Rotating device for an objective diaphragm

Abstract

The present application belongs to the technical field of photoetching machine, disclose a kind of rotating device of objective lens diaphragm, comprising: vane support seat;Rotary table, rotatably disposed on the vane support seat;And limiting mechanism, with the vane support seat is connected and along vertical direction elastic point pressure rotary table.Laundry table movement on the surface of vane support seat, limiting mechanism is connected with vane support seat also can along vertical direction elastic point pressure rotary table, on the one hand, limiting mechanism can elastically move, further can resist the vibration and impact of rotary table along vertical direction;On the other hand, point contact between limiting mechanism and rotary table, compared with linear contact and surface contact significantly reduce the contact area, further reduce friction also can reduce particle generation, delay the time of particle contaminant inside objective lens, improve the reliability of the rotating device of objective lens diaphragm.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photoetching machine, and in particular to a rotating device of an objective lens diaphragm. BACKGROUND

[0002] The main purpose of the objective lens variable diaphragm is to control the size of the diaphragm aperture (NA). In the exposure system, different imaging requirements correspond to different numerical diaphragm apertures, and due to the existence of diaphragm field curvature, the axial position of the diaphragm under different diaphragm apertures is also different.

[0003] The adjustment time of the objective lens diaphragm is short, and it is necessary to ensure high roundness and coaxiality; during the whole life cycle of the product, particles are generated in the rotating device of the objective lens diaphragm when rotating, which affects the cleanliness inside the objective lens, and the rotating device is prone to jam when rotating. Therefore, high reliability is required for the rotating mechanism in the objective lens diaphragm. SUMMARY

[0004] The objective of the present application is to provide an objective lens diaphragm to improve the reliability of the rotating device of the objective lens diaphragm.

[0005] To achieve this objective, the present application adopts the following technical solutions:

[0006] A rotating device of an objective lens diaphragm, comprising:

[0007] A blade support seat;

[0008] A rotating disc rotatably arranged on the blade support seat; and

[0009] A limiting mechanism connected with the blade support seat and elastically pressing the rotating disc in the vertical direction.

[0010] The rotating disc moves on the surface of the blade support seat, and the limiting mechanism connected with the blade support seat can also elastically press the rotating disc in the vertical direction. On the one hand, the limiting mechanism can elastically move, thereby resisting the vibration and impact of the rotating disc in the vertical direction; on the other hand, the limiting mechanism and the rotating disc are in point contact, which significantly reduces the contact area compared with linear contact and surface contact, thereby reducing friction and also reducing the generation of particles, delaying the time of particle contamination inside the objective lens, and improving the reliability of the rotating device of the objective lens diaphragm.

[0011] As a preferred solution of the above-mentioned rotating device of the objective lens diaphragm, the limiting mechanism comprises:

[0012] A base, a first end of the base being connected with the blade support seat, a second end of the base being arranged above the edge area of the rotating disc and being provided with a positioning hole extending in the vertical direction;

[0013] A point pressure piece, a first end of the point pressure piece is movably arranged in the positioning hole, and a second end of the point pressure piece is provided with a spherical surface for point pressure on the edge area; and

[0014] An elastic member is connected between the second end of the base and the second end of the point pressure piece to apply elastic force in the vertical direction to the point pressure piece.

[0015] The second end of the base is provided with a positioning hole extending in the vertical direction, and the first end of the point pressure piece is movably arranged in the positioning hole. The elastic member is connected between the second end of the base and the second end of the point pressure piece, so that the point pressure piece can elastically move in the vertical direction when point pressure is applied to the turntable. The point pressure piece point pressure on the edge area of the turntable, which can more easily suppress the vibration amplitude of the turntable and ensure the stable rotation of the turntable.

[0016] As a preferred solution of the rotating device of the objective diaphragm, the point pressure piece comprises:

[0017] A sleeve, a first end of the sleeve is movably arranged in the positioning hole, and a second end of the sleeve is provided with a sleeve threaded hole extending upward; and

[0018] A pressure head is threadedly connected in the sleeve threaded hole, and the pressure head is provided with the spherical surface.

[0019] The sleeve is movably arranged in the positioning hole, and can move in the vertical direction relative to the turntable. The pressure head is threadedly connected in the sleeve threaded hole, and can be stably connected.

[0020] As a preferred solution of the rotating device of the objective diaphragm, an outer wall of the second end of the sleeve is provided with a sleeve step, and the sleeve step is provided with a gasket. The gasket and the elastic member are sleeved on the outer periphery of the sleeve, and the elastic member abuts against the gasket.

[0021] The gasket is arranged on the sleeve step, and the elastic member is arranged on the gasket. The gasket and the elastic member are sleeved on the outer periphery of the sleeve and are radially limited, and the elastic member can be stably moved in the vertical direction.

[0022] As a preferred solution of the rotating device of the objective diaphragm, a precision gasket is selectively arranged between the gasket and the sleeve step, and the precision gasket is sleeved on the outer periphery of the sleeve.

[0023] The precision gasket is sleeved on the outer periphery of the sleeve and can be radially limited. The precision gasket is arranged between the gasket and the sleeve step, and can accurately adjust the compression amount of the elastic member. The more the precision gaskets, the greater the compression amount of the elastic member. The fewer the precision gaskets, the smaller the compression amount of the elastic member.

[0024] As a preferred solution of the rotating device of the objective diaphragm, a plurality of limiting mechanisms are equiangularly arranged on the outer periphery of the turntable.

[0025] The plurality of limiting mechanisms are arranged at the outer periphery of the rotating disc and can be pressed at a plurality of positions in the circumferential direction of the rotating disc, so that the rotating disc is subjected to elastic pressure at a plurality of positions during rotation, and can rotate stably.

[0026] As a preferred solution of the rotating device of the objective diaphragm, the blade support seat is provided with a first annular groove on the support seat top surface facing the rotating disc, and the rotating disc is provided with a second annular groove on the rotating disc bottom surface facing the blade support seat, and the second annular groove is opposite to the first annular groove in the vertical direction, wherein:

[0027] A plurality of balls are arranged between the first annular groove and the second annular groove, and the balls rotatably support the rotating disc.

[0028] The blade support seat is provided with a first annular groove, and the rotating disc is provided with a second annular groove opposite to the first annular groove, and the balls are arranged between the first annular groove and the second annular groove, i.e. the balls are limited by the first annular groove and the second annular groove at the same time, the balls support the rotating disc, and the rotating disc is automatically centered during rotation, thereby ensuring stable rotation.

[0029] As a preferred solution of the rotating device of the objective diaphragm, the first annular groove is provided with an arc-shaped first axial section, and the second annular groove is provided with an arc-shaped second axial section, and the curvature radii of the first axial section and the second axial section are both greater than the balls.

[0030] The curvature radii of the first axial section and the second axial section are both greater than the balls, so that the balls are in point contact with the first annular groove and the second annular groove respectively, which can reduce friction, generate less particles, delay the time of particle contamination in the objective, and improve the reliability of the rotating device of the objective diaphragm.

[0031] As a preferred solution of the rotating device of the objective diaphragm, the support seat top surface and the rotating disc bottom surface are further provided with a retainer, the retainer is provided with a retaining hole corresponding to each ball, the balls are rotatably arranged in the retaining hole, and the balls rotatably support the retainer.

[0032] The balls are limited in the retaining holes of the retainer, so that the retainer is arranged on the balls, the relative positions of the balls are limited, and the relative positions between the balls are maintained, thereby avoiding that the balls change positions in the first annular groove and the second annular groove at will due to friction after the rotating disc rotates.

[0033] As a preferred solution of the rotating device of the objective diaphragm, the retaining hole is provided with a tapered surface tangent to the ball, so that the ball is seamlessly arranged in the retaining hole.

[0034] The holding hole is provided with a taper surface tangent to the ball to allow the ball to be seamlessly arranged in the holding hole, so that the ball can be rolled in the holding hole without gap and the retainer can be smoothly rotated.

[0035] As a preferred solution of the rotating device of the objective diaphragm, a first sealing member and a second sealing member are further connected between the support seat top surface and the rotating disc bottom surface, the first sealing member is arranged at the radial inner side of the retainer, and the second sealing member is arranged at the radial outer side of the retainer.

[0036] The first sealing member and the second sealing member are respectively arranged at the radial two sides of the retainer, a closed space is formed between the first sealing member, the second sealing member, the vane support seat and the rotating disc, and the retainer and the ball are arranged in the closed space, so that when the rotating disc rotates, the particles generated on the ball and the retainer are limited in the closed space and cannot affect the outside of the closed space, further maintaining the cleanliness of the objective.

[0037] As a preferred solution of the rotating device of the objective diaphragm, the support seat top surface is further provided with a third annular groove, the first annular groove is arranged in the third annular groove, the rotating disc bottom surface is further provided with a fourth annular groove, and the second annular groove is arranged in the fourth annular groove.

[0038] The axial two ends of the retainer are respectively arranged in the third annular groove and the fourth annular groove.

[0039] The support seat top surface is provided with the third annular groove, the first annular groove is arranged in the third annular groove, the rotating disc bottom surface is provided with the fourth annular groove, and the second annular groove is arranged in the fourth annular groove, so that the ball and the retainer are accommodated without changing the axial spacing of the rotating disc and the vane support seat, the third annular groove and the fourth annular groove can cooperate with the retainer in radial gap, limit the retainer from both radial sides, and facilitate the alignment of the retainer during installation.

[0040] As a preferred solution of the rotating device of the objective diaphragm, the vane support seat is further provided with a support seat side wall extending in the axial direction, the support seat side wall is connected to the radial inner side of the support seat top surface, and the rotating disc is further provided with a rotating disc side wall opposite to the support seat side wall in the radial direction.

[0041] The first sealing member is arranged between the support seat side wall and the rotating disc side wall, and the second sealing member is arranged at the radial outer side of the third annular groove and the fourth annular groove.

[0042] The first seal is closer to the shaft than the retainer and the ball, reduces the radial space occupation, and further reduces the radial space requirement of the rotating device of the objective lens diaphragm.

[0043] As the preferred solution of the rotating device of the objective lens diaphragm, the first seal and the second seal are both provided as flexible sealing rings.

[0044] The flexible sealing ring has elasticity, the first seal is arranged between the side wall of the support seat and the side wall of the rotating disc and can be subjected to radial elastic pressure, the second seal is arranged between the top surface of the support seat and the bottom surface of the rotating disc and can be subjected to axial elastic pressure, the support seat and the rotating disc are subjected to radial and axial elastic sealing effects through the first seal and the second seal, and the inside of the objective lens is prevented from being polluted by particulate contaminants, so that the rotating device of the objective lens diaphragm is more reliable in movement.

[0045] The application has the following beneficial effects: the rotating disc moves on the surface of the support seat, the limiting mechanism connected with the support seat can also elastically point-press the rotating disc in the vertical direction, on one hand, the limiting mechanism can elastically move, thereby resisting the vibration and impact of the rotating disc in the vertical direction; on the other hand, the limiting mechanism and the rotating disc are in point contact, which significantly reduces the contact area compared with linear contact and surface contact, thereby reducing friction and reducing the generation of particles, delaying the time of particulate contaminants polluting the inside of the objective lens, and improving the reliability of the rotating device of the objective lens diaphragm. BRIEF DESCRIPTION OF DRAWINGS

[0046] Figure 1 is a structural schematic view of the objective lens diaphragm;

[0047] Figure 2 is Figure 1 is a structural schematic view of the objective lens diaphragm hidden behind the lens barrel and the rotating disc;

[0048] Figure 3 is a structural schematic view of the rotating device of the objective lens diaphragm provided by the embodiment of the application;

[0049] Figure 4 is a structural schematic view of the rotating device of the objective lens diaphragm at the limiting mechanism provided by the embodiment of the application;

[0050] Figure 5 is a structural schematic view of the limiting mechanism in the rotating device of the objective lens diaphragm of the embodiment of the application;

[0051] Figure 6 is Figure 5 is a structural schematic view of the base of the limiting mechanism;

[0052] Figure 7 is Figure 5 a structural schematic diagram of the point presser of the limiting mechanism shown in

[0053] Figure 8 is Figure 4 a structural schematic diagram of the blade support seat in

[0054] Figure 9 is Figure 8 an enlarged schematic diagram in the A circle in

[0055] Figure 10 is Figure 4 a partial structural schematic diagram of

[0056] Figure 11 is Figure 8 a structural schematic diagram of the retainer in

[0057] in the figure:

[0058] 1000 - motor; 1001 - bevel gear pair; 1002 - blade; 1002a - diaphragm aperture; 1003 - rotating pin; 1004 - fixed pin; 1005 - lens barrel;

[0059] 1 - blade support seat; 10 - mounting support; 100 - support seat top surface; 101 - first annular groove; 102 - third annular groove; 103 - support seat side wall;

[0060] 2 - rotating disc; 20 - edge region; 21 - gear; 200 - rotating disc bottom surface; 201 - second annular groove; 202 - fourth annular groove; 203 - rotating disc side wall;

[0061] 3 - limiting mechanism; 31 - base; 32 - point presser; 33 - elastic member; 311 - positioning hole; 320 - spherical surface; 321 - sleeve; 322 - press head; 3210 - sleeve threaded hole; 323 - sleeve step; 324 - washer; 325 - precision gasket;

[0062] 4 - ball bearing;

[0063] 5 - retainer; 50 - retainer hole; 51 - conical surface;

[0064] 6 - first sealing member;

[0065] 7 - second sealing member. DETAILED DESCRIPTION

[0066] The application will be described in further detail below with reference to the drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the application and are not a limitation of the application. In addition, it should be noted that, for ease of description, only the parts related to the application are shown in the drawings and not all structures.

[0067] In the description of the present application, unless otherwise explicitly specified and limited, the terms "connected", "connected", "fixed" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0068] In the present application, unless otherwise explicitly specified and limited, the "upper" or "lower" of the first feature to the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the "upper", "above" and "on" of the first feature to the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the horizontal height of the first feature is higher than that of the second feature. The "below", "under" and "under" of the first feature to the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the horizontal height of the first feature is less than that of the second feature.

[0069] In the description of the present embodiment, the terms "upper", "lower", "right", and other orientation or position relationships are based on the orientation or position relationship shown in the drawings, and are only for the convenience of description and simplification of operation, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first" and "second" are only used to distinguish in the description and have no special meaning.

[0070] The present application provides a rotating device for an objective diaphragm, Figure 1 is a structural schematic diagram of the objective diaphragm, Figure 2 is Figure 1 The structure of the objective diaphragm shown in the figure is hidden behind the lens barrel 1005 and the rotating disc 2.

[0071] As shown in Figure 1 and Figure 2 The objective diaphragm is driven to rotate by a motor 1000 through a pair of bevel gear pairs 1001, which drives the rotating disc 2 to rotate. By means of the rotating pin 1003 on the blade 1002 embedded in the rotating disc 2, a plurality of stacked blades 1002 can be driven to rotate around the fixed pin 1004, so as to finally realize the change of the diaphragm aperture 1002a composed of the blades 1002, and meet the different silicon wafer exposure requirements by changing the diaphragm aperture 1002a.

[0072] The aperture of the objective diaphragm of the embodiment of the present application needs to be continuously adjustable, and the adjustment range is 136mm-191.6mm. At the same time, the adjustment time of the objective diaphragm needs to be as short as possible, and a high roundness and coaxiality need to be ensured, and the particles generated in the objective diaphragm cannot affect the cleanliness of the objective lens in the whole life cycle of the product. Therefore, the reliability of the rotating device of the objective diaphragm is required to be very high.

[0073] Figure 3 is a structure diagram of the rotating device of the objective diaphragm provided by the embodiment of the present application, Figure 4 is a structure diagram of the rotating device of the objective diaphragm at the limiting mechanism, as shown in Figure 3 and Figure 4 , the rotating device comprises a vane support seat 1, a rotating disc 2 and a limiting mechanism 3.

[0074] The vane support seat 1 is arranged at the bottom of the whole rotating device and is used for supporting the vane 1002 and related components, and the rotating disc 2 is rotatably arranged on the vane support seat 1. Specifically, the rotating disc 2 and the vane support seat 1 are coaxially arranged, which can be understood as that the rotation center of the rotating disc 2 passes through the center of the vane support seat 1. The rotation of the rotating disc 2 is driven by Figure 1 the motor 1000 shown in the figure, and then the rotating disc 2 is driven to move through the bevel gear pair 1001. The limiting mechanism 3 is connected with the vane support seat 1 and elastically points the rotating disc 2 in the vertical direction. Specifically, part of the limiting mechanism 3 is located on the radial outside of the rotating disc 2, and the other part points the surface of the rotating disc 2 vertically downward.

[0075] On the one hand, the limiting mechanism 3 can elastically move in the vertical direction, so as to resist the vibration and impact of the rotating disc 2 in the vertical direction; on the other hand, the limiting mechanism 3 and the rotating disc 2 are in point contact, which significantly reduces the contact area compared with linear contact and surface contact, thereby reducing friction and also reducing the generation of particulate matter, delaying the time of particulate matter polluting the inside of the objective lens, and improving the reliability of the rotating device of the objective diaphragm.

[0076] It should be noted that the vane support seat 1 comprises a mounting support 10, the mounting support 10 is provided with a first connecting hole, the limiting mechanism 3 is provided with a second connecting hole, the mounting support 10 is connected with the second connecting hole of the limiting mechanism 3 by penetrating the first connecting hole through the connecting piece to realize fixed connection. Of course, the number of the first connecting hole and the second connecting hole is not limited, in order to realize more firm connection, a plurality of first connecting holes and second connecting holes can be arranged.

[0077] In this embodiment, the mounting bracket 10 is located at the circumferential edge of the blade support 1. The mounting bracket 10 has a smooth through hole, and the limiting mechanism 3 has a threaded hole. A bolt passes through the smooth through hole of the mounting bracket 10 and then connects to the threaded hole of the limiting mechanism 3 to achieve a fixed connection between the mounting bracket 10 and the limiting mechanism 3. Furthermore, the threaded connection allows for a detachable connection between the mounting bracket 10 and the limiting mechanism 3. That is, when the limiting mechanism 3 wears down to the point of needing replacement, it can be removed from the mounting bracket 10.

[0078] Figure 5 This is a schematic diagram of the structure of the limiting mechanism 3 in the rotating device of the objective aperture according to an embodiment of this application. The limiting mechanism 3 includes a base 31, a pressing member 32, and an elastic member 33.

[0079] The first end of the base 31 is connected to the blade support seat 1. Specifically, the bottom of the base 31 is connected to the mounting support 10, which will not be described in detail. The second end of the base 31 is vertically above the edge region 20 of the turntable 2. In this embodiment, the edge region 20 is set as an annular region 1 cm radially inward from the edge of the turntable 2, and the top of the base 31 is set above the edge region 20.

[0080] It is understood that the bottom of the base 31 is located below the turntable 2, while the top of the base 31 is located above the turntable 2. In this embodiment, the base 31 has a “]” shaped structure. Furthermore, there is a height difference between the mounting bracket 10 and the turntable 2, and the bottom of the base 31 is located between the bracket 10 and the turntable 2. This allows the base 31 to be adapted to mounting brackets 10 with smaller diameters, which is beneficial for the miniaturization design of the objective aperture.

[0081] Figure 6 yes Figure 5 The schematic diagram of the base 31 of the limiting mechanism shown is combined with... Figure 5 and Figure 6 The top of the base 31 is provided with a positioning hole 311 extending in the vertical direction, the top of the pressing member 32 is movably disposed in the positioning hole 311, and the bottom of the pressing member 32 is provided with a spherical surface 320 for pressing the edge area 20.

[0082] Specifically, the positioning hole 311 can be configured as a through hole, in which case the pressing member 32 can freely pass through the positioning hole 311. Of course, the positioning hole 311 can also be configured as a blind hole, with an opening facing a certain direction, allowing the top of the pressing member 32 to freely extend into the positioning hole 311 in the vertical direction. For the purpose of a thinner and lighter base 31, in this embodiment, the positioning hole 311 is configured as a through hole.

[0083] The spherical surface 320 can be in point contact with the edge area 20 arranged as a planar structure, so that the contact area can be significantly reduced relative to linear contact and surface contact, thereby reducing the generation of particles.

[0084] Generally, when the turntable 2 rotates, the farther the area on the turntable 2 is from the rotation center, the greater the vibration amplitude of the area. Therefore, when the spherical surface 320 is in point contact with the edge area 20, the vibration amplitude of the turntable 2 can be inhibited as much as possible, further ensuring the smooth rotation of the turntable 2. As shown in Figure 4 The surface of the turntable 2 is also fixedly connected with a gear 21, and the bevel gear pair 1001 engages the gear 21, thereby driving the turntable 2 to rotate.

[0085] It should be noted that the area of the turntable 2 corresponding to the gear 21 is located radially inward of the edge area 20. It can be understood that the closer the force point for rotating the turntable 2 is to the rotation center of the turntable 2, the more stable the rotation of the turntable 2 is. Therefore, the gear 21 and the point presser 32 are designed to be radially staggered, and the gear 21 is closer to the rotation center of the turntable 2 than the point presser 32, so that the gear 21 and the point presser 32 do not interfere with each other, and the rotation of the turntable 2 is more stable.

[0086] The elastic member 33 is connected between the top of the base 31 and the bottom of the point presser 32 to apply an elastic force in the vertical direction to the point presser 32. It can be understood that the top of the elastic member 33 is fixed, and the bottom of the elastic member 33 moves with the point presser 32, thereby changing the elastic force of the elastic member 33. The elastic member 33 can deform in the vertical direction to change the elastic force, and the longer the length of the elastic member 33 is, the smaller the compression amount of the elastic member 33 is, and the shorter the length of the elastic member 33 is, the greater the compression amount of the elastic member 33 is.

[0087] Figure 7 is Figure 5 As shown in the structural schematic view of the point presser 32 of the limiting mechanism, the point presser 32 includes a sleeve 321 and a pressure head 322. The top of the sleeve 321 is movably arranged in the positioning hole 311, and the bottom of the sleeve 321 is provided with a sleeve threaded hole 3210 extending upward. The pressure head 322 is threadedly connected in the sleeve threaded hole 3210, and the bottom of the pressure head 322 is provided with the spherical surface 320.

[0088] Specifically, the outer diameter of the sleeve 321 is smaller than the inner diameter of the positioning hole 311, so that the sleeve 321 can move in the radial direction and in the axial direction in the positioning hole 311. The bottom of the sleeve 321 is located below the positioning hole 311, and the top of the pressure head 322 is in the form of a cylinder. The surface of the cylinder is provided with an external thread and can be threadedly connected in the sleeve threaded hole 3210 of the sleeve 321.

[0089] Further, the outer wall of the bottom of the sleeve 321 is provided with a sleeve step 323, and the sleeve step 323 is provided with a gasket 324. It should be noted that the sleeve step 323 can be an annular structure and annularly arranged on the outer periphery of the sleeve 321, or the sleeve step 323 can be provided as one, two, or even multiple protruding structures formed on the surface of the sleeve 321. The sleeve step 323 is used to support the gasket 324, and the bottom of the elastic member 33 abuts against the gasket 324.

[0090] In the embodiment of the present application, the gasket 324 is sleeved on the outer periphery of the sleeve 321, and the elastic member 33 is provided as a spring, which is also sleeved on the outer periphery of the sleeve 321, so that the elastic member 33 and the gasket 324 abut against each other in the circumferential direction.

[0091] It should be noted that the elastic member 33 is not limited to a single spring sleeved on the sleeve 321, and the elastic member 33 can also be provided as multiple small springs surrounding the outer periphery of the sleeve 321. It can be understood that the diameters of these small springs are obviously smaller than the diameter of the spring sleeved on the sleeve 321.

[0092] Further, a precision gasket 325 is optionally arranged between the gasket 324 and the sleeve step 323, and the precision gasket 325 is annular and sleeved on the outer periphery of the sleeve 321. It can be understood that the precision gasket 325, the gasket 324, and the elastic member 33 are coaxially arranged. Different precision gaskets 325 can be used to accurately control the height position of the pressure head 322, adjust the tightness of the elastic member 33, and change the compression degree when the rotating disc 2 vibrates.

[0093] In the embodiment of the present application, the thickness of a single precision gasket 325 is 100 microns. In order to accurately adjust the elastic force of the elastic member 33, different numbers of precision gaskets 325 are stacked to raise the gasket 324. Each time a precision gasket 325 is stacked, the height of the gasket 324 increases by 100 microns.

[0094] It should be noted that in the embodiment of the present application, the outer periphery of the rotating disc 2 is provided with multiple limiting mechanisms 3, and the number of the limiting mechanisms 3 is not limited to three, four, or even more. The interval angles of the adjacent two limiting mechanisms 3 are the same. The multiple limiting mechanisms 3 arranged on the outer periphery of the rotating disc 2 can point-press at multiple places in the circumferential direction of the rotating disc 2, so that the rotating disc 2 is subjected to elastic pressure at multiple places in the rotating process, can keep stable rotation, and the equiangularly arranged limiting mechanisms 3 make the rotating disc 2 be subjected to uniform force in the circumferential direction, further keeping stable rotation. Specifically, in the embodiment of the present application, the outer periphery of the rotating disc 2 is provided with three limiting mechanisms 3, and the interval angles of the adjacent two limiting mechanisms 3 are both 120°.

[0095] Figure 8 is Figure 4 a structural schematic view of the middle vane support seat 1, Figure 9 isFigure 8 An enlarged schematic view of the inner A ring, Figure 10 Figure 4 A schematic view of a partial structure of the inner A ring, as Figure 4 Figures 8-10 As shown in the drawings, the blade support seat 1 is provided with a first annular groove 101 on the support seat top surface 100 facing the turntable 2, and the turntable 2 is provided with a second annular groove 201 on the turntable bottom surface 200 facing the blade support seat 1, and the second annular groove 201 is opposite to the first annular groove 101 in the vertical direction. A plurality of balls 4 are arranged between the first annular groove 101 and the second annular groove 201, and the balls 4 rotatably support the turntable 2.

[0096] The support seat top surface 100 is provided with a plurality of balls 4, and the turntable 2 is arranged on the balls 4. When the turntable 2 rotates, it can rotate relative to the balls 4. At the same time, due to the pressure of the turntable 2 and the friction between the diameter of the turntable 2 and the balls 4, the balls 4 can also rotate. Moreover, since the support seat top surface 100 is provided with the first annular groove 101, and the turntable bottom surface 200 is provided with the second annular groove 201 axially opposite to the first annular groove 101, and the balls 4 are arranged in the first annular groove 101 and the second annular groove 201, the turntable 2 can make the balls 4 move along a predetermined annular route, and the turntable 2 can automatically center when rotating to ensure stable rotation.

[0097] It should be noted that there is a height difference between the support seat top surface 100 and the surface of the mounting support 10. Specifically, the support seat top surface 100 is higher than the surface of the mounting support 10, so that the support seat top surface 100 and the mounting support 10 form a stepped structure. Moreover, the radius of the support seat top surface 100 is smaller than the radius of the turntable 2, so that a receiving space is formed between the turntable 2 and the mounting support 10, and the base 31 can be as close as possible to the turntable 2 without causing the base 31 of the limiting mechanism 3 to occupy too much space of the mounting support 10.

[0098] Further, the first annular groove 101 is provided with an arc-shaped first axial section, and the second annular groove 201 is provided with an arc-shaped second axial section. The curvature radii of the first axial section and the second axial section are both greater than the balls 4, so that the balls 4 are respectively in point contact with the first annular groove 101 and the second annular groove 201. This can reduce the friction of the balls 4 in the first annular groove 101 and the second annular groove 201, generate less particles, delay the time of particle contamination inside the objective lens, and improve the reliability of the rotating device of the objective lens diaphragm.

[0099] A retainer 5 is further arranged between the support seat top surface 100 and the turntable bottom surface 200, Figure 11 Figure 4 A schematic view of the structure of the retainer 5 in the inner A ring, the retainer 5 is provided with a retainer hole 50 corresponding to each ball 4, and the ball 4 is rotatably arranged in the retainer hole 50 and rotatably supports the retainer 5.​​​

[0100] In this embodiment, the retainer 5 is configured as an annular structure, coaxially arranged with the turntable 2, and has retaining holes 50 that extend through the thickness of the retainer 5, allowing the balls 4 to be supported when placed in the retaining holes 50. The balls 4 can rotate freely within the retaining holes 50. This means that when the turntable 2 drives the balls 4 to move in the first annular groove 101 and the second annular groove 201, the balls 4 can drive the retainer 5 to rotate stably. Simultaneously, the retainer 5 restricts and maintains the relative positions of the balls 4, preventing the balls 4 from arbitrarily changing positions in the first annular groove 101 and the second annular groove 201 due to friction after the turntable 2 rotates.

[0101] Furthermore, in this embodiment, a total of twelve ball bearings 4 are provided, each ball bearing 4 being the same size and having the same mass. Correspondingly, the retainer 5 is provided with twelve retaining holes 50. Preferably, the interval angle between any two adjacent retaining holes 50 is the same, that is, the interval angle between any two adjacent retaining holes 50 is 30°.

[0102] like Figure 11 As shown, the retaining hole 50 has a conical surface 51 tangent to the ball 4 to ensure that the ball 4 is seamlessly disposed within the retaining hole 50. Specifically, the conical surface 51 ensures that the ball 4 is seamlessly disposed within the retaining hole 50, and the ball 4 is tangent to the conical surface 51 at the dotted line position. It can be understood that the dotted line position is actually circular. By making the ball 4 tangent to the conical surface 51, it is ensured that the ball 4 can roll without gaps within the retaining hole 50, and the retainer 5 can also rotate smoothly. At the same time, the retainer 5 is supported by the upward oblique abutment of the ball 4 through the conical surface 51, allowing the ball 4 to rotatably support the retainer 5. In other words, the tangent position of the conical surface 51 and the ball 4 is located above the center of the ball 4, the top diameter of the conical surface 51 is smaller than the diameter of the ball 4, and the bottom diameter of the conical surface 51 is larger than the diameter of the ball 4.

[0103] The top surface 100 of the support base is also provided with a third annular groove 102, in which a first annular groove 101 is disposed. The bottom surface 200 of the turntable is also provided with a fourth annular groove 202, in which a second annular groove 201 is disposed. Specifically, the axial cross-section of the third annular groove 102 is set as a rectangle, the first annular groove 101 is disposed in the central region of the third annular groove 102, the axial cross-section of the fourth annular groove 202 is also set as a rectangle or a right-angled groove, and the second annular groove 201 is disposed in the central region of the fourth annular groove 202.

[0104] The axial both ends of the retainer 5 are arranged inside the third annular groove 102 and the fourth annular groove 202 respectively. It can be understood that the retainer 5 is suspended by the ball 4 between the third annular groove 102 and the fourth annular groove 202, the lower end surface of the retainer 5 is spaced from the groove bottom surface of the third annular groove 102, and the upper end surface of the retainer 5 is spaced from the groove bottom surface of the fourth annular groove 202.

[0105] The third annular groove 102 and the fourth annular groove 202 can accommodate the ball 4 and the retainer 5 without changing the axial spacing of the disc 2 and the blade support seat 1, and the third annular groove 102 and the fourth annular groove 202 can be radially matched with the retainer 5 to limit the retainer 5 from both sides in the radial direction, and facilitate alignment when the retainer 5 is installed.

[0106] In the embodiment of the application, the diameter of the ball 4 is 8mm, the groove bottom of the first annular groove 101 is 2mm lower than the groove bottom of the third annular groove 102, the groove bottom of the second annular groove 201 is 1mm higher than the groove bottom of the fourth annular groove 202, the axial spacing between the retainer 5 and the support seat top surface 100 is 0.8mm, and the radial spacing is 1mm, and the axial spacing between the retainer 5 and the disc bottom surface 200 is 0.8mm, and the radial spacing is 1mm.

[0107] Further, the blade support seat 1 is also provided with a support seat side wall 103 extending in the axial direction, the support seat side wall 103 is connected to the radial inner side of the support seat top surface 100, and the disc 2 is also provided with a disc side wall 203 radially opposite to the support seat side wall 103. The first sealing member 6 is arranged between the support seat side wall 103 and the disc side wall 203, and the second sealing member 7 is arranged radially outside the third annular groove 102 and the fourth annular groove 202.

[0108] Specifically, the support seat side wall 103 is higher than the support seat top surface 100, the bottom of the support seat side wall 103 is connected to the inner side end of the support seat top surface 100 and forms a right angle structure, the disc side wall 203 is higher than the disc bottom surface 200, and the bottom of the disc side wall 203 is connected to the inner side end of the disc bottom surface 200 and forms a right angle structure. The blade support seat 1 and the disc 2 are limited by the gap fit in the radial direction through the support seat side wall 103 and the disc side wall 203.

[0109] One of the support seat side wall 103 and the disc side wall 203 is provided with a first sealing groove, in the embodiment of the application, the support seat side wall 103 is provided with the first sealing groove, one side of the first sealing member 6 is clamped in the first sealing groove, and the other side of the first sealing member 6 is sealed and abuts against the disc side wall 203 in the radial direction.

[0110] One of the support seat top surface 100 and the rotating disc bottom surface 200 is provided with a second sealing groove, in the embodiment of the application, the support seat top surface 100 is provided with the second sealing groove, one side of the second sealing element 7 is clamped in the second sealing groove, and the other side of the second sealing element 7 is sealed against the rotating disc bottom surface 200 in the axial direction.

[0111] The first sealing element 6 is closer to the central axis than the retainer 5 and the ball 4, the first sealing element 6 occupies a height position that can avoid occupying a radial space, thereby reducing the radial space requirement of the rotating device of the objective diaphragm. The second sealing element 7 is located radially outside the third annular groove 102 and the fourth annular groove 202, can fully utilize the height gap between the vane support seat 1 and the rotating disc 2, and reduces the axial space requirement of the rotating device of the objective diaphragm, which is beneficial to the miniaturization design requirement of the objective diaphragm.

[0112] Further, the first sealing element 6 and the second sealing element 7 are both provided as flexible sealing rings, the flexible sealing rings can maintain sealing while having a certain elasticity, in the embodiment of the application, the first sealing element 6 and the second sealing element 7 are both selected as rubber rings.

[0113] The first sealing element 6 is arranged between the support seat side wall 103 and the rotating disc side wall 203 and can be subjected to radial elastic pressure, the second sealing element 7 is arranged between the support seat top surface 100 and the rotating disc bottom surface 200 and is subjected to axial elastic pressure, the vane support seat 1 and the rotating disc 2 are subjected to radial and axial elastic sealing effects through the first sealing element 6 and the second sealing element 7, the granular pollutants are prevented from polluting the inside of the objective, and the rotating device of the objective diaphragm is more stable when moving.

[0114] The objective diaphragm rotating device provided by the embodiment of the application has the beneficial effects that: the limiting mechanism 3 can elastically move in the vertical direction, thereby resisting the vibration and impact of the rotating disc 2 in the vertical direction, the limiting mechanism 3 and the rotating disc 2 are in point contact, the contact area is significantly reduced compared with linear contact and surface contact, thereby reducing friction and also reducing the generation of particulate matter, delaying the time of particulate matter polluting the inside of the objective, and improving the reliability of the rotating device of the objective diaphragm.

[0115] Obviously, the above embodiments of the application are only examples for clearly illustrating the application, and are not intended to limit the implementation modes of the application. For those skilled in the field, various obvious changes, readjustments and substitutions can be made without departing from the protection scope of the application. It is unnecessary and impossible to enumerate all the implementation modes. Any modification, equivalent substitution and improvement made within the spirit and principle of the application shall be included in the protection scope of the claims of the application.

Claims

1. A rotating device for an objective aperture, characterized in that, include: Blade support (1); The turntable (2) is rotatably mounted on the blade support (1); as well as The limiting mechanism (3) is connected to the blade support seat (1) and elastically presses the turntable (2) in the vertical direction. The limiting mechanism (3) includes: The base (31) has its first end connected to the blade support seat (1), and its second end is located above the edge area (20) of the turntable (2) and has a positioning hole (311) extending in the vertical direction. A pressure point element (32), the first end of which is movably disposed in the positioning hole (311), and the second end of which is provided with a spherical surface (320) for pressing the edge region (20); and An elastic element (33) is connected between the second end of the base (31) and the second end of the pressure point (32) to apply a vertical elastic force to the pressure point (32).

2. The objective aperture rotation device according to claim 1, characterized in that, The point pressure component (32) includes: A sleeve (321), the first end of which is movably disposed in the positioning hole (311), and the second end of which is provided with an upwardly extending sleeve threaded hole (3210); and The pressure head (322) is threadedly connected in the threaded hole (3210) of the sleeve, and the pressure head (322) is provided with the spherical surface (320).

3. The objective aperture rotation device according to claim 2, characterized in that, The outer wall of the second end of the sleeve (321) is provided with a sleeve step (323), and a washer (324) is provided on the sleeve step (323). The washer (324) and the elastic element (33) are both sleeved on the outer periphery of the sleeve (321), and the elastic element (33) abuts against the washer (324).

4. The objective aperture rotation device according to claim 3, characterized in that, A precision gasket (325) is provided between the washer (324) and the sleeve step (323), and the precision gasket (325) is sleeved on the outer periphery of the sleeve (321).

5. The objective aperture rotation device according to any one of claims 1-4, characterized in that, Multiple limiting mechanisms (3) are arranged at equal angular intervals on the outer periphery of the turntable (2).

6. The objective aperture rotation device according to any one of claims 1-4, characterized in that, The blade support (1) has a first annular groove (101) on its top surface (100) facing the turntable (2), and the turntable (2) has a second annular groove (201) on its bottom surface (200) facing the blade support (1). The second annular groove (201) and the first annular groove (101) are vertically opposite each other. A plurality of balls (4) are provided between the first annular groove (101) and the second annular groove (201), and the balls (4) rotatably support the turntable (2).

7. The objective aperture rotation device according to claim 6, characterized in that, The first annular groove (101) has an arc-shaped first axial section, and the second annular groove (201) has an arc-shaped second axial section. The radii of curvature of the first axial section and the second axial section are both greater than the ball (4).

8. The objective aperture rotation device according to claim 6, characterized in that, A retainer (5) is provided between the top surface (100) of the support base and the bottom surface (200) of the turntable. The retainer (5) is provided with retaining holes (50) corresponding to the balls (4). The balls (4) are rotatably disposed in the retaining holes (50) and the balls (4) rotatably support the retainer (5).

9. The objective aperture rotation device according to claim 8, characterized in that, The retaining hole (50) is provided with a tapered surface (51) tangent to the ball (4) so ​​that the ball (4) is seamlessly disposed in the retaining hole (50).

10. The objective aperture rotation device according to claim 8, characterized in that, A first seal (6) and a second seal (7) are also connected between the top surface (100) of the support base and the bottom surface (200) of the turntable. The first seal (6) is disposed on the radial inner side of the retainer (5), and the second seal (7) is disposed on the radial outer side of the retainer (5).

11. The objective aperture rotation device according to claim 10, characterized in that, The top surface (100) of the support base is also provided with a third annular groove (102), and the first annular groove (101) is disposed in the third annular groove (102). The bottom surface (200) of the turntable is also provided with a fourth annular groove (202), and the second annular groove (201) is disposed in the fourth annular groove (202). The axial ends of the retainer (5) are respectively disposed in the third annular groove (102) and the fourth annular groove (202).

12. The objective aperture rotation device according to claim 11, characterized in that, The blade support (1) is further provided with a support sidewall (103) extending along the axial direction. The support sidewall (103) is connected to the radial inner side of the top surface (100) of the support. The turntable (2) is further provided with a turntable sidewall (203) that is radially opposite to the support sidewall (103). The first seal (6) is disposed between the side wall of the support seat (103) and the side wall of the turntable (203), and the second seal (7) is disposed radially outside the third annular groove (102) and the fourth annular groove (202).

13. The objective aperture rotation device according to claim 12, characterized in that, Both the first seal (6) and the second seal (7) are configured as flexible sealing rings.

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