A method and system for measuring the secondary electron emission coefficient of a dielectric material

By combining cutting and neutralizing electron guns, the problem of surface charge removal of dielectric materials was solved, enabling accurate measurement of the secondary electron emission coefficient and obtaining a complete measurement curve.

CN116297610BActive Publication Date: 2026-03-27XI AN JIAOTONG UNIV +1
2 Cites 0 Cited by

Patent Information

Application Number
CN202310380754.3
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-04-10
Publication Date
2026-03-27
Estimated Expiration
2043-04-10

AI Technical Summary

Technical Problem

In existing technologies, when measuring the secondary electron emission coefficient of a dielectric material, it is impossible to completely remove the accumulated charge on the surface of the dielectric material, resulting in measurement errors and the inability to obtain a complete secondary electron emission coefficient curve.

Method used

A measurement method is adopted to neutralize the charge on the surface of the dielectric material by cutting the electron beam with a primary electron beam current and neutralizing the electron gun. The secondary electron emission coefficient is calculated by combining the ratio of the beam cutting current and the sampling current. The accumulated charge is neutralized by the first and second neutralizing electron guns, ensuring accurate and fast measurement.

Benefits of technology

This method enables rapid and accurate measurement of the secondary electron emission coefficient of dielectric materials, avoids errors in the measurement process, and obtains a complete secondary electron emission coefficient curve.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

The application provides a method and system for measuring a secondary electron emission coefficient of a medium material, the method comprising the following steps: obtaining a total primary electron beam current, and cutting the total primary electron beam current to obtain a primary electron beam current; obtaining a beam cutting current and a sampling current, and calculating a ratio of the primary electron beam current to the beam cutting current; obtaining the beam cutting current and the sampling current of the medium material to be measured, and obtaining the secondary electron emission coefficient of the medium material to be measured under primary electron incidence energy; neutralizing accumulated charges on the surface of the medium material to be measured by using a first neutralizing electron gun and a second neutralizing electron gun; measuring the secondary electron emission coefficient under different primary electron incidence energies to obtain a secondary electron emission coefficient curve. The accumulated charges on the surface of the medium material to be measured are neutralized and removed by using the neutralizing electron gun, the problems that a long time is consumed in the previous medium material measurement process and the measurement of the secondary electron emission coefficient less than 1 cannot be realized are solved, and the complete curve of the secondary electron emission coefficient of the medium material is rapidly and accurately measured.
Need to check novelty before this filing date? Find Prior Art