Brush and substrate processing apparatus having the same

Abstract

The present invention is aimed at cleaning a substrate without damaging the cleaned surface of the substrate by making the surface on which the brush acts follow the inclination of the substrate instantaneously. The present invention relates to a brush and a substrate processing apparatus provided with the brush. In the case where a cleaning section (77) is located at the peripheral portion of a substrate, the outer peripheral brush (515) moves in the vertical direction with respect to the central brush (513) in accordance with the inclination of the peripheral portion. The outer peripheral brush (515) moves upward instantaneously by the reaction force from the substrate (W) corresponding to the target load which is stronger than the elastic pushing force of the compression coil spring (517). Therefore, the surface on which the brush (99) acts is in a shape following the inclination of the substrate. As a result, since the outer peripheral brush (515) does not deform with a skew, and almost only the central brush (513) acts on the substrate, the cleaned surface of the substrate is not damaged.

Description

TECHNICAL FIELD

[0001] The present application relates to a brush that acts on a substrate when performing cleaning processing on a substrate such as a semiconductor substrate, a substrate for a liquid crystal display or an organic EL (Electroluminescence) display device, or the like, a substrate for a FPD (Flat Panel Display), a glass substrate for a photomask, a substrate for an optical disc, and the like, and a substrate processing apparatus provided with the brush. BACKGROUND

[0002] Conventionally, as a first device of this kind, there is a brush that performs cleaning processing by acting on the upper surface of a substrate while rotating and moving in the radial direction of the substrate (for example, refer to Patent Literature 1). The brush has members with different hardness at the center portion and the outer peripheral portion. Specifically, the outer peripheral portion has a member with lower hardness than the center portion. Thus, even if the surface of the substrate is warped and has a tilt in the radial direction of the substrate, the cleaning surface of the brush deforms according to the shape. Therefore, even if the substrate has a tilt in the radial direction from the center portion toward the outer peripheral portion, the uncleaned portion can be eliminated and cleaning can be performed with high cleanliness.

[0003] In addition, as a second device of this kind, there is a brush that has an inner cylinder and an outer cylinder (for example, refer to Patent Literature 2). The inner cylinder and the outer cylinder each have a cleaning brush at the lower surface. After cleaning is performed by moving in the radial direction using one of the cleaning brushes and then moving in the radial direction to the next, cleaning is performed using the other. That is, by separately using the brushes of the inner cylinder and the outer cylinder, it is possible to prevent a substrate from being damaged by a brush to which a foreign matter has adhered, and thus it is possible to save time or effort for replacing the brush. However, the second device does not describe anything about a configuration for switching the inner cylinder and the outer cylinder according to warping of a substrate.

[0004] [BACKGROUND ART LITERATURE]

[0005] [PATENT LITERATURE]

[0006] [Patent Literature 1]

[0007] Japanese Patent Application Publication No. 2013-38178

[0008] [Patent Literature 2]

[0009] Japanese Patent Application Publication No. 2006-319279 SUMMARY

[0010] [PROBLEMS TO BE SOLVED BY THE INVENTION]

[0011] However, in the case of the conventional example having such a configuration, the following problems exist.

[0012] That is, since the conventional first device follows the inclination of the substrate by the difference in hardness of the members constituting the brush, the brush cannot instantaneously follow the inclination of the substrate. Therefore, a state in which the outer peripheral side of the brush becomes a skew shape and acts on the substrate is generated. Specifically, a case in which the substrate is linearly inclined toward one side on the surface on which the brush acts, for example, a case in which the substrate is inclined toward the lower right side, is described. In this case, the brush is weakly compressed on the peripheral side (right side) of the substrate in the outer peripheral side of the brush, and the brush is strongly compressed on the central side (left side) of the substrate. Therefore, the outer peripheral side of the brush becomes a skew shape and rotates. Thus, there is a concern that the cleaning surface of the substrate is damaged.

[0013] In addition, the second device does not switch the inner cylinder and the outer cylinder in accordance with the warping of the substrate. Therefore, even for a substrate having warping, it is not possible to switch between the central portion and the peripheral portion of the substrate at an appropriate timing.

[0014] The present application is completed in view of such a situation, and aims to provide a brush capable of cleaning a substrate without damaging the cleaning surface of the substrate by making the surface on which the brush acts on the substrate instantaneously follow the inclination of the substrate, and a substrate processing device provided with the brush.

[0015] [Technical means for solving the problem]

[0016] The present application is completed in view of such a situation, and aims to provide a brush capable of cleaning a substrate without damaging the cleaning surface of the substrate by making the surface on which the brush acts on the substrate instantaneously follow the inclination of the substrate, and a substrate processing device provided with the brush.

[0017] That is, the invention described in Technical Solution 1 is a brush that acts on a substrate to perform cleaning processing, and is characterized by including: a brush body that acts on the substrate, and a brush holder that mounts the brush body; and the brush body includes: a central brush that constitutes a central portion in a plan view; at least one outer peripheral brush that is disposed on the outer peripheral side of the central brush and is mounted so as to be slidable in the vertical direction with respect to the central brush; and a spring urging mechanism that urges the outer peripheral brush toward the substrate side with respect to the central brush in a manner in which the lower surface of the central brush and the lower surface of the outer peripheral brush become almost the same height in a state in which the brush body is positioned at the central portion of the substrate, and allows the outer peripheral brush to move in the vertical direction with respect to the central brush in accordance with the inclination of the peripheral portion of the substrate in a state in which the brush body is positioned at the peripheral portion of the substrate.

[0018] [Action, effect] According to the invention described in the technical solution 1, the elastic pushing mechanism elastically pushes in a manner that the lower surface of the central brush and the lower surface of the outer peripheral brush become almost the same height in a state where the brush body is located at the central portion of the substrate. The elastic pushing mechanism elastically pushes in a manner that the outer peripheral brush is allowed to move in the vertical direction with respect to the central brush in accordance with the inclination of the peripheral portion of the substrate in a state where the brush body is located at the peripheral portion of the substrate. Therefore, in the central portion of the substrate, the lower surface of the brush body as a whole acts on the substrate. In the peripheral portion of the substrate, the outer peripheral brush momentarily moves in the vertical direction with respect to the central brush to follow the inclination of the substrate. As a result, since the outer peripheral brush does not deform with skewing, almost only the central brush acts on the substrate, so that damage to the cleaning surface of the substrate is not caused.

[0019] In addition, in the invention, it is preferable that the central brush has an upper flange and a columnar member protruding in the vertical direction from the central portion of the upper flange, and the outer peripheral brush has a lower flange facing the lower surface of the upper flange and a hollow member covering the outer peripheral portion of the columnar member and protruding in the vertical direction from the lower flange (technical solution 2).

[0020] The hollow member of the outer peripheral brush moves along the columnar member of the central brush. Therefore, the movement of the outer peripheral brush in the vertical direction can be smoothly performed.

[0021] In addition, in the invention, it is preferable that the elastic pushing mechanism is disposed between the lower surface of the upper flange and the upper surface of the lower flange (technical solution 3).

[0022] The elastic pushing force of the elastic pushing mechanism can be effectively transmitted from the upper flange to the lower flange.

[0023] In addition, in the invention, it is preferable that the elastic pushing mechanism is a compression coil spring whose upper end and lower end are disposed between the upper flange and the lower flange (technical solution 4).

[0024] The elastic pushing mechanism can be configured only by disposing the compression coil spring between the upper flange and the lower flange. Therefore, the outer peripheral brush can be moved with a simple configuration.

[0025] In addition, in the invention, it is preferable that the elastic pushing force of the elastic pushing mechanism is smaller than the pushing pressure with which the brush is elastically pushed against the substrate (technical solution 5).

[0026] The outer peripheral brush of the brush, which receives the reaction force of the pushing pressure, can move in the vertical direction against the elastic pushing force of the elastic pushing mechanism. Therefore, in the peripheral portion of the substrate, the outer peripheral brush can be appropriately moved in accordance with the inclination of the substrate.

[0027] Further, in the present application, it is preferable that the brush holder has a mounting portion, an outer peripheral portion extending from an outer peripheral surface of the mounting portion along an outer peripheral surface of the lower flange, and a restriction portion extending from a lower surface of the outer peripheral portion along a lower surface of the lower flange (claim 6).

[0028] The outer peripheral brush can be restricted from moving in the direction of the surface of the substrate by the outer peripheral portion extending from the mounting portion. The outer peripheral brush can be restricted from protruding downward from the brush holder by the restriction portion. Thus, the outer peripheral brush can be maintained in a stable state with respect to the central brush.

[0029] Further, the application described in claim 7 is a substrate processing apparatus that performs a cleaning process with a brush acting on a substrate, and is characterized by including: a rotation holding portion that holds a substrate in a horizontal posture and rotates the substrate; a brush that acts on an upper surface of the substrate held by the rotation holding portion and includes a brush body that acts on the substrate and a brush holder that mounts the brush body; a cleaning arm that includes the brush at a front end portion; an arm drive portion that drives the cleaning arm in such a manner that the brush moves in a radial direction of the substrate between a rotation center of the substrate and a peripheral portion of the substrate while being held by the rotation holding portion; and a spring urging mechanism that urges the outer peripheral brush toward the substrate side with respect to the central brush in such a manner that a lower surface of the central brush and a lower surface of the outer peripheral brush become substantially the same height in a state in which the brush body is positioned at a central portion of the substrate, and allows the outer peripheral brush to move in a vertical direction with respect to the central brush in accordance with an inclination of the peripheral portion of the substrate in a state in which the brush body is positioned at the peripheral portion of the substrate.

[0030] [Effects, Advantages] According to the application described in claim 7, the brush is moved between a central portion and a peripheral portion of the substrate with the cleaning arm while acting on the substrate with respect to the substrate rotated by the rotation holding portion. At this time, the spring urging mechanism urges the outer peripheral brush in such a manner that a lower surface of the central brush and a lower surface of the outer peripheral brush become substantially the same height in a state in which the brush body is positioned at the central portion of the substrate. The spring urging mechanism urges the outer peripheral brush in such a manner that the outer peripheral brush moves in a vertical direction with respect to the central brush in accordance with an inclination of the peripheral portion of the substrate in a state in which the brush body is positioned at the peripheral portion of the substrate. Thus, in the central portion of the substrate, a lower surface of the brush body as a whole acts on the substrate. In the peripheral portion of the substrate, the outer peripheral brush momentarily moves in a vertical direction with respect to the central brush to follow the inclination of the substrate. As a result, since the outer peripheral brush does not deform with a skew, and almost only the central brush acts on the substrate, damage to a cleaned surface of the substrate does not occur.

[0031] [Effects of the Invention]

[0032] The brush according to the present application is pushed by the pushing mechanism in a manner that the lower surface of the central brush and the lower surface of the outer peripheral brush become almost the same height in a state where the brush body is positioned at the central portion of the substrate. The pushing mechanism is pushed in a manner that the outer peripheral brush is allowed to move in the vertical direction with respect to the central brush according to the inclination of the peripheral portion of the substrate in a state where the brush body is positioned at the peripheral portion of the substrate. Therefore, the lower surface of the brush body as a whole acts on the substrate at the central portion of the substrate. At the peripheral portion of the substrate, the outer peripheral brush follows the inclination of the substrate by momentarily moving in the vertical direction with respect to the central brush by the pushing mechanism. As a result, since the outer peripheral brush does not deform with a skew, almost only the central brush acts on the substrate, so that damage to the cleaned surface of the substrate is not caused. BRIEF DESCRIPTION OF DRAWINGS

[0033] Figure 1 is a plan view showing the entire configuration of a substrate processing apparatus of an embodiment.

[0034] Figure 2 is a view of the substrate processing apparatus from the rear X. Figure 1

[0035] Figure 3 is a plan view showing the schematic configuration of a back surface cleaning unit of an embodiment.

[0036] Figure 4 is a side view showing the schematic configuration of the back surface cleaning unit.

[0037] Figure 5 is a longitudinal sectional view of a cleaning arm.

[0038] Figure 6 is a longitudinal sectional view showing details of a cleaning portion.

[0039] Figure 7 is a view showing the state of the brush in the central portion and the peripheral portion.

[0040] Figure 8 is a longitudinal sectional view showing details of the cleaning portion of variation 1.

[0041] Figure 9 is a longitudinal sectional view showing details of the cleaning portion of variation 2.

[0042] Figure 10 is a longitudinal sectional view showing details of the cleaning portion of variation 3.

[0043] Figure 11 is a longitudinal sectional view showing details of the cleaning portion of variation 4. DETAILED DESCRIPTION

[0044] Hereinafter, an embodiment of the present application will be described with reference to the drawings.

[0045] ​Figure 1 is a plan view showing the entire configuration of a substrate processing apparatus of an embodiment. Figure 2 is a view of the substrate processing apparatus of Figure 1 from the rear X.

[0046] <1. Entire Configuration>

[0047] The substrate processing apparatus 1 is provided with an in-out block 3, a transfer block 5, and a processing block 7.

[0048] The substrate processing apparatus 1 processes substrates W. The substrate processing apparatus 1, for example, performs a cleaning process on the substrates W. The substrate processing apparatus 1 processes the substrates W in a single wafer manner in the processing block 7. The substrates W are processed one by one in a horizontal posture.

[0049] In the present specification, for the sake of convenience, the direction in which the in-out block 3, the transfer block 5, and the processing block 7 are arranged is referred to as a front-rear direction X. The front-rear direction X is horizontal. The direction from the processing block 7 toward the in-out block 3 in the front-rear direction X is referred to as the front. The direction opposite to the front is referred to as the rear. The horizontal direction orthogonal to the front-rear direction X is referred to as a width direction Y. One direction of the width direction Y is appropriately referred to as the right. The direction opposite to the right is referred to as the left. The direction perpendicular to the horizontal direction is referred to as a vertical direction Z. In each drawing, as a reference, the front, the rear, the right, the left, the upper, and the lower are appropriately indicated.

[0050] <2. In-Out Block>

[0051] The in-out block 3 is provided with an input section 9 and a removal section 11. The input section 9 and the removal section 11 are arranged in the width direction Y. A plurality of (for example, 25) substrates W are stacked and housed in a carrier C with a fixed interval in a horizontal posture. The carrier C housing the substrates W that have not been processed is placed on the input section 9. The input section 9, for example, is provided with two placement stages 13 on which the carriers C are placed. The carrier C has a plurality of grooves (not shown) in which the substrates W are housed one by one with the faces of the substrates W separated from each other. The carrier C, for example, houses the substrates W in a posture in which the front faces of the substrates W face upward. As the carrier C, for example, there is a FOUP (Front Opening Unified Pod). The FOUP is a closed container. The carrier C can also be an open container, and the type is not limited.

[0052] The removal section 11 is provided on the opposite side of the input section 9 across the central portion of the substrate processing apparatus 1 in the width direction Y. The removal section 11 is arranged on the left Y of the input section 9. The removal section 11 houses the processed substrates W in the carrier C and removes the carrier C together. The removal section 11 functioning as such, like the input section 9, is provided with two placement stages 13 on which the carriers C are placed, for example. The input section 9 and the removal section 11 are also referred to as load ports.

[0053] <3. Transfer block>

[0054] A transfer block 5 is disposed adjacent to the rear side X of the carry-in / out block 3 in the substrate processing apparatus 1. The transfer block 5 is provided with a transfer robot IR and a transfer interface 15.

[0055] The transfer robot IR is configured to be rotatable about the vertical direction Z. The transfer robot IR is configured to be movable in the width direction Y. The transfer robot IR is provided with a first hand 19 and a second hand 21. Figure 1 The first hand 19 and the second hand 21 each hold one substrate W. The first hand 19 and the second hand 21 are configured to be independently advanced and retracted in the front-rear direction X. The transfer robot IR moves in the width direction Y and rotates about the vertical direction Z, and advances and retracts the first hand 19 or the second hand 21 to transfer the substrate W between each cassette C. Similarly, the transfer robot IR transfers the substrate W between the transfer interface 15.

[0056] Figure 2 The transfer interface 15 is disposed at the boundary between the transfer block 5 and the processing block 7. The transfer interface 15 is disposed, for example, at the central portion in the width direction Y. As shown in FIG. 1, the transfer interface 15 is formed longer in the vertical direction Z.

[0057] The transfer interface 15 is provided with a first inversion unit 23, a passage portion 25, a passage portion 27, and a second inversion unit 29 from the lower side to the upper side in the vertical direction Z.

[0058] The first inversion unit 23 inverts the substrate W received from the transfer block 5 upside down. The first inversion unit 23 inverts the horizontal posture of the substrate W. Specifically, the first inversion unit 23 converts the substrate W with the front surface facing upward to a posture with the front surface facing downward. In other words, the posture of the substrate W is converted to a posture with the back surface facing upward.

[0059] The second inversion unit 29 performs an action opposite thereto. That is, the second inversion unit 29 inverts the substrate W received from the processing block 7 upside down. The second inversion unit 29 converts the substrate W with the front surface facing downward to a posture with the front surface facing upward. In other words, the posture of the substrate W is converted to a posture with the back surface facing downward.

[0060] The inversion directions of the first inversion unit 23 and the second inversion unit 29 can also be opposite to each other. That is, the first inversion unit 23 converts the posture of the substrate W to a posture with the front surface facing upward. The second inversion unit 29 converts the posture of the substrate W to a posture with the back surface facing upward.

[0061] ​The passage portions 25, 27 are used for the transfer of the substrates W between the transport block 5 and the processing block 7. The passage portion 25 is used, for example, to carry the substrates W from the processing block 7 to the transport block 5. The passage portion 27 is used, for example, to carry the substrates W from the transport block 5 to the processing block 7. In addition, the direction of the substrates W carried in the passage portions 25, 27 can be opposite to each other.

[0062] <4. Processing block>

[0063] The processing block 7 performs, for example, a cleaning process on the substrates W. The cleaning process is, for example, a process using a brush in addition to a processing liquid. As shown in FIG. 1, the processing block 7 is divided, for example, into a first column Rl, a second column R2, and a third column R3 in the width direction Y. In detail, the first column Rl is disposed on the left side Y. The second column R2 is disposed at the center in the width direction Y. In other words, the second column R2 is disposed on the right side Y of the first column Rl. The third column R3 is disposed on the right side Y of the second column R2. Figure 1

[0064] <4-1. First column>

[0065] The first column Rl of the processing block 7 has a plurality of processing units 31. The first column Rl has, for example, four processing units 31. The first column Rl has the four processing units 31 stacked in the vertical direction Z. Details of each processing unit 31 will be described later. Each processing unit 31 is, for example, a cleaning unit. The cleaning unit performs a cleaning process on the substrates W. As the cleaning unit, there are a front surface cleaning unit that performs a cleaning process on the front surface of the substrate W and a back surface cleaning unit that performs a cleaning process on the back surface of the substrate W. In the present embodiment, as the processing unit 31, the back surface cleaning unit SSR will be described as an example.

[0066] <4-2. Second column>

[0067] The second column R2 of the processing block 7 has a central robot CR. The central robot CR is configured to be rotatable about the vertical direction Z. The central robot CR is configured to be liftable and lowerable in the vertical direction Z. The central robot CR has, for example, a first hand 33 and a second hand 35. The first hand 33 and the second hand 35 each hold one substrate W. The first hand 33 and the second hand 35 are configured to be independently advanceable and retractable in the front-back direction X and the width direction Y.

[0068] <4-3. Third column>

[0069] ​The third column R3 of the processing block 7 has the same configuration as the first column Rl. That is, the third column R3 has a plurality of processing units 31. The third column R3 has, for example, four processing units 31. The third column R3 has the four processing units 31 stacked in the vertical direction Z. The processing units 31 of the first column Rl and the processing units 31 of the third column R3 are arranged in opposition to each other in the width direction Y. Thus, the central robot CR can access the processing units 31 of the first column Rl and the third column R3 in opposition to each other at the same height in the vertical direction Z.

[0070] The processing block 7 is configured as described above. Here, an example of the operation of the central robot CR will be described. The central robot CR receives the substrate W from the first inversion unit 23, for example. The central robot CR carries the substrate W to either one of the back surface cleaning units SSR in the first column Rl and the third column R3, and performs cleaning processing on the back surface of the substrate W. The central robot CR receives the substrate W that has been subjected to the cleaning processing in either one of the back surface cleaning units SSR in the first column Rl and the third column R3. The central robot CR carries the substrate W to the second inversion unit 29.

[0071] <4-4. Processing unit>

[0072] Here, the back surface cleaning unit SSR (processing unit 31) will be described with reference to Figures 3-5 , for example. Figure 3 is a plan view showing the schematic configuration of the back surface cleaning unit of the embodiment. Figure 4 is a side view showing the schematic configuration of the back surface cleaning unit. Figure 5 is a longitudinal sectional view of the cleaning arm.

[0073] In addition, the back surface cleaning unit SSR of the first column Rl will be described here as an example. The back surface cleaning unit SSR of the third column R3 has a configuration in which the arrangement in the width direction Y is replaced.

[0074] The back surface cleaning unit SSR has a rotation holding section 37, a shield 39, a first processing liquid arm 41, a second processing liquid arm 43, a cleaning arm 45, and a standby tank 47.

[0075] <4-4-1. Rotation holding section>

[0076] The rotation holding section 37 is arranged at almost the center of the back surface cleaning unit SSR in plan view. The rotation holding section 37 rotates the substrate W in the horizontal plane while holding the substrate W in a horizontal posture. The rotation holding section 37 has a motor 49, a rotation shaft 51, a rotation chuck 53, and a support pin 55.

[0077] The motor 49 is disposed in a posture with the rotation axis 51 directed in the vertical direction Z. A rotary chuck 53 is attached to the upper end of the rotation axis 51. The rotary chuck 53 has a diameter slightly larger than that of the substrate W. The rotary chuck 53 is a plate-like member in a circular shape. The rotary chuck 53 has a plurality of support pins 55. In the embodiment, for example, six support pins 55 are provided. The six support pins 55 abut against the outer periphery of the substrate W and support the substrate W in a horizontal posture. The number of the support pins 55 is not limited to six as long as the substrate W can be stably supported in a horizontal posture. The six support pins 55 are erected in the vicinity of the outer periphery of the substrate W in the rotary chuck 53. The six support pins 55 release the holding of the periphery of the substrate W when the substrate W is carried into and out of the rotary chuck 53. Therefore, each of the support pins 55 is configured to be rotatable about the vertical direction Z. The description of the specific configuration for performing the operation is omitted. The rotary holding section 37 rotates the rotary chuck 53 about the rotation center Pl when the motor 49 is rotated. The rotation center Pl is the vertical direction Z.

[0078] <4-4-2. Guard>

[0079] The guard 39 is disposed so as to surround the rotary holding section 37 in a plan view. Specifically, the guard 39 has a main body section 57 and an inclined section 59. The guard 39 is configured to be liftable and lowerable in the vertical direction Z. The guard 39 is liftable and lowerable to a lowered standby position and a processing position above the standby position. The description of the specific configuration for lifting and lowering the guard 39 is omitted.

[0080] The main body section 57 of the guard 39 is in a cylindrical shape. The inner peripheral surface of the main body section 57 is disposed apart outward from the outer peripheral side of the rotary holding section 37. The inclined section 59 is tapered so as to approach the rotation axis 51 side from the upper portion of the main body section 57. The inclined section 59 has an opening section 61 in the upper portion. The opening section 61 is formed in the central portion of the inclined section 59. The opening section 61 is larger in diameter than the substrate W. The opening section 61 is larger in diameter than the rotary chuck 53. When the substrate W is carried in and out, the guard 39 is lowered in the vertical direction Z to a position where the rotary chuck 53 protrudes upward from the opening section 61. When the substrate W is subjected to the cleaning process, the inclined section 59 of the guard 39 is positioned in the vicinity of the height of the substrate W held by the rotary chuck 53. The inclined section 59 guides the processing liquid and the like scattered from the substrate W to the surroundings to the lower side of the guard 39 with the inclined inner peripheral surface.

[0081] <4-4-3. First processing liquid arm>

[0082] The first processing liquid arm 41 is disposed behind the rotation holding portion 37 in plan view. The first processing liquid arm 41 has a motor 42 at the base end portion side. The first processing liquid arm 41 is swung about the rotation center P2 at the base end portion side by the motor 42. The rotation center P2 is in the vertical direction Z. The first processing liquid arm 41 has one nozzle 63. The nozzle 63 has a discharge port at the lower side. The nozzle 63 discharges a processing liquid. The first processing liquid arm 41 is configured to swing the front end portion of the nozzle 63 between the standby position shown in FIG. 6 and the supply position in the vicinity of the rotation center PI. The first processing liquid arm 41 moves the front end portion of the nozzle 63 to the supply position when supplying the processing liquid to the substrate W. The first processing liquid arm 41 moves the front end portion of the nozzle 63 to the standby position when not supplying the processing liquid to the substrate W. The first processing liquid arm 41 can also swing the nozzle 63 above the substrate W without interfering with the cleaning arm 45 when supplying the processing liquid to the substrate W. Figure 3

[0083] As the processing liquid discharged from the nozzle 63, for example, a cleaning liquid is given. As the cleaning liquid, for example, pure water, carbonated water, electrolytic ion water, hydrogen water, ozone water, and the like are given.

[0084] <4-4-4. Second Processing Liquid Arm>

[0085] The second processing liquid arm 43 is disposed to the left of the rotation holding portion 37 in plan view. The second processing liquid arm 41 has a motor 44 at the base end portion side. The second processing liquid arm is swung about the rotation center P3 at the base end portion side by the motor 44. The rotation center P3 is in the vertical direction Z. The second processing liquid arm 43 has three nozzles 65, 67, and 69. Each of the nozzles 65, 67, and 69 has a discharge port at the lower side. The nozzles 65, 67, and 69 discharge a processing liquid. The second processing liquid arm 43 is configured to swing the front end portions of the nozzles 65, 67, and 69 between the standby position shown in FIG. 6 and the supply position in the vicinity of the rotation center PI. The second processing liquid arm 43 moves the front end portions of the nozzles 65, 67, and 69 to the supply position when supplying the processing liquid to the substrate W. The second processing liquid arm 43 moves the front end portions of the nozzles 65, 67, and 69 to the standby position when not supplying the processing liquid to the substrate W. The second processing liquid arm 43 can also swing the nozzles 65, 67, and 69 above the substrate W without interfering with the cleaning arm 45 when supplying the processing liquid to the substrate W. Figure 3

[0086] As the processing liquid discharged from the nozzles 65, 67, and 69, for example, a chemical liquid is given. As the chemical liquid, for example, a chemical liquid containing at least one of sulfuric acid, nitric acid, acetic acid, hydrochloric acid, hydrofluoric acid, ammonia water, and hydrogen peroxide water is given. As a more specific chemical liquid, for example, a mixed liquid of ammonia water and hydrogen peroxide water, that is, SC-1 or the like can be used.

[0087] ​​<4-4-5. Washing arm>

[0088] The washing arm 45 is configured as follows.

[0089] The washing arm 45 has a rotary lifting mechanism 71, a support column 73, a housing 75, and a washing section 77.

[0090] The rotary lifting mechanism 71 is configured to lift the support column 73, the housing 75, and the washing section 77 in the vertical direction Z. The rotary lifting mechanism 71 is configured to swing the support column 73, the housing 75, and the washing section 77 about the rotation center P4. Specifically, the rotary lifting mechanism 71 is configured by, for example, combining a motor and a cylinder. The rotary lifting mechanism 71 lifts the washing section 77 from the standby groove 47 in the vertical direction Z at the standby position. The rotary lifting mechanism 71 swings (moves) the washing section 77 in such a manner that the washing section 77 passes near the rotation center P1.

[0091] In addition, the rotary lifting mechanism 71 corresponds to the "arm driving section" in the present application.

[0092] The support column 73 is cylindrical. The lower portion of the support column 73 is connected to the rotary lifting mechanism 71. The upper portion of the support column 73 is connected to one lower portion of the housing 75. The housing 75 has a long axis in the horizontal plane. The housing 75 has the washing section 77 in the other lower portion. The washing section 77 rotates about the rotation center P5. The rotation center P5 is the vertical direction Z.

[0093] The housing 75 has a lower housing 75a and an upper housing 75b. The lower housing 75a constitutes the lower portion of the housing 75. The upper housing 75b constitutes the upper portion of the housing 75. The upper housing 75b and the lower housing 75a are connected to each other.

[0094] The housing 75 has a pushing mechanism 81 and a rotating mechanism 83. Specifically, the lower housing 75a mounts the pushing mechanism 81 and the rotating mechanism 83.

[0095] The pushing mechanism 81 has a fulcrum member 85, a flap member 87, a pushing actuator 89, and a support mechanism 91.

[0096] The fulcrum member 85 is installed on the upper surface of the lower housing 75a. The fulcrum member 85 is erected at the almost central portion in the front-rear direction X of the lower housing 75a. The fulcrum member 85 has a swing shaft 85a on the upper portion. The swing shaft 85a is rotatable about the width direction Y. The central portion 87c of the flap member 87 is swingably installed to the fulcrum member 85 via the swing shaft 85a. The one side 87l (action point portion) and the other side 87r (force point portion) of the flap member 87 are alternately liftable in the vertical direction Z. The flap member 87 swings about the swing shaft 85a.

[0097] The actuator 89 is arranged so that the actuator 89a is directed in the vertical direction Z. The actuator 89 raises the side 87l of the rocker member 87 by extending the actuator shaft 89a. The actuator 89 is preferably an air bearing actuator, for example.

[0098] The actuator shaft 89a of the air bearing actuator is supported so as to be able to advance and retreat in a minute gap by air. Therefore, in theory, the sliding resistance of the actuator shaft 89a is zero and no friction occurs. Therefore, compared with a general air cylinder, the air bearing actuator is able to advance and retreat the actuator shaft 89a even with a minute air pressure. Therefore, it is able to advance and retreat linearly according to the air pressure. However, as the actuator 89, a general air cylinder can also be used.

[0099] The support mechanism 91 is arranged on the opposite side of the actuator 89 from the fulcrum member 85 in the front-rear direction X. The support mechanism 91 supports the cleaning section 77. The support mechanism 91 cantilever supports the cleaning section 77 below the housing 75.

[0100] The support mechanism 91 has a holding member 93, a spring 95, and a guide rail 97.

[0101] The support mechanism 91 cantilever supports the cleaning section 77. The cleaning section 77 has a brush 99 and a brush holder 101. The brush 99 acts on the substrate W to clean it. The brush holder 101 holds the brush 99. The brush holder 101 detachably holds the brush 99. A rotation shaft 103 is attached to the center of the brush holder 101 in plan view. The rotation shaft 103 extends in the vertical direction Z from the brush holder 101. The brush 99 is held by the cleaning arm 45 so as to move in the horizontal plane in the vicinity of the rotation center PI of the substrate W.

[0102] The holding member 93 rotatably holds the rotation shaft 103. The rotation shaft 103 is composed of a spline shaft, for example. The rotation shaft 103 is attached to the holding member 93 via a spline nut 103a. The rotation shaft 103 is able to move in the vertical direction Z with respect to the spline nut 103a. The holding member 93 holds the spline nut 103a so as to be able to rotate about the vertical direction Z. The spline nut 103a is attached to the holding member 93 via a bearing not shown. The rotation shaft 103 is able to rotate about the rotation center P5. A pulley 105 is attached to the spline nut 103a that protrudes toward the upper portion of the holding member 93. The pulley 105 is fixed to the outer peripheral surface of the spline nut 103a. When the pulley 105 rotates, the spline nut 103a rotates, and at the same time, the rotation shaft 103 also rotates in the same direction.

[0103] The elastic pushing portion 95 is provided at the upper portion of the pulley 105. The elastic pushing portion 95 includes an upper holding portion 107, a lower holding portion 109, and a coil spring 111. The upper holding portion 107 is mounted to the upper side of the rotation shaft 103 via a bearing (not shown). In other words, the upper holding portion 107 is kept stationary even if the rotation shaft 103 rotates. The lower holding portion 109 is provided separately from the upper holding portion 107. The lower holding portion 109 is provided below the upper holding portion 107 and at the upper portion of the pulley 105. The inner circumferential surface of the lower holding portion 109 is provided separately from the outer circumferential surface of the rotation shaft 103. Thus, the lower holding portion 109 is kept stationary even if the rotation shaft 103 rotates. In addition, the lower holding portion 109 is mounted to the upper surface of the pulley 105 via a bearing. Thus, the lower holding portion 109 is not affected by the rotation of the pulley 105.

[0104] The coil spring 111 is mounted to the upper holding portion 107 and the lower holding portion 109. The upper end of the coil spring 111 is fixed to the upper holding portion 107. The lower end of the coil spring 111 is fixed to the lower holding portion 109. The coil spring 111 has, for example, a cylindrical shape. The coil spring 111 is a compression coil spring. Thus, the upper holding portion 107 is elastically pushed upward from the upper surface of the pulley 105 and the lower holding portion 109. As a result, the rotation shaft 103 is elastically pushed upward in the vertical direction Z. Thus, in the normal state in which the pushing actuator 89 is not activated, the brush 99 is maintained at a fixed height from the lower surface of the lower housing 75a. In other words, in the normal state, the load of the brush 99 is zero.

[0105] The support mechanism 91 supports the rotation shaft 103 that is raised and lowered in the vertical direction Z. The support mechanism 91 includes a linear guide 113 and a shaft holding portion 115. The linear guide 113 is provided adjacent to the holding member 93. The linear guide 113 is erected in the vertical direction Z. The linear guide 113 includes a guide 113a and a carriage 113b. The guide 113a is arranged in the vertical direction Z in the longitudinal direction. The guide 113a is mounted so that the carriage 113b can move in the vertical direction Z. The carriage 113b is provided below the other side 87r of the flap member 87. The carriage 113b is provided at a position that abuts when the other side 87r of the flap member 87 is lowered.

[0106] The shaft holding portion 115 holds the upper portion of the rotation shaft 103. The shaft holding portion 115 holds in a state that allows the rotation shaft 103 to rotate. The shaft holding portion 115 holds the rotation shaft 103 via a bearing not shown, for example. The carriage 113b is linked to the shaft holding portion 115. When the pusher actuator 89 is caused to ascend the actuator shaft 89a with a driving force stronger than the elastic pushing force of the coil spring 111, the one side 871 (the point-of-application portion) ascends. When the one side 871 ascends, the other side 87r (the force-point portion) descends. At this time, the other side 87r causes the carriage 113b to descend together with the shaft holding portion 115. Then, the rotation shaft 103 descends, and the brush 99 moves downward from the prescribed position. When the pusher actuator 89 is thus driven, a pushing force corresponding to the driving force of the pusher actuator 89 is applied to the brush 99.

[0107] The rotation mechanism 83 is disposed adjacent to the support mechanism 91. The rotation mechanism 83 is disposed on the fulcrum member 85 side. The rotation mechanism 83 has a mounting member 117 and a motor 119. The mounting member 117 is disposed so as to separate the motor 119 upward from the bottom surface of the lower housing 75a. The rotation shaft of the motor 119 is disposed so as to face downward in the vertical direction Z. The motor 119 rotates the rotation shaft about the rotation center P6. The rotation center P6 is substantially parallel to the rotation center P5 in the vertical direction Z. The motor 119 has a pulley 121 mounted to the rotation shaft. A timing belt 123 is stretched over the pulley 121 and the pulley 105. Therefore, when the motor 119 rotates, the rotation shaft 103 rotates about the rotation center P5 via the timing belt 123, the belts 105, 121, and the spline nut 103a. Even if the rotation shaft 103 thus rotates, the rotation shaft 103 can be raised and lowered in the vertical direction Z.

[0108] The cleaning arm 45 is configured as described above. That is, the operation of the pusher actuator 89 is applied to the other side 87r (the point-of-application portion) via the one side 871 (the force-point portion) of the rocker member 87. Therefore, by providing the rocker member 87, the degree of freedom of the arrangement of the pusher actuator 89 can be improved. Therefore, the height of the substrate processing apparatus 1 can be suppressed. As a result, the arrangement in which the substrate processing apparatus 1 is stacked in multiple stages can be easily realized.

[0109] The brush 99 is raised and lowered as follows. The rocker member 87 is swung by the pusher actuator 89. For example, as described later, the pusher actuator 89 is operated in accordance with a target load. By the operation, the brush 99 is moved in the vertical direction Z. Specifically, the brush 99 is raised and lowered to an unloaded height, an application height, and a maximum press-in height.

[0110] The unloaded height is the highest. The brush 99 is located at the unloaded height at ordinary times other than during the cleaning process. The application height is a high position lower than the unloaded height. The maximum press-in height is a height lower than the application height.

[0111] <4-5. Control system>

[0112] The control section 161 has a CPU (Central Processing Unit) and a memory, not shown. The control section 161 comprehensively controls the respective sections. Specifically, the control section 161 controls the conveyance operation in the input section 9 and the removal section 11, the conveyance operation of the transfer robot IR, the reversing operation of the first reversing unit 23 and the second reversing unit 29, the conveyance operation of the center robot CR, and the like. The control section 161 operates the rotation of the motor 49 in the backside cleaning unit SSR (processing unit 31), the lifting operation of the guard 39, the opening and closing operation of the support pin 55 in the rotary chuck 53, the swinging operation of the motors 42 and 44, with the pusher actuator 89 as a control object. The control section 161 operates the pusher actuator 89 to control the push pressure of the brush 99 against the substrate W, in accordance with the target load specified in the cleaning process.

[0113] <4-6. Cleaning section 77>

[0114] Here, the details of the cleaning section 77 will be described with reference to Figure 6 Figure 6 is a longitudinal sectional view showing the details of the cleaning section.

[0115] In addition, the cleaning section 77 corresponds to the "brush" of the present application, and the brush 99 corresponds to the "brush body" of the present application.

[0116] The cleaning section 77 mounts the brush 99 to the brush holder 101. The brush holder 101 has a mounting section 501, a peripheral section 503, and a restriction section 505.

[0117] The mounting section 501 constitutes the upper portion of the brush holder 101. The mounting section 501 has a circular shape in plan view. The mounting section 501 forms a mounting hole 507 on the upper surface. The mounting hole 507 is formed in the central portion of the mounting section 501 in plan view. The lower end portion of the rotation shaft 103 is screwed into the mounting hole 507. The brush holder 101 is coupled to the rotation shaft 103 on the upper surface.

[0118] The peripheral surface of the mounting section 501 extends downward in the vertical direction Z. The extended portion constitutes the peripheral section 503. The lower surface of the peripheral section 503 extends toward the central portion of the mounting section 501. The portion constitutes the restriction section 505. The restriction section 505 forms an opening 509 in the central portion in plan view. The lower surface of the mounting section 501, the inner peripheral surface of the peripheral section 503, and the upper surface of the restriction section 505 form a space 511.

[0119] ​The brush 99 is disposed in the space 511. The brush 99 has a central brush 513, a peripheral brush 515, and a plurality of compression coil springs 517. The brush 99 is composed of, for example, PVA (poly vinyl alcohol). The material of the brush 99 is not limited.

[0120] The central brush 513 has an upper flange 519 and a columnar member 521. The upper flange 519 has a circular shape in plan view. The diameter of the upper flange 519 is smaller than that of the brush holder 101. The central brush 513 is mounted to the top surface of the space 511. The columnar member 521 extends downward in the vertical direction Z from the center of the lower surface of the upper flange 519. The lower surface of the columnar member 521 protrudes downward from the opening 509. The outer diameter of the columnar member 521 is smaller than the inner diameter of the opening 509.

[0121] The peripheral brush 515 has a lower flange 523 and a hollow member 525. The peripheral brush 515 is disposed with the upper surface of the lower flange 523 facing the lower surface of the upper flange 519. In other words, the peripheral brush 515 is disposed at a position apart from the central brush 513 with the upper surface of the lower flange 523 facing the lower surface of the upper flange 519. The outer diameter of the lower flange 523 is smaller than the inner diameter of the space 511. The hollow member 525 extends downward in the vertical direction Z from the center of the lower surface of the lower flange 523. The center of the hollow member 525 is hollow. The hollow member 525 forms a through-hole 527 that penetrates from the upper surface of the lower flange 523 to the lower surface of the hollow member 525. The inner diameter of the through-hole 527 is slightly larger than the outer diameter of the columnar member 521. The peripheral brush 515 is inserted through the columnar member 521 in the through-hole 527 of the hollow member 525. The peripheral brush 515 is mounted so as to be able to be raised and lowered in the vertical direction Z with respect to the central brush 513.

[0122] The plurality of compression coil springs 517 are disposed between the central brush 513 and the peripheral brush 515. Specifically, the plurality of compression coil springs 517 are disposed between the upper flange 519 of the central brush 513 and the lower flange 523 of the peripheral brush 515. The plurality of compression coil springs 517 are disposed between the lower surface of the upper flange 519 and the upper surface of the lower flange 523. The plurality of compression coil springs 517 is, for example, four. The plurality of compression coil springs 517 is preferably, for example, each disposed so as to have an equal angle with the center in plan view. The plurality of compression coil springs 517 is disposed so as to surround the columnar member 521 in plan view. The upper and lower ends of the plurality of compression coil springs 517 do not need to be fixed to the upper flange 519 and the lower flange 523. It is sufficient that the plurality of compression coil springs 517 is disposed between the upper flange 519 and the lower flange 523.

[0123] The compression coil spring 517 urges the outer peripheral brush 515 downward in the vertical direction Z. The urging force of the compression coil spring 517 is smaller than the pressing force of the target load. Thus, when the brush 99 is pressed to the substrate W with the target load and receives a reaction force corresponding to the target load due to the inclination of the substrate W, the outer peripheral brush 515 can move upward. The lower surface of the lower flange 523 of the outer peripheral brush 515 urged downward abuts against the upper surface of the restriction portion 505 and is restricted from moving downward to a certain degree or more. Thus, the height of the lower surface of the outer peripheral brush 515 is restricted. In addition, the compression coil spring 517 urges the outer peripheral brush 515 downward in the vertical direction Z. Thus, when the brush 99 returns from the peripheral portion to the central portion, the outer peripheral brush 515 can return to the original position. In the case where the compression coil spring 517 is not provided, the outer peripheral brush 515 cannot return to the original position.

[0124] Figure 6 The height of the lower surface of the outer peripheral brush 515 indicated by a solid line represents the position of the brush 99 when the brush 99 is positioned at the central portion of the substrate W. The compression coil spring 517 makes the lower surface of the central brush 513 and the lower surface of the outer peripheral brush 515 in a state where there is no step, in a state where the brush 99 is not loaded and does not receive a reaction force, or in a state where the brush 99 receives a reaction force corresponding to the target load, but the substrate W is not inclined. In other words, the lower surface of the central brush 513 and the lower surface of the outer peripheral brush 515 coincide with each other in the front and back direction X and the width direction Y. Figure 6 The height of the lower surface of the outer peripheral brush 515 indicated by a two-dot chain line represents the position of the brush 99 when the brush 99 is positioned at the peripheral portion of the substrate W. The compression coil spring 517 makes the lower surface of the outer peripheral brush 515 move upward compared to the lower surface of the central brush 513, in a state where the brush 99 receives a reaction force corresponding to the target load and the substrate W is inclined.

[0125] Next, the operation of the cleaning portion 77 configured as described above will be described with reference to Figure 7 to the drawings. Figure 7 is a view illustrating the state of the brush in the central portion and the peripheral portion. In addition, in the actual cleaning process, the supply of the processing liquid is performed, but is omitted in the following description.

[0126] In the back surface cleaning apparatus SSR, when the substrate W is cleaned, the brush 99 is pressed to the substrate W with the target load by the pressing mechanism 81 with respect to the substrate W rotated by the rotation holding portion 37. In addition, the brush 99 is moved between the central portion CP and the peripheral portion PP by the cleaning arm 45. In the example, the central portion CP of the substrate W is not inclined and is horizontal. In the example, the peripheral portion PP of the substrate W has an inclination with respect to the central portion CP. In the example, the inclination is toward the lower right.

[0127] In the case where the cleaning section 77 is located at the central portion CP of the substrate W, the lower surfaces of the central brush 513 and the outer peripheral brush 515 of the brush 99 act on the upper surface of the substrate W in a uniform state with respect to each other. Therefore, in the central portion CP of the substrate W, the lower surfaces of the brush 99 as a whole act on the substrate W.

[0128] On the other hand, in the case where the cleaning section 77 is located at the peripheral portion PP of the substrate W, the outer peripheral brush 515 moves in the vertical direction with respect to the central brush 513 depending on the inclination of the peripheral portion PP. The outer peripheral brush 515 is instantaneously moved upward by the reaction force from the substrate W corresponding to the target load which is stronger than the urging force of the compression coil spring 517. Therefore, the acting surface of the brush 99 is a shape following the inclination of the substrate W. As a result, since the outer peripheral brush 515 does not generate a skewed deformation, and almost only the central brush 513 acts on the substrate W, damage to the cleaned surface of the substrate W does not occur. In addition, when the cleaning section 77 is moved to the central portion CP, since the outer peripheral brush 515 is urged downward by the compression coil spring 517, it is instantaneously moved to a position coinciding with the central brush 513.

[0129] <Modification Example 1>

[0130] Here, with reference to Figure 8 , a modification example of the cleaning section 77 will be described. Figure 8 is a longitudinal sectional view showing the details of the cleaning section of Modification Example 1.

[0131] The brush 99A of the cleaning section 77A has one compression coil spring 517A. The compression coil spring 517A is disposed in a state in which the hollow portion passes through the columnar member 521. Even with this configuration, the same effects as those of the embodiment are exerted. Further, in Modification Example 1, since the compression coil spring 517 is one, the configuration can be simplified as compared with the embodiment. As a result, the assembly of the cleaning section 77A can be easily performed.

[0132] <Modification Example 2>

[0133] Here, with reference to Figure 9 , a modification example of the cleaning section 77 will be described. Figure 9 is a longitudinal sectional view showing the details of the cleaning section of Modification Example 2.

[0134] The configuration of the cleaning section 77B is different from that of the embodiment in that, in the brush 99B, a leaf spring 517B is provided instead of the compression coil spring 517. The leaf spring 517B has an L-shaped longitudinal sectional shape. The leaf spring 517B is simple in configuration and light in weight as compared with the compression coil spring 517. Therefore, the lightening of the cleaning section 77B can be attempted.

[0135] <Modification Example 3>

[0136] Here, with reference toFigure 10 A variation of the cleaning section 77 will be described. Figure 10 is a longitudinal sectional view showing details of the cleaning section of Variation 3.

[0137] The brush 99C of the cleaning section 77C is provided with a leaf spring 517C which is integral with the brush holder 101. The leaf spring 517C is formed on the outer peripheral portion 503 of the brush holder 101. The leaf spring 517C extends from the inner peripheral surface of the outer peripheral portion 503 toward the cylindrical member 521. The leaf spring 517C is bent downward. The leaf spring 517C urges the outer peripheral brush 515 downward on its lower surface. In the variation 1, the leaf spring 517C is integrally formed with the brush holder 101. Therefore, the number of parts can be reduced, and the configuration can be simplified.

[0138] <Variation 4>

[0139] Here, reference will be made to Figure 11 A variation of the cleaning section 77 will be described. Figure 11 is a longitudinal sectional view showing details of the cleaning section of Variation 4.

[0140] The brush 99D of the cleaning section 77D is provided with one central brush 513 and two outer peripheral brushes 515D1 and 515D2. The outer peripheral brush 515D1 is disposed on the outer peripheral side of the central brush 513. The outer peripheral brush 515D2 is disposed on the outer peripheral side of the outer peripheral brush 515D1. The outer peripheral brush 515D1 is in a cylindrical shape. The outer peripheral brush 515D2 is in the same shape as the outer peripheral brush 515 of the embodiment.

[0141] The outer peripheral brush 515D1 is formed with a stopper portion 531 on the upper surface. The central brush 513 is formed with a stopper portion 533 on the lower surface of the upper flange 519. The upper and lower ends of the first compression coil spring 535 are fixed to the stopper portions 531 and 533. Therefore, the cylindrical outer peripheral brush 515D1 is suspended and supported by the first compression coil spring 535. The outer peripheral brush 515D2 is disposed with the second compression coil spring 537 between the central brush 513. The first and second compression coil springs 535 and 537 have urging forces smaller than the reaction forces corresponding to the urging forces of the target loads, as in the embodiment.

[0142] In the variation 4, the shape of the brush 99D is deformed in two stages according to the inclination of the substrate W. Therefore, the shape of the brush 99D can be deformed according to the inclination of the substrate W, and the area of the brush 99D acting on the substrate W can be maximally maintained. As a result, the cleaning process can be efficiently performed.

[0143] The present application is not limited to the embodiment described above, and can be variously changed as follows.

[0144] (1) In the embodiment, the back surface cleaning unit SSR has been described as an example of the substrate processing apparatus. However, the present application is not limited to the back surface cleaning unit SSR. For example, it can also be applied to a front surface cleaning unit that cleans the front surface of the substrate with a brush 99.

[0145] (2) In the embodiment, the back surface cleaning unit SSR (processing unit 31) as the substrate processing apparatus has been described as an example of the configuration provided in the substrate processing apparatus 1 with the load-in / out block 3 or the transfer block 5, etc. However, the present application is not limited to this configuration. For example, it can also be configured only with the back surface cleaning unit SSR (processing unit 31).

[0146] (3) In the embodiment, the cleaning arm 45 does not have a mechanism that detects the load applied to the brush 99. However, the present application is not limited to this configuration. For example, it can also be configured to detect the force applied to the carriage 113b with a load cell and detect the degree of coincidence with the target load.

[0147] (4) In the embodiment, the central brush 513 has the upper flange 519 and the outer peripheral brush 515 has the lower flange 523. However, the present application is not limited to this configuration.

[0148] (5) In the embodiment and each variation, the elastic pushing mechanism uses an elastic force, but the present application is not limited to this configuration. For example, as the elastic pushing mechanism, a driving mechanism that actively adjusts the height of the outer peripheral brush 515 according to the inclination of the substrate W can also be used.

[0149] (6) In the embodiment, the movement of the brush 99 is performed by rotating and driving with the rotary lifting mechanism 71 mounted on the cleaning arm 45. However, it is not limited to this configuration, and the brush 99 held on the cleaning arm 45 can also be moved linearly by linearly driving the cleaning arm 45 with a linear motion mechanism such as a ball screw, a linear guide, and a motor that rotates the ball screw.

[0150] [Explanation of Symbols]

[0151] 1 substrate processing apparatus

[0152] 3 load-in / out block

[0153] 5 transfer block

[0154] 7 processing block

[0155] W substrate

[0156] C carrier

[0157] IR transfer robot

[0158] 15 handover portion

[0159] 23 1st reversing unit

[0160] 25, 27 passage portions

[0161] 29 2nd reversing unit

[0162] 31 processing unit

[0163] SSR back surface cleaning unit

[0164] CR center robot

[0165] 37 rotation holding portion

[0166] 39 guard

[0167] 41 1st processing liquid arm

[0168] 42 motor

[0169] 43 2nd processing liquid arm

[0170] 45 cleaning arm

[0171] 47 standby tank

[0172] 53 rotation chuck

[0173] 71 rotation lifting mechanism

[0174] 75 housing

[0175] 77, 77A to 77D cleaning portions

[0176] 81 push mechanism

[0177] 83 rotation mechanism

[0178] 85 fulcrum member

[0179] 87 flap member

[0180] 87c central portion

[0181] 87l one side

[0182] 87r other side

[0183] 89 push actuator

[0184] 91 support mechanism

[0185] 93 holding member

[0186] 95 spring push portion

[0187] 97 guide portion

[0188] 99, 99A to 99D brushes

[0189] 101 brush seat

[0190] 103 rotation axis

[0191] 111 coil spring

[0192] 113 linear guide

[0193] 501 mounting portion

[0194] 503 outer peripheral portion

[0195] 505 restriction portion

[0196] 513 central brush

[0197] 515 outer peripheral brush

[0198] 517 compression coil spring

[0199] 519 upper flange

[0200] 521 columnar member

[0201] 523 lower flange

[0202] 525 hollow member

[0203] CP central portion

[0204] PP peripheral portion

Claims

1. A brush that acts on a substrate to perform a cleaning process, characterized by comprising: a brush body that acts on a substrate; and a brush holder that mounts the brush body; and the brush body comprising: a central brush that constitutes a central portion in a plan view; at least one peripheral brush that is disposed on a peripheral side of the central brush and is mounted so as to be slidable in a vertical direction with respect to the central brush; and a springing mechanism that springs the peripheral brush with respect to the central brush toward a substrate side in a manner that, in a state in which the brush body is positioned at a central portion of a substrate, a lower surface of the central brush and a lower surface of the peripheral brush become almost uniform in height, and, in a state in which the brush body is positioned at a peripheral portion of the substrate, allows the peripheral brush to move in a vertical direction with respect to the central brush in accordance with an inclination of the peripheral portion.

2. The brush according to claim 1, wherein the central brush comprises an upper flange and a columnar member that protrudes from a central portion of the upper flange in a vertical direction; the peripheral brush comprises a lower flange that faces a lower surface of the upper flange, and a hollow member that covers an outer peripheral portion of the columnar member and protrudes from the lower flange in a vertical direction.

3. The brush according to claim 2, wherein the springing mechanism is disposed between a lower surface of the upper flange and an upper surface of the lower flange.

4. The brush according to claim 3, wherein the springing mechanism is a compression coil spring that is disposed between the upper flange and the lower flange with an upper end and a lower end.

5. The brush according to any one of claims 1 to 3, wherein a springing force of the springing mechanism is smaller than a pressing force that springs the brush toward a substrate.

6. The brush according to claim 2, wherein the brush holder comprises a mounting portion, a peripheral portion that extends from an outer peripheral surface of the mounting portion along an outer peripheral surface of the lower flange, and a limiting portion that extends from a lower surface of the peripheral portion along a lower surface of the lower flange.

7. A substrate processing apparatus that causes a brush to act on a substrate to perform a cleaning process, characterized by comprising: a rotation holding portion that holds a substrate in a horizontal posture and rotates the substrate; a brush that acts on an upper surface of a substrate held in the rotation holding portion and comprises a brush body that acts on a substrate, and a brush holder that mounts the brush body; a cleaning arm that comprises the brush at a front end portion; and an arm driving portion that drives the cleaning arm in a manner that causes the brush to move in a radial direction of a substrate between a rotation center and a peripheral portion of a substrate held in the rotation holding portion; and the brush body comprising: a central brush that constitutes a central portion in a plan view; at least one peripheral brush that is disposed on a peripheral side of the central brush and is mounted so as to be slidable in a vertical direction with respect to the central brush; and a springing mechanism that springs the peripheral brush with respect to the central brush toward a substrate side in a manner that, in a state in which the brush body is positioned at a central portion of a substrate, a lower surface of the central brush and a lower surface of the peripheral brush become almost uniform in height, and, in a state in which the brush body is positioned at a peripheral portion of the substrate, allows the peripheral brush to move in a vertical direction with respect to the central brush in accordance with an inclination of the peripheral portion. ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​

Images