A structural colored fabric and its preparation method

Abstract

This invention discloses a structurally colored fabric and its preparation method. The structurally colored fabric includes a substrate, and a smoothing layer, a reflective layer, and a color and saturation enhancement layer are sequentially formed on the substrate. The smoothing layer is obtained by smoothing the surface of the substrate. The reflective layer includes one or more of a single metal layer and an alloy layer. The color and saturation enhancement layer includes a non-absorbing material layer, an absorbing material layer, and a non-absorbing material layer sequentially arranged from the inside out. The advantage of this application is that the base fabric is smoothed in advance to ensure the subsequent coloring effect. This application uses a color and saturation enhancement film layer, selects materials with small changes in optical constants in the visible light band, and uses a combination of absorbing and non-absorbing materials to achieve high reflection of the target light wave and high absorption of other light waves, thereby presenting a structural color with a wide color gamut and high saturation.

Description

Technical Field

[0001] This disclosure relates to the field of fabric coloring technology, and in particular to a structurally colored fabric and its preparation method. Background Technology

[0002] Currently, there are various methods for preparing structural colors of fabrics. For example, Chinese patent (CN110629569A) discloses a method for coloring fabrics and a colored fabric. The coloring method for this fabric includes the following steps: subjecting a base fabric to radiation drying treatment; and forming an adhesive layer and at least one color-forming layer sequentially on the surface of the radiation-dried base fabric by vacuum deposition. The adhesive layer contains at least one of Ti, Cr, Si, and Ni elements, and its thickness is 1-2000 nm. The color-forming layer contains at least one of Al, Ti, Cu, Fe, Mo, Zn, Ag, Au, and Mg elements, and the total thickness of the color-forming layer is 1-4000 nm.

[0003] Chinese patent (CN105603715A) discloses a method for preparing structural colors of fabrics. Using magnetron sputtering radio frequency method, TiO2, SiO2, etc., are used as targets to sputter a base fabric. TiO2, SiO2 (or other materials) targets are alternately sputtered onto the fabric surface, forming a nano-periodic thin film. Due to optical principles such as light interference, the fabric exhibits vibrant structural colors under light. The sputtered materials, the number of layers, and the thickness of each layer determine the color of the fabric surface. Moreover, the color of the fabric changes with the viewing angle, and as long as the thin film structure is not damaged, the fabric will never fade.

[0004] Chinese patent (CN105862000A) discloses a method for preparing a nanofilm on a fabric surface to achieve structural color using magnetron sputtering technology. The method includes: pretreatment of the fabric; depositing a nanometal film on the fabric surface using magnetron sputtering technology; and depositing a nanometal oxide film again on the fabric surface with the nanometal film.

[0005] Chinese patent application (CN114318861A) discloses a method for preparing structurally colored fabrics based on magnetron sputtering. This method includes pretreating the fabric, depositing a nano-metal thin film on the fabric surface, and then depositing a nano-titanium dioxide thin film onto the fabric. Additionally, Chinese patent application (CN102691202A) discloses a method for achieving structural color by preparing a one-dimensional photonic crystal thin film on the fabric surface, including: preparing titanium sol and silica sol; and alternating the formation of titanium dioxide and silica thin film layers on the fabric surface. This method can form structural color on the fabric surface, and results show that the fabric treated by this method exhibits surface color changes from different angles, producing a structural color effect.

[0006] Chinese patent application (CN109023280B) discloses a method for preparing gradient color films using a magnetron sputtering machine, comprising the following steps: S1, optical film system design; S2, shielding plate design, wherein the shape of the shielding plate is designed based on the thickness variation of the optical thin film structure simulated by software; S3, vacuum coating; S4, color and optical performance inspection, wherein the color LAB value, visible light reflectance curve, and visible light transmittance curve of the vacuum-coated product are tested. If the test results are qualified, mass production preparation can be carried out; if the test results are unqualified, the process returns to step S1.

[0007] However, the shortcomings of the above-mentioned existing technologies are as follows: 1. Due to the rough surface of the fabric itself, the color designed by optical theory always deviates from the color actually produced on the fabric; 2. Due to the rough surface of the fabric itself, light will be scattered in all directions, resulting in insufficient purity / saturation of the structural color and a narrow color gamut coverage. Summary of the Invention

[0008] This disclosure provides a structural colored fabric and a method for preparing the same, in order to at least solve one of the technical problems existing in the prior art.

[0009] In a first aspect, this application discloses a structural color fabric, the structural color fabric comprising a substrate, a smoothing layer, a reflective layer, and a color and saturation enhancement layer formed sequentially on the substrate;

[0010] A structural color fabric, the structural color fabric comprising a substrate, and a smoothing layer, a reflective layer, and a color and saturation enhancement layer formed sequentially on the substrate;

[0011] The smoothing layer is obtained by smoothing the surface of the substrate.

[0012] The reflective layer includes one or more of a single metal layer and an alloy layer;

[0013] The color and saturation enhancement layer comprises, from the inside out, a non-absorbing material layer, an absorbing material layer, and a non-absorbing material layer.

[0014] In one embodiment, the smoothing layer is obtained by calendering or coating the substrate surface; the surface roughness of the smoothing layer is 10 nm to 10 μm.

[0015] In one embodiment, the surface roughness of the smoothing layer is ≥10nm and less than 1μm; the material used for coating is polyurethane, polyaniline, polypropylene or a multi-block copolymer organic solution.

[0016] In one embodiment, the reflective layer comprises a single layer of metals Ti, Ag, Cu, Ni, Cr, Al, or an alloy layer of any combination thereof.

[0017] The absorbent material layer includes one or more of the following: elemental layers or alloy layers of metals Ti, Ag, Cu, Ni, Cr, and Al; and compound layers of TiN, Si3N4, and TiC.

[0018] The non-absorbing material layer includes one or more of the following compounds: Ta2O5, TiO2, ZnO, and Al2O3.

[0019] In one embodiment, the reflective layer is a metallic elemental layer with a reflectivity greater than 80%; the absorbent material layer is a TiN compound layer.

[0020] In one embodiment, the total thickness of the reflective layer is 80nm to 350nm, and the total thickness of the color and saturation enhancement layer is 30nm to 300nm; the film system of the structural colored fabric is Ag / TiO2 / TiN / TiO2, with the following thicknesses from left to right: Ag thickness is 100-300nm, TiO2 thickness is 20-100nm, TiN thickness is 20-90nm, and TiO2 thickness is 10-50nm.

[0021] In one embodiment, the substrate is a base fabric, which is selected from nylon, silk, chemical fiber or cotton fabric with a roughness of 100nm to 100μm.

[0022] It also includes a surface protective layer formed on the surface of the color and saturation enhancement layer, the thickness of which is 300nm to 30μm; the material of which is one or more of polyurethane, perfluoroethylene propylene, PET, and polypropylene resin.

[0023] Secondly, this application provides a method for preparing a structural colored fabric as described above, including step 1): smoothing the surface of a substrate to obtain a smoothing layer, such that the surface roughness of the smoothing layer is 10 nm to 10 μm;

[0024] Step 2): A reflective layer is formed on the surface of the smooth layer by physical vapor deposition;

[0025] Step 3): Form a color and saturation enhancement layer on the surface of the reflective layer using physical vapor deposition, chemical vapor deposition, or liquid phase processes.

[0026] In one embodiment, before step 1), the substrate is further subjected to degassing and surface pretreatment in sequence; in step 1), the smooth layer is obtained by calendering or coating the substrate surface, wherein the calendering conditions are 1 to 5 tons of pressure and 80 to 100°C; the coating is a slit coating of a solution of polyurethane, polyaniline, polypropylene or multi-block copolymer organic material, and the coating machine speed is 2-6 m / min.

[0027] The innovative points of this application are: 1. The surface of the base fabric is smoothed to reduce the surface roughness of the fabric and reduce the impact of roughness on the color characteristics of the subsequent grown structural color film layer, so as to restore the design effect as much as possible; 2. A color and saturation enhancement film layer is introduced into the traditional color system to improve the color effect (increase color saturation and expand the color gamut range).

[0028] Compared with existing technologies, the advantages of this application's technical solution are as follows: 1. This application pre-processes the base fabric with a smoothing treatment to ensure the subsequent coloring effect. 2. The structural color fabric of this application first undergoes a smoothing treatment of the substrate surface to reduce the surface roughness, making the color of the prepared structural color fabric more consistent with the optical theoretical design. 3. The structural color fabric of this application uses a color and saturation enhancement film layer. The so-called enhancement film layer is a material with relatively small changes in optical constants (refractive index and extinction coefficient) in the visible light band, and uses a combination of absorbing and non-absorbing materials to achieve high reflection of the target light wave and high absorption of other light waves, thereby presenting a structural color with a wide color gamut and high saturation.

[0029] It should be understood that the description in this section is not intended to identify key or essential features of the embodiments of this disclosure, nor is it intended to limit the scope of this disclosure. Other features of this disclosure will become readily apparent from the following description. Attached Figure Description

[0030] The above and other objects, features, and advantages of this disclosure will become readily apparent from the following detailed description of exemplary embodiments, taken in conjunction with the accompanying drawings. Several embodiments of this disclosure are illustrated in the drawings by way of example and not limitation, in which:

[0031] In the accompanying drawings, the same or corresponding reference numerals indicate the same or corresponding parts.

[0032] Figure 1 A flowchart illustrating the preparation process of structurally colored fabrics according to embodiments of this disclosure is shown;

[0033] Figure 2 A schematic diagram of the cross-sectional layered structure of the fabric in an embodiment of this disclosure is shown;

[0034] Figure 3 The graph shows the relationship between wavelength and reflectance of the traditional structured color film system Ag / Si (from the graph, it can be seen that the traditional structured color film system Ag / Si has broadband reflectance characteristics near 538nm);

[0035] Figure 4The diagram showing the relationship between wavelength and reflectivity of the Ag / TiO2 / TiN / TiO2 film system in Embodiment 1 of this disclosure is shown (from the diagram, it can be seen that the Ag / TiO2 / TiN / TiO2 film system in Embodiment 1 has narrow-spectrum reflectivity around 538nm).

[0036] Figure 5 A schematic diagram showing the positions of the color coordinates of the film system (dots) of Embodiment 1 of this disclosure and the conventional film system (triangles) in the chromaticity diagram is provided.

[0037] Figure 6 The diagram showing the relationship between wavelength and reflectance of the film system Al / TiO2 / TiN / Al2O3 in Embodiment 2 of this disclosure is shown (it can be seen from the figure that the film system Al / TiO2 / TiN / Al2O3 in Embodiment 2 has narrow-spectrum reflectance characteristics around 447nm).

[0038] Figure 7 A schematic diagram showing the position of the film system in the chromaticity diagram of Embodiment 2 of this disclosure is shown;

[0039] Figure 8 The diagram showing the relationship between wavelength and reflectance of the Cr-Ni / Ta2O5 / Ti / TiO2 film system in Embodiment 3 of this disclosure is shown (from the figure, it can be seen that the Cr-Ni / Ta2O5 / Ti / TiO2 film system in Embodiment 3 has narrow-spectrum reflectance characteristics around 780nm).

[0040] Figure 9 This diagram shows the position of the film system in the chromaticity diagram of Embodiment 3 of this disclosure;

[0041] Figure 10 The diagram showing the relationship between wavelength and reflectance of the Ag / TiO2 / TiN / TiO2 film system in Embodiment 4 of this disclosure is shown (from the diagram, it can be seen that the Ag / TiO2 / TiN / TiO2 film system in Embodiment 4 has narrow-spectrum reflectance characteristics around 390nm).

[0042] Figure 11 A schematic diagram showing the position of the film system in the chromaticity diagram of Embodiment 4 of this disclosure is shown;

[0043] Figure 12 The diagram showing the relationship between wavelength and reflectivity of the Ag / TiO2 / TiN / TiO2 film system in Embodiment 5 of this disclosure is illustrated.

[0044] Figure 13 A schematic diagram showing the position of the film system of Embodiment 5 of this disclosure in a chromaticity diagram is shown.

[0045] The labels in the diagram are: 10-substrate, 21-smoothing layer, 22-reflective layer, 23-color and saturation enhancement layer, 30-surface protective layer. Detailed Implementation

[0046] To make the objectives, features, and advantages of this disclosure more apparent and understandable, the technical solutions in the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this disclosure, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this disclosure without creative effort are within the scope of protection of this disclosure.

[0047] Structural colors: Unlike pigment colors, structural colors do not require dyes. Instead, they exhibit different colors through the scattering and interference of light by the structure. For example, the colors on the surface of butterfly wings and peacock feathers are structural colors.

[0048] This application reduces the surface roughness of the base fabric by treating its surface, thereby making the color of the prepared fabric more consistent with the optical theoretical design. Based on the surface treatment of the base fabric, the color purity / saturation is improved and the color gamut coverage is expanded by introducing specific materials and film structures.

[0049] like Figure 2 As shown, a structural colored fabric includes a substrate 10, and a smoothing layer 21, a reflective layer 22, and a color and saturation enhancement layer 23 formed sequentially on the substrate 10.

[0050] The base 10 is a fabric base (or base fabric), which can be made of nylon, silk, chemical fiber or cotton, with a preference for fabrics that are relatively smooth and have low roughness (100nm~100μm).

[0051] The smoothing layer 21 is formed by smoothing the surface of the substrate 10 (by calendering, organic coating, or inorganic coating) to further reduce the roughness to 10 nm to 10 μm. Preferably, the surface roughness of the smoothing layer is ≥10 nm and less than 1 μm.

[0052] The total thickness of the reflective layer 22 is 50 nm to 350 nm (preferably, 50-300 nm). The reflective layer 22 can be a single-element layer of metals such as Ti, Ag, Cu, Ni, Cr, and Al, or an alloy layer of any combination of Ti, Ag, Cu, Ni, Cr, and Al. Preferably, the reflective layer 22 is a single-element metal layer with a reflectivity greater than 80%, such as an Ag single-element layer, a Cu single-element layer, or an Al single-element layer.

[0053] For example, the reflective layer 22 can be a Ti single layer, an Ag single layer, a Cu single layer, a Ti-Ag alloy layer, or a Ti-Ag-Cu alloy layer. These metals can be combined arbitrarily to form an alloy layer.

[0054] The total thickness of the color and saturation enhancement layer 23 is 30nm to 300nm. The materials used in the color and saturation enhancement layer 23 include absorbing materials and non-absorbing materials; the extinction coefficient of the absorbing materials is not zero, and includes elemental or alloy of any combination of metals Ti, Ag, Cu, Ni, Cr, and Al, as well as one or more of TiN, Si3N4, and TiC; the extinction coefficient of the non-absorbing materials is close to zero, and includes one or more of Ta2O5, TiO2, ZnO, and Al2O3.

[0055] Therefore, the color and saturation enhancement layer 23 is a composite layer combining an absorbing material layer and a non-absorbing material layer. The color and saturation enhancement layer 23 includes a non-absorbing material layer, an absorbing material layer, and another non-absorbing material layer arranged sequentially outwards from the reflective layer (in this application, the layer containing the substrate is designated as the inner layer, and the layer containing the surface protective layer is designated as the outer layer). The absorbing material layer is a single metallic layer of Ti, Ag, Cu, Ni, Cr, or Al; an alloy layer of any combination of Ti, Ag, Cu, Ni, Cr, or Al; a compound layer of TiN, Si3N4, or TiC; or a multilayer structure composed of any combination of the above single-material layers, alloy layers, and compound layers. The non-absorbing material layer is a compound layer of Ta2O5, TiO2, ZnO, or Al2O3. Preferably, the thickness of the absorbent material layer is 20-160 nm, and the total thickness of the two non-absorbent material layers is 30-150 nm. The thickness of the inner non-absorbent material layer is preferably 20-100 nm, and the thickness of the outer non-absorbent material layer is 10-50 nm.

[0056] For example, the color and saturation enhancement layer 23 can be a TiO2 / Ti / TiO2 composite layer, a TiO2 / TiN / Ta2O5 composite layer, or a ZnO / Ti-TiN / TiO2 composite layer.

[0057] Preferably, the absorbing material layer is a TiN compound layer. The absorption rate of TiN material fluctuates little in the visible light band (400nm-1000nm) and the average absorption rate can reach 83%, which is more conducive to the formation of a narrower reflection peak in the fabric of this application.

[0058] The reflective layer 22 is composed of metals (such as one or more of Ti, Ag, Cu, Ni, Cr, and Al), and its preparation can be achieved by adjusting physical vapor deposition (such as magnetron sputtering, electron beam evaporation, thermal evaporation, arc ion plating, etc.).

[0059] Using the same process, a color and saturation enhancement layer 23 can be further prepared. This layer has the following characteristics: its optical constants (refractive index and extinction coefficient) change little in the visible light band; it combines absorbing materials (extinction coefficient not zero) and non-absorbing materials (extinction coefficient close to zero); based on satisfying the first two conditions, the material can be selected from one or more of the following: absorbing materials: metals Ti, Ag, Cu, Ni, Cr, Al; or one or more of TiN, Si3N4, TiC compound layers; and non-absorbing materials: one or more of TiO2, ZnO, Ta2O5, Al2O3. This layer aims to achieve high reflection of the target light wave and high absorption of other light waves, thereby presenting a structural color with a wide color gamut and high saturation. The key to achieving a structural color with a wide color gamut and high saturation lies in the control of the target reflection peak and other wavelength absorption peaks. In principle, this requires constructing a reflection peak at the target peak position of the target color, where all light waves except for the wavelength of the reflection peak are absorbed. Therefore, the color and saturation enhancement layer 23 of the present invention uses a material whose optical constant changes little in the visible light band, so that the desired reflection characteristics can be obtained through film system design without being affected by too much fluctuation of the optical constant of the material itself; the reason for using a combination of absorbing and non-absorbing materials is to construct the target reflection peak by changing the refractive index of the material, while using absorbing materials to absorb light waves of other wavelengths while achieving the reflection of the target wavelength.

[0060] Finally, a surface protective layer 30 is prepared on the surface of the color and saturation enhancement layer 23 using physical or chemical coating methods to enhance the adhesion of the structural color film layer, enabling it to withstand the impact of friction and washing. The thickness of the surface protective layer is 300 nm to 30 μm.

[0061] The following example illustrates the composition of the structural color fabric in this invention. First, consider the more conventional traditional structural color film system Ag / Si. This type of film system has a limited color gamut; specifically, it is difficult to obtain green. For ideal reflective structural colors, the typical reflection peaks of the RGB primary colors red, green, and blue usually appear around 688, 538, and 420 nm, respectively. However, the traditional structural color film system Ag / Si rarely constructs a significant reflection peak only around 538 nm; instead, a broad-band reflection peak appears. When the Ag thickness is fixed at 100 nm and the Si is amorphous with a thickness of 7 nm, its reflection spectrum can be obtained, such as... Figure 3 As shown. The appearance of a broad reflection peak indicates a mixture of multiple colors, with color coordinates x = 0.468, y = 0.435, close to yellow. The color coordinates gradually change with the thickness of the amorphous Si, but green is not observed.

[0062] The optimal film system used in this invention is Ag / TiO2 / TiN / TiO2. From left to right, the thicknesses are as follows: Ag thickness must be greater than its skin depth, i.e., greater than 20 nm, preferably 100-300 nm; TiO2 thickness is 20-100 nm; TiN thickness is 20-90 nm; and TiO2 thickness is 10-50 nm. Through numerical optimization, the final film system (Ag / TiO2 / TiN / TiO2 thicknesses from left to right: Ag thickness is 200 nm, TiO2 thickness is 60 nm, TiN thickness is 70 nm, and TiO2 thickness is 20 nm) can be determined, resulting in the following... Figure 4 The reflectance spectrum shown is as follows. The reflectance peak appears near 520 nm, close to the typical 538 nm, while the reflectance is low in the wavelength ranges below 450 nm and above 600 nm. Its color coordinates are x = 0.235, y = 0.459, which is exactly in the green region of the chromaticity diagram.

[0063] The positions of the two film systems in the chromaticity diagram are respectively: Figure 5 The markings are as follows. As can be seen from the color coordinate system, traditional film systems (represented by "triangle ▲") have a wider reflectance spectrum, resulting in a hue in the yellow range, close to the orange-yellow and yellow-green regions. In contrast, the film system of this application (represented by "dot ●") has a narrower reflectance spectrum, resulting in a hue in the green range, a range that is difficult for traditional metal / absorbing layer film systems to reach.

[0064] As mentioned above, the most preferred film system in this application is Ag / TiO2 / TiN / TiO2, with the following thicknesses from left to right: Ag is preferably 100-300 nm, TiO2 is 20-100 nm, TiN is 20-90 nm, and TiO2 is 10-50 nm. With this film system, other structural colors, such as red, blue, and purple, can be achieved by adjusting the thickness of each layer.

[0065] Based on this technical solution, the mechanical strength of the structural color film layer can be improved by adding an organic or inorganic coating to the surface of the structural color film layer, thereby improving the wear resistance, washability and other properties of the structural color fabric.

[0066] In addition, specific color patterns can be obtained by selectively depositing structural color film layers in specific regions or by removing certain colors, achieving the effects presented by traditional printing processes.

[0067] Secondly, this application provides a method for preparing structurally colored fabrics, such as... Figure 1As shown, step S1 feeds the fabric into the machine. After degassing and surface cleaning in step S2, step S3 involves calendering, organic coating, or inorganic coating to smooth the fabric and reduce its surface roughness. The reflective layer S4 mainly consists of a Bragg reflector made of metallic materials. On this basis, a color and saturation enhancement film layer S5 is prepared to achieve high reflection of the target light wave and high absorption of other light waves, thus presenting a wide color gamut and high saturation structural color. Based on the structural color film layer, step S6 prepares an organic / inorganic protective material to improve its mechanical strength and enhance the wear resistance and washability of the structural color fabric. This completes the processing of the structural color fabric in step S7 (i.e., the structural color fabric).

[0068] Specifically, the above preparation method can be summarized into the following steps:

[0069] Step 1): The substrate surface is treated by calendering, organic coating or inorganic coating to obtain a smooth layer, so that the surface roughness of the smooth layer is 10nm~10μm;

[0070] Step 2): A reflective layer is formed on the surface of the smooth layer by physical vapor deposition;

[0071] Step 3): Form a color and saturation enhancement layer on the surface of the reflective layer using physical vapor deposition, chemical vapor deposition, or liquid phase processes.

[0072] Preferably, the base fabric is degassed and pretreated on the surface before the base fabric is smoothed.

[0073] Preferably, the surface roughness of the smoothing layer is ≥10nm and less than 1μm. The calendering process conditions are as follows: two hard rolling points are formed by one metal roller and two soft rollers, and the base fabric is rolled under certain temperature and high pressure conditions; wherein, the high pressure conditions are 1 to 5 tons of pressure and the temperature is 80 to 100℃.

[0074] Both organic and inorganic coating processes can utilize existing technologies. For example, solutions of organic materials such as polyurethane, polyaniline, polypropylene, and multi-block copolymers can be applied by slot coating with a coating machine speed of 2-6 m / min (or preferably 2-6.5 m / min).

[0075] The reflective layer can be prepared by physical vapor deposition using existing processes; physical vapor deposition includes magnetron sputtering, electron beam evaporation, thermal evaporation, and arc ion plating; specifically, any of the following methods can be selected:

[0076] A: Arc ion plating: After the base fabric is smoothed to obtain a smooth layer, it undergoes low-pressure vacuum plasma surface treatment; the parameters for low-pressure vacuum plasma etching are: temperature 30~100℃, pressure 8×10 -4 ~1×10 -3 Pa, power supply 150-250W, time 15-18 minutes, working gas Ar;

[0077] B: Magnetron sputtering: A reflective layer is formed on the surface of the planar layer using magnetron sputtering. The parameters for magnetron sputtering are: vacuum degree of 1.8 × 10⁻⁶. -4 ~1.5×10 -3 The parameters are as follows: Pa, distance between the planarization layer and the target material is 100 mm, working gas is Ar with a purity of 98%–99.9%, gas flow rate is 6–8 sccm, substrate (i.e., base fabric) rotation speed is 9–12 r / min, magnetron sputtering power is 140–255 W, and magnetron sputtering time is 5–15 min. When the reflective layer is a single metallic layer, the selected target material is a corresponding metallic target; when the reflective layer is an alloy layer, the selected target material is a corresponding alloy target.

[0078] C: Electron beam evaporation: Its general preparation method is as follows:

[0079] (1) Fix the flattened base fabric in the vacuum chamber and select an evaporation material;

[0080] (2) Evacuate the vacuum chamber to achieve a vacuum level of 1 to 5 × 10⁻⁶. -3 Pa;

[0081] (3) Rotate the base fabric to the top of the evaporation boat, turn on the main power supply of the electron beam evaporation gun cabinet, and after preheating the filament, turn on the high voltage on the wire controller. Use the electron beam light to observe whether the focusing center of the electron beam is in the crucible. Then increase the beam current until the target material melts and stop increasing the beam current. Open the electron beam baffle and the film thickness gauge baffle to start the evaporation.

[0082] For example, the preparation method for Ag monolayers by electron beam evaporation is as follows:

[0083] (1) Fix the flattened base fabric in the vacuum chamber and select Ag evaporation material;

[0084] (2) Evacuate the vacuum chamber to achieve a vacuum level of 1 to 5 × 10⁻⁶. -3 Pa;

[0085] (3) Rotate the base fabric to the top of the evaporation boat, turn on the main power supply of the electron beam evaporation gun cabinet, and after preheating the filament, turn on the high voltage on the wire controller. Use the electron beam light to observe whether the focusing center of the electron beam is in the crucible. Then increase the beam current until the target material melts and stop increasing the beam current. Open the electron beam baffle and the film thickness gauge baffle to start the evaporation.

[0086] Color and saturation enhancement layers can be prepared using existing known methods such as physical vapor deposition, chemical vapor deposition, and liquid phase processes. Physical vapor deposition includes magnetron sputtering, electron beam evaporation, thermal evaporation, and arc ion plating; specifically, any of the following methods can be selected:

[0087] D: Liquid phase process: For example, the preparation method of TiO2 layer is as follows: coating with TiO2 precursor solution and heating and curing at a certain temperature.

[0088] E: Arc ion plating: Low-pressure vacuum plasma surface treatment is performed on the reflective layer surface to obtain a color and saturation enhancement layer; the parameters of low-pressure vacuum plasma etching are: temperature 30~100℃, pressure 8×10 -4 ~1×10 - 3 Pa, power supply power of 150-250W, time of 15-18 minutes, working gas is Ar.

[0089] F: Magnetron sputtering: A color and saturation enhancement layer is formed on the surface of the reflective layer using magnetron sputtering. The parameters for magnetron sputtering are: vacuum degree of 1.8 × 10⁻⁶. -4 ~1.5×10 -3 Pa, the distance between the reflective layer and the target is 100 mm, the working gas is Ar or N2 with a purity of 98% to 99.9%, the gas flow rate is 6 to 8 sccm, the substrate (i.e., the base fabric) rotation speed is 9 to 12 r / min, the magnetron sputtering power is 140 to 255 W, and the magnetron sputtering time is 8 to 10 min.

[0090] In one embodiment, the above preparation method further includes: step 4: preparing a surface protective layer on the surface of the color and saturation enhancement layer by physical coating or chemical coating method. The surface protective layer can enhance the firmness of the structural color film layer, enabling it to resist the impact of friction and washing.

[0091] In one embodiment, before the substrate (base fabric) surface is smoothed, the base fabric is first degassed and pretreated in sequence; wherein: the degassed process conditions are: the base fabric is placed in a vacuum environment, and water vapor and other adsorbed gases in the gaps of the base fabric are removed by heating, heat preservation and cooling.

[0092] The surface pretreatment adopts surface cleaning treatment, which includes vacuum heating cleaning, ultraviolet irradiation cleaning, plasma discharge cleaning, gas flushing, ultrasonic cleaning, etc. The cleaning methods mentioned in this embodiment can all be implemented by existing technologies, so they will not be described in detail here.

[0093] Example 1

[0094] A structurally colored fabric includes a substrate 10, on which a smoothing layer 21, a reflective layer 22, a color and saturation enhancement layer 23, and a surface protective layer 30 are sequentially formed. The reflective layer 22 is an Ag reflective layer, and the color and saturation enhancement layer 23 is a TiO2-TiN-TiO2 color and saturation enhancement layer. Therefore, the film system of the structurally colored fabric in this embodiment 1 is Ag / TiO2 / TiN / TiO2; from left to right, the thickness of Ag must be greater than its skin depth, that is, the thickness of Ag is 200 nm, the thickness of TiO2 is 60 nm, the thickness of TiN is 70 nm, and the thickness of TiO2 is 20 nm. The thickness of the surface protective layer 30 is 700 nm.

[0095] The preparation method of this structural colored fabric includes the following steps:

[0096] S1: Feed the base fabric into the machine. The base fabric is made of nylon with a roughness of 100nm.

[0097] S2: Degas and clean the base fabric, wherein degassing is performed by heating the base fabric in a vacuum environment for 20 minutes;

[0098] S3: Calender the surface of the base fabric after S2 treatment to form a smooth layer, so that the surface roughness of the fabric is 10nm; the calendering conditions are: using one metal roller and two soft rollers to form two hard rolling points, and rolling the base fabric at a temperature of 80℃ and a high pressure of 5 tons.

[0099] S4: An Ag reflective layer is formed on the surface of the planar layer by magnetron sputtering, specifically:

[0100] Using Ag as the target material, a metallic Ag reflective layer is deposited on the surface of a planar layer by magnetron sputtering. The magnetron sputtering parameters include a vacuum level of 9 × 10⁻⁶. -4 Pa, the distance between the planarization layer and the target is 100 mm, the working gas is argon with a purity of 99.9%, the gas flow rate is 6 sccm, the substrate rotation speed is 12 r / min, the magnetron sputtering power is 160 W, and the magnetron sputtering time is 10 min;

[0101] S5: A TiO2-TiN-TiO2 color and saturation enhancement layer is formed on the Ag reflective layer by magnetron sputtering. The specific steps are as follows:

[0102] S5-1: A TiO2 non-absorbing material layer was prepared on the surface of an Ag reflective layer by magnetron sputtering using TiO2 as the target material; the parameters of the magnetron sputtering included: a vacuum degree of 1.5 × 10⁻⁶. -3The distance between the Ag reflective layer and the target is 100 mm, the working gas is Ar with a purity of 99.9%, the gas flow rate is 7.5 sccm, the substrate rotation speed is 11 r / min, the magnetron sputtering power is 255 W, and the magnetron sputtering time is 8 min.

[0103] S5-2: Using Ti as the target material, a TiN absorbing material layer is attached to the surface of a TiO2 non-absorbing material layer by magnetron sputtering; the magnetron sputtering parameters include: vacuum degree of 7.2 × 10⁻⁶. -4 Pa, the distance between the TiO2 non-absorbing material layer and the target is 100 mm, the working gas is N2 with a purity of 99.9%, the gas flow rate is 8 sccm, the substrate rotation speed is 12 r / min, the magnetron sputtering power is 160 W, and the magnetron sputtering time is 10 min;

[0104] S5-3: Using TiO2 as the target material, magnetron sputtering is performed to prepare a TiO2 non-absorbing material layer on the surface of a TiN absorbing material layer; the parameters of the magnetron sputtering include: a vacuum degree of 10 -3 The distance between the Pa, TiN absorber layer and the target is 100 mm. The working gas is Ar with a purity of 99.9%, the gas flow rate is 8 sccm, the substrate rotation speed is 9 r / min, the magnetron sputtering power is 235 W, and the magnetron sputtering time is 9 min.

[0105] S6: A surface protective layer is formed on the surface of the TiO2-TiN-TiO2 color and saturation enhancement layer by chemical coating, thereby obtaining a structural colored fabric; the specific steps of chemical coating are as follows: polyurethane material is used, the coating machine speed is 5m / min, and the drying temperature is 75℃.

[0106] The structural colored fabric obtained in Example 1 has a film system of Ag / TiO2 / TiN / TiO2. The thickness from left to right is as follows: the thickness of Ag needs to be greater than its skin depth, that is, the thickness of Ag is 200nm, the thickness of TiO2 is 60nm, the thickness of TiN is 70nm, and the thickness of TiO2 is 20nm.

[0107] In this embodiment 1, the reflectance spectrum of the structurally colored fabric is as follows: Figure 4 As shown, in this Figure 4 In the reflection spectrum, the highest reflection peak appears near 520nm, which is close to the typical 538nm. The reflectivity is low in the wavelength ranges below 450nm and above 600nm. Its color coordinates are x = 0.235 and y = 0.459, which are exactly in the green area of ​​the colorimetric diagram. This indicates that the color of the structural fabric in this application is consistent with the optical theoretical design.

[0108] In this embodiment, the positions of the film system of the structured color fabric and the traditional structured color film system Ag / Si in the colorimetric diagram are respectively... Figure 5 The color coordinates show that traditional film systems (represented by triangles ▲) have a wider reflectance spectrum, resulting in a hue in the yellow range, close to the orange-yellow and yellow-green regions. In contrast, the film system of Example 1 (represented by dots ●) has a narrower reflectance spectrum, resulting in a hue in the green range, a range that is difficult for traditional metal / absorbing layer film systems to reach.

[0109] Comparative Example 1

[0110] The fabric structure of Comparative Example 1 is largely the same as that of Example 1. The only difference is that the fabric of Comparative Example 1 does not have a smoothing layer, and the fabric was not smoothed during its preparation.

[0111] The fabric prepared in Comparative Example 1 was found to have a high surface roughness, resulting in low reflectivity; the fabric's position in the chromaticity diagram was as follows: Figure 5 As shown in the diagram (represented by "rectangle ■"), its position in the color coordinate system is: x = 0.291, y = 0.384; its hue is closer to the neutral color region, with low color saturation, resulting in a light and pale color, which deviates significantly from the optical design and the aesthetic requirement for high-saturation colors. Therefore, by smoothing the surface of the base fabric in this application, the surface roughness of the fabric can be reduced, minimizing the impact of roughness on the color-forming characteristics of the subsequently grown structural color film layer, resulting in a final structural color fabric with high saturation and a wide color gamut.

[0112] Example 2

[0113] A structurally colored fabric includes a substrate 10, on which a smoothing layer 21, a reflective layer 22, a color and saturation enhancement layer 23, and a surface protective layer 30 are sequentially formed. The reflective layer 22 is an Al reflective layer, and the color and saturation enhancement layer 23 is a TiO2-TiN-Al2O3 color and saturation enhancement layer. Therefore, the film system of the structurally colored fabric in this embodiment 2 is Al / TiO2 / TiN / Al2O3; the thickness from left to right is: Al thickness is 95nm, TiO2 thickness is 65nm, TiN thickness is 140nm, Al2O3 thickness is 50nm, and the surface protective layer 30 thickness is 300nm.

[0114] The preparation method of this structural colored fabric includes the following steps:

[0115] S1: Feed the base fabric into the machine. The base fabric is made of nylon with a roughness of 100nm.

[0116] S2: Degas and clean the base fabric, wherein degassing is performed by heating the base fabric in a vacuum environment for 20 minutes;

[0117] S3: Calender the surface of the base fabric after S2 treatment to form a smooth layer, so that the surface roughness of the fabric is 10nm; the calendering conditions are: using one metal roller and two soft rollers to form two hard rolling points, and rolling the base fabric at a temperature of 80℃ and a high pressure of 5 tons.

[0118] S4: An Al reflective layer is formed on the surface of the planarized layer by magnetron sputtering; specifically:

[0119] Using Al as the target material, a metallic Al reflective layer is deposited on the surface of a planar layer via magnetron sputtering; the parameters of the magnetron sputtering include: a vacuum degree of 9 × 10⁻⁶. -4 Pa, the distance between the planarization layer and the target is 100 mm, the working gas is Ar with a purity of 99.9%, the gas flow rate is 6 sccm, the substrate rotation speed is 12 r / min, the magnetron sputtering power is 145 W, and the magnetron sputtering time is 10 min;

[0120] S5: A TiO2-TiN-Al2O3 color and saturation enhancement layer is formed on the Al reflective layer by magnetron sputtering. The specific steps are as follows:

[0121] S5-1: A TiO2 non-absorbing material layer is prepared on the surface of an Al reflective layer by magnetron sputtering using TiO2 as the target material; the parameters of the magnetron sputtering include: a vacuum degree of 10 -3 The distance between the Pa and Al reflective layers and the target is 100 mm. The working gas is Ar with a purity of 99.9% and a gas flow rate of 8 sccm. The substrate rotation speed is 9 r / min. The magnetron sputtering power is 245 W and the magnetron sputtering time is 10 min.

[0122] S5-2: Using TiN as the target material, a TiN absorbing material layer is attached to the surface of a TiO2 non-absorbing material layer by magnetron sputtering; the parameters of the magnetron sputtering include: a vacuum degree of 1.1 × 10⁻⁶. -3 Pa, the distance between the TiO2 non-absorbing material layer and the target is 100 mm, the working gas is Ar with a purity of 99.9%, the gas flow rate is 8 sccm, the substrate rotation speed is 10 r / min, the magnetron sputtering power is 217 W, and the magnetron sputtering time is 10 min;

[0123] S5-3: Using Al2O3 as the target material, a non-absorbing Al2O3 layer was prepared on the surface of a TiN layer with absorbing material by magnetron sputtering; the parameters of the magnetron sputtering included: a vacuum degree of 1.5 × 10⁻⁶. -3 The distance between the Pa, TiN absorber layer and the target is 100 mm. The working gas is Ar with a purity of 99.9% and a gas flow rate of 7 sccm. The substrate rotation speed is 11 r / min. The magnetron sputtering power is 255 W and the magnetron sputtering time is 9 min.

[0124] S6: A surface protective layer is formed on the surface of the TiO2-TiN-Al2O3 color and saturation enhancement layer by chemical coating, thereby obtaining a structural colored fabric; the specific steps of chemical coating are as follows: polyurethane material is used, the coating machine speed is 6.5m / min, and the drying temperature is 75℃.

[0125] The structural colored fabric obtained in Example 2 has a film system of Al / TiO2 / TiN / Al2O3; the thickness from left to right is: Al thickness is 95nm, TiO2 thickness is 65nm, TiN thickness is 140nm, and Al2O3 thickness is 50nm.

[0126] The structurally colored fabric obtained in Example 2 has the following reflectance spectrum: Figure 6 As shown, the chromaticity diagram is as follows Figure 7 As shown; in this Figure 6 In the spectrum, the highest reflection peak appears near 447 nm, approaching the typical 420 nm blue light band, while the reflectivity remains low in the 450 nm–700 nm wavelength range. Figure 7 In this embodiment 2, the color appears at the dot, with color coordinates x = 0.163 and y = 0.142, which is exactly in the blue area of ​​the chromaticity diagram. This indicates that the color of the structural fabric prepared in embodiment 2 of this application is consistent with the optical theoretical design.

[0127] Example 3

[0128] A structural colored fabric includes a substrate 10, on which a smoothing layer 21, a reflective layer 22, a color and saturation enhancement layer 23, and a surface protective layer 30 are sequentially formed. The reflective layer 22 is a Cr-Ni alloy reflective layer, and the color and saturation enhancement layer 23 is a Ta2O5-Ti-TiO2 color and saturation enhancement layer. Therefore, the film system of the structural colored fabric in this embodiment 3 is Cr-Ni / Ta2O5 / Ti / TiO2; the thickness from left to right is: Cr-Ni thickness is 57nm, Ta2O5 thickness is 29nm, Ti thickness is 160nm, TiO2 thickness is 30nm, and the surface protective layer 30 thickness is 700nm.

[0129] The preparation method of this structural colored fabric includes the following steps:

[0130] S1: Feed the base fabric into the machine. The base fabric is made of nylon with a roughness of 100nm.

[0131] S2: Degas and clean the base fabric, wherein degassing is performed by heating the base fabric in a vacuum environment for 20 minutes;

[0132] S3: Calender the surface of the base fabric after S2 treatment to form a smooth layer, so that the surface roughness of the fabric is 10nm; the calendering conditions are: using one metal roller and two soft rollers to form two hard rolling points, and rolling the base fabric at a temperature of 80℃ and a high pressure of 5 tons.

[0133] S4: A Cr-Ni alloy reflective layer is formed on the surface of the planar layer by magnetron sputtering; specifically:

[0134] Using Cr-Ni as the target material, a metallic Cr-Ni alloy reflective layer is deposited on the surface of a planar layer via magnetron sputtering; the parameters of the magnetron sputtering include: a vacuum degree of 10... -3 Pa, the distance between the planarization layer and the target is 100 mm, the working gas is Ar with a purity of 99.9%, the gas flow rate is 6 sccm, the substrate rotation speed is 12 r / min, the magnetron sputtering power is 145 W, and the magnetron sputtering time is 10 min;

[0135] S5: A Ta2O5-Ti-TiO2 color and saturation enhancement layer is formed on the Cr-Ni reflective layer by magnetron sputtering. The specific steps are as follows:

[0136] S5-1: A Ta2O5 non-absorbing material layer was prepared on the surface of a Cr-Ni reflective layer by magnetron sputtering using Ta2O5 as the target material; the parameters of the magnetron sputtering included: a vacuum degree of 10 -3 The distance between the Pa, Cr-Ni reflective layer and the target is 100 mm. The working gas is Ar with a purity of 99.9% and a gas flow rate of 7.8 sccm. The substrate rotation speed is 11 r / min. The magnetron sputtering power is 240 W and the magnetron sputtering time is 8 min.

[0137] S5-2: Using Ti as the target material, a Ti absorbing material layer is attached to the surface of a Ta2O5 non-absorbing material layer by magnetron sputtering; the magnetron sputtering parameters include: vacuum degree of 7.2 × 10⁻⁶. -4 The distance between the Pa, Ta2O5 non-absorbing material layer and the target is 100 mm, the working gas is Ar with a purity of 99.9%, the gas flow rate is 8 sccm, the substrate rotation speed is 9 r / min, the magnetron sputtering power is 220 W, and the magnetron sputtering time is 10 min.

[0138] S5-3: Using TiO2 as the target material, magnetron sputtering is performed to prepare a TiO2 non-absorbing material layer on the surface of a Ti absorbing material layer; the parameters of the magnetron sputtering include: vacuum degree of 8×10 -4The distance between the Pa and Ti absorber layer and the target is 100 mm. The working gas is Ar with a purity of 99.9% and a gas flow rate of 6.4 sccm. The substrate rotation speed is 11 r / min. The magnetron sputtering power is 197 W and the magnetron sputtering time is 9 min.

[0139] S6: A surface protective layer is formed on the surface of the Ta2O5-Ti-TiO2 color and saturation enhancement layer by chemical coating, thereby obtaining a structural colored fabric; the specific steps of chemical coating are as follows: polyurethane material is used, the coating machine speed is 5m / min, and the drying temperature is 75℃.

[0140] The structural colored fabric obtained in Example 3 has a film system of Cr-Ni / Ta2O5 / Ti / TiO2; from left to right, the thicknesses are: Cr-Ni thickness is 57nm, Ta2O5 thickness is 29nm, Ti thickness is 160nm, and TiO2 thickness is 30nm.

[0141] In Example 3, the reflectance spectrum of the structurally colored fabric was obtained as follows: Figure 8 As shown, in this Figure 8 In the mid-wavelength spectrum, the highest reflection peak appears near 780 nm, which is quite close to the typical 688 nm red light band. Reflectivity continuously increases in the 538 nm–780 nm range, while it remains low in the 400 nm–538 nm wavelength range. Figure 9 In the chromaticity diagram, its position (represented by "dot ●") has color coordinates of x = 0.528 and y = 0.307, which is located in the boundary area between red and pink in the chromaticity diagram, indicating that the color of the structural fabric of this application tends to be consistent with the optical theory design.

[0142] Example 4

[0143] This embodiment 4 is largely the same as embodiment 1, that is, the film system of the structured fabric in embodiment 4 is also Ag / TiO2 / TiN / TiO2; the difference from embodiment 1 is that the thickness of the film system Ag / TiO2 / TiN / TiO2 in embodiment 4, from left to right, is: Ag thickness is 100nm, TiO2 thickness is 25nm, TiN thickness is 24nm, and TiO2 thickness is 13nm.

[0144] In Example 4, the reflectance spectrum of the structurally colored fabric was obtained as follows: Figure 10 As shown in the figure, the highest reflection peak appears near 390nm in the reflection spectrum, which is quite close to the typical 380nm violet light band. Figure 11 In the chromaticity diagram, its color coordinate position (represented by "dot ●") is x = 0.284, y = 0.176, which is located in the purple area of ​​the chromaticity diagram, indicating that the color of the structural colored fabric of this application tends to be consistent with the optical theoretical design.

[0145] Example 5

[0146] This embodiment 5 is largely the same as embodiment 1, that is, the film system of the structured fabric in embodiment 5 is also Ag / TiO2 / TiN / TiO2; the difference from embodiment 1 is that the thickness of the film system Ag / TiO2 / TiN / TiO2 in embodiment 5 from left to right is: Ag thickness is 273nm, TiO2 thickness is 97nm, TiN thickness is 88nm, and TiO2 thickness is 50nm.

[0147] In Example 5, the reflectance spectrum of the structurally colored fabric was obtained as follows: Figure 12 As shown in the figure, the reflection spectrum shows peaks near 410nm and 530nm, and the reflectivity in the 400nm-700nm band is greater than 40%. There are no obvious troughs in the visible light band, indicating minimal absorption of visible light. Figure 13 In the chromaticity diagram, its color coordinate position (represented by "dot ●") is x = 0.331, y = 0.345, which is located in the white area of ​​the chromaticity diagram, indicating that the color of the structural colored fabric of this application tends to be consistent with the optical theory design.

[0148] It should be understood that the above description is merely a specific embodiment of this disclosure, but the scope of protection of this disclosure is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in this disclosure should be included within the scope of protection of this disclosure. Therefore, the scope of protection of this disclosure should be determined by the scope of the claims.

Claims

1. A structural color fabric, characterized by: The structural color fabric comprises a substrate, a smoothing layer, a reflection layer, a color and saturation enhancement layer formed on the substrate in sequence; The smoothing layer is obtained by smoothing the surface of the substrate; The reflection layer comprises a single layer of metal Ti, Ag, Cu, Ni, Cr, Al or an alloy layer of any combination thereof; The color and saturation enhancement layer comprises, from inside to outside, a non-absorbing material layer, an absorbing material layer and a non-absorbing material layer; the absorbing material layer comprises one or more of a single layer of metal Ti, Ag, Cu, Ni, Cr, Al, an alloy layer, and a TiN, Si3N4, TiC compound layer; the non-absorbing material layer comprises one or more of a Ta2O5, TiO2, ZnO, Al2O3 compound layer; The thickness of the absorbing material layer is 20-160nm, and the total thickness of the two non-absorbing material layers is 30-150nm, wherein the thickness of the non-absorbing material layer close to the reflection layer is 20-100nm, and the thickness of the non-absorbing material layer away from the reflection layer is 10-50nm.

2. A structural color fabric according to claim 1, wherein: The smoothing layer is obtained by calendering or coating the surface of the substrate; the surface roughness of the smoothing layer is 10nm-10μm.

3. A structural color fabric according to claim 2, wherein: The surface roughness of the smoothing layer is ≥10nm and less than 1μm; the material used for coating is a solution of polyurethane, polyaniline, polypropylene or a multi-block copolymer organic matter.

4. A structural color fabric according to claim 1, wherein: The reflection layer is a single layer of metal with reflectivity greater than 80%; the absorbing material layer is a TiN compound layer.

5. A structural color textile according to any one of claims 1-4, wherein: The total thickness of the reflection layer is 50nm-350nm; The film system of the structural color fabric is Ag / TiO2 / TiN / TiO2, and the thickness from left to right is: Ag thickness is 100-300nm, TiO2 thickness is 20-100nm, TiN thickness is 20-90nm, and TiO2 thickness is 10-50nm.

6. A structural color fabric according to claim 1, wherein: The substrate is a base cloth, and the base cloth is selected from silk, chemical fiber or cotton cloth with roughness of 100nm-100μm.

7. A structural color fabric according to claim 1, wherein: A surface protection layer is further formed on the surface of the color and saturation enhancement layer, the thickness of the surface protection layer is 300nm-30μm, and the material of the surface protection layer comprises one or more of polyurethane, polyperfluoroethylene propylene and PET.

8. A method for preparing the structural color fabric according to any one of claims 1-7, characterized in that: Step 1): smoothing the surface of the substrate to obtain a smoothing layer; Step 2): forming a reflection layer on the surface of the smoothing layer by physical vapor deposition; Step 3): forming a color and saturation enhancement layer on the surface of the reflection layer by physical vapor deposition, chemical vapor deposition or liquid phase process.

9. The method of claim 8, wherein: Before step 1), the substrate is sequentially subjected to degassing and surface pretreatment; in step 1), the smoothing layer is obtained by calendering or coating the surface of the substrate, wherein the calendering conditions are 1-5 tons of pressure and a temperature of 80-100℃; the coating is slot coating of a solution of polyurethane, polyaniline, polypropylene or a multi-block copolymer organic matter, and the coating machine speed is 2-6m / min.

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