Chloroalkane chlorination mixed distillation treatment equipment and process

Abstract

The present invention discloses a chlorinated mixed distillation processing device and process method, which relates to the technical field of pharmaceutical intermediate preparation. The present invention configures a combined structure of a reflux plate, a guide frame, a temperature resistance plate, a flow control plate, and a flow control component in the distillation processing device. During the distillation process, the temperature of each rising distillation airflow is sensed and monitored by a multi-channel thermistor ring. The flow control component cooperates with the airflow cut-off control of the flow control plate to allow the airflow that meets the temperature to enter the rising chamber, while the airflow that does not meet the temperature is blocked and flows through a conical bottom groove into the second reflux hole, the guide frame, the first reflux hole, and the reflux pipe, and then refluxes to the bottom of the evaporation chamber, preventing the subsequent continuously rising distillation airflow from forming a blocking area, thereby efficiently distilling, discharging, and collecting the distillation airflow components, thereby improving the efficiency of the distillation and purification process of the pharmaceutical intermediate components.

Description

Technical Field

[0001] The present invention relates to the technical field of pharmaceutical intermediate preparation, in particular to equipment and a process for treating chlorinated alkane chlorination and mixed distillation. Background Art

[0002] Pharmaceutical intermediates are fine chemical products produced during the production process from pharmaceutical chemical raw materials to APIs or pharmaceuticals. The synthesis of chemical drugs relies on high-quality pharmaceutical intermediates. Pharmaceutical intermediates can be considered pharmaceutical raw materials and do not require production approval and batch number applications under pharmaceutical regulations. However, when used in pharmaceutical synthesis, their product specifications and quality must meet certain standards, and typically, they must undergo client audits before becoming a qualified supplier.

[0003] In the production process of many pharmaceutical intermediates, it is necessary to perform distillation and purification of various components to make the components of the pharmaceutical intermediates more pure. For example, after chlorination and mixing of chloroalkanes, distillation is an essential step to separate the chloroalkanes more purely. However, in the existing component distillation process, the mixed liquid is generally heated to the corresponding temperature range. For example, 1-bromo-2-fluorocyclohexane (C6H 10 BrF has a boiling point of 75-77°C. During distillation, the fraction between 75-77°C / 1.46 kPa is collected. However, during distillation, fine liquids often linger in the airflow, some of which are not the desired distillation components. Furthermore, during distillation, the evaporator typically heats the mixed liquid to a temperature exceeding the lowest boiling point of the desired distillation component. This prevents the desired distillation component's airflow from rapidly dropping below its boiling point after leaving the mixture, maintaining its shape as it exits the distillation equipment.

[0004] To prevent low-temperature airflow that hasn't reached the distillation separation temperature from mixing with the distilled components, a flow channel is typically installed in the distillation flow channel to monitor whether the distilled airflow temperature is within the distillation temperature of the desired component. For example, 1-bromo-2-fluorocyclohexane has a boiling point of 75-77°C. When monitoring the distilled airflow temperature, it is determined whether the airflow temperature is between 75-77°C. If it is, the airflow is released; if it is not, the flow channel is closed. While this method can directly control the purity of the distilled airflow components, the evaporator continuously heats the mixed liquid. During the flow, the airflow in some areas, where the temperature meets the distillation separation temperature, is blocked and cannot be discharged for distillation collection. This causes the newly distilled airflow to be "carried over" and blocked, significantly affecting the separation and collection efficiency of the distilled components. Therefore, efficient distillation, discharge, and collection of distilled airflow components and reducing "carried over" blockages are crucial steps in improving the efficiency of the distillation purification process for pharmaceutical intermediate components. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to provide a chlorinated mixed distillation treatment device and process method for chlorinated alkanes, so as to efficiently distill, discharge and collect the components of the distilled gas flow, reduce the "involvement" blockage of the distilled gas flow, and improve the efficiency of the distillation and purification process of pharmaceutical intermediate components.

[0006] To solve the above technical problems, the present invention is achieved through the following technical solutions:

[0007] The present invention provides a chlorinated mixed distillation treatment device for chlorinated alkanes. The distillation treatment device comprises an evaporation chamber, an ascending chamber, and a discharge pipe located above the ascending chamber. An evaporator and a mixed liquid are disposed at the bottom of the evaporation chamber. The distillation treatment device comprises a return plate, a flow guide frame, a temperature resistance plate, and a flow control plate located between the evaporation chamber and the ascending chamber. The return plate has an airflow ascending groove defined in the middle region thereof, and the return plate has a plurality of first return holes surrounding the airflow ascending groove. The flow guide frame has a plurality of flow guide cones, each of which has a vertically extending conical through-hole, with the lower ends of all the conical through-holes of the flow guide frame aligned with the airflow ascending groove of the return plate. The temperature resistance plate has a plurality of annular thermistor rings, each of which forms an airflow channel. The temperature resistance plate has a plurality of second return holes surrounding each thermistor ring, and the airflow channels of the thermistor rings align with the upper ends of the conical through-holes of the flow guide cones. The temperature resistance plate is provided with a first wiring harness and a first electrical plug electrically connected to the thermistor rings. The bottom side of the flow control plate is provided with multiple conical bottom grooves aligned with the positions of the thermistor rings. The opening size of the lower side of the conical bottom grooves matches the size of the distribution range of the multiple second return holes on the ring side of the thermistor ring. The flow control plate is provided with an ascending through hole connected to the conical bottom groove. The upper side of the flow control plate is equipped with a flow control assembly. The flow control assembly includes a fixed frame, on which a vertical rod is movably mounted. The lower end of the vertical rod is provided with a sealing disk that matches the ascending through hole. The vertical rod sleeve is equipped with a lightweight spring that tension-supports the sealing disk downward. The upper end of the vertical rod is provided with an upper end cap of magnetic material. The upper side of the flow control assembly is equipped with an electromagnetic module that magnetically matches the upper end cap. A second wiring harness and a second electrical plug electrically connected to the electromagnetic module are fixedly mounted on the side of the flow control plate. A sealing ring is provided inside the distillation processing equipment. The inner periphery of the sealing ring is provided with a sealing ring that is in extrusion contact with the outer surface of the flow control plate.

[0008] As an optimal technical solution for the distillation processing equipment of the present invention: the evaporation chamber wall is provided with a reflux pipe connected to the first reflux hole, the bottom end of the reflux pipe is higher than the upper plane of the mixed liquid, and a one-way valve is provided at the bottom end of the reflux pipe.

[0009] As a preferred technical solution for the distillation processing equipment of the present invention: the upper port diameter of the conical through hole is smaller than the lower port diameter, and a plurality of supporting vertical plates are provided at the edge of the upper side of the guide frame, and the supporting vertical plates and the guide cone protruding from the upper side of the guide frame have the same height.

[0010] As a preferred technical solution of the distillation processing equipment of the present invention: The temperature resistance plate is provided with a plurality of resistor mounting holes, and the thermistor ring is installed at the positions of the resistor mounting holes.

[0011] As a preferred technical solution of the distillation processing equipment of the present invention: The temperature resistance plate is provided with a pipeline groove and a joint groove, the first wire harness is embedded and installed at the position of the pipeline groove, and the first electrical plug is embedded and installed at the position of the joint groove.

[0012] As a preferred technical solution of the distillation processing equipment of the present invention: Let the lower opening size of the conical bottom groove be Da, and let the radial span size Dc formed by the distribution range of the plurality of second return holes on the ring side of the thermistor ring, then Da > Dc.

[0013] As a preferred technical solution of the distillation processing equipment of the present invention: The fixing frame is provided with a cross plate, the cross plate is provided with a through hole, the vertical rod is movably installed at the position of the through hole of the cross plate, and the light spring is located between the cross plate and the plugging disc.

[0014] The present invention provides a chlorinated alkane chlorination mixed distillation processing process method, including the following link contents:

[0015] S1. The evaporator heats the mixed liquid to between 75 and 80 °C, the chlorinated alkane component liquid in the mixed liquid reaches the boiling point and vaporizes, and the gas flow separated from the mixed liquid enters the upper region of the evaporation chamber.

[0016] S2. The gas flow passes through the gas flow rising groove of the reflux plate and enters the conical through hole. The conical through hole收拢气流上升通道的径向尺寸,气流中部分悬浮液体被阻挡并自然凝结滴落。

[0017] S3. The gas flow passes through the upper port of the conical through hole and enters the gas flow channel of the thermistor ring. The thermistor ring changes its resistance value according to the gas flow temperature. The control system drives and controls the electromagnetic module at the corresponding position to perform corresponding actions according to the current change in the circuit where the thermistor ring is located. Among them, the control system presets the standard current range: Let the current in the circuit where the thermistor ring is located be I X . When I X ∈[I1, I2], then the current of the current electromagnetic module is the standard current I B , the electromagnetic module magnetically attracts the upper end cap, the plugging disc is separated from the rising through hole of the flow control plate, and the gas flow passes through the gas flow channel, the conical bottom groove, and the rising through hole and enters the rising chamber and enters the outlet pipe. When I X <I1, let the current difference △I = I1 - I X , then the energized current of the electromagnetic module is I C , then . When I X >I2, let the current difference △I = I X -I2, then the energized current of the electromagnetic module is ID ,but .

[0018] As a preferred technical solution of the distillation treatment process of the present invention: the control system presets the maximum temperature difference and current difference △I max , when the current difference △I≥ the maximum temperature difference current difference △I max , the electromagnetic module is powered off.

[0019] Compared with the existing technology, the beneficial effects of the present invention are:

[0020] 1. The present invention configures a combined structure of a reflux plate, a guide frame, a temperature resistance plate, a flow control plate, and a flow control component in the distillation processing equipment. During the distillation process, the temperature of each rising distillation air flow is sensed and monitored by a multi-channel thermistor ring. The flow control component and the airflow interruption control of the flow control plate are coordinated to allow the air flow that meets the temperature to enter the rising chamber, and the air flow that does not meet the temperature is blocked and flows into the second reflux hole, the guide frame, the first reflux hole, and the reflux pipe through the conical bottom groove, and refluxes to the bottom of the evaporation chamber, forming a form of independent movement of the air flow at multiple points in the same rising plane, preventing the formation of a blocking area for the subsequent continuously rising distillation air flow, thereby efficiently distilling, discharging, and collecting the distillation air flow components, thereby improving the efficiency of the distillation and purification process of the pharmaceutical intermediate components.

[0021] 2. The present invention monitors the air flow temperature through a thermistor ring, and controls the conduction state of the electromagnetic module and the magnitude of the current after conduction through a control system, thereby forming a "preparatory" state for rapid control of the distillation air flow conduction path. When the distillation air flow temperature changes from a non-compliant state to a compliant state, the distillation air flow conduction path is quickly completed, thereby avoiding the problem of the distillation air flow that meets the temperature "missing" the introduction into the rising chamber due to the regulation hysteresis of the flow control component, thereby ensuring the collection efficiency of the distillation air flow components that meet the temperature to the greatest extent. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is an overall schematic diagram of the distillation processing equipment in the present invention.

[0023] Figure 2 for Figure 1 Schematic diagram of the local enlargement at point A in the middle.

[0024] Figure 3 It is a schematic diagram of the assembly of the return plate, guide frame, temperature resistance plate, flow control plate, and flow control component in the present invention.

[0025] Figure 4 This is a schematic diagram of the separation of the return plate, guide frame, temperature resistance plate, flow control plate, and flow control assembly in the present invention.

[0026] Figure 5It is a structural schematic diagram of the return plate in the present invention.

[0027] Figure 6 Schematic diagram of the structure of the guide frame in the present invention.

[0028] Figure 7 It is a structural schematic diagram of the temperature resistance plate in the present invention.

[0029] Figure 8 Schematic diagram of the structure of the temperature resistance plate (without thermistor ring installed) in the present invention.

[0030] Figure 9 It is a structural schematic diagram of the return plate and flow control component in the present invention.

[0031] Figure 10 It is a structural schematic diagram of the bottom of the return plate in the present invention.

[0032] Figure 11 It is a structural schematic diagram of the return plate and the bottom of the guide frame in the present invention.

[0033] Wherein: 1-distillation processing equipment, 101-evaporation chamber, 102-rising chamber, 103-reflux pipe, 104-check valve, 105-export pipe; 2-mixed liquid; 3-reflux plate, 301-airflow rising groove, 302-first reflux hole; 4-guide frame, 401-guide cone, 402-conical through hole, 403-support vertical plate; 5-temperature resistance plate, 501-resistance mounting hole, 502-second reflux hole, 503-pipeline groove, 504-connector groove, 505-thermistor ring, 506-air flow channel, 507-first wiring harness, 508-first electrical plug; 6-flow control plate, 601-conical bottom groove, 602-rising through hole; 7-flow control assembly, 701-fixing frame, 702-horizontal plate, 703-electromagnetic module, 704-vertical rod, 705-upper end cap, 706-sealing disk, 707-light spring, 708-second wiring harness, 709-second electrical plug; 8-sealing ring, 801-sealing ring. DETAILED DESCRIPTION

[0034] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0035] Example 1 The present invention relates to a chlorinated mixed distillation treatment device for chlorinated alkanes, the main structure of the device is as follows:

[0036] See also Figure 1Inside the distillation processing apparatus 1, the lower portion comprises an evaporation chamber 101, the upper portion comprises an ascending chamber 102, and a discharge pipe 105 is positioned above the ascending chamber 102. An evaporator and a mixed liquid 2 are located at the bottom of the evaporation chamber 101. Multiple reflux pipes 103 are disposed on the wall of the evaporation chamber 101. Each reflux pipe 103 is connected to a first reflux hole 302, and the bottom of each reflux pipe 103 is higher than the upper surface of the mixed liquid.

[0037] A one-way valve 104 is disposed at the bottom of the return pipe 103. When the liquid in the return pipe 103 reaches a certain weight, the one-way valve 104 opens in one direction due to gravity. This type of structure is common in the prior art and will not be described in detail in this disclosure. Furthermore, any gas-liquid mixture evaporating upward from the mixed liquid 2 will not enter the return pipe 103 through the one-way valve 104.

[0038] See also Figure 1 、 Figure 2 、 Figure 3 、 Figure 4 The distillation processing equipment 1 is internally provided with a reflux plate 3, a guide frame 4, a temperature resistance plate 5, and a flow control plate 6 located between the evaporation chamber 101 and the rising chamber 102. The reflux plate 3, the guide frame 4, the temperature resistance plate 5, and the flow control plate 6 are stacked and fixed in sequence.

[0039] See also Figure 2 Distillation processing equipment 1 is equipped with a sealing ring 8, and a sealing ring 801 is located within the sealing ring 8. Sealing ring 801 is in pressurized contact with the outer surface of flow control plate 6. Sealing ring 8 and sealing ring 801 "encircle" the periphery of flow control plate 6, preventing the substandard gas-liquid mixture from escaping through gaps in the inner wall of the equipment due to the temperature of the guide frame 4 and the return plate 3.

[0040] See also Figure 5 、 Figure 11 An airflow rising groove 301 is opened in the middle area of ​​the return plate 3, and a plurality of first return holes 302 are opened in the return plate 3. The first return holes 302 surround the airflow rising groove 301.

[0041] See also Figure 6 、 Figure 11 The guide frame 4 is equipped with multiple guide cones 401, and each guide cone 401 is provided with a vertical conical through hole 402. The lower ports of all the conical through holes 402 of the guide frame 4 are directly opposite to the airflow rising groove 301 of the return plate 3.

[0042] See also Figure 2 、 Figure 6 The upper end of the tapered through hole 402 is small and the lower end is large. A plurality of support vertical plates 403 are provided at the edge of the upper side of the guide frame 4. The support vertical plates 403 and the guide cone 401 protrude from the upper side of the guide frame 4 at the same height.

[0043] See also Figure 7 、 Figure 8 The temperature resistance plate 5 is provided with a plurality of resistor mounting holes 501, and a thermistor ring 505 is installed at the position of each resistor mounting hole 501. An air flow channel 506 is formed inside the thermistor ring 505. The temperature resistance plate 5 is provided with a plurality of second return holes 502 around each thermistor ring 505. The air flow channel 506 of the thermistor ring 505 is aligned with the upper end of the tapered through hole 402 of the guide cone 401. The temperature resistance plate 5 is provided with a first wiring harness 507 and a first electrical plug 508 electrically connected to the thermistor ring 505. The first wiring harness 507 has a plurality of electrical conductors, each of which is electrically connected to a thermistor ring 505. All electrical conductors of the first wiring harness 507 are integrated and connected to the first electrical plug 508. The first electrical plug 508 is internally provided with a plurality of PIN pins for easy connection to an external PIN connector.

[0044] See also Figure 2 、 Figure 9 A flow control assembly 7 is disposed on the upper side of the flow control plate 6. The flow control assembly 7 comprises a fixed frame 701, an electromagnetic module 703 fixed to the upper end of the fixed frame 701, a horizontal plate 702 provided on the fixed frame 701, a through-hole provided on the horizontal plate 702, a vertical rod 704 movably mounted at the through-hole position of the horizontal plate 702, a blocking disk 706 provided at the lower end of the vertical rod 704, the blocking disk 706 cooperating with the rising through-hole 602, a lightweight spring 707 located between the horizontal plate 702 and the blocking disk 706, and a lightweight spring 707 sleeved on the vertical rod 704 to support the blocking disk 706 downward under tension. An upper end cap 705 of magnetic material is disposed on the upper end of the vertical rod 704. For example, the upper end cap 705 is made of an iron-containing alloy, such as stainless steel. The electromagnetic module 703 is magnetically coupled to the upper end cap 705.

[0045] A second wiring harness 708 and a second electrical plug 709 are fixedly mounted on the upper side of the flow control plate 6, electrically connected to the electromagnetic module 703. The temperature resistance plate 5 is provided with a pipeline slot 503 and a connector slot 504. The first wiring harness 507 is embedded in the pipeline slot 503, and the first electrical plug 508 is embedded in the connector slot 504. The second wiring harness 708 has multiple electrical conductors, each of which is independently electrically connected to the electromagnetic module 703. All of the electrical conductors are collectively connected to the second electrical plug 709. The second electrical plug 709 is internally configured with multiple PIN pins to facilitate connection to an external PIN connector.

[0046] See also Figure 2 、 Figure 8 、 Figure 10The bottom side of the flow control plate 6 is provided with a plurality of conical bottom grooves 601, each of which is aligned with a thermistor ring 505. The opening size of the lower side of the conical bottom groove 601 matches the distribution range size of the plurality of second return holes 502 on the ring side of the thermistor ring 505, wherein the opening size of the lower side of the conical bottom groove 601 is larger than the radial span size formed by the distribution range of the plurality of second return holes 502 on the ring side of the thermistor ring 505. The flow control plate 6 is provided with an ascending through hole 602 connected to the conical bottom groove 601, and the ascending through hole 602 is located on the upper side of the conical bottom groove 601.

[0047] See also Figure 1 、 Figure 2 、 Figure 11 In the present invention, the distillation airflow passes through the airflow rising groove 301 of the reflux plate 3, the conical through hole 402 of the guide frame 4, and the airflow channel 506 of the temperature resistance plate 5. The airflow that meets the temperature enters the rising chamber 102 through the rising through hole 602, and the airflow that does not meet the temperature is blocked by the blocking plate 706 and flows back into the second reflux hole 502, the guide frame 4, the first reflux hole 301, and the reflux pipe 103 through the conical bottom groove 601, and flows back to the bottom of the evaporation chamber 101, preventing the formation of a blocking area for the subsequent continuously rising distillation airflow, thereby efficiently distilling, discharging, and collecting the components of the distillation airflow.

[0048] Example 2: The present invention relates to a chlorinated mixed distillation process for treating chlorinated alkanes, the main contents of which are as follows:

[0049] First, the evaporator heats the mixed liquid to between 75 and 80° C., and the chlorinated hydrocarbon component liquid in the mixed liquid reaches the boiling point and vaporizes. The air flow separated from the mixed liquid enters the upper area of ​​the evaporation chamber 101.

[0050] Then, the airflow passes through the airflow ascending groove 301 of the return plate 3 and enters the tapered through hole 402. The tapered through hole 402 shrinks the radial dimension of the airflow ascending channel, and part of the suspended liquid in the airflow is blocked and naturally condenses and drips.

[0051] Then, the air flow passes through the upper port of the tapered through hole 402 and enters the air flow channel 506 of the thermistor ring 505, wherein the radial dimension of the air flow channel 506 is the same as the radial dimension of the upper port of the tapered through hole 402. In order to ensure sealing, a sealing ring gasket can be installed between the upper port of the tapered through hole 402 and the air flow channel 506.

[0052] The resistance of the thermistor ring 505 changes according to the airflow temperature, and the control system drives the electromagnetic module 703 at the corresponding position to perform corresponding actions according to the current change of the circuit where the thermistor ring 505 is located.

[0053] Among them, the control system presets the standard current range: I1~I 2。Standard current range: For example, when the temperature is between 75 and 80 °C, the resistance value of the thermistor ring 505 is between R1 and R2, and the current change range of the circuit where the current thermistor ring 505 is located is I1 to I2, and I1 to I2 is the standard current range.

[0054] Let the current in the circuit where the thermistor ring 505 is located be I X . When I X ∈[I1, I2], the current electromagnetic module 703 conducts the standard current I B . The standard current refers to the minimum current that can overcome the tension of the light spring 707 and completely separate the plugging disk 706 from the rising through-hole 602. The electromagnetic module 703 magnetically attracts the upper end cap 705, and the plugging disk 706 is separated from the rising through-hole 602 of the flow control plate 6. The air flow passes through the air flow channel 506, the conical bottom groove 601, and the rising through-hole 602 into the rising cavity 102 and enters the outlet pipe 105, and the air flow separates from the distillation treatment device 1.

[0055] When I X <I1, let the current difference △I = I1 - I X , then the energized current of the electromagnetic module 703 is I C , then . When I X >I2, let the current difference △I = I X -I2, then the energized current of the electromagnetic module 703 is I D , then . When the temperature is too high, the probability ratio of other organic components doped in the air flow increases. Therefore, the more the temperature exceeds the standard, the smaller the conduction current of the electromagnetic module 703, which not only conforms to the component distillation principle but also reduces the magnetic attraction "preparation" principle of the electromagnetic module 703.

[0056] In addition, the control system presets the maximum temperature difference current difference △I max for power-off. When the current difference △I ≥ the maximum temperature difference current difference △I max for power-off, the electromagnetic module 703 is powered off, that is, the electrical circuit where the electromagnetic module 703 is located is open, and no longer performs electromagnetic magnetic attraction "preparation". When the current difference returns to the maximum temperature difference current range for power-off, the circuit where the electromagnetic module 703 is located is conducted, and corresponding current regulation is performed according to the actual current difference to perform electromagnetic magnetic attraction "preparation". The maximum temperature difference current difference △I max is actually the current of the circuit where the thermistor ring is located when the difference between the air flow temperature and the temperature range corresponding to the standard current range reaches a large degree. For example, when the temperature range corresponding to the standard current range is 75 to 80 °C, when the air flow temperature is 71 °C, 86 °C, etc., the current difference generated by the large gap between the current air flow temperature and the standard temperature required for distillation is also large.

[0057] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A chlorinated mixed distillation treatment device for chlorinated alkane, wherein the distillation treatment device (1) is provided with an evaporation chamber (101), an ascending chamber (102), and a lead-out pipe (105) located above the ascending chamber (102), and an evaporator and a mixed liquid are arranged at the bottom of the evaporation chamber (101), characterized in that: The distillation processing equipment (1) is internally provided with a reflux plate (3), a flow guide frame (4), a temperature resistance plate (5), and a flow control plate (6) located between the evaporation chamber (101) and the rising chamber (102); An airflow ascending groove (301) is provided in the middle area of ​​the return plate (3), and a plurality of first return holes (302) surrounding the airflow ascending groove (301) are provided in the return plate (3); The guide frame (4) is provided with a plurality of guide cones (401), each guide cone (401) is provided with a vertically penetrating conical through hole (402), and the lower ports of all the conical through holes (402) of the guide frame (4) are directly opposite to the airflow ascending groove (301) of the return plate (3); The temperature resistance plate (5) is provided with a plurality of annular thermistor rings (505), an air flow channel (506) is formed inside the thermistor ring (505), the air flow passes through the upper port of the tapered through hole (402) and enters the air flow channel (506) of the thermistor ring (505), the resistance of the thermistor ring (505) changes according to the temperature of the air flow, the temperature resistance plate (5) is provided with a plurality of second return holes (502) around each thermistor ring (505), the air flow channel (506) of the thermistor ring (505) is aligned with the upper port of the tapered through hole (402) of the guide cone (401), and the temperature resistance plate (5) is provided with a first wiring harness (507) and a first electrical plug (508) electrically connected to the thermistor ring (505); The bottom side surface of the flow control plate (6) is provided with a plurality of conical bottom grooves (601) aligned with the positions of the thermistor ring (505); the opening size of the lower side of the conical bottom groove (601) matches the distribution range size of the plurality of second return holes (502) on the ring side of the thermistor ring (505); the flow control plate (6) is provided with an ascending through hole (602) communicating with the conical bottom groove (601); The upper side of the flow control plate (6) is provided with a flow control component (7), the flow control component (7) includes a fixing frame (701), the fixing frame (701) is movably provided with a vertical rod (704), the lower end of the vertical rod (704) is provided with a blocking disk (706) that matches the ascending through hole (602), the vertical rod (704) is sleeved with a light spring (707) that supports the blocking disk (706) downward under tension, the upper end of the vertical rod (704) is provided with an upper end cap (705) made of magnetic material, the upper side of the flow control component (7) is provided with an electromagnetic module (703) that magnetically matches the upper end cap (705), and the control system drives the electromagnetic module (703) at the corresponding position to perform corresponding actions according to the current change of the circuit where the thermistor ring (505) is located; A second wiring harness (708) and a second electrical plug (709) electrically connected to the electromagnetic module (703) are fixedly mounted on the upper side of the flow control plate (6); A sealing ring (8) is provided inside the distillation processing equipment (1), and a sealing ring (801) is provided inside the sealing ring (8) for extrusion contact with the outer surface of the flow control plate (6).

2. A chlorinated alkane chlorination mixed distillation treatment equipment according to claim 1, characterized in that: The wall surface of the evaporation chamber (101) is provided with a reflux pipe (103) communicating with the first reflux hole (302), and the bottom end of the reflux pipe (103) is higher than the upper plane of the mixed liquid; Wherein, a one-way valve (104) is provided at the bottom end of the reflux pipe (103).

3. A chlorinated alkane chlorination mixed distillation treatment equipment according to claim 1, characterized in that: The diameter of the upper end of the tapered through hole (402) is smaller than the diameter of the lower end thereof; A plurality of supporting vertical plates (403) are provided at the edge of the upper side of the guide frame (4), and the supporting vertical plates (403) and the guide cone (401) protrude to the same height from the upper side of the guide frame (4).

4. A chlorinated alkane chlorination mixed distillation treatment equipment according to claim 1, characterized in that: The temperature resistance plate (5) is provided with a plurality of resistor mounting holes (501), and the thermistor ring (505) is mounted at the positions of the resistor mounting holes (501).

5. A chlorinated alkane chlorination mixed distillation treatment equipment according to claim 1, characterized in that: The temperature resistance plate (5) is provided with a pipeline groove (503) and a connector groove (504); the first wiring harness (507) is embedded and installed at the position of the pipeline groove (503); and the first electric plug (508) is embedded and installed at the position of the connector groove (504).

6. A chlorinated alkane chlorination mixed distillation treatment equipment according to claim 1, characterized in that: Assuming the opening size of the lower side of the conical bottom groove (601) is Da, and assuming the radial span size Dc formed by the distribution range of the plurality of second return holes (502) on the ring side of the thermistor ring (505), Da>Dc.

7. A chlorinated alkane chlorination mixed distillation treatment equipment according to claim 1, characterized in that: The fixing frame (701) is provided with a transverse plate (702), a through hole is provided on the transverse plate (702), the vertical rod (704) is movably mounted at the through hole position of the transverse plate (702), and the light spring (707) is located between the transverse plate (702) and the blocking disk (706).

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