A parallel three-dimensional gray scale laser direct writing method and device based on a turning mirror

Abstract

The application relates to a parallel three-dimensional gray-scale laser direct writing lithography method based on a rotating mirror, wherein the method comprises the following steps: generating a writing laser through a writing laser; generating a multi-channel writing light beam according to an optical diffraction device and the writing laser; generating three-dimensional gray-scale writing data according to a two-dimensional gray-scale image of a structure to be written; splitting and writing the three-dimensional gray-scale writing data into different output channels of a waveform generator based on a rotating mirror parallel writing algorithm and the number of the multi-channel writing light beams; when a displacement table moves to a target position, controlling the switching or amplitude modulation of each corresponding channel of a multi-channel acousto-optic modulator by using the three-dimensional gray-scale writing data of the different output channels of the waveform generator, and completing parallel writing of the structure to be written. Through the application, the problem that obvious step phenomena easily occur during three-dimensional laser writing in the related art is solved, the three-dimensional laser writing speed is improved, and the obvious step phenomena during three-dimensional laser writing are eliminated.

Description

Technical Field

[0001] This application relates to the field of three-dimensional laser direct writing lithography, and in particular to a parallel three-dimensional grayscale laser direct writing method and apparatus based on rotating mirrors. Background Technology

[0002] Three-dimensional laser direct writing, such as laser direct writing based on two-photon polymerization, double absorption effect, and edge light suppression effect, can achieve the fabrication of three-dimensional structures at the mm-cm scale while maintaining high precision at the nm-µm level. This capability allows for the realization of micrometer- or even nanometer-scale functional features on mesoscopic objects, which is particularly important in the research of high-precision novel complex devices and structures, such as on-chip integrated systems, micro-nano optics, and metamaterials. Currently, three-dimensional laser direct writing lithography still faces several challenges, such as slow writing speed. The commonly used galvanometer scanning method has a scanning frequency of around 100–200 Hz and a writing speed of 0.01–0.1 mm. 2 The speed of [speed] / min is insufficient to meet the demands of rapid fabrication of large-scale structures in industrial environments. Furthermore, 3D laser direct writing employs a layer-by-layer stacking strategy. For certain special structures, such as the top of a microlens, this strategy can easily lead to noticeable step-like phenomena due to the rapid structural changes between layers.

[0003] There is currently no effective solution to the problem of obvious step-like phenomena that easily occur during 3D laser engraving in related technologies. Summary of the Invention

[0004] This embodiment provides a parallel three-dimensional grayscale laser direct writing method and apparatus based on rotating mirrors to solve the problem of obvious step phenomenon that easily occurs during three-dimensional laser writing in related technologies.

[0005] Firstly, this embodiment provides a parallel three-dimensional grayscale laser direct-write lithography method based on a rotating mirror, comprising:

[0006] A writing laser is generated using a writing laser; multiple writing beams are generated based on an optical diffraction device and the writing laser.

[0007] Generate three-dimensional grayscale writing data based on the two-dimensional grayscale image of the structure to be written;

[0008] Based on the rotating mirror parallel writing algorithm and the number of beams of the multi-path writing beam, the three-dimensional grayscale writing data is split and written to different output channels of the waveform generator.

[0009] When the displacement stage moves to the target position, the three-dimensional grayscale writing data of different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator, so as to complete the parallel writing of the structure to be written.

[0010] In some embodiments, generating three-dimensional grayscale inscription data from a two-dimensional grayscale image of the structure to be inscribed includes:

[0011] The two-dimensional grayscale image of the structure to be inscribed is segmented into a target grayscale image composed of nx columns and nz layers of two-dimensional grayscale images, where nx and nz are positive integers;

[0012] Traverse the target grayscale image and obtain three-dimensional grayscale characterization data based on the target grayscale image.

[0013] In some embodiments, after traversing the target grayscale image and obtaining three-dimensional grayscale characterization data based on the target grayscale image, the method further includes:

[0014] When the three-dimensional grayscale data is a four-dimensional array, based on the fact that the target grayscale image has been divided into nx columns and nz layers, the four-dimensional array is transformed into a three-dimensional array.

[0015] In some embodiments, the method of splitting and writing the three-dimensional grayscale characterization data to different output channels of the waveform generator based on the rotating mirror parallel characterization algorithm and the number of beams of the multi-path characterization beams includes:

[0016] Based on the three-dimensional grayscale characterization data, the three-dimensional grayscale characterization data in column xi is obtained sequentially to obtain three-dimensional grayscale characterization sub-data;

[0017] Based on the number of beams of the multi-path writing beams, the three-dimensional grayscale writing sub-data is sampled and grouped. The grouped three-dimensional grayscale writing sub-data correspond to the different output channels of the waveform generator.

[0018] Based on the number of interleavings, the target three-dimensional grayscale writing data of the different output channels is subjected to a delay and zero-padding operation to obtain the target three-dimensional grayscale writing data;

[0019] The target three-dimensional grayscale data is written to the different output channels of the waveform generator respectively.

[0020] In some of these embodiments, the number of interleavings satisfies:

[0021] (ncross×nbeams+1)×pixelsize=dbeams;

[0022] Wherein, the positive integer nbeams is the number of beams of the multi-path writing beam, the positive integer pixelsize is the pixel size, and the positive integer dbeams is the distance between two adjacent beams used by the multi-path writing beam at the focal plane of the objective lens.

[0023] In some embodiments, when the displacement stage moves to the target position, the control of the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator using the three-dimensional grayscale characterization data from different output channels of the waveform generator includes:

[0024] Move the displacement stage to the start position;

[0025] The displacement platform enters a uniform motion state through the acceleration and uniform speed transition zone;

[0026] When the displacement stage passes through the designated position, that is, when each column of the target grayscale image begins to be written, a waveform generator trigger signal is generated.

[0027] Based on the trigger signal of the waveform generator and the three-dimensional grayscale characterization data of different output channels of the waveform generator, the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator is controlled.

[0028] Secondly, this embodiment provides a parallel three-dimensional grayscale laser direct-write lithography apparatus based on a rotating mirror, comprising:

[0029] The marking laser generation module is used to generate marking laser through a marking laser; and to generate multiple marking beams based on an optical diffraction device and the marking laser.

[0030] The image processing module is used to generate three-dimensional grayscale marking data based on the two-dimensional grayscale image of the structure to be marked.

[0031] The rotating mirror algorithm module is used to split the three-dimensional grayscale writing data and write it to different output channels of the waveform generator according to the rotating mirror parallel writing algorithm and the number of beams of the multi-path writing beam;

[0032] The parallel writing module is used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator by using the three-dimensional grayscale writing data of different output channels of the waveform generator when the displacement stage moves to the target position, so as to complete the parallel writing of the structure to be written.

[0033] Thirdly, this embodiment provides a parallel three-dimensional grayscale laser direct-write lithography system based on a rotating mirror, including: a writing laser device, an optical diffraction device, a multi-channel high-speed optical modulation device, a sample translation motion device, a waveform generator, and a computer device;

[0034] The writing laser device is used to generate the writing laser;

[0035] The optical diffraction device is used to generate the high-throughput multi-path writing beam;

[0036] The multi-channel high-speed optical modulation device is used to independently control the light intensity of each sub-beam in the high-throughput multi-path writing beam;

[0037] The sample translation motion device is used for large-scale three-dimensional movement of the structure to be inscribed;

[0038] The waveform generator is used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator.

[0039] The computer device includes a memory and a processor, the memory storing a computer program, and the processor executing the parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors as described in the first aspect.

[0040] In some embodiments, the rotating mirror-based parallel three-dimensional grayscale laser direct-write lithography system further includes:

[0041] A high-speed rotating mirror device is used to achieve high-throughput horizontal parallel scanning of the multi-path writing beams.

[0042] Fourthly, this embodiment provides a storage medium storing a computer program that, when executed by a processor, implements the parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors described in the first aspect above.

[0043] Compared with related technologies, the parallel three-dimensional grayscale laser direct writing method and apparatus based on a rotating mirror provided in this embodiment generates a writing laser through a writing laser; generates multiple writing beams based on an optical diffraction device and the writing laser; generates three-dimensional grayscale writing data based on the two-dimensional grayscale image of the structure to be written; splits the three-dimensional grayscale writing data and writes it to different output channels of a waveform generator based on a rotating mirror parallel writing algorithm and the number of beams of the multiple writing beams; when the displacement stage moves to the target position, the three-dimensional grayscale writing data of the different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator to complete the parallel writing of the structure to be written. This solves the problem of obvious step phenomenon that easily occurs during three-dimensional laser writing in related technologies, improves the three-dimensional laser writing speed, and eliminates the obvious step phenomenon during three-dimensional laser writing.

[0044] Details of one or more embodiments of this application are set forth in the following drawings and description to make other features, objects and advantages of this application more readily apparent. Attached Figure Description

[0045] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments of this application and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:

[0046] Figure 1 This is a schematic diagram of the hardware structure of the parallel three-dimensional grayscale laser direct-write lithography system based on rotating mirror in this embodiment.

[0047] Figure 2 This is a schematic flowchart of the parallel three-dimensional grayscale laser direct writing lithography method based on rotating mirrors in this embodiment.

[0048] Figure 3 This is a flowchart illustrating the three-dimensional grayscale writing data generation procedure of the parallel three-dimensional grayscale laser direct writing lithography method based on rotating mirrors according to this preferred embodiment.

[0049] Figure 4 This is a schematic flowchart of the laser writing operation of the parallel three-dimensional grayscale laser direct writing lithography method based on rotating mirrors according to this preferred embodiment.

[0050] Figure 5 This is a schematic diagram of the three-dimensional writing data splitting process of the parallel three-dimensional grayscale laser direct writing lithography method based on rotating mirrors according to this preferred embodiment.

[0051] Figure 6 This is a structural block diagram of the parallel three-dimensional grayscale laser direct writing lithography apparatus based on a rotating mirror according to a preferred embodiment.

[0052] In the figure: 1. Writing laser; 2. Half-wave plate; 3. First reflecting mirror; 4. Second reflecting mirror; 5. First beam expander lens; 6. Second beam expander lens; 7. Optical diffraction device; 8. Third reflecting mirror; 9. First lens; 10. Multi-channel acousto-optic modulator; 11. Second lens; 12. Fourth reflecting mirror; 13. Rotating mirror; 14. Scanning lens; 15. Field lens; 16. Dichroic mirror; 17. High-NA objective lens; 18. Photoresist sample; 19. Piezoelectric... 20. Displacement stage; 21. Air bearing displacement stage; 22. Beam splitter; 23. Imaging lens; 24. Camera; 25. Condenser lens; 26. Aperture; 27. Illumination source; 28. Data acquisition card; 29. ​​Rotating mirror position detection laser; 30. Rotating mirror position detection detector; 31. Waveform generator; 120. Computer; 130. Writing laser generation module; 140. Image processing module; 150. Rotating mirror algorithm module; 160. Parallel writing module. Detailed Implementation

[0053] To better understand the purpose, technical solution, and advantages of this application, the application is described and illustrated below in conjunction with the accompanying drawings and embodiments.

[0054] Unless otherwise defined, the technical or scientific terms used in this application shall have the general meaning as understood by one of ordinary skill in the art to which this application pertains. Words such as “a,” “an,” “an,” “the,” “the,” and “these,” used in this application, do not indicate quantitative limitation and may be singular or plural. The terms “comprising,” “including,” “having,” and any variations thereof used in this application are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or device that comprises a series of steps or modules (units) is not limited to the listed steps or modules (units) but may include steps or modules (units) not listed, or may include other steps or modules (units) inherent to such processes, methods, products, or devices. The terms “connected,” “linked,” and “coupled,” used in this application, are not limited to physical or mechanical connections but may include electrical connections, whether direct or indirect. The term “multiple” used in this application refers to two or more. The "and / or" operator describes the relationship between related objects, indicating that three relationships can exist. For example, "A and / or B" can represent three cases: A alone, A and B simultaneously, and B alone. Typically, the character " / " indicates that the objects before and after it are in an "or" relationship. The terms "first," "second," and "third," etc., used in this application are merely for distinguishing similar objects and do not represent a specific ordering of the objects.

[0055] This application discloses a parallel three-dimensional grayscale laser direct-write lithography method based on a rotating mirror, which can be applied to a parallel three-dimensional grayscale laser direct-write lithography system based on a rotating mirror. This system includes a writing laser device, a beam expander and shaper, an optical diffractometer, a multi-channel high-speed optical modulation device, a high-speed rotating mirror device, a rotating mirror position monitoring device, an optical scanning device, a sample translational motion device, a waveform generator, a data acquisition device, and a server device. The writing laser generated by the server device and the writing laser device is reflected into the beam expander and shaper, then incident on the optical diffractometer to generate multiple writing beams. These multiple writing beams are then independently modulated by the multi-channel high-speed optical modulation device, and finally focused onto the structure to be written by the high-speed rotating mirror device, the rotating mirror position monitoring device, and the optical scanning device. The server device is connected to the waveform generator, the sample translational motion device, and the data acquisition device. The waveform generator is also connected to the multi-channel high-speed optical modulation device, and the data acquisition device is also connected to the rotating mirror position monitoring device.

[0056] The writing laser device is used to generate the writing laser. In this embodiment, the writing laser device is a 780nm writing laser. It should be noted that in other embodiments, the writing laser device also includes a synchrotron radiation source, a full-band continuous light laser, or a full-band pulsed laser.

[0057] A beam expander and shaper is used to generate high-quality expanded and collimated polarized light. In this embodiment, the beam expander and shaper includes two lenses, positioned one behind the other with their focal points overlapping. The focal lengths f1 and f2 have the following relationship with the incident / outgoing light spot size D1 and D2: The shaping device, based on the beam expander, places a pinhole at the focal point where the two lenses coincide. The size D of the pinhole is determined by the following formula: λ represents the wavelength, f represents the focal length of the incident lens, and r represents the incident beam energy 1 / e 2 Radius at that location.

[0058] An optical diffraction device for generating the high-throughput multipath writing beam, including but not limited to the following devices: spatial light modulator (SLM) and diffractive optical element (DOE).

[0059] A multi-channel high-speed optical modulation device for independently controlling the light intensity of each sub-beam in the high-throughput multi-path writing beam.

[0060] The rotating mirror position monitoring device is used to monitor the position of the rotating mirror and generate a rotating mirror position trigger signal.

[0061] An optical scanning device is used to focus the high-throughput multi-path writing beam onto the structure to be written. In this embodiment, the optical scanning device includes a scanning lens, a field lens, and an objective lens. The scanning lens and the field lens form a 4f system, which is placed between the rotating mirror and the objective lens. The rotating mirror and the objective lens are respectively positioned at the front and rear focal planes of the 4f system.

[0062] The sample translation motion device is used for large-scale three-dimensional movement of the structure to be inscribed. In this embodiment, the sample translation motion device includes, but is not limited to, the following devices: piezoelectric displacement stage, air bearing displacement stage, mechanical electric displacement stage, manual displacement stage, and combinations containing at least one of the above devices.

[0063] A waveform generator (AWG) is used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator.

[0064] A data acquisition device is used to monitor the position trigger signal of the rotating mirror. In this embodiment, the data acquisition device used is a data acquisition card (DAQ). The displacement stage position trigger signal is monitored by using a programmable input port, and the small semiconductor laser switch of the rotating mirror position monitoring module is controlled by using a digital output port.

[0065] The computer device includes a memory and a processor. The memory stores a computer program, and the processor is used to execute a rotating mirror-based parallel three-dimensional grayscale laser direct-write lithography method.

[0066] In some embodiments, the above-described parallel three-dimensional grayscale laser direct-write lithography system based on rotating mirrors further includes the following devices:

[0067] A high-speed rotating mirror device is used to achieve high-throughput horizontal parallel scanning of the multi-path writing beams.

[0068] Figure 1 This is a schematic diagram of the hardware structure of a parallel 3D grayscale laser direct-write lithography system based on a rotating mirror. Figure 1 As can be seen, the parallel three-dimensional grayscale laser direct-write lithography system based on rotating mirror in this embodiment includes: a writing laser 1, a half-wave plate 2, a first reflecting mirror 3, a second reflecting mirror 4, a first beam expander lens 5, a second beam expander lens 6, an optical diffraction device 7, a third reflecting mirror 8, a first lens 9, a multi-channel acousto-optic modulator 10, a second lens 11, a fourth reflecting mirror 12, a rotating mirror 13, a scanning lens 14, a field lens 15, a dichroic mirror 16, a high-NA objective lens 17, a photoresist sample 18, a piezoelectric displacement stage 19, an air bearing displacement stage 20, a beam splitter 21, an imaging lens 22, a camera 23, a condenser lens 24, an aperture 25, an illumination source 26, a data acquisition card 27, a rotating mirror position detection laser 28, a rotating mirror position detection detector 29, a waveform generator 30, and a computer 31.

[0069] Specifically, the writing laser 1 is used to emit the writing laser. In this embodiment, the writing laser 1 is a 780nm femtosecond laser. The 780nm femtosecond laser generates a 780nm femtosecond laser beam, which is passed through a half-wave plate 2 to adjust the laser polarization direction. In this embodiment, the half-wave plate 2 is a 780nm half-wave plate. After the laser direction is adjusted by the first reflecting mirror 3 and the second reflecting mirror 4, it enters the first beam expanding lens 5 and the second beam expanding lens 6 to complete the laser beam expansion. In this embodiment, both the first and second beam expanding lenses are commercially available beam expanding lenses. Subsequently, the laser is incident on the optical diffraction device 7. By loading a hologram onto the optical diffraction device 7, the single beam of light is modulated into multiple beams. In this embodiment, the optical diffraction device 7 is a commercially available phase-type spatial light modulator. The laser is reflected by the third reflecting mirror 8, and then the hologram is subjected to a Fourier transform by the first lens 9. A multi-focus point is generated at the focal plane of the first lens 9; a multi-channel acousto-optic modulator 10 is placed at the focal plane of the lens, with each channel passing through a focal point to achieve independent modulation of each beam of light; it should be noted that the multiple beams are arranged along the direction perpendicular to the paper plane at this time. Here, in order to more clearly express the effect of the multi-channel acousto-optic modulator 10, a 90-degree rotation display processing is performed; the second lens 11 re-collimates the diverging light, which is reflected by the fourth reflecting mirror 12 and enters the rotating mirror 13. In this embodiment, the rotating mirror is used as a scanning device, and the scanning speed can reach 32kHz, which is about two orders of magnitude higher than that of the traditional galvanometer, greatly improving the writing efficiency; after being reflected by the rotating mirror 13, the multiple beams are reflected by the scanning lens 14, the field lens 15, and the dichroic mirror 16 and enter the high NA objective lens 17, and are focused on the photoresist sample 18; the piezoelectric displacement stage 19 and the air bearing displacement stage 20 perform scanning motion under program control.

[0070] The light is reflected by three reflecting mirrors 8, and then the hologram is subjected to Fourier transform by the first lens 9, generating multiple focal points at the focal plane of the first lens 9. A multi-channel acousto-optic modulator 10 is placed at the focal plane of the lens, with each channel passing through a focal point to achieve independent modulation of each beam of light. It should be noted that the multiple beams are arranged along the direction perpendicular to the paper plane. To better illustrate the effect of the multi-channel acousto-optic modulator 10, a 90-degree rotation display is performed. The second lens 11 re-collimates the diverging light, which is reflected by the fourth reflecting mirror 12 and enters the rotating mirror 13. In this embodiment, the rotating mirror 13 is used as a scanning device, and the scanning speed can reach 32kHz, which is about two orders of magnitude higher than that of the traditional galvanometer, greatly improving the writing efficiency. After being reflected by the rotating mirror 13, the multiple beams are reflected by the scanning lens 14, the field lens 15, and the dichroic mirror 16 and then enter the high-NA objective lens 17, and are focused onto the photoresist sample 18. The piezoelectric displacement stage 19 and the air bearing displacement stage 20 perform scanning motion under program control.

[0071] In this embodiment, the illumination source 26 is an LED lamp. The emitted illumination light is converted into quasi-parallel light by the condenser lens 24 after passing through the aperture 25. After being reflected by the beam splitter 21, it passes through the dichroic mirror 16 and the high NA objective lens 17 in sequence before being incident on the photoresist sample 18. In addition, the image of the photoresist sample 18 is imaged onto the camera 23 in sequence through the high NA objective lens 17, the dichroic mirror 16, the beam splitter 21, and the imaging lens 22 for writing and observation.

[0072] Computer 31 acts as the host computer to control the writing program, calculating and generating three-dimensional grayscale writing data. After the writing data is prepared, computer 31 sends instructions to air bearing displacement stage 20 and piezoelectric displacement stage 19, commanding them to move to the starting position of the current splicing writing unit and turn off the rotating mirror trigger laser. Subsequently, the data of the current unit is split and written into each channel of the waveform generator. After the writing is completed, data acquisition card 27 is started to monitor the position trigger signal, and waveform generator 30 is started to wait for the rotating mirror trigger signal. Then, instructions are sent to air bearing displacement stage 20 to start moving. When it moves to the designated position, a trigger signal is sent to data acquisition card 27. After receiving the trigger signal, data acquisition card 27 turns on rotating mirror position detection laser 28. The laser beam emitted by the rotating mirror position detection laser 28 is reflected by the rotating mirror 13 and received by the rotating mirror position detection detector 29. The signal received by the rotating mirror position detection detector 29 is used as a trigger signal and transmitted to the waveform generator 30. After receiving the trigger signal, the waveform generator 30 outputs the writing data that has been written into the buffer in advance, and controls the multi-channel acousto-optic modulator 10 to realize switching or amplitude modulation, thereby completing the parallel writing of the photoresist sample.

[0073] Computer 31 also includes a processor and a memory. The processor may be a processing device including, but not limited to, a microprocessor (MCU) or a programmable logic device (FPGA), which executes various functional applications and data processing. The memory can be used to store control programs, such as application software programs and modules, like the control program corresponding to a parallel three-dimensional grayscale laser direct-write lithography method based on a rotating mirror in this embodiment. Computer 31 executes various functional applications and data processing by running the control program stored in the memory, thereby implementing the above-described method. The memory may include high-speed random access memory (RAM) and non-volatile memory, such as one or more magnetic storage devices, flash memory, or other non-volatile solid-state memories.

[0074] This embodiment provides a parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors. Figure 2 This is a flowchart of the parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors in this embodiment, as shown below. Figure 2 As shown, the process includes the following steps:

[0075] Step S201: A writing laser is generated using a writing laser; multiple writing beams are generated based on the optical diffraction device and the writing laser.

[0076] Step S202: Generate three-dimensional grayscale writing data based on the two-dimensional grayscale image of the structure to be written.

[0077] Step S203: Based on the rotating mirror parallel writing algorithm and the number of multiple writing beams, the three-dimensional grayscale writing data is split and written to different output channels of the waveform generator.

[0078] Step S204: When the displacement stage moves to the target position, the three-dimensional grayscale writing data of different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator to complete the parallel writing of the structure to be written.

[0079] It should be noted that the optical diffraction device used in this embodiment is a commercial phase-type spatial light modulator. In other embodiments, diffractive optical elements (DOEs) can also be used to generate multiple beams.

[0080] In existing technologies, the galvanometer scanning commonly used in 3D laser direct-write lithography has a scanning frequency of around 100–200 Hz and a writing speed of 0.01–0.1 mm. 2 The speed of [speed] / min is insufficient to meet the demands of rapid fabrication of large-scale structures in industrial environments. Furthermore, 3D laser direct writing employs a layer-by-layer stacking strategy. For certain special structures, such as the top of a microlens, this strategy can easily lead to noticeable step-like phenomena due to the rapid structural changes between layers.

[0081] Compared with existing technologies, this embodiment uses a rotating mirror as a scanning device, achieving a scanning speed of 32kHz, which is approximately two orders of magnitude faster than traditional galvanometers. Combined with a rotating mirror parallel writing algorithm, this significantly improves writing efficiency. Furthermore, this application replaces traditional layer-by-layer data with three-dimensional grayscale writing data and introduces a rotating mirror parallel writing algorithm, effectively solving the step phenomenon problem between layers, improving laser writing efficiency, and achieving excellent laser writing results.

[0082] In some embodiments, generating three-dimensional grayscale writing data based on a two-dimensional grayscale image of the structure to be written includes the following steps:

[0083] Step S301: The two-dimensional grayscale image of the structure to be inscribed is segmented into a target grayscale image consisting of nx columns and nz layers of two-dimensional grayscale images, where nx and nz are positive integers.

[0084] Step S302: Traverse the target grayscale image and obtain three-dimensional grayscale characterization data based on the target grayscale image.

[0085] The specific implementation steps are as follows:

[0086] Step S301-a: First, read the two-dimensional grayscale image of the structure to be inscribed, perform image segmentation on the two-dimensional grayscale image, segment the two-dimensional grayscale image into nx columns, select the grayscale image of the j-th column, where the integer j is greater than or equal to 0 and less than or equal to nx.

[0087] Step S301-b: The grayscale image in column j is re-pixelated using a two-dimensional interpolation method. This two-dimensional interpolation method can be bilinear interpolation, quadratic interpolation, cubic spline interpolation, or a custom function interpolation. After re-pixelation, the number of pixels in the x-direction (npixelx) and the number of pixels in the y-direction (npixely) are respectively:

[0088] npixelx=lx / pixelsize(1.1);

[0089] npixely=ly / pixelsize(1.2);

[0090] In Equation (1.1), lx and in Equation (1.2), ly represent the actual writing lengths in the x and y directions of the j-th column grayscale image, respectively, and pixelsize represents the set pixel size.

[0091] Step S301-c: Read the two-dimensional grayscale data of the j-th column of the re-pixelated grayscale image, denoted as imagegray(j,x,y).

[0092] Step S301-d: Determine whether the current grayscale value is 0 (bottom or top layer). If it is the bottom layer, imagegray(j,x,y) remains unchanged; if it is the top layer, the value of imagegray(j,x,y) is:

[0093] imagegray(j,x,y)=maxgray-imagegray(j,x,y)(1.3);

[0094] In equation (1.3), maxgray represents the maximum gray value.

[0095] Step S301-e: Set the total height of the structure to be inscribed to h and the layer thickness to dz, and obtain the two-dimensional data layergray(j,x,y,k) of the grayscale values ​​of the j-th column and k-th layer grayscale image:

[0096] layergray(j,x,y,k)=(imagegray(j,x,y)-k / nz*maxgray)*nz(1.4);

[0097] In Equation (1.4), nz = h / dz represents the number of layers the structure to be inscribed is divided into, and the two-dimensional grayscale image of the nx columns and nz layers obtained after image segmentation is the target grayscale image mentioned above.

[0098] Step S301-f: Reset the data type and bit depth of layergray(j,x,y,k) to maintain consistency with the data structure of the two-dimensional grayscale image in step b.

[0099] Step S302-a, repeat steps S301-e to S301-f to obtain grayscale writing data of all layers in column j, for a total of nz groups of three-dimensional grayscale writing data;

[0100] Step S302-b: Repeat steps S301-a to S302-a to obtain grayscale data for all columns and all layers, totaling n = nx * nz groups of three-dimensional grayscale data, which is a four-dimensional array layergray(j,x,y,k).

[0101] Through the steps described above in this embodiment, the two-dimensional grayscale image of the structure to be inscribed is finely segmented to generate three-dimensional grayscale inscription data. This allows the subsequent computer equipment to control the inscription laser to perform inscription operations more smoothly based on the three-dimensional grayscale inscription data, which helps to eliminate inscription phenomena between layers during inscription and achieve a good laser inscription effect.

[0102] In some embodiments, after traversing the target grayscale image and obtaining the three-dimensional grayscale characterization data based on the target grayscale image, the following steps are also included:

[0103] Step S401: When the three-dimensional grayscale data is written as a four-dimensional array, based on the fact that the target grayscale image has been divided into nx columns and nz layers, the four-dimensional array is transformed into a three-dimensional array.

[0104] Specifically, as described above, steps S301 and S302 convert the two-dimensional grayscale image of the structure to be inscribed into three-dimensional grayscale inscription data of nx*nz groups, which is a four-dimensional array layergray(j,x,y,k). In this embodiment, based on the fact that the target grayscale image has been divided into nx columns and nz layers, the four-dimensional array layergray(j,x,y,k) is converted into a three-dimensional array stitchgray(i,x,y). The specific implementation steps are as follows:

[0105] In step S401-a, set variables j = 0 and k = 0 respectively.

[0106] Step S401-b: Define variable i = j + k * nx, and stitchgray(i,x,y) = layergray(j,x,y,k).

[0107] In step S401-c, j = j + 1, repeat step S401-b until j = nx.

[0108] In step S401-d, k = k+1, repeat steps S401-b to S401-c until k = nz.

[0109] Step S401-e: The four-dimensional data layergray(j,x,y,k) is transformed into three-dimensional data stitchgray(i,x,y).

[0110] By using the steps described above in this embodiment, the four-dimensional array is transformed into a three-dimensional array, which helps to improve the efficiency of subsequent data processing and thus improve the efficiency of laser engraving.

[0111] In some embodiments, based on the rotating mirror parallel writing algorithm and the number of beams of the multi-path writing beams, the three-dimensional grayscale writing data is split and written to different output channels of the waveform generator, including the following steps:

[0112] Step S501: Based on the three-dimensional grayscale inscription data, the three-dimensional grayscale inscription data of the xi column are obtained sequentially to obtain the three-dimensional grayscale inscription sub-data;

[0113] Step S502: Based on the number of beams of the multi-path writing beam, the three-dimensional grayscale writing sub-data is sampled and grouped. The grouped three-dimensional grayscale writing sub-data correspond to different output channels of the waveform generator.

[0114] Step 503: Based on the number of interleavings, perform a delay-padding operation on the target 3D grayscale writing data of different output channels to obtain the target 3D grayscale writing data.

[0115] Step 504: Write the target 3D grayscale data into different output channels of the waveform generator.

[0116] Specifically, the data in the xi-th column of the 3D data stitchgray(i,x,y) is taken and denoted as stitchgray(i,xi,y), where xi is greater than or equal to 0 and less than or equal to nx. Elements in stitchgray(i,xi,y) are extracted, with elements 0, nbeams, 2nbeams, ... being output as the first channel stitchch1(i,xi,y), elements 1, nbeams+1, 2nbeams+1, ... being output as the second channel stitchch2(i,xi,y), and so on, until nbeams-1, 2nbeams+1, ... are extracted. ams-1, 3nbeams-1, ... are the final channel outputs stitchchnbeams(i,xi,y), where nbeams is the number of beams used for parallel writing; the xi-th column of 3D grayscale writing data is obtained sequentially to obtain the corresponding 2D writing data stitchch1(i,x,y), stitchch2(i,x,y), ..., stitchchnbeams(i,x,y) for each output channel; in parallel writing, the writing data of different channels are not output simultaneously, and there is a certain delay between different channels, so it is necessary to perform zero-padding operation on the writing data of each channel in sequence. The delay is proportional to the number of interpolations, ncross. The two-dimensional data is padded with zeros: channel 1 is not padded, channel 2 is padded with zeros for ncross rows at the beginning, and so on, until the last channel is padded with zeros for (nbeams-1)*ncross rows at the beginning. The data for each output channel, stitchch1(i,x,y), stitchch2(i,x,y), ..., stitchchnbeams(i,x,y), is converted from two-dimensional to one-dimensional data by concatenating the end of the previous row with the beginning of the next row, resulting in stitchch1(i,data), stitchch2(i,data), ..., stitchchnbeams(i,data). The data size of each channel is standardized, using the channel with the largest data size as the standard, and the other channels are padded with a sufficient number of zeros at the end. The data for each channel is then written into the corresponding channels of the waveform generator.

[0117] Through the steps described above in this embodiment, the three-dimensional grayscale writing data is split and written to different output channels of the waveform generator, thereby improving the laser writing efficiency.

[0118] In some of these embodiments, the above-mentioned number of interleavings satisfies:

[0119] (ncross×nbeams+1)×pixelsize=dbeams(1.5);

[0120] In Equation (1.5), the positive integer nbeams is the number of beams in the multi-path writing beam, the positive integer pixelsize is the pixel size, and the positive integer dbeams is the distance between two adjacent beams used by the multi-path writing beam at the focal plane of the objective lens.

[0121] Specifically, in order to solve the output delay problem of writing data in different channels during parallel writing, since the output delay is proportional to the number of interleaving ncross, it is necessary to perform zero-padding operation on the writing data at the beginning position of each channel according to the number of interleaving and the number of beams used in parallel writing.

[0122] The above steps in this embodiment solve the problem of output delay of writing data from different channels in parallel writing, thereby achieving a good laser writing effect.

[0123] In some embodiments, when the displacement stage moves to the target position, the three-dimensional grayscale characterization data from different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator, including the following steps:

[0124] Step S601: Move the displacement stage to the start position.

[0125] Step S602: The displacement stage is moved through the acceleration and uniform speed transition zone to enter a uniform speed motion state.

[0126] Step S603: When the displacement stage passes the specified position, that is, when each column of the target grayscale image begins to be written, a waveform generator trigger signal is generated.

[0127] Step S604: Based on the waveform generator trigger signal and the three-dimensional grayscale writing data of different output channels of the waveform generator, control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator.

[0128] Specifically, in this embodiment, the displacement stage is a piezoelectric displacement stage. Before writing begins, the displacement stage needs to be moved backward a certain distance along the -y direction. This distance ensures that the displacement stage has entered a uniform speed motion state when it passes the writing start position. The displacement stage first moves along the -y axis to the start position; then, the displacement stage accelerates along the y axis, entering a uniform speed motion state through the acceleration uniform speed transition zone; a trigger signal is generated when the displacement stage passes the designated position, i.e., the starting writing position of each column; the displacement stage moves to the writing end position and begins to decelerate; the displacement stage comes to a complete stop after passing the uniform speed interval transition zone. When the displacement stage passes the designated position, a waveform generator trigger signal is generated. Based on the waveform generator trigger signal and the three-dimensional grayscale writing data of different output channels of the waveform generator, a writing signal is output to the high-speed optical switch to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator. It should be noted that this embodiment uses analog output with a sampling rate of 40MHz or higher.

[0129] By using the steps described above in this embodiment to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator, the accuracy of laser engraving can be improved, and a good laser engraving effect can be achieved.

[0130] The present embodiment will now be described and illustrated through preferred embodiments.

[0131] Figure 3 This is a flowchart illustrating the three-dimensional grayscale writing data generation procedure of the parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors according to this preferred embodiment, as shown below. Figure 3 As shown, the process of this 3D grayscale characterization data generation program includes the following steps:

[0132] Step S701: Read the two-dimensional grayscale image and initialize j = 0.

[0133] Step S702: Perform a cropping operation on the graphic, dividing the two-dimensional grayscale image into 1 row and n columns.

[0134] Step S703: Select the grayscale image in column j.

[0135] Step S704: Perform two-dimensional interpolation on the grayscale image in column j. The interpolation method can be bilinear interpolation, quadratic interpolation, cubic spline interpolation, or a custom function interpolation. After re-pixelation, the number of pixels in the x and y directions are npixelx = lx / pixelsize and npixelly = ly / pixelsize, respectively, where lx and ly represent the actual writing lengths in the x and y directions of the grayscale image in column j, and pixelsize represents the set pixel size. Read the two-dimensional grayscale data after re-pixelation, denoted as imagegray(j,x,y); set variable k = 0.

[0136] Step S705: Determine whether the current grayscale value is 0 or the top layer.

[0137] Step S706: If the current grayscale value is 0 and it is the bottom layer, then imagegray(j,x,y) remains unchanged; if it is the top layer, then imagegray(j,x,y) = maxgray - imagegray(j,x,y), where maxgray represents the maximum grayscale value.

[0138] Step S707: Set the total height of the inscribed structure to h and the layer cutting thickness to dz, and obtain the two-dimensional data of the grayscale value of the k-th grayscale image: layergray(j,x,y,k)=(imagegray(j,x,y)-k / nz*maxgray)*nz, where nz=h / dz represents the layer number.

[0139] Step S708: Reset the data type and bit depth of layergray(j,x,y,k) to maintain the same level as the two-dimensional grayscale in step S702. Figure 1 To; set k = k + 1.

[0140] Step S709: Repeat steps S707-S708 until k = nz to end the loop, and obtain grayscale writing data of all layers in column j, for a total of nz groups of three-dimensional grayscale writing data.

[0141] Step S710, j = j + 1;

[0142] Step S711: Repeat steps S702-S710 until j = nx, ending the loop.

[0143] Step S712: Obtain grayscale data for all columns and all layers, totaling n = nx * nz groups of three-dimensional grayscale data, which is a four-dimensional array layergray(j,x,y,k).

[0144] Step S713: Reorder j and k to transform the four-dimensional array layergray(j,x,y,k) into a three-dimensional array.

[0145] Step S714: Set variables j = 0 and k = 0 respectively.

[0146] Step S715, define variable i = j + k * nx, and stitchgray(i,x,y) = layergray(j,x,y,k).

[0147] Step S716, j = j + 1, repeat step S715, the loop ends when j = nx.

[0148] In step S717, k = k + 1, repeat steps S715 to S716, and end the loop when k = nz.

[0149] Step S718: The four-dimensional data layergray(j,x,y,k) is transformed into three-dimensional data stitchgray(i,x,y).

[0150] Figure 4 This is a schematic flowchart of the laser writing operation of the parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors according to this preferred embodiment, as shown below. Figure 4 As shown, after the data preparation is complete, the computer, acting as the host computer, completes the writing operation. The program begins as follows:

[0151] Step S801: Turn on the writing laser to generate a writing laser beam; turn off the rotating mirror position monitoring module; turn on the rotating mirror and control it to work at the set rotating mirror scanning frequency; mark i = 0.

[0152] In step S802, the displacement stage moves to the starting position of the i-th column; using the starting position (x0, y0, z0) of the first group of splicing units as a reference position, subsequent splicing units complete the relative movement according to the above sorting method. When the first sorting method is selected, the pattern is first spliced ​​in the z-direction, and then spliced ​​in the x-direction. Whenever the x-coordinate changes, the z-coordinate returns to zero. When the second sorting method is selected, the pattern is first spliced ​​in the x-direction, and then spliced ​​in the z-direction. Whenever the z-coordinate changes, the x-coordinate returns to zero.

[0153] Step S803: Read the i-th column of data, split it, and write it into the waveform generator buffer. Figure 5 This is a schematic diagram of the three-dimensional writing data splitting process of the parallel three-dimensional grayscale laser direct writing lithography method based on rotating mirror according to this preferred embodiment. The specific steps are as follows: Figure 5 As shown, it includes:

[0154] Step S803-a: Read the current writing unit stitchgray(i,x,y) and denot it as stitchgray(x,y); initialize xi = 0.

[0155] Step S803-b: Read the data in column xi: stitchgray(xi,y).

[0156] Step S803-c: Extract the elements in stitchgray(xi,y) and use elements 0, nbeams, 2nbeams, ... as the first channel output stitchch1(xi,y), use elements 1, nbeams+1, 2nbeams+1, ... as the second channel output stitchch2(xi,y), and so on, until n-1, 2nbeams-1, 3nbeams-1, ... are used as the final channel output stitchchnbeams(xi,y), where nbeams is the number of beams used for parallel writing.

[0157] In step S803-d, xi = xi + 1, and repeat steps S718-b and S718-c until xi = nx, at which point the loop ends.

[0158] Step S803-e: Obtain the writing data stitchch1(x,y), stitchch2(x,y), ... stitchchnbeams(x,y) corresponding to each output channel.

[0159] In step S803-f, during parallel writing, the writing data for different channels are not output simultaneously, and there is a certain delay between different channels. Therefore, it is necessary to perform zero-padding on the writing data of each channel in sequence. This delay is proportional to the number of interleaving beams, ncross. The number of interleaving beams, ncross, is calculated according to the formula (ncross × nbeams + 1) × pixelsize = dbeams, where nbeams is the number of beams used in parallel writing, pixelsize is the pixel size, and dbeams is the distance between the two adjacent beams used in parallel writing at the focal plane of the objective lens.

[0160] Step S803-g: Pad the two-dimensional writing data obtained in step S718-d with zeros. Channel 1 is not padded with zeros, while channel 2 is padded with zeros of ncross rows at the beginning position, and so on. Finally, each channel is padded with zeros of (nbeams-1)*ncross rows at the beginning position.

[0161] Step S803-h: Convert the two-dimensional data of each output channel stitchch1(x,y), stitchch2(i,x,y), ... stitchchnbeams(x,y) into one-dimensional data by connecting the end of the previous row with the beginning of the next row, to obtain stitchch1(data), stitchch2(data), ... stitchchnbeams(data).

[0162] Step S803-i: Unify the data size of each channel, using the channel with the largest data size as the standard, and add a sufficient number of zeros to the end of the other channels.

[0163] Step S804: Determine whether the waveform generator (AWG) writing has been completed. If not, repeat step S803.

[0164] Step S805: If the waveform generator (AWG) writing is complete, start the data acquisition card DAQ to enter the position trigger waiting state.

[0165] Step S806: The waveform generator's trigger mode is set to multi-trigger mode. The waveform generator waits for a trigger signal, specifically including: when there is no trigger signal, any waveform generator is in a waiting state; when a trigger signal is received, a timer starts, the time interval is a user-defined value, after the timer completes, a segment of data of a specified size in the buffer is output, while waiting for the next trigger signal; when the next trigger signal is received, a time delay equal to the previous time interval is completed, and then the next segment of data of the same size begins to be output, until all data in the buffer is completely output. The specified segment of data corresponds to a line of written data.

[0166] Step S807: Execute the specified movement program stored in the displacement stage buffer. The displacement stage begins to move at a constant speed along the specified path. When passing the displacement stage trigger position, a displacement stage position trigger signal is issued. The specified movement program includes:

[0167] Step S807-a: The displacement stage moves along the -y axis to the starting position.

[0168] In step S807-b, the displacement stage accelerates along the y-axis and enters a uniform motion state through the acceleration uniform transition zone.

[0169] In step S807-c, the displacement stage generates a trigger signal when it passes the designated position, i.e., the starting position for writing each column.

[0170] In step S807-d, the displacement stage moves to the writing end position and begins to decelerate.

[0171] In step S807-e, the displacement stage comes to a complete stop after passing through the uniform speed interval transition zone.

[0172] Step S808: The data acquisition card DAQ waits for the displacement stage position trigger signal.

[0173] In step S809, if a position trigger signal of the displacement stage is not acquired, proceed to step S808.

[0174] Step S810: If a displacement stage position trigger signal is acquired, the rotating mirror position monitoring module is turned on to generate a rotating mirror position trigger signal.

[0175] Step S811: Determine whether the waveform generator has acquired the mirror position trigger signal. If it has not acquired it, proceed to step S806.

[0176] In step S812, after receiving the mirror position trigger signal, the waveform generator ends its waiting period and begins operating in a multi-trigger state. Each time a trigger signal is received, it outputs a line of data. This data is used to control the multi-channel acousto-optic modulator 10 to perform switching or amplitude modulation, thereby writing the specific structure. The task ends after an entire column of data in the buffer has been output.

[0177] Step S813: Determine whether the waveform generator (AWG) output has been completed. If not, repeat step S811.

[0178] Step S814: When the waveform generator (AWG) output is complete, turn off the rotating mirror trigger laser.

[0179] In step S815, set i = i + 1, and repeat steps S802 to S814 until i = n - 1, where n = nx * nz, which represents all column data, to complete the writing process.

[0180] Through the above preferred embodiments, three-dimensional grayscale marking data is generated based on the two-dimensional grayscale image of the structure to be marked; based on the parallel marking algorithm of the rotating mirror and the number of multiple marking beams generated by the optical diffraction device, the three-dimensional grayscale marking data is split and written to different output channels of the waveform generator; when the displacement stage moves to the target position, the three-dimensional grayscale marking data of different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator, thereby completing the parallel marking of the structure to be marked, improving the speed of three-dimensional laser marking, and eliminating the obvious step phenomenon during three-dimensional laser marking.

[0181] This embodiment also provides a parallel three-dimensional grayscale laser direct-write lithography apparatus based on a rotating mirror. This apparatus is used to implement the above embodiments and preferred embodiments, and details already described will not be repeated. The terms "module," "unit," "subunit," etc., used below can refer to combinations of software and / or hardware that implement a predetermined function. Although the apparatus described in the following embodiments is preferably implemented in software, hardware implementation, or a combination of software and hardware, is also possible and contemplated.

[0182] Figure 6 This is a structural block diagram of the parallel three-dimensional grayscale laser direct-write lithography apparatus based on a rotating mirror according to a preferred embodiment, as shown below. Figure 6As shown, the device includes: a laser writing generation module 110, an image processing module 120, a rotating mirror algorithm module 130, and a parallel writing module 140.

[0183] It should be noted that the above modules can be functional modules or program modules, and can be implemented through software or hardware. For modules implemented through hardware, the above modules can reside in the same processor; or the above modules can be located in different processors in any combination.

[0184] The marking laser generation module 110 is used to generate marking laser through a marking laser, and generate multiple marking beams based on the optical diffraction device and the marking laser; the image processing module 120 is used to generate three-dimensional grayscale marking data based on the two-dimensional grayscale image of the structure to be marked; the rotating mirror algorithm module 130 is used to split the three-dimensional grayscale marking data and write it to different output channels of the waveform generator based on the rotating mirror parallel marking algorithm and the number of beams of the multiple marking beams; the parallel marking module 140, when the displacement stage moves to the target position, uses the three-dimensional grayscale marking data from different output channels of the waveform generator to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator to complete the parallel marking of the structure to be marked.

[0185] In some embodiments, the image processing module 120 is further configured to perform image segmentation on the two-dimensional grayscale image of the structure to be inscribed, segmenting the two-dimensional grayscale image of the structure to be inscribed into a target grayscale image composed of nx columns and nz layers of two-dimensional grayscale images, where nx and nz are positive integers; traversing the target grayscale image, and obtaining three-dimensional grayscale inscription data based on the target grayscale image.

[0186] In some embodiments, the image processing module 120 is also configured to convert the four-dimensional array into a three-dimensional array based on the fact that the target grayscale image has been segmented into nx columns and nz layers when the three-dimensional grayscale data is a four-dimensional array.

[0187] In some embodiments, the rotating mirror algorithm module 130 is further configured to: acquire the xi-th column of three-dimensional grayscale inscription data sequentially based on the three-dimensional grayscale inscription data to obtain three-dimensional grayscale inscription sub-data; perform data sampling and grouping of the three-dimensional grayscale inscription sub-data according to the number of beams of the multi-path inscription beams, with the grouped three-dimensional grayscale inscription sub-data corresponding to different output channels of the waveform generator; perform delay and zero-padding operation on the target three-dimensional grayscale inscription data of different output channels according to the number of interleaving operations to obtain target three-dimensional grayscale inscription data; and write the target three-dimensional grayscale inscription data into the different output channels of the waveform generator respectively.

[0188] In some embodiments, in the mirror rotation algorithm module 130, the number of interleavings satisfies:

[0189] (ncross×nbeams+1)×pixelsize=dbeams;

[0190] Wherein, the positive integer nbeams is the number of beams in the multi-path writing beam, the positive integer pixelsize is the pixel size, and the positive integer dbeams is the distance between two adjacent beams used in the multi-path writing beam at the focal plane of the objective lens.

[0191] In some embodiments, the parallel writing module 140 is also used to move the displacement stage to the start position; to move the displacement stage through the acceleration uniform speed transition zone to a uniform speed motion state; to generate a waveform generator trigger signal when the displacement stage passes through a designated position, i.e., when each column of the target grayscale image begins to be written; and to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator according to the waveform generator trigger signal and the three-dimensional grayscale writing data of different output channels of the waveform generator.

[0192] The above-mentioned device solves the problem of obvious step phenomenon that easily occurs during 3D laser engraving in related technologies, improves the speed of 3D laser engraving, and eliminates the obvious step phenomenon during 3D laser engraving.

[0193] Furthermore, in conjunction with the rotating mirror-based parallel three-dimensional grayscale laser direct-write lithography method provided in the above embodiments, this embodiment can also provide a storage medium for implementation. This storage medium stores a computer program; when executed by a processor, the computer program implements any of the rotating mirror-based parallel three-dimensional grayscale laser direct-write lithography methods described in the above embodiments.

[0194] It should be understood that the specific embodiments described herein are merely illustrative of the application and not intended to limit it. All other embodiments derived by those skilled in the art based on the embodiments provided in this application without inventive effort are within the scope of protection of this application.

[0195] Obviously, the accompanying drawings are merely some examples or embodiments of this application. Those skilled in the art can apply this application to other similar situations based on these drawings without any creative effort. Furthermore, it is understood that although the work done in this development process may be complex and lengthy, for those skilled in the art, certain design, manufacturing, or production modifications made based on the technical content disclosed in this application are merely conventional technical means and should not be considered as insufficient disclosure of this application.

[0196] The term "embodiment" in this application refers to a specific feature, structure, or characteristic described in connection with an embodiment that may be included in at least one embodiment of this application. The appearance of this phrase in various places in the specification does not necessarily imply the same embodiment, nor does it imply that it is mutually exclusive with or independent of other embodiments. It will be clearly or implicitly understood by those skilled in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0197] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of patent protection. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the appended claims.

Claims

1. A parallel three-dimensional grayscale laser direct-write lithography method based on rotating mirrors, characterized in that, include: The writing laser is generated by a writing laser; Multiple writing beams are generated based on the optical diffraction device and the writing laser; Generate three-dimensional grayscale writing data based on the two-dimensional grayscale image of the structure to be written; Based on the rotating mirror parallel writing algorithm and the number of beams of the multi-path writing beam, the three-dimensional grayscale writing data is split and written to different output channels of the waveform generator. When the displacement stage moves to the target position, the three-dimensional grayscale writing data of different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator, so as to complete the parallel writing of the structure to be written.

2. The parallel three-dimensional grayscale laser direct-write lithography method according to claim 1, characterized in that, The process of generating three-dimensional grayscale inscription data based on the two-dimensional grayscale image of the structure to be inscribed includes: The two-dimensional grayscale image of the structure to be inscribed is segmented into a target grayscale image composed of nx columns and nz layers of two-dimensional grayscale images, where nx and nz are positive integers; Traverse the target grayscale image and obtain three-dimensional grayscale characterization data based on the target grayscale image.

3. The parallel three-dimensional grayscale laser direct-write lithography method according to claim 2, characterized in that, After traversing the target grayscale image and obtaining the three-dimensional grayscale characterization data based on the target grayscale image, the method further includes: When the three-dimensional grayscale data is a four-dimensional array, based on the fact that the target grayscale image has been divided into nx columns and nz layers, the four-dimensional array is transformed into a three-dimensional array.

4. The parallel three-dimensional grayscale laser direct-write lithography method according to claim 1, characterized in that, The parallel inscription algorithm based on rotating mirrors and the number of inscription beams in the multi-path inscription beams are used to split the three-dimensional grayscale inscription data and write it to different output channels of the waveform generator, including: Based on the three-dimensional grayscale characterization data, the three-dimensional grayscale characterization data in column xi is obtained sequentially to obtain three-dimensional grayscale characterization sub-data; Based on the number of beams of the multi-path writing beams, the three-dimensional grayscale writing sub-data is sampled and grouped. The grouped three-dimensional grayscale writing sub-data correspond to the different output channels of the waveform generator. Based on the number of interleavings, the three-dimensional grayscale writing sub-data of the different output channels are subjected to a delay and zero-padding operation to obtain the target three-dimensional grayscale writing data; The target three-dimensional grayscale data is written into the different output channels of the waveform generator respectively.

5. The parallel three-dimensional grayscale laser direct-write lithography method according to claim 4, characterized in that, The number of interleavings satisfies: ； Wherein, the positive integer nbeams is the number of beams of the multi-path writing beam, the positive integer pixelsize is the pixel size, and the positive integer dbeams is the distance between two adjacent beams used by the multi-path writing beam at the focal plane of the objective lens.

6. The parallel three-dimensional grayscale laser direct-write lithography method according to claim 2, characterized in that, When the displacement stage moves to the target position, the three-dimensional grayscale data from different output channels of the waveform generator are used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator, including: Move the displacement stage to the start position; The displacement platform enters a uniform motion state through the acceleration and uniform speed transition zone; When the displacement stage passes through the designated position, that is, when each column of the target grayscale image begins to be written, a waveform generator trigger signal is generated. Based on the trigger signal of the waveform generator and the three-dimensional grayscale characterization data of different output channels of the waveform generator, the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator is controlled.

7. A parallel three-dimensional grayscale laser direct-write lithography apparatus based on a rotating mirror, characterized in that, include: The marking laser generation module is used to generate marking laser through a marking laser; and to generate multiple marking beams based on an optical diffraction device and the marking laser. The image processing module is used to generate three-dimensional grayscale marking data based on the two-dimensional grayscale image of the structure to be marked. The rotating mirror algorithm module is used to split the three-dimensional grayscale writing data and write it to different output channels of the waveform generator according to the rotating mirror parallel writing algorithm and the number of beams of the multi-path writing beam; The parallel writing module is used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator by using the three-dimensional grayscale writing data of different output channels of the waveform generator when the displacement stage moves to the target position, so as to complete the parallel writing of the structure to be written.

8. A parallel three-dimensional grayscale laser direct-write lithography system based on a rotating mirror, characterized in that, include: Inscription laser equipment, optical diffraction equipment, multi-channel acousto-optic modulator, sample translation motion equipment, waveform generator, and computer equipment; The writing laser device is used to generate writing laser; The optical diffraction device is used to generate high-throughput multi-path writing beams; The multi-channel acousto-optic modulator is used to independently control the light intensity of each sub-beam in a high-throughput multi-path writing beam. The sample translation motion device is used for large-scale three-dimensional movement of the structure to be inscribed; The waveform generator is used to control the switching or amplitude modulation of each corresponding channel of the multi-channel acousto-optic modulator. The computer device includes a memory and a processor, the memory storing a computer program, and the processor executing a parallel three-dimensional grayscale laser direct-write lithography method based on a rotating mirror, as described in any one of claims 1 to 6.

9. The parallel three-dimensional grayscale laser direct-write lithography system based on a rotating mirror according to claim 8, characterized in that, The parallel three-dimensional grayscale laser direct-write lithography system based on rotating mirror also includes: A high-speed rotating mirror device is used to achieve high-throughput horizontal parallel scanning of the multi-path writing beams.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements the steps of the parallel three-dimensional grayscale laser direct writing lithography method based on a rotating mirror as described in any one of claims 1 to 6.

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