The invention discloses a high-purity
quartz component
surface cleaning graphite jig for a
semiconductor and a using method, the device comprises a movable working platform, a mechanical arm, a
graphite jig, a
laser instrument and a dust discharging device, the
graphite jig is arranged on the movable working platform, the mechanical arm is arranged on one side of the graphite jig, the
laser instrument is arranged at the working end of the mechanical arm, and the dust discharging device is arranged on the mechanical arm. Dust exhaust devices are arranged on the two sides of the
laser instrument, each dust exhaust device comprises an exhaust port and an air inlet, and an
ultraviolet light source is arranged on the periphery of the upper surface of the graphite jig. According to the treatment method, the cleanliness of the surface of a used component can be guaranteed, no residual film or
metal pollution exists, meanwhile, the cleaning efficiency of the component can be improved, and the cleaning
operation time is saved; the surface of the high-purity
quartz component is treated through laser cleaning, residues on the surface can be effectively removed, the chemical soaking time in a traditional process is shortened, the cleaning loss of the component is reduced, the service life of the component is prolonged, and meanwhile the air leakage risk caused by excessive
corrosion of the sealing surface is reduced.