Cleaning cage

Abstract

The present invention prevents contamination of polysilicon during the cleaning process. The cleaning cage (1) is a cleaning cage (1) used for cleaning polysilicon in a state of containing polysilicon, and has a plurality of resin-made components (10), which are connected to each other by screwing in resin-made screws (N).

Description

TECHNICAL FIELD

[0001] The present application relates to a cleaning cage used when cleaning polysilicon. BACKGROUND

[0002] Polysilicon used for silicon semiconductor raw materials, solar cell raw materials, and the like is required to be high purity, and thus a manufacturing process includes a cleaning process for removing contaminant substances and the like adhering to the polysilicon. In the cleaning process, etching cleaning and pure water cleaning are performed while the polysilicon is housed in a dedicated cleaning cage. As a cleaning cage used when cleaning the polysilicon, for example, Patent Literature 1 discloses a cleaning cage formed in a box shape by a resin plate, which houses polysilicon.

[0003] In addition, Patent Literature 2 shows that, in a case where etching cleaning is performed while the polysilicon is housed in a resin-made cleaning cage, contamination caused by organic components and carbon originating from the cleaning cage occurs on the surface of the polysilicon after cleaning. Also, in paragraphs 0039 to 0041 of Patent Literature 2, it is described that, in a case where the resin deteriorates due to repeated etching cleaning, contamination from the resin of the cleaning cage is more severe than in a case where the cleaning cage is new.

[0004] PRIOR ART DOCUMENTS

[0005] PATENT LITERATURE

[0006] Patent Literature 1: Japanese Patent Application Laid-Open No. 2011-68554

[0007] Patent Literature 2: Japanese Patent Application Laid-Open No. 2020-128332 SUMMARY

[0008] PROBLEMS TO BE SOLVED BY THE INVENTION

[0009] In the cleaning cage disclosed in Patent Literature 1, in the cleaning process, in a case where a portion of the cleaning cage immersed in fluoronitric acid as a cleaning solution is welded, the welded portion is more likely to deteriorate than other resin portions, and the present inventors have found that this is one factor of contamination of the above-described cleaning cage. In particular, if etching cleaning is repeatedly performed, cracking and peeling caused by the acid occur, and the resulting resin pieces do not dissolve in the cleaning solution, so there is a problem that the resin pieces adhere to the polysilicon, and further significantly increase contamination of the polysilicon.

[0010] According to one embodiment of the present application, an object is to prevent contamination of polysilicon in a cleaning process.

[0011] MEANS FOR SOLVING THE PROBLEMS

[0012] To solve the above problems, a cleaning cage according to an embodiment of the present application is characterized in that the cleaning cage is a cleaning cage for cleaning polysilicon in a state in which the polysilicon is housed, and the cleaning cage includes a plurality of constituent members made of resin, the plurality of constituent members being coupled to each other by being screwed into screws made of resin.

[0013] Effects of the Invention

[0014] According to an embodiment of the present application, it is possible to prevent contamination of polysilicon in a cleaning process. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 is a side view of a cleaning cage according to an embodiment of the present application.

[0016] Figure 2 is a plan view of the cleaning cage.

[0017] Figure 3 is a front view of the cleaning cage.

[0018] Figure 4 is an A-A sectional view of Figure 1

[0019] Figure 5 is a plan view of a bottom plate of the cleaning cage.

[0020] Figure 6 is a plan view of a first side plate of the cleaning cage.

[0021] Figure 7 is a plan view of a second side plate of the cleaning cage.

[0022] Figure 8 is a plan view of a third side plate of the cleaning cage.

[0023] Figure 9 is a view for explaining prevention of loosening. DETAILED DESCRIPTION

[0024] Hereinafter, an embodiment of the present application will be described in detail.

[0025] <Method for manufacturing polysilicon>

[0026] A method for manufacturing polysilicon as a cleaning target includes, for example, a silicon deposition process of causing a chlorosilane compound and hydrogen to react in a reactor to deposit polysilicon. As a method for depositing polysilicon, a Siemens method is known. In the Siemens method, trichlorosilane and hydrogen are caused to react in a bell-type (bell-jar type) reactor. Then, polysilicon is deposited on a surface of a polysilicon deposition core rod vertically provided inside the reactor, and a grown polysilicon rod is obtained.

[0027] ​Furthermore, the method for manufacturing polycrystalline silicon may also include a step of pulverizing the polycrystalline silicon rod obtained through a silicon precipitation process, and a step of classifying the pulverized polycrystalline silicon. Further, the method for manufacturing polycrystalline silicon includes a cleaning step of cleaning the pulverized or classified polycrystalline silicon, and a drying step of drying the cleaned polycrystalline silicon. This yields high-purity polycrystalline silicon. Since polycrystalline silicon is used in semiconductor components, high purity is required.

[0028] <Cleansing Methods for Polycrystalline Silicon>

[0029] In the cleaning process, fluoronitric acid, used as the cleaning solution, is brought into contact with the polycrystalline silicon. Fluoronitric acid is an aqueous solution obtained by mixing nitric acid and hydrogen fluoride. The polycrystalline silicon removed from the reactor typically forms an oxide film containing contaminants, with a thickness of several nm, through natural oxidation. This oxide film is a SiO2 film. The reaction described below occurs when the polycrystalline silicon is brought into contact with fluoronitric acid.

[0030] The surface of polycrystalline silicon is etched primarily by hydrogen fluoride, removing the existing oxide film. Conversely, a new oxide film is formed on the polycrystalline silicon surface, primarily through the action of nitric acid. By simultaneously removing and forming the oxide film, the polycrystalline silicon is etched, removing contaminants adhering to its surface and those incorporated into it. These contaminants include organic matter, metals, and resins. Common metals that can be contaminants or impurities include Na, Mg, Al, K, Ca, Cr, Fe, Ni, Co, Cu, Zn, and W.

[0031] As a specific method for contacting polycrystalline silicon with fluorinated nitric acid, a method is described in which a cleaning cage 1 containing polycrystalline silicon is immersed in a first cleaning tank containing fluorinated nitric acid. The cleaning cage 1 will be described later. After immersing the cleaning cage 1 in the first cleaning tank, the cleaning cage 1 is pulled out of the first cleaning tank and immersed in a second cleaning tank containing ultrapure water. This allows the fluorinated nitric acid adhering to the polycrystalline silicon to be washed away. The cleaning cage 1 according to this embodiment is used at least for cleaning polycrystalline silicon in the first cleaning tank.

[0032] Alternatively, the cleaning cage 1 can also be used for the drying process. Specifically, after immersing the cleaning cage 1 into the second cleaning tank, the cleaning cage 1 is pulled out of the second cleaning tank, and in the aforementioned drying process, the cleaning cage 1 is housed in a dryer. The polysilicon housed in the cleaning cage 1 is dried by hot air from the dryer.

[0033] <Composition of the cleaning cage>

[0034] Figure 1 This is a side view of the cleaning cage 1 according to an embodiment of the present invention. Figure 2 yes Figure 1The top view of the washing cage 1 shown. Figure 3 yes Figure 1 The front view of the washing cage 1 shown. Figure 1 In this design, the long side of the cleaning cage 1 is defined as the X-axis, the height of the cleaning cage 1 is defined as the Z-axis, and the depth of the cleaning cage 1 (the direction of the short side) is defined as the Y-axis. Additionally, the direction from the opening of the cleaning cage 1 towards the bottom plate 2 is defined as the downward direction, and the direction from the bottom plate 2 towards the opening of the cleaning cage 1 is defined as the upward direction. Figure 4 yes Figure 1 The A-A sectional view of the washing cage 1 shown.

[0035] like Figure 1-4 As shown, the cleaning cage 1 includes multiple components 10 made of resin and screws N made of resin. The multiple components 10 are connected to each other by screwing in the screws N.

[0036] Component 10 and screw N are both made of fluororesin. Fluororesin has high chemical resistance, reducing the risk of cracking and peeling caused by acidic cleaning solutions used in the cleaning process. Furthermore, fluororesin has high heat resistance, allowing for drying of the polysilicon after etching while it is housed in the cleaning cage 1. Moreover, fluororesin has high mechanical strength, thus suppressing the amount of wear on the cleaning cage 1 when it comes into contact with the polysilicon, preventing contamination of the polysilicon by the worn resin sheets of the cleaning cage 1.

[0037] <Components>

[0038] like Figure 1-4 As shown, the cleaning cage 1 has a base plate 2, a first side plate 3, a second side plate 4, and a third side plate 5 as constituent components 10. The base plate 2, the first side plate 3, the second side plate 4, and the third side plate 5 have the same thickness. By making the thickness of these plates uniform, material costs can be reduced.

[0039] <Base Plate>

[0040] like Figure 1 As shown, the base plate 2 is configured approximately horizontally relative to the mounting surface on which the cleaning cage 1 is mounted, and supports the polysilicon when the cleaning cage 1 contains the polysilicon. Figure 5 yes Figure 1 The top view of the bottom plate 2 of the washing cage 1 shown. Figure 5As shown, the base plate 2 is a generally rectangular plate-shaped component with multiple elongated holes 21 extending along the long side direction (X-axis direction) of the base plate 2. The multiple elongated holes 21 are arranged along the short side direction (Y-axis direction) of the base plate 2, and multiple groups of these elongated holes 21 arranged along the Y-axis direction are configured to form a row in the X-axis direction. By making the holes formed in the base plate 2 elongated holes, the ratio (i.e., the opening ratio) of the total opening area of ​​each of the multiple elongated holes 21 relative to the area of ​​the inner surface 2a of the base plate 2 is increased, resulting in better drainage and air leakage from the cleaning cage 1.

[0041] Multiple screw holes NH2 are formed along the Y-axis direction of the base plate 2 on the side 2d of the short side. The screw holes NH2 are formed to be recessed relative to the side 2d. Figure 8 As shown, a screw hole NH5-2 is formed on the third side plate 5 at a location corresponding to the screw hole NH2 formed on the base plate 2. By aligning the position of the screw hole NH2 with the position of the screw hole NH5-2, the screw N can pass through the screw hole NH5-2 and be screwed into both the screw hole NH5-2 and the screw hole NH2, thereby connecting the third side plate 5 to the base plate 2.

[0042] <First Side Panel>

[0043] like Figure 1 As shown, the first side plate 3 is connected to the base plate 2 along the long side of the base plate 2, as follows: Figure 4 As shown, it extends in a direction away from the inner surface 2a (surface) of the base plate 2. Figure 6 yes Figure 1 The top view of the first side plate 3 of the washing cage 1 shown. Figure 6 As shown, the first side plate 3 is a generally rectangular plate-shaped component, and a plurality of holes 31 are formed in the first side plate 3.

[0044] Multiple screw holes NH3 are formed along the short side 3d of the first side plate 3. The screw holes NH3 are formed to be recessed relative to the side 3d. Figure 8 As shown, a screw hole NH5-3 is formed on the third side plate 5 at a position corresponding to the screw hole NH3 formed on the first side plate 3. By aligning the position of the screw hole NH3 with the position of the screw hole NH5-3, the screw N can pass through the screw hole NH5-3 and be screwed into both the screw hole NH5-3 and the screw hole NH3, thereby connecting the third side plate 5 with the first side plate 3.

[0045] in addition, Figure 4As shown, the first side plate 3 is inclined upward and outward along the long side of the inner surface 2a of the base plate 2 and is connected to the inner surface 2a. The bottom surface 3c of the first side plate 3 abuts against the inner surface 2a of the base plate 2, and also abuts against the outer edge 2c along the long side of the base plate 2. The first side plate 3 abuts against the inner surface 2a in an inclined manner relative to the base plate 2, so the bottom surface 3c of the first side plate 3 is not perpendicular to the inner surface 3a and the outer surface 3b of the first side plate 3.

[0046] By setting the first side plate 3 to be inclined relative to the base plate 2, the polysilicon tends to concentrate on the base plate 2 when it is contained in the cleaning cage 1. Furthermore, drainage from the cleaning cage 1 is improved. Moreover, the load on the polysilicon contained in the cleaning cage 1 is distributed between the base plate 2 and the first side plate 3. This reduces the load exerted on the base plate 2 from the polysilicon, thus reducing deformation of the base plate 2 due to load.

[0047] <Second side panel>

[0048] like Figure 1 As shown, the second side plate 4 is connected to the base plate 2 via the first side plate 3 along the long side of the base plate 2, as... Figure 4 As shown, it extends in a direction away from the inner surface 2a of the base plate 2. Specifically, the bottom surface 4c of the second side plate 4 abuts against the upper surface 3e of the first side plate 3 in a direction that is approximately perpendicular to the inner surface 2a of the base plate 2. Figure 7 yes Figure 1 A top view of the second side plate 4 of the washing cage 1 shown. Figure 7 As shown, the second side plate 4 is a roughly rectangular plate-shaped component, and a plurality of holes 41 are formed in the second side plate 4.

[0049] Additionally, multiple threaded holes NH4 are formed along the Z-axis direction on the side 4d of the short side plate 4. The threaded holes NH4 are formed to be recessed relative to the side 4d. For example... Figure 8 As shown, a screw hole NH5-4 is formed on the third side plate 5 at a position corresponding to the screw hole NH4 formed on the second side plate 4. By aligning the position of the screw hole NH4 with the position of the screw hole NH5-4, a screw N can be passed through the screw hole NH5-4 and screwed into both the screw hole NH5-4 and the screw hole NH4, thereby connecting the third side plate 5 and the second side plate 4.

[0050] <Third side panel>

[0051] like Figure 1 As shown, the third side plate 5 is connected to the base plate 2 along the short side of the base plate 2 and extends in a direction away from the inner surface 2a of the base plate 2. Thus, the first side plate 3, the second side plate 4, and the third side plate 5 are connected to the periphery of the base plate 2.

[0052] like Figure 1 as well asFigure 3 As shown, a pair of third side plates 5 sandwich the bottom plate 2, the first side plate 3, and the second side plate 4 by being connected to both ends of the bottom plate 2, the first side plate 3, and the second side plate 4. Figure 3 As shown, the bottom plate 2, the first side plate 3, and the second side plate 4 are combined with each other by being fixed to the third side plate 5 by screwing in of the screws N. As a result, as shown, the housing space 20 in which the polysilicon is housed is formed. Figure 4 As shown, a pair of third side plates 5 sandwich the bottom plate 2, the first side plate 3, and the second side plate 4 by being connected to both ends of the bottom plate 2, the first side plate 3, and the second side plate 4.

[0053] Figure 8 As shown, a pair of third side plates 5 sandwich the bottom plate 2, the first side plate 3, and the second side plate 4 by being connected to both ends of the bottom plate 2, the first side plate 3, and the second side plate 4. Figure 3 As shown, a pair of third side plates 5 sandwich the bottom plate 2, the first side plate 3, and the second side plate 4 by being connected to both ends of the bottom plate 2, the first side plate 3, and the second side plate 4.

[0054] <SCREW>

[0055] The screws N are disk-shaped screws composed of resin. If a pan head screw, a rack screw, or the like is used in order to combine the bottom plate 2, the first side plate 3, the second side plate 4, and the third side plate 5, the screw head protrudes from the surface of the third side plate 5. If the cleaning of the polysilicon is performed in a state in which the screw head protrudes from the surface of the third side plate 5, the protruding screw head is consumed, and there is a possibility that the polysilicon is contaminated by the resin chip generated due to the consumption of the screw head.

[0056] Therefore, in the present embodiment, a disk-shaped screw is used as the screw N. As a result, the upper surface of the screw head and the surface of the third side plate 5 are arranged on the same plane, so it is possible to prevent the contamination of the polysilicon caused by the protrusion of the screw head of the screw N from the surface of the third side plate 5.

[0057] Further, instead of using a disk-shaped screw as the screw N, the screw head can be shaved so as not to protrude from the surface of the third side plate 5, and the upper surface of the screw head and the surface of the third side plate 5 are arranged on the same plane. Further, the member used in order to combine the constituent members 10 is not limited to the screw N. The member used in order to combine the constituent members 10 is a member composed of a material having high resistance to chemicals and heat, and it is sufficient that the member does not protrude from the surface of the constituent members 10 in order to combine the constituent members 10. As the member used in order to combine the constituent members 10, for example, a rivet composed of resin or the like can be used.

[0058] <ASSEMBLY METHOD>

[0059] Next, the assembling method of the cleaning cage 1 will be described. First, the bottom plate 2 is fixed to the third side plate 5 by screwing the screw N. After the bottom plate 2 is fixed to the third side plate 5, the first side plate 3 is fixed to the third side plate 5 by screwing the screw N so that the first side plate 3 abuts on the inner face 2a of the bottom plate 2 in the longitudinal direction of the bottom plate 2. After the first side plate 3 is fixed to the third side plate 5, the second side plate 4 is fixed to the third side plate 5 by screwing the screw N so that the bottom face 4c of the second side plate 4 abuts on the upper face 3e of the side of the first side plate 3 opposite to the side of the bottom plate 2.

[0060] The bottom plate 2, the first side plate 3, and the second side plate 4 are fixed to the third side plate 5, so the positions of the respective plates are fixed. Therefore, for example, in order to form the accommodation space 20, the bottom plate 2 and the first side plate 3 do not need to be fixed to each other, so welding between the bottom plate 2 and the first side plate 3 can be omitted. Similarly, in order to form the accommodation space 20, the first side plate 3 and the second side plate 4 do not need to be fixed to each other, so welding between the first side plate 3 and the second side plate 4 can be omitted.

[0061] Thus, the cleaning cage 1 can be assembled without welding. Therefore, the cleaning cage 1 can be configured so that a portion that is likely to be broken or peeled in the cleaning process, which is weak to the cleaning liquid, is not formed, and the contamination of the polysilicon in the cleaning process can be prevented.

[0062] Further, the positions of the bottom plate 2, the first side plate 3, and the second side plate 4 are determined by the positions of the plurality of screw holes NH5-2 to NH5-4 formed in the third side plate 5. Therefore, by forming the screw holes NH5-2 to NH5-4 in the third side plate 5 in advance, the variation of the finished product from the assembler can be reduced. Further, the first side plate 3 that is inclined at a prescribed angle with respect to the bottom plate 2 and the second side plate 4 can be easily disposed.

[0063] Figure 9 is a view for describing the welding portion W. Based on Figure 9 The screw N is screwed in while the screw N is prevented from loosening. In order to screw the screw N in the third side plate 5, the screw N is screwed in while the screw N is prevented from loosening. Figure 3 After the bottom plate 2, the first side plate 3, and the second side plate 4 are fixed to the third side plate 5 by screwing the screw N, as shown in Figure 9 part of the boundary portion of the screw N and the third side plate 5 is melted, and the welding portion W is formed in the boundary portion of the screw N and the third side plate 5. Thus, the screw N can be prevented from loosening, and the screw N can be prevented from coming off from the position where the screw N is screwed in. Further, after the welding portion W is formed, the torque screw driver is used to apply torque to the screw N in the direction opposite to the direction in which the screw N is screwed in at a torque value of 45 cN m or more, and it is confirmed that the screw N does not come off from the position where the screw N is screwed in.

[0064] Thus, by not welding between the bottom plate 2, the first side plate 3, the second side plate 4, and the third side plate 5, and by performing the formation of the welding portion W and the confirmation that the screw N does not fall from the position into which the screw N is screwed, and the like, it is possible to reduce the variation in the strength with which the cage 1 is washed by the assembler.

[0065] <EFFECTS>

[0066] As described above, polycrystalline silicon used for silicon semiconductor raw materials, solar cell raw materials, and the like requires high purity. Specifically, in the case where a small amount of heavy metals is attached to the surface of the polycrystalline silicon, the polycrystalline silicon is not qualified. In order to maintain high purity, it is necessary to take careful contamination prevention measures to achieve the production of polycrystalline silicon with high purity.

[0067] In the present embodiment, by screwing the resin-made screws N to combine the constituent members 10 of the resin-made cage 1 with each other, it is possible to omit the welding between the constituent members 10 at the time of assembly of the cage 1. Thus, it is possible to prevent the contamination of the polycrystalline silicon in the washing process, and to achieve the cage 1 that maintains high purity as described above.

[0068] According to such a configuration, in the manufacturing process of polycrystalline silicon, it is possible to reduce the cases where the polycrystalline silicon becomes waste due to contamination of the polycrystalline silicon. Thus, it is possible to contribute to the goal 12 "responsibility to create responsibility to use" of the sustainable development goals (SDGs).

[0069] [Example 1]

[0070] <Polycrystalline silicon washing and drying>

[0071] The polycrystalline silicon washing and drying in Example 1 will be described. First, a polycrystalline silicon rod manufactured by the Siemens method is crushed into pieces using a hammer. The polycrystalline silicon thus obtained is housed in the cage, and the polycrystalline silicon is washed by immersing the cage in which the polycrystalline silicon is housed in a first washing tank filled with fluoboric acid.

[0072] Next, the cage is pulled up from the first washing tank, and the cage is immersed in a second washing tank filled with ultrapure water, thereby washing away the fluoboric acid attached to the polycrystalline silicon. Thereafter, the cage is pulled up from the second washing tank, and the cage is housed in a drying machine. The polycrystalline silicon housed in the cage is dried by blowing hot air from the drying machine.

[0073] After the polycrystalline silicon washing and drying described above is performed once or more per day on average over a period of three months while repeatedly using the cage of Example 1, the presence or absence of the resin sheet in the washing liquid and the appearance of the cage are visually observed. In addition, Comparative Example 1 described later also performs polycrystalline silicon washing and drying in the same manner, and the presence or absence of the resin sheet in the washing liquid and the appearance of the cage are observed.

[0074] <Configuration of the cleaning cage>

[0075] In Example 1, a cleaning cage was used in which the constituent members and the screws were each made of a PVDF (polyvinylidene fluoride) resin. More specifically, the cleaning cage used in Example 1 had a bottom plate and side plates as the constituent members, and the constituent members were each joined to each other by being screwed into the screws. The cleaning cage used in Example 1 did not have a welded portion that joined the constituent members to each other.

[0076] <Results>

[0077] Table 1 below shows the results of Example 1 and Comparative Example 1. As shown in Table 1, in the cleaning cage used in Example 1, no cracking or peeling due to deterioration was found. In addition, no resin pieces were found in the cleaning solution.

[0078] [Table 1]

[0079]

[0080] [Comparative Example 1]

[0081] In Comparative Example 1, the cleaning and drying of polysilicon were performed by the same method as in Example 1, except that the cleaning cage did not use screws, and had a welded portion that joined the constituent members of the cleaning cage to each other.

[0082] As shown in Table 1, in the cleaning cage used in Comparative Example 1, some whitening due to deterioration was found in the welded portion. In addition, resin pieces generated from the cleaning cage were found in the cleaning solution, and resin powder was retained in the cleaning solution filter provided at the discharge port of the first cleaning tank.

[0083] [Summary]

[0084] A cleaning cage according to an embodiment of the present application is a cleaning cage for cleaning polysilicon in a state in which the polysilicon is housed, and includes a plurality of constituent members made of a resin, the plurality of constituent members being joined to each other by being screwed into screws made of a resin.

[0085] According to the above configuration, the constituent members of the cleaning cage made of a resin are joined to each other by being screwed into screws made of a resin, so welding is not required to join the constituent members to each other when the cleaning cage is assembled. Therefore, the cleaning cage can be configured without forming a portion that is weak to a cleaning solution because an organic component or carbon is easily eluted due to deterioration caused by a chemical solution, and cracking or peeling occurs. As a result, a cleaning cage that can prevent contamination of polysilicon during a cleaning process can be achieved.

[0086] In addition, in the cleaning cage, the constituent member and the screw can each be made of fluororesin. According to the above configuration, the constituent member and the screw are made of fluororesin which has high chemical resistance, so that the constituent member and the screw are less likely to be deteriorated by the chemical liquid, and the risk of elution, breakage, or peeling of organic components or carbon can be reduced. In addition, by making the constituent member and the screw have the same material and the same coefficient of thermal expansion, adverse situations caused by a difference in the coefficient of thermal expansion between the constituent member and the screw can be prevented.

[0087] In addition, the cleaning cage can have a bottom plate and a side plate connected to the periphery of the bottom plate and extending away from the surface of the bottom plate as the constituent member, and the bottom plate and the side plate can be combined with each other by screwing of the screw.

[0088] According to the above configuration, the bottom plate and the side plate made of resin are combined with each other by screwing of the screw made of resin, and a storage space for storing the polysilicon is formed. Thus, for the portion storing the polysilicon, the cleaning cage can be configured without forming a portion that is easily deteriorated by the chemical liquid, and is weak to the cleaning liquid, such as a portion that is broken or peeled, in a cleaning process in which the polysilicon is cleaned with a cleaning chemical. As a result, a cleaning cage that can prevent contamination of the polysilicon in the cleaning process can be realized.

[0089] The present application is not limited to the above-described embodiments, and various modifications can be made within the scope of the claims, and configurations obtained by appropriately combining the technical means disclosed in the respective embodiments are also included in the technical scope of the present application.

[0090] Explanation of Reference Numerals

[0091] 1 Cleaning cage

[0092] 2 Bottom plate

[0093] 2a Inner surface (surface)

[0094] 3 First side plate (side plate)

[0095] 4 Second side plate (side plate)

[0096] 5 Third side plate (side plate)

[0097] 10 Constituent member

[0098] 20 Storage space

[0099] N Screw

Claims

1. A cleaning cage, characterized in that, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, 2. The cleaning cage of claim 1, wherein, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a state where the polysilicon is accommodated, The cleaning cage is a cleaning cage for cleaning polysilicon in a

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