A water-soluble stripping solution, its preparation method and application

Abstract

This invention relates to the field of PI film stripping solution technology, and more particularly to a water-soluble stripping solution, its preparation method, and its application. The invention provides a water-soluble stripping solution comprising, by weight, the following components: 15-20 parts of organic alcohol amine, 55-65 parts of alcohol / ether substances, 1.5-2.5 parts of additives, and 12.5-28.5 parts of water; the water-soluble stripping solution does not contain TMAH. The water-soluble stripping solution exhibits good stripping performance and is environmentally friendly.

Description

Technical Field

[0001] This invention relates to the field of PI film stripping solution technology, and more particularly to a water-soluble stripping solution, its preparation method, and its application. Background Technology

[0002] PI liquid (mainly composed of polyimide) is a crucial material in the manufacturing process of TFT-LCDs (Thin Film Transistor Liquid Crystal Displays). It serves as the primary material for anchoring liquid crystal molecules, and its unique ionic and molecular bonds provide excellent guidance for these molecules. After being coated onto glass and baked, the PI liquid forms a PI film. Further rubbing or light exposure then aligns the liquid crystals, resulting in better consistency in the rotational direction of the molecules. Under an electric field, the liquid crystals deflect, effectively switching the optical path.

[0003] During the PI film production process, the yield rate of a single coating is not high. To reduce raw material waste, certain techniques are needed to remove the PI film and enable the reuse of the glass substrate. Additionally, to check the uniformity of the coating, a bare substrate is first coated and baked. This bare substrate is then recycled, and the PI film is peeled off using a PI stripping solution, achieving the effect of substrate recycling.

[0004] Dry PI film removal processes are used below G8.5 generation high-generation lines, while wet PI film removal is currently used above G8.5 generation lines. Wet removal methods are mainly mastered by Japanese and Korean manufacturers, and domestic technology currently has significant limitations. For example, Chinese patent CN113741159A discloses a PI film stripping solution whose main component is TMAH. Its instability and safety issues have led to significant industry resistance to TMAH-based products, and it also has a significant corrosive effect on metal circuits and other photoresists. Chinese patent CN112255899A discloses an aqueous PI film stripping solution that does not contain TMAH and is only effective for stripping friction PI, but its stripping effect on the currently prevalent photopolymer PI is minimal and does not meet usage requirements. Therefore, current water-soluble stripping solutions cannot simultaneously meet the requirements of effective stripping and environmental friendliness. Summary of the Invention

[0005] The purpose of this invention is to provide a water-soluble stripping solution, its preparation method, and its application. The water-soluble stripping solution has a good stripping effect and is environmentally friendly.

[0006] To achieve the above-mentioned objectives, the present invention provides the following technical solution:

[0007] The present invention provides a water-soluble stripping solution, comprising the following components by mass: 15-20 parts of organic alcohol amine, 55-65 parts of alcohol / ether, 1.5-2.5 parts of additives, and 12.5-28.5 parts of water;

[0008] The water-soluble stripping solution does not include TMAH.

[0009] Preferably, the organic alcohol amine includes one or two of the following: monoisopropanolamine, diisopropanolamine, triisopropanolamine, methylethanolamine, ethylethanolamine, dimethylethanolamine, N-ethylethanolamine, N-(2-hydroxyethyl)ethylenediamine, ethanolamine, diethanolamine, triethanolamine, diethylene glycolamine, and 3-ethoxypropylamine.

[0010] Preferably, the alcohol / ether substance includes one or more of propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol butyl ether, ethylene glycol methyl ether, ethylene glycol dimethyl ether, propylene glycol diethylene ether, diethylene glycol butyl ether, diethylene glycol dimethyl ether, monoethylene glycol, diethyl ether ethylene glycol, polyethylene glycol, n-butanol, isobutanol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1-amino-2-propanol, mannitol, and xylitol.

[0011] Preferably, the additive includes one or more of piperazine, benzotriazole, 1,4-dioxane, methimazole, N-(3-aminopropyl)morpholine, iminodiacetic acid, 5-aminotetrazolium, citric acid, malic acid, polyethyleneimine, hexamethylenetetramine, nonylphenol polyoxyethylene ether, fatty alcohol polyoxyethylene ether, polyethylene glycol, and octadecylamine polyoxyethylene ether.

[0012] Preferably, the product comprises the following components by weight: 15-20 parts isopropanolamine, 20-30 parts propylene glycol methyl ether, 30-35 parts monoethylene glycol, 0.5-1 part benzotriazole, 0.5 parts fatty alcohol polyoxyethylene ether, 0.5 parts citric acid, and 13.5-28.5 parts water.

[0013] Preferably, the composition comprises, by weight parts, the following components: 15-20 parts methyl ethanolamine, 20 parts propylene glycol methyl ether, 35 parts monoethylene glycol, 0.5 parts benzotriazole, 0.5 parts fatty alcohol polyoxyethylene ether, 0.5 parts citric acid, and 23.5-28.5 parts water.

[0014] Preferably, the product comprises the following components by weight: 15-20 parts ethanolamine, 20-30 parts diethylene glycol, 30-35 parts diethylene glycol dimethyl ether, 0.5-1 part benzotriazole, 0.5 parts fatty alcohol polyoxyethylene ether, 0.5 parts citric acid, and 13.5-28.5 parts water.

[0015] Preferably, the composition comprises, by weight parts, the following components: 15-20 parts ethanolamine, 20-35 parts propylene glycol methyl ether, 30-35 parts monoethylene glycol, 0.5 parts benzotriazole, 0.5 parts fatty alcohol polyoxyethylene ether, 0.5 parts citric acid, and 13.5-28.5 parts water.

[0016] The present invention also provides a method for preparing the water-soluble stripping solution described in the above technical solution, comprising the following steps:

[0017] Organic alcohol amines, alcohols / ethers, additives, and water are mixed to obtain a water-soluble stripping solution.

[0018] The present invention also provides the application of the water-soluble stripping solution described above in the stripping of the PI film of a liquid crystal display panel.

[0019] This invention provides a water-soluble stripping solution, comprising the following components by mass: 15-20 parts of organic alcohol amine, 55-65 parts of alcohol / ether, 1.5-2.5 parts of additives, and 12.5-28.5 parts of water; the water-soluble stripping solution does not include TMAH.

[0020] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0021] 1) The water-soluble stripping solution of the present invention does not contain TMAH, but contains organic alcohol amines. The raw materials used are highly water-soluble, environmentally friendly, easy to recycle, and reusable.

[0022] 2) The water-soluble stripping solution of the present invention achieves short stripping time by adjusting the synergistic effect of organic alcohol amines, alcohol / ether substances and additives, and can complete the stripping within 3 minutes. The stripping rate is fast and the effect is good. The water-soluble stripping solution of the present invention does not corrode the circuits and photoresist of the substrate for a long time. Attached Figure Description

[0023] Figure 1 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 1 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0024] Figure 2 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 2 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0025] Figure 3 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 3 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0026] Figure 4The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 4 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0027] Figure 5 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 5 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0028] Figure 6 The image shows the OM image of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 6 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0029] Figure 7 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 7 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0030] Figure 8 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 8 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0031] Figure 9 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 9 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0032] Figure 10 The image shows the OM (Optical Model) of the experimental substrate after being peeled for 3 minutes with the water-soluble stripping solution described in Example 10 (left image is CF substrate, right image is TFT substrate);

[0033] Figure 11 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 11 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0034] Figure 12 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 12 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0035] Figure 13 The image shows the OM (Optical Model) of the experimental substrate after being peeled for 3 minutes with the water-soluble stripping solution described in Example 13 (left image is the CF substrate, right image is the TFT substrate).

[0036] Figure 14 The image shows the OM (Optical Model) of the experimental substrate after being peeled for 3 minutes with the water-soluble stripping solution described in Example 14 (left image is the CF substrate, right image is the TFT substrate).

[0037] Figure 15The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 15 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0038] Figure 16 The image shows the OM (Optical Model) of the experimental substrate after being peeled off with the water-soluble stripping solution described in Example 16 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0039] Figure 17 The image shows the OM (Optical Image) of the experimental substrate after being peeled with the water-soluble stripping solution described in Comparative Example 1 for 3 minutes (left image is CF substrate, right image is TFT substrate).

[0040] Figure 18 The images show the OM (Optical Image) of the experimental substrates after being peeled with the water-soluble stripping solution described in Comparative Example 3 for 3 minutes (left image is the CF substrate, right image is the TFT substrate).

[0041] Figure 19 The image shows the OM (Optical Image) of the experimental substrate after being peeled with the water-soluble stripping solution described in Comparative Example 4 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0042] Figure 20 The image shows the OM (Optical Image) of the experimental substrate after being peeled with the water-soluble stripping solution described in Comparative Example 5 for 3 minutes (left image is CF substrate, right image is TFT substrate).

[0043] Figure 21 The image shows the OM (Optical Image) of the experimental substrate after being peeled with the water-soluble stripping solution described in Comparative Example 6 for 3 minutes (left image is CF substrate, right image is TFT substrate);

[0044] Figure 22 The images show the OM (Optical Image) of the experimental substrates after being peeled off with the water-soluble stripping solution described in Comparative Example 7 for 3 minutes (left image is the CF substrate, right image is the TFT substrate). Detailed Implementation

[0045] The present invention provides a water-soluble stripping solution, comprising the following components by mass: 15-20 parts of organic alcohol amine, 55-65 parts of alcohol / ether, 1.5-2.5 parts of additives, and 12.5-28.5 parts of water;

[0046] The water-soluble stripping solution does not include TMAH.

[0047] In this invention, unless otherwise specified, all raw materials used in the preparation are commercially available products well known to those skilled in the art.

[0048] The water-soluble stripping solution of the present invention comprises 15-20 parts by weight, preferably 16-19 parts, and more preferably 17-18 parts of an organic alcohol amine. In the present invention, the organic alcohol amine preferably comprises one or two of the following: monoisopropanolamine, diisopropanolamine, triisopropanolamine, methylethanolamine, ethylethanolamine, dimethylethanolamine, N-ethylethanolamine, N-(2-hydroxyethyl)ethylenediamine, ethanolamine, diethanolamine, triethanolamine, diethylene glycolamine, and 3-ethoxypropylamine; more preferably, it comprises monoisopropanolamine, methylethanolamine, ethanolamine, or a mixture of diethylene glycolamine and 3-ethoxypropylamine in a mass ratio of 1:1.

[0049] In this invention, the organic alcohol amine is used to strip the photoresist.

[0050] Based on the mass fraction of the organic alcohol amine, the water-soluble stripping solution of the present invention comprises 55 to 65 parts of alcohol / ether substances, preferably 58 to 62 parts, and more preferably 60 parts. In this invention, the alcohol / ether substances preferably include one or more of propylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol butyl ether, ethylene glycol methyl ether, ethylene glycol dimethyl ether, propylene glycol diethylene ether, diethylene glycol butyl ether, diethylene glycol dimethyl ether, monoethylene glycol, diethyl ether ethylene glycol, polyethylene glycol, n-butanol, isobutanol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1-amino-2-propanol, mannitol, and xylitol. More preferably, they include propylene glycol methyl ether and monoethylene glycol in a mass ratio of 4:7, propylene glycol methyl ether and monoethylene glycol in a mass ratio of 6:7, diethylene glycol and diethylene glycol dimethyl ether in a mass ratio of 4:7, diethylene glycol and diethylene glycol dimethyl ether in a mass ratio of 6:7, diethylene glycol and diethylene glycol dimethyl ether in a mass ratio of 1:1, or diethylene glycol and diethylene glycol dimethyl ether in a mass ratio of 5:6.

[0051] Based on the mass fraction of the organic alcohol amine, the water-soluble stripping solution of the present invention comprises 1.5 to 2.5 parts of additives, preferably 1.8 to 2.3 parts, and more preferably 2.0 to 2.2 parts. In the present invention, the additives preferably include one or more of piperazine, benzotriazole, 1,4-dioxane, methimazole, N-(3-aminopropyl)morpholine, iminodiacetic acid, 5-aminotetrazolium, citric acid, malic acid, polyethyleneimine, hexamethylenetetramine, nonylphenol polyoxyethylene ether, fatty alcohol polyoxyethylene ether, polyethylene glycol, and octadecylamine polyoxyethylene ether, more preferably benzotriazole, fatty alcohol polyoxyethylene ether, and citric acid in a mass ratio of 1:1:1, or benzotriazole, fatty alcohol polyoxyethylene ether, and citric acid in a mass ratio of 2:1:1.

[0052] In this invention, the additives are used to slow down the metal corrosion rate, accelerate the stripping speed of the stripping liquid, and accelerate the elimination of bubbles that occur during use or prevent the generation of bubbles.

[0053] In this invention, the water is preferably pure water.

[0054] The present invention also provides a method for preparing the water-soluble stripping solution described in the above technical solution, comprising the following steps:

[0055] Organic alcohol amines, alcohols / ethers, additives, and water are mixed to obtain a water-soluble stripping solution.

[0056] The present invention does not impose any special limitations on the mixing process; any process known to those skilled in the art can be used.

[0057] This invention also provides the application of the water-soluble stripping solution described above in the stripping of the PI film in a liquid crystal display panel. This invention does not impose any special limitations on the method of application; any method well-known to those skilled in the art can be used.

[0058] The following detailed description of the water-soluble stripping solution, its preparation method, and its application provided by the present invention, with reference to specific embodiments, should not be construed as limiting the scope of protection of the present invention.

[0059] Example 1

[0060] The composition of the water-soluble stripping solution is: 15 parts by weight of isopropanolamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 28.5 parts by weight of water.

[0061] Preparation method of water-soluble stripping solution: Mix isopropanolamine, propylene glycol methyl ether, monoethylene glycol, benzotriazole, fatty alcohol polyoxyethylene ether, citric acid and water to obtain the aqueous stripping solution.

[0062] Example 2

[0063] The composition of the water-soluble stripping solution is: 20 parts by weight of isopropanolamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 23.5 parts by weight of water.

[0064] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0065] Example 3

[0066] The composition of the water-soluble stripping solution is as follows: 15 parts by weight of methyl ethanolamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 28.5 parts by weight of water.

[0067] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0068] Example 4

[0069] The composition of the water-soluble stripping solution is as follows: 20 parts by weight of methyl ethanolamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 23.5 parts by weight of water.

[0070] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0071] Example 5

[0072] The composition of the water-soluble stripping solution is as follows: 15 parts by weight of ethanolamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 28.5 parts by weight of water.

[0073] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0074] Example 6

[0075] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 23.5 parts by weight of water.

[0076] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0077] Example 7

[0078] The composition of the water-soluble stripping solution is as follows: 10 parts by weight of diethylene glycolamine, 10 parts by weight of 3-ethoxypropylamine, 20 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 23.5 parts by weight of water.

[0079] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0080] Example 8

[0081] The composition of the water-soluble stripping solution is: 20 parts by weight of isopropanolamine, 30 parts by weight of propylene glycol methyl ether, 35 parts by weight of monoethylene glycol, 1 part by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 13.5 parts by weight of water.

[0082] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0083] Example 9

[0084] The composition of the water-soluble stripping solution is: 20 parts by weight of isopropanolamine, 30 parts by weight of propylene glycol methyl ether, 30 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 18.5 parts by weight of water.

[0085] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0086] Example 10

[0087] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 35 parts by weight of propylene glycol methyl ether, 30 parts by weight of monoethylene glycol, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 13.5 parts by weight of water.

[0088] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0089] Example 11

[0090] The composition of the water-soluble stripping solution is: 20 parts by weight of isopropanolamine, 20 parts by weight of diethylene glycol, 35 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 23.5 parts by weight of water.

[0091] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0092] Example 12

[0093] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 30 parts by weight of diethylene glycol, 35 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 13.5 parts by weight of water.

[0094] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0095] Example 13

[0096] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 30 parts by weight of diethylene glycol, 30 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 18.5 parts by weight of water.

[0097] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0098] Example 14

[0099] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 25 parts by weight of diethylene glycol, 30 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 23.5 parts by weight of water.

[0100] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0101] Example 15

[0102] The composition of the water-soluble stripping solution is as follows: 15 parts by weight of ethanolamine, 25 parts by weight of diethylene glycol, 30 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 28.5 parts by weight of water.

[0103] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0104] Example 16

[0105] The composition of the water-soluble stripping solution is as follows: 15 parts by weight of ethanolamine, 25 parts by weight of diethylene glycol, 30 parts by weight of diethylene glycol dimethyl ether, 1 part by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 27.5 parts by weight of water.

[0106] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0107] Comparative Example 1

[0108] The water-soluble stripping solution consists of: 20 parts by weight of ethanolamine, 20 parts by weight of diethylene glycol, 30 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid, and 28.5 parts by weight of water. ；

[0109] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0110] Comparative Example 2

[0111] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 30 parts by weight of diethylene glycol, 35 parts by weight of diethylene glycol dimethyl ether, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 0.5 parts by weight of citric acid and 24 parts by weight of water.

[0112] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0113] Comparative Example 3

[0114] The composition of the water-soluble stripping solution is: 20 parts by weight of ethanolamine, 30 parts by weight of diethylene glycol, 35 parts by weight of diethylene glycol dimethyl ether, 1.5 parts by weight of benzotriazole, 0.5 parts by weight of fatty alcohol polyoxyethylene ether, 1 part by weight of citric acid and 12 parts by weight of water.

[0115] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0116] Comparative Example 4

[0117] Composition of the water-soluble stripping solution: 5 parts by weight of TMAH, 14 parts by weight of diethanolamine, 54 parts by weight of ethylene glycol and 0.8 parts by weight of polyoxyethylene amine;

[0118] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0119] Comparative Example 5

[0120] Composition of the water-soluble stripping solution: 9 parts by weight of isopropanolamine, 10 parts by weight of propylene glycol methyl ether, 13 parts by weight of propylene glycol ethyl ether, 6 parts by weight of acrylate copolymer, 2 parts by weight of fatty alcohol polyoxyethylene ether, 0.4 parts by weight of benzotriazole and 0.35 parts by weight of inositol hexaphosphate.

[0121] Comparative Example 6

[0122] In CN113741159A, there are 54% ethylene glycol, 14% diethanolamine, 5% tetramethylammonium hydroxide (TNAH), and 0.8% polyoxyethylene amine by weight.

[0123] The preparation method of the water-soluble stripping solution is the same as the preparation process in Example 1.

[0124] Test case

[0125] Place 50 mL of the water-soluble stripping solution described in Examples 1-16 and Comparative Examples 1-6 into a beaker. After maintaining the temperature in a 60°C water bath, place 3 cm x 3 cm mass-produced glass samples coated with PI film (TFT substrate and CF substrate) in the solution. Remove the samples after the specified time, clean them with a water spray system, and then dry them with an air knife. After 3 minutes at 60°C, check for any PI film residue (test results are shown in the figure). Figures 1-22 As shown in the table), observe whether there is corrosion on the substrate within 3 hours. The test results are shown in Table 1:

[0126] Table 1 shows the peeling and anti-corrosion effects of the water-soluble stripping solutions described in Examples 1-16 and Comparative Examples 1-6.

[0127]

[0128]

[0129] The above description is only a preferred embodiment of the present invention. It should be noted that those skilled in the art can make several improvements and modifications without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A water-soluble stripping solution, characterized in that, The specific components, by mass parts, are as follows: 15-20 parts ethanolamine, 20-30 parts diethylene glycol, 30-35 parts diethylene glycol dimethyl ether, 0.5-1 part benzotriazole, 0.5 parts fatty alcohol polyoxyethylene ether, 0.5 parts citric acid, and 13.5-28.5 parts water.

2. The method for preparing the water-soluble stripping solution according to claim 1, characterized in that, Includes the following steps: Ethanolamine, diethylene glycol, diethylene glycol dimethyl ether, benzotriazole, fatty alcohol polyoxyethylene ether, citric acid and water are mixed to obtain a water-soluble stripping solution.

3. The application of the water-soluble stripping solution according to claim 1 in stripping the PI film of a liquid crystal display panel.

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