Optical Proximity Correction Method

Abstract

An optical proximity correction method includes: providing an initial layout, the initial layout including a first dense area, a first junction area, a sparse area, a second junction area, and a second dense area arranged along a first direction; the first dense area having a plurality of first patterns arranged parallel to and along a second direction; the first junction area having a first edge pattern; the second dense area having a plurality of second patterns arranged parallel to and along the first direction; and the second junction area having a second edge pattern; obtaining environmental information of the first edge patterns and the second edge patterns; and, based on the environmental information, determining the number, position, and size of auxiliary patterns formed in the sparse area in a targeted manner according to the environment of the first and second edge patterns in each case, thereby improving the final optical proximity correction effect.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing technology, and in particular to an optical proximity correction method. Background Art

[0002] Photolithography is a crucial technology in semiconductor manufacturing. It enables the transfer of patterns from a mask onto the surface of a silicon wafer, creating semiconductor products that meet design requirements. The photolithography process consists of an exposure step, a development step following the exposure step, and an etching step following the development step. During the exposure step, light passes through the light-transmitting areas of the mask onto a silicon wafer coated with photoresist, causing the photoresist to undergo a chemical reaction under the irradiation of light. During the development step, the different solubility of the developer in the photosensitive and unsensitive photoresists is exploited to form a photoresist pattern, enabling the transfer of the mask pattern to the photoresist. During the etching step, the silicon wafer is etched based on the photoresist pattern formed in the photoresist layer, further transferring the mask pattern to the wafer.

[0003] In semiconductor manufacturing, as design dimensions continue to shrink, approaching the limits of photolithography imaging systems, the diffraction effect of light becomes increasingly pronounced, ultimately leading to optical image degradation of the designed pattern. The actual photolithography pattern formed is severely distorted relative to the pattern on the mask, and the actual pattern formed by photolithography on the silicon wafer is ultimately different from the designed pattern. This phenomenon is called the Optical Proximity Effect (OPE).

[0004] Optical Proximity Correction (OPC) was developed to correct for the optical proximity effect. The core concept of OPC is to establish an OPC model based on the consideration of offsetting the optical proximity effect. The photomask pattern is designed based on the OPC model. This allows the photomask pattern to be closer to the target pattern desired by the user, even though the optical proximity effect may occur in the photolithography pattern relative to the mask pattern after photolithography. This offset has been taken into account when designing the photomask pattern based on the OPC model.

[0005] However, there are still many problems with optical proximity correction in the prior art. Summary of the Invention

[0006] The technical problem solved by the present invention is to provide an optical proximity correction method, which can effectively improve the final optical proximity correction effect.

[0007] To solve the above problems, the technical solution of the present invention provides an optical proximity correction method, including: providing an initial layout, the initial layout including a first dense area, a first junction area, a sparse area, a second junction area and a second dense area arranged along a first direction, the first junction area is located between the first dense area and the sparse area, the second junction area is located between the second dense area and the sparse area, the sparse area is located between the first junction area and the second junction area, the first dense area has a plurality of first graphics parallel to the second direction and arranged along the first direction, the first direction is perpendicular to the second direction, the first junction area has a first edge graphic, the second dense area has a plurality of second graphics parallel to the second direction and arranged along the first direction, and the second junction area has a second edge graphic; obtaining environmental information of the first edge graphic and the second edge graphic; and determining the number, position and size of the auxiliary graphics formed in the sparse area according to the environmental information.

[0008] Optionally, adjacent first graphics have a first center distance p1, adjacent second graphics have a second center distance p2, and the first center distance p1 and the second center distance p2 are equal; the first graphic has a first width dimension w1, and the second graphic has a second width dimension w2; the first width dimension w1 and the second width dimension w2 are equal; the first edge graphic has a first length dimension L1; and the second edge graphic has a second length dimension L2.

[0009] Optionally, the environmental information includes: the edge center distance D1 between the first edge graphic and the second edge graphic; the projection length Len of the first edge graphic on the second edge graphic; a number of first environmental detection data of the first edge graphic, the first environmental detection data is used to record whether there are surrounding graphics within a preset area range in the second direction or the third direction with the edge of the first edge graphic as the starting point; a number of second environmental detection data of the second edge graphic, the second environmental detection data is used to record whether there are surrounding graphics within a preset area range in the second direction or the third direction with the edge of the second edge graphic as the starting point.

[0010] Optionally, the first environmental detection data include: first detection data C1(T), second detection data C2(T), third detection data C1(B) and fourth detection data C2(B), wherein the first detection data C1(T) is acquired by detection at the top of the first edge figure toward the second direction according to the Euclidean detection method with a detection length of 1 times the first center distance p1; the second detection data C2(T) is acquired by detection at the top of the first edge figure toward the second direction according to the Euclidean detection method with a detection length of 2 times the first center distance p1; the third detection data C1(B) is acquired by detection at the bottom of the first edge figure toward the third direction according to the Euclidean detection method with a detection length of 1 times the first center distance p1; the fourth detection data C2(B) is acquired by detection at the bottom of the first edge figure toward the third direction according to the Euclidean detection method with a detection length of 2 times the first center distance p1; The second environmental detection data includes: fifth detection data C1(T)', sixth detection data C2(T)', seventh detection data C1(B)' and eighth detection data C2(B)', wherein the fifth detection data C1(T)' is acquired by detection at the top of the second edge figure toward the second direction according to the Euclidean detection method with a detection length of 1 times the second center distance p2; the sixth detection data C2(T)' is acquired by detection at the top of the second edge figure toward the second direction according to the Euclidean detection method with a detection length of 2 times the second center distance p2; the seventh detection data C1(B)' is acquired by detection at the bottom of the second edge figure toward the third direction according to the Euclidean detection method with a detection length of 1 times the second center distance p2; and the eighth detection data C2(B)' is acquired by detection at the bottom of the second edge figure toward the third direction according to the Euclidean detection method with a detection length of 2 times the second center distance p2.

[0011] Optionally, the method for determining the number of auxiliary graphics formed in the sparse area based on the environmental information includes: when the projection length Len is less than or equal to 0, the number of auxiliary graphics formed in the sparse area is 2; when the projection length Len is greater than 0 and the edge center distance D1 is less than 2 times the first center distance p1, the number of auxiliary graphics formed in the sparse area is 0; when the projection length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the number of auxiliary graphics formed in the sparse area is int(D1 / p1)-1.

[0012] Optionally, the method for determining the position of the auxiliary graphics formed in the sparse area based on the environmental information includes: when the projection length Len is less than or equal to 0, one of the two auxiliary graphics and the first edge graphics are arranged along the first direction, and the center distance between one of the two auxiliary graphics and the first edge graphics is 1 times the first center distance p1, and the other of the two auxiliary graphics and the second edge graphics are arranged along the first direction, and the center distance between the other of the two auxiliary graphics and the second edge graphics is 1 times the second center distance p2; when the projection length Len is greater than 0, and the edge center distance D1 is greater than 2 times the first center distance p1, the center of the auxiliary graphics and the center of the projection length Len are located on a straight line parallel to the first direction, and the center distance between adjacent auxiliary graphics, the center distance between adjacent auxiliary graphics and the first edge graphics, and the center distance between adjacent auxiliary graphics and the second edge graphics are equal.

[0013] Optionally, the dimensions of the auxiliary graphic include: length and width.

[0014] Optionally, the method for determining the length of the auxiliary pattern formed in the sparse area based on the environmental information includes: when the projected length Len is less than or equal to 0, the length of the auxiliary pattern arranged along the first direction with the first edge pattern is equal to the first length L1, and the length of the auxiliary pattern arranged along the first direction with the second edge pattern is equal to the second length L2; when the projected length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the length of the auxiliary pattern is: min{f(LAE), f(RAE)}, where:

[0015] f(LAE)={C1(T)+(1-|C1(T)|*C2(T))}*Len-{C1(B)+(1-|C1(B)|*C2(B))}*Len+Len;

[0016] f(RAE)={C1(T)'+(1-|C1(T)'|*C2(T)')}*Len-{C1(B)'+(1-|C1(B)'|*

[0017] C2(B)')}*Len+Len.

[0018] Optionally, the width of the auxiliary graphic is equal to the first width w1.

[0019] Compared with the prior art, the technical solution of the present invention has the following advantages:

[0020] In the optical proximity correction method of the present invention, environmental information about the first and second edge patterns is obtained; based on this environmental information, the number, position, and size of the auxiliary patterns formed in the sparse area are determined. This method can specifically determine the number, position, and size of the auxiliary patterns formed in the sparse area based on the environment of the first and second edge patterns in each case, thereby improving the final optical proximity correction effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of a graphic arrangement after optical proximity correction;

[0022] Figure 2 is a flow chart of an optical proximity correction method according to an embodiment of the present invention;

[0023] Figures 3 to 11 1 is a schematic structural diagram of each step of the optical proximity correction method in an embodiment of the present invention. DETAILED DESCRIPTION

[0024] As described in the background art, there are still many problems with optical proximity correction in the prior art, which will be described in detail below with reference to the accompanying drawings.

[0025] Figure 1 It is a schematic diagram of graphic arrangement after optical proximity correction.

[0026] Please refer to Figure 1 , providing an initial layout, the initial layout including a first dense area A1, a first junction area B1, a sparse area C, a second junction area B2 and a second dense area A2 arranged along a first direction X, the first junction area B1 is located between the first dense area A1 and the sparse area C, the second junction area B2 is located between the second dense area A2 and the sparse area C, the sparse area C is located between the first junction area B1 and the second junction area B2, the first dense area A1 has a plurality of first graphics 101 parallel to the second direction Y and arranged along the first direction X, the first direction X is perpendicular to the second direction Y, the first junction area B1 has a first edge graphic 100, the second dense area A2 has a plurality of second graphics 103 parallel to the second direction Y and arranged along the first direction X, and the second junction area B2 has a second edge graphic 102.

[0027] Since the environments of the first edge pattern 100 and the first pattern 101, and the second edge pattern 102 and the second pattern 103 are significantly different, when optical proximity correction is employed, the first edge pattern 100 is likely to move toward several of the first patterns 101, and the second edge pattern 102 is likely to move toward several of the second patterns 103, thereby easily causing short circuits between subsequently formed device structures.

[0028] In the prior art, a solution to this problem is to add several auxiliary patterns to the edge of the wafer to reduce the environmental differences between the first edge pattern 100 and the plurality of first patterns 101, and between the second edge pattern 102 and the plurality of second patterns 103, thereby improving the effectiveness of optical proximity correction. However, due to the significant differences in the environments in which different first edge patterns 100 and second edge patterns 102 are located, it is not possible to solve the problem of movement of the first edge pattern 100 and the second edge pattern 102 in all situations by simply adding auxiliary patterns in batches.

[0029] Based on this, the present invention provides an optical proximity correction method that obtains environmental information about the first and second edge patterns and, based on this environmental information, determines the number, position, and size of auxiliary patterns formed in the sparse area. This method can specifically determine the number, position, and size of auxiliary patterns formed in the sparse area based on the environment of the first and second edge patterns in each case, thereby improving the final optical proximity correction effect.

[0030] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0031] Figure 2 FIG. 1 is a flow chart of an optical proximity correction method according to an embodiment of the present invention, comprising:

[0032] Step S101, providing an initial layout, wherein the initial layout includes a first dense area, a first junction area, a sparse area, a second junction area, and a second dense area arranged along a first direction, the first junction area is located between the first dense area and the sparse area, the second junction area is located between the second dense area and the sparse area, and the sparse area is located between the first junction area and the second junction area. The first dense area has a plurality of first graphics parallel to and arranged along a second direction, the first direction is perpendicular to the second direction, the first junction area has a first edge graphic, the second dense area has a plurality of second graphics parallel to and arranged along the second direction, and the second junction area has a second edge graphic.

[0033] Step S102, obtaining environmental information of the first edge graphic and the second edge graphic;

[0034] Step S103: determining the number, position and size of auxiliary patterns formed in the sparse area according to the environmental information.

[0035] The steps of the optical proximity correction method are described in detail below with reference to the accompanying drawings.

[0036] Figures 3 to 11 1 is a schematic structural diagram of each step of the optical proximity correction method in an embodiment of the present invention.

[0037] Please refer to Figure 3 , providing an initial layout, the initial layout including a first dense area A1, a first junction area B1, a sparse area C, a second junction area B2 and a second dense area A2 arranged along a first direction, the first junction area B1 being located between the first dense area A1 and the sparse area C, the second junction area B2 being located between the second dense area A2 and the sparse area C, the sparse area C being located between the first junction area B1 and the second junction area B2, the first dense area A1 having a plurality of first graphics 201 parallel to the second direction Y and arranged along the first direction X, the first direction X being perpendicular to the second direction Y, the first junction area B1 having a first edge graphic 200, the second dense area A2 having a plurality of second graphics 203 parallel to the second direction Y and arranged along the first direction X, and the second junction area B2 having a second edge graphic 202.

[0038] In this embodiment, adjacent first graphics have a first center distance p1, adjacent second graphics have a second center distance p2, and the first center distance p1 and the second center distance p2 are equal; the first graphic has a first width dimension w1, and the second graphic has a second width dimension w2; the first width dimension w1 and the second width dimension w2 are equal; the first edge graphic has a first length dimension L1; and the second edge graphic has a second length dimension L2.

[0039] In this embodiment, the first length dimension L1 of the first edge graphic 200 is equal to the length dimension of the first graphic 201 ; the second length dimension L2 of the second edge graphic 202 is equal to the length dimension of the second graphic 203 .

[0040] Please refer to Figure 4 , obtain environmental information of the first edge graph 200 and the second edge graph 202.

[0041] In this embodiment, the environmental information includes: the edge center distance D1 between the first edge graphic 200 and the second edge graphic 202; the projection length Len of the first edge graphic 200 on the second edge graphic 202; a number of first environmental detection data of the first edge graphic 200, the first environmental detection data being used to record whether there are surrounding graphics within a preset area range starting from the edge of the first edge graphic 200 and in the second direction Y or the third direction Y'; a number of second environmental detection data of the second edge graphic 202, the second environmental detection data being used to record whether there are surrounding graphics within a preset area range starting from the edge of the second edge graphic 202 and in the second direction Y or the third direction Y'.

[0042] In this embodiment, the plurality of first environmental detection data include: first detection data C1(T), second detection data C2(T), third detection data C1(B), and fourth detection data C2(B), wherein the first detection data C1(T) is acquired by detection in the second direction Y at the top of the first edge figure 200 according to the Euclidean detection method with a detection length of 1 times the first center distance p1; the second detection data C2(T) is acquired by detection in the second direction Y at the top of the first edge figure 200 according to the Euclidean detection method with a detection length of 2 times the first center distance p1; the third detection data C1(B) is acquired by detection in the third direction Y' at the bottom of the first edge figure 200 according to the Euclidean detection method with a detection length of 1 times the first center distance p1; and the fourth detection data C2(B) is acquired by detection in the third direction Y' at the bottom of the first edge figure 200 according to the Euclidean detection method with a detection length of 2 times the first center distance p1. The plurality of second environment detection data include: fifth detection data C1(T)', sixth detection data C2(T)', seventh detection data C1(B)' and eighth detection data C2(B)', wherein the fifth detection data C1(T)' is obtained by detection in the second direction Y at the top of the second edge figure 202 according to the Euclidean detection method with a detection length of 1 times the second center distance p2; the sixth detection data C2(T)' is obtained by detection in the second direction Y at the top of the second edge figure 202 according to the Euclidean detection method with a detection length of 2 times the second center distance p2; the seventh detection data C1(B)' is obtained by detection in the third direction Y' at the bottom of the second edge figure 202 according to the Euclidean detection method with a detection length of 1 times the second center distance p2; and the eighth detection data C2(B)' is obtained by detection in the third direction Y' at the bottom of the second edge figure 202 according to the Euclidean detection method with a detection length of 2 times the second center distance p2.

[0043] In this embodiment, the first detection data C1(T), the third detection data C1(B), the fifth detection data C1(T)' and the seventh detection data C1(B)' are all specific detection data under the C1() function. The C1() function is a type of Count() function. Its physical meaning is: the upper and lower edges of the array edge graphics located at the ISO spacing use 1 times the center distance as the detection length, and detect the surrounding graphics upward and downward in a Euclidean manner. Undetected surrounding graphics are recorded as 0, detection upward (i.e., 0° to 180°) is recorded as 1, and detection downward (i.e., 180° to 360°) is recorded as -1. Therefore, the C1() function has only three values, 0, 1 and -1. Similarly, the definition of 2 times the center distance as the detection length is abbreviated as the C2() function. The specific data obtained by the C2() function are: the second detection data C2(T), the fourth detection data C2(B), the sixth detection data C2(T)' and the eighth detection data C2(B)'.

[0044] In this embodiment, the upward direction is the second direction Y, and the downward direction is the third direction Y′.

[0045] After obtaining the environmental information of the first edge pattern 200 and the second edge pattern 202, the method further includes: determining the number, position and size of the auxiliary patterns formed in the sparse area C according to the environmental information. Figures 5 to 11 .

[0046] Please refer to Figure 5 , based on the environmental information, the method for determining the number of auxiliary graphics 300 formed in the sparse area C includes: when the projection length Len is less than or equal to 0, the number of auxiliary graphics 300 formed in the sparse area C is 2.

[0047] In this embodiment, the projection length Len is less than or equal to 0, that is, the projections of the first edge graphic 200 and the second edge graphic 202 are in a completely staggered positional relationship. At this time, it is necessary to form one auxiliary graphic 300 next to the first edge graphic 200 and one next to the second edge graphic 202, that is, the number of auxiliary graphics 300 formed in the sparse area C is 2.

[0048] Please refer to Figure 6 When the projection length Len is greater than 0 and the edge center distance D1 is less than 2 times of the first center distance p1, the number of auxiliary patterns 300 formed in the sparse area C is 0.

[0049] In this embodiment, the projection length Len is greater than 0, that is, the projections of the first edge graphic 200 and the second edge graphic 202 have overlapping parts. At this time, if the edge center distance D1 is less than 2 times the first center distance p1, it is considered that the distance between the first edge graphic 200 and the second edge graphic 202 is close, and there is no need to form the auxiliary graphic 300 in the sparse area C. That is, the number of auxiliary graphics 300 formed in the sparse area C is 0.

[0050] Please refer to Figure 7 When the projection length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the number of auxiliary patterns 300 formed in the sparse area C is int(D1 / p1)-1.

[0051] In this embodiment, when the projections of the first edge graphic 200 and the second edge graphic 202 have an overlapping portion, and at this time if the edge center distance D1 is greater than 2 times the first center distance p1, it is considered that the distance between the first edge graphic 200 and the second edge graphic 202 is large. At this time, an auxiliary graphic 300 needs to be formed in the sparse area C. The number of the auxiliary graphics 300 formed needs to refer to the multiple relationship between the edge center distance D1 and the first center distance p1, that is, the number of auxiliary graphics 300 formed in the sparse area C is int(D1 / p1)-1, where the int() function is a rounding-down function.

[0052] Please Figure 5 Based on reference Figure 8 , the method for determining the position of the auxiliary pattern 300 formed in the sparse area C according to the environmental information includes: when the projection length Len is less than or equal to 0, one of the two auxiliary patterns 300 and the first edge pattern 200 are arranged along the first direction X, and the center distance between one of the two auxiliary patterns 300 and the first edge pattern 200 is 1 times the first center distance p1, and the other of the two auxiliary patterns 300 and the second edge pattern 202 are arranged along the first direction X, and the center distance between the other of the two auxiliary patterns 300 and the second edge pattern 202 is 1 times the second center distance p2.

[0053] In this embodiment, the center distance between the auxiliary pattern 300 and the first edge pattern 200 is 1 times the first center distance p1, so that the center distance between the auxiliary pattern 300 and the first edge pattern 200 remains equal to the center distance between adjacent first patterns 201. Correspondingly, the center distance between the auxiliary pattern 300 and the second edge pattern 202 is 1 times the second center distance p2, so that the center distance between the auxiliary pattern 300 and the second edge pattern 202 remains equal to the center distance between adjacent second patterns 203.

[0054] Please Figure 7 Based on reference Figure 9 When the projection length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the center of the auxiliary pattern 300 and the center of the projection length Len are located on a straight line S parallel to the first direction X, and the center distances between adjacent auxiliary patterns 300, the center distances between adjacent auxiliary patterns 300 and the first edge pattern 200, and the center distances between adjacent auxiliary patterns 300 and the second edge pattern 202 are equal.

[0055] In this embodiment, the center of the auxiliary pattern 300 and the center of the projection length Len are located on a straight line S parallel to the first direction X, and the center distances between adjacent auxiliary patterns 300, the center distances between adjacent auxiliary patterns 300 and the first edge pattern 200, and the center distances between adjacent auxiliary patterns 300 and the second edge pattern 202 are equal. This is to ensure that the additional auxiliary pattern 300 is not biased towards either the first edge pattern 200 or the second edge pattern 202 in the first direction X, the second direction Y, and the third direction Y', so as to ensure the uniformity of the arrangement of the additional auxiliary patterns 300, thereby improving the final optical proximity correction effect.

[0056] In this embodiment, the dimensions of the auxiliary graphic 300 include: a length dimension and a width dimension.

[0057] Please Figure 8 Based on reference Figure 10 , based on the environmental information, the method for determining the length dimension of the auxiliary pattern 300 formed in the sparse area C includes: when the projected length Len is less than or equal to 0, the length dimension of the auxiliary pattern 300 arranged along the first direction X with the first edge pattern 200 is equal to the first length dimension L1, and the length dimension of the auxiliary pattern 300 arranged along the first direction X with the second edge pattern 202 is equal to the second length dimension L2.

[0058] In this embodiment, the two additional auxiliary patterns 300 are respectively equal to the first length dimension L1 of the corresponding first edge pattern 200 and the second length dimension L2 of the second edge pattern 202, which can ensure the uniformity of the overall pattern arrangement and thereby enhance the final optical proximity correction effect.

[0059] Please Figure 9 Based on reference Figure 11 When the projection length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the length dimension of the auxiliary pattern 300 is: min{f(LAE), f(RAE)}, where:

[0060] f(LAE)={C1(T)+(1-|C1(T)|*C2(T))}*Len-{C1(B)+(1-|C1(B)|*C2(B))}*Len+Len;

[0061] f(RAE)={C1(T)'+(1-|C1(T)'|*C2(T)')}*Len-{C1(B)'+(1-|C1(B)'|*

[0062] C2(B)')}*Len+Len.

[0063] Since the probability of the fifth detection data C1(T)' and the first detection data C1(T), the sixth detection data C2(T)' and the second detection data C2(T), the seventh detection data C1(B)' and the third detection data C1(B), and the eighth detection data C2(B)' and the fourth detection data C2(B) are simultaneously guaranteed to be equal is small, the probability of the results between f(LAE) and f(RAE) being equal is also small.

[0064] Please continue to refer to Figure 10 and Figure 11 , the width dimension of the auxiliary pattern 300 is equal to the first width dimension w1.

[0065] In this embodiment, environmental information of the first edge pattern 200 and the second edge pattern 202 is obtained, and the number, position, and size of the auxiliary patterns 300 formed in the sparse area C are determined based on the environmental information. The number, position, and size of the auxiliary patterns 300 formed in the sparse area C can be specifically determined based on the environment of the first edge pattern 200 and the second edge pattern 202 in each case, thereby improving the final optical proximity correction effect.

[0066] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be based on the scope defined by the claims.

Claims

1. An optical proximity correction method, characterized in that: include: Providing an initial layout, the initial layout including a first dense area, a first junction area, a sparse area, a second junction area, and a second dense area arranged along a first direction, the first junction area being located between the first dense area and the sparse area, the second junction area being located between the second dense area and the sparse area, and the sparse area being located between the first junction area and the second junction area, the first dense area having a plurality of first graphics parallel to and arranged along a second direction, the first direction being perpendicular to the second direction, the first junction area having a first edge graphic, the second dense area having a plurality of second graphics parallel to and arranged along the second direction, and the second junction area having a second edge graphic; Acquire environmental information of the first edge graphic and the second edge graphic; According to the environmental information, the number, position and size of the auxiliary graphics formed in the sparse area are determined; wherein, Adjacent first graphics have a first center distance p1, adjacent second graphics have a second center distance p2, and the first center distance p1 and the second center distance p2 are equal; the first graphics have a first width dimension w1, and the second graphics have a second width dimension w2; the first width dimension w1 and the second width dimension w2 are equal; the first edge graphics have a first length dimension L1; and the second edge graphics have a second length dimension L2; The environmental information includes: an edge center distance D1 between the first edge figure and the second edge figure; a projection length Len of the first edge figure on the second edge figure; a plurality of first environmental detection data of the first edge figure, the first environmental detection data being used to record whether there are surrounding figures within a preset area with the edge of the first edge figure as the starting point and in the second direction or the third direction; and a plurality of second environmental detection data of the second edge figure, the second environmental detection data being used to record whether there are surrounding figures within a preset area with the edge of the second edge figure as the starting point and in the second direction or the third direction. The first environmental detection data include: first detection data C1(T), second detection data C2(T), third detection data C1(B) and fourth detection data C2(B), wherein the first detection data C1(T) is acquired by detection at the top of the first edge figure toward the second direction according to the Euclidean detection method with a detection length of 1 times the first center distance p1; the second detection data C2(T) is acquired by detection at the top of the first edge figure toward the second direction according to the Euclidean detection method with a detection length of 2 times the first center distance p1; the third detection data C1(B) is acquired by detection at the bottom of the first edge figure toward the third direction according to the Euclidean detection method with a detection length of 1 times the first center distance p1; the fourth detection data C2(B) is acquired by detection at the bottom of the first edge figure toward the third direction according to the Euclidean detection method with a detection length of 2 times the first center distance p1; The second environmental detection data includes: fifth detection data C1(T)', sixth detection data C2(T)', seventh detection data C1(B)' and eighth detection data C2(B)', wherein the fifth detection data C1(T)' is acquired by detection at the top of the second edge figure toward the second direction with a detection length of 1 times the second center distance p2 according to the Euclidean detection method; the sixth detection data C2(T)' is acquired by detection at the top of the second edge figure toward the second direction with a detection length of 2 times the second center distance p2 according to the Euclidean detection method; the seventh detection data C1(B)' is acquired by detection at the bottom of the second edge figure toward the third direction with a detection length of 1 times the second center distance p2 according to the Euclidean detection method; and the eighth detection data C2(B)' is acquired by detection at the bottom of the second edge figure toward the third direction with a detection length of 2 times the second center distance p2 according to the Euclidean detection method.

2. The optical proximity correction method according to claim 1, wherein: The method for determining the number of auxiliary graphics formed in the sparse area based on the environmental information includes: when the projection length Len is less than or equal to 0, the number of auxiliary graphics formed in the sparse area is 2; when the projection length Len is greater than 0 and the edge center distance D1 is less than 2 times the first center distance p1, the number of auxiliary graphics formed in the sparse area is 0; when the projection length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the number of auxiliary graphics formed in the sparse area is int(D1 / p1)-1.

3. The optical proximity correction method according to claim 2, wherein: The method for determining the position of the auxiliary graphics formed in the sparse area based on the environmental information includes: when the projection length Len is less than or equal to 0, one of the two auxiliary graphics and the first edge graphics are arranged along the first direction, and the center distance between one of the two auxiliary graphics and the first edge graphics is 1 times the first center distance p1, and the other of the two auxiliary graphics and the second edge graphics are arranged along the first direction, and the center distance between the other of the two auxiliary graphics and the second edge graphics is 1 times the second center distance p2; when the projection length Len is greater than 0, and the edge center distance D1 is greater than 2 times the first center distance p1, the center of the auxiliary graphics and the center of the projection length Len are located on a straight line parallel to the first direction, and the center distance between adjacent auxiliary graphics, the center distance between adjacent auxiliary graphics and the first edge graphics, and the center distance between adjacent auxiliary graphics and the second edge graphics are equal.

4. The optical proximity correction method according to claim 3, wherein: The dimensions of the auxiliary graphics include length and width.

5. The optical proximity correction method according to claim 4, wherein: The method for determining, based on the environmental information, a length dimension of an auxiliary pattern formed in the sparse area includes: when the projected length Len is less than or equal to 0, the length dimension of the auxiliary pattern arranged along the first direction with the first edge pattern is equal to the first length dimension L1, and the length dimension of the auxiliary pattern arranged along the first direction with the second edge pattern is equal to the second length dimension L2; when the projected length Len is greater than 0 and the edge center distance D1 is greater than 2 times the first center distance p1, the length dimension of the auxiliary pattern is: ,in: ； 。 6. The optical proximity correction method according to claim 4, wherein: The width of the auxiliary pattern is equal to the first width w1.

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