Beam spot trajectory measurement device and method

Abstract

The application provides a kind of beam spot trajectory measuring device and method.The beam spot trajectory measuring device includes: support flat plate, the horizontal plate test frame and at least two vertical plate test frames vertically fixedly connected with the support flat plate;The first vertical plate test frame in the horizontal plate test frame and at least two vertical plate test frames is spaced apart, and the adjacent two vertical plate test frames in at least two vertical plate test frames are spaced apart;Wherein, under the action of magnetic field, the electron beam is deflected after passing through the vertical plate test plate of the Nth vertical plate test frame in at least two vertical plate test frames, sequentially passes through N-1 vertical plate test plates, enters the horizontal plate test plate and horizontal plate test block of horizontal plate test frame, and forms electron beam spot on the horizontal plate test block, determines the beam spot trajectory of electron according to the position of the electron beam spot on the horizontal plate test block, and N is positive integer greater than 1.The scheme of the application improves the measurement accuracy and test efficiency.

Description

Technical Field

[0001] This invention relates to the field of electron beams, and more particularly to a beam spot trajectory measurement device and method. Background Technology

[0002] Vacuum electron beam melting involves deflecting an electron beam into a molten pool in a crucible, causing the metal in the pool to melt and form liquid metal. During this process, impurities are evaporated, thus achieving the smelting and purification of the metal.

[0003] Vacuum electron beam evaporation coating works by deflecting an electron beam into a molten crucible. The metal in the molten pool is heated and melts, forming atomic vapor that leaves the surface of the molten metal pool. The evaporated atomic vapor acts on the substrate to form a coating.

[0004] In vacuum electron beam melting and vacuum electron beam evaporation coating processes, if the emitted electron beam trajectory deviates during the metal melting process, it may cause the electron beam to melt the container holding the metal. Therefore, an electron beam trajectory measurement device is needed to test whether the trajectory precisely reaches the metal to be melted without melting other components. Measuring the electron beam trajectory not only reveals important parameters of the electron beam performance, such as beam diameter, beam distribution characteristics, and electron beam divergence angle, but also allows for a comprehensive, accurate, and in-depth analysis of the electron beam. Furthermore, it enables accurate determination of whether the electron beam generated by the electron gun meets the usage requirements. In addition, the beam trajectory measurement device can guide the optimization of the electron gun's structural design and installation debugging.

[0005] A beam spot trajectory measurement device is a characterization device for electron beam trajectories. Existing beam spot trajectory measurement devices are structurally complex, have redundant trajectory measurement points, and are prone to interference with other devices during use, resulting in poor testing accuracy. Furthermore, their installation and use are also complex. In addition, beam spot trajectory measurement devices can only be manually placed and cannot be adapted to trajectory testing in radiation environments. Moreover, the positioning components of beam spot trajectory measurement devices often use bent parts, resulting in poor target plate positioning accuracy and an inability to accurately characterize trajectory parameters. Summary of the Invention

[0006] The technical problem to be solved by the present invention is to provide a beam spot trajectory measurement device and method, which can improve the accuracy and efficiency of beam spot trajectory measurement.

[0007] To solve the above-mentioned technical problems, the technical solution of the present invention is as follows:

[0008] A beam spot trajectory measuring device, comprising:

[0009] Support tablet,

[0010] A horizontal test frame and at least two vertical test frames are vertically and fixedly connected to the support plate.

[0011] The horizontal test frame is spaced apart from the first vertical test frame in at least two vertical test frames, and adjacent vertical test frames in at least two vertical test frames are spaced apart.

[0012] In this process, the electron beam, under the influence of a magnetic field, passes through the vertical test plate of the Nth vertical test frame in at least two vertical test frames and is deflected. After passing through N-1 vertical test plates in sequence, it enters the horizontal test block of the horizontal test frame and forms an electron beam spot on the horizontal test block. The electron beam trajectory is determined based on the position of the electron beam spot on the horizontal test block, where N is a positive integer greater than 1.

[0013] Optionally, the supporting plate includes:

[0014] Fixed plate,

[0015] A gripper portion is fixed perpendicularly to the fixed plate, and the gripper portion is disposed above the fixed plate;

[0016] The fixing plate is provided with multiple positioning blocks, and the horizontal plate test frame and the at least two vertical plate test frames are respectively positioned and fixed by the positioning blocks.

[0017] Optionally, the fixing plate is provided with multiple positioning holes, and the horizontal plate test frame or at least two vertical plate test frames are fixed to the support plate by means of positioning pins passing through the positioning holes.

[0018] Optionally, the transverse test fixture includes:

[0019] Test block base;

[0020] A horizontal test block is set on the base of the test block;

[0021] The first and second columns are fixedly connected to the base of the test block.

[0022] A first horizontal plate support frame fixedly connected to the first column;

[0023] The second horizontal plate support frame is fixedly connected to the second column;

[0024] A horizontal test plate that is snapped into the first horizontal plate support frame and the second horizontal plate support frame;

[0025] A positioning part that is fixedly connected to the first column and the second column;

[0026] The first column and the second column support the horizontal plate test plate through the first horizontal plate support frame and the second horizontal plate support frame, and the horizontal plate test plate is arranged parallel to the horizontal plate test block.

[0027] Optionally, the positioning part includes:

[0028] The top leader;

[0029] The first connecting plate is fixedly connected to the first handle.

[0030] The first positioning pin and the second positioning pin are located at both ends of the first connecting plate.

[0031] A first handle is fixedly installed on the top of the first connecting plate, and a first positioning pin and a second positioning pin are installed on the bottom of the first connecting plate;

[0032] The horizontal test frame is fixedly connected to the support plate 1 by the first positioning pin passing through the first positioning hole and the second positioning pin passing through the second positioning hole.

[0033] Optionally, the horizontal test block is provided with scale lines, and the degree of deflection of the electron beam trajectory is determined by the scale lines.

[0034] Optionally, the vertical plate test frame includes: a first vertical plate test frame and a second vertical plate test frame;

[0035] The second vertical plate test frame is arranged adjacent to the first vertical plate test frame, and the first vertical plate test frame is arranged adjacent to the horizontal plate test frame.

[0036] The first vertical plate test frame and the second vertical plate test frame are arranged in parallel and are both perpendicular to the support plate.

[0037] Optionally, the first vertical plate test fixture includes:

[0038] Second-in-command;

[0039] The second connecting plate is fixedly connected to the second handle;

[0040] The third and fourth positioning pins are fixedly connected to the end of the second connecting plate;

[0041] The first vertical test plate is fixed to the second connecting plate;

[0042] A second handle is fixedly installed above the second connecting plate, and a third positioning pin and a fourth positioning pin are installed below the second connecting plate;

[0043] The first vertical test plate is arranged perpendicularly to the horizontal test plate, and the first vertical test plate is located above the horizontal test plate.

[0044] The first vertical plate test frame is fixedly connected to the support plate by the third positioning pin passing through the third positioning hole and the fourth positioning pin passing through the fourth positioning hole.

[0045] Optionally, the second vertical plate test fixture includes:

[0046] Third in command

[0047] The third connecting plate is fixedly connected to the third handle;

[0048] The fifth and sixth positioning pins are fixedly connected to the end of the third connecting plate;

[0049] The second vertical test plate is fixed to the third connecting plate;

[0050] The fifth positioning pin is symmetrically arranged with the fifth positioning hole, and the sixth positioning pin is symmetrically arranged with the sixth positioning hole;

[0051] A third handle is fixedly installed on the top of the third connecting plate, and a fifth positioning pin and a sixth positioning pin are installed below the third connecting plate;

[0052] The second vertical plate test board is arranged parallel to the first vertical plate test board;

[0053] The second vertical plate test frame is fixedly connected to the support plate by the fifth positioning pin passing through the fifth positioning hole and the sixth positioning pin passing through the sixth positioning hole.

[0054] The present invention also provides a method for measuring beam spot trajectory, applied to the beam spot trajectory measuring device described above, the method comprising:

[0055] Obtain the electron beam spot formed by the electron beam on the horizontal test block of the horizontal test frame. The electron beam spot is formed when the electron beam, under the action of a magnetic field, passes through the vertical test plate of the Nth vertical test frame in at least two vertical test frames and is deflected, passes through N-1 vertical test plates in sequence, and then enters the horizontal test block of the horizontal test frame. N is a positive integer greater than 1.

[0056] The accuracy of the electron beam trajectory is determined by the position of the electron beam spot on the horizontal test block.

[0057] The above-described solution of the present invention has at least the following beneficial effects:

[0058] The layout of the test board was optimized, the number of test boards was reduced, the positioning accuracy of the entire device was improved, interference from other devices was reduced, and the measurement accuracy and testing efficiency were improved. Attached Figure Description

[0059] Figure 1 This is a schematic diagram of the beam spot trajectory measuring device of the present invention;

[0060] Figure 2 This is an exploded view of the beam spot trajectory measuring device of the present invention;

[0061] Figure 3 This is a schematic diagram of the support plate assembly of the present invention;

[0062] Figure 4 This is a schematic diagram of the horizontal plate test frame of the present invention;

[0063] Figure 5 This is a schematic diagram of the first vertical plate test frame of the present invention;

[0064] Figure 6 This is a schematic diagram of step 1 of the horizontal plate test frame installation of the present invention;

[0065] Figure 7 This is a schematic diagram of step 2 of the horizontal plate test frame installation of the present invention;

[0066] Figure 8 This is a schematic diagram of step 3 of the horizontal plate test frame installation of the present invention;

[0067] Figure 9 This is a schematic diagram of the installation of the first vertical plate test frame of the present invention;

[0068] Figure 10 This is a schematic diagram of the installation of the second vertical plate test frame of the present invention;

[0069] Figure 11 This is a schematic diagram of the electron beam bombardment test plate of the present invention.

[0070] Explanation of icon numbers:

[0071] 1. Support plate; 2. Horizontal test frame; 3. First vertical test frame; 4. Second vertical test frame;

[0072] 11. Fixing plate; 12. Gripper; 13. Positioning block; 14. Positioning hole;

[0073] 111. First border; 112. Second border; 113. Third border;

[0074] 131. First positioning block; 132. Second positioning block; 133. Third positioning block; 134. Fourth positioning block;

[0075] 141. First positioning hole; 142. Second positioning hole; 143. Third positioning hole; 144. Fourth positioning hole; 145. Fifth positioning hole; 146. Sixth positioning hole;

[0076] 21. Test block base; 22. Horizontal test block; 23. First column; 24. Second column; 25. Horizontal test plate; 26. Positioning part;

[0077] 221. Scale line; 231. First horizontal plate support frame; 241. Second horizontal plate support frame;

[0078] 261. First handle; 262. First connecting plate; 263. First locating pin; 264. Second locating pin;

[0079] 31. Second handle; 32. Second connecting plate; 33. Third positioning pin; 34. Fourth positioning pin; 35. First vertical plate test plate;

[0080] 41. Third handle; 42. Third connecting plate; 43. Fifth positioning pin; 44. Sixth positioning pin; 45. Second vertical plate test plate. Detailed Implementation

[0081] Exemplary embodiments of the invention will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the invention are shown in the drawings, it should be understood that the invention can be implemented in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided to enable a more thorough understanding of the invention and to fully convey the scope of the invention to those skilled in the art.

[0082] like Figure 1 and Figure 2 As shown, an embodiment of the present invention provides a beam spot trajectory measurement device, comprising:

[0083] A support plate 1, a horizontal test frame 2 and at least two vertical test frames are vertically and fixedly connected to the support plate 1; the horizontal test frame 2 and the first vertical test frame 3 of the at least two vertical test frames are spaced apart, and the two adjacent vertical test frames of the at least two vertical test frames are spaced apart.

[0084] In this process, the electron beam, under the influence of a magnetic field, passes through the vertical test plate of the Nth vertical test frame in at least two vertical test frames and is deflected. After passing through N-1 vertical test plates in sequence, it enters the horizontal test block 22 of the horizontal test frame 2 and forms an electron beam spot on the horizontal test block 22. The electron beam trajectory is determined based on the position of the electron beam spot on the horizontal test block 22, where N is a positive integer greater than 1.

[0085] In this embodiment, there are at least two vertical test plates. The trajectory of the electron beam spot can be determined by the two vertical test plates and the horizontal test plate 2. When there are fewer vertical test plates, the simulated beam trajectory can be determined by connecting the beam spots on the fewer vertical test plates. When there are more vertical test plates, the simulated beam trajectory can be determined by connecting the beam spots on more vertical test plates. Therefore, the vertical test plates on the larger vertical test plate frame can continuously correct the electron beam trajectory, reducing errors in the electron beam trajectory measurement process and making the simulation of the electron beam trajectory more accurate. However, too many vertical test plates will cause redundancy. Therefore, this embodiment optimizes the layout of the vertical and horizontal test plates 25 and places fewer vertical test plates in appropriate positions, improving measurement accuracy while reducing the number of test plates used.

[0086] The number of test fixtures can be selected according to actual needs to meet the requirements of different usage environments. When selecting a vertical test fixture, the appropriate fixture should be chosen based on the required accuracy or test trajectory. This ensures that the beam spot trajectory achieves the expected test accuracy under this setup without wasting test plates. In other words, it allows for a more accurate simulation of the electron beam trajectory using fewer test plates. Furthermore, the placement of the vertical test fixtures also significantly affects the beam spot trajectory test results. Ideally, the distance between the vertical test fixtures should be kept constant to minimize measurement errors.

[0087] In this embodiment, the size of the test board is also changed to meet the needs of different usage environments.

[0088] The beam spot trajectory measuring device in this embodiment has a small overall structure, making it less prone to interference with other devices. Before entering the beam spot trajectory measuring device, the electron beam first enters the detection device to determine whether the electron beam enters the magnetic field at the correct position. When the overall structure of the beam spot trajectory measuring device is large, it will interfere with the detection device. Therefore, the beam spot trajectory measuring device in this embodiment can reduce interference.

[0089] Therefore, in this embodiment, two vertical test frames and one horizontal test frame 2 are used, and the test frames are placed in key positions to realize beam spot trajectory measurement and achieve the expected measurement effect. The layout of the test plates is optimized, the redundant test plates in the existing beam spot trajectory measurement device are eliminated, the efficiency of beam spot trajectory testing is improved, the device cost is saved, and interference between devices can be avoided.

[0090] like Figure 3 As shown, in one optional embodiment, the supporting plate 1 includes:

[0091] A fixed plate 11 and a gripper 12 fixed perpendicularly to the fixed plate 11 are provided above the fixed plate 11. The fixed plate 11 is provided with a plurality of positioning blocks 13. The horizontal plate test frame 2 and the at least two vertical plate test frames are respectively positioned and fixed by the positioning blocks 13.

[0092] In this embodiment, the first frame 111 and the third frame 113 of the fixing plate 11 are arranged parallel to each other, and the first frame 111 and the third frame 113 are connected by the second frame 112. The first frame 111 is provided with a first positioning block 131 and a third positioning block 133. The third frame 113 is provided with a second positioning block 132 and a fourth positioning block 134. The first positioning block 131 and the second positioning block 132 are symmetrically arranged about the center line of the second frame 112. The third positioning block 133 and the fourth positioning block 134 are symmetrically arranged about the center line of the second frame 112. The arrangement of the positioning block 13 is beneficial to maintaining the same distance between the horizontal plate test frame 2 and the vertical plate test frame and the first frame 111 and the third frame 113 of the fixing plate 11 during installation, which facilitates positioning and improves the accuracy of beam spot trajectory measurement.

[0093] In this embodiment, the beam spot trajectory measuring device is tested by placing the gripper 12 in the test environment. The gripper 12 is fixedly connected to the fixing plate 11. By clamping the gripper 12 with a machine tool, the beam spot trajectory measuring device can be placed in the radiation environment, realizing the adaptation of the beam spot trajectory measuring device to the automation system in the radiation environment. The gripper 12 is machined with a stepped gripping structure, and the knurled surface of the structure improves the surface friction coefficient, which is beneficial for gripping and fastening.

[0094] In addition, both the horizontal test frame 2 and the vertical test frame are fixed with handles. According to the needs of trajectory testing, the machine tool clamps the handles to fix the horizontal test frame 2 or the vertical test frame to the beam spot trajectory measuring device, so as to realize the adaptation of the beam spot trajectory measuring device to the automated system in the radiation environment. The handles are machined with a stepped gripping structure, and the knurled surface of the structure is used to improve the surface friction coefficient, which is conducive to gripping and fastening.

[0095] In one optional embodiment, the fixing plate 11 is provided with a plurality of positioning holes 14, and the horizontal plate test frame 2 or at least two vertical plate test frames are fixed to the support plate 1 by means of positioning pins passing through the positioning holes 14.

[0096] In this embodiment, the first frame 111 of the fixing plate 11 is provided with a first positioning hole 141, a third positioning hole 143 and a fifth positioning hole 145, and the third frame 113 of the fixing plate 11 is provided with a second positioning hole 142, a fourth positioning hole 144 and a sixth positioning hole 146.

[0097] The first positioning hole 141 and the second positioning hole 142 are symmetrically arranged about the center line of the second frame 112, the third positioning hole 143 and the fourth positioning hole 144 are symmetrically arranged about the center line of the second frame 112, and the fifth positioning hole 145 and the sixth positioning hole 146 are symmetrically arranged about the center line of the second frame 112.

[0098] In this embodiment, the positioning structure is optimized, eliminating the traditional "plate-slot" positioning method in the measurement structure and adopting a "column-hole" positioning method. Furthermore, all bent parts are eliminated, replaced by machined parts, ensuring the dimensional accuracy of each component and improving the overall positioning accuracy of the device. The plate-slot positioning insert has a placement error of ±1mm, while the column-hole fit achieves ±0.1mm. The column and hole are directly inserted; the "plate-slot" must be larger for easy plate placement. Therefore, the "column-hole" positioning greatly improves positioning accuracy. Positioning pins and holes on the positioning plate achieve positioning. The positioning pins adopt a two-section structure: a conical front section and a cylindrical rear section. This facilitates insertion into the positioning hole 14 and effectively prevents the test plate from swaying after mating with the positioning hole 14. The positioning holes 14 on the support plate 1 and the positioning pins on each test frame have a clearance fit, with a positioning accuracy ≤0.1mm.

[0099] The specific installation method in this embodiment is as follows: Figures 6-10 , Figure 6 , Figure 7 and Figure 8 The horizontal test frame 2 is positioned and fixed on the support plate 1 by the positioning block 13. Figure 9 The first vertical test frame 3 is fixed to the support plate 1 by the positioning component. Figure 10 The second vertical plate test frame 4 is positioned by the positioning component and then fixed on the support plate 1. If an additional vertical plate test frame is added, it is installed on the left side of the second vertical plate test frame 4 and fixed on the support plate 1.

[0100] like Figure 4 As shown, in one optional embodiment, the horizontal test frame 2 includes:

[0101] Test block base 21; horizontal test block 22 disposed on the test block base 21; first column 23 and second column 24 fixedly connected to the test block base 21; first horizontal support frame 231 fixedly connected to the first column 23; second horizontal support frame 241 fixedly connected to the second column 24; horizontal test plate 25 snapped into the first horizontal support frame 231 and the second horizontal support frame 241; positioning part 26 fixedly connected to the first column 23 and the second column 24; the first column 23 and the second column 24 support the horizontal test plate 25 through the first horizontal support frame 231 and the second horizontal support frame 241, and the horizontal test plate 25 is arranged parallel to the horizontal test block 22.

[0102] In this embodiment, the horizontal test plate 25 and the horizontal test block 22 are arranged in parallel on a horizontal test frame 2, which combines the marking of the trajectory and the formation of the beam spot, thus improving the accuracy of the beam spot trajectory measurement. The horizontal test block 22 is thicker than the horizontal test plate 25, as it needs to withstand more heat. Only a thicker block can withstand more heat. In this embodiment, the horizontal test block 22 and the horizontal test plate 25 are made of molybdenum. The horizontal test plate 25 is structurally adjacent to the first vertical test plate 35, thereby ensuring that the horizontal test plate 25 can withstand the electron beam passing through the first vertical test plate 35.

[0103] In one optional embodiment, the positioning part 26 includes:

[0104] A first handle 261; a first connecting plate 262 fixedly connected to the first handle 261; a first positioning pin 263 and a second positioning pin 264 disposed at both ends of the first connecting plate 262; the first handle 261 is fixedly disposed directly above the first connecting plate 262; the first positioning pin 263 and the second positioning pin 264 are disposed below the first connecting plate 262; the horizontal plate test frame 2 is fixedly connected to the support plate 1 through the first positioning pin 263 passing through the first positioning hole 141 and the second positioning pin 264 passing through the second positioning hole 142.

[0105] In this embodiment, the first handle 261 is machined with a stepped gripping structure, and the knurled surface of this structure increases the surface friction coefficient, which is beneficial for gripping and securing. Positioning is achieved through the positioning pin and the hole on the positioning plate. The positioning pin has a two-section structure: a conical front section and a cylindrical rear section. This facilitates insertion into the positioning hole 14 and effectively prevents the test plate from swaying after engaging with the positioning hole 14. The positioning hole 14 on the support plate 1 and the positioning pin on each test frame are in clearance fit, with a positioning accuracy ≤0.1mm.

[0106] In one optional embodiment, the horizontal test block 22 is provided with scale lines 221, and the degree of deflection of the electron beam trajectory is determined by the scale lines 221.

[0107] In this embodiment, the horizontal test block 22 is provided with a scale line 221. When the electron beam spot falls on the horizontal test block 22, the scale line 221 is used to determine whether the electron beam spot falls at the expected position. That is, the position of the electron beam spot in the crucible molten pool containing the metal is read, or the direction and amount of deviation of the electron beam spot trajectory are determined according to the scale line 221, so that it is easy to adjust according to the position shown by the scale line 221.

[0108] like Figure 5 As shown, in one optional embodiment, the vertical plate test frame includes: a first vertical plate test frame 3 and a second vertical plate test frame 4; the second vertical plate test frame 4 is arranged adjacent to the first vertical plate test frame 3, the first vertical plate test frame 3 is arranged adjacent to the horizontal plate test frame 2, and the first vertical plate test frame 3 and the second vertical plate test frame 4 are arranged parallel to each other and both are perpendicular to the support plate 1.

[0109] In one optional embodiment, the first vertical test frame 3 includes:

[0110] A second handle 31; a second connecting plate 32 fixedly connected to the second handle 31; a third positioning pin 33 and a fourth positioning pin 34 fixedly connected to the end of the second connecting plate 32; a first vertical test plate 35 fixedly mounted on the second connecting plate 32; a second handle 31 fixedly mounted above the second connecting plate 32, and a third positioning pin 33 and a fourth positioning pin 34 mounted below the second connecting plate 32; the first vertical test plate 35 is perpendicular to the horizontal test plate 25, and is located above the horizontal test plate 25; the first vertical test plate 3 is fixedly connected to the support plate 1 by the third positioning pin 33 passing through the third positioning hole 143 and the fourth positioning pin 34 passing through the fourth positioning hole 144.

[0111] In this embodiment, the second handle 31 is machined with a stepped gripping structure, and the knurled surface of this structure increases the surface friction coefficient, which is beneficial for gripping and securing. The positioning pin adopts a two-section structure of a front conical section and a rear cylindrical section, which facilitates its insertion into the positioning hole 14 and effectively prevents the test plate from swaying after engaging with the positioning hole 14.

[0112] In one optional embodiment, the second vertical test frame 4 includes:

[0113] A third handle 41; a third connecting plate 42 fixedly connected to the third handle 41; a fifth positioning pin 43 and a sixth positioning pin 44 fixedly connected to the end of the third connecting plate 42; a second vertical plate test plate 45 fixedly mounted on the third connecting plate 42; the fifth positioning pin 43 and the fifth positioning hole 145 are symmetrically arranged, and the sixth positioning pin 44 and the sixth positioning hole 146 are symmetrically arranged; a third handle 41 is fixedly mounted directly above the third connecting plate 42, and a fifth positioning pin 43 and a sixth positioning pin 44 are mounted below the third connecting plate 42; the second vertical plate test plate 45 is parallel to the first vertical plate test plate 35; the second vertical plate test frame 4 is fixedly connected to the support plate 1 by the fifth positioning pin 43 passing through the fifth positioning hole 145 and the sixth positioning pin 44 passing through the sixth positioning hole 146.

[0114] In the above embodiments of the present invention, the beam spot trajectory testing device, once assembled, is a single unit that can be installed as needed. Each component is equipped with a gripping structure for matching an automated system, enabling beam spot trajectory testing to be performed under radiation conditions. Each test frame is installed with a clearance fit, and the positioning pins and positioning holes 14 are precision machined to a positioning accuracy of ≤0.1mm. Furthermore, the spacing between each positioning hole 14 is strictly machined according to the drawing requirements, ensuring dimensional accuracy and thus guaranteeing the positional accuracy of each test point. The positioning components of the beam spot trajectory testing device are all machined, ensuring the dimensional accuracy of each part. The beam spot trajectory testing device optimizes the layout of the test plates, eliminating redundant test plates in existing beam spot trajectory testing devices, improving the efficiency of beam spot trajectory testing, and saving device costs. The number of test frames and the size of the test plates can be changed according to actual needs to meet different usage environments.

[0115] like Figure 11 As shown, embodiments of the present invention also provide a beam spot trajectory measurement method, applied to the beam spot trajectory measurement device described above, the method comprising:

[0116] Step 111: Obtain the electron beam spot formed by the electron beam on the horizontal test block 22 of the horizontal test frame 2. The electron beam spot is formed by the electron beam passing through the vertical test plate of the Nth vertical test frame in at least two vertical test frames under the action of the magnetic field, being deflected, passing through N-1 vertical test plates in sequence, and entering the horizontal test block 22 of the horizontal test frame 2. N is a positive integer greater than 1.

[0117] Step 112: Determine whether the electron beam trajectory is accurate based on the position of the electron beam spot on the horizontal test block 22.

[0118] The method described in this embodiment, specifically implemented as follows:

[0119] The machine tool grips the gripper 12 on the beam spot trajectory measuring device and places it in a magnetic field environment. According to the pre-set running trajectory of the electron beam, magnetic fields are set in different directions of the test environment to deflect the electron beam in different directions according to the predetermined trajectory.

[0120] The electron gun releases an electron beam;

[0121] The electron beam passes through the second vertical plate test plate 45 on the second vertical plate test frame 4 under the action of the magnetic field;

[0122] The electron beam that passes through the second vertical test plate 45 passes through the first vertical test plate 35;

[0123] The electron beam that passes through the first vertical test plate 35 passes through the horizontal test plate 25;

[0124] The electron beam passing through the horizontal test plate 25 falls on the horizontal test block 22, resulting in an electron beam spot.

[0125] The position of the electron beam spot is read from the scale line 221 on the horizontal test block 22, and the position of the spot on the vertical test plate and the horizontal test plate 25 are used to determine whether the electron beam trajectory deflects as expected.

[0126] In the above embodiments of the present invention, the horizontal test block 22 is equivalent to a crucible for smelting metal in actual working conditions. The position of the electron beam spot falling on the crucible is determined by the scale line 221 on the horizontal test block 22. At the same time, the electron beam bombardment position on the second vertical test plate 45, the electron beam bombardment position on the first vertical test plate 35, and the electron beam bombardment position on the horizontal test plate 25 are calibrated in the same coordinate system. Thus, on the one hand, the position accuracy of each bombardment point is obtained by comparing each bombardment point with the expected point, and on the other hand, the beam spot trajectory is obtained by curve fitting.

[0127] By optimizing the test board layout, the number of test fixtures and the size of the test boards can be changed according to actual needs to meet the requirements of different usage environments and application conditions. Reducing the number of test boards eliminates redundant test boards in existing beam pattern trajectory testing devices, improving the efficiency of beam pattern trajectory testing and saving equipment costs. Optimizing the test board layout also reduces the structural size of the measurement device and minimizes interference with other devices.

[0128] By using machine tools to process parts, and by employing "column-hole" positioning and adding positioning blocks 13 and positioning rods, the positioning accuracy of the positioning components is improved, thereby improving the measurement accuracy.

[0129] Automated testing in a radiation environment is achieved through the gripper 12. The beam spot trajectory testing structure is relatively small and lightweight, and it is easy to place in the radiation environment by clamping the gripper 12 with a machine tool. The number of test frames can also be increased or decreased by clamping the machine tool handle, thereby achieving automated testing in a radiation environment.

[0130] The above description represents the preferred embodiments of the present invention. It should be noted that those skilled in the art can make various improvements and modifications without departing from the principles of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A beam spot trajectory measuring device, characterized in that, include: Support plate (1), A horizontal test frame (2) and at least two vertical test frames are vertically fixedly connected to the support plate (1); The horizontal test frame (2) is spaced apart from the first vertical test frame (3) of at least two vertical test frames, and two adjacent vertical test frames of at least two vertical test frames are spaced apart; Under the influence of a magnetic field, the electron beam deflects after passing through the vertical test plate of the Nth vertical test frame in at least two vertical test frames. After passing through N-1 vertical test plates in sequence, it enters the horizontal test block (22) of the horizontal test frame (2) and forms an electron beam spot on the horizontal test block (22). The electron beam spot trajectory is determined according to the position of the electron beam spot on the horizontal test block (22), where N is a positive integer greater than 1.

2. The beam spot trajectory measuring device according to claim 1, characterized in that, The supporting plate (1) includes: Fixing plate (11), A gripper (12) is fixed perpendicularly to the fixing plate (11), and the gripper (12) is disposed above the fixing plate (11); The fixing plate (11) is provided with a plurality of positioning blocks (13), and the horizontal plate test frame (2) and the at least two vertical plate test frames are respectively positioned and fixed by the positioning blocks (13).

3. The beam spot trajectory measuring device according to claim 2, characterized in that, The fixing plate (11) is provided with a plurality of positioning holes (14). The horizontal plate test frame (2) or at least two vertical plate test frames are fixed to the support plate (1) by means of positioning pins passing through the positioning holes (14).

4. The beam spot trajectory measuring device according to claim 1, characterized in that, The horizontal test frame (2) includes: Test block base (21); The horizontal test block (22) is set on the test block base (21); The first column (23) and the second column (24) are fixedly connected to the test block base (21). The first horizontal plate support frame (231) is fixedly connected to the first column (23); The second horizontal plate support frame (241) is fixedly connected to the second column (24); A horizontal test plate (25) that is snapped into the first horizontal plate support frame (231) and the second horizontal plate support frame (241); The positioning part (26) is fixedly connected to the first column (23) and the second column (24); The first column (23) and the second column (24) support the horizontal plate test plate (25) through the first horizontal plate support frame (231) and the second horizontal plate support frame (241), and the horizontal plate test plate (25) is arranged parallel to the horizontal plate test block (22).

5. The beam spot trajectory measuring device according to claim 4, characterized in that, The positioning part (26) includes: The top leader (261); The first connecting plate (262) is fixedly connected to the first handle (261). The first positioning pin (263) and the second positioning pin (264) are disposed at both ends of the first connecting plate (262). A first handle (261) is fixedly installed on the top of the first connecting plate (262), and a first positioning pin (263) and a second positioning pin (264) are installed below the first connecting plate (262); The horizontal test frame (2) is fixedly connected to the support plate (1) by the first positioning pin (263) passing through the first positioning hole (141) and the second positioning pin (264) passing through the second positioning hole (142).

6. The beam spot trajectory measuring device according to claim 4, characterized in that, The horizontal test block (22) is provided with scale lines (221), and the degree of deflection of the electron beam trajectory is determined by the scale lines (221).

7. The beam spot trajectory measuring device according to claim 4, characterized in that, The vertical plate test frame includes: a first vertical plate test frame (3) and a second vertical plate test frame (4); The second vertical plate test frame (4) is arranged adjacent to the first vertical plate test frame (3), and the first vertical plate test frame (3) is arranged adjacent to the horizontal plate test frame (2). The first vertical plate test frame (3) and the second vertical plate test frame (4) are arranged in parallel and are both perpendicular to the support plate (1).

8. The beam spot trajectory measuring device according to claim 7, characterized in that, The first vertical plate test frame (3) includes: Second in command (31); A second connecting plate (32) is fixedly connected to the second handle (31); The third positioning pin (33) and the fourth positioning pin (34) are fixedly connected to the end of the second connecting plate (32); The first vertical test plate (35) is fixed on the second connecting plate (32); A second handle (31) is fixedly installed above the second connecting plate (32), and a third positioning pin (33) and a fourth positioning pin (34) are installed below the second connecting plate (32); The first vertical test plate (35) is set perpendicularly to the horizontal test plate (25), and the first vertical test plate (35) is above the horizontal test plate (25). The first vertical plate test frame (3) is fixedly connected to the support plate (1) by the third positioning pin (33) passing through the third positioning hole (143) and the fourth positioning pin (34) passing through the fourth positioning hole (144).

9. The beam spot trajectory measuring device according to claim 7, characterized in that, The second vertical plate test frame (4) includes: The third in command (41), A third connecting plate (42) fixedly connected to the third handle (41); The fifth positioning pin (43) and the sixth positioning pin (44) are fixedly connected to the end of the third connecting plate (42); The second vertical test plate (45) is fixed on the third connecting plate (42); The fifth positioning pin (43) is symmetrically arranged with the fifth positioning hole (145), and the sixth positioning pin (44) is symmetrically arranged with the sixth positioning hole (146); A third handle (41) is fixedly installed on the top of the third connecting plate (42), and a fifth positioning pin (43) and a sixth positioning pin (44) are installed below the third connecting plate (42); The second vertical plate test plate (45) is arranged parallel to the first vertical plate test plate (35); The second vertical plate test frame (4) is fixedly connected to the support plate (1) by the fifth positioning pin (43) passing through the fifth positioning hole (145) and the sixth positioning pin (44) passing through the sixth positioning hole (146).

10. A method for measuring beam spot trajectory, applied to the beam spot trajectory measuring apparatus as described in any one of claims 1 to 9, the method comprising: Obtain the electron beam spot formed on the horizontal test block (22) of the horizontal test frame (2). The electron beam spot is formed when the electron beam, under the action of the magnetic field, passes through the vertical test plate of the Nth vertical test frame in at least two vertical test frames and is deflected, passes through N-1 vertical test plates in sequence, and enters the horizontal test block (22) of the horizontal test frame (2). N is a positive integer greater than 1. The accuracy of the electron beam trajectory is determined by the position of the electron beam spot on the horizontal test block (22).

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