Ion cleaning method, coating preparation method, and coating

CN116103607BActive Publication Date: 2026-07-07GUANGDONG HUASHENG NANO TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
GUANGDONG HUASHENG NANO TECH CO LTD
Filing Date
2023-01-09
Publication Date
2026-07-07

AI Technical Summary

Technical Problem

Traditional ion cleaning methods are difficult to completely remove contaminants from the surface of the substrate, resulting in less than ideal adhesion between the substrate and the coating, and are also energy-intensive and costly.

Method used

By applying a magnetic field and combining it with a negative bias voltage in the reaction chamber, a plasma with high ion energy, high ionization rate, and uniform distribution is induced by the magnetic field and negative bias voltage to perform ion cleaning on the substrate surface, thereby removing contaminants and improving surface activity.

Benefits of technology

It achieves complete removal of contaminants from the substrate surface, enhances the adhesion between the substrate and the coating, and reduces energy consumption and cost.

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Abstract

The present application relates to a kind of ion cleaning method, coating preparation method and coating.The ion cleaning method includes the following steps: substrate is arranged in reaction cavity, vacuumizing, and magnetic field is applied in the reaction cavity;Cleaning gas is introduced into the reaction cavity, negative bias is applied to the substrate, the cleaning gas is ionized, and the surface of the substrate is ion cleaned using the obtained ion.The ion cleaning method induces plasma with high ion energy, high ionization rate and uniform distribution by the combination of magnetic field and negative bias, can thoroughly remove the pollutants attached to the surface of substrate, and improve the surface activity of substrate, so as to enhance the adhesion between substrate and coating.
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