A method for preparing and transferring micro- and nano-scale samples using a focused ion beam system
By employing the 'flat cutting' method of the focused ion beam system and the rotation of the nanomechanical needle tip, the problems of contamination and damage during sample transfer in existing technologies have been solved, enabling stable preparation and efficient transfer of thick thin films and crystal samples with specific orientations.
CN116858626BActive Publication Date: 2026-05-15XI AN JIAOTONG UNIV
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Patent Information
- Application Number
- CN202310545616.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-05-15
- Publication Date
- 2026-05-15
- Estimated Expiration
- 2043-05-15
AI Technical Summary
Technical Problem
Existing technologies have limitations in preparing and transferring micro and nano samples, especially for thin film samples and crystal samples with specific orientations. Samples are prone to contamination and falling off during the transfer process, and may damage the in-situ chip.
Method used
A 'flat-cut' method based on a focused ion beam system is adopted, combined with nanomechanical tip rotation and low-voltage argon ion beam cleaning, to simplify the sample preparation process, avoid multiple connections and contamination, and improve sample stability.
Benefits of technology
It expands the range of applicable samples, reduces sample contamination and damage, and improves experimental efficiency and sample stability on the target carrier.
✦ Generated by Eureka AI based on patent content.
Abstract
The present application relates to the technical field of micro-nano material preparation, and particularly relates to a method for preparing and transferring a micro-nano scale sample by using a focused ion beam system, comprising the following steps: cutting a surface to be cut of a large sample by using a focused ion beam to obtain a cut sample; fixing a nano mechanical needle to the cut sample and rotating the cut sample to thin and process the cut sample to obtain a deep-processed sample; and transferring the deep-processed sample to an observation area of a target carrier and cleaning, so as to complete the preparation and transfer of the micro-nano sample. The method of the present application overcomes many shortcomings in the traditional sample preparation method, simplifies the experimental process, improves the experimental efficiency, maximally avoids the pollution of the sample in the environmental and gas deposition process, as much as possible avoids the structural damage caused by excessive gallium ion injection into the sample, and improves the stability of the sample on the target carrier.
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