A wet etching device

Abstract

The present invention belongs to the field of wet etching, and in particular to a wet etching device, which comprises a platform, a bracket B, a motor A, a slide A, a motor B, a slide C, a motor C, and an acid spraying mechanism, wherein a square frame slide A driven by the motor A moves vertically in the bracket B installed on the platform, and a slide C driven by the motors B and C moves horizontally in the slide A. The present invention senses the photolithography groove of the photoresist on the glass through a sensor on the acid spraying plate, so that the spray holes A, B and C on the acid spraying plate located in the corresponding stay area and opposite to the photolithography groove are opened, and the glass surface within the range of the photolithography groove is sprayed with HF acid at the pixel level accurately, thereby avoiding the waste of HF acid during the glass etching process.

Description

Technical Field

[0001] The present invention belongs to the field of wet etching, and particularly relates to a wet etching device. Background Art

[0002] Wet etching of glass includes processes such as applying photoresist, lithography, spraying etching solution, cleaning, and drying.

[0003] Currently, in the process of spraying the etching solution, multiple nozzles are used to spray a large amount of etching solution onto the surface after lithography to ensure that the glass surface within all lithography grooves can be etched. However, the etching solution is wasted severely, and environmental pollution may occur if the post-treatment is not careful.

[0004] The present invention designs a wet etching device to perform precise pixel-level spraying on the lithography grooves of photoresist on glass to solve the above problems. Summary of the Invention

[0005] To solve the defects in the prior art, the present invention discloses a wet etching device, which is implemented by the following technical solutions.

[0006] A wet etching device includes a platform, a bracket B, a motor A, a slide A, a motor B, a slide C, a motor C, and an acid spraying mechanism. A square slide A driven by the motor A and capable of vertical movement is arranged in the bracket B installed on the platform. A slide C driven by the motor B and the motor C and capable of horizontal movement is arranged in the slide A. An acid spraying mechanism for performing pixel-level acid spraying on the horizontal glass on the platform is installed below the slide C through a vertical rod.

[0007] The acid spraying mechanism includes an acid spraying plate, guide sleeves, sliding plug A, sliding plug B, sliding plug C, and piezoelectric plates. The lower surface of the cavity-equipped acid spraying plate installed on the vertical rod is densely arrayed with spraying holes A. There is a small-diameter spraying hole B between any two adjacent spraying holes A, and a small-diameter spraying hole C between any two diagonally distributed spraying holes A. A sliding plug A capable of vertically sealing and sliding is arranged in each guide sleeve at the position of a spraying hole A. The sliding plug A controls the opening or closing of the acid hole on the guide sleeve under the drive of the piezoelectric plate. A sliding plug B capable of vertically sealing and sliding is arranged in each guide sleeve at the position of a spraying hole B. The sliding plug B controls the opening or closing of the acid hole on the guide sleeve under the drive of the piezoelectric plate. A sliding plug C capable of vertically sealing and sliding is arranged in each guide sleeve at the position of a spraying hole C. The sliding plug C controls the opening or closing of the acid hole on the guide sleeve under the drive of the piezoelectric plate. There is a transmission structure between any two adjacent sliding plugs A and the sliding plug B therebetween, which does not cause the sliding plug B to open the acid hole on the corresponding guide sleeve when only one sliding plug A opens the acid hole on the corresponding guide sleeve, and causes the sliding plug B to open the acid hole on the corresponding guide sleeve when two sliding plugs A simultaneously open the acid holes on the corresponding guide sleeves. There is a transmission structure between any two diagonally distributed sliding plugs A and the sliding plug C therebetween, which does not cause the sliding plug C to open the acid hole on the corresponding guide sleeve when only one sliding plug A opens the acid hole on the corresponding guide sleeve, and causes the sliding plug C to open the acid hole on the corresponding guide sleeve when two sliding plugs A simultaneously open the acid holes on the corresponding guide sleeves.

[0008] As a further improvement of the present technology, the platform is installed on bracket A; two vertical screw rods A installed on bracket B and the platform are in one-to-one threaded fit with two screw sleeves on both sides of sliding seat A; pulley A is installed on both of the two screw rods A, and the two pulley As are connected by synchronous belt A in transmission; one screw rod A is in transmission connection with the output shaft of motor A on the platform.

[0009] As a further improvement of the present technology, a sliding seat B capable of horizontally moving in a straight line direction is arranged on sliding seat A; sliding seat B is in threaded fit with two screw rods B installed on sliding seat A; pulley B is installed on both of the two screw rods B, and the two pulley Bs are connected by synchronous belt B in transmission; one screw rod B is in transmission connection with the output shaft of motor B on sliding seat A.

[0010] As a further improvement of the present technology, a sliding seat B capable of horizontally moving in a straight line direction is arranged on sliding seat C; the screw rod C installed on sliding seat B is in threaded fit with sliding seat C and is in transmission connection with the output shaft of motor C on sliding seat B.

[0011] As a further improvement of the present technology, a sealing ring that is hermetically fitted with the corresponding spraying hole A is nested and installed at the lower end of sliding plug A.

[0012] As a further improvement of the present technology, the upper end of the sliding plug B is provided with a chute A, in which a gear A is installed. In the chute A, two racks A capable of vertical sliding are arranged. The two racks A are engaged with the gear A and the moving directions of the two racks A are opposite. The two racks A are respectively connected to two adjacent sliding plugs A through connecting rods in a one-to-one correspondence.

[0013] As a further improvement of the present technology, a sealing ring that is hermetically matched with the spray hole B is nested and installed at the lower end of the sliding plug B.

[0014] As a further improvement of the present technology, there are two vertically distributed chutes B in the sliding plug C. In each chute B, a slider capable of vertical sliding is arranged, and a gear B is installed on each slider; each gear B corresponds to two diagonally distributed sliding plugs A among the four sliding plugs A around the sliding plug C; in each chute B, a rack B capable of vertical sliding is arranged. The two racks B are engaged with the corresponding gears B and the moving directions of the two racks B are opposite. The two racks B are respectively connected to the two diagonally distributed sliding plugs A through connecting rods in a one-to-one correspondence.

[0015] As a further improvement of the present technology, a sealing ring that is hermetically matched with the spray hole C is nested and installed at the lower end of the sliding plug C.

[0016] As a further improvement of the present technology, the vertical dimension of the acid hole on the guide sleeve is less than the maximum distance between the lower edge of the acid hole on the guide sleeve and the lower end of the sliding plug A in the spray hole A and greater than half of the maximum distance between the lower edge of the acid hole on the guide sleeve and the lower end of the sliding plug A in the spray hole A.

[0017] Compared with the traditional wet etching equipment, the present invention uses the sensors on the acid spraying plate to sense the photolithography grooves of the photoresist on the glass, so that the spray holes A, B, and C on the acid spraying plate corresponding to the photolithography grooves in the corresponding staying areas are opened, and pixel-level precise spraying of HF acid is performed on the glass surface within the range of the photolithography grooves, avoiding the waste of HF acid during the glass etching process.

[0018] In the present invention, the spray hole B between any two adjacent spray holes A with larger diameters on the acid spraying plate is opened when the two spray holes A are simultaneously located within the orientation of the photolithography groove, and uniform spraying of HF acid is performed on the area between the two adjacent spray holes A in the photolithography groove, so that the glass surface in the photolithography groove can be uniformly sprayed with HF acid and effectively and uniformly etched, improving the etching quality.

[0019] The structure of the present invention is simple and has good use effects. Description of the Drawings

[0020] Figure 1 It is a schematic diagram of the whole of the present invention.

[0021] Figure 2 It is two schematic cross-sectional views of the driving structure of the sliding seat A in the present invention.

[0022] Figure 3 It is a cross-sectional schematic diagram of the slide C driving structure and the slide B driving structure in the present invention.

[0023] Figure 4 It is a cross-sectional schematic diagram of the acid spraying mechanism and the glass.

[0024] Figure 5 It is a partial schematic diagram of the distribution of sliding plugs A, sliding plugs B and sliding plugs C in the acid injection mechanism.

[0025] Figure 6 It is a cross-sectional schematic diagram of the transmission connection between any two adjacent sliding plugs A and the sliding plug B therebetween in the acid spraying mechanism.

[0026] Figure 7 It is a schematic cross-sectional diagram of two diagonally distributed sliding plugs A in the acid spray mechanism and a sliding plug C therebetween for transmission connection.

[0027] Figure 8 It is a partial schematic diagram of the acid spraying plate and its lower surface.

[0028] Figure 9 Schematic diagram of the sliding plug B and its cross section.

[0029] Figure 10 Schematic diagram of the sliding plug C and its two cross-sections.

[0030] Figure 11 This is a schematic diagram of the division of the area where the acid spray plate stays on the glass to be engraved.

[0031] The reference numerals in the figure are: 1. bracket A; 2. platform; 3. bracket B; 4. screw A; 5. pulley A; 6. synchronous belt A; 7. motor A; 8. slide A; 9. slide B; 10. screw B; 11. pulley B; 12. synchronous belt B; 13. motor B; 14. slide C; 15. screw C; 16. motor C; 17. vertical rod; 18. acid spraying mechanism; 19. acid spraying plate; 20. cavity; 21. spray hole A; 22. Nozzle B; 23. Guide sleeve; 24. Acid hole; 25. Sliding plug A; 26. Sliding plug B; 27. Slide groove A; 28. Gear A; 29. Nozzle C; 30. Rack A; 31. Connecting rod; 32. Sliding plug C; 33. Slide groove B; 34. Sliding block; 35. Gear B; 36. Rack B; 37. Glass; 38. Photoresist layer; 39. Photolithography pattern; 40. Stay area; 41. Piezoelectric plate; 42. Screw sleeve. DETAILED DESCRIPTION

[0032] The accompanying drawings are schematic diagrams of the present invention, which are provided to facilitate understanding of the operating principle of the structure. The specific product structure and proportional dimensions can be determined according to the use environment combined with conventional technology.

[0033] like Figure 1 ,2 As shown in FIGS. 3, it includes a platform 2, a bracket B3, a motor A7, a slide A8, a motor B13, a slide C14, a motor C16, and an acid spraying mechanism 18. Among them, as Figure 1 、 2 、FIG. 3 shows, a square slide A8 driven by a motor A7 and capable of vertical movement is arranged in a bracket B3 installed on the platform 2, and a slide C14 driven by a motor B13 and a motor C16 and capable of horizontal movement is arranged in the slide A8; an acid spraying mechanism 18 for pixel-level acid spraying on a horizontal glass 37 on the platform 2 is installed below the slide C14 through a vertical rod 17.

[0034] As Figure 4 、 5 shown, the acid spraying mechanism 18 includes an acid spraying plate 19, a guide sleeve 23, a slide plug A25, a slide plug B26, a slide plug C32, and a piezoelectric plate 41. Among them, as Figure 4 、 8 shown, a plurality of spray holes A21 are densely arranged in an array on the lower surface of the acid spraying plate 19 with a cavity 20 installed on the vertical rod 17. A small-caliber spray hole B22 is provided between any two adjacent spray holes A21, and a small-caliber spray hole C29 is provided between any two diagonally distributed spray holes A21; as Figure 5 、 6 、FIG. 7 shows, a slide plug A25 capable of vertical sealing sliding is arranged in the guide sleeve 23 at each spray hole A21, and the slide plug A25 controls the opening or closing of the acid hole 24 on the guide sleeve 23 under the drive of the piezoelectric plate 41; a slide plug B26 capable of vertical sealing sliding is arranged in the guide sleeve 23 at each spray hole B22, and the slide plug B26 controls the opening or closing of the acid hole 24 on the guide sleeve 23 under the drive of the piezoelectric plate 41; a slide plug C32 capable of vertical sealing sliding is arranged in the guide sleeve 23 at each spray hole C29, and the slide plug C32 controls the opening or closing of the acid hole 24 on the guide sleeve 23 under the drive of the piezoelectric plate 41; as Figure 5 、 6 shown, a transmission structure is provided between any two adjacent slide plugs A25 and the slide plug B26 therebetween, which does not cause the slide plug B26 to open the acid hole 24 on the corresponding guide sleeve 23 when only one slide plug A25 opens the acid hole 24 on the corresponding guide sleeve 23, and causes the slide plug B26 to open the acid hole 24 on the corresponding guide sleeve 23 when two slide plugs A25 open the acid hole 24 on the corresponding guide sleeve 23 at the same time; as Figure 5 、 7 shown, a transmission structure is provided between any two diagonally distributed slide plugs A25 and the slide plug C32 therebetween, which does not cause the slide plug C32 to open the acid hole 24 on the corresponding guide sleeve 23 when only one slide plug A25 opens the acid hole 24 on the corresponding guide sleeve 23, and causes the slide plug C32 to open the acid hole 24 on the corresponding guide sleeve 23 when two slide plugs A25 open the acid hole 24 on the corresponding guide sleeve 23 at the same time.

[0035] AsFigure 1 , 2 As shown, the platform 2 is installed on the bracket A1; two vertical screws A4 installed on the bracket B3 and the platform 2 are in one-to-one threaded fit with two screw sleeves 42 on both sides of the sliding seat A8; pulley A5 is installed on both of the two screws A4, and the two pulleys A5 are connected by a synchronous belt A6; one screw A4 is in transmission connection with the output shaft of the motor A7 on the platform 2.

[0036] As Figure 1 , 3 shown, a sliding seat B9 capable of horizontally moving in a straight line direction is arranged on the sliding seat A8; the sliding seat B9 is in threaded fit with two screws B10 installed on the sliding seat A8; pulley B11 is installed on both of the two screws B10, and the two pulleys B11 are connected by a synchronous belt B12; one screw B10 is in transmission connection with the output shaft of the motor B13 on the sliding seat A8.

[0037] As Figure 1 , 3 shown, a sliding seat B9 capable of horizontally moving in a straight line direction is arranged on the sliding seat C14; the screw C15 installed on the sliding seat B9 is in threaded fit with the sliding seat C14 and is in transmission connection with the output shaft of the motor C16 on the sliding seat B9.

[0038] As Figure 6 , 7 shown, a sealing ring in sealed fit with the corresponding spray hole A21 is nested and installed at the lower end of the sliding plug A25.

[0039] As Figure 6 , 9 shown, the upper end of the sliding plug B26 has a chute A27, a gear A28 is installed in the chute A27, two racks A30 capable of vertically sliding are arranged in the chute A27, the two racks A30 are meshed with the gear A28 and the moving directions of the two racks A30 are opposite, and the two racks A30 are connected to the adjacent two sliding plugs A25 in one-to-one correspondence through a connecting rod 31.

[0040] As Figure 6 shown, a sealing ring in sealed fit with the spray hole B22 is nested and installed at the lower end of the sliding plug B26.

[0041] As Figure 7 , 10As shown, the sliding plug C32 has two sliding grooves B33 distributed up and down, each sliding groove B33 is provided with a slider 34 capable of vertical sliding, and each slider 34 is installed with a gear B35; each gear B35 corresponds to two diagonally distributed sliding plugs A25 among the four sliding plugs A25 around the sliding plug C32; each sliding groove B33 is provided with a rack B36 capable of vertical sliding, the two racks B36 are meshed with the corresponding gears B35 and the two racks B36 move in opposite directions, and the two racks B36 are connected one by one with the two diagonally distributed sliding plugs A25 through the connecting rod 31.

[0042] like Figure 7 As shown, a sealing ring is nested and installed at the lower end of the sliding plug C32 to seal with the spray hole C29.

[0043] like Figure 6 , 7 As shown, the vertical dimension of the acid hole 24 on the guide sleeve 23 is smaller than the maximum distance between the lower edge of the acid hole 24 on the guide sleeve 23 and the lower end of the sliding plug A25 in the spray hole A21, but larger than half of the maximum distance between the lower edge of the acid hole 24 on the guide sleeve 23 and the lower end of the sliding plug A25 in the spray hole A21, ensuring that the sliding plug B26 still closes the corresponding acid hole 24 on the guide sleeve 23 when one of the two sliding plugs A25 opens the acid hole 24 on the guide sleeve 23 at the corresponding spray hole A21, and the sliding plug C32 still closes the corresponding acid hole 24 on the guide sleeve 23 when one of the two diagonally distributed sliding plugs A25 opens the acid hole 24 on the guide sleeve 23 at the corresponding spray hole A21.

[0044] In the present invention, the inner cavity of the acid spray plate 19 is communicated with the acid pump through a hose.

[0045] like Figure 11 As shown, the acid spraying mechanism 18 of the present invention has six retention areas 40 above the glass 37 .

[0046] The working process of the present invention is as follows: in the initial state, the acid spraying mechanism 18 stays in a stay area 40, the sliding plug A25 closes the acid hole 24 on the guide sleeve 23 at the corresponding spray hole A21, the sliding plug B26 closes the acid hole 24 on the guide sleeve 23 at the corresponding spray hole B22, and the sliding plug C32 closes the acid hole 24 on the guide sleeve 23 at the corresponding spray hole C29. The two sliders 34 in each sliding plug C32 are located at the top limit position of the corresponding slide groove B33.

[0047] When the glass 37 needs to be subjected to acid spray etching using the present invention, the glass 37 with the photoresist layer 38 having the photolithography pattern 39 coated on the surface is placed on the platform 2 so that the glass 37 is located within the six stop areas 40 .

[0048] Then, start the motor A7 to drive the acid spraying mechanism 18 to move vertically towards each other by a certain amplitude, so that there is an appropriate acid spraying distance between the acid spraying mechanism 18 and the glass 37. The sensor on the acid spraying plate 19 senses the photolithography grooves of the photolithography pattern 39, causing the piezoelectric plates 41 on the corresponding sliding plugs A25 corresponding to the photolithography grooves to contract and drive the corresponding sliding plugs A25 to move vertically upward, completely opening the acid holes 24 on the corresponding guide sleeves 23.

[0049] If the sliding plug A25 that opens the acid hole 24 and the adjacent sliding plug A25 are both located within the orientation of the photolithography groove, then any two adjacent sliding plugs A25 within the photolithography groove range will move upward synchronously under the drive of the corresponding piezoelectric plates 41 to open the acid holes 24 on the corresponding guide sleeves 23. At the same time, the two sliding plugs A25 that open the acid holes 24 will drive the sliding plug B26 between them to move upward synchronously and equally in amplitude through the two racks A30 and the corresponding gears A28, and open the acid holes 24 on the guide sleeve 23 at the corresponding spray holes B22. If the sliding plug A25 adjacent to the sliding plug A25 that opens the acid hole 24 is not located within the orientation of the photolithography groove, then the sliding plug A25 not within the photolithography groove range will not move upward, and the acid holes 24 on the guide sleeve 23 at the corresponding spray holes A21 will not be opened. And the sliding plug A25 within the photolithography groove range that opens the acid holes 24 on the guide sleeve 23 will drive the sliding plug B26 within the corresponding spray hole B22 to move upward by a distance equal to half of the upward movement distance of the sliding plug A25, so that the sliding plug B26 still keeps the acid holes 24 on the guide sleeve 23 at the corresponding spray holes B22 in a closed state.

[0050] If the sliding plug A25 that opens the acid hole 24 and the diagonal sliding plug A25 are both located within the orientation of the photolithography groove, then any two diagonally distributed sliding plugs A25 within the photolithography groove range will move upward synchronously under the drive of the corresponding piezoelectric plates 41 to open the acid holes 24 on the corresponding guide sleeves 23. At the same time, the two sliding plugs A25 that open the acid holes 24 and are diagonally distributed will drive the sliding plug C32 between them to move upward synchronously and equally in amplitude through the two racks B36 and the corresponding gears B35, and open the acid holes 24 on the guide sleeve 23 at the corresponding spray holes C29. If the sliding plug A25 diagonally distributed with the sliding plug A25 that opens the acid hole 24 is not located within the orientation of the photolithography groove, then the sliding plug A25 not within the photolithography groove range will not move upward, and the acid holes 24 on the guide sleeve 23 at the corresponding spray holes A21 will not be opened. And the sliding plug A25 within the photolithography groove range that opens the acid holes 24 on the guide sleeve 23 will drive the sliding plug C32 within the corresponding spray hole C29 to move upward by a distance equal to half of the upward movement distance of the sliding plug A25, so that the sliding plug C32 still keeps the acid holes 24 on the guide sleeve 23 at the corresponding spray holes C29 in a closed state.

[0051] All the sliding plugs A25 within the photolithography tank fully open the acid holes 24 on the bushings 23 corresponding to the spray holes A21. If the sliding plugs A25 within the photolithography tank are diagonally distributed or adjacent to each other, the corresponding spray holes B22 and spray holes C29 are opened, and the spray holes A21 within the photolithography tank spray acid into the photolithography tank, avoiding spraying acid by the acid spraying plate 19 to the area outside the photolithography tank, thereby avoiding waste of etching acid solution. At the same time, the densely arrayed spray holes A21, spray holes B22, and spray holes C29 can achieve pixel-level acid spraying and etching within the photolithography tank range, making the etching effect more uniform and improving the etching quality.

[0052] After the acid spraying and etching of the corresponding part of the photolithography pattern 39 within a stop area 40 is completed, start the motor A7, motor B13, and motor C16 to drive the acid spraying mechanism 18 to move to the next adjacent stop area 40 to perform acid spraying and etching on the corresponding part of the photolithography pattern 39.

[0053] After the etching of the photolithography pattern 39 on the glass 37 is completed, start the motor A7 to drive the acid spraying mechanism 18 to move vertically upward to reset.

[0054] In summary, the beneficial effects of the present invention are as follows: The sensor on the acid spraying plate 19 of the present invention senses the photolithography tank of the photoresist on the glass 37, so that the spray holes A21, spray holes B22, and spray holes C29 on the acid spraying plate 19 corresponding to the photolithography tank within the corresponding stop area 40 are opened, and pixel-level precise spraying of HF acid is performed on the surface of the glass 37 within the photolithography tank range, avoiding waste of HF acid during the etching of the glass 37.

[0055] The greater the distance between the acid spraying mechanism 18 and the glass 37, the longer the time required to complete etching by acid spraying, and the larger the area of acid spraying and etching. The smaller the distance between the acid spraying mechanism 18 and the glass 37, the shorter the time required to complete etching by acid spraying, and the smaller the area of acid spraying and etching.

[0056] In the present invention, the spray hole B22 between any two adjacent larger-diameter spray holes A21 on the acid spraying plate 19 is opened when the two spray holes A21 are simultaneously within the orientation of the photolithography tank, and uniform spraying of HF acid is performed on the area between the two adjacent spray holes A21 within the photolithography tank, so that the surface of the glass 37 within the photolithography tank can be uniformly sprayed with HF acid and effectively and uniformly etched, improving the etching quality.

Claims

1. A wet etching device, characterized in that: It includes a platform, a bracket B, a motor A, a slide A, a motor B, a slide C, a motor C, and an acid spraying mechanism, wherein a square frame slide A driven by the motor A and capable of vertical movement is arranged in the bracket B installed on the platform, and a slide C driven by the motors B and C and capable of horizontal movement is arranged in the slide A; an acid spraying mechanism for performing pixel-level acid spraying on the horizontal glass on the platform is installed below the slide C through a vertical rod; The acid spraying mechanism comprises an acid spraying plate, a guide sleeve, a sliding plug A, a sliding plug B, a sliding plug C, and a piezoelectric plate, wherein the lower surface of the acid spraying plate with a cavity installed on the vertical rod is densely arrayed with spray holes A, between any two adjacent spray holes A there is a small-diameter spray hole B, between any two diagonally distributed spray holes A there is a small-diameter spray hole C; a sliding plug A capable of vertical sealing and sliding is arranged in the guide sleeve at each spray hole A, the sliding plug A controls the opening or closing of the acid hole on the guide sleeve under the drive of the piezoelectric plate, a sliding plug B capable of vertical sealing and sliding is arranged in the guide sleeve at each spray hole B, the sliding plug B controls the opening or closing of the acid hole on the guide sleeve under the drive of the piezoelectric plate, and a vertical sealing is arranged in the guide sleeve at each spray hole C A sliding plug C is sealed and slidable, and the sliding plug C controls the opening or closing of the acid hole on the guide sleeve under the drive of the piezoelectric plate; a transmission structure is provided between any two adjacent sliding plugs A and the sliding plug B between them, so that when only one sliding plug A opens the acid hole on the corresponding guide sleeve, the sliding plug B is prevented from opening the acid hole on the corresponding guide sleeve, and when both sliding plugs A open the acid holes on the corresponding guide sleeve at the same time, the sliding plug B is enabled to open the acid hole on the corresponding guide sleeve; a transmission structure is provided between any two diagonally distributed sliding plugs A and the sliding plug C between them, so that when only one sliding plug A opens the acid hole on the corresponding guide sleeve, the sliding plug C is prevented from opening the acid hole on the corresponding guide sleeve, and when both sliding plugs A open the acid holes on the corresponding guide sleeve at the same time, the sliding plug C is enabled to open the acid hole on the corresponding guide sleeve; The upper end of the sliding plug B has a sliding groove A, a gear A is installed in the sliding groove A, and two racks A capable of vertical sliding are arranged in the sliding groove A. The two racks A are meshed with the gear A and move in opposite directions. The two racks A are connected to two adjacent sliding plugs A one-to-one through a connecting rod; The sliding plug C has two sliding grooves B distributed vertically, each of which is provided with a slider capable of vertical sliding, and each slider is provided with a gear B; each gear B corresponds to two diagonally distributed sliding plugs A among the four sliding plugs A around the sliding plug C; each of which is provided with a rack B capable of vertical sliding, and the two racks B are meshed with the corresponding gears B and move in opposite directions, and the two racks B are connected to the two diagonally distributed sliding plugs A one-to-one through a connecting rod; The acid spray plate is provided with a sensor for sensing the photolithography groove of the photoresist on the glass.

2. The wet etching equipment according to claim 1, characterized in that: The platform is installed on the bracket A; the two vertical screws A installed on the bracket B and the platform are threadedly matched with the two screw sleeves on both sides of the slide A; pulleys A are installed on the two screws A, and the two pulleys A are connected by a synchronous belt A; one screw A is connected to the output shaft of the motor A on the platform.

3. The wet etching equipment according to claim 1, characterized in that: A sliding seat B capable of horizontally moving in a straight line direction is provided on the sliding seat A; the sliding seat B is in threaded fit with two screw rods B installed on the sliding seat A; pulley Bs are installed on both of the two screw rods B, and the two pulley Bs are drivingly connected through a timing belt B; one of the screw rods B is drivingly connected to the output shaft of a motor B on the sliding seat A.

4. The wet etching equipment according to claim 3, characterized in that: A sliding seat B capable of horizontally moving in a straight line direction is provided on the sliding seat C; a screw rod C installed on the sliding seat B is in threaded fit with the sliding seat C and is drivingly connected to the output shaft of a motor C on the sliding seat B.

5. The wet etching equipment according to claim 1, characterized in that: A sealing ring that is hermetically fitted with the corresponding spray hole A is nested and installed at the lower end of the sliding plug A.

6. The wet etching equipment according to claim 1, characterized in that: A sealing ring that is hermetically fitted with the spray hole B is nested and installed at the lower end of the sliding plug B.

7. A wet etching device according to claim 1, wherein: A sealing ring that is hermetically fitted with the spray hole C is nested and installed at the lower end of the sliding plug C.

8. A wet etching device according to claim 1, characterized in that: The vertical dimension of the acid hole on the guide sleeve is less than the maximum distance between the lower edge of the acid hole on the guide sleeve and the lower end of the sliding plug A in the spray hole A and greater than half of the maximum distance between the lower edge of the acid hole on the guide sleeve and the lower end of the sliding plug A in the spray hole A.

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