A device for preparing a semiconductor high-purity chemical solution

By designing a control and reversing valve mechanism suitable for semiconductor chemical solution preparation devices, continuous cleaning and drying of the inner wall of the pipette is achieved, solving the problem of low pipette cleaning efficiency, maintaining solvent cleanliness, improving cleaning and drying efficiency, and reducing cleaning difficulty.

CN116474636BActive Publication Date: 2026-02-10冠礼控制科技(上海)有限公司
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Patent Information

Application Number
CN202310451936.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-04-25
Publication Date
2026-02-10
Estimated Expiration
2043-04-25

AI Technical Summary

Technical Problem

In the existing semiconductor chemical solution preparation process, the pipette cleaning efficiency is low, and impurities are easily left behind, leading to solvent contamination and reduced cleanliness. In addition, the cleaning equipment has low single-pass efficiency, requiring a large number of pipettes to be piled up for cleaning, which increases the cleaning difficulty.

Method used

A mixing device was designed to achieve the alternating flow of cleaning liquid and drying gas on the inner wall of the straw through a control mechanism and a reversing valve mechanism. Combined with a lifting and rotating mechanism, it enables continuous cleaning and drying of the straw, improves cleaning and drying efficiency, and avoids solvent dehydration and adhesion.

Benefits of technology

It improves the cleaning effect of the inner wall of the pipette, reduces residual impurities, maintains the cleanliness of the solvent, reduces the need for cleaning equipment and time, and improves the high cleanliness of the chemical solution.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application belongs to the technical field of high-purity chemical solution preparation, and discloses a preparation device suitable for semiconductor high-cleanliness chemical solution, which comprises a base, a control mechanism is arranged on one side of the upper surface of the base, and a plurality of support plates are arranged on the upper surface of the base. The cleaning liquid in the first feeding pipe and the dry gas in the second feeding pipe are alternately introduced into the inner cavity of the ring shell through the front duct, and the cleaning liquid or the dry gas on the other side of the inner cavity of the ring shell rotates in the opposite direction of the suction pipe, so that the relative flow speed of the cleaning liquid or the dry gas along the inner wall of the suction pipe is adjusted, the collision force between the attachments on the inner wall of the suction pipe and the cleaning liquid or the dry gas is improved, the cleaning effect of the inner wall of the suction pipe is improved, the problem that the cleaning liquid in the traditional suction pipe is not easy to flow, thereby leading to poor cleaning effect of the inner wall of the suction pipe and easy residue is solved, and the problem that the residual impurities pollute the solvent stock solution, thereby reducing the cleanliness is solved.
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Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of high-purity chemical solution preparation, and particularly relates to a preparation device suitable for high-purity semiconductor chemical solution. BACKGROUND

[0002] The semiconductor industry has a high demand for high-purity chemicals, and solution is an essential part of the semiconductor manufacturing process. High-quality semiconductor devices require high-purity chemicals as raw materials, so the preparation of high-purity semiconductor chemical solution is a very important technology. The key to preparing high-purity chemical solution is the high purity of raw materials and the avoidance of external impurities. The preparation process needs to be carried out in a clean room with high cleanliness. The preparation of high-purity chemical solution is an indispensable part of the semiconductor manufacturing process, and has an important influence on the performance and quality of semiconductor devices.

[0003] Generally, the preparation process of semiconductor chemical solution is to suck a certain amount of solvent from the solvent tank through a pipette, then inject the solvent into the solution tank, so that the solvent and the solution are mixed to obtain the corresponding mixture. When the pipette sucks the solvent in the solvent tank, part of the solvent will adhere to the outer surface of the pipette. When the pipette sucks the solvent and transfers it to the solution tank, the solvent adhering to the surface of the pipette will react with the chemicals in the air, causing the chemical properties of the solvent on the surface of the pipette to change. At the same time, it will also stick to the dust in the air, causing the deteriorated solvent adhering to the pipette to contaminate the solvent in the solvent tank when the pipette sucks the solvent again, resulting in contamination of the original solvent and a decrease in the performance and quality of semiconductor devices. Therefore, the pipette needs to be cleaned. The existing pipette cleaning method is to place the used pipette in a circular cavity filled with cleaning liquid, and then clean the pipette by stirring. Since the diameter of one end of the pipette is small, the cleaning liquid inside the pipette does not flow easily during stirring and cleaning, resulting in poor cleaning effect of the inner wall of the pipette and easy residue. At the same time, the pipette is dried naturally after cleaning, which reduces the cleaning efficiency of the pipette, resulting in the need for a large number of pipettes when the pipetting frequency is high. At the same time, the existing cleaning equipment has low single cleaning efficiency, so a certain amount of pipettes need to be cleaned together. Since most semiconductor chemical solvents are organic solvents, they have strong viscosity and are easy to evaporate, which increases the difficulty of cleaning and causes impurities to remain on the surface of the pipette. SUMMARY

[0004] The purpose of the present application is to provide a preparation device suitable for high-purity semiconductor chemical solution to solve the problems raised in the background.

[0005] In order to achieve the above object, the present application provides the following technical scheme: A device for preparing semiconductor high-purity chemical solution, comprising a base, a solvent tank fixedly installed on the front side of the middle part of the upper surface of the base, a solution tank fixedly installed on the rear side of the middle part of the upper surface of the base, a regulating mechanism arranged on one side of the upper surface of the base, a plurality of support plates arranged on the other side of the middle part of the upper surface of the base at equal intervals in the circumferential direction, a ring shell fixedly installed on the top end of the plurality of support plates, a support ring fixedly installed on the middle part of the ring shell, a circular block slidingly sleeved on the middle part of the support ring, a plurality of clamping blocks fixedly installed on the upper surface of the circular block at equal intervals in the circumferential direction and slidingly sleeved on the support ring, a ring sleeve fixedly installed on the bottom end of the outer side of the clamping block and slidingly sleeved on the outer curved surface of the support ring, a plurality of mounting holes formed on the side surface of the ring sleeve at equal intervals in the circumferential direction, a plurality of mounting grooves formed on the upper surface of the ring sleeve at equal intervals in the circumferential direction, a gear shaft movably sleeved on the middle part of each of the plurality of mounting holes, a rack slidingly sleeved on the middle part of each of the plurality of mounting grooves, a limiting ring fixedly installed on the bottom end of the rack and slidingly sleeved on the ring shell, a fixing sleeve fixedly installed on the end of each of the plurality of gear shafts away from the support ring, a suction pipe arranged on the middle part of each of the plurality of fixing sleeves, a lifting mechanism arranged between the middle part of the circular block and the upper surface of the base, a valve mechanism arranged between the lifting mechanism and the upper surface of the ring shell, and a reversing valve mechanism arranged on the front and rear sides of the upper surface of the base and connected with the regulating mechanism and the ring shell.

[0006] Preferably, the regulating mechanism comprises a guide shell fixedly installed on one side of the upper surface of the base, a first driving member fixedly installed on one side of the rear side of the base close to the guide shell, a threaded rod fixedly installed on the front end of the output shaft of the first driving member, a threaded sliding block connected with the guide shell in a sliding manner and connected with the threaded rod in a threaded manner, a support shaft fixedly connected with the threaded sliding block and slidingly sleeved on the middle part of the guide shell, a first telescopic rod fixedly installed on the top end of the support shaft, a pipe shaft fixedly installed on the bottom end of the telescopic end of the first telescopic rod, a mounting block fixedly installed on one side of the bottom part of the support shaft close to the ring shell and slidingly sleeved on the guide shell, and clamping columns fixedly installed on both sides of the bottom surface of the mounting block.

[0007] Preferably, the lifting mechanism comprises a driving seat fixedly installed on the front side of the middle part of the upper surface of the base, a second driving member fixedly installed on the top surface of the inner cavity of the driving seat, a driving gear fixedly installed on the bottom end of the output shaft of the second driving member, a telescopic sleeve fixedly installed on the middle part of the circular block, a second telescopic rod movably sleeved on the middle part of the telescopic sleeve and movably sleeved on the base, and a driven gear fixedly installed on the bottom part of the second telescopic rod and engaged with the driving gear.

[0008] Preferably, the valve mechanism comprises a limiting sleeve fixedly installed at the bottom of the telescopic sleeve curved surface, a mounting sleeve slidably sleeved with the telescopic sleeve is slidably sleeved with the side surface of the limiting sleeve, a plurality of groups of cranks are equidistantly arranged on the side surface of the mounting sleeve, a push rod is slidably sleeved with the end of the crank away from the mounting sleeve, and a plurality of groups of guide valve blocks are equidistantly arranged on the upper surface of the ring shell.

[0009] Preferably, the reversing valve mechanism comprises a connecting rod slidably arranged at the middle of the two clamping columns, a plug rod is fixedly installed on the front and back sides of the connecting rod close to the ring shell, the length of the plug rod on the front side is greater than that on the back side, a piston is fixedly installed on the end of the two plug rods away from the connecting rod, valve housings are symmetrically fixedly installed on the front and back sides of the middle of the upper surface of the base, the two pistons are slidably sleeved with the middle of the adjacent valve housings, the plug rods are slidably sleeved with the adjacent valve housings, guide pipes are fixedly installed on the side of the two valve housings close to the ring shell and fixedly connected with the ring shell, first feed pipes are fixedly installed on the side of the two valve housings away from the ring shell and close to the connecting rod, and second feed pipes are fixedly installed on the side of the two valve housings away from the ring shell.

[0010] The beneficial effects of the present application are as follows:

[0011] 1、The piston of the reversing valve mechanism is driven by the adjusting mechanism to move to one side or the other side along the inner cavity of the valve housing, so that the cleaning liquid in the first feed pipe and the dry gas of the second feed pipe alternately pass through the guide pipe on the front side into the inner cavity of the ring shell, and the relative flow speed of the cleaning liquid or the dry gas along the inner wall of the suction pipe is adjusted through the opposite rotation direction of the cleaning liquid or the dry gas on the other side of the ring shell cavity and the suction pipe, so as to improve the collision intensity of the adhering matter on the inner wall of the suction pipe and the cleaning liquid or the dry gas, thereby improving the cleaning effect of the inner wall of the suction pipe, and solving the problem that the cleaning liquid in the traditional suction pipe is not easy to flow, thereby causing poor cleaning effect of the inner wall of the suction pipe and easy residue.

[0012] 2、The present application is provided with lifting mechanism, the telescopic sleeve of lifting mechanism moves upward, the telescopic sleeve drives the valve on the valve mechanism to move outward along the guide valve block, and the telescopic sleeve drives the round block to move upward, the round block drives the suction tube to move upward through the middle gap of two guide valve blocks in sequence through the clamping block, ring sleeve, gear shaft and fixed sleeve, and the rack forces the clockwise rotation of the gear shaft that moves upward, the gear shaft drives the suction tube to rotate clockwise through the fixed sleeve, the tip of the suction tube is perpendicular to the upper surface of the base, finally, the suction tube is replaced through the regulating mechanism, and the suction tube is moved to the upper side of the solution tank after the solvent in the inner cavity of the solvent tank is sucked, and finally the solvent is injected into the solution tank, so that the chemical solution is prepared, and the suction tube is continuously and alternately cleaned and dried during preparation, the cleaning and drying efficiency is improved, the problem that a large number of suction tubes need to be prepared and the static time is too long is avoided, the chemical solvent is lost and adhered to the surface of the suction tube, so that the cleaning difficulty is increased, the surface of the suction tube is polluted by residual impurities, and finally the residual impurities pollute the solvent stock solution, so that the cleanliness is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0013] Figure 1 It is the overall appearance schematic view of the structure of the present application;

[0014] Figure 2 It is the support ring schematic view of the structure of the present application;

[0015] Figure 3 It is the gear shaft schematic view of the structure of the present application;

[0016] Figure 4 It is the regulating mechanism schematic view of the present application;

[0017] Figure 5 It is the lifting mechanism schematic view of the present application;

[0018] Figure 6 It is the suction tube schematic view of the structure of the present application;

[0019] Figure 7 It is the valve mechanism schematic view of the present application;

[0020] Figure 8 It is the ring sleeve schematic view of the structure of the present application;

[0021] Figure 9 It is the limit sleeve schematic view of the structure of the present application.

[0022] In the diagram: 1. Base; 201. Solvent tank; 202. Solution tank; 3. Control mechanism; 301. First driving component; 302. Threaded rod; 303. Threaded slider; 304. Support shaft; 305. Telescopic rod one; 306. Tube shaft; 307. Guide shell; 308. Mounting block; 309. Clamping column; 4. Support plate; 5. Ring shell; 6. Support ring; 7. Round block; 8. Clamping block; 9. Ring sleeve; 901. Mounting hole; 902. Mounting groove; 10. Gear shaft; 11. Rack; 12. Limiting ring; 13. Fixing sleeve; 14. Suction tube; 15. Lifting mechanism Structure; 1501, Drive seat; 1502, Second drive component; 1503, Drive gear; 1504, Driven gear; 1505, Telescopic rod II; 1506, Telescopic sleeve; 16, Valve mechanism; 1601, Limit sleeve; 1602, Mounting sleeve; 1603, Crank; 1604, Push rod; 1605, Valve; 1606, Guide valve block; 17, Reversing valve mechanism; 1701, Connecting rod; 1702, Plug rod; 1703, Piston; 1704, Valve housing; 1705, Guide tube; 1706, First feed pipe; 1707, Second feed pipe. Detailed Implementation

[0023] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0024] like Figures 1 to 9As shown, this embodiment of the invention provides a mixing device suitable for high-purity chemical solutions for semiconductors, including a base 1. A solvent tank 201 is fixedly installed on the front side of the middle of the upper surface of the base 1, and a solution tank 202 is fixedly installed on the rear side of the middle of the upper surface of the base 1. A regulating mechanism 3 is provided on one side of the upper surface of the base 1, and multiple sets of support plates 4 are equidistantly arranged on the other side of the middle of the upper surface of the base 1. A ring shell 5 is fixedly installed at the top of the multiple sets of support plates 4, and a support ring is fixedly installed in the middle of the ring shell 5. 6. A circular block 7 is slidably sleeved in the middle of the support ring 6. Multiple sets of locking blocks 8, which are equidistantly fixed to the upper surface of the circular block 7 and slidably sleeved with the support ring 6, are fixedly installed. A ring sleeve 9, which is slidably sleeved with the outer curved surface of the support ring 6, is fixedly installed at the bottom outer end of the locking block 8. Multiple sets of mounting holes 901 are equidistantly opened on the outer circumference of the ring sleeve 9. Multiple sets of mounting grooves 902 are equidistantly opened on the upper surface of the ring sleeve 9. A gear shaft 10 is movably sleeved in the middle of each of the multiple sets of mounting holes 901. A gear shaft 10 is movably sleeved in the middle of each of the multiple sets of mounting grooves 902. A rack 11 is connected to the rotating part of the base 1. A limiting ring 12, which is slidably fitted to the bottom end of the rack 11, is fixedly installed. A fixing sleeve 13 is fixedly installed at the end of each of the multiple gear shafts 10 away from the support ring 6. A suction tube 14 is provided in the middle of each of the multiple fixing sleeves 13. A lifting and rotating mechanism 15 is provided between the middle of the circular block 7 and the upper surface of the base 1. A valve mechanism 16 is provided between the lifting and rotating mechanism 15 and the upper surface of the ring 5. Reversing valves connected to the regulating mechanism 3 and the ring 5 are provided on the front and rear sides of the upper surface of the base 1. Mechanism 17, wherein the limiting ring 12 is used to limit the vertical displacement of the rack 11, and the contact surfaces of the support ring 6 with the round block 7, the locking block 8 and the ring sleeve 9 are all smooth surfaces, thereby reducing the frictional resistance when the round block 7, the locking block 8 and the ring sleeve 9 move up and down and rotate along the curved surface of the support ring 6, avoiding the support ring 6, the round block 7, the locking block 8 and the ring sleeve 9 from generating heat due to friction and causing a sharp change in shape, improving the service life of the support ring 6, the round block 7, the locking block 8 and the ring sleeve 9, and at the same time reducing the load on the second drive component 1502.

[0025] like Figure 1 and Figure 4As shown, the control mechanism 3 includes a guide shell 307, which is fixedly installed on one side of the upper surface of the base 1. A first driving member 301 is fixedly installed on the rear side of the base 1 near the guide shell 307. A threaded rod 302 is fixedly installed at the front end of the output shaft of the first driving member 301. A threaded slider 303 that is slidably sleeved with the guide shell 307 is connected to the threaded curved surface of the threaded rod 302. A support shaft 304 that is fixedly connected to the threaded slider 303 is slidably sleeved in the middle of the guide shell 307. A telescopic rod 305 is fixedly installed at the top end of the support shaft 304. A tube shaft 306 is fixedly installed at the bottom end of the telescopic rod 305. A tube shaft 306 that is slidably sleeved with the guide shell 307 is fixedly installed at the bottom of the support shaft 304 near the annular shell 5. The mounting block 308 is connected to the guide block 308. Clamping posts 309 are fixedly mounted on both sides of the bottom surface of the mounting block 308. The clamping posts 309 are cylindrical, ensuring line contact between the clamping posts 309 and the connecting rod 1701. This prevents the clamping posts 309 from jamming when moving to the corner of the connecting rod 1701. The clamping posts 309 contact the upper part of the side of the connecting rod 1701, while the stop rod 1702 is fixedly mounted on the lower part of the side of the connecting rod 1701. This prevents the clamping posts 309 from colliding with the stop rod 1702 as they move along the connecting rod 1701, thus preventing them from being unable to move along the connecting rod 1701. In use, the first driving member 301 drives the threaded slider 303 to move to the center of the guide shell 307 via the threaded rod 302. After the support shaft 304 and telescopic rod 305 drive the tube shaft 306 to move directly above the annular shell 5, the tube shaft 306 is activated. The tube shaft 306 first moves downwards to clamp the suction tube 14, then drives the suction tube 14 upwards to disengage from the fixing sleeve 13. Next, the first drive unit 301 is activated, rotating clockwise. The output shaft of the first drive unit 301 drives the threaded rod 302 to rotate clockwise. The threaded rod 302 drives the threaded slider 303 to move forward. The threaded slider 303 drives the support shaft 304 to move forward. The support shaft 304 drives the telescopic rod 305 to move forward. The telescopic rod 305 drives the tube shaft 306 to move forward. The tube shaft 306 moves the suction tube 14 above the solvent tank 201, towards the solvent tank 201. After the solvent is drawn into the internal part, the first driving component 301 reverses. The first driving component 301 drives the pipette 14 to move to the upper part of the solution tank 202 through the threaded rod 302, threaded slider 303, support shaft 304, telescopic rod 305 and tube shaft 306, squeezing the solvent into the solution tank 202 and mixing the solvent with the solution. Then the first driving component 301 rotates forward. The first driving component 301 drives the pipette 14 forward to the upper part of the ring shell 5 through the threaded rod 302, threaded slider 303, support shaft 304, telescopic rod 305 and tube shaft 306. The tube shaft 306 places the used pipette 14 in the middle of the fixed sleeve 13, and at the same time extracts a new pipette 14 that has been cleaned and dried from another fixed sleeve 13.

[0026] like Figures 6 to 7and Figure 9 As shown, the lifting and rotating mechanism 15 includes a drive base 1501, which is fixedly installed on the front side of the middle of the upper surface of the base 1. A second drive member 1502 is fixedly installed on the top surface of the inner cavity of the drive base 1501. A drive gear 1503 is fixedly installed at the bottom end of the output shaft of the second drive member 1502. A telescopic sleeve 1506 is fixedly installed in the middle of the circular block 7. A telescopic rod 1505 that is movably sleeved with the base 1 is slidably connected to the middle of the telescopic sleeve 1506. A driven gear 1504 that meshes with the drive gear 1503 is fixedly installed at the bottom of the telescopic rod 1505. The telescopic rod 1505 has multiple sets of vertical guide bars equidistantly arranged on its side circumference, and the telescopic sleeve 1506 has multiple sets of guide bars equidistantly arranged on its inner side circumference. The guide bar is slidably sleeved in the guide groove, so that the telescopic rod 1505 can drive the telescopic sleeve 1506 to rotate. At the same time, the telescopic sleeve 1506 can also move up and down along the side of the telescopic rod 1505. When in use, the second drive unit 1502 is activated. The output shaft of the second drive unit 1502 drives the drive gear 1503 to rotate. The drive gear 1503 drives the driven gear 1504 to rotate. The driven gear 1504 drives the telescopic rod 1505 to rotate. The telescopic rod 1505 drives the telescopic sleeve 1506 to rotate. The telescopic sleeve 1506 drives the round block 7 to rotate. In addition, when the telescopic sleeve 1506 moves upward along the telescopic rod 1505, the telescopic sleeve 1506 drives the round block 7 to move upward along the support ring 6.

[0027] like Figures 6 to 7 and Figure 9As shown, the valve mechanism 16 includes a limiting sleeve 1601, which is fixedly installed at the bottom of the curved surface of the telescopic sleeve 1506. A mounting sleeve 1602, which is slidably fitted onto the side of the limiting sleeve 1601 and is slidably fitted onto the telescopic sleeve 1506. Multiple sets of movable cranks 1603 are equidistantly arranged on the circumference of the side of the mounting sleeve 1602. A push rod 1604 is slidably fitted onto the end of the crank 1603 away from the mounting sleeve 1602. Multiple sets of guide valve blocks 1606 are equidistantly arranged on the circumference of the upper surface of the annular shell 5. A valve 1605, fixedly connected to the push rod 1604, is slidably fitted onto the middle of two adjacent guide valve blocks 1606. When the telescopic sleeve 1506 drives the limiting sleeve 1601 to move up and down and rotate by setting the limiting sleeve 1601, the limiting sleeve 1601 can only drive the mounting sleeve 1602 to move up and down, and cannot cause the mounting sleeve 1602 to rotate. When in use, when the telescopic sleeve 1506 on the lifting mechanism 15 moves the limiting sleeve 1601 upward, the limiting sleeve 1601 moves the mounting sleeve 1602 upward, the mounting sleeve 1602 moves the crank 1603 upward, the crank 1603 pushes the push rod 1604 outward, the push rod 1604 moves the valve 1605 outward along the guide valve block 1606, thereby opening the opening between two adjacent guide valve blocks 1606, allowing the suction tube 14 to move above the annular shell 5. Similarly, when the telescopic sleeve 1506 moves the limiting sleeve 1601 downward, the limiting sleeve 1601 moves the valve 1605 inward along the guide valve block 1606 through the mounting sleeve 1602, the crank 1603 and the push rod 1604, closing the opening above the annular shell 5, allowing the cleaning fluid or drying gas to flow along the inner cavity of the annular shell 5.

[0028] like Figure 1 and Figure 4As shown, the reversing valve mechanism 17 includes a connecting rod 1701, which is slidably disposed in the middle of two clamping columns 309. A stopper rod 1702 is fixedly installed on both the front and rear sides of the connecting rod 1701 near the annular housing 5. The length of the front stopper rod 1702 is greater than the length of the rear stopper rod 1702. A piston 1703 is fixedly installed on the end of each stopper rod 1702 away from the connecting rod 1701. Valve housings 1704 are symmetrically fixedly installed on both the front and rear sides of the middle of the upper surface of the base 1. Two pistons 1703 are slidably sleeved in the middle of adjacent valve housings 1704. The stopper rod 1702 is slidably sleeved with adjacent valve housings 1704. A conduit 1705, fixedly connected to the annular housing 5, is fixedly installed on the side of each valve housing 1704 near the annular housing 5. A first feed pipe 1706 is fixedly installed on the side of the two valve housings 1704 away from the annular housing 5 and near the connecting rod 1701. A second feed pipe 1707 is fixedly installed on the side of the two valve housings 1704 away from the annular housing 5. The first feed pipe 1706 is connected to a device outside the device that provides cleaning fluid, and the second feed pipe 1707 is connected to a device outside the device that provides drying gas. Both the cleaning fluid and the drying gas are chemical substances that do not react with the solvent solution. The contact surface between the piston 1703 and the valve housing 1704 is a smooth plane to prevent the cleaning fluid or drying gas from flowing out from the contact surface between the piston 1703 and the valve housing 1704. The length of the piston 1703 is one-third the length of the valve housing 1704, thus realizing the connection of the conduit 1. 705. The first feed pipe 1706 and the second feed pipe 1707 alternately open and close, thereby allowing the cleaning liquid or drying gas to alternately flow into the inner cavity of the annular shell 5 to clean the suction tube 14. During use, the flow velocity of the cleaning liquid and drying gas must be greater than the linear velocity of the suction tube 14 during rotation to ensure proper cleaning and drying of the suction tube 14. When the threaded slider 303 is at the foremost position of the guide shell 307, the cleaning liquid inside the first feed pipe 1706 flows sequentially through the front valve shell 1704, the front conduit 1705, the inner cavity of the annular shell 5, the rear conduit 1705, and the rear valve shell 1704 before exiting from the rear first feed pipe 1706, thus achieving cleaning of the inner cavity of the annular shell 5. The suction tube 14 is cleaned. When the threaded slider 303 moves the clamping column 309 to the middle of the guide shell 307 via the support shaft 304 and mounting block 308, the clamping column 309 moves the connecting rod 1701 towards the guide shell 307. The connecting rod 1701 moves the piston 1703 to the middle of the valve shell 1704 via the plug rod 1702. At this time, the cleaning fluid and drying gas stop flowing. After the tube shaft 306 places the used suction tube 14 and clamps the new suction tube 14, the threaded slider 303 moves backward. When the threaded slider 303 moves the clamping column 309 backward via the support shaft 304 and mounting block 308, the clamping column 309 moves the connecting rod 1701 away from the guide shell 307.The drying gas inside the second feed pipe 1707 passes sequentially through the front valve shell 1704, the front conduit 1705, the inner cavity of the annular shell 5, the rear conduit 1705, and the rear valve shell 1704 before exiting through the second feed pipe 1707, thereby achieving drying of the inner cavity of the annular shell 5 and the suction pipe 14.

[0029] Working principle and usage process:

[0030] In use, the first driving component 301 first drives the threaded slider 303 to move to the middle of the guide shell 307 via the threaded rod 302. The threaded slider 303 then drives the tube shaft 306 to move directly above the annular shell 5 via the support shaft 304 and the first telescopic rod 305. The lifting mechanism 15 is then activated. The telescopic sleeve 1506 on the lifting mechanism 15 moves upward along the second telescopic rod 1505. The telescopic sleeve 1506 drives the limiting sleeve 1601 to move upward. The limiting sleeve 1601 drives the mounting sleeve 1602 to move upward. The mounting sleeve 1602 drives the crank 1603 to move upward. The crank 1603 pushes the push rod 1604 to move outward. The push rod 1604 drives the valve 1605 to move outward along the guide valve block 1606, opening the opening between two adjacent guide valve blocks 1606, thus preparing for the suction tube 14 to move above the inner cavity of the annular shell 5.

[0031] Next, the telescopic sleeve 1506 moves upward, causing the round block 7 to move upward along the inner side of the support ring 6. The round block 7 causes the locking block 8 to move upward, the locking block 8 causes the ring sleeve 9 to move upward, and the ring sleeve 9 causes the gear shaft 10 to move upward along the rack 11. At this time, the gear shaft 10 rotates clockwise under the action of the rack 11. The gear shaft 10 causes the fixed sleeve 13 to move upward and rotate clockwise. The fixed sleeve 13 causes the straw 14 to move upward and rotate clockwise, so that the straw 14 passes through the middle opening between two adjacent guide valve blocks 1606 and makes the central axis of the straw 14 perpendicular to the upper surface of the base 1, thus preparing for the adjustment mechanism 3 to replace the straw 14.

[0032] Then, after the tube shaft 306 extends and retracts downward to replace the suction tube 14, the telescopic sleeve 1506 on the lifting mechanism 15 moves downward along the telescopic rod 1505, so that the suction tube 14, which was not clamped by the tube shaft 306, returns to the inner cavity of the annular shell 5. At the same time, the telescopic sleeve 1506 drives the valve 1605 on the valve mechanism 16 to move inward along the guide valve block 1606, so that the opening between two adjacent guide valve blocks 1606 is closed, thereby closing the inner cavity of the annular shell 5, thus preparing for the subsequent flow of cleaning fluid and drying gas.

[0033] Restart the second drive unit 1502. The second drive unit 1502 drives the drive gear 1503 to rotate clockwise. The drive gear 1503 drives the driven gear 1504 to rotate clockwise. The driven gear 1504 drives the telescopic rod 1505 to rotate clockwise. The telescopic rod 1505 drives the telescopic sleeve 1506 to rotate clockwise. The telescopic sleeve 1506 drives the round block 7 to rotate clockwise. The round block 7 drives the locking block 8 to rotate clockwise. The locking block 8 drives the ring sleeve 9 to rotate clockwise. The ring sleeve 9 drives the gear shaft 10 to rotate clockwise. The gear shaft 10 drives the fixed sleeve 13 to rotate clockwise. The fixed sleeve 13 drives the suction tube 14 to rotate clockwise around the inner cavity of the ring shell 5.

[0034] Then, the first drive unit 301 is activated, and the first drive unit 301 rotates clockwise. The output shaft of the first drive unit 301 drives the threaded rod 302 to rotate clockwise. The threaded rod 302 drives the threaded slider 303 to move forward. The threaded slider 303 drives the support shaft 304 to move forward. The support shaft 304 drives the telescopic rod 305 to move forward. The telescopic rod 305 drives the tube shaft 306 to move forward. The tube shaft 306 drives the suction tube 14 to move above the front solvent tank 201, towards the solvent tank 201. After the internal solvent is absorbed, the threaded slider 303 drives the support shaft 304 to move forward. Simultaneously, the support shaft 304 drives the mounting block 308 to move forward, and the mounting block 308 drives the clamping column 309 to move forward. The clamping column 309 pushes the connecting rod 1701 to move away from the guide housing 307. The connecting rod 1701 pushes the plug rod 1702 to move away from the guide housing 307, and the plug rod 1702 pushes the piston 1703 located in the middle of the valve housing 1704 to move away from the guide housing 307. Moving in direction 7, the valve of conduit 1705 opens, and the cleaning fluid inside the first feed pipe 1706 enters the inner cavity of the annular shell 5 through the front valve housing 1704 and the front conduit 1705. The cleaning fluid flowing into the inner cavity of the annular shell 5 rotates clockwise on one side of the inner cavity and counterclockwise on the other side. Then, it flows out from the rear first feed pipe 1706 through the rear conduit 1705 and the rear valve housing 1704. The cleaning fluid flowing counterclockwise on the other side of the inner cavity of the annular shell... The larger end of the straw, rotated clockwise, flows out from the tip opening along the inner wall of the straw. The cleaning fluid inside the ring shell rotates in the opposite direction to the straw, increasing the relative flow speed of the cleaning fluid along the inner wall of the straw. This increases the collision force between the adhering substances on the inner wall of the straw and the cleaning fluid, thereby improving the cleaning effect on the inner wall of the straw. This solves the problem of poor cleaning effect and easy residue on the inner wall of traditional straws due to the difficulty of the cleaning fluid flowing inside. As a result, chemical solutions are kept at a high level of cleanliness.

[0035] The first driving component 301 reverses direction, driving the suction tube 14 to move to the upper part of the rear solution tank 202 via the threaded rod 302, threaded slider 303, support shaft 304, telescopic rod 305, and tube shaft 306. This forces the solvent into the solution tank 202, mixing the solvent with the solution to achieve chemical solution preparation. Simultaneously, the reverse-rotating first driving component 301 pulls the connecting rod 1701 towards the [missing information - likely a direction or direction]. As the guide housing 307 moves, the connecting rod 1701 pushes the piston rod 1702 towards the guide housing 307. The piston rod 1702 pulls the piston 1703 towards the guide housing 307. When the support shaft 304 moves rearward beyond the center of the guide housing 307, the first feed pipe 1706 closes, and the cleaning fluid stops flowing. The second feed pipe 1707 opens, and the drying gas inside the second feed pipe 1707 passes sequentially through the front valve housing 1704, the front conduit 1705, and the annular housing 5. The fluid flows out through the rear second feed pipe 1707 after passing through the cavity, rear conduit 1705, and rear valve housing 1704, thereby drying the pipette 14 after it has been cleaned inside the annular shell 5, thus improving the drying efficiency of the pipette 14. After the solvent and solution are mixed, the first drive member 301 rotates forward again. The first drive member 301 drives the pipette 14 to move above the annular shell 5 through the threaded rod 302, threaded slider 303, support shaft 304, telescopic rod 305, and tube shaft 306. The tube shaft 306 then removes the used pipette 14. The straw 14 is placed in the middle of the fixing sleeve 13, and a new straw 14 that has been cleaned and dried is taken out from another fixing sleeve 13. This allows for continuous and alternating cleaning and drying of the straw 14 while mixing, which improves the cleaning and drying efficiency. It avoids the need to prepare a large number of straws 14 and the problem of chemical solvents losing water and sticking to the surface of the straw 14 due to excessive standing time. This would increase the difficulty of cleaning, cause impurities to remain on the surface of the straw 14, and ultimately lead to the residual impurities contaminating the original solvent solution and reducing the cleanliness.

[0036] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0037] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A device for preparing high-purity chemical solutions for semiconductors, comprising a base (1), wherein a solvent tank (201) is fixedly mounted on the front side of the upper surface of the base (1), and a solution tank (202) is fixedly mounted on the rear side of the upper surface of the base (1), characterized in that: A regulating mechanism (3) is provided on one side of the upper surface of the base (1). Multiple sets of support plates (4) are provided equidistantly on the other side of the middle of the upper surface of the base (1). A ring shell (5) is fixedly installed at the top of the multiple sets of support plates (4). A support ring (6) is fixedly installed in the middle of the ring shell (5). A round block (7) is slidably sleeved in the middle of the support ring (6). Multiple sets of locking blocks (8) that are slidably sleeved with the support ring (6) are fixedly installed equidistantly on the upper surface of the round block (7). A ring sleeve (9) that is slidably sleeved with the outer curved surface of the support ring (6) is fixedly installed at the bottom of the outer side of the locking block (8). Multiple sets of mounting holes (901) are equidistantly opened on the outer side of the ring sleeve (9). Multiple sets of mounting grooves (902) are equidistantly opened on the upper surface of the ring sleeve (9). A gear shaft (10) is movably sleeved in the middle of each of the mounting holes (901). A rack (11) is slidably sleeved in the middle of each of the mounting grooves (902). A limiting ring (12) that is slidably sleeved with the ring shell (5) is fixedly installed at the bottom end of the rack (11). A fixing sleeve (13) is fixedly installed at the end of each of the gear shafts (10) away from the support ring (6). A suction tube (14) is provided in the middle of each of the fixing sleeves (13). A lifting and rotating mechanism (15) is provided between the middle of the round block (7) and the upper surface of the base (1). A valve mechanism (16) is provided between the lifting and rotating mechanism (15) and the upper surface of the ring shell (5). A reversing valve mechanism (17) connected to the regulating mechanism (3) and the ring shell (5) is provided on the front and rear sides of the upper surface of the base (1). The control mechanism (3) includes a guide shell (307), which is fixedly installed on one side of the upper surface of the base (1). A first driving member (301) is fixedly installed on the rear side of the base (1) near the guide shell (307). A threaded rod (302) is fixedly installed at the front end of the output shaft of the first driving member (301). The threaded surface of the threaded rod (302) is connected to a threaded slider (303) that is slidably sleeved with the guide shell (307). The middle part of the support shaft (304) is slidably sleeved with a support shaft (304) fixedly connected to the threaded slider (303). The top end of the support shaft (304) is fixedly installed with a telescopic rod (305). The bottom end of the telescopic rod (305) is fixedly installed with a tube shaft (306). The bottom of the support shaft (304) near the ring shell (5) is fixedly installed with a mounting block (308) slidably sleeved with the guide shell (307). The bottom surfaces of the mounting block (308) are fixedly installed with clamping columns (309) on both sides. The lifting mechanism (15) includes a drive seat (1501), which is fixedly installed on the front side of the middle part of the upper surface of the base (1). A second drive member (1502) is fixedly installed on the top surface of the inner cavity of the drive seat (1501). A drive gear (1503) is fixedly installed at the bottom end of the output shaft of the second drive member (1502). A telescopic sleeve (1506) is fixedly installed in the middle of the round block (7). A telescopic rod two (1505) that is movably sleeved with the base (1) is slidably sleeved in the middle of the telescopic sleeve (1506). A passive gear (1504) that meshes with the drive gear (1503) is fixedly installed at the bottom of the telescopic rod two (1505). The valve mechanism (16) includes a limiting sleeve (1601), which is fixedly installed at the bottom of the curved surface of the telescopic sleeve (1506). The side of the limiting sleeve (1601) is slidably sleeved with an installation sleeve (1602) that is slidably sleeved with the telescopic sleeve (1506). The side of the installation sleeve (1602) is provided with multiple sets of movable cranks (1603) equidistantly arranged around its circumference. The end of the crank (1603) away from the installation sleeve (1602) is slidably sleeved with a push rod (1604). The upper surface of the ring shell (5) is provided with multiple sets of guide valve blocks (1606) equidistantly arranged around its circumference. The middle of two adjacent guide valve blocks (1606) is slidably sleeved with a valve (1605) that is fixedly connected to the push rod (1604).

2. The preparation device for high-purity chemical solutions for semiconductors according to claim 1, characterized in that: The reversing valve mechanism (17) includes a connecting rod (1701), which is slidably disposed in the middle of two clamping columns (309). A stopper rod (1702) is fixedly installed on both the front and rear sides of the connecting rod (1701) near the annular shell (5). The length of the stopper rod (1702) on the front side is greater than the length of the stopper rod (1702) on the rear side. A piston (1703) is fixedly installed on the end of each stopper rod (1702) away from the connecting rod (1701). A valve shell (1704) is symmetrically fixedly installed on both the front and rear sides of the middle of the upper surface of the base (1). The two pistons (1703) are slidably sleeved in the middle of the adjacent valve housing (1704), the piston rod (1702) is slidably sleeved with the adjacent valve housing (1704), and the two valve housings (1704) are fixedly installed with a conduit (1705) fixedly connected to the ring housing (5) on the side of the two valve housings (1704) away from the ring housing (5) on the side of the connecting rod (1701) fixedly installed, and the two valve housings (1704) are fixedly installed with a second feed pipe (1707) on the side of the two valve housings (1704) away from the ring housing (5).

Citation Information

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