Mask, gluing method and display panel

Abstract

Embodiments of the present application provide a mask, a gluing method and a display panel, and relate to the technical field of display. The embodiments are used to solve the problem of a large slope angle of organic glue in the prior art. The mask comprises a shielding portion, an edge of the shielding portion has a plurality of protrusions, the protrusions extend along a first direction, and the first direction is a direction from the shielding portion to a direction away from the shielding portion. By arranging the plurality of protrusions on the edge of the mask, the organic glue protrusions can be formed on the edges of the organic glue pattern on the to-be-glued base layer. The self-leveling property of the organic glue protrusions is utilized, so that the glue-free areas between the organic glue protrusions are filled with the peripheral organic glue, thereby the thickness difference between the boundary of the finally formed organic glue and the middle part of the organic glue can be reduced, and further the slope angle of the boundary of the organic glue can be effectively reduced.

Description

Technical Field

[0001] This application relates to the field of display technology, and more specifically, to a photomask, a coating method, and a display panel. Background Technology

[0002] During the manufacturing process of display panels, a slope angle is formed at the boundary of the organic adhesive. The slope angle directly affects the film formation quality of the subsequent film layer covering the surface of the organic adhesive, and also directly affects the stress of the subsequent film layer at the slope angle.

[0003] In existing technologies, the slope angle of organic adhesives is controlled by adjusting process equipment parameters. However, this method is not effective enough in reducing the slope angle of organic adhesives, thus affecting product quality. Summary of the Invention

[0004] In order to overcome the technical problems mentioned in the above technical background, this application provides a photomask, the photomask including a blocking portion, and a plurality of protrusions are provided on the edge of the blocking portion along the circumference of the blocking portion. The protrusions extend along a first direction, the first direction being from the blocking portion to the direction away from the blocking portion.

[0005] In one possible implementation, the protrusion is a strip-shaped structure;

[0006] Preferably, the orthographic projection of the protrusion on the substrate to be coated with adhesive is rectangular.

[0007] In one possible implementation, the width of the orthographic projection of the protrusion on the substrate to be coated is 0.5μm-5μm, and / or the length of the orthographic projection of the protrusion on the substrate to be coated is 5μm-15μm, and / or the distance between the orthographic projections of two adjacent protrusions on the substrate to be coated is 0.5μm-5μm.

[0008] In one possible implementation, a plurality of the protrusions are evenly arranged on the edge of the shielding portion.

[0009] In one possible implementation, the width of the orthographic projection of the end of the protrusion near the shielding portion onto the substrate to be coated is smaller than the width of the orthographic projection of the end of the protrusion away from the shielding portion onto the substrate to be coated.

[0010] Preferably, the width of the orthographic projection of the protrusion on the substrate to be coated with adhesive gradually increases from the end of the protrusion near the shielding portion to the end of the protrusion away from the shielding portion.

[0011] In one possible implementation, the protrusion has at least one gentle beam extending along a second direction, which forms an angle with the first direction;

[0012] Preferably, the included angle is a right angle.

[0013] In one possible implementation, the orthographic projection of the leveling beam onto the substrate to be coated with adhesive is rectangular;

[0014] Preferably, the extension length of the leveling beam gradually increases in the second direction from near the shielding portion to away from the shielding portion;

[0015] Preferably, the spacing between two adjacent leveling beams gradually decreases in the first direction from near the shielding portion to away from the shielding portion.

[0016] In one possible implementation, the width of the orthographic projection of the end of the smoothing beam near the shielding part onto the substrate to be coated is smaller than the width of the orthographic projection of the end of the smoothing beam away from the shielding part onto the substrate to be coated.

[0017] Preferably, the width of the orthographic projection of the gradual leveling beam on the substrate to be coated gradually increases from the end of the gradual leveling beam near the shielding part to the end of the gradual leveling beam away from the shielding part.

[0018] In one possible implementation, this application also provides a method for applying adhesive, the method comprising:

[0019] Provide a substrate to be coated with adhesive;

[0020] Apply a layer of organic adhesive to the adhesive surface of the substrate to be coated;

[0021] Based on the photomask described in this application, a photolithographic pattern is formed on the substrate to be coated with adhesive using exposure and development processes.

[0022] Remove the organic adhesive that has not formed a photolithographic pattern from the substrate to be coated;

[0023] The substrate to be coated is dried after removing the organic adhesive that has not formed a photolithographic pattern, in order to complete the adhesive coating process on the substrate.

[0024] In one possible implementation, this application also provides a display panel prepared using the photomask described in this application.

[0025] Compared with the prior art, this application has the following beneficial effects:

[0026] This application provides a photomask, a coating method, and a display panel. By setting multiple protrusions on the edge of the photomask, organic adhesive ridges can be formed on the edge of the organic adhesive pattern on the substrate to be coated. Utilizing the leveling properties of the organic adhesive ridges, the uncoated areas between the ridges are filled by the surrounding organic adhesive, thereby reducing the thickness difference between the boundary and the center of the final organic adhesive and effectively reducing the slope angle of the organic adhesive boundary. Attached Figure Description

[0027] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a top view of a photomask in the prior art provided in this embodiment;

[0029] Figure 2 This is a cross-sectional schematic diagram of an organic adhesive formed using a photomask in the prior art, as provided in this embodiment.

[0030] Figure 3 A top view schematic diagram of the first type of photomask provided in this embodiment;

[0031] Figure 4 This is a schematic diagram of the photolithographic pattern formed by the first type of mask before leveling, as provided in this embodiment.

[0032] Figure 5 This is a top view of the second type of photomask provided in this embodiment;

[0033] Figure 6 This is a top view of the third type of photomask provided in this embodiment;

[0034] Figure 7 This is a schematic diagram of the photolithographic pattern formed by the third type of mask before leveling, as provided in this embodiment.

[0035] Figure 8 This is a top view of the fourth type of photomask provided in this embodiment;

[0036] Figure 9 This is a schematic flowchart of an adhesive application method provided in this embodiment.

[0037] Figure reference numerals: 1. Mask; 11. Masking part; 12. Raised part; 13. Gradient beam; 2. Slope angle; 3. Base layer to be coated with adhesive; 31. Organic adhesive raised strip; 32. Organic adhesive pattern; 33. No adhesive area; 34. Gradient raised strip. Detailed Implementation

[0038] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0039] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0040] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0041] In the description of this application, it should be noted that the terms "upper," "lower," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product is in use. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0042] It should be noted that, where there is no conflict, different features in the embodiments of this application can be combined with each other.

[0043] Please see Figure 1 Currently, the mask 1 used for applying adhesive to the substrate includes a masking portion 11. After applying an organic adhesive layer to the substrate (such as a glass substrate), the mask 1 forms an organic adhesive pattern on the organic adhesive layer. The remaining organic adhesive, excluding the pattern, is then removed, thus completing the adhesive application process on the substrate. Please refer to [link to relevant documentation]. Figure 2 Because organic adhesives have leveling properties, a slope angle of 2 will be formed at the boundaries of the organic adhesive (e.g., Figure 2 Angle A) in the slope angle 2 will affect the quality of the film layer covering the organic adhesive layer, and ultimately affect the quality of the finished product.

[0044] In view of this, please see Figure 3This embodiment provides a photomask 1, which includes a blocking portion 11. Along the circumference of the blocking portion 11, a plurality of protrusions 12 are provided on the edge of the blocking portion 11. The protrusions 12 extend along a first direction B, where the first direction B is from the blocking portion 11 to a direction away from the blocking portion 11 (i.e.,...). Figure 3 The direction pointed to by the middle arrow B is the first direction B).

[0045] The masking portion 11 of the photomask 1 is used to block light transmission during exposure of the organic adhesive, so as to form a corresponding pattern on the organic adhesive layer of the substrate to be coated. Through the photomask 1, a pattern can be formed on the substrate 3 to be coated, such as... Figure 4 The pattern shown is an organic adhesive pattern 32, organic adhesive raised strips 31, and an adhesive-free area 33. The blocking portion 11 corresponds to the organic adhesive pattern 32, the raised strips 12 correspond to the organic adhesive raised strips 31, and the blank area between the raised strips 12 corresponds to the adhesive-free area 33.

[0046] Because of the leveling properties of the organic adhesive, the edges of the organic adhesive protrusions 31 and the organic adhesive pattern 32 will flow outwards, eventually filling the adhesive-free area 33. The presence of the organic adhesive protrusions 31 increases the amount of adhesive at the final organic adhesive boundary, thereby reducing the thickness difference between the boundary and the center of the final organic adhesive, and thus effectively reducing the slope angle 2 of the organic adhesive boundary.

[0047] Based on the above design, this application sets multiple protrusions 12 on the edge of the mask plate 1, which can form organic adhesive protrusions 31 on the edge of the organic adhesive pattern 32 on the substrate to be coated. By utilizing the leveling properties of the organic adhesive protrusions 31, the adhesive-free area 33 between the organic adhesive protrusions 31 is filled by the surrounding organic adhesive, thereby reducing the thickness difference between the boundary and the center of the final organic adhesive, and thus effectively reducing the slope angle 2 of the organic adhesive boundary.

[0048] In one possible implementation, please see again Figure 3 The protrusion 12 is a strip-shaped structure. By setting the protrusion 12 as a strip-shaped structure, an organic adhesive protrusion 31 with a strip-shaped orthographic projection can be formed on the substrate 3 to be coated with adhesive. Since the edge of the strip is a straight line, the amount of adhesive flowing in all directions of the organic adhesive protrusion 31 is basically equal, thereby reducing the difference in the amount of adhesive flowing in all directions of the organic adhesive protrusion 31, and thus making the thickness of the boundary of the final organic adhesive more uniform.

[0049] Preferably, please see again. Figure 3The protrusion 12 has a rectangular orthographic projection on the substrate 3 to be coated with adhesive. Through the protrusion 12 of the shielding part 11, an organic adhesive protrusion 31 with a rectangular orthographic projection can be formed on the substrate 3 to be coated with adhesive. Since the edges of the rectangle are straight and more regular, the amount of adhesive flowing in all directions of the organic adhesive protrusion 31 is more equal, thereby reducing the difference in the amount of adhesive flowing in all directions of the organic adhesive protrusion 31, and thus making the thickness of the boundary of the final organic adhesive more uniform.

[0050] In one possible implementation, please see again Figure 3 The width D1 of the orthographic projection of the protrusion 12 on the substrate 3 to be coated with adhesive is 0.5μm-5μm, for example, the width D1 can be 0.5μm, 1μm, 2μm, 3μm, 4μm, 4.5μm and 5μm, etc.; and / or, the length D2 of the orthographic projection of the protrusion 12 on the substrate 3 to be coated with adhesive is 5μm-15μm, for example, the length D2 can be 5μm, 7μm, 10μm, 13μm and 15μm, etc.; and / or, the distance D3 between the orthographic projections of two adjacent protrusions 12 on the substrate 3 to be coated with adhesive is 0.5μm-5μm, for example, the distance D3 can be 0.5μm, 1μm, 2μm, 3μm, 4μm, 4.5μm and 5μm, etc. By reasonably setting the width, length and gap between two adjacent protrusions 12, organic adhesive protrusions 31 with more suitable width, length and spacing can be formed on the substrate 3 to be coated with adhesive, thereby making the thickness of the final organic adhesive boundary more uniform.

[0051] In one possible implementation, please see again Figure 3 The protrusions 12 are evenly distributed on the edge of the shielding portion 11. If the protrusions 12 on the edge of the shielding portion 11 are not evenly distributed, that is, the distance between two adjacent protrusions 12 is not equal, then the distance between two adjacent organic adhesive protrusions 31 formed on the substrate 3 to be coated with adhesive based on the mask 1 will also be unequal. If the distance between two adjacent organic adhesive protrusions 31 is not equal, the amount of adhesive flowing from the organic adhesive protrusions 31 to different adhesive-free areas 33 will be different, resulting in uneven thickness of the final organic adhesive boundary. Therefore, by evenly distributing the protrusions 12 on the edge of the shielding portion 11, the thickness of the final organic adhesive boundary can be made more uniform.

[0052] In one possible implementation, please see Figure 5 The width of the orthographic projection of the end of the protrusion 12 near the shielding part 11 on the substrate 3 to be coated with adhesive is smaller than the width of the orthographic projection of the end of the protrusion 12 away from the shielding part 11 on the substrate 3 to be coated with adhesive.

[0053] The glue-free area 33 near the organic adhesive pattern 32 is mainly filled by the flow of the organic adhesive pattern 32 and the portion of the organic adhesive protrusions 31 near the organic adhesive pattern 32, while the glue-free area 33 away from the organic adhesive pattern 32 is mainly filled by the flow of the organic adhesive protrusions 31 away from the organic adhesive pattern 32.

[0054] The width of the organic adhesive protrusions 31 formed on the substrate 3 to be coated by the mask 1 at the end near the organic adhesive pattern 32 is smaller than the width of the organic adhesive protrusions 31 away from the organic adhesive pattern 32. Therefore, the amount of adhesive on the portion of the organic adhesive protrusions 31 near the end of the organic adhesive pattern 32 is less than the amount of adhesive on the portion of the organic adhesive protrusions 31 away from the end of the organic adhesive pattern 32. Consequently, the amount of adhesive flowing from the portion of the organic adhesive protrusions 31 near the end of the organic adhesive pattern 32 to the adhesive-free area 33 is less than the amount of adhesive flowing from the portion of the organic adhesive protrusions 31 away from the end of the organic adhesive pattern 32 to the adhesive-free area 33. However, the organic adhesive pattern 32 will flow towards the adhesive-free area 33 near the organic adhesive pattern 32. In this way, the difference between the amount of adhesive flowing to the adhesive-free area 33 away from the organic adhesive pattern 32 and the amount of adhesive flowing to the adhesive-free area 33 close to the organic adhesive pattern 32 can be reduced, thereby further reducing the thickness difference between the boundary and the center of the finally formed organic adhesive, and thus further effectively reducing the slope angle 2 of the organic adhesive boundary.

[0055] Preferably, please see again. Figure 5 The width of the orthographic projection of the protrusion 12 on the substrate 3 to be coated with adhesive gradually increases from the end of the protrusion 12 near the blocking portion 11 to the end of the protrusion 12 away from the blocking portion 11. The organic adhesive protrusion 31 formed on the substrate 3 to be coated with adhesive through the mask 1 is trapezoidal, and the width of the organic adhesive protrusion 31 near the organic adhesive pattern 32 is smaller than the width away from the organic adhesive pattern 32. In this way, the thickness of the organic adhesive filling the adhesive-free area 33 can be more uniform, thereby further and more effectively reducing the slope angle 2 of the organic adhesive boundary.

[0056] In one possible implementation, please see Figure 6 The protrusion 12 has at least one leveling beam 13, which extends along a second direction, forming an angle with the first direction B. See also... Figure 7 The smoothing beam 13 of the mask plate 1 can form a smoothing protrusion 34 at the corresponding position of the substrate 3 to be coated with adhesive. The smoothing protrusion 34 can flow adhesive into the adhesive-free area 33. Thus, the amount of adhesive filling the adhesive-free area 33 includes the amount of adhesive from the organic adhesive protrusion 31 and the smoothing protrusion 34, thereby further reducing the thickness difference between the boundary and the center of the final organic adhesive.

[0057] Preferably, please see again. Figure 6 The included angle is a right angle. Please refer again. Figure 7 The organic adhesive protrusions 31 and the smoothing protrusions 34 formed on the substrate 3 to be coated by the mask 1 are perpendicular to each other. Therefore, the amount of adhesive flowing to the adhesive-free area 33 through the smoothing protrusions 34 is more uniform.

[0058] In one possible implementation, please see again Figure 6 The orthographic projection of the smoothing beam 13 onto the substrate 3 to be coated with adhesive is rectangular. The smoothing protrusion 34 formed on the substrate 3 through the mask 1 is rectangular with straight edges. Therefore, the amount of adhesive flowing outwards from the smoothing protrusion 34 is less uneven.

[0059] Preferably, please see again. Figure 6 Along the direction from near the shielding portion 11 to away from the shielding portion 11, the extension length of the smooth beam 13 in the second direction gradually increases.

[0060] Please see again Figure 7 Along the direction from near to far from the organic adhesive pattern 32, the extension length of the gently sloping raised strips 34 formed on the substrate 3 to be coated with adhesive by the mask 1 gradually increases in the second direction. The longer the extension length of the gently sloping raised strips 34 in the second direction, the more adhesive flows to the adhesive-free area 33. Along the direction from near to far from the organic adhesive pattern 32, the amount of adhesive flowing from the organic adhesive pattern 32 to the adhesive-free area 33 gradually decreases, while the amount of adhesive flowing from the gently sloping raised strips 34 to the adhesive-free area 33 gradually increases. Therefore, the thickness difference of the boundary portion of the finally formed organic adhesive can be reduced, thereby further effectively reducing the slope angle 2 of the organic adhesive boundary.

[0061] Preferably, please see again. Figure 6 Along the direction from near the shielding part 11 to away from the shielding part 11, the spacing between two adjacent leveling beams 13 gradually decreases in the first direction B.

[0062] Please see again Figure 7Along the direction from near to far from the organic adhesive pattern 32, the spacing of the gently sloping protrusions 34 formed on the substrate 3 to be coated with adhesive by the mask 1 gradually decreases in the first direction B. The sum of the amount of adhesive flowing from two gently sloping protrusions 12 closer together to the corresponding adhesive-free area 33 is greater than the sum of the amount of adhesive flowing from two gently sloping protrusions 12 farther apart to the corresponding adhesive-free area 33. Therefore, along the direction from near to far from the organic adhesive pattern 32, the amount of adhesive flowing from the gently sloping protrusions 12 to the adhesive-free area 33 gradually increases, while the amount of adhesive flowing from the organic adhesive pattern 32 to the adhesive-free area 33 gradually decreases. Therefore, the thickness difference of the boundary portion of the finally formed organic adhesive can be reduced, thereby further effectively reducing the slope angle 2 of the organic adhesive boundary.

[0063] In one possible implementation, please see Figure 8 The width of the orthographic projection of the end of the leveling beam 13 near the shielding part 11 onto the substrate 3 to be coated with adhesive ( Figure 8 S2) is less than the width of the orthographic projection of the end of the leveling beam 13 away from the shielding part 11 onto the substrate 3 to be coated with adhesive. Figure 8 S1 in S1, i.e. S2 <S1。

[0064] The width of the gently sloping raised strip 34 formed on the substrate 3 to be coated with adhesive through the mask 1 is smaller at the end near the organic adhesive pattern 32 than at the end away from the organic adhesive pattern 32. The amount of adhesive flowing from the end of the gently sloping raised strip 34 near the organic adhesive pattern 32 to the adhesive-free area 33 is less than the amount flowing from the end of the gently sloping raised strip 34 away from the organic adhesive pattern 32 to the adhesive-free area 33, and along the first direction B, the amount of adhesive flowing from the organic adhesive pattern 32 to the adhesive-free area 33 gradually decreases. Therefore, the adhesive thickness of the adhesive-free area 33 corresponding to a single gently sloping raised strip 34 is more uniform.

[0065] Preferably, the width of the orthographic projection of the smoothing beam 13 near the shielding portion 11 to the end of the smoothing beam 13 away from the shielding portion 11 on the substrate 3 to be coated with adhesive gradually increases. Along the direction from near the organic adhesive pattern 32 to away from the organic adhesive pattern 32, the width of the smoothing protrusion 34 formed by the mask 1 on the substrate 3 to be coated with adhesive gradually increases. Based on the analysis of the above embodiments, it can be seen that by designing the smoothing beam 13 with this structure, the thickness of the adhesive in the adhesive-free area 33 corresponding to a single smoothing protrusion 34 can be further made more uniform.

[0066] In summary, by setting multiple protrusions 12 on the edge of the mask 1, this application can form organic adhesive protrusions 31 on the edge of the organic adhesive pattern on the substrate 3 to be coated. By utilizing the leveling properties of the organic adhesive protrusions 31, the adhesive-free area 33 between the organic adhesive protrusions 31 is filled by the surrounding organic adhesive, thereby reducing the thickness difference between the boundary and the center of the final organic adhesive, and thus effectively reducing the slope angle 2 of the organic adhesive boundary.

[0067] In one possible implementation, please see Figure 9 This application also provides a method for applying adhesive, the method comprising:

[0068] S10: Provide a substrate 3 to be coated with adhesive.

[0069] In this embodiment, the substrate 3 to be coated with adhesive can be a film layer or substrate in the display device that needs to be coated with adhesive.

[0070] S11: Apply a layer of organic adhesive to the adhesive surface of the substrate 3 to be coated.

[0071] In this embodiment, the substrate 3 to be coated with adhesive includes a coating surface. First, an organic adhesive is applied to the coating surface of the substrate 3 to be coated with adhesive, and the organic adhesive layer is coated as evenly as possible.

[0072] S12: Based on the mask 1 described in this application, a photolithographic pattern is formed on the substrate 3 to be coated with adhesive using an exposure and development process.

[0073] In this embodiment, the photomask 1 described in this application is installed directly above the adhesive-coated surface, and then a photolithographic pattern is formed on the substrate 3 to be coated with adhesive through processes such as exposure and development.

[0074] S13: Remove the organic adhesive that has not formed a photolithographic pattern on the substrate 3 to be coated.

[0075] In this embodiment, the organic adhesive on the substrate 3 to be coated, except for the photolithographic pattern, is removed. For example, the organic adhesive in the exposed area can be dissolved using a dissolving solution.

[0076] S14: Dry the substrate 3 to be coated after removing the organic adhesive that has not formed a photolithographic pattern, so as to complete the adhesive coating process on the substrate 3 to be coated.

[0077] In this embodiment, during the process of drying the organic adhesive from a wet film to a dry film, the organic adhesive of the photolithographic pattern will form a slope angle 2 at its boundary due to its own flow. However, since the photolithographic pattern is formed on the substrate 3 to be coated with adhesive using the mask 1 of this application, the thickness difference between the boundary and the middle of the finally formed organic adhesive can be reduced, thereby effectively reducing the slope angle 2 of the boundary of the finally formed organic adhesive.

[0078] In one possible implementation, this application also provides a display panel fabricated using the mask 1 described in this application. Since the display panel is fabricated using the mask 1 described in this application, the slope angle 2 at the boundary of the organic adhesive can be reduced, thereby improving the film quality of the film layer covering the organic adhesive surface, reducing the stress of subsequent film layers at the slope angle 2, and further improving the quality of the display panel.

[0079] In one possible implementation, this application also provides a display device, which includes the display panel described in this application. The display device can be a computer, mobile phone, etc., and has all the beneficial effects of the display panel described in this application, which will not be repeated here.

[0080] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0081] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A photomask, characterized in that, The mask includes a shielding portion. Along the circumference of the shielding portion, a plurality of protrusions are provided on the edge of the shielding portion. The protrusions extend along a first direction, which is from the shielding portion to the direction away from the shielding portion. The width of the orthographic projection of the end of the protrusion near the shielding portion on the substrate to be coated is smaller than the width of the orthographic projection of the end of the protrusion away from the shielding portion on the substrate to be coated. The width of the orthographic projection of the protrusion on the substrate to be coated gradually increases from the end of the protrusion near the shielding part to the end of the protrusion away from the shielding part.

2. The photomask according to claim 1, characterized in that, The protrusion has a strip-shaped structure.

3. The photomask according to claim 2, characterized in that, The protrusion's orthographic projection on the substrate to be coated with adhesive is rectangular.

4. The photomask according to claim 2, characterized in that, The width of the orthographic projection of the protrusion on the substrate to be coated is 0.5μm-5μm, and / or the length of the orthographic projection of the protrusion on the substrate to be coated is 5μm-15μm, and / or the distance between the orthographic projections of two adjacent protrusions on the substrate to be coated is 0.5μm-5μm.

5. The photomask according to claim 1, characterized in that, The protrusions are evenly distributed on the edge of the shielding part.

6. A photomask, characterized in that, The mask includes a shielding portion, and a plurality of protrusions are provided on the edge of the shielding portion along the circumference of the shielding portion. The protrusions extend along a first direction, which is a direction from the shielding portion to away from the shielding portion. Each protrusion has at least one smoothing beam, which extends along a second direction. The second direction and the first direction form an angle. The orthographic projection of the smoothing beam on the substrate to be coated with adhesive is rectangular. Along the direction from near the shielding portion to away from the shielding portion, the extension length of the gentle beam in the second direction gradually increases; Along the direction from near the shielding portion to away from the shielding portion, the spacing between two adjacent leveling beams gradually decreases in the first direction.

7. The photomask according to claim 6, characterized in that, The included angle is a right angle.

8. A photomask, characterized in that, The mask includes a shielding portion. Along the circumference of the shielding portion, a plurality of protrusions are provided on the edge of the shielding portion. The protrusions extend along a first direction, which is a direction from the shielding portion to away from the shielding portion. Each protrusion has at least one smoothing beam. The smoothing beam extends along a second direction, which forms an angle with the first direction. The width of the orthographic projection of the end of the smoothing beam near the shielding portion on the substrate to be coated is smaller than the width of the orthographic projection of the end of the smoothing beam away from the shielding portion on the substrate to be coated. The width of the orthographic projection of the gradual leveling beam on the substrate to be coated gradually increases from the end of the gradual leveling beam near the shielding part to the end of the gradual leveling beam away from the shielding part.

9. A method for applying adhesive, characterized in that, The method includes: Provide a substrate to be coated with adhesive; Apply a layer of organic adhesive to the adhesive surface of the substrate to be coated; Based on the photomask according to any one of claims 1-8, a photolithographic pattern is formed on the substrate to be coated with adhesive using an exposure and development process; Remove the organic adhesive that has not formed a photolithographic pattern from the substrate to be coated; The substrate to be coated is dried after removing the organic adhesive that has not formed a photolithographic pattern, in order to complete the adhesive coating process on the substrate.

10. A display panel, characterized in that, Prepared using a mask as described in any one of claims 1-8.

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