Triggering structure and method for lithography machine interlock

Abstract

The application discloses a kind of triggering structure and method of photoetching machine interlock device, belong to photoetching machine technical field, the triggering structure of this photoetching machine interlock device, set in the maintenance window of the photoetching machine, the maintenance window of the photoetching machine is covered with baffle, the inside of the photoetching machine is also provided with fixing device, and detection space is formed between the fixing device and the baffle, the triggering structure includes laser emitter, reflecting device and laser receiver, the laser receiver position fixedly installed in the inside of the photoetching machine, to trigger the interlock device when not receiving laser beam. Adopt laser device as triggering structure, trigger interlock device by not receiving laser beam in laser receiving device, to reduce the photoetching machine downtime caused by external force collision, avoid potential wafer and component damage risk.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photoetching machines, in particular to a triggering structure and method of an interlock device of a photoetching machine. BACKGROUND

[0002] There are various laser light sources and high-speed moving components inside a photoetching machine, and the laser light of some wavelengths and the high-speed moving components can also cause potential harm to the human body, so the interlock device of the cover arranged on the maintenance window of the photoetching machine is very important. The interlock device of the photoetching machine generally adopts a contact interlock device, and the magnetic sensitive elements are arranged on the two layers of covers inside and outside the machine, when the covers inside and outside the machine are normally locked, the contact magnetic sensitive elements generate an electric signal, when the MBDS (Machine Based Diagnostic System) software of the machine detects the electric signal generated by the contact magnetic sensitive elements, it is indicated that the covers inside and outside the machine are normally locked, and the interlock device works normally, when the cover outside the machine is removed, the covers inside and outside the machine cannot transmit the electric signal, and the MBDS software detects that there is no electric signal transmission, then the interlock device is triggered, the laser light source and the moving component are closed and stopped working, and the machine is stopped working, thereby protecting the safety of the personnel.

[0003] In the actual manufacturing process, the interlock device of the photoetching machine still has defects, and the cover is often intact, but the interlock device is triggered, thereby causing the photoetching machine to stop suddenly. Especially for the covers before and after the Waferstage (crystal wafer bearing table) of the 12-inch photoetching machine, when there is a slight collision of external force, the covers inside and outside the machine normally cover the maintenance window, the interlock device alarm is triggered, and the photoetching machine stops suddenly, if the interlock device is triggered when the wafer is being handed over to the mechanical arm, the machine stops suddenly, and there is a risk of wafer damage caused by wafer throwing. The reason is that when the mask is placed, the body or the cart of the production personnel collides with the outer cover of the machine, when the cover is impacted by external force, the electric signal generated by the magnetic sensitive element will have a large instantaneous current, which will be fed back to the MBDS system to display that the interlock device is abnormal, thereby causing the machine to stop suddenly, causing unnecessary machine downtime and potential wafer damage or component damage. SUMMARY

[0004] The present application aims to provide a triggering structure and method of an interlock device of a photoetching machine, to solve the problem that the cover is easily impacted to cause the machine to stop suddenly.

[0005] In order to solve the above technical problems, the present application provides a triggering structure of an interlocking device of a photoetching machine, which is arranged at a maintenance window of the photoetching machine, a shielding plate is arranged on the maintenance window of the photoetching machine, a fixing device is further arranged in the photoetching machine, and a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, the laser receiver is fixedly arranged in the photoetching machine, and is used for triggering the interlocking device when no laser beam is received.

[0006] The laser emitter is arranged on a side of the fixing device which faces the shielding plate, and the reflecting device is arranged on an end surface of the shielding plate which is located in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver.

[0007] Preferably, the reflecting device comprises a first beam splitter and a second beam splitter which are perpendicular to each other, so that the laser beams which enter and exit the reflecting device are parallel.

[0008] Preferably, the laser receiver is arranged on a side of the fixing device which faces the shielding plate, and is used for receiving the laser beam reflected by the reflecting device.

[0009] A photoetching machine comprises the triggering structure of the interlocking device of the photoetching machine according to any one of the above.

[0010] The present application further provides another triggering structure of an interlocking device of a photoetching machine, which is arranged at a maintenance window of the photoetching machine, a shielding plate is arranged on the maintenance window of the photoetching machine, a fixing device is further arranged in the photoetching machine, and a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, the laser receiver is fixedly arranged in the photoetching machine, and is used for triggering the interlocking device when no laser beam is received.

[0011] The laser emitter is arranged on an end surface of the shielding plate which is located in the photoetching machine, and the reflecting device is arranged on a side of the fixing device which faces the shielding plate, and is used for reflecting the received laser beam to the laser receiver.

[0012] Preferably, the reflecting device comprises a first beam splitter and a second beam splitter which are perpendicular to each other, so that the laser beams which enter and exit the reflecting device are parallel.

[0013] Preferably, the laser receiver is arranged on an end surface of the shielding plate which is located in the photoetching machine, and is used for receiving the laser beam reflected by the reflecting device.

[0014] A photoetching machine comprises the triggering structure of the interlocking device of the photoetching machine according to any one of the above.

[0015] The application also provides a triggering method of an interlocking device of a photoetching machine, which is arranged at a maintenance window of the photoetching machine, a shielding plate is arranged on the maintenance window of the photoetching machine, a fixing device is arranged in the photoetching machine, and a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, the laser receiver is fixedly arranged in the photoetching machine, and is used for triggering the interlocking device when no laser beam is received; wherein:

[0016] The laser emitter is arranged on a side of the fixing device facing the shielding plate, and the reflecting device is arranged on an end surface of the shielding plate in the photoetching machine, and is used for reflecting the received laser beam to the laser receiver; or the laser emitter is arranged on an end surface of the shielding plate in the photoetching machine, and the reflecting device is arranged on a side of the fixing device facing the shielding plate, and is used for reflecting the received laser beam to the laser receiver.

[0017] The method further comprises the following steps:

[0018] The laser emitter is started to emit a laser beam, the laser beam is reflected to the laser receiver through the reflecting device, and the photoetching machine works normally.

[0019] When the shielding plate moves with the reflecting device or the laser emitter thereon, the laser receiver cannot receive the laser beam reflected by the reflecting device, the interlocking device is triggered, and the photoetching machine stops working.

[0020] Preferably, the reflecting device comprises first and second reflecting surfaces, so that the laser beams entering and exiting the reflecting device are parallel.

[0021] In the triggering structure and method of the interlocking device of the photoetching machine, the laser device is used as the triggering structure, when the shielding plate is hit by external force, as long as the laser receiver in the photoetching machine can receive the reflected laser beam, the interlocking device will not be triggered, and slight displacement of the shielding plate is not enough to offset the position of the laser beam beyond the receiving range of the laser receiver, the laser receiver can still receive the laser beam, thereby allowing a certain degree of position displacement, effectively avoiding the photoetching machine from being stopped due to the triggering of the interlocking device caused by accidental collision of external force, and unnecessary loss is caused. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 is a schematic diagram of an embodiment provided by the application.

[0023] In the drawings,

[0024] 1, laser transmitter; 2, laser receiver; 3, first beam splitter; 4, second beam splitter; 5, shielding plate; 6, fixing device. DETAILED DESCRIPTION

[0025] The triggering structure and method of the interlocking device of the photoetching machine according to the present application will be further described in detail below in combination with the accompanying drawings and specific embodiments. The advantages and features of the present application will be more apparent according to the following description and claims. It should be noted that the accompanying drawings are all in a very simplified form and all use non-precise proportions, only for the purpose of facilitating and clarifying the description of the embodiments of the present application.

[0026] The inventor has found that the contact type interlocking device is generally used in the photoetching machine, and the magnetic sensitive elements are assembled in the inner and outer covers of the photoetching machine. When the inner and outer covers are normally locked, the magnetic sensitive elements in contact with each other will generate an electric signal, which will be transmitted in sequence through SHB (Safety Handling Box), MSB device net (Machine Based safety structure device net), IPC (Industrial PC), SUN MBDS hardware system (SUN Machine Based Diagnostic System Hardwaresystem SUN system), and when the final machine software MBDS detects the signal, it indicates that the inner and outer covers are in good contact. When the outer cover is removed, SHB has no signal transmission, and MBDS cannot detect the signal, the interlocking device is triggered, and the photoetching machine stops working.

[0027] The inventor has further found that the production personnel will collide with the outer wall of the cover when placing the photo mask, and the impact will cause the electric signal generated by the magnetic sensitive element to have a too large instantaneous current, which will be fed back to the MBDS system to display that the interlocking device is abnormal, causing the machine to stop suddenly, especially when the wafer carrier is in high-speed motion, which can easily cause the wafer to be damaged accidentally.

[0028] Based on this, the core idea of the present application is to improve the triggering structure of the interlocking device of the photoetching machine, use a laser transmitter and a laser receiver as the triggering structure, and when the shielding plate is impacted and collided by the outside, the slight displacement of the shielding plate is not enough to offset the position of the laser beam beyond the receiving range of the laser receiver, and the laser receiver can still receive the laser beam, thereby allowing the shielding plate to move to a certain extent, avoiding the external accidental touch or accidental impact from causing the machine to stop suddenly and causing unnecessary loss.

[0029] Specifically, please refer to Figure 1 which is a schematic diagram of an embodiment of the present application. As shown inFigure 1 As shown in the figure, a trigger structure of an interlock device of a photoetching machine is arranged at a maintenance window of the photoetching machine, a shielding plate 5 is arranged on the maintenance window of the photoetching machine, a fixing device 6 is further arranged inside the photoetching machine, and a detection space is formed between the fixing device 6 and the shielding plate 5. The trigger structure comprises a laser emitter 1, a reflecting device and a laser receiver 2. The laser receiver 2 is fixedly installed inside the photoetching machine and is used to trigger the interlock device when no laser beam is received. Wherein: the laser emitter 1 is arranged on the side of the fixing device 6 facing the shielding plate 5, and the reflecting device is installed on the end face of the shielding plate 5 inside the photoetching machine and is used to reflect the received laser beam to the laser receiver 2.

[0030] The laser emitter 1 is assembled on the side of the machine close to the shielding plate 5, and the reflecting device is arranged on the inner side of the shielding plate 5 opposite to the laser emitter 1, for example, two beam splitters are arranged at an angle of 45 degrees with the shielding plate 5. In normal working condition, the laser emitted by the laser emitter 1 is reflected to the laser receiver 2 through the reflecting device. When the shielding plate 5 is hit by external force, as long as the laser receiver 2 on the inner side of the machine can receive the reflected laser beam, the interlock device will not be triggered, so the machine interlock triggered by external force is effectively avoided. When it is necessary to open the shielding plate 5 for work, for example, for maintenance, the shielding plate 5 is removed, so that the laser receiver 2 cannot receive the laser, the interlock device is triggered, the machine is shut down, and the related moving parts stop moving, thereby ensuring the personal safety of the operator. For safety consideration, the laser emitter 1 can emit low-intensity infrared light, and the laser emitter 1 also stops emitting laser at the same time when the interlock device is triggered.

[0031] In addition, the trigger sensitivity of the trigger structure can be adjusted by adjusting the receiving range of the laser receiver 2, which is convenient for flexible adjustment according to the working state of the photoetching machine.

[0032] It should be noted that there is inevitable diffuse reflection of light inside the shielding plate 5. In order to avoid the interference of diffuse reflection, the laser receiver 2 can be arranged to keep the interlock device from being triggered only when a laser beam with a predetermined intensity is received, and the interlock device will be triggered when a laser beam with an intensity lower than the predetermined intensity is received.

[0033] In an embodiment, the fixing device 6 can be a device inside the photoetching machine opposite to the shielding plate 5 and without shielding between them, wherein the fixing device 6 is used to arrange the end face of the laser emitter 1 parallel or at an angle with the shielding plate 5, so as to form a corresponding detection space between the fixing device 6 and the opposite shielding plate 5, so that the laser beam can pass through the detection space. The fixing device 6 can be a device fixed in position inside the photoetching machine, for example, the base of a wafer carrier.

[0034] The interior of the lithography machine, specifically the cavity housing the wafer carrier and other components, includes a removable shield 5. Removing the shield 5 exposes the internal inspection space of the lithography machine, allowing for inspection and maintenance through the inspection window. Furthermore, although the shield 5 has a double-layered structure, the "end face" of the shield 5 inside the lithography machine refers specifically to the end face of the inner shield 5 within the machine.

[0035] In one embodiment, the reflecting device includes a first beam splitter 3 and a second beam splitter 4 with perpendicular reflecting surfaces, so that the laser beams entering and exiting the reflecting device are parallel. Figure 1 The reflective surfaces of the first beam splitter 3 and the second beam splitter 4 are both at a 45-degree angle to the shielding plate 5. The laser emitter 1 emits a laser beam to the first beam splitter 3, which reflects the laser beam to the second beam splitter 4. The second beam splitter 4 then emits a laser beam parallel to the laser beam emitted by the laser emitter 1. When the shielding plate 5 is impacted and shaken (along its normal direction), the first beam splitter 3 and the second beam splitter 4 can still reflect the laser beam to the laser receiver 2, which can also expand the laser receiving range of the laser receiver 2 and prevent the lithography machine from stopping abruptly due to the impact of the shielding plate 5, thus avoiding losses.

[0036] In practical operation, since the relative displacement between the laser emitter 1 and the reflecting device (e.g., in the direction perpendicular to the baffle 5) is within a certain range, the first beam splitter 3 can still receive the laser beam and reflect it to the second beam splitter 4. The second beam splitter 4 then emits a laser beam parallel to the incident laser beam, allowing for slight displacement caused by the slight vibration of the baffle 5, thus avoiding false triggering. The sensitivity of the triggering structure can also be adjusted by adjusting the receiving range of the laser receiver 2. For example, the direction of an impact from the outside is not necessarily perpendicular to the direction of the baffle 5. In addition to vibrating in its normal direction, the baffle 5 also tends to squeeze the maintenance window. Therefore, by slightly increasing the lens area of ​​the receiving window at the receiving end of the laser receiver 2, the laser receiver 2 can still receive the reflected laser beam when the baffle 5 experiences slight up-down or left-right displacement.

[0037] Alternatively, a single beam splitter can be used as a reflecting device. When the shielding plate 5 is impacted and vibrates, it can easily cause the reflected laser beam to vibrate. Therefore, it is necessary to increase the receiving range of the laser receiver 2 to avoid accidental external contact or impact that could trigger the interlocking device.

[0038] Specifically, such as Figure 1The laser receiver 2 is arranged on the side of the fixed device 6 facing the shielding plate 5 to receive the laser beam reflected by the reflecting device. If the reflecting device comprises the first beam splitter 3 and the second beam splitter 4 with the reflecting surfaces being perpendicular, the laser emitter 1 can be arranged to emit the laser beam perpendicular to the shielding plate 5, and the laser beam is reflected by the first beam splitter 3 and the second beam splitter 4 and then emitted parallel to the incident laser beam, so the laser receiver 2 can also be arranged on the fixed device 6.

[0039] As an extended embodiment, the existing laser ranging device can also be used as the laser emitter 1 and the laser receiver 2, and the corresponding reflecting device reflects the laser emitted by the laser ranging device. When the laser ranging device measures that the distance between the fixed device 6 and the shielding plate 5 is less than the preset distance, the interlocking device is not triggered; and when the laser ranging device measures that the distance between the fixed device 6 and the shielding plate 5 is less than the preset distance, the interlocking device is triggered.

[0040] Based on the triggering structure of the lithography machine interlocking device, a lithography machine is also provided, which comprises the triggering structure of the lithography machine interlocking device according to any one of the above.

[0041] The present application also provides another embodiment, a triggering structure of a lithography machine interlocking device, which is arranged at a maintenance window of a lithography machine, the maintenance window of the lithography machine is covered by a shielding plate 5, the inside of the lithography machine is also provided with a fixed device 6, and a detection space is formed between the fixed device 6 and the shielding plate 5, the triggering structure comprises a laser emitter 1, a reflecting device and a laser receiver 2, the laser receiver 2 is fixedly installed in the inside of the lithography machine to trigger the interlocking device when no laser beam is received; wherein: the laser emitter 1 is installed on an end surface of the shielding plate 5 located in the inside of the lithography machine, the reflecting device is installed on the side of the fixed device 6 facing the shielding plate 5 to reflect the received laser beam to the laser receiver 2. The reflecting device comprises the first beam splitter 3 and the second beam splitter 4 with the reflecting surfaces being perpendicular, so that the incident and emitted laser beams of the reflecting device are parallel. The laser receiver 2 is arranged on the end surface of the shielding plate 5 located in the inside of the lithography machine to receive the laser beam reflected by the reflecting device.

[0042] The reference surface is a plane in the detection space parallel to the shielding plate 5 and having a predetermined distance from the shielding plate 5. In fact, the laser emitter 1 and the reflecting device can be arranged on the two sides of the reference surface, and any one of the laser emitter 1 and the reflecting device is arranged on the end surface of the shielding plate 5 located in the inside of the lithography machine, and the reflecting device is used to reflect the received laser beam to the laser receiver 2. Therefore, the present embodiment is different from the previous embodiment, and the laser emitter 1 and the laser receiver 2 are both arranged on the shielding plate 5, and the reflecting device is arranged on the fixed device 6, and the technical principle of triggering is the same as that of the previous embodiment, which will not be described herein.

[0043] Based on the above-mentioned triggering structure of the lithography machine interlocking device, another lithography machine is provided, comprising the above-mentioned triggering structure of the lithography machine interlocking device.

[0044] Based on the above-mentioned triggering structure of the lithography machine interlocking device, a triggering method of the lithography machine interlocking device is provided, which is arranged at a maintenance window of a lithography machine, the maintenance window of the lithography machine is covered with a shielding plate 5, the inside of the lithography machine is further provided with a fixing device 6, and a detection space is formed between the fixing device 6 and the shielding plate 5, the triggering structure comprises a laser emitter 1, a reflecting device and a laser receiver 2, the laser receiver 2 is fixedly installed in the inside of the lithography machine, and is used to trigger the interlocking device when no laser beam is received; wherein: the laser emitter 1 is arranged on the side of the fixing device 6 facing the shielding plate 5, the reflecting device is installed on the end face of the shielding plate 5 located in the inside of the lithography machine, and is used to reflect the received laser beam to the laser receiver 2; or, the laser emitter 1 is installed on the end face of the shielding plate 5 located in the inside of the lithography machine, and the reflecting device is installed on the side of the fixing device 6 facing the shielding plate 5, and is used to reflect the received laser beam to the laser receiver 2. The method further comprises the following steps:

[0045] The laser emitter 1 is started to emit a laser beam, the laser beam is reflected to the laser receiver 2 through the reflecting device, and the lithography machine works normally; when the shielding plate 5 drives the reflecting device or the laser emitter 1 to move, the laser receiver 2 cannot receive the laser beam reflected by the reflecting device, the interlocking device is triggered, and the lithography machine stops working. The reflecting device comprises a first beam splitter 3 and a second beam splitter 4 which are perpendicular to the reflecting surface, so that the laser beams entering and exiting the reflecting device are parallel.

[0046] As can be seen from the above, in the triggering structure of the lithography machine interlocking device provided in the embodiment of the present application, a new triggering structure is designed, a laser device is used as the triggering structure, and the interlocking device is triggered when the laser receiving device cannot receive the laser beam, so that the downtime of the lithography machine caused by external force collision is reduced, and the potential risk of wafer and component damage is avoided.

[0047] The above description is only a description of the preferred embodiments of the present application, and does not limit the scope of the present application in any way, and any modification or modification of the present application by a person skilled in the art based on the above disclosure is within the protection scope of the claims.

Claims

1. A triggering structure of an interlock device of a photolithography machine, disposed at a maintenance window of the photolithography machine, characterized in that, The maintenance window of the photoetching machine is covered with a shielding plate, the inside of the photoetching machine is further provided with a fixing device, and a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, the laser receiver is fixedly installed in the inside of the photoetching machine, and is used for triggering the interlocking device when no laser beam is received; wherein: The laser emitter is arranged on the side of the fixing device facing the shielding plate, and the reflecting device is installed on the end face of the shielding plate located in the inside of the photoetching machine, and is used for reflecting the received laser beam to the laser receiver; the reflecting device comprises a first light splitter and a second light splitter with perpendicular reflecting surfaces, so that the laser beams entering and exiting the reflecting device are parallel.

2. The trigger structure of the lithography machine interlock device according to claim 1, wherein, The laser receiver is arranged on the side of the fixing device facing the shielding plate, and is used for receiving the laser beam reflected from the reflecting device.

3. A lithographic machine characterized by, The photoetching machine interlocking device triggering structure comprises the photoetching machine interlocking device triggering structure according to any one of claims 1-2.

4. A triggering structure of an interlock device of a lithography machine, characterized in that, The maintenance window of the photoetching machine is covered with a shielding plate, the inside of the photoetching machine is further provided with a fixing device, and a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, the laser receiver is fixedly installed in the inside of the photoetching machine, and is used for triggering the interlocking device when no laser beam is received; wherein: The laser emitter is installed on the end face of the shielding plate located in the inside of the photoetching machine, and the reflecting device is installed on the side of the fixing device facing the shielding plate, and is used for reflecting the received laser beam to the laser receiver; the reflecting device comprises a first light splitter and a second light splitter with perpendicular reflecting surfaces, so that the laser beams entering and exiting the reflecting device are parallel.

5. The photoetcher interlock trigger structure of claim 4 wherein, The laser receiver is arranged on the side of the fixing device facing the shielding plate, and is used for receiving the laser beam reflected from the reflecting device.

6. A lithographic machine characterized by, The photoetching machine interlocking device triggering structure comprises the photoetching machine interlocking device triggering structure according to any one of claims 4-5.

7. A method for triggering an interlock device of a lithography machine, the interlock device and a triggering structure of the interlock device are arranged at an access window of the lithography machine, characterized in that, The maintenance window of the photoetching machine is covered with a shielding plate, the inside of the photoetching machine is further provided with a fixing device, and a detection space is formed between the fixing device and the shielding plate, the triggering structure comprises a laser emitter, a reflecting device and a laser receiver, the laser receiver is fixedly installed in the inside of the photoetching machine, and is used for triggering the interlocking device when no laser beam is received; wherein: The laser emitter is arranged on the side of the fixing device facing the shielding plate, and the reflecting device is installed on the end face of the shielding plate located in the inside of the photoetching machine, and is used for reflecting the received laser beam to the laser receiver; or, the laser emitter is installed on the end face of the shielding plate located in the inside of the photoetching machine, and the reflecting device is installed on the side of the fixing device facing the shielding plate, and is used for reflecting the received laser beam to the laser receiver; Further comprising the following steps: The laser emitter is started to emit a laser beam, the laser beam is reflected to the laser receiver through the reflecting device, and the photoetching machine works normally; When the shielding plate moves with the reflecting device or the laser emitter, the laser receiver cannot receive the laser beam reflected by the reflecting device, the interlocking device is triggered, and the photoetching machine stops working; the reflecting device comprises a first beam splitter and a second beam splitter with perpendicular reflecting surfaces, so that the laser beams entering and exiting the reflecting device are parallel.

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