Device and method for laser non-destructive preparation of anti-glare glass

Abstract

This invention provides an apparatus and method for non-destructive laser fabrication of anti-glare glass, belonging to the field of glass manufacturing. The apparatus includes an ultrafast laser atomization unit, a high-temperature passivation unit, and a sample-changing unit. The ultrafast laser atomization unit uses an ultrafast laser to perform laser scanning etching on the glass to be processed, forming random micro / nano structures on its surface to obtain atomized glass. The high-temperature passivation unit heats the surface of the atomized glass to remelt its micro / nano structures, adjusting gloss, haze, and transmittance to obtain anti-glare glass. The sample-changing unit transports the atomized glass and anti-glare glass to exchange samples between the laser atomization unit and the high-temperature passivation unit. This invention can form a random textured anti-glare structure on the surface of the glass to be processed, thereby reducing its reflectivity to incident light and achieving an anti-glare effect. Furthermore, it exhibits good wear resistance and scratch resistance, and can directly process glass of any thickness.

Description

Technical Field

[0001] This invention belongs to the field of glass manufacturing, and more specifically, relates to an apparatus and method for non-destructive laser preparation of anti-glare glass. Background Technology

[0002] The manufacturing process of anti-glare glass has undergone continuous improvement and development, resulting in manufacturing methods based on mechanics, chemistry, and lasers. Mechanical processing methods mainly include sandblasting and grinding, while chemical processing methods include chemical etching, chemical spraying, and glass surface coating. Currently, the mainstream processing techniques are chemical etching and chemical spraying, both of which require etching solutions containing hydrofluoric acid. Hydrofluoric acid and its fluorine-containing chemical waste liquid pose a significant threat to the environment; even after sedimentation treatment, fluoride ions in the waste liquid can easily be reduced in the natural environment and seep into the soil. In recent years, anti-glare glass manufacturing processes based on laser processing technology, which are more environmentally friendly than chemical methods, have gradually developed.

[0003] CN110449745A discloses a laser etching method for anti-glare glass. The method involves feeding a pre-formed flat glass into a high-temperature furnace and heating it to a specific temperature range below the glass transition temperature for laser engraving. After engraving, the flat glass is returned to the high-temperature furnace and cooled to room temperature, completing the manufacturing of the anti-glare glass. However, this technical solution uses a laser scanning method to create periodic structures on the glass surface, which leads to rasterization of the glass surface, resulting in poor display quality. Summary of the Invention

[0004] In view of the shortcomings of the prior art, the purpose of this invention is to provide an apparatus and method for non-destructive laser fabrication of anti-glare glass, which aims to solve the problem that existing laser fabrication processes for anti-glare glass can lead to grating formation on the glass surface.

[0005] To achieve the above objectives, according to one aspect of the present invention, an apparatus for non-destructive laser fabrication of anti-glare glass is provided. This apparatus includes an ultrafast laser atomization unit, a high-temperature passivation unit, and a sample switching unit, wherein:

[0006] The ultrafast laser atomization unit is used to perform laser scanning etching on the glass to be processed using an ultrafast laser to form a random micro-nano structure on its surface, thereby obtaining atomized glass.

[0007] The high-temperature passivation unit is used to heat the surface of the atomized glass to remelt its micro-nano structure in order to adjust the gloss, haze and transmittance, thereby producing anti-glare glass.

[0008] The sample changing unit is used to transport the atomizing glass and anti-glare glass to change the samples of the laser atomizing unit and the high-temperature passivation unit.

[0009] As a further preferred embodiment, the ultrafast laser atomization unit includes a sample stage module and an ultrafast laser, a beam expander collimating mirror, a first light guide mirror, a second light guide mirror, and a scanning focusing module, which are arranged sequentially above the sample stage module along the light propagation direction. The sample stage module is used to place the glass to be processed. The ultrafast laser emits an ultrafast laser beam, which is then fed into the beam expander collimating mirror for beam expansion and collimation. The expanded and collimated ultrafast laser beam is reflected sequentially by the first and second light guide mirrors and then incident into the scanning focusing module, whereby laser scanning etching is performed on the glass under the control of the scanning focusing module.

[0010] As a further preferred embodiment, the scanning focusing module includes a scanning galvanometer, a scanning field mirror, a Z-axis moving mechanism, a laser displacement sensor, and an industrial camera. The scanning galvanometer and the scanning field mirror cooperate to scan and focus the ultrafast laser. The Z-axis moving mechanism is connected to the scanning galvanometer and the scanning field mirror and is used to move them along the Z-axis direction. The laser displacement sensor and the industrial camera are fixed below the Z-axis moving mechanism. The laser displacement sensor is used to measure the displacement of the Z-axis moving mechanism, and the industrial camera is used to monitor the surface condition of the glass to be processed in real time.

[0011] As a further preferred embodiment, the sample stage module includes a clamp and an XY-axis moving mechanism. The clamp is disposed above the XY-axis moving mechanism and is used to clamp and fix the glass to be processed. The XY-axis moving mechanism is used to drive the glass to be processed to move along the X and Y axes.

[0012] As a further preferred embodiment, the ultrafast laser atomization unit also includes a plasma condensate guiding mechanism, which is disposed above the sample stage module and is used to remove waste generated by the laser scanning etching process.

[0013] As a further preferred embodiment, the high-temperature passivation unit includes a heating mechanism, a constant-temperature base, and a circulating cooling mechanism, wherein the heating mechanism is used to heat the surface of the atomized glass to remelt its surface micro-nano structures; the constant-temperature base is used to maintain the temperature of the atomized glass substrate; and the circulating cooling mechanism is used to maintain the temperature of the heating mechanism and the constant-temperature base constant.

[0014] As a further preferred embodiment, the sample changing unit includes a transfer mechanism disposed between the ultrafast laser atomization unit and the high-temperature passivation unit, for gripping and transferring the atomized glass and the anti-glare glass, thereby performing sample changing.

[0015] According to another aspect of the present invention, a method for laser non-destructive fabrication of anti-glare glass is provided, the method specifically comprising:

[0016] S1 uses an ultrafast laser to perform laser scanning etching on the glass to be processed to form a random micro-nano structure on its surface, thereby obtaining frosted glass;

[0017] S2 Then the atomized glass is heated to remelt its surface micro-nano structure to adjust the gloss, haze and transmittance, thereby producing anti-glare glass.

[0018] As a further preferred embodiment, in step S1, a damaged area is pre-defined on the glass to be processed, and then the glass to be processed is subjected to laser scanning etching using an ultrafast laser.

[0019] As a further preferred embodiment, in step S2, the base temperature of the atomizing glass is maintained at 400°C to 650°C, and the surface of the atomizing glass is heated to 800°C to 2000°C.

[0020] In summary, the technical solutions conceived by this invention have the following beneficial effects compared with the prior art:

[0021] 1. This invention utilizes ultrafast lasers to perform laser scanning etching on the glass to be processed. This process allows the surface of the glass to be atomized before deposition, forming a micro / nano structure to be passivated to obtain atomized glass. The randomness of this micro / nano structure prevents the glass surface from becoming rasterized, thus avoiding any impact on the display effect. Then, a high-temperature passivation unit is used to perform surface heat treatment on the atomized glass, causing the micro / nano structure to remelt and passivate, forming a microlens structure. Thus, under the combined action of the ultrafast laser atomization unit and the high-temperature passivation unit, a random textured anti-glare structure is formed on the surface of the glass to be processed, thereby reducing its reflectivity to incident light and achieving an anti-glare effect. Compared with traditional chemical methods, this method is cleaner and more environmentally friendly, and has good wear resistance and scratch resistance. The surface anti-glare layer will not peel off or discolor. At the same time, relying on the excellent characteristics of ultrafast lasers, glass of any thickness can be processed directly, avoiding damage to the glass substrate and realizing non-destructive laser fabrication of anti-glare glass.

[0022] 2. Meanwhile, this invention optimizes the structure of the ultrafast laser atomization unit, utilizes the combined action of the galvanometer and field mirror to achieve scanning and focusing of the ultrafast laser, and utilizes the Z-axis moving mechanism and XY-axis moving mechanism to achieve precise control of the glass surface processing, thereby effectively improving the manufacturing precision of anti-glare glass;

[0023] 3. The present invention also provides a method for non-destructive laser fabrication of anti-glare glass. In order to solve the problem that the spectral range of ultrafast lasers is all in the high transmittance region of glass and it is difficult to act on the glass surface, a method is proposed to first pre-define the damaged area on the glass to be processed, and then perform laser scanning etching. At the same time, the heat treatment temperature is optimized to achieve the adjustment of gloss, haze and transmittance. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the apparatus for laser non-destructive fabrication of anti-glare glass provided in an embodiment of the present invention;

[0025] Figure 2 This is a schematic diagram of the atomized glass prepared according to an embodiment of the present invention;

[0026] Figure 3 This is a schematic diagram of the anti-glare glass prepared according to an embodiment of the present invention.

[0027] In all the accompanying drawings, the same reference numerals are used to denote the same elements or structures, wherein:

[0028] A-Ultrafast laser atomization unit, B-Sample changing unit, C-High-temperature passivation unit, 1-Ultrafast laser, 2-Beam expander collimating lens, 3-First light guide mirror, 4-Second light guide mirror, 5-Scanning galvanometer, 6-Scanning field mirror, 7-Plasma condensate guiding mechanism, 8-Glass to be processed, 9-Clamping device, 10-XY axis moving mechanism, 11-Z axis moving mechanism, 12-Industrial camera, 13-Laser displacement sensor, 14-Transfer mechanism, 15-Constant temperature base, 16-Heating mechanism, 17-Circulating cooling mechanism, 18-Control mechanism. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0030] like Figures 1-3 As shown, this invention provides an apparatus for non-destructive laser fabrication of anti-glare glass. The apparatus includes an ultrafast laser atomization unit A, a high-temperature passivation unit C, and a sample switching unit B, wherein:

[0031] The ultrafast laser atomization unit A is used to perform laser scanning etching on the glass to be processed 8 using an ultrafast laser to form a plasma deposition layer on its surface to form a random micro-nano structure, thereby obtaining a high-haze atomized glass. Compared with the traditional carbon dioxide laser, the ultrafast laser can form a micron-scale random structure on the glass surface, thereby avoiding the formation of periodic structures that cause rasterization on the glass surface and thus affect the display effect.

[0032] The high-temperature passivation unit C is used to heat the surface of the frosted glass to remelt its micro-nano structure in order to adjust the gloss, haze and transmittance, thereby producing anti-glare glass;

[0033] Sample changing unit B is used to transport atomizing glass and anti-glare glass for sample changing of laser atomizing unit A and high-temperature passivation unit C.

[0034] Furthermore, the ultrafast laser atomization unit A includes a sample stage module and an ultrafast laser 1, a beam expander and collimator 2, a first light guide mirror 3, a second light guide mirror 4, and a scanning and focusing module, which are arranged sequentially above the sample stage module along the light propagation direction. The sample stage module is used to place the glass to be processed 8 and includes a clamp 9 and an XY-axis moving mechanism 10. The clamp 9 is positioned above the XY-axis moving mechanism 10 and is used to clamp and fix the glass to be processed 8, restricting its spatial position and maintaining the shape of the glass to be processed 8, especially the surface to be processed. The flatness; the XY axis moving mechanism 10 is used to drive the glass to be processed 8 to move along the X and Y axes to control the absolute position of the glass to be processed 8 in the XY plane; the ultrafast laser 1 is a femtosecond laser or a picosecond laser. The ultrafast laser 1 is used to emit ultrafast laser and send it into the beam expanding and collimating mirror 2 for beam expanding and collimation. After beam expanding and collimation, the ultrafast laser is reflected by the first light guide mirror 3 and the second light guide mirror 4 in sequence and then enters the scanning and focusing module to perform laser scanning etching on the glass to be processed 8 under the control of the scanning and focusing module.

[0035] Furthermore, the scanning focusing module includes a scanning galvanometer 5, a scanning field lens 6, a Z-axis moving mechanism 11, a laser displacement sensor 13, and an industrial camera 12. The scanning galvanometer 5 and the scanning field lens 6 cooperate to scan and focus the ultrafast laser onto the glass to be processed 8, and drive the ultrafast laser to perform scanning etching on the glass to be processed 8. The Z-axis moving mechanism 11 is connected to the scanning galvanometer 5 and the scanning field lens 6, and is used to move them along the Z-axis direction to control the absolute position of the ultrafast laser focus point in the Z-axis direction. The laser displacement sensor 13 and the industrial camera 12 are fixed below the Z-axis moving mechanism 11. The laser displacement sensor 13 is used to measure the distance to the glass to be processed 8 to determine the displacement of the Z-axis moving mechanism 11, and the industrial camera 12 is used to monitor the surface condition of the glass to be processed 8 in real time during the processing.

[0036] Furthermore, the ultrafast laser atomization unit A also includes a plasma condensate guiding mechanism 7, which is located above the sample stage module and is used to remove waste generated by the laser scanning etching process.

[0037] Furthermore, the high-temperature passivation unit C includes a heating mechanism 16, a constant-temperature base 15, and a circulating cooling mechanism 17. The heating mechanism 16 is used to heat the surface of the atomized glass to remelt its surface micro-nano structure; the constant-temperature base 15 is used to maintain the temperature of the atomized glass substrate, thereby avoiding an excessive temperature gradient in the atomized glass field; and the circulating cooling mechanism 17 is used to maintain a constant temperature for the heating mechanism 16 and the constant-temperature base 15.

[0038] Furthermore, the sample changing unit B includes a transfer mechanism 14, which is positioned between the ultrafast laser atomization unit A and the high-temperature passivation unit C. This mechanism is used to grip and transfer the atomized glass and anti-glare glass for sample changing. The transfer mechanism 14 uses a clamping method for sample changing, avoiding direct contact with the upper and lower surfaces of the glass, thus improving sample changing efficiency while preventing damage to the glass. Positioned between the ultrafast laser atomization unit A and the high-temperature passivation unit C, the transfer mechanism 14 not only replaces the already processed atomized glass and anti-glare glass but also preheats the atomized glass using the residual heat from the high-temperature passivation unit C and slows down the cooling rate of the anti-glare glass.

[0039] Furthermore, the apparatus for non-destructive laser fabrication of anti-glare glass also includes a control mechanism 18, which is connected to the ultrafast laser atomization unit A and the high-temperature passivation unit C, and is used to control them to achieve automated production. Specifically, the control mechanism 18 can control the ultrafast laser 1, the Z-axis movement mechanism 11, and the XY-axis movement mechanism 10 based on information collected by the laser displacement sensor 13 and the industrial camera 12.

[0040] This invention utilizes the combined effects of ultrafast laser and auxiliary heat source to fabricate anti-glare glass. It can create micro-nano-scale random textured anti-glare structures on the surface of glass of any thickness (≥0.3mm) to reduce the reflection of strong light, thus achieving an anti-glare effect. The anti-glare area of ​​the glass is editable, and the haze and gloss can also be adjusted, achieving non-destructive laser fabrication of anti-glare glass. Ultrafast lasers possess characteristics such as high efficiency, high precision, high resolution, high flexibility, non-contact operation, strong material adaptability, and cleanliness. Using ultrafast lasers as the laser source, and in conjunction with the scanning focusing module and sample stage module, the size, shape, and arrangement of the processed area on the surface of the glass can be precisely and freely edited. Simultaneously, by adjusting the parameters of the high-temperature passivation unit C, a random textured anti-glare structure can be further generated, and the haze and gloss of the final anti-glare glass can be freely adjusted, even achieving numerical gradients in haze and gloss on the anti-glare glass surface.

[0041] According to another aspect of the present invention, a method for laser non-destructive fabrication of anti-glare glass is provided, the method specifically comprising:

[0042] S1 uses an ultrafast laser to perform laser scanning etching on the glass to be processed to form a random micro-nano structure on its surface, thereby obtaining frosted glass;

[0043] S2 Then, the frosted glass is heated to remelt its surface micro-nano structure to adjust the gloss, haze and transmittance, thereby producing anti-glare glass.

[0044] Furthermore, in step S1, considering that glass is a transparent material and the spectral range of ultrafast lasers is all in the high transmittance region of glass, it is difficult to act on the glass surface. Therefore, a damage area can be pre-set on the glass to be treated, and then the ultrafast laser can be used to perform laser scanning etching on the glass to be treated, thereby ensuring that the ultrafast laser can form micro-nano structures on the surface of the glass to be treated.

[0045] Further, in step S2, the base temperature of the atomized glass is maintained at 400℃~650℃, and the surface of the atomized glass is heated to 800℃~2000℃. By adjusting the surface heating temperature of the atomized glass, the gloss, haze, and transmittance are adjusted, so that the gloss of the anti-glare glass reaches 72.2~93.9, the haze reaches 3~30, and the transmittance reaches 89.8~90.6. Preferably, a gradual heating strategy can also be adopted, so that the surface heating temperature of the atomized glass gradually increases or decreases from left to right, thereby making the gloss and transmittance of the anti-glare glass gradually change from left to right.

[0046] Compared with traditional chemical methods in the prior art, the present invention has the following advantages:

[0047] 1. Clean, environmentally friendly and pollution-free: This invention uses ultrafast lasers to scan the material surface in a specific way, without any chemical corrosion process. Therefore, there is no chemical waste in the preparation process, the preparation environment is clean and environmentally friendly, and energy utilization is highly efficient.

[0048] 2. Excellent Mechanical Properties and Anti-Glare Structure: Traditional anti-glare glass manufacturing processes include spraying and vacuum evaporation. Spraying involves applying a coating to the glass surface using a spray gun or disc atomizer, using pressure or centrifugal force to disperse the coating into uniform, fine droplets. Anti-glare glass produced in this way has a film that is prone to peeling and has poor wear resistance. Vacuum evaporation coats the glass surface with an anti-reflective film such as magnesium fluoride. Anti-glare glass produced in this way has a film that resists strong sunlight. Under harsh conditions such as sunlight or outdoor wind and rain, it is prone to discoloration and is not corrosion resistant, and its wear resistance and scratch resistance are very poor. Using the method provided by this invention, firstly, the glass to be treated 8 is laser-scanned and etched using an ultrafast laser, so that the surface of the glass to be treated 8 is first atomized and then deposited to form a micro-nano structure to be passivated and obtain atomized glass; then, the atomized glass is subjected to surface heat treatment, so that the atomized deposited micro-nano structure on the material surface is remelted and passivated, and finally a random textured anti-glare structure is formed, thereby producing anti-glare glass with good wear resistance, scratch resistance and no peeling or discoloration of the surface anti-glare layer;

[0049] 3. Flexible and adjustable: Due to the high processing precision and high resolution of ultrafast laser, the present invention can be adjusted according to the different requirements of haze and gloss of anti-glare glass. That is, by precisely controlling the energy distribution of ultrafast laser 1 on the surface of glass 8 to be processed and the temperature of constant temperature heating mechanism 16, anti-glare glass that meets different performance requirements can be obtained.

[0050] 4. No requirements on glass material thickness: Traditional anti-glare glass manufacturing processes, such as spraying and chemical etching, cannot precisely control parameters during processing, and the processes themselves can damage the glass substrate. For example, the powdered material sprayed in the spraying process has high kinetic energy, and the chemical etching process requires a certain etching depth during frosted liquid etching, thus requiring a certain glass thickness. To produce thin anti-glare glass, subsequent polishing and thinning processes are needed, which reduces material utilization and yield. Using the method provided by this invention, due to the excellent characteristics of ultrafast lasers, micro-nano structures can be directly processed on the surface of glass of any thickness (≥0.3mm) by reasonably controlling the laser processing parameters, avoiding damage to the glass substrate and realizing non-destructive laser fabrication of anti-glare glass.

[0051] Those skilled in the art will readily understand that the above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A method for non-destructive laser fabrication of anti-glare glass, characterized in that, The method is as follows: S1 uses an ultrafast laser to perform laser scanning etching on the glass to be processed to form a random micro-nano structure on its surface, thereby obtaining frosted glass; S2 Then, the atomized glass is heated to remelt its surface micro-nano structure to adjust the gloss, haze and transmittance, thereby producing anti-glare glass. The base temperature of the atomized glass is kept at 400℃~650℃, and the surface of the atomized glass is heated to 800℃~2000℃.

2. The method for non-destructive laser fabrication of anti-glare glass as described in claim 1, characterized in that, In step S1, a damaged area is pre-defined on the glass to be processed, and then an ultrafast laser is used to perform laser scanning etching on the glass.

3. An apparatus for laser-based non-destructive fabrication of anti-glare glass using the method described in claim 1 or 2, characterized in that, The device includes an ultrafast laser atomization unit (A), a high-temperature passivation unit (C), and a sample changing unit (B), wherein: The ultrafast laser atomization unit (A) is used to perform laser scanning etching on the glass to be processed using an ultrafast laser to form a random micro-nano structure on its surface, thereby obtaining atomized glass; The high-temperature passivation unit (C) is used to heat the surface of the atomized glass to remelt its micro-nano structure in order to adjust the gloss, haze and transmittance, thereby producing anti-glare glass. The high-temperature passivation unit (C) ensures that the base temperature of the atomized glass is 400℃~650℃ and heats the surface of the atomized glass to 800℃~2000℃. The sample changing unit (B) is used to transport the atomizing glass and anti-glare glass to change the laser atomizing unit (A) and the high-temperature passivation unit (C).

4. The apparatus for non-destructive laser fabrication of anti-glare glass as described in claim 3, characterized in that, The ultrafast laser atomization unit (A) includes a sample stage module and an ultrafast laser (1), a beam expander collimator (2), a first light guide mirror (3), a second light guide mirror (4), and a scanning focusing module arranged sequentially above the sample stage module along the light propagation direction. The sample stage module is used to place the glass to be processed. The ultrafast laser (1) is used to emit ultrafast laser light and send it to the beam expander collimator (2) for beam expansion and collimation. After beam expansion and collimation, the ultrafast laser light is reflected by the first light guide mirror (3) and the second light guide mirror (4) and then incident into the scanning focusing module to perform laser scanning etching on the glass to be processed under the control of the scanning focusing module.

5. The apparatus for non-destructive laser fabrication of anti-glare glass as described in claim 4, characterized in that, The scanning focusing module includes a scanning galvanometer (5), a scanning field lens (6), a Z-axis moving mechanism (11), a laser displacement sensor (13), and an industrial camera (12). The scanning galvanometer (5) and the scanning field lens (6) cooperate to scan and focus the ultrafast laser. The Z-axis moving mechanism (11) is connected to the scanning galvanometer (5) and the scanning field lens (6) and is used to drive them to move along the Z-axis direction. The laser displacement sensor (13) and the industrial camera (12) are fixed below the Z-axis moving mechanism (11). The laser displacement sensor (13) is used to measure the displacement of the Z-axis moving mechanism (11), and the industrial camera (12) is used to monitor the surface condition of the glass to be processed in real time.

6. The apparatus for laser non-destructive fabrication of anti-glare glass as described in claim 4, characterized in that, The sample stage module includes a clamp (9) and an XY axis moving mechanism (10). The clamp (9) is positioned above the XY axis moving mechanism (10) and is used to clamp and fix the glass to be processed. The XY axis moving mechanism (10) is used to drive the glass to be processed to move along the X and Y axes.

7. The apparatus for laser non-destructive fabrication of anti-glare glass as described in any one of claims 4 to 6, characterized in that, The ultrafast laser atomization unit (A) also includes a plasma condensate guiding mechanism (7), which is located above the sample stage module and is used to remove waste generated by laser scanning etching.

8. The apparatus for laser non-destructive fabrication of anti-glare glass as described in claim 3, characterized in that, The high-temperature passivation unit (C) includes a heating mechanism (16), a constant-temperature base (15), and a circulating cooling mechanism (17). The heating mechanism (16) is used to heat the surface of the atomized glass to remelt its surface micro-nano structure; the constant-temperature base (15) is used to maintain the temperature of the atomized glass substrate; and the circulating cooling mechanism (17) is used to maintain the temperature of the heating mechanism (16) and the constant-temperature base (15) constant.

9. The apparatus for laser non-destructive fabrication of anti-glare glass as described in claim 3, characterized in that... The sample changing unit (B) includes a transfer mechanism (14), which is located between the ultrafast laser atomization unit (A) and the high temperature passivation unit (C) for gripping and transferring the atomized glass and the anti-glare glass, thereby performing sample changing.

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