Thin film transistor, thin film transistor substrate, and display device

By introducing a gap space design into the thin-film transistor, the difference in electric field effect is enhanced, which solves the problem of insufficient grayscale performance of thin-film transistors in driving thin-film transistors, achieves a large s-factor and excellent current characteristics, and improves the grayscale performance of display devices.

CN116153937BActive Publication Date: 2026-07-03LG DISPLAY CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
LG DISPLAY CO LTD
Filing Date
2022-10-31
Publication Date
2026-07-03

AI Technical Summary

Technical Problem

When existing thin-film transistors are used to drive thin-film transistors in display devices, they are difficult to simultaneously possess a large s-factor and excellent on-state current characteristics, resulting in insufficient grayscale performance.

Method used

Design a thin-film transistor structure including a first active layer, a first gate electrode and two auxiliary gate electrodes. By setting a gap space in the channel portion to increase the difference in electric field effect, improve the s-factor, and provide excellent current characteristics in the on state.

Benefits of technology

This achievement realizes a large s-factor and excellent current characteristics of thin-film transistors in the on-state, thereby improving the grayscale performance of display devices.

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Abstract

A thin-film transistor (TFT), a TFT substrate including the TFT, and a display device are provided. The TFT includes a first active layer, a first auxiliary gate electrode, and a first gate electrode, wherein the first active layer includes a first channel portion, a first connection portion contacting one side of the first channel portion, and a second connection portion contacting the other side of the first channel portion.
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