Plasma activated water production system and method of controlling the same
By incorporating a condensation device and a water absorption structure into the plasma activated water preparation system, the problem of water vapor in the internal circulating gas affecting discharge stability was solved, thereby improving the stability of the plasma generation unit and the efficiency of activated water preparation.
Patent Information
- Application Number
- CN202310493864.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-05-04
- Publication Date
- 2026-02-27
- Estimated Expiration
- 2043-05-04
AI Technical Summary
In existing plasma-activated water preparation systems, water vapor carried in the gas during the internal circulation process affects the discharge stability of the plasma generation unit and the efficiency of activated water preparation.
A condensation device is installed between the gas outlet of the plasma generation unit and the circulating gas supply unit. The condensation device condenses the water vapor in the gas, and water vapor is separated by setting a water absorption structure at the gas outlet of the inlet pipe. The water vapor interception efficiency is improved by combining a porous structure and a condensation baffle. Automatic return of condensate is achieved by using interlocking switches and a liquid level detection unit.
It effectively reduces the water content in the gas, improves the stability of electrode discharge in the plasma generation unit and the efficiency of activated water preparation, reduces water accumulation in the circulating gas pipe, and improves the stability and efficiency of the system.
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Figure CN116375169B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of plasma, in particular to a plasma-activated water preparation system and a control method thereof. BACKGROUND
[0002] With the continuous breakthrough of plasma technology, the technology is more and more favored by various industries. Plasma technology is applied to medical devices, food preservation, cleaning and disinfection, and agricultural killing, and plays a very key role. Plasma-activated water has strong sterilization and preservation functions, so plasma-activated water technology is applied to various industries. The existing plasma-activated water preparation system generally includes a plasma generation unit and a circulating gas supply unit, wherein the plasma generation unit is used to electrolyze the to-be-ionized gas to generate plasma, and the generated plasma is dissolved in water to form activated water, and the circulating gas supply unit is adapted to circulate the excess gas escaping from the plasma generation unit into the plasma generation unit to realize internal circulation of the gas. However, in the internal circulation process, water vapor is easily attached to the gas discharged from the gas outlet of the plasma generation unit, affecting the stability of the discharge of the plasma generation unit and the efficiency of the preparation of activated water. SUMMARY
[0003] Therefore, the present application provides a plasma-activated water preparation system and a control method thereof to solve the problem that water vapor is attached to the gas in the internal circulation of the plasma-activated water preparation system in the prior art, affecting the stability of the discharge of the plasma generation unit and the efficiency of the preparation of activated water.
[0004] In a first aspect, the present application provides a plasma-activated water preparation system, comprising a plasma generation device and a condensing device, the plasma generation device comprising a plasma generation unit and a circulating gas supply unit, the plasma generation unit having a gas inlet adapted to introduce a to-be-ionized gas and a gas outlet for discharging excess gas, and the circulating gas supply unit being adapted to circulate the excess gas discharged from the gas outlet into the plasma generation unit; the condensing device is connected in series between the circulating gas supply unit and the gas outlet, and is used to condense water vapor in the gas discharged from the gas outlet, the condensing device comprising a condenser main body, a gas inlet pipe and a gas outlet pipe, the condenser main body having a condensing cavity therein, the gas inlet end of the gas inlet pipe being connected to the gas outlet, the gas outlet end of the gas inlet pipe being inserted into the condensing cavity, and the gas outlet end being provided with a water absorption structure, the gas inlet end of the gas outlet pipe being inserted into the condensing cavity, and the gas outlet end of the gas outlet pipe being connected to the circulating gas supply unit.
[0005] In an alternative embodiment, the water absorption structure is a water absorption sponge or a water absorption film arranged on the outer periphery of the gas outlet end of the gas inlet pipe.
[0006] In an alternative embodiment, the air outlet end of the air inlet pipe is configured as a porous structure with a plurality of air outlet holes on the peripheral wall, and the water absorption structure is wrapped outside the air outlet holes.
[0007] In an alternative embodiment, the circulating air supply unit comprises a circulating air pipe connected between the condensing device and the air inlet, the air outlet end of the air outlet pipe is connected to the circulating air pipe, and the air inlet end of the air outlet pipe is located at the top of the condensing cavity, and the air outlet end of the air inlet pipe is located at the bottom of the condensing cavity.
[0008] In an alternative embodiment, the condensing device further comprises a condensing baffle fixedly arranged in the condensing cavity and located between the air inlet end of the air outlet pipe and the air outlet end of the air inlet pipe; the condensing baffle is made of a gas-permeable and water-impermeable material, or the condensing baffle is provided with an air passage.
[0009] In an alternative embodiment, a plurality of condensing baffles are arranged in the condensing cavity and are spaced apart along the direction of air flow.
[0010] In an alternative embodiment, the bottom wall of the condensing baffle is provided with a water absorption sponge or a water absorption film.
[0011] In an alternative embodiment, the plasma generating unit comprises a liquid storage container adapted to store a solution to be treated; the condensing device further comprises a water collection cavity located below the condensing cavity and in communication with the condensing cavity, adapted to collect water accumulated in the condensing cavity, and the water collection cavity and the liquid storage container are connected by a reflux pipe.
[0012] In an alternative embodiment, the condensing device has a condensing ventilation mode and an automatic reflux mode, and the condensing device further comprises a mode switching mechanism comprising a first switch arranged on the air outlet pipe and a second switch arranged on the reflux pipe; when the condensing device is in the condensing ventilation mode, the first switch is in an open state and the second switch is in a closed state; when the condensing device is in the automatic reflux mode, the first switch is in a closed state and the second switch is in an open state.
[0013] In an alternative embodiment, the plasma-activated water preparation system further comprises a liquid level detection unit and a controller, wherein the liquid level detection unit is arranged in the condenser body for detecting the liquid level information of the condensed water in the condenser body; the controller is connected with the mode switching mechanism and the liquid level detection unit, respectively, and the liquid level detection unit is configured to feed back a signal to the controller when detecting that the liquid level value of the condensed water in the condenser body is greater than a set threshold value; and the controller is adapted to control the mode switching mechanism to switch to the automatic backflow mode periodically and / or according to the feedback signal of the liquid level detection unit.
[0014] In an alternative embodiment, the first switch and the second switch are both solenoid valves.
[0015] In an alternative embodiment, the liquid storage container has a closed liquid storage cavity, and the liquid storage container is provided with the gas outlet at the top thereof.
[0016] In an alternative embodiment, the circulating gas supply unit further comprises a gas pump arranged on the circulating gas pipe.
[0017] In an alternative embodiment, the plasma generation unit comprises a reaction tube and a discharge mechanism, the reaction tube is adapted to be inserted into the liquid storage container, the reaction tube is provided with a gas inlet at the top thereof for introducing the gas to be ionized, the bottom of the reaction tube is provided with a microporous structure for communicating with the liquid storage container, and the discharge mechanism is configured to ionize the gas to be ionized in the reaction tube to obtain plasma, the generated plasma is introduced into the liquid storage container through the microporous structure and mixed with the solution to be treated in the liquid storage container to generate plasma-activated water.
[0018] In a second aspect, the present application further provides a control method of the plasma-activated water preparation system according to any one of the above embodiments, the method comprising: receiving a signal for starting the preparation of plasma-activated water; controlling the plasma generation unit to start, while controlling the condensing device to condense the water vapor in the gas discharged from the gas outlet of the plasma generation unit; and controlling the circulating gas supply unit to circulate the condensed gas into the plasma generation unit.
[0019] In an alternative embodiment, the method further comprises: receiving a signal for starting the automatic backflow mode; and controlling the first switch to switch from the open state to the closed state, and the second switch to switch from the closed state to the open state.
[0020] In an alternative embodiment, the receiving of the signal for starting the automatic backflow mode comprises: receiving a user trigger signal, and / or receiving a timing signal, and / or receiving a feedback signal that the liquid level value of the condensed water in the condenser body is greater than a set threshold value.
[0021] The technical scheme of the present application has the following advantages:
[0022] 1、The plasma activated water preparation system provided by the present application condenses water vapor in the gas flowing through the circulating gas supply unit through the condensing device arranged between the gas outlet of the plasma generation unit and the circulating gas supply unit, avoids water accumulation in the circulating gas pipe, and simultaneously separates water vapor from high-humidity gas through the water absorption structure arranged at the gas outlet end of the gas inlet pipe, effectively reduces the water content in the gas, improves the stability of electrode discharge of the plasma generation unit, and thus effectively improves the activated water preparation efficiency and stability.
[0023] 2、The plasma activated water preparation system provided by the present application is constructed as a porous structure with a plurality of gas outlet holes on the peripheral wall of the gas outlet end of the gas inlet pipe, and the water absorption structure is wrapped outside the gas inlet pipe at the periphery of the gas outlet hole, so that the contact area of the water absorption structure with high-humidity gas is increased, and the water vapor adsorption efficiency and uniform stability of the water absorption structure are further improved.
[0024] 3、The plasma activated water preparation system provided by the present application greatly improves the interception efficiency of water vapor by arranging the condensing baffle between the gas inlet end of the gas outlet pipe and the gas outlet end of the gas inlet pipe, and further improves the water vapor adsorption efficiency, reduces water accumulation in the circulating gas pipe of the circulating gas supply unit, and thus improves the stability of electrode discharge of the plasma generation unit.
[0025] 4、The plasma activated water preparation system provided by the present application is provided with interlocked first and second switch elements on the gas outlet pipe and the return pipe of the condensing device, and the condensate water level is monitored in real time by the liquid level detection unit in the condenser main body, or the first and second switch elements are controlled to automatically return the condensate water to the water tank according to the user's trigger instruction or periodic control, so as to realize automatic return control of the condensate water in the condensing device, reduce the auxiliary system required for return, effectively avoid the condensate water from secondary humidifying of the gas, and improve the return efficiency of the condensate water. BRIEF DESCRIPTION OF DRAWINGS
[0026] In order to more clearly illustrate the specific embodiments of the present application or the technical scheme in the prior art, the drawings needed in the specific embodiments or prior art description will be briefly introduced below. Obviously, the drawings in the following description are some embodiments of the present application, and those skilled in the art can also obtain other drawings according to these drawings without creative labor.
[0027] Figure 1The principle schematic view of the plasma-activated water preparation system of the embodiment of the present application;
[0028] Figure 2 The internal structure schematic view of the condensing device in the plasma-activated water preparation system of the embodiment of the present application;
[0029] Figure 3 The sectional view of the condensing device in the plasma-activated water preparation system of the embodiment of the present application;
[0030] Figure 4 The Figure 3 The structure enlarged view of A in the above figure;
[0031] Figure 5 The flow schematic view of another embodiment of the control method of the plasma-activated water preparation system of the embodiment of the present application;
[0032] Figure 6 The flow schematic view of another embodiment of the control method of the plasma-activated water preparation system of the embodiment of the present application.
[0033] Explanation of the reference signs:
[0034] 10, plasma generating unit; 11, liquid storage container; 110, solution to be treated; 111, gas outlet; 12, reaction tube; 121, gas inlet; 122, microporous structure; 13, high-voltage electrode; 14, ground electrode; 15, high-voltage alternating current power supply;
[0035] 20, circulating gas supply unit; 21, gas pump; 22, circulating gas pipe;
[0036] 30, condensing device; 31, condenser main body; 310, condensing cavity; 311, water collecting cavity; 312, discharge port; 32, gas inlet pipe; 321, gas outlet hole; 33, gas outlet pipe; 34, water absorbing structure; 35, condensing baffle; 351, air vent; 36, return pipe; 37, first switch; 38, second switch. DETAILED DESCRIPTION
[0037] In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are some but not all of the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.
[0038] The embodiments of the present application will be described below with reference to the drawings. Figures 1 to 6
[0039] The related art plasma activated water preparation system generally comprises a plasma generating unit 10 and a circulating gas supply unit 20, wherein the plasma generating unit 10 is used for electrolyzing a to-be-ionized gas to generate plasma, and the generated plasma is dissolved in water to form activated water.
[0040] Specifically, the plasma generating unit 10 comprises a discharging mechanism and a liquid storage container 11 internally storing a to-be-treated solution 110, and the discharging mechanism electrolyzes the generated plasma to be mixed with the to-be-treated solution 110 in the liquid storage container 11 to form activated water. The circulating gas supply unit 20 comprises a gas pump 21 and a circulating gas pipe 22, and the gas pump 21 is suitable for circulating the excess gas escaping from the plasma generating unit 10 into the plasma generating unit 10 to realize internal circulation of the gas. The discharging mechanism comprises a high-voltage electrode 13 and a ground electrode 14, and after starting a high-voltage alternating current power supply 15, most of the generated plasma gas is dissolved in the to-be-treated solution 110, and the remaining gas is escaped from a gas outlet 111 at the top of the liquid storage container 11. It should be noted that high-voltage discharge is mainly to break down air molecules to cause a series of chemical reactions, so the solution near the high-voltage electrode 13 must be drained clean before the high-voltage electricity is input. Since the entire discharging process continuously generates heat and the discharging environment is in a closed space, the system is a high-humidity and high-temperature working environment, and in the internal circulation process, the gas discharged from the gas outlet 111 of the plasma generating unit 10 is easy to carry water vapor, and after a long time of operation, a large amount of water droplets appear on the inner wall of the circulating gas pipe 22, which seriously affects the discharging stability and the activated water preparation efficiency.
[0041] Therefore, in view of the problem that a large amount of water droplets is easy to accumulate on the inner wall of the circulating gas pipe 22 in the internal circulation process, which causes the to-be-ionized gas input into the plasma generating unit 10 to contain water vapor, and affects the discharging stability, the embodiment of the present application proposes a plasma activated water preparation system capable of automatically and efficiently removing water vapor in the circulating gas, so as to improve the activated water preparation stability and efficiency, and effectively make up for the shortcomings of the traditional activated water preparation system.
[0042] As shown in Figures 1 to 4 According to the embodiment of the present application, on the one hand, a plasma activated water preparation system is provided, which comprises a plasma generating device and a condensing device 30.
[0043] Specifically, the plasma generating device comprises a plasma generating unit 10 and a circulating gas supply unit 20, the plasma generating unit 10 has a gas inlet 121 adapted to introduce the gas to be ionized and a gas outlet 111 for discharging the excess gas. The circulating gas supply unit 20 is adapted to circulate the excess gas discharged by the gas outlet 111 into the plasma generating unit 10. A condensing device 30 is connected in series between the circulating gas supply unit 20 and the gas outlet 111, and is used to condense the water vapor in the gas discharged by the gas outlet 111. The condensing device 30 comprises a condenser body 31, a gas inlet pipe 32 and a gas outlet pipe 33. The condenser body 31 has a condensing cavity 310 therein. The gas inlet pipe 32 is connected to the gas outlet 111 at a gas inlet end and is inserted into the condensing cavity 310 at a gas outlet end. The gas inlet pipe 32 is used to introduce the gas discharged by the plasma generating unit 10 into the condenser body 31. The gas outlet end of the gas inlet pipe 32 is provided with a water absorption structure 34. The gas outlet pipe 33 is inserted into the condensing cavity 310 at a gas inlet end and is connected to the circulating gas supply unit 20 at a gas outlet end.
[0044] The plasma activated water preparation system provided by the embodiment condenses the water vapor in the gas flowing through the circulating gas supply unit 20 by the condensing device 30 arranged between the gas outlet 111 of the plasma generating unit 10 and the circulating gas supply unit 20, thereby avoiding water accumulation in the circulating gas pipe 22. The water absorption structure 34 arranged at the gas outlet end of the gas inlet pipe 32 of the condensing device 30 is used to separate the water vapor from the high humidity gas, thereby effectively reducing the water content in the gas and improving the stability of the electrode discharge of the plasma generating unit 10, so as to effectively improve the efficiency and stability of the activated water preparation.
[0045] In some optional embodiments of the embodiment, the temperature of the condensing cavity 310 in the condenser body 31 is lower than the outlet temperature of the plasma generating unit 10. Thus, the high humidity and high temperature gas discharged by the plasma generating unit 10 will be condensed in the condensing cavity 310 when flowing through the condenser body 31 with a lower temperature.
[0046] It should be noted that, in the embodiment, the gas to be ionized is preferably air, which is convenient to obtain and low in cost. A part of the plasma generated by the discharge of the plasma generating unit 10 will escape after mixing with the solution to be treated 110 and will be discharged from the gas outlet 111 of the plasma generating unit 10. The circulating gas supply unit 20 comprises a gas pump 21 or a negative pressure pipe, which is used to circulate the gas discharged by the gas outlet 111 into the plasma generating unit 10, thereby realizing the internal circulation of the gas. The gas discharged by the gas outlet 111 will be condensed in the condensing cavity 310 of the condenser body 31 by the condensing device 30, thereby avoiding the gas containing water vapor from being introduced into the plasma generating unit 10, which affects the stability of the power generation of the plasma generating unit 10.
[0047] The specific distribution position, structure and working principle of the water absorption structure 34 will be described in detail below. Figures 1 to 4
[0048] In some alternative embodiments, the water absorption structure 34 is a water absorption sponge or a water absorption film arranged on the outer periphery of the air outlet end of the air inlet pipe 32. The water vapor in the gas discharged from the air outlet end is first adsorbed by the water absorption sponge or the water absorption film and then discharged to the condensation cavity 310 for condensation. Preferably, in the present embodiment, the water absorption structure 34 adopts a water absorption film, which has good water absorption and occupies a small volume, facilitating assembly in the filter main body.
[0049] It should be noted that the water absorption structure 34 is made of a water-permeable and water-impermeable material. The specific material and structure of the water absorption structure 34 are not limited in the present embodiment, such as sponge, cotton cloth, water absorption film, and adsorption resin. The water absorption structure 34 formed by these materials and structures all falls within the protection scope of the present embodiment.
[0050] In some alternative embodiments, the water absorption film is wrapped around the air outlet end of the air inlet pipe 32 and is fixed on the outer wall of the air inlet pipe 32 by adhesion.
[0051] In an alternative embodiment, as shown in Figures 1 to 4 , the air outlet end of the air inlet pipe 32 is configured as a porous structure with a plurality of air outlet holes 321 on the peripheral wall, and the water absorption structure 34 is wrapped outside the air outlet holes 321. In the present embodiment, the porous design of the air outlet end of the air inlet pipe 32 increases the contact area between the water absorption structure 34 and the high-humidity gas, thereby further improving the adsorption efficiency and uniform stability of the water absorption structure 34 for water vapor in the gas.
[0052] Specifically, as shown in Figure 3 and Figure 4 , the peripheral wall of the air inlet pipe 32 at the air outlet end is uniformly and axially spaced with multiple rings of air outlet holes 321, and each ring of air outlet holes 321 includes a plurality of air outlet small holes uniformly and circumferentially arranged. The plurality of air outlet small holes can effectively increase the contact area between the gas discharged from the air outlet end and the water absorption structure 34, thereby improving the water absorption efficiency.
[0053] In an alternative embodiment, the port of the air outlet end of the air inlet pipe 32 is closed. This design ensures that all the gas in the air inlet pipe 32 is discharged through the air outlet holes 321, thereby further improving the uniformity and adsorption effect of the water absorption structure 34.
[0054] In an alternative embodiment, as shown in Figure 1 and Figure 3 , the air outlet end of the air inlet pipe 32 is configured as a porous structure with a plurality of air outlet holes 321 on the peripheral wall, and the water absorption structure 34 is wrapped outside the air outlet holes 321. In the present embodiment, the porous design of the air outlet end of the air inlet pipe 32 increases the contact area between the water absorption structure 34 and the high-humidity gas, thereby further improving the adsorption efficiency and uniform stability of the water absorption structure 34 for water vapor in the gas.As shown, the circulating gas supply unit 20 includes a circulating gas pipe 22 connected between the condensing device 30 and the gas inlet 121, the gas outlet end of the gas outlet pipe 33 is connected with the circulating gas pipe 22, the gas inlet end of the gas outlet pipe 33 is located at the top of the condensing cavity 310, and the gas outlet end of the gas inlet pipe 32 is located at the bottom of the condensing cavity 310.
[0055] That is, in the embodiment, the gas inlet end of the gas outlet pipe 33 is higher than the gas outlet end of the gas inlet pipe 32, which ensures that the gas discharged by the gas outlet pipe 33 is dry gas after condensation.
[0056] In some optional embodiments of the embodiment, the diameter of the gas outlet pipe 33 is smaller than the diameter of the gas inlet pipe 32, so that the gas entering the condensing cavity 310 is not directly discharged without condensation.
[0057] In some optional embodiments of the embodiment, the condenser body 31 includes a cylindrical body, the upper end of the cylindrical body is closed, and the top wall of the condenser body 31 is provided with openings for inserting the gas inlet pipe 32 and the gas outlet pipe 33 into the condensing cavity 310, respectively. The gas inlet pipe 32 and the gas outlet pipe 33 are respectively provided with sealing rings between the gas inlet pipe 32 and the gas outlet pipe 33 and the openings to ensure the sealing of the entire condensing cavity 310.
[0058] In some optional embodiments of the embodiment, the gas inlet pipe 32 and the gas outlet pipe 33 are L-shaped pipes.
[0059] The specific structure, position distribution and working principle of the plasma generating unit 10 will be described in detail below. Figures 1 to 4
[0060] In the embodiment, the plasma generating unit 10 includes a liquid storage container 11 adapted to store a solution to be treated 110. The liquid storage container 11 has a closed liquid storage cavity therein, and the top of the liquid storage container 11 is provided with a gas outlet 111.
[0061] It should be noted that the solution to be treated 110 is generally tap water or pure water in the embodiment. The water tank is in a non-full state, i.e., there is a set interval space between the solution to be treated 110 and the top wall of the water tank. Moreover, the highest water level of the solution to be treated 110 is lower than the lowest edge of the gas outlet 111, so as to avoid overflow of the solution to be treated from the gas outlet 111. In the embodiment, the so-called treatment of the solution to be treated 110 is that the high-voltage electrode 13 generates plasma gas after electrification, and a series of chemical reactions occur after dissolving in water to form active particles such as hydrogen peroxide, peroxynitrite, nitrate, etc. The process of producing active particles is the treatment process, and the treated solution is called plasma-activated water in academic terms.
[0062] Further, the plasma generating unit 10 further comprises a reaction tube 12 adapted to be inserted into the liquid storage container 11, and a discharge mechanism, wherein the top of the reaction tube 12 is provided with a gas inlet 121 adapted to be connected to a gas source for supplying the gas to be ionized. The circulating gas unit 20 further comprises a gas pump 21 arranged on the circulating gas pipe 22, and of course, in other alternative embodiments, a negative pressure pipe can also be used as the gas flow driving member for circulating the gas into the reaction tube 12, which is not limited in the present embodiment.
[0063] Specifically, the bottom of the reaction tube 12 is provided with a micro-porous structure 122 connected to the liquid storage container 11, and the discharge mechanism is used to ionize the gas to be ionized in the reaction tube 12 to obtain plasma, and the generated plasma is introduced into the liquid storage container 11 through the micro-porous structure 122 and mixed with the solution 110 in the liquid storage container 11 to generate plasma-activated water. The liquid storage container 11 is a water tank, which comprises a tank body and a cover body detachably arranged on the top of the tank body, and the gas outlet 111 is arranged at the top of the side wall of the water tank. Preferably, the circumferential edge of the gas outlet 111 extends outwardly to form an interface structure, which is convenient for assembling and connecting with the gas inlet pipe 32.
[0064] In the present embodiment, the reaction tube 12 is an insulating tube. Alternatively, the reaction tube 12 is a glass tube or a ceramic tube. The reaction tube 12 is inserted into the inside of the liquid storage container 11. The bottom of the reaction tube 12 is provided with a plurality of micro-holes to form a micro-porous structure 122, and the plasma generated by the discharge mechanism in the reaction tube 12 enters the liquid storage container 11 through the micro-holes. In the present embodiment, the discharge mechanism comprises a high-voltage electrode 13 connected to the live wire of the high-voltage alternating current power supply 15 and a ground electrode 14 connected to the zero line of the high-voltage alternating current power supply 15, wherein the high-voltage electrode 13 is inserted into the reaction tube 12, and the ground electrode 14 is fixedly arranged in the liquid storage container 11. Preferably, the ground electrode 14 is fixedly arranged at the bottom of the liquid storage container 11.
[0065] In the above embodiments, after the high-voltage AC power supply 15 is started, most of the plasma gas generated by the discharge of the high-voltage electrode 13 is dissolved in the solution 110 to be treated through the microporous structure 122, and the remaining gas is discharged from the gas outlet 111 at the top of the liquid storage container 11. By forming the microporous structure 122 at the bottom of the reaction tube 12, which is adapted to communicate with the inside of the liquid storage container 11, the microporous structure 122 is adapted to release the gas product generated by the electrolysis of the high-voltage electrode 13 in the reaction tube 12 into the liquid storage container 11 after the gas product is formed into micro-bubbles. By providing the microporous structure 122 on the reaction tube 12, the plasma, especially ozone, can be micro-bubbled into bubbles, and the ozone can be dispersed into uniform and fine bubbles and then released into water. The ozone is exposed through the microporous structure, which can effectively increase the contact area between the ozone and water, improve the solubility of the ozone, and further improve the concentration and efficiency of the activated water. Compared with the conventional bubble stone structure, the weight of the entire plasma generating device can be greatly reduced, and the assembly steps of the bubble stone and the reaction tube 12 can be omitted, thereby improving the assembly efficiency.
[0066] Optionally, the pore size of the microporous structure is 0.01mm-2mm.
[0067] In this embodiment, the gas inlet 121 is provided on the reaction tube 12. Specifically, the reaction tube 12 includes a tube body with a reaction cavity and a gas inlet branch pipe provided on the side of the tube body. One end of the gas inlet branch pipe is opened as the gas inlet 121, and the other end is fixedly connected with the tube body. In some optional embodiments, the included angle between the gas inlet branch pipe and the tube body is greater than or equal to 90°, and the gas inlet branch pipe is an inclined pipe that is gradually inclined upward. When the condensate water is collected in the gas inlet branch pipe, the inclined gas inlet branch pipe can guide the condensate water to flow quickly to the reaction tube 12, and then be discharged from the microporous structure 122 at the bottom of the reaction tube 12 into the liquid storage container 11, thereby avoiding the accumulation of a large amount of condensate water in the gas inlet branch pipe, increasing the water content of the gas to be ionized, and affecting the stability of the discharge.
[0068] In some embodiments not shown, the top of the reaction tube 12 is formed with a top pipe opening through which the upper end of the high-voltage electrode 13 passes. The upper end of the high-voltage electrode 13 passes through the top pipe opening and is integrally sealed with the top pipe opening by a hot melting process. The hot melting process not only fixes the high-voltage electrode 13 to the glass tube, but also seals them. Therefore, it is not necessary to additionally provide a sealing ring or other structure for sealing, which simplifies the assembly steps of the reaction tube 12 and the high-voltage electrode 13, and also avoids the connection by the sealing ring, which is prone to water accumulation and breakdown.
[0069] In this embodiment, the condensing device 30 is provided between the plasma generating unit 10 and the circulating gas supply unit 20 to condense the gas discharged from the gas outlet 111 at the top of the liquid storage container 11, thereby avoiding the accumulation of water on the inner wall of the circulating gas pipe 22. Referring toFigure 1 As shown, in this embodiment, the circulating gas flows in the direction indicated by the "arrow". The airflow direction is approximately from the outlet of the gas pump 21 through the circulating gas pipe 22 to the reaction tube 12 of the high-voltage electrode 13, where electrolysis generates plasma. After the plasma comes out of the vent of the reaction tube 12, most of it mixes thoroughly with the solution, and a small portion is discharged from the gas outlet 111 of the liquid storage vent into the condenser 30, and then returns to the inlet of the gas pump 21 through the circulating gas pipe 22.
[0070] It should be noted that the plasma discharge device in this embodiment is based on the principle of dielectric barrier discharge technology, meaning that a dielectric layer is required between the two electrodes for normal discharge. The dielectric material is required to have insulating, high-temperature and high-pressure resistant properties; that is, the reaction tube 12 is made of an insulating, high-temperature and high-pressure resistant material. Preferably, in this embodiment, the dielectric layer is a glass tube, that is, the reaction tube 12 is a glass tube.
[0071] The following is in conjunction with the appendix Figure 1 To be continued Figure 3 The other structures of the condensation device 30 and their specific distribution locations are described in detail.
[0072] In this embodiment, the condensation device 30 further includes a condensation baffle 35, which is fixedly disposed within the condensation chamber 310 and located between the inlet end of the outlet pipe 33 and the outlet end of the inlet pipe 32. By using the condensation baffle 35 disposed between the inlet end of the outlet pipe 33 and the outlet end of the inlet pipe 32, the efficiency of water vapor interception is significantly improved.
[0073] Furthermore, the condensation baffle 35 is made of a breathable but waterproof material, or the condensation baffle 35 is provided with a vent 351 for gas to pass through, that is, the condensation baffle 35 is perforated. By adopting the above design, it is ensured that gas can pass through the condensation baffle 35 and be discharged through the gas outlet pipe 33.
[0074] See appendix Figure 2 Appendix Figure 3 In this embodiment, the condensation baffle 35 is provided with a vent 351, and the vents 351 on two adjacent condensation baffles 35 are staggered.
[0075] In one optional embodiment, a plurality of condensation baffles 35 are provided in the condensation chamber 310. These baffles 35 are arranged at intervals along the airflow discharge direction, specifically, they are vertically spaced between the inlet end of the outlet pipe 33 and the outlet end of the inlet pipe 32. The multiple, spaced-apart condensation baffles 35 further improve the efficiency of water vapor interception. Preferably, in this embodiment, there are two condensation baffles 35, which are vertically spaced between the outlet end of the inlet pipe 32 and the inlet end of the outlet pipe 33.
[0076] In this embodiment, a plurality of condensing baffles 35 are arranged inside the condenser body 31. The condensing baffles 35 can have a serpentine or mesh structure, and can be arranged horizontally or at an angle.
[0077] In an alternative embodiment, a water-absorbing sponge or film is arranged on the bottom wall of the condensing baffles 35. The water-absorbing film further improves the water absorption efficiency of the condensing baffles 35, reduces the water accumulation in the circulating gas pipe 22 of the circulating gas supply unit 20, and further improves the stability of the discharge of the plasma generating unit 10.
[0078] In an alternative embodiment, the condensing device 30 further comprises a water collecting cavity 311 arranged below the condensing cavity 310 and in communication with the condensing cavity 310, which is adapted to collect the water accumulated in the condensing cavity 310. The water collecting cavity 311 is connected to the liquid storage container 11 through a return pipe 36. The condensed water generated in the condensing device 30 can be returned to the liquid storage container 11 through the return pipe, achieving the recycling of water resources.
[0079] Specifically, the condenser body 31 comprises a cylindrical body and an inverted frustum structure fixedly arranged at the lower end of the cylindrical body, and the inner cavity of the inverted frustum structure constitutes the condensing cavity 310. The large-diameter end of the upper end of the inverted frustum structure is connected to the cylindrical body, and the small-diameter end of the lower end serves as a discharge port 312 for connecting to the return pipe 36. The water collecting cavity 311 formed by the inverted frustum structure at the bottom of the condenser body 31 has a better water collecting effect, and the water flow in the condenser body 31 can be automatically and quickly collected to the discharge port 312 at the bottom along the side wall of the conical water collecting cavity 311. Preferably, the circumferential edge of the discharge port 312 extends outward to form an interface structure, facilitating the connection with the return pipe 36.
[0080] In the conventional condensing device, the condensed water needs to be additionally pumped back to the liquid storage container 11. The present embodiment creatively proposes to use interlocking switch components and logical control to automatically return the condensed water, reducing the auxiliary system and improving the use efficiency.
[0081] Specifically, in the embodiment, the condensing device 30 has a condensing ventilation mode and an automatic backflow mode, and the condensing device 30 further comprises a mode switching mechanism, which comprises a first switch 37 arranged on the air outlet pipe 33 and a second switch 38 arranged on the backflow pipe 36; when the condensing device 30 is in the condensing ventilation mode, the first switch 37 is in an open state and the second switch 38 is in a closed state; when the condensing device 30 is in the automatic backflow mode, the first switch 37 is in a closed state and the second switch 38 is in an open state.
[0082] The embodiment provides automatic backflow control of the condensed water by using automatic control logic, greatly reduces the water accumulation on the inner wall of the circulating gas pipe 22, and effectively improves the stability of the discharge system. By increasing the logic control of the system and combining the automatic backflow control of the condensed water in the condensing device 30 by the interlocking electromagnetic valve, the backflow efficiency of the condensed water can be effectively improved.
[0083] By arranging the interlocking first switch 37 and the second switch 38 on the air outlet pipe 33 and the backflow pipe 36 of the condensing device 30 respectively, by increasing the logic control of the system and combining the condensed water level condition monitored by the liquid level detection unit in the condenser main body 31 in real time, or according to the trigger instruction of the user, or periodically controlling the actions of the first switch 37 and the second switch 38, the condensed water is automatically backflowed to the water tank, the automatic backflow control of the condensed water in the condensing device 30 is realized, the auxiliary system required for backflow can be reduced, the condensed water is effectively prevented from secondary humidifying the gas, and the backflow efficiency of the condensed water is improved.
[0084] In an alternative embodiment, the plasma-activated water preparation system further comprises a liquid level detection unit and a controller, wherein the liquid level detection unit is arranged in the condenser main body 31 and is used to detect the liquid level information of the condensed water in the condenser main body 31. The controller is connected with the mode switching mechanism and the liquid level detection unit respectively, and the liquid level detection unit is used to feed back a signal to the controller when detecting that the liquid level value of the condensed water in the condenser main body 31 is greater than a set threshold value. The controller is adapted to control the mode switching mechanism to switch to the automatic backflow mode periodically and / or according to the feedback signal of the liquid level detection unit.
[0085] In an alternative embodiment, the plasma-activated water preparation system is further provided with a trigger button for controlling the switching mode of the condensing device 30, and the user can send a trigger instruction to the mode switching mechanism through the trigger button.
[0086] In an alternative embodiment, the plasma-activated water preparation system further comprises a timing unit for timing, for example, the condensed water can be discharged once every 30 days, and then the timing unit feeds back a timing signal to the controller when judging that the time has arrived, and the controller controls the mode switching mechanism to automatically switch to the automatic backflow mode.
[0087] The liquid level detection unit in this embodiment is a liquid level sensor installed inside the condenser body 31. When the condensate water level in the condenser body 31 reaches a certain position, the liquid level detection unit triggers the control, or the liquid level sensor timing unit triggers the controller after a certain period of operation cycle, and the controller controls the interlocked first switch 37 and second switch 38. The control logic of the condensing device 30 in this embodiment is as follows: before the controller is triggered, that is, when the condensing device 30 is in the condensing and venting mode, the first switch 37 is in the open state, and the second switch 38 is in the closed state. When the controller is triggered, the first switch 37 is switched from normally open to normally closed, and the second switch 38 is switched from normally closed to normally open, and the condensing device 30 switches to the automatic reflux mode. At this time, the gas enters the gas inlet 111 of the liquid storage container 11 and then enters the gas inlet pipe 32. Due to the closing of the first switch 37, the pressure in the condenser body 31 increases, thereby pressing the condensate water collected at the bottom of the condenser body 31, and the water collected at the bottom of the condensing device 30 is discharged into the liquid storage container 11. When the controller detects that the condensate water in the condenser body 31 has dropped to a set value or after a certain period of operation, it automatically returns to the normal state, that is, the first switch 37 is switched to the open state, and the second switch 38 is switched to the closed state, thereby switching to the condensing and venting mode. In the whole process, it can ensure that the condensate water of the condensing device 30 automatically refluxes into the liquid storage container 11 within a certain period or within a certain time, thereby avoiding secondary humidification.
[0088] The present embodiment provides a novel high-efficiency automatic drainage condensing device 30, which realizes automatic reflux of condensate water by real-time monitoring of the liquid level in the condenser body 31 and cleverly using the interlocked first switch 37 and second switch 38 in combination with control logic, has higher intelligence, does not need to additionally add a water pump, reduces cost, effectively avoids the problem of secondary humidification of gas caused by large accumulation of condensate water, effectively improves the stability of discharge of the plasma generating device in the internal circulation process, and thereby improves the efficiency of preparing activated water, provides technical support for products, and can improve the competitiveness of products.
[0089] In an alternative embodiment, the first switch 37 and the second switch 38 are both solenoid valves. That is, the first switch 37 is a first solenoid valve, and the second switch 38 is a first solenoid valve. In this embodiment, interlocked solenoid valves are creatively used in combination with a liquid level sensor to real-time monitor the condensate water level, and the solenoid valves are real-time controlled and automatically refluxed through logic control, which can reduce the auxiliary system required for reflux, effectively slow down the condensate water secondary humidification speed, and improve the reflux efficiency of the condensate water.
[0090] Of course, in other alternative embodiments, the first switch member 37 and the second switch member 38 can also be mechanical valves. Preferably, in the present embodiment, the first switch member 37 and the second switch member 38 are both electromagnetic valves, which are more automated and more convenient to control.
[0091] In an alternative embodiment, the first switch member 37 is arranged at the connection position of the gas outlet pipe 33 and the circulating gas pipe 22.
[0092] As shown in FIG. 6, the working process of the plasma-activated water preparation system in the present embodiment is as follows: Figures 1 to 4
[0093] In the present embodiment, the gas outlet end of the gas inlet pipe 32 of the condensing device 30 is designed with a porous structure and a water-absorbing film. The porous structure functions to diffuse the high-humidity gas at the gas inlet end to the water-absorbing film to increase the contact area of water molecules and improve the interception efficiency of water molecules. The condensing device 30 is internally designed with a multi-layer condensing baffle structure. The bottom wall of the condensing baffle 35 is also provided with a water-absorbing film, which has a good interception effect on water molecules. After passing through the water-absorbing film, the high-humidity gas passes through the condensing baffle 35 multiple times and is then absorbed in large quantities and finally discharged from the gas outlet pipe 33. This effectively reduces the water content in the gas and improves the stability of the electrode discharge of the plasma generation unit 10, thereby effectively improving the preparation efficiency and stability of the activated water.
[0094] When the condensing water in the condensing device 30 accumulates to a certain amount, it flows to the discharge port 312 at the bottom of the condensing device 30 under the action of gravity and is discharged. In a conventional condensing device 30, a water pump needs to be additionally added to return the condensing water in the condensing device 30 to the water tank. In addition, in the present embodiment, an interlocking electromagnetic valve is used in combination with logic control to automatically return the condensing water, which reduces the auxiliary system and improves the use efficiency. The liquid level sensor is installed in the condenser main body 31. When the liquid level reaches a certain position or after a certain period of working cycle, the sensor triggers the controller, which in turn controls the first electromagnetic valve and the second electromagnetic valve.
[0095] The specific control logic is as follows: before triggering, that is, in the normal state, the first electromagnetic valve is in the normally open state and the second electromagnetic valve is in the normally closed state; when the controller is triggered and receives a signal for starting the automatic backflow mode, the first electromagnetic valve is switched from the normally open state to the closed state and the second electromagnetic valve is switched from the normally closed state to the open state; at this time, the gas enters the gas inlet 111 of the liquid storage container 11 and then enters the gas inlet pipe 32, and the water collected in the collection cavity is discharged into the water tank due to the large pressure in the condensation main body caused by the closed first electromagnetic valve. When the condensate water in the condensation device 30 is detected to be reduced to a set threshold value or after a certain period of time, the normal state is automatically restored, that is, the condensation ventilation mode is switched to, the first electromagnetic valve is in the normally open state, and the second electromagnetic valve is in the normally closed state, so that the condensate water in the condensation device 30 can be automatically backflowed into the water tank within a certain period of time or within a certain period of time, thereby avoiding secondary humidification. The embodiment mainly adopts the automatic backflow control method to recycle the condensate water, and the condensation effect can be improved without increasing other auxiliary devices, which is suitable for the application of small household appliances.
[0096] According to an embodiment of the present application, on the other hand, in combination with Figure 1 and Figure 5 , a control method of the plasma activated water preparation system according to any one of the above embodiments is provided, and the method comprises the following steps:
[0097] Step S101: receiving a signal for starting preparation of plasma activated water;
[0098] Step S102: controlling the plasma generation unit 10 to start, and simultaneously controlling the condensation device 30 to condense water vapor in the gas discharged from the gas outlet 111 of the plasma generation unit 10;
[0099] Step S103: controlling the circulating gas supply unit 20 to circulate the condensed gas into the plasma generation unit 10.
[0100] In an optional embodiment, in combination with Figure 1 and Figure 6 , the method further comprises the following steps:
[0101] Step S201: receiving a signal for starting the automatic backflow mode;
[0102] Step S202: controlling the first switch 37 to switch from the normally open state to the normally closed state, and controlling the second switch 38 to switch from the normally closed state to the normally open state.
[0103] In an optional embodiment, in combination with Figure 1 and Figure 6 , the method further comprises the following steps after step S202:
[0104] Step S203: receiving a signal for closing the automatic backflow mode;
[0105] Step S204: controlling the first switch 37 to switch from the normally closed state to the normally open state, and the second switch 38 to switch from the normally open state to the normally closed state.
[0106] In an alternative embodiment, receiving the signal for starting the automatic backflow mode includes receiving a user trigger signal, and / or receiving a timing signal, and / or receiving a feedback signal that the liquid level in the condenser body 31 is greater than a set threshold.
[0107] In the above embodiments, the signal for starting the automatic backflow mode can be sent to the controller by the aforementioned liquid level detection unit, timing unit or trigger button.
[0108] Specifically, when the liquid level detection unit detects that the liquid level in the condenser body is greater than a set upper threshold, it feeds back a signal for starting the automatic backflow mode to the controller, i.e. step S202 is performed; when the liquid level detection unit detects that the liquid level in the condenser body is less than a set lower threshold, it feeds back a signal for closing the automatic backflow mode to the controller, i.e. step S204 is performed. When the timing unit judges that the preset backflow time has been reached, for example, the controller is set to control the condensate in the condenser 30 to automatically backflow into the liquid storage container 11 every 30 days, when the timing unit judges that 30 days have been reached, it feeds back a timing signal to the controller, and after the controller receives the signal for starting the automatic backflow mode, the mode switching mechanism is switched to the automatic backflow mode, i.e. step S202 is performed. When the trigger button is pressed by the user, it feeds back a signal for starting the automatic backflow mode to the controller.
[0109] In step S203, the signal for closing the automatic backflow mode can be detected by the liquid level detection unit, or it can be set to a fixed discharge time, for example, it can be set to a discharge time of 2 minutes, after starting the automatic backflow mode, when the timing unit judges that the discharge time has reached 2 minutes, it feeds back a signal for closing the automatic backflow mode to the controller.
[0110] Although embodiments of the present application have been described in conjunction with the accompanying drawings, various modifications and changes can be made by those skilled in the art without departing from the spirit and scope of the present application, and such modifications and changes fall within the scope defined by the appended claims.
Claims
1. A system for the production of plasma-activated water, characterized in that, The application relates to a plasma generating device, a condensing device and a condensing mode switching method. The plasma generating device comprises a plasma generating unit (10) and a circulating gas supply unit (20), the plasma generating unit (10) has a gas inlet (121) adapted to introduce a gas to be ionized and a gas outlet (111) for discharging excess gas, and the circulating gas supply unit (20) is adapted to circulate the excess gas discharged from the gas outlet (111) into the plasma generating unit (10). The condensing device (30) is connected in series between the circulating gas supply unit (20) and the gas outlet (111) and is used for condensing water vapor in the gas discharged from the gas outlet (111), and the condensing device (30) comprises a condenser main body (31), a gas inlet pipe (32) and a gas outlet pipe (33). The condenser main body (31) has a condensing cavity (310) therein, the gas inlet end of the gas inlet pipe (32) is connected with the gas outlet (111), the gas outlet end of the gas inlet pipe (32) is inserted into the condensing cavity (310), and the gas outlet end of the gas inlet pipe (32) is provided with a water absorption structure (34), the gas inlet end of the gas outlet pipe (33) is inserted into the condensing cavity (310), and the gas outlet end of the gas outlet pipe (33) is connected with the circulating gas supply unit (20), The plasma generating unit (10) comprises a liquid storage container (11) adapted to contain a solution (110) to be treated. The condensing device (30) further comprises: a water collecting cavity (311) arranged below the condensing cavity (310) and in communication with the condensing cavity (310) and adapted to collect water accumulated in the condensing cavity (310), and the water collecting cavity (311) is connected with the liquid storage container (11) through a backflow pipe (36), The condensing device (30) has a condensing ventilation mode and an automatic backflow mode, and the condensing device (30) further comprises: a mode switching mechanism comprising a first switch part (37) arranged on the gas outlet pipe (33) and a second switch part (38) arranged on the backflow pipe (36); when the condensing device (30) is in the condensing ventilation mode, the first switch part (37) is in an open state and the second switch part (38) is in a closed state; when the condensing device (30) is in the automatic backflow mode, the first switch part (37) is in a closed state and the second switch part (38) is in an open state, The condensing device (30) further comprises: a condensing baffle (35) fixedly arranged in the condensing cavity (310) and located between the gas inlet end of the gas outlet pipe (33) and the gas outlet end of the gas inlet pipe (32); the condensing baffle (35) is made of a gas-permeable and water-impermeable material, or the condensing baffle (35) is provided with a gas passage (351), The gas outlet end of the gas inlet pipe (32) is constructed as a porous structure with a plurality of gas outlet holes (321) arranged on the peripheral wall, and the water absorption structure (34) is wrapped outside the gas outlet holes (321).
2. The plasma activated water generating system of claim 1, wherein, The water absorption structure (34) is a water absorption sponge or a water absorption film arranged outside the peripheral wall of the gas outlet end of the gas inlet pipe (32).
3. The system for producing plasma-activated water according to claim 1 or 2, characterized in that, The circulating air supply unit (20) comprises a circulating air pipe (22) connected between the condensing device (30) and the air inlet (121), and further comprises an air pump (21) arranged on the circulating air pipe (22); The air outlet end of the air outlet pipe (33) is connected with the circulating air pipe (22), and the air inlet end of the air outlet pipe (33) is located at the top of the condensing cavity (310), and the air outlet end of the air inlet pipe (32) is located at the bottom of the condensing cavity (310).
4. The plasma activated water generating system of claim 1, wherein, A plurality of condensing baffles (35) are arranged in the condensing cavity (310) and are arranged at intervals along the air flow discharge direction.
5. The plasma activated water generating system of claim 1, wherein, A water-absorbing sponge or a water-absorbing film is arranged on the bottom wall of the condensing baffle (35).
6. The plasma activated water generating system of claim 1, wherein, The plasma-activated water preparation system further comprises: A liquid level detection unit arranged in the condenser main body (31) and used for detecting the liquid level information of the condensing water in the condenser main body (31); A controller connected with the mode switching mechanism and the liquid level detection unit, respectively, and used for receiving a feedback signal from the liquid level detection unit when the liquid level value of the condensing water in the condenser main body (31) is greater than a set threshold value; The controller is adapted to control the mode switching mechanism to switch to the automatic backflow mode periodically and / or according to the feedback signal of the liquid level detection unit.
7. The plasma activated water generating system of claim 1, wherein, The first switch (37) and the second switch (38) are both electromagnetic valves.
8. The plasma activated water generating system of claim 1, wherein, The liquid storage container (11) has a closed liquid storage cavity, and the top of the liquid storage container (11) is provided with the air outlet (111); The plasma generation unit (10) comprises a reaction tube (12) and a discharge mechanism, the reaction tube (12) is adapted to be inserted into the liquid storage container (11), and the top of the reaction tube (12) is provided with an air inlet (121) adapted to introduce the gas to be ionized; The bottom of the reaction tube (12) is provided with a microporous structure (122) in communication with the liquid storage container (11), and the discharge mechanism is used for ionizing the gas to be ionized in the reaction tube (12) to obtain plasma, the generated plasma is introduced into the liquid storage container (11) through the microporous structure (122), and mixed with the solution (110) to be treated in the liquid storage container (11) to generate plasma-activated water.
9. A control method of a system for producing plasma-activated water according to any one of claims 1 to 8, characterized by, The method comprises: Receiving a signal for starting preparation of plasma-activated water; Controlling the plasma generation unit (10) to start, and controlling the condensing device (30) to condense water vapor in the gas discharged from the air outlet (111) of the plasma generation unit (10); Controlling the circulating air supply unit (20) to circulate the condensed gas into the plasma generation unit (10).
10. The control method of the plasma-activated water preparation system according to claim 9, characterized by, The method further comprises: Receiving a signal for starting the automatic backflow mode; Controlling the first switch (37) to switch from the open state to the closed state, and controlling the second switch (38) to switch from the closed state to the open state.
11. The control method of the plasma-activated water preparation system according to claim 10, wherein, The receiving of the signal for starting the automatic backflow mode comprises: receiving a user trigger signal, and / or receiving a timing signal, and / or receiving a feedback signal that the level of condensate water in the condenser body (31) is greater than a set threshold.
Citation Information
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