure 28 In some embodiments, the shape of each wire grid unit 21 along the cross-section perpendicular to the first direction D1 is arc-shaped. However, experiments show that... Figure 28 The extinction ratio of the wire grating polarizer 1 shown is less than Figure 1 and Figure 2 The extinction ratio of the wire grid polarizer 1 is shown. In summary, in some embodiments, the coating layer 30 of the wire grid polarizer 1 is formed only on the first side surface S1 of each wire grid unit 21, and the coating layer 30 is not formed on the top surface ST of each wire grid unit 21. Therefore, the wire grid polarizer 1 does not have the problem of the metal above each wire grid unit 21 being exposed in space and easily damaged by external forces. Furthermore, the width GT of the wire grid unit 21, the spacing D of the wire grid unit 21, the height H of the coating layer 30, and the width CT of the coating layer 30 can be adjusted during the manufacturing of the wire grid polarizer 1 according to the shape of the mold 40 or the degree of etching, so that the wire grid polarizer 1 can have a better extinction ratio ER and total transmittance T. BLU Or total penetration rate T VR .

[0122] Of course, the present invention may have other various embodiments. Without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and modifications according to the present invention, but these corresponding changes and modifications should all fall within the protection scope of the appended claims.

Claims

1. A linear grid polarizer, characterized in that, Include: One substrate layer; A polymer grid layer is disposed on the substrate layer. The polymer grid layer includes a plurality of grid units. The grid units are formed on the upper surface of the substrate layer and extend along a first direction. Each grid unit has a top surface and a first side surface and a second side surface on two sides along the first direction, respectively. and Multiple coating layers are individually formed on the first side surface of each grid unit and not formed on the second side surface of each grid unit, wherein the coating layers are metallic or non-metallic dielectric materials; Each of the coating layers contacts the upper surface of the substrate layer; The width of these wire grid units is 20 nanometers and the spacing is 100 nanometers; The coating layers are 35 nanometers wide and 100 nanometers high.

2. The wire grid polarizer as described in claim 1, characterized in that, The polymer grid layer further comprises multiple bottom layers, each individually disposed between two adjacent grid units and in contact with the upper surface of the substrate layer, and the upper surface of each bottom layer is lower than the top surface of each grid unit.

3. The wire grid polarizer as described in claim 1, characterized in that, The material of the substrate layer is different from that of the polymer grid layer.

4. The wire grid polarizer according to any one of claims 1 to 3, characterized in that, The shape of each wire grid unit along the cross section perpendicular to the first direction is rectangular.

5. A method for manufacturing a wire grating polarizer, characterized in that, Include: A polymer layer is disposed on a substrate layer; A polymer grid layer is formed by pressing the polymer layer with a mold. The polymer grid layer includes a plurality of bottom layers and a plurality of grid units extending along a first direction. The bottom layers are individually located between two adjacent grid units and in contact with the upper surface of the substrate layer. Each grid unit has a top surface and a first side surface and a second side surface on two sides along the first direction, respectively. The upper surface of each bottom layer is lower than the top surface of each grid unit. Deposit metallic or non-metallic dielectric material on the top surface and the first side surface of each grid cell; and Remove the metallic or non-metallic dielectric material deposited on the top surface of each grid cell; In this case, no metallic or non-metallic dielectric material is deposited on the second side surface of each wire grid unit; The width of these wire grid units is 20 nanometers and the spacing is 100 nanometers; The width of the metallic or non-metallic dielectric material is 35 nanometers and the height is 100 nanometers.

6. The method for manufacturing a wire grating polarizer as described in claim 5, characterized in that, Following the imprinting step of the polymer layer, the process further includes: The polymer grid layer is etched to remove the underlying layers.

7. The method for manufacturing a wire grating polarizer as described in claim 5, characterized in that, The polymer layer is made of thermoplastic polymers, thermosetting polymers, or photocurable polymers.

8. The method for manufacturing a wire-grid polarizer as described in any one of claims 5 to 7, characterized in that, The shape of each wire grid unit along the cross section perpendicular to the first direction is rectangular.

9. A linear grid polarizer, characterized in that, Include: A substrate layer comprising a plurality of wire grid units extending along a first direction, each wire grid unit having a top surface and a first side surface and a second side surface on two sides along the first direction; and Multiple coating layers are individually formed on the first side surface of each grid unit and not formed on the second side surface of each grid unit, wherein the coating layers are metallic or non-metallic dielectric materials; Each of the coating layers contacts the upper surface of the substrate layer; The width of these wire grid units is 20 nanometers and the spacing is 100 nanometers; The coating layers are 35 nanometers wide and 100 nanometers high.

10. The wire grid polarizer as described in claim 9, characterized in that, The shape of each wire grid unit along the cross section perpendicular to the first direction is rectangular.

11. A method for manufacturing a wire grating polarizer, characterized in that, Include: A mold is used to imprint the upper surface of a substrate layer so that a plurality of wire grid units extending along a first direction are formed on the upper surface of the substrate layer. Each wire grid unit has a top surface and a first side surface and a second side surface on two sides along the first direction, respectively. Deposit metallic or non-metallic dielectric material on the top surface and the first side surface of each grid cell; and Remove the metallic or non-metallic dielectric material deposited on the top surface of each grid cell; In this case, no metallic or non-metallic dielectric material is deposited on the second side surface of each wire grid unit; The width of these wire grid units is 20 nanometers and the spacing is 100 nanometers; The width of the metallic or non-metallic dielectric material is 35 nanometers and the height is 100 nanometers.

12. The method for manufacturing a wire grating polarizer as described in claim 11, characterized in that, The shape of each wire grid unit along the cross section perpendicular to the first direction is rectangular.

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