Antireflection layer structure and method for manufacturing the same, display panel, display device

Abstract

An anti-reflective laminate structure, its manufacturing method, a display panel, and a display device are provided. The anti-reflective laminate structure includes: a substrate having a first refractive index and a first surface; an antistatic layer disposed on one side of the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface; and an anti-reflective layer disposed between the substrate and the antistatic layer, the anti-reflective layer including at least one composite layer, the composite layer including a first anti-reflective layer and a second anti-reflective layer, the first anti-reflective layer having a third refractive index and the second anti-reflective layer having a fourth refractive index; at most one first anti-reflective layer is bonded to the first surface of the substrate, and at most one second anti-reflective layer is bonded to the second surface of the antistatic layer, the second refractive index being greater than the first refractive index and the fourth refractive index, and the third refractive index being greater than the first refractive index and the fourth refractive index.

Description

Technical Field

[0001] This disclosure relates to the field of display technology, and more specifically, to an anti-reflective laminate structure and its manufacturing method, a display panel, and a display device. Background Technology

[0002] With the development of display technology, display devices are applied to all aspects of life, such as automobiles, laptops, and mobile phones. Different display devices have different requirements for different environments. For example, for display devices such as automotive displays that need to be used outdoors, they need to have good readability in well-lit outdoor environments. The anti-reflective properties of the display panels in related technologies are poor and cannot meet the anti-reflective requirements of outdoor light. In addition, other anti-reflective layered structures have high manufacturing costs and long manufacturing times, which cannot effectively improve the production efficiency of products.

[0003] It should be noted that the information disclosed in the background section above is only used to enhance the understanding of the background of this disclosure, and therefore may include information that does not constitute prior art known to those skilled in the art. Summary of the Invention

[0004] In one aspect, an anti-reflective laminate structure is provided, comprising:

[0005] A substrate having a first refractive index and a first surface;

[0006] An antistatic layer is disposed on one side of the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface;

[0007] An anti-reflective layer is disposed between the substrate and the antistatic layer. The anti-reflective layer includes at least one composite layer, which includes a first anti-reflective layer and a second anti-reflective layer. The first anti-reflective layer has a third refractive index, and the second anti-reflective layer has a fourth refractive index.

[0008] At most one first anti-reflective layer is bonded to the first surface of the substrate, and at most one second anti-reflective layer is bonded to the second surface of the antistatic layer.

[0009] The second refractive index is greater than the first refractive index and the fourth refractive index, and the third refractive index is greater than the first refractive index and the fourth refractive index.

[0010] In some exemplary embodiments of this disclosure, the thickness of the first antireflective layer is less than or equal to the thickness of the second antireflective layer.

[0011] In some exemplary embodiments of this disclosure, the material used to manufacture the antistatic layer includes at least one of transparent metal oxide materials, solution-type conductive polymer materials, and sputtered inorganic materials.

[0012] In some exemplary embodiments of this disclosure, the antireflective layer includes a plurality of the composite layers, wherein the thickness of the composite layer near the substrate is less than or equal to the thickness of the composite layer near the antistatic layer.

[0013] In some exemplary embodiments of this disclosure, the antireflective layer includes a first composite layer near the substrate and a second composite layer near the antistatic layer; the first antireflective layer of the first composite layer is bonded to a first surface of the substrate, and the second antireflective layer of the second composite layer is bonded to a second surface.

[0014] In some exemplary embodiments of this disclosure, the antireflective layer includes a first composite layer adjacent to the substrate, a third composite layer adjacent to the antistatic layer, and a second composite layer located between the first composite layer and the third composite layer.

[0015] Wherein, the thickness of the first composite layer is less than or equal to the thickness of the second composite layer, and the thickness of the second composite layer is less than or equal to the thickness of the third composite layer.

[0016] In some exemplary embodiments of this disclosure, the first refractive index is 1.45 to 1.55; the second refractive index is 1.50 to 1.90; the third refractive index is 1.80 to 2.30; and the fourth refractive index is 1.44 to 1.52.

[0017] In some exemplary embodiments of this disclosure, the materials used to manufacture the first antireflective layer and the materials used to manufacture the second antireflective layer are different.

[0018] In some exemplary embodiments of this disclosure, the material used to manufacture the first antireflective layer includes SiNx; and the material used to manufacture the second antireflective layer includes SiO2.

[0019] In some exemplary embodiments of this disclosure, the antireflective laminate structure further includes a polarizing layer disposed on the side of the antistatic layer away from the substrate.

[0020] In some exemplary embodiments of this disclosure, the polarizing layer has a fifth refractive index, which is less than the second refractive index.

[0021] In some exemplary embodiments of this disclosure, the fifth refractive index is 1.45 to 1.55.

[0022] In some exemplary embodiments of this disclosure, the thickness of the first antireflective layer is 5 nanometers to 65 nanometers; and the thickness of the second antireflective layer is 40 nanometers to 80 nanometers.

[0023] In some exemplary embodiments of this disclosure, the thickness of the antistatic layer is 14 nanometers to 30 nanometers.

[0024] In some exemplary embodiments of this disclosure, the transparent metal oxide material includes indium tin oxide; the solution-type conductive polymer material includes Heraeus-polyvinyldioxythiophene; and the sputtered inorganic material includes a mixture of graphite oxide, tin oxide, zinc oxide, aluminum oxide, antimony oxide, and surfactants and crosslinking agents.

[0025] In some exemplary embodiments of this disclosure, the substrate includes a color filter.

[0026] Another aspect of this disclosure provides a method for manufacturing an anti-reflective laminate structure, the method comprising:

[0027] A substrate is formed, the substrate having a first refractive index and a first surface;

[0028] An antistatic layer is formed on one side of the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface;

[0029] An anti-reflective layer is formed on one side of the substrate. The anti-reflective layer includes at least one composite layer, which includes a first anti-reflective layer and a second anti-reflective layer. The first anti-reflective layer has a third refractive index, and the second anti-reflective layer has a fourth refractive index.

[0030] An antistatic layer is formed on the side of the antireflective layer away from the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface;

[0031] At most one first anti-reflective layer is bonded to the first surface of the substrate, and at most one second anti-reflective layer is bonded to the second surface of the antistatic layer.

[0032] The second refractive index is greater than the first refractive index and the fourth refractive index, and the third refractive index is greater than the first refractive index and the fourth refractive index.

[0033] In another aspect of this disclosure, a display panel is provided, comprising: an array substrate; a color filter substrate disposed opposite to the array substrate; a liquid crystal layer disposed between the array substrate and the color filter substrate; and an anti-reflective stacked structure disposed on the side of the color filter substrate away from the array substrate, wherein the anti-reflective stacked structure is the anti-reflective stacked structure described above.

[0034] In some exemplary embodiments of this disclosure, the color filter substrate includes a substrate, and the substrate of the anti-reflective laminate structure includes the substrate of the color filter substrate.

[0035] Another aspect of this disclosure provides a display device including the display panel described above. Attached Figure Description

[0036] To more clearly illustrate the technical solutions in this disclosure, the accompanying drawings used in some embodiments of this disclosure will be briefly described below. Obviously, the drawings described below are only drawings of some embodiments of this disclosure, and those skilled in the art can obtain other drawings based on these drawings. In addition, the drawings described below can be regarded as schematic diagrams and are not intended to limit the actual size of the product, the actual flow of the method, the actual timing of the signals, etc. involved in the embodiments of this disclosure.

[0037] Figure 1 This is a schematic cross-sectional view of an anti-reflection laminate structure according to an exemplary embodiment of the present disclosure;

[0038] Figure 2 This is a cross-sectional structural schematic diagram of an anti-reflective laminated structure according to another exemplary embodiment of the present disclosure;

[0039] Figure 3 This is a cross-sectional structural schematic diagram of an anti-reflective laminated structure according to yet another exemplary embodiment of the present disclosure;

[0040] Figure 4 This is a schematic diagram of the refraction of incident light through the antireflective layer of an antireflective laminate structure according to an exemplary embodiment of the present disclosure;

[0041] Figure 5 This is a flowchart of a method for manufacturing an anti-reflective laminated structure according to an exemplary embodiment of the present disclosure;

[0042] Figure 6 This is a cross-sectional schematic diagram of a display panel according to an exemplary embodiment of the present disclosure.

[0043] Figure 7 This is a schematic diagram of a display device according to an exemplary embodiment of the present disclosure.

[0044] It should be noted that, for clarity, the dimensions of layers, structures, or regions in the accompanying drawings used to describe embodiments of this disclosure may be enlarged or reduced; that is, these drawings are not drawn to actual scale. Detailed Implementation

[0045] The technical solutions in some embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments provided in this disclosure are within the scope of protection of this disclosure.

[0046] Unless the context otherwise requires, throughout the specification and claims, the term "comprise" and its other forms, such as the third-person singular "comprises" and the present participle "comprising," are interpreted as open-ended and encompassing, meaning "including, but not limited to." In the description of the two specifications, the terms "one embodiment," "some embodiments," "exemplary embodiments," "example," "specific example," or "some examples," etc., are intended to indicate that a particular feature, structure, material, or characteristic associated with that embodiment or example is included in at least one embodiment or example of this disclosure. The illustrative representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics mentioned may be included in any suitable manner in any one or more embodiments or examples.

[0047] Hereinafter, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of embodiments of this disclosure, unless otherwise stated, "a plurality of" means two or more.

[0048] In describing some embodiments, the term "connection" and its derivative expressions may be used. For example, the term "electrical connection" may be used in describing some embodiments to indicate that two or more components are in direct physical or electrical contact with each other.

[0049] "At least one of A, B and C" has the same meaning as "at least one of A, B or C", both including the following combinations of A, B and C: only A, only B, only C, combinations of A and B, combinations of A and C, combinations of B and C, and combinations of A, B and C.

[0050] "A and / or B" includes the following three combinations: A only, B only, and a combination of A and B.

[0051] The use of “configured as” in this article implies an open and inclusive language that does not exclude the applicability to or configuration of devices to perform additional tasks or steps.

[0052] In addition, the use of “based on” implies openness and inclusivity, because processes, steps, calculations or other actions “based on” one or more of the stated conditions or values ​​may in practice be based on additional conditions or values ​​beyond those stated.

[0053] As used herein, “about” or “approximately” includes the stated value and the average value within an acceptable range of deviation from the given value, wherein the acceptable range of deviation is determined by a person skilled in the art taking into account the measurement under discussion and the error associated with the measurement of the given quantity (i.e., the limitations of the measurement system).

[0054] As used herein, “parallel,” “perpendicular,” and “equal” include the described situation and situations that are similar to the described situation, within an acceptable range of deviation, which is determined by those skilled in the art taking into account the measurement under discussion and the error associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, “parallel” includes absolute parallelism and approximate parallelism, where an acceptable range of deviation for approximate parallelism may be, for example, within 5°; “perpendicular” includes absolute perpendicularity and approximate perpendicularity, where an acceptable range of deviation for approximate perpendicularity may also be, for example, within 5°; “equal” includes absolute equality and approximate equality, where an acceptable range of deviation for approximate equality may be, for example, a difference between the two equals being less than or equal to 5% of either one.

[0055] It should be understood that when a layer or element is referred to as being on another layer or substrate, it can mean that the layer or element is directly on the other layer or substrate, or that there is an intermediate layer between the layer or element and the other layer or substrate.

[0056] In this article, "same layer" refers to a layer structure formed using the same film deposition process to create a specific pattern, and then using a photomask to form a single patterning process. Depending on the specific pattern, the single patterning process may include multiple exposure, development, or etching processes, and the specific pattern in the formed layer structure can be continuous or discontinuous, and these specific patterns may also be at different heights or have different thicknesses. Conversely, "different layers" refers to a layer structure formed using separate film deposition processes to create specific patterns, and then using separate photomasks to form a patterning process. For example, "two-layer-different-layer configuration" means that two layer structures are formed separately under corresponding process steps (film deposition process and patterning process).

[0057] This document describes exemplary embodiments with reference to cross-sectional views and / or plan views, which are idealized exemplary drawings. In the drawings, the thickness of layers and regions is enlarged for clarity. Therefore, variations in shape relative to the drawings are contemplated due to, for example, manufacturing techniques and / or tolerances. Thus, exemplary embodiments should not be construed as limited to the shapes of the regions shown herein, but rather include shape deviations due to, for example, manufacturing processes. For example, etched regions shown as rectangular would typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shapes of the regions of the device, nor are they intended to limit the scope of the exemplary embodiments.

[0058] In embodiments of this disclosure, the term "relative" means facing each other, for example, the first surface and the second surface being relative can mean that the first surface and the second surface are facing each other.

[0059] The term "antistatic layer" refers to a film layer used to resist electrostatic discharge, that is, a film layer that resists ESD (Electro-Static discharge). For example, it can be a film layer made of indium tin oxide, or it can be a high-resistivity film layer made of materials such as graphene.

[0060] In related technologies, because different layers of different display devices have different refractive indices, natural light has a high reflectivity when passing through different layers. When the reflectivity of natural light is high, resulting in the intensity of reflected natural light exceeding the brightness of the display device, the user will not be able to see the content displayed on the display device, affecting the readability of the display device. In addition, in order to obtain a better anti-reflection effect, the anti-reflection stacked structure in related technologies uses materials such as Nb2O5. Using this material results in relatively low impedance of the touch screen product, which cannot meet the requirements of touch performance. Furthermore, the manufacturing cost of this type of material is high, and the manufacturing time is long, resulting in low production efficiency.

[0061] To address the aforementioned problems, embodiments of this disclosure provide an anti-reflective laminate structure, comprising: a substrate having a first refractive index and a first surface; an antistatic layer disposed on one side of the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface; and an anti-reflective layer disposed between the substrate and the antistatic layer, the anti-reflective layer comprising at least one composite layer, the composite layer comprising a first anti-reflective layer and a second anti-reflective layer, the first anti-reflective layer having a third refractive index and the second anti-reflective layer having a fourth refractive index; wherein at most one first anti-reflective layer is bonded to the first surface of the substrate, and at most one second anti-reflective layer is bonded to the second surface of the antistatic layer, the second refractive index being greater than the first refractive index and the fourth refractive index, and the third refractive index being greater than the first refractive index and the fourth refractive index.

[0062] According to embodiments of this disclosure, by providing a first antireflective layer and a second antireflective layer in a stacked structure, and by making the second refractive index of the antistatic layer greater than the third refractive index greater than the first refractive index of the substrate and the fourth refractive index of the second antireflective layer, and by making the third refractive index of the first antireflective layer greater than the first refractive index of the substrate and the fourth refractive index of the second antireflective layer, a combination of high refractive index material and low refractive index material is achieved, thereby eliminating the influence of the antistatic layer on reflectivity. In the visible light wavelength range of 380 nm to 780 nm, the reflection of natural light is effectively reduced or eliminated.

[0063] The following is combined Figures 1 to 4 The structure of the anti-reflective laminate structure according to the embodiments of this disclosure will be described in detail.

[0064] Figure 1 This is a cross-sectional schematic diagram of an anti-reflective laminate structure according to an exemplary embodiment of the present disclosure. Figure 2 This is a cross-sectional schematic diagram of an anti-reflective laminate structure according to another exemplary embodiment of the present disclosure. Figure 3 This is a cross-sectional structural schematic diagram of an anti-reflective laminate structure according to yet another exemplary embodiment of the present disclosure.

[0065] In embodiments of this disclosure, such as Figures 1 to 3 As shown, the anti-reflective laminate structure includes a substrate 10, an antistatic layer 20, an anti-reflective layer 30, and a polarizing layer 40. The antistatic layer 20 is disposed on one side of the substrate 10, and the anti-reflective layer 30 is disposed between the substrate 10 and the antistatic layer 20. The anti-reflective layer 30 includes at least one composite layer. Each composite layer includes a first anti-reflective layer and a second anti-reflective layer. The first and second anti-reflective layers have different refractive indices, including a first anti-reflective layer with a high refractive index and a second anti-reflective layer with a low refractive index. The composite layer combines high-refractive-index and low-refractive-index materials to match the antistatic layer 20, enabling the anti-reflective layer to eliminate optical interference, thereby eliminating the influence of the antistatic layer 20 on the reflectivity and reducing the reflectivity.

[0066] In embodiments of this disclosure, the substrate 10 has a first surface, and the antistatic layer 20 has a second surface. The first and second surfaces are disposed opposite to each other, i.e., the first and second surfaces face each other. The antireflective layer 30 is bonded to the first surface of the substrate 10 and the second surface of the antistatic layer 20, respectively. The antireflective layer 30 includes at least one composite layer, at most one first antireflective layer of the composite layer is bonded to the first surface of the substrate 10, and at most one second antireflective layer of the composite layer is bonded to the second surface of the antistatic layer 20.

[0067] In embodiments of this disclosure, the substrate 10 has a first refractive index n1, the antistatic layer 20 has a second refractive index n2, the first antireflective layer has a third refractive index n3, and the second antireflective layer has a fourth refractive index n3. The second refractive index n2 is greater than the first refractive index n1 and the fourth refractive index n4, and the third refractive index n3 is greater than the first refractive index n1 and the fourth refractive index n4.

[0068] Because there is a significant difference in refractive indices between the first refractive index n1 of the substrate 10 and the second refractive index n2 of the antistatic layer 20 (the second refractive index n2 of the antistatic layer 20 is greater than the first refractive index n1 of the substrate 10), natural light experiences high reflectivity due to optical interference after passing through the antistatic layer 20 and the substrate 10. A composite layer is provided between the substrate 10 and the antistatic layer 20 to eliminate optical interference of natural light after passing through the antistatic layer 20 and the substrate 10, thereby reducing the reflectivity of natural light.

[0069] For example, by setting the second refractive index n2 to be greater than the first refractive index n1 and the fourth refractive index n4, and the third refractive index n3 to be greater than the first refractive index n1 and the fourth refractive index n4, the refractive indices of the antistatic layer 20, the second antireflection layer, the first antireflection layer, and the substrate 10 are arranged in a high refractive index-low refractive index-high refractive index-low refractive index form, that is, a combination of high refractive index and low refractive index, thereby reducing or eliminating the optical interference phenomenon generated when natural light enters the antistatic layer 20, the composite layer, and the substrate 10.

[0070] In embodiments of this disclosure, the material of the antistatic layer 20 includes one or more of the following: transparent metal oxide materials, solution-based conductive polymer materials, and sputtered inorganic materials. The transparent metal oxide material may be, for example, indium tin oxide; the solution-based conductive polymer material may be, for example, Heraeus-PEDOT; and the sputtered inorganic material may be, for example, a mixture of graphite oxide, tin oxide, zinc oxide, aluminum oxide, antimony oxide, etc., with a surfactant and a crosslinking agent. A high-resistivity film can be formed using either the solution-based conductive polymer material or the sputtered inorganic material, and the impedance of this high-resistivity film is 10 Ω·cm. 8 Up to 10 9 ohm.

[0071] In embodiments of this disclosure, the thickness of the first antireflective layer of the composite layer is less than or equal to the thickness of the second antireflective layer. The thickness of the first antireflective layer refers to its dimension in a direction perpendicular to the first surface of the substrate 10. The material used to fabricate the first antireflective layer in the composite layer includes SiN. x The material used to manufacture the second anti-reflective layer in the composite layer includes SiO2.

[0072] In embodiments of this disclosure, the substrate 10 has a first refractive index n1 of 1.45 to 1.55, a second refractive index of 1.50 to 1.90, a third refractive index of 1.80 to 2.30, and a fourth refractive index of 1.44 to 1.52.

[0073] In embodiments of this disclosure, the antireflective layer comprises multiple composite layers, wherein the thickness of the composite layer closest to the substrate is less than or equal to the thickness of the composite layer closest to the electrostatic layer.

[0074] For example, the composite layer can be configured as two or more layers, and the thickness of the composite layer tends to decrease from the direction closer to the electrostatic layer toward the direction closer to the substrate.

[0075] The thickness of the first antireflective layer in the composite layer is 5 nanometers to 65 nanometers, and the thickness of the second antireflective layer in the composite layer is 40 nanometers to 80 nanometers. The number of composite layers and the thicknesses of the first and second antireflective layers can be adjusted according to actual needs, for example, by determining the number of composite layers and the thicknesses of the first and second antireflective layers in the composite layer based on the first, second, third, and fourth refractive indices.

[0076] In embodiments of this disclosure, the thickness of the antistatic layer 20 is set to a range of 14 nanometers to 30 nanometers. The thickness of the antistatic layer 20 can be adjusted according to actual production needs.

[0077] Figure 4 This is a schematic diagram illustrating the refraction of incident light through the antireflective layer of an antireflective laminate structure according to an exemplary embodiment of the present disclosure. The following is in conjunction with... Figure 4 The structural design principle of the anti-reflection laminate structure according to the embodiments of this disclosure will be described in detail.

[0078] In related technologies, light is known to be an electromagnetic wave with wave characteristics. When one wave encounters another wave of the same frequency, interference occurs. The different initial phases of the two interfering waves lead to different amplitudes in the resulting waves, resulting in wave superposition, constructive interference, or destructive interference, causing an increase or decrease in wave intensity. For thin-film interference, multiple reflected and transmitted waves occur during reflection and transmission, but their intensity gradually decreases. Therefore, it is only necessary to consider the reflected wave reflected once between the thin films and the transmitted wave reflected twice. A phase difference will exist between these two waves and the original wave. This phase difference can be adjusted by changing the thickness of the thin film, thereby increasing the wave projection or reflection effect.

[0079] The following is combined Figure 4 Please provide an explanation, such as Figure 4 As shown, the incident light ray comes from a source with a refractive index of n. aA ray enters medium B from medium A, undergoes one reflection and one transmission, and the first reflected ray re-enters medium A, resulting in a second reflection and transmission. The first incident ray enters medium C and is reflected. The incident angle of the ray entering medium A is e0, the angle of refraction entering medium B is e1, and the angle of refraction after re-entering medium C is e2. The refractive indices of media A, B, C, and D are n, n, and n, respectively. a n b n c n d .

[0080] The reflection coefficients of light rays after passing through media B and media C can be calculated using the following formula, where the thicknesses of media B and media C are known to be h, respectively. b and h c :

[0081] For the reflection coefficient of medium B

[0082]

[0083] in,

[0084]

[0085]

[0086]

[0087] Therefore, the reflectivity of medium A is:

[0088]

[0089] The reflection coefficient for medium B is:

[0090]

[0091]

[0092] r2′=r1

[0093]

[0094] Therefore, the overall reflectivity of media B and media C is:

[0095]

[0096] That is, by determining the refractive index after interference of multiple media, and designing the thickness of the corresponding medium according to the refractive index of each medium, the reflectivity of the anti-reflection laminate structure is made low enough to meet the requirements. For example, when the actual medium thickness meets the production requirements, the total reflectivity of the final anti-reflection laminate structure is less than 5.33%, so that the anti-reflection laminate structure still has good display effect in outdoor light environment.

[0097] In one embodiment of this disclosure, such as Figure 1 As shown, in this embodiment, the antireflective layer 30 of the antireflective laminate structure 100 includes a composite layer 31. The composite layer 31 includes a first antireflective layer 311 and a second antireflective layer 312, the first antireflective layer 311 being attached to the first surface of the substrate 10. Figure 1 The upper surface of the substrate 10 is bonded together, and the second anti-reflective layer 312 is bonded to the second surface of the antistatic layer 20. Figure 1 (The lower surface of the antistatic layer 20) is bonded together.

[0098] In this embodiment, to meet the requirements of refractive index and manufacturing cost, the materials used to manufacture the first antireflective layer and the second antireflective layer are different.

[0099] For example, the first anti-reflective layer is selected from SiN. x The second antireflective layer is made of SiO2 material. The first refractive index n1 of the substrate 10 can be 1.5, the second refractive index n2 of the antistatic layer 20 can be 1.9, the third refractive index n3 of the first antireflective layer 311 can be 1.8, and the fourth refractive index n4 of the second antireflective layer 312 can be 1.45. The thickness of the first antireflective layer 311 is the same as that of the second antireflective layer 312. The thickness of the first antireflective layer 311 is set in the range of 5 nm to 65 nm, for example, 50 nm. The thickness of the second antireflective layer 312 is set in the range of 40 nm to 80 nm, for example, 50 nm. The thickness of the antistatic layer 20 is set in the range of 14 nm to 30 nm, for example, 16 nm.

[0100] Based on the design principles of the anti-reflective laminated structure described above, the anti-reflective laminated structure of this embodiment was simulated and verified to determine the reflectivity R of the film layer composed of the composite layer 31 and the antistatic layer 20. IM The total reflectance R of the film layer composed of the composite layer 31, the antistatic layer 20, and the polarizing layer 40 of the antireflective laminate structure is 0.76%. total The value is 5.07%, thus achieving a good anti-reflective effect.

[0101] For example, the first refractive index n1 of the substrate 10 is determined to be 1.5, the second refractive index n2 of the antistatic layer 20 is determined to be 1.9, the third refractive index n3 of the first antireflective layer 311 can be 1.85, and the fourth refractive index n4 of the second antireflective layer 312 can be 1.45, when the thickness of each film layer is the same as in the above embodiment. Then the reflectivity R of the film layer composed of the composite layer 31 and the antistatic layer 20 in this antireflective laminate structure is... IM The total reflectance R of the antireflective laminated structure, consisting of composite layer 31, antistatic layer 20, and polarizing layer 40, is 1.29%. total It is 5.26%.

[0102] According to this embodiment, when the minimum thickness of the first antireflective layer is 50 nanometers, the third refractive index n3 of the first antireflective layer can be 1.8, resulting in the minimum total reflectivity R. total The total reflectance is 5.07%, meaning that with only one composite layer, the minimum total reflectance can be achieved, thereby improving the anti-reflection effect of the anti-reflection stacked structure.

[0103] In other embodiments of this disclosure, the thicknesses of the first antireflective layer and the second antireflective layer can be adjusted according to actual needs. For example, the minimum thickness of the first antireflective layer can be 5 nanometers, and the minimum thickness of the second antireflective layer can be 40 nanometers.

[0104] In another embodiment of this disclosure, such as Figure 2 As shown, in this embodiment, the antireflective layer 30 of the antireflective laminate structure 200 includes two composite layers, exemplarily including a first composite layer 31 near the substrate 10 and a second composite layer 32 near the antistatic layer 20. The first composite layer 31 includes a first antireflective layer 311 and a second antireflective layer 312, and the second composite layer 32 includes a first antireflective layer 321 and a second antireflective layer 322. The first antireflective layer 311 of the first composite layer 31 is bonded to the first surface of the substrate 10, the second antireflective layer 322 of the second composite layer 32 is bonded to the second surface of the antistatic layer 20, and the second antireflective layer 312 of the first composite layer 31 is bonded to the first antireflective layer 321 of the second composite layer 32.

[0105] In this embodiment, the first antireflective layer and the second antireflective layer in the first composite layer 31 and the second composite layer 32 are made of the same material, for example, the first antireflective layer is made of SiN. xThe second anti-reflective layer is made of SiO2 material. The first refractive index n1 of the substrate 10 is determined to be 1.5, the second refractive index n2 of the antistatic layer 20 is determined to be 1.9, the third refractive index n3 of the first anti-reflective layer 311 of the first composite layer 31 and the first anti-reflective layer 321 of the second composite layer 32 is determined to be 1.8, and the fourth refractive index n4 of the second anti-reflective layer 312 of the first composite layer 31 and the second anti-reflective layer 322 of the second composite layer 32 is determined to be 1.45. In actual manufacturing, due to SiN… x The thickness of the material is determined based on the actual limits of the equipment. For example, in this embodiment, the equipment forms SiN. x The minimum thickness of the material is 50 nanometers. Therefore, to meet actual production needs and reduce manufacturing costs, the thickness of the first antireflective layer 311 of the first composite layer 31 and the first antireflective layer 321 of the second composite layer 32 are both set to the minimum value, i.e., 50 nanometers. By further adjusting the thickness of the second antireflective layer 322 of the second composite layer 32, the reflectivity of the antireflective laminate structure is reduced to a minimum. In this embodiment, the thickness of the second antireflective layer is set in the range of 50 to 80 nanometers. For example, the thickness of the second antireflective layer 312 of the first composite layer 31 is set to 50 nanometers, and the thickness of the second antireflective layer 322 of the second composite layer 32 is set to 80 nanometers. Another example is that the thickness of the second antireflective layer 312 of the first composite layer 31 is set to 50 nanometers, and the thickness of the second antireflective layer 322 of the second composite layer 32 is set to 75 nanometers.

[0106] In one embodiment, the antireflective laminate structure of this embodiment is simulated and verified using the design principle of the antireflective laminate structure described above. When the antireflective laminate structure consists of two composite layers, and the thickness of the first antireflective layer 311 of the first composite layer 31 is 50 nanometers, the thickness of the second antireflective layer 312 of the first composite layer 31 is 50 nanometers, the thickness of the first antireflective layer 321 of the second composite layer 32 is 50 nanometers, and the thickness of the second antireflective layer 322 of the second composite layer 32 is 80 nanometers, the reflectivity R of the film layer composed of the first composite layer 31, the second composite layer 32, and the antistatic layer 20 of the antireflective laminate structure is determined. iM The total reflectance R of the antireflective laminate structure, composed of the first composite layer 31, the second composite layer 32, the antistatic layer 20, and the polarizing layer 40, is 0.08%. total The value is 5.15%, thus achieving a better anti-reflective effect.

[0107] In another embodiment, the anti-reflective laminate structure of this embodiment is simulated and verified using the design principle of the anti-reflective laminate structure described above. When the anti-reflective laminate structure consists of two composite layers, and the thickness of the first anti-reflective layer 311 of the first composite layer 31 is 50 nanometers, the thickness of the second anti-reflective layer 312 of the first composite layer 31 is 50 nanometers, the thickness of the first anti-reflective layer 321 of the second composite layer 32 is 50 nanometers, the thickness of the second anti-reflective layer 322 of the second composite layer 32 is 75 nanometers, the third refractive index n3 of the first anti-reflective layer is 1.85, and the refractive index n4 of the second anti-reflective layer is 1.45. The reflectivity R of the film layer composed of the first composite layer 31, the second composite layer 32, and the antistatic layer 20 of this anti-reflective laminate structure is determined. IM The total reflectance R of the antireflective laminate structure, composed of the first composite layer 31, the second composite layer 32, the antistatic layer 20, and the polarizing layer 40, is 0.32%. total It is 5.23%.

[0108] According to this embodiment, when the antireflective laminate structure consists of two composite layers, and the minimum thickness of the first antireflective layer is 50 nanometers, and the third refractive index n3 of the first antireflective layer is determined to be 1.8, the reflective laminate structure has the minimum total reflectivity R. total The total reflectance is 5.07%, meaning that when the antireflective laminate structure has two composite layers, the first antireflective layer can achieve the minimum total reflectance when the third refractive index n3 is 1.8, thereby improving the antireflective effect of the antireflective laminate structure.

[0109] According to embodiments of this disclosure, by setting the composite layer into a stacked structure with different refractive indices, and making the thickness of the composite layer near the substrate less than or equal to the thickness of the composite layer near the antistatic layer, the reflectivity of ambient light incident on the antireflective layer can be reduced, thereby enabling the display device with the antireflective stacked structure to have a better display effect.

[0110] In yet another embodiment of this disclosure, such as Figure 3 As shown, in this embodiment, the antireflective layer 30 of the antireflective laminate structure 300 includes three composite layers. Exemplarily, it includes a first composite layer 31 near the substrate 10, a third composite layer 33 near the antistatic layer 20, and a second composite layer 32 located between the first composite layer 31 and the third composite layer 33. The first composite layer 31 includes a first antireflective layer 311 and a second antireflective layer 312; the second composite layer 32 includes a first antireflective layer 321 and a second antireflective layer 322; and the third composite layer 33 includes a first antireflective layer 331 and a second antireflective layer 332. The first antireflective layer 311 of the first composite layer 31 is bonded to the first surface of the substrate 10, and the second antireflective layer 332 of the third composite layer 33 is bonded to the second surface of the antistatic layer 20.

[0111] In this embodiment, in the three composite layers, the thickness of the first and second antireflective layers in each composite layer is set to the same dimension, for example, the thickness is set to 50 nanometers, and the third refractive index n3 of the first antireflective layer is 1.8. The antireflective composite structure of this embodiment is simulated and verified using the design principle of the antireflective composite structure described above, when the antireflective composite structure consists of three composite layers. The reflectivity R of the film layer composed of the first composite layer 31, the second composite layer 32, the third composite layer 33, and the antistatic layer 20 is determined. iM The total reflectance R of the antireflective laminate structure, composed of the first composite layer 31, the second composite layer 32, the antistatic layer 20, and the polarizing layer 40, is 0.24%. total It is 5.20%.

[0112] In another exemplary embodiment, the antireflective laminate structure includes three composite layers. When all layers have the same thickness, for example, 50 nanometers, and the third refractive index of the first antireflective layer is determined to be 1.85, the antireflective laminate structure of this embodiment is simulated and verified using the design principles of the antireflective laminate structure described above. The reflectivity R of the film layer composed of the first composite layer 31, the second composite layer 32, the third composite layer 33, and the antistatic layer 20 of the antireflective laminate structure is determined. IM The total reflectance R of the antireflective laminate structure, consisting of the first composite layer 31, the second composite layer 32, the antistatic layer 20, and the polarizing layer 40, is 0.37%. total It is 5.24%.

[0113] According to this embodiment, when the antireflective stacked structure is composed of three composite layers, and the minimum thickness of the first antireflective layer is 50 nanometers, and the third refractive index n3 of the first antireflective layer is determined to be 1.8, the antireflective stacked structure has the minimum total reflectivity R. total The total reflectance is 5.07%, meaning that when the anti-reflective laminate structure has three composite layers, the first anti-reflective layer can achieve the minimum total reflectance when the third refractive index n3 is 1.8, thereby improving the anti-reflective effect of the anti-reflective laminate structure.

[0114] In an exemplary embodiment of this disclosure, the antireflective layer includes a first composite layer near the substrate, a third composite layer near the antistatic layer, and a second composite layer located between the first composite layer and the third composite layer. The thickness of the first composite layer is less than or equal to the thickness of the second composite layer, and the thickness of the second composite layer is less than or equal to the thickness of the third composite layer.

[0115] According to embodiments of this disclosure, by setting the thickness of the composite layer near the electrostatic layer to the composite layer near the substrate to a gradually decreasing stacked structure, the reflectivity of incident light after entering the anti-reflection layer can be reduced, thereby achieving a good anti-reflection effect of the anti-reflection stacked structure.

[0116] In exemplary embodiments of this disclosure, such as Figures 1 to 3 As shown, the anti-reflection stacked structure of this embodiment further includes a polarizing layer 40 disposed on the side of the antistatic layer 20 away from the substrate 10. The polarizing layer 40 has a fifth refractive index n5, which is less than the second refractive index n2 of the antistatic layer 20. This results in the film structure in the anti-reflection stacked structure exhibiting a combination of high and low refractive indices, thereby reducing or eliminating the reflection effect and achieving the minimum reflectivity.

[0117] For example, the fifth refractive index n5 is in the range of 1.45 to 1.55, such as 1.52.

[0118] In the embodiments of this disclosure, the first anti-reflection layer is selected from SiN. x Materials manufactured using different processes have different refractive indices. For example, materials containing SiN manufactured using a low-temperature film deposition process... x The first antireflective layer has a refractive index of 1.8 and is manufactured using a high-temperature film-forming process, containing SiN. x The refractive index of the first antireflective layer is 1.85.

[0119] As mentioned above, in the process of manufacturing the first anti-reflection layer, when the minimum thickness is 50 nanometers, the optimal anti-reflection effect can be achieved by determining the refractive index of the first anti-reflection layer to be 1.8. At the same time, the low-temperature film-forming process is used to effectively reduce the manufacturing cost.

[0120] Figure 5 This is a flowchart of a method for manufacturing an anti-reflective laminate structure according to an exemplary embodiment of the present disclosure.

[0121] The following is combined Figure 5 The manufacturing method of the anti-reflective laminate structure according to the embodiments of this disclosure will be described in detail.

[0122] like Figure 5 As shown, the process S100 of the manufacturing method of the anti-reflective laminate structure includes operations S110 to S130.

[0123] In operation S110, a substrate is formed, the substrate having a first refractive index and a first surface.

[0124] For example, the substrate may be a color filter glass substrate. The substrate has different refractive indices depending on the manufacturing process and materials. In this embodiment, the refractive index of the substrate is in the range of 1.45 to 1.55, for example, 1.50.

[0125] In operation S120, an anti-reflective layer is formed on one side of the substrate. The anti-reflective layer includes at least one composite layer, which includes a first anti-reflective layer and a second anti-reflective layer. The first anti-reflective layer has a third refractive index, and the second anti-reflective layer has a fourth refractive index.

[0126] For example, when forming the composite layer of antireflective layers, different forming processes and forming materials are used to make the first antireflective layer and the second antireflective layer of the composite layer have different refractive indices, thereby achieving different antireflective effects.

[0127] For example, SiN is used to form the first anti-reflection layer. x When the material is manufactured using a low-temperature film-forming process, a first anti-reflective layer with a refractive index of 1.8 can be obtained; when manufactured using a high-temperature film-forming process, a first anti-reflective layer with a refractive index of 1.85 can be obtained.

[0128] For example, the second anti-reflective layer is formed using SiO2 material.

[0129] In the embodiments of this disclosure, multiple composite layers can be formed through different processes, such as one composite layer, two composite layers, three composite layers, or other numbers of composite layers. The number of composite layers can be adjusted according to the actual anti-reflective performance requirements.

[0130] In operation S130, an antistatic layer is formed on the side of the antireflective layer away from the substrate. The antistatic layer has a second refractive index and a second surface opposite to the first surface. At most one first antireflective layer is attached to the first surface of the substrate, and at most one second antireflective layer is attached to the second surface of the antistatic layer. The second refractive index is greater than the first refractive index and the fourth refractive index, and the third refractive index is greater than the first refractive index and the fourth refractive index.

[0131] For example, after forming the anti-reflective layer, an antistatic layer is formed on the side of the anti-reflective layer away from the substrate. Since the refractive index of the antistatic layer is higher than that of the substrate, by setting an anti-reflective layer composed of a composite layer between the substrate and the antistatic layer, the reflection of natural light is reduced or eliminated, thereby reducing the reflectivity.

[0132] In embodiments of this disclosure, the method for manufacturing the antireflective layer further includes forming a polarizing layer on the side of the antistatic layer away from the substrate.

[0133] According to embodiments of this disclosure, the antireflective laminate structure manufactured by the antireflective laminate structure manufacturing method of this disclosure has a first antireflective layer and a second antireflective layer in a laminated structure. The second refractive index of the antistatic layer is greater than the third refractive index, which is greater than the first refractive index of the substrate and the fourth refractive index of the second antireflective layer. The third refractive index of the first antireflective layer is greater than the first refractive index of the substrate and the fourth refractive index of the second antireflective layer. This achieves the combination of high refractive index materials and low refractive index materials, thereby eliminating the influence of the antistatic layer on the reflectivity. In the visible light wavelength range of 380 nm to 780 nm, the reflection of natural light is effectively reduced or eliminated.

[0134] Figure 6 This is a cross-sectional schematic diagram of a display panel according to an exemplary embodiment of the present disclosure.

[0135] like Figure 6 As shown, in some embodiments of this disclosure, a display panel 400 is also provided. The display panel includes an array substrate 401, a color filter substrate 403, a liquid crystal layer 402, and an anti-reflective laminate structure 100. The color filter substrate 403 is disposed opposite to the array substrate 401. The liquid crystal layer 402 is disposed between the array substrate 401 and the color filter substrate 403. The anti-reflective laminate structure 100 is disposed on the side of the color filter substrate 403 away from the array substrate 401.

[0136] In this embodiment, the display panel 400 includes a rear polarizer 404 on the side of the array substrate 401 away from the anti-reflective laminate structure 100. The liquid crystal layer 402 may include, for example, a liquid crystal material layer (LC layer) and a cover layer (OC layer) covering the liquid crystal material layer.

[0137] In embodiments of this disclosure, the anti-reflective laminate structure 100 is the anti-reflective laminate structure described above. The color filter substrate 403 includes a substrate, and the substrate of the anti-reflective laminate structure includes the substrate of the color filter substrate. According to embodiments of this disclosure, the anti-reflective laminate structure is disposed on the color filter substrate 403, thereby achieving the anti-reflective effect.

[0138] Figure 7 This is a schematic diagram of a display device according to an exemplary embodiment of the present disclosure.

[0139] like Figure 7 As shown, the display device 500 includes the display panel 400 described above.

[0140] The beneficial effects that the display device 500 in the above embodiments of this disclosure can achieve are the same as the beneficial effects that the display panel 400 and the anti-reflective laminate structure can achieve, and will not be repeated here.

[0141] The aforementioned display device 500 can be any device that displays images, whether moving (e.g., video) or fixed (e.g., still images), and whether it contains text or images. More specifically, the embodiments described are contemplated to be implemented in or associated with a variety of electronic devices, such as (but not limited to) in-vehicle displays, mobile phones, wireless devices, personal data assistants (PDAs), handheld or portable computers, GPS receivers / navigators, cameras, MP4 video players, camcorders, game consoles, watches, clocks, calculators, television monitors, flat panel displays, computer monitors, automotive displays (e.g., odometer displays, etc.), navigators, cockpit controllers and / or displays, displays of camera views (e.g., displays of rearview cameras in vehicles), electronic photographs, electronic billboards or signs, projectors, architectural structures, packaging and aesthetic structures (e.g., displays of images of a piece of jewelry), etc.

[0142] While some embodiments of the general concept of this disclosure have been illustrated and described, those skilled in the art will understand that changes may be made to these embodiments without departing from the principles and spirit of the general inventive concept, the scope of which is defined by the claims and their equivalents.

Claims

1. An anti-reflective laminated structure, comprising: A substrate having a first refractive index and a first surface; An antistatic layer is disposed on one side of the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface; An anti-reflective layer is disposed between the substrate and the antistatic layer. The anti-reflective layer includes at least one composite layer, which includes a first anti-reflective layer and a second anti-reflective layer. The first anti-reflective layer has a third refractive index, and the second anti-reflective layer has a fourth refractive index. At most one first anti-reflective layer is bonded to the first surface of the substrate, and at most one second anti-reflective layer is bonded to the second surface of the antistatic layer. The second refractive index is greater than the first refractive index and the fourth refractive index, and the third refractive index is greater than the first refractive index and the fourth refractive index; The anti-reflection stacked structure further includes a polarizing layer, which is disposed on the side of the antistatic layer away from the substrate. The polarizing layer has a fifth refractive index, which is less than the second refractive index. The anti-reflective layer includes a first composite layer near the substrate and a second composite layer near the antistatic layer. The thickness of the first anti-reflective layer of the first composite layer is less than the thickness of the second anti-reflective layer of the first composite layer, and the thickness of the first anti-reflective layer of the second composite layer is less than the thickness of the second anti-reflective layer of the second composite layer.

2. The anti-reflective laminated structure according to claim 1, wherein, The materials used to manufacture the antistatic layer include at least one of transparent metal oxide materials, solution-type conductive polymer materials, and sputtered inorganic materials.

3. The anti-reflective laminated structure according to claim 2, wherein, The anti-reflective layer includes a plurality of composite layers, wherein the thickness of the composite layer closest to the substrate is less than or equal to the thickness of the composite layer closest to the antistatic layer.

4. The anti-reflective laminated structure according to claim 3, wherein, The first anti-reflective layer of the first composite layer is bonded to the first surface of the substrate, and the second anti-reflective layer of the second composite layer is bonded to the second surface.

5. The anti-reflective laminate structure according to claim 3, wherein the anti-reflective layer comprises: A first composite layer near the substrate, a third composite layer near the antistatic layer, and a second composite layer located between the first composite layer and the third composite layer. Wherein, the thickness of the first composite layer is less than or equal to the thickness of the second composite layer, and the thickness of the second composite layer is less than or equal to the thickness of the third composite layer.

6. The anti-reflective laminated structure according to any one of claims 1 to 5, wherein, The first refractive index is 1.45 to 1.55; The second refractive index is 1.50 to 1.90; The third refractive index is 1.80 to 2.30; The fourth refractive index is 1.44 to 1.

52.

7. The anti-reflective laminated structure according to any one of claims 1 to 5, wherein, The materials used to manufacture the first anti-reflective layer and the materials used to manufacture the second anti-reflective layer are different.

8. The anti-reflective laminated structure according to claim 7, wherein, The material used to manufacture the first antireflective layer includes SiNx; The material used to manufacture the second anti-reflective layer includes SiO2.

9. The anti-reflective laminated structure according to claim 1, wherein, The fifth refractive index is 1.45 to 1.

55.

10. The antireflective laminate structure according to any one of claims 1 to 5, wherein, The thickness of the first anti-reflective layer is 5 nanometers to 65 nanometers; The thickness of the second antireflective layer is 40 nanometers to 80 nanometers.

11. The antireflective laminate structure according to any one of claims 1 to 5, wherein, The thickness of the antistatic layer is 14 nanometers to 30 nanometers.

12. The anti-reflective laminated structure according to claim 2, wherein, The transparent metal oxide material includes indium tin oxide; The solution-type conductive polymer material includes Heraeus-polyethylenedioxythiophene; The sputtered inorganic material includes a mixture of graphite oxide, tin oxide, zinc oxide, aluminum oxide, antimony oxide, surfactants, and crosslinking agents.

13. The anti-reflective laminated structure according to claim 1, wherein, The substrate includes a color filter.

14. A method for manufacturing an anti-reflective laminated structure, comprising: A substrate is formed, the substrate having a first refractive index and a first surface; An anti-reflective layer is formed on one side of the substrate. The anti-reflective layer includes at least one composite layer, which includes a first anti-reflective layer and a second anti-reflective layer. The first anti-reflective layer has a third refractive index, and the second anti-reflective layer has a fourth refractive index. An antistatic layer is formed on the side of the antireflective layer away from the substrate, the antistatic layer having a second refractive index and a second surface opposite to the first surface; At most one first anti-reflective layer is bonded to the first surface of the substrate, and at most one second anti-reflective layer is bonded to the second surface of the antistatic layer. The second refractive index is greater than the first refractive index and the fourth refractive index, and the third refractive index is greater than the first refractive index and the fourth refractive index; The anti-reflective layer includes a first composite layer near the substrate and a second composite layer near the antistatic layer. The thickness of the first anti-reflective layer of the first composite layer is less than the thickness of the second anti-reflective layer of the first composite layer, and the thickness of the first anti-reflective layer of the second composite layer is less than the thickness of the second anti-reflective layer of the second composite layer. The manufacturing method further includes forming a polarizing layer on the side of the antistatic layer away from the substrate, the polarizing layer having a fifth refractive index, the fifth refractive index being less than the second refractive index.

15. A display panel, comprising: Array substrate; A color filter substrate, wherein the color filter substrate is disposed opposite to the array substrate; A liquid crystal layer disposed between the array substrate and the color filter substrate; An anti-reflective laminate structure is provided on the side of the color filter substrate away from the array substrate. Wherein, the anti-reflective laminate structure is the anti-reflective laminate structure according to any one of claims 1 to 13.

16. The display panel according to claim 15, wherein, The color filter substrate includes a substrate, and the substrate of the anti-reflective laminate structure includes the substrate of the color filter substrate.

17. A display device comprising the display panel as described in claim 15 or 16.

Images