Substrate processing apparatus and substrate processing method
By designing an automated cleaning chamber substrate processing device, the problems of large cleaning fluid consumption in batch cleaning devices and nozzle contamination in single-piece cleaning devices were solved, achieving efficient substrate cleaning and increased productivity.
CN116207001BActive Publication Date: 2026-07-03SYSTEM ENGINEERING MEGA SOLUTION CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SYSTEM ENGINEERING MEGA SOLUTION CO LTD
- Filing Date
- 2022-05-24
- Publication Date
- 2026-07-03
Smart Images
Figure CN116207001B_ABST
Abstract
The substrate processing apparatus described herein includes: a spraying unit disposed within the internal space of a chamber component for processing a substrate, which sprays a washing liquid into the internal space of the chamber component to wash the substrate and then recovers the washing liquid after spraying it onto the substrate, and sprays a drying gas to dry any remaining washing liquid; a management unit for removing residues remaining in the spraying unit; and a control unit for controlling the spraying unit and the management unit.
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