Display substrate, manufacturing method thereof, and display device

Abstract

A display substrate, a manufacturing method thereof, and a display device. The display substrate includes a substrate and a plurality of sub-pixels. The sub-pixel includes a light emitting element including a light emitting functional layer, a first electrode and a second electrode, and the first electrode is located between the light emitting functional layer and the substrate. The display substrate further includes a limiting structure between adjacent sub-pixels. A first orthographic projection of a surface of the limiting structure close to the substrate on the substrate is completely located in a second orthographic projection of a surface of the limiting structure away from the substrate on the substrate. The maximum size of the second orthographic projection is greater than that of the first orthographic projection, and the limiting structure includes inorganic non-metallic material. At least one layer in the light emitting functional layer is disconnected at the edge of the limiting structure, and the second electrode of the adjacent sub-pixel is at least partially continuous. The brightness uniformity problem can be avoided while reducing the crosstalk generated between the adjacent sub-pixels.

Description

Technical Field

[0001] This disclosure relates to a display substrate, a method for manufacturing the same, and a display device. Background Technology

[0002] With the development of display technology, users have increasingly higher performance requirements for display devices. By separating the light-emitting material layers between adjacent sub-pixels, signal crosstalk can be reduced, thereby meeting the performance requirements of high brightness and low power consumption of display devices as much as possible. Summary of the Invention

[0003] This disclosure provides a display substrate and a display device.

[0004] This disclosure provides a display substrate, including a substrate and a plurality of sub-pixels located on the substrate. The substrate includes at least a first region; the plurality of sub-pixels are located in the first region on the substrate, and each sub-pixel, at least a portion of which includes a light-emitting element, the light-emitting element including a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the substrate, the first electrode being located between the light-emitting functional layer and the substrate, the light-emitting functional layer including a plurality of film layers. The display substrate further includes a defining structure, at least one defining structure being disposed between at least two adjacent sub-pixels, the first orthographic projection of the surface of the defining structure on the substrate near the substrate located between adjacent sub-pixels being completely within the second orthographic projection of the surface of the defining structure on the substrate away from the substrate, the maximum size of the second orthographic projection being larger than the maximum size of the first orthographic projection along the light-emitting region arrangement direction of the adjacent sub-pixels, and the defining structure comprising an inorganic non-metallic material; in at least a portion of the first region, at least one layer of the light-emitting functional layer is interrupted at the edge of the defining structure, and the second electrodes of adjacent sub-pixels are at least partially continuous.

[0005] For example, according to an embodiment of the present disclosure, the second electrode is continuously disposed at the edge of the defined structure.

[0006] For example, according to embodiments of this disclosure, the second electrode of at least one sub-pixel and the second electrode of a sub-pixel adjacent to it in a first sub-direction are continuously disposed, and the second electrode of the at least one sub-pixel and the second electrode of the sub-pixel adjacent to it in a second sub-direction are disconnected, the first sub-direction and the second sub-direction intersect; and / or, the second electrode of at least one sub-pixel and the second electrode of a sub-pixel adjacent to it in a first sub-direction are continuously disposed, and the second electrode of the at least one sub-pixel and the second electrode of the sub-pixel adjacent to it in a second sub-direction are continuously disposed, the first sub-direction and the second sub-direction intersect.

[0007] For example, according to an embodiment of this disclosure, the defined structure surrounds more than 50% of the contour of at least one sub-pixel.

[0008] For example, according to an embodiment of the present disclosure, the second electrode of at least one sub-pixel and the second electrode of its adjacent sub-pixel are continuously disposed, and the minimum width of the second electrode between the two adjacent sub-pixels is greater than 1 micrometer in the direction perpendicular to their arrangement.

[0009] For example, according to an embodiment of this disclosure, the orthographic projection of the center line connecting two adjacent sub-pixels onto the plane where the second electrode is located lies within the second electrode.

[0010] For example, according to an embodiment of the present disclosure, the outline of at least a partially defined structure is the same as the outline of the light-emitting area of ​​the sub-pixel surrounded by the at least partially defined structure, and the ratio of the distance between the adjacent edges of the different defined structures and the light-emitting areas of the sub-pixels surrounded by the different defined structures is 0.9 to 1.1.

[0011] For example, according to an embodiment of the present disclosure, the cross-sectional shape of the defined structure cut by the plane containing the center line includes a first trapezoid, wherein the length of the first base of the first trapezoid away from the substrate is greater than the length of the second base of the first trapezoid close to the substrate, and the plane is perpendicular to the substrate.

[0012] For example, according to an embodiment of the present disclosure, the angle between at least a portion of at least one side of the first trapezoid and the second base is 110 to 150 degrees.

[0013] For example, according to an embodiment of this disclosure, the thickness of the defined structure is 300 to 550 angstroms.

[0014] For example, according to embodiments of this disclosure, the display substrate further includes a first insulating layer located between the defining structure and the substrate. In at least a portion of the first region, the first insulating layer is in contact with the surface of the defining structure facing the substrate, the first insulating layer is located between the first electrode and the substrate, and the material of the first insulating layer includes an organic material.

[0015] For example, according to an embodiment of the present disclosure, the first insulating layer includes a protrusion that contacts the surface of the defined structure, and the first orthographic projection is entirely within the orthographic projection of the protrusion on the substrate.

[0016] For example, according to an embodiment of the present disclosure, the distance between the edge of the protrusion and the orthographic projection of the edge of the defining structure on the side of the substrate away from the substrate on the substrate is less than 0.5 micrometers.

[0017] For example, according to an embodiment of this disclosure, the surface of the first electrode is in contact with the surface of the first insulating layer, and the distance between the surface of the first electrode away from the substrate and the substrate is less than the distance between the surface of the defining structure away from the substrate and the substrate.

[0018] For example, according to embodiments of this disclosure, the display substrate further includes: a pixel defining pattern located on the side of the first electrode away from the substrate, the pixel defining pattern at least located in the first region including a plurality of first openings, one sub-pixel corresponding to at least one first opening, the light-emitting element of the sub-pixel being at least partially located in the first opening corresponding to the sub-pixel, and the first opening being configured to expose the first electrode. The pixel defining pattern further includes a second opening, at least partially of the defining structure being exposed by the second opening.

[0019] For example, according to an embodiment of the present disclosure, at least one layer of the light-emitting functional layer is broken at at least a portion of the edge of the defining structure exposed by the second opening, and the second electrode is continuously disposed at that edge of the defining structure.

[0020] For example, according to an embodiment of the present disclosure, at least one film layer of the light-emitting functional layer includes a charge-generating layer. The light-emitting functional layer includes a first light-emitting layer, the charge-generating layer, and a second light-emitting layer stacked together. The charge-generating layer is located between the first light-emitting layer and the second light-emitting layer, and the charge-generating layer is broken at the edge of the defined structure.

[0021] For example, according to embodiments of this disclosure, the plurality of sub-pixels includes a plurality of first color sub-pixels, a plurality of second color sub-pixels, and a plurality of third color sub-pixels, and the defining structure includes a plurality of first annular defining structures surrounding at least one of the plurality of first color sub-pixels, the plurality of second color sub-pixels, and the plurality of third color sub-pixels.

[0022] For example, according to embodiments of this disclosure, each sub-pixel in at least some of the sub-pixels further includes a pixel circuit, a first electrode of the light-emitting element of at least one sub-pixel includes a main electrode and a connecting electrode, the main electrode overlaps with the light-emitting area of ​​the light-emitting element in a direction perpendicular to the substrate, and the connecting electrode does not overlap with the light-emitting area of ​​the light-emitting element, the pixel circuit is electrically connected to the connecting electrode, and the first annular defining structure surrounding the at least one sub-pixel includes a notch, and the first annular defining structure does not overlap with the connecting electrode in a direction perpendicular to the substrate.

[0023] For example, according to an embodiment of this disclosure, the display substrate further includes: a second insulating layer located between the defining structure and the substrate. The substrate further includes a second region, with the first region located around the periphery of the second region; the second insulating layer includes at least one annular insulating portion surrounding the second region, and the defining structure further includes a second annular defining structure in contact with the surface of the annular insulating portion away from the substrate, the second insulating layer being located on the side of the first insulating layer facing the substrate, the material of the second insulating layer including an inorganic non-metallic material, and the material of the second insulating layer being different from the material of the defining structure, the light-emitting functional layer and the second electrode both being disconnected at the edge of the second annular defining structure.

[0024] For example, according to an embodiment of the present disclosure, the cross-section of the second annular defining structure includes a second trapezoid, wherein the length of the base of the second trapezoid away from the substrate is greater than the length of the base of the second trapezoid close to the substrate.

[0025] For example, according to an embodiment of the present disclosure, the orthographic projection of the second annular defining structure on the substrate lies within the orthographic projection of the annular insulating portion on the substrate.

[0026] For example, according to an embodiment of the present disclosure, the ratio of the dimension of the first trapezoid in the direction perpendicular to the substrate to the dimension of the second trapezoid in the direction perpendicular to the substrate is 0.8 to 1.2, and the ratio of the angle between the waist of the first trapezoid and the second base to the angle between the waist of the second trapezoid and the base of the second trapezoid closer to the substrate is 0.8 to 1.2.

[0027] Another embodiment of this disclosure provides a display substrate, including a substrate and a plurality of sub-pixels located on the substrate. The substrate includes at least a first region; the plurality of sub-pixels are located in the first region on the substrate, and each sub-pixel, at least some of which includes a light-emitting element, includes a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer includes a plurality of film layers. The display substrate further includes a defining structure, with at least one defining structure disposed between at least two adjacent sub-pixels. The plurality of sub-pixels includes a first sub-pixel, a second sub-pixel, and a third sub-pixel. The second sub-pixel and the third sub-pixel are both adjacent to the first sub-pixel. The maximum dimension of the defining structure disposed between the first sub-pixel and the second sub-pixel in the arrangement direction of the two sub-pixels is a first dimension, and the maximum dimension of the defining structure disposed between the first sub-pixel and the third sub-pixel in the arrangement direction of the two sub-pixels is a second dimension. The first dimension and the second dimension are different.

[0028] For example, according to an embodiment of this disclosure, the plurality of sub-pixels are arranged in an array along a first direction and a second direction, and some of the sub-pixels are arranged in an array along a third direction and a fourth direction, wherein the first direction is perpendicular to the second direction, the third direction is perpendicular to the fourth direction, and the first direction intersects the third direction; the maximum size of the defining structure between two adjacent sub-pixels arranged along the first direction or the second direction in the arrangement direction of the two sub-pixels is a third size, and the maximum size of the defining structure between two adjacent sub-pixels arranged along the third direction or the fourth direction in the arrangement direction of the two sub-pixels is a fourth size, wherein the third size is smaller than the fourth size.

[0029] For example, according to an embodiment of this disclosure, the plurality of sub-pixels includes a plurality of green sub-pixels, a plurality of blue sub-pixels, and a plurality of red sub-pixels, wherein the maximum size of the limiting structure disposed between two adjacent green sub-pixels in the arrangement direction of the two green sub-pixels is greater than the maximum size of the limiting structure disposed between other adjacent sub-pixels in the arrangement direction of the adjacent sub-pixels.

[0030] For example, according to embodiments of this disclosure, each sub-pixel in at least a portion of the sub-pixels further includes a pixel circuit, and the first electrode of the light-emitting element of at least one sub-pixel includes a main electrode and a connecting electrode. In a direction perpendicular to the substrate, the main electrode overlaps with the light-emitting area of ​​the light-emitting element, and the connecting electrode does not overlap with the light-emitting area of ​​the light-emitting element. The pixel circuit is electrically connected to the connecting electrode. In at least a portion of the first region, at least one of the light-emitting functional layers is disconnected at the edge of the defined structure, and the second electrode is at least partially continuous at the position where it overlaps with the connecting electrode.

[0031] For example, according to an embodiment of the present disclosure, in a direction perpendicular to the substrate, the defining structure does not overlap with at least a portion of the connecting electrode.

[0032] For example, according to embodiments of this disclosure, the second electrode in at least a portion of the sub-pixels includes a planar structure or a mesh structure.

[0033] Another embodiment of this disclosure provides a display device including any of the above-described display substrates.

[0034] Another embodiment of this disclosure provides a method for manufacturing a display substrate, comprising: providing a substrate; forming an inorganic non-metallic material layer on the substrate; forming a shielding structure on a side of the inorganic non-metallic material layer away from the substrate; using the shielding structure as a mask, etching the inorganic non-metallic material layer with a first gas to form a defined pattern; using the shielding structure as a mask, etching the defined pattern with a second gas to form a defined structure; and forming a plurality of sub-pixels in at least a first region of the substrate. At least one defining structure is provided between at least two adjacent sub-pixels. Each sub-pixel in at least a portion of the sub-pixels includes a light-emitting element. Forming the light-emitting element includes sequentially forming a first electrode, a light-emitting functional layer, and a second electrode in a direction perpendicular to the substrate. The first electrode is located between the second electrode and the substrate. The light-emitting functional layer includes multiple film layers. The first orthographic projection of the surface of the defining structure located between adjacent sub-pixels on the substrate near the substrate is completely located within the second orthographic projection of the surface of the defining structure on the substrate away from the substrate. Along the light-emitting region arrangement direction of the adjacent sub-pixels, the maximum size of the second orthographic projection is greater than the maximum size of the first orthographic projection. In at least a portion of the first region, at least one layer of the light-emitting functional layer is broken at the edge of the defining structure, and the second electrode is continuously disposed at the edge of the defining structure.

[0035] For example, according to an embodiment of this disclosure, the cross-sectional shape of the defined pattern cut by the plane containing the center line includes a rectangle, and the cross-sectional shape of the defined structure cut by the plane includes a first trapezoid, wherein the length of the base of the first trapezoid away from the substrate is greater than the length of the base of the first trapezoid close to the substrate, and the plane is perpendicular to the substrate.

[0036] For example, according to an embodiment of this disclosure, after forming the defined structure, the manufacturing method further includes: removing the obstructing structure.

[0037] For example, according to an embodiment of this disclosure, before forming the inorganic non-metallic material layer, the fabrication method further includes: forming a first insulating layer on the substrate, wherein, in a portion of the first region, the inorganic non-metallic material layer is formed on the surface of the first insulating layer; before forming the first insulating layer, the fabrication method further includes: forming a second insulating layer on the substrate, wherein, in another portion of the first region, the inorganic non-metallic material layer is formed on the surface of the second insulating layer; etching the inorganic non-metallic material layer with a first gas to form a defined pattern includes simultaneously etching the inorganic non-metallic material layer on the first insulating layer and the inorganic non-metallic material layer on the second insulating layer to form the defined pattern; etching the defined pattern with a second gas to form the defined structure includes simultaneously etching the defined pattern on the first insulating layer and the defined pattern on the second insulating layer to form the defined structure. Attached Figure Description

[0038] To more clearly illustrate the technical solutions of the embodiments of this disclosure, the accompanying drawings of the embodiments will be briefly described below. Obviously, the drawings described below only relate to some embodiments of this disclosure and are not intended to limit this disclosure.

[0039] Figure 1 This is a plan view of a display substrate provided according to an embodiment of the present disclosure.

[0040] Figure 2 for Figure 1 A schematic diagram of the sub-pixels and the defined structure of the local region A11 shown.

[0041] Figure 3 For along Figure 2 A schematic diagram of the partial cross-sectional structure cut by BB' is shown.

[0042] Figure 4A for Figure 3 An enlarged view of region C shown.

[0043] Figure 4B For different examples Figure 3An enlarged view of region C shown.

[0044] Figure 5 This is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure.

[0045] Figure 6 and Figure 7A This is a partial planar structure schematic diagram of a display substrate provided according to different examples of embodiments of the present disclosure.

[0046] Figure 7B This is a plan view of the second electrode covering defined structure provided according to an embodiment of the present disclosure.

[0047] Figure 8 For along Figure 2 A schematic diagram of the local cross-section structure intercepted by line DD'.

[0048] Figure 9A For along Figure 1 A schematic diagram of the local cross-section structure intercepted by line EE'.

[0049] Figure 9B This is a schematic diagram of a partial cross-sectional structure of a first region near a second region, provided as an example of an embodiment of this disclosure.

[0050] Figure 10 This is a schematic block diagram of a display device provided according to another embodiment of the present disclosure.

[0051] Figures 11A to 11E This is a schematic process flow diagram illustrating a method for manufacturing a portion of a display substrate according to an embodiment of the present disclosure.

[0052] Figures 12A to 12C This is a schematic process flow diagram illustrating a method for fabricating another region of a display substrate according to an embodiment of the present disclosure. Detailed Implementation

[0053] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. Based on the described embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

[0054] Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that an element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects.

[0055] The features such as "parallel," "perpendicular," and "identical" used in the embodiments of this disclosure include features in the strict sense of "parallel," "perpendicular," and "identical," as well as cases where "approximately parallel," "approximately perpendicular," and "approximately identical" include a certain degree of error. Taking into account measurement and errors associated with the measurement of a specific quantity (e.g., limitations of the measurement system), they represent the acceptable deviation range for a specific value as determined by a person skilled in the art. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of said value. Unless otherwise specified in the following embodiments of this disclosure, the quantity of a component is implied to mean that the component can be one or more, or can be understood as at least one. "At least one" means one or more, and "more" means at least two.

[0056] In their research, the inventors of this application discovered that the light-emitting functional layer of a light-emitting element may include multiple layers of light-emitting layers stacked together. At least two of these layers have a charge generation layer (CGL) between them. The charge generation layer has a high conductivity. When the charge generation layer is a continuous film layer, the charge generation layers of adjacent light-emitting elements are continuous, which can easily cause crosstalk between adjacent sub-pixels, leading to color shift in the display substrate. For example, the charge generation layer can easily cause crosstalk between sub-pixels of different colors at low brightness, resulting in low grayscale color shift.

[0057] This disclosure provides a display substrate, a method for manufacturing the same, and a display device. The display substrate includes a substrate and a plurality of sub-pixels located on the substrate. The substrate includes at least a first region; the plurality of sub-pixels are located in the first region, and each sub-pixel, at least a portion of which includes a light-emitting element, comprises a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer comprises a plurality of film layers. The display substrate also includes a defining structure, wherein at least one defining structure is disposed between at least two adjacent sub-pixels. The first orthographic projection of the surface of the defining structure located between adjacent sub-pixels on the substrate, which is closer to the substrate, is completely located within the second orthographic projection of the surface of the defining structure on the substrate, which is farther from the substrate. Along the light-emitting region arrangement direction of the adjacent sub-pixels, the maximum size of the second orthographic projection is greater than the maximum size of the first orthographic projection, and the defining structure comprises an inorganic non-metallic material. In at least a portion of the first region, at least one layer of the light-emitting functional layer is broken at the edge of the defining structure, and at least a portion of the second electrodes of the adjacent sub-pixels are continuously disposed. The limited structure provided in the display substrate of this disclosure isolates at least one layer of the light-emitting functional layer while realizing the continuous arrangement of the second electrode. This can reduce crosstalk between adjacent sub-pixels and avoid brightness uniformity problems caused by large-area breakage of the second electrode.

[0058] This disclosure provides a display substrate, which includes a substrate and a plurality of sub-pixels located on the substrate. The substrate includes at least a first region; the plurality of sub-pixels are located in the first region on the substrate, and each sub-pixel, at least a portion of which includes a light-emitting element. The light-emitting element includes a light-emitting functional layer and a first electrode and a second electrode located on opposite sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate. The light-emitting functional layer includes a plurality of film layers. The display substrate further includes a defining structure, with at least one defining structure disposed between at least two adjacent sub-pixels. The plurality of sub-pixels includes a first sub-pixel, a second sub-pixel, and a third sub-pixel. The second sub-pixel and the third sub-pixel are both adjacent to the first sub-pixel. The maximum dimension of the defining structure disposed between the first sub-pixel and the second sub-pixel in the arrangement direction of the two sub-pixels is a first dimension, and the maximum dimension of the defining structure disposed between the first sub-pixel and the third sub-pixel in the arrangement direction of the two sub-pixels is a second dimension. The first dimension and the second dimension are different. The embodiments disclosed herein can improve the matching between the limiting structure and the sub-pixel arrangement by setting the size of the limiting structure set between different adjacent sub-pixels, thereby improving the conduction effect of the second electrode.

[0059] The display substrate, its manufacturing method, and display device provided in the embodiments of this disclosure are described below with reference to the accompanying drawings.

[0060] Figure 1 This is a plan view of a display substrate provided according to an embodiment of the present disclosure. Figure 2 for Figure 1 A schematic diagram of the sub-pixels and the limiting structure of the local region A11 shown. Figure 3 For along Figure 2 A schematic diagram of the partial cross-sectional structure cut by BB' is shown. Figures 1 to 3 As shown, the display substrate includes a substrate 01, and the substrate 01 includes at least a first region A1.

[0061] like Figures 1 to 3 As shown, the display substrate includes a plurality of sub-pixels 10 located on a substrate 01, and the plurality of sub-pixels 10 are located in a first region A1. At least some of the sub-pixels 10 include a light-emitting element 100. The light-emitting element 100 includes a light-emitting functional layer 130 and a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 along a direction perpendicular to the substrate 01. The first electrode 110 is located between the light-emitting functional layer 130 and the substrate 01. The light-emitting functional layer 130 includes a plurality of film layers. For example, the light-emitting functional layer 130 includes a charge-generating layer 133. For example, the light-emitting element 100 can be an organic light-emitting element. For example, each sub-pixel located in the display area includes a light-emitting element.

[0062] like Figures 1 to 3 As shown, the display substrate also includes a defining structure 300. At least one defining structure 300 is disposed between at least two adjacent sub-pixels 10. The first orthographic projection 301 of the surface of the defining structure 300 located between adjacent sub-pixels 10 on the substrate 01 is completely located within the second orthographic projection 302 of the surface of the defining structure 300 located away from the substrate 01 on the substrate 01. Along the light-emitting area arrangement direction of the adjacent sub-pixels 10, the maximum size S2 of the second orthographic projection 302 is greater than the maximum size S1 of the first orthographic projection 301. The light-emitting area arrangement direction of the adjacent sub-pixels can be a direction parallel to the center line connecting the sub-pixels 10, such as... Figure 2 The direction shown is either V, U, X, or Z. For example, a limiting structure 300 is set between any two adjacent sub-pixels 10.

[0063] like Figures 1 to 3 As shown, the defined structure 300 includes an inorganic non-metallic material. For example, the material defining the structure 300 may include any one or more of silicon oxide (SiOx), silicon nitride (SiNx), and silicon oxynitride (SiON).

[0064] like Figures 1 to 3 As shown, in at least a portion of the first region A1, at least one of the light-emitting functional layers 130 is broken at the edge of the defining structure 300, and the second electrode 120 is continuously disposed at the edge of the defining structure 300.

[0065] The edge of the limiting structure provided in the display substrate of this disclosure blocks at least one layer of the light-emitting functional layer. The continuous arrangement of the second electrode at the edge of the limiting structure can reduce crosstalk between adjacent sub-pixels and avoid brightness uniformity problems caused by large-area breakage of the second electrode. For example, if the second electrode in the display area is blocked by a large area, it will cause the VSS signal voltage drop to increase, resulting in brightness uniformity problems.

[0066] The aforementioned defining structure may refer to a structure used to define the distribution of at least one film layer of the light-emitting functional layer, for example, at least one film layer defining the light-emitting functional layer is broken at its edge, and the second electrode is continuously disposed at the edge.

[0067] In any embodiment of this disclosure, "adjacent sub-pixels" refers to two sub-pixels 10 where no other sub-pixels 10 are set between them.

[0068] For example, such as Figure 3 As shown, the light-emitting functional layer 130 may include a first light-emitting layer (EML) 131, a charge-generating layer (CGL) 133, and a second light-emitting layer (EML) 132 stacked together, with the charge-generating layer 133 located between the first light-emitting layer 131 and the second light-emitting layer 132. The charge-generating layer has strong conductivity, which enables the light-emitting functional layer to have advantages such as long lifespan, low power consumption, and high brightness. For example, compared to a light-emitting functional layer without a charge-generating layer, a sub-pixel can nearly double its brightness by incorporating a charge-generating layer within the light-emitting functional layer.

[0069] For example, the light-emitting elements 100 of the same sub-pixel 10 can be tandem light-emitting elements, such as TandemOLED.

[0070] For example, the charge generation layer 133 may include an N-type charge generation layer and a P-type charge generation layer.

[0071] For example, in each sub-pixel 10, the light-emitting functional layer 130 may also include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).

[0072] For example, the hole injection layer, hole transport layer, electron transport layer, electron injection layer, and charge generation layer 133 are all shared film layers of multiple sub-pixels 10, and can be referred to as common layers. For example, at least one film layer in the light-emitting functional layer 130 that is broken at the edge of the defining structure 300 can be at least one of the aforementioned common layers. By breaking at least one of the aforementioned common layers at the edge of the defining structure 300 located between adjacent sub-pixels, it is beneficial to reduce the probability of crosstalk between adjacent sub-pixels. For example, the aforementioned common layer and the second electrode can be film layers formed using an open mask.

[0073] For example, the second light-emitting layer 132 can be located between the first light-emitting layer 131 and the second electrode 120, and the hole injection layer can be located between the first electrode 110 and the first light-emitting layer 131. For example, an electron transport layer can also be disposed between the charge generation layer 133 and the first light-emitting layer 131. For example, a hole transport layer can be disposed between the second light-emitting layer 132 and the charge generation layer 133. For example, an electron transport layer and an electron injection layer can be disposed between the second light-emitting layer 132 and the second electrode 120.

[0074] For example, in the same sub-pixel 10, the first light-emitting layer 131 and the second light-emitting layer 132 can be light-emitting layers that emit the same color of light. For example, in a sub-pixel 10 that emits different colors of light, the first light-emitting layer 131 emits different colors of light. For example, in a sub-pixel 10 that emits different colors of light, the second light-emitting layer 132 emits different colors of light. Of course, the embodiments disclosed herein are not limited to this. For example, in the same sub-pixel 10, the first light-emitting layer 131 and the second light-emitting layer 132 can be light-emitting layers that emit different colors of light. By setting light-emitting layers that emit different colors of light in the same sub-pixel 10, the light emitted by the multiple light-emitting layers included in the sub-pixel 10 can be mixed into white light, and the color of the light emitted by each sub-pixel can be adjusted by setting a color filter layer.

[0075] For example, such as Figures 1 to 3 As shown, the first light-emitting layers 131 of adjacent sub-pixels 10 can overlap on the defining structure 300. For example, the second light-emitting layers 132 of adjacent sub-pixels 10 can overlap on the defining structure 300. However, this is not the only possibility. For example, the first light-emitting layers 131 of adjacent sub-pixels 10 can be spaced apart on the defining structure 300, and the second light-emitting layers 132 of adjacent sub-pixels 10 can be spaced apart on the defining structure 300; or, the defining structure 300 may only have the first light-emitting layer 131 of one of the adjacent sub-pixels 10, and the defining structure 300 may only have the second light-emitting layer 132 of one of the adjacent sub-pixels 10.

[0076] For example, in adjacent sub-pixels 10, the light-emitting layers located on the same side of the charge generation layer 133 can be spaced apart from each other, or they can overlap or connect at the interval between two sub-pixels 10. This disclosure does not limit this.

[0077] For example, the materials of the electron transport layer may include aromatic heterocyclic compounds, such as imidazole derivatives, imidazopyridine derivatives, benzimidazolephenanthridine derivatives, and other imidazole derivatives; pyrimidine derivatives, triazine derivatives, and other azine derivatives; quinoline derivatives, isoquinoline derivatives, phenanthreneroline derivatives, and other compounds containing a nitrogen-containing six-membered ring structure (including compounds with phosphine oxide substituents on the heterocycle), etc.

[0078] For example, the material of the charge generation layer 133 can be a material containing phospho groups or a material containing triazine.

[0079] For example, the ratio of the electron mobility of the charge generation layer 133 to the electron mobility of the electron transport layer is 10. -2 ~10 2 .

[0080] For example, such as Figure 3 As shown, at least one of the light-emitting functional layers 130 can be a charge-generating layer 133. The first orthographic projection of the charge-generating layer 133 on the substrate 01 is continuous, while the second orthographic projection of the charge-generating layer on a plane perpendicular to the substrate 01 is discontinuous. For example, the charge-generating layer 133 may include a portion located on the defining structure 300 and a portion not located on the defining structure 300, with these two portions disconnected at the edge of the defining structure 300. For example, the first orthographic projections of these two portions on the substrate 01 may be adjacent or overlap, and the first orthographic projection of the charge-generating layer is continuous. For example, if the distances between these two portions and the substrate 01 are different, then the second orthographic projections of these two portions on a plane perpendicular to the substrate (the plane containing the BB' line and the Y direction) are discontinuous.

[0081] For example, such as Figure 3 As shown, the light-emitting functional layer 130 includes at least one light-emitting layer. The film layers in the light-emitting functional layer 130 that are broken at the defining structure 300 include at least one light-emitting layer and at least one other film layer. The area of ​​the orthogonal projection of the broken at least one other film layer on the substrate 01 is greater than the area of ​​the orthogonal projection of the broken at least one light-emitting layer on the substrate 01. Alternatively, the area of ​​the portion of the defining structure 300 covered by the broken at least one other film layer is greater than the area of ​​the portion of the defining structure 300 covered by the broken at least one light-emitting layer.

[0082] For example, such as Figure 3As shown, the second electrode 120 in the plurality of sub-pixels 10 can be a common electrode shared by the plurality of sub-pixels 10. When there is no limiting structure 300 between two adjacent sub-pixels 10, the second electrode 120 is a whole film layer.

[0083] For example, such as Figure 3 As shown, at least one of the multiple films included in the second electrode 120 and the light-emitting functional layer 130 overlaps with the orthographic projection of the defining structure 300 on the substrate 01.

[0084] For example, at least a portion of at least one of the multiple film layers included in the light-emitting functional layer 130 covers a portion of the side surface defining the structure 300.

[0085] For example, the thickness of the portion where the second electrode 120 and the defining structure 300 overlap in the direction perpendicular to the substrate 01 is less than the thickness of at least the portion where the second electrode 120 and the defining structure 300 do not overlap, and the thickness of the portion where the charge generating layer 133 and the defining structure 300 overlap in the direction perpendicular to the substrate 01 is less than the thickness of at least the portion where the charge generating layer 133 and the defining structure 300 do not overlap.

[0086] For example, the thickness of the portion of the second electrode 120 located at the center of the defining structure 300 is greater than the thickness of the portion of the second electrode 200 located at the edge of the defining structure 300, and the thickness of the portion of the charge generating layer 133 located at the center of the defining structure 300 is greater than the thickness of the portion of the charge generating layer 133 located at the edge of the defining structure 300. For example, the thickness of the middle portion of the second electrode 120 located on the defining structure 300 is greater than the thickness of the edge. For example, the thickness of the middle portion of the charge generating layer 133 located on the defining structure 300 is greater than the thickness of the edge.

[0087] For example, Figure 3 The illustration schematically shows that all the films included in the light-emitting functional layer 130 are disconnected at the edge of the defining structure 300, while the second electrode 120 is not disconnected at the edge of the defining structure 300. However, this is not a limitation. In other examples, the thickness of the defining structure can be set such that a portion of the films in the light-emitting functional layer near the substrate is disconnected at the edge of the defining structure, while a portion of the films in the light-emitting functional layer away from the substrate is not disconnected at the edge of the defining structure. For example, the film layer of the charge-generating layer away from the substrate is not disconnected, the charge-generating layer and its film layer near the substrate are disconnected, and the second electrode is not disconnected at the edge of the defining structure.

[0088] For example, the first electrode 110 can be an anode, and the second electrode 120 can be a cathode. For example, the cathode can be formed of a material with high conductivity and low work function; for example, the cathode can be made of a metallic material. For example, the anode can be formed of a transparent conductive material with a high work function.

[0089] For example, such as Figure 2 As shown, the shapes of the first orthographic projection 301 and the second orthographic projection 302 can be identical. For example, along a direction parallel to line BB', the ratio of the distance between a first edge on one side of the first orthographic projection 301 and a second edge in the second orthographic projection 302 that is closer to the first edge to that first edge to the second edge in the second orthographic projection 302 that is closer to the first edge to that first edge to the first edge on the other side of the first orthographic projection 301 can be 0.7 to 1.5. For example, the ratio of the distances between the two first edges and the corresponding two second edges can be 0.8 to 1.3. For example, the ratio of the distances between the two first edges and the corresponding two second edges can be 0.9 to 1.4. For example, the ratio of the distances between the two first edges and the corresponding two second edges can be 0.95 to 1.2. For example, the ratio of the distances between the two first edges and the corresponding two second edges can be 1 to 1.1.

[0090] In some examples, such as Figure 3 As shown, the cross-sectional shape of the defined structure 300 cut by the plane containing the center line includes a first trapezoid 310. The length of the first base 311 of the first trapezoid 310 away from the substrate 01 is greater than the length of the second base 312 of the first trapezoid 310 close to the substrate 01. This plane is perpendicular to the substrate 01. For example, it can be... Figure 3 The VY plane is shown. However, it is not limited to this; the plane can also be a UY plane, an XY plane, etc.

[0091] In some examples, such as Figure 3 As shown, the thickness of the defined structure 300 is 300–550 angstroms. For example, the thickness of the defined structure 300 is 320–530 angstroms. For example, the thickness of the defined structure 300 is 350–400 angstroms. For example, the thickness of the defined structure 300 is 330–420 angstroms. For example, the thickness of the defined structure 300 is 360–450 angstroms. For example, the thickness of the defined structure 300 is 380–500 angstroms. For example, the thickness of the defined structure 300 is 480–520 angstroms.

[0092] For example, such as Figure 3 As shown, along the direction perpendicular to the substrate 01, the ratio of the thickness of the defined structure 300 to the thickness of the light-emitting functional layer 130 is 0.7 to 1.5. For example, the ratio of the thickness of the defined structure 300 to the thickness of the light-emitting functional layer 130 is 0.8 to 1.2. For example, the ratio of the thickness of the defined structure 300 to the thickness of the light-emitting functional layer 130 is 0.9 to 1.1.

[0093] In some examples, such as Figure 3As shown, the angle between the leg and the second base 312 of the first trapezoid 310 is 110–150 degrees. For example, the angle between the leg and the second base 312 of the first trapezoid 310 is 115–130 degrees. For example, the angle between the leg and the second base 312 of the first trapezoid 310 is 112–140 degrees. For example, the angle between the leg and the second base 312 of the first trapezoid 310 is 120–148 degrees. For example, the angle between the leg and the second base 312 of the first trapezoid 310 is 118–135 degrees. For example, the angle between the leg and the second base 312 of the first trapezoid 310 is 122–145 degrees. For example, the angle between the leg and the second base 312 of the first trapezoid 310 is 135–146 degrees.

[0094] For example, the ratio of the lengths of the two legs of the first trapezoid 310 is 0.9 to 1.1. For example, the two legs of the first trapezoid 310 are the same length.

[0095] For example, such as Figure 3 As shown, the first bottom edge 311 is the cross-section of the surface of the defining structure 300 away from the substrate 01, which is intercepted by the VY plane; the second bottom edge 312 is the cross-section of the surface of the defining structure 200 facing the substrate 01, which is intercepted by the VY plane; and the waist is the cross-section of the sidewall of the defining structure 300, which is intercepted by the VY plane. For example, the sidewall of the defining structure 300 is an inclined sidewall, which is inclined away from the center of the defining structure.

[0096] The first trapezoid in this embodiment includes a standard trapezoid and a generalized trapezoid. In the standard trapezoid, the leg, first base, and second base are all straight sides. In the generalized trapezoid, at least one of the leg, first base, and second base is a curved side. For example, when the leg of the first trapezoid is a curved side, the curved side can bend towards the midpoint of the first base or away from the midpoint of the first base. When the first trapezoid is a generalized trapezoid, the angle between the leg and the second base can be the angle between the line connecting the intersection of the leg and the second base and the intersection of the leg and the first base, and a straight line parallel to the substrate.

[0097] The display substrate provided in this disclosure sets the shape, thickness and sidewall tilt angle of the defined structure to achieve continuous arrangement of the second electrode while isolating at least one layer of the light-emitting functional layer. This is beneficial to reduce crosstalk between adjacent sub-pixels and avoid brightness uniformity problems caused by the breakage of the second electrode.

[0098] In some examples, such as Figure 3As shown, the display substrate further includes a first insulating layer 200 located between the defining structure 300 and the substrate 01. In at least a portion of the first region A1, the first insulating layer 200 is in contact with the surface of the defining structure 300 facing the substrate 01. The first insulating layer 200 is located between the first electrode 110 and the substrate 01. The material of the first insulating layer 200 includes an organic material.

[0099] For example, such as Figure 3 As shown, the first insulating layer 200 includes a planarization (PLN) layer.

[0100] Figure 4A for Figure 3 A magnified view of region C shown. In some examples, such as... Figure 3 and Figure 4A As shown, the first insulating layer 200 includes a protrusion 210 that contacts the surface of the defining structure 300, and the first orthographic projection of the defining structure 300 is completely located within the orthographic projection of the protrusion 210 on the substrate 01.

[0101] Figure 4B For different examples Figure 3 An enlarged view of region C shown. Figure 4B The defined structure 300 shown is... Figure 4A The difference in the defined structure 300 shown is that Figure 4B The edges of the defined structure 300 shown are rounded.

[0102] For example, such as Figure 3 and Figure 4A As shown, the protrusion 210 included in the first insulating layer 200 is only located below the defining structure 300, and no protrusion 210 is provided at other locations, such as the light-emitting area of ​​the light-emitting element, the first electrode of the light-emitting element, or the pixel defining portion (described later) of the pixel defining pattern.

[0103] For example, such as Figure 3 and Figure 4A As shown, the maximum dimension of the surface of the defining structure 300 near the substrate 01 in the direction parallel to the substrate 01 is smaller than the maximum dimension of the protrusion 210 in that direction. For example, the length of the second bottom edge 312 of the defining structure 300 is smaller than the dimension of the protrusion 210 in the direction parallel to the second bottom edge 312.

[0104] For example, such as Figure 3 and Figure 4AAs shown, the ratio of the dimensions of the two intervals between the two ends of the second bottom edge 312 and the two ends of the protrusion 210 can be 0.8 to 1.2, or 0.9 to 1.1, or 1. For example, the second bottom edge 312 can be located in the middle region of the protrusion 210.

[0105] In some examples, such as Figure 3 and Figure 4A As shown, the edge of the protrusion 210 is flush with the edge of the surface of the defining structure 300 on the side away from the substrate 01. For example, a straight line extending in a direction perpendicular to the substrate 01 passes through the edge of the protrusion 210 and the edge of the surface of the defining structure 300 on the side away from the substrate 01. For example, the second orthographic projection completely coincides with the orthographic projection of the protrusion 210 on the substrate 01.

[0106] For example, such as Figure 3 and Figure 4A As shown, the thickness of protrusion 210 can be 200 to 550 angstroms. For example, the thickness of protrusion 210 can be less than the thickness of the defining structure 300.

[0107] For example, such as Figure 3 and Figure 4A As shown, the light-emitting functional layer 113 covers the sidewall of the protrusion 210. For example, the light-emitting functional layer 113 covers the surface of the protrusion 210 away from the substrate 01.

[0108] For example, the process can be controlled during the formation of the defined structure 300 to minimize the thickness of the protrusion 210.

[0109] For example, such as Figure 3 and Figure 4A As shown, the shape of the cross section of the protrusion 210 cut by the VY plane perpendicular to the substrate 01 can be rectangular.

[0110] In some examples, such as Figure 3 As shown, the surface of the first electrode 110 is in contact with the surface of the first insulating layer 200, and the distance between the surface of the first electrode 110 away from the substrate 01 and the substrate 01 is less than the distance between the surface of the limiting structure 300 away from the substrate 01 and the substrate 01.

[0111] For example, such as Figure 3 As shown, the limiting structure 300 and the first electrode 110 are both located on the first insulating layer 200, and the limiting structure 300 and the first electrode 110 are spaced apart.

[0112] In some examples, such as Figures 1 to 3As shown, the display substrate also includes a pixel defining pattern 400 located on the side of the first electrode 110 away from the substrate 01. The pixel defining pattern 400, at least located in the first region A1, includes a plurality of first openings 410. Each sub-pixel 10 corresponds to at least one first opening 410. The light-emitting element 100 of the sub-pixel 10 is at least partially located in the first opening 410 corresponding to the sub-pixel 10, and the first opening 410 is configured to expose the first electrode 110. For example, the first opening 410 exposes a portion of the first electrode 110. For example, one sub-pixel 10 may correspond to one first opening 410.

[0113] For example, such as Figure 3 As shown, when the light-emitting functional layer 130 is formed in the first opening 410 of the pixel-defined pattern 400, the first electrode 110 and the second electrode 120 located on both sides of the light-emitting functional layer 130 can drive the light-emitting functional layer 130 in the first opening 410 to emit light. For example, the light-emitting area mentioned above can refer to the area where the sub-pixel effectively emits light, and the shape of the light-emitting area refers to a two-dimensional shape. For example, the shape of the light-emitting area can be the same as the shape of the first opening 410 of the pixel-defined pattern 400.

[0114] For example, such as Figure 3 As shown, the pixel-defined pattern 400 includes a pixel-defined portion 401 surrounding the first opening 410. The material of the pixel-defined portion 401 may include polyimide, acrylic, or polyethylene terephthalate, etc.

[0115] In some examples, such as Figure 3 As shown, the pixel defining pattern 400 also includes a second opening 420, through which at least a portion of the defining structure 300 is exposed. For example, the defining structure 300 is located within the second opening 420, or the defining structure 300 is completely exposed by the second opening 420. For example, a gap is provided between the defining structure 300 and the pixel defining portion 401 of the pixel defining pattern 400.

[0116] In some examples, such as Figure 3 As shown, at least one layer of the light-emitting functional layer 130 is broken at at least a portion of the edge of the defining structure 300 exposed by the second opening 420, and the second electrode 120 is continuously disposed at that edge.

[0117] For example, such as Figure 3 As shown, along the V direction, the size of the first opening 410 can be smaller than the size of the second opening 420. However, it is not limited to this; the size of the second opening can be set according to product requirements.

[0118] For example, such as Figure 3 As shown, along the direction perpendicular to the substrate 01, the thickness of the defined structure 300 is less than the thickness of the pixel defined portion 401.

[0119] For example, such as Figure 3 and Figure 4A As shown, at least a portion of the protrusion 210 is located within the second opening 420. For example, the protrusion 210 is completely located within the second opening 420.

[0120] For example, a spacer may be provided on the side of the pixel-limiting portion 401 of the pixel-limiting pattern 400 away from the substrate 01, and the spacer is configured to support the vapor deposition mask for forming the light-emitting layer.

[0121] For example, Figures 3 to 4A The illustration shows a limiting structure 300 between adjacent sub-pixels 10, but it is not limited to this. Two or more limiting structures can be set between adjacent sub-pixels 10. The number of limiting structures can be set according to the distance between adjacent sub-pixels and the size of the limiting structures.

[0122] For example, a limiting structure 300 is provided between two adjacent sub-pixels 10, and the ratio of the distance between the limiting structure 300 and the light-emitting area of ​​the two sub-pixels 10 can be 0.8 to 1.1, or 0.9 to 1.

[0123] For example, spacers and thin-film encapsulation layers may be provided on the side of the pixel-defining pattern 400 away from the substrate 01. For example, a color filter layer may also be provided on the side of the pixel-defining pattern 400 away from the substrate 01.

[0124] Figure 5 This is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to another example of an embodiment of the present disclosure. Figure 5 The display substrate shown is Figures 3 to 4A The difference in the display substrate shown is that Figure 5 The second opening 420 shown exposes only a portion of the defining structure 300, and a portion of the defining structure 300 is covered by the pixel defining portion 401. The edge of the portion of the defining structure 300 exposed by the second opening 420 is used to disconnect at least one layer of the light-emitting functional layer 130, and the second electrode 120 is continuously disposed at the edge of the defining structure 300 exposed by the second opening 420.

[0125] For example, multiple defining structures can be provided between adjacent sub-pixels, at least one defining structure being exposed by a second opening, such as a portion of at least one defining structure being covered by a pixel defining portion.

[0126] In some examples, such as Figure 2As shown, the plurality of sub-pixels 10 include a plurality of first-color sub-pixels 101, a plurality of second-color sub-pixels 102, and a plurality of third-color sub-pixels 103. For example, one of the first-color sub-pixels 101 and the third-color sub-pixels 103 emits red light, and the other emits blue light; the second-color sub-pixels 102 emit green light. Figure 12 schematically shows that the first-color sub-pixels 101 emit red light, which is a red sub-pixel; the third-color sub-pixels 103 emit blue light, which is a blue sub-pixel; and the second-color sub-pixels 102 emit green light, which is a green sub-pixel.

[0127] For example, such as Figure 2 As shown, a plurality of first color sub-pixels 101 and a plurality of third color sub-pixels 103 are alternately arranged along the X and Z directions parallel to the substrate 01 to form a plurality of first pixel rows and a plurality of first pixel columns. A plurality of second color sub-pixels 102 are arrayed along the X and Z directions to form a plurality of second pixel rows and a plurality of second pixel columns. The plurality of first pixel rows and the plurality of second pixel rows are alternately arranged along the Z direction and staggered from each other in the X direction. The plurality of first pixel columns and the plurality of second pixel columns are alternately arranged along the X direction and staggered from each other in the Z direction.

[0128] In some examples, such as Figure 2 As shown, the limiting structure 300 includes a plurality of first annular limiting structures 320, which surround at least one sub-pixel 10 among a plurality of first color sub-pixels 101, a plurality of second color sub-pixels 102 and a plurality of third color sub-pixels 103.

[0129] For example, such as Figure 2 As shown, each of the at least one color sub-pixel 10 among the first color sub-pixel 101, the second color sub-pixel 102, and the third color sub-pixel 103 is surrounded by the first annular defining structure 320.

[0130] For example, such as Figure 2 As shown, sub-pixels 10 arranged along the V direction can share a portion of the first annular defining structure 320. For example, sub-pixels 10 arranged along the U direction can share a portion of the first annular defining structure 320.

[0131] For example, such as Figure 2 As shown, the two first annular defining structures 320 corresponding to two adjacent sub-pixels 10 arranged along the X direction can be an integrated structure or spaced apart. For example, the two first annular defining structures 320 corresponding to two adjacent sub-pixels 10 arranged along the Z direction can be an integrated structure or spaced apart.

[0132] For example, at least one first ring-shaped defining structure 320 may be a closed ring structure. For example, at least one first ring-shaped defining structure 320 may be a non-closed ring structure. For example, some of the first ring-shaped defining structures 320 may be closed ring structures, while other parts of the first ring-shaped defining structures 320 may be non-closed ring structures. For example, all the first ring-shaped defining structures 320 may be closed ring structures. For example, all the first ring-shaped defining structures 320 may be non-closed ring structures.

[0133] For example, a first annular defining structure 320 having a non-closed annular structure may include at least one notch 321. For example, the first annular defining structure 320 may include one notch 321, or two notches 321, or three notches 321. For example, different first annular defining structures 320 may include the same or different numbers of notches 321.

[0134] For example, such as Figure 2 As shown, at least a portion of the boundary of the defining structure 300 is substantially the same as the boundary contour of the light-emitting area of ​​the adjacent sub-pixel 10. For example, the boundary contour of the light-emitting area of ​​the sub-pixel 10 may include multiple straight edges, and / or curved edges connecting adjacent straight lines. The boundary contour of the defining structure 300 surrounding the light-emitting area may include straight edge contours corresponding to the straight edges of the light-emitting area, and / or curved edge contours corresponding to the curved edges.

[0135] Figure 6 and Figure 7A This is a partial planar structure schematic diagram of a display substrate provided according to different examples of embodiments of the present disclosure. Figure 6 and Figure 7A The display substrate shown is Figure 2 The differences in the display substrates shown lie in the shape of the limiting structure 300, such as different planar shapes and different widths. The planar shape, width, and opening of the first annular limiting structure can be flexibly set according to the size of the light-emitting area of ​​the sub-pixel and the distance between the light-emitting areas of adjacent sub-pixels.

[0136] For example, Figure 6 The distance between the defined structure 300 and the light-emitting area of ​​its adjacent sub-pixel 10 is different. Figure 2 The distance between the defined structure and the light-emitting area of ​​its adjacent sub-pixel 10. For example, Figure 6 The length of the upper base of the first trapezoidal section of the defined structure 300 shown is different from that of the upper base. Figure 2 The length of the upper base of the first trapezoidal section of the structure 300 shown.

[0137] For example, Figure 6The portion of the defined structure 300 located between adjacent sub-pixels 10 arranged along the X or Z direction has a larger size. For example, Figure 7A At least one first ring-shaped defining structure 320 shown is a closed ring.

[0138] For example, such as Figure 2 and Figure 6 As shown, in a direction perpendicular to the substrate 01, a portion of the first electrode 110 overlaps with a notch 321 of the first annular defining structure 320. For example, a first annular defining structure 320 includes at least two notches 321, and each notch 321 overlaps with the first electrode 110 of a different sub-pixel 10.

[0139] For example, the orthographic projection of a portion of the first electrode 110 onto the substrate is inserted into a notch in the orthographic projection of the first annular structure 320 onto the substrate. For example, in a direction perpendicular to the substrate, the first annular defining structure 320 does not overlap with the connecting electrode.

[0140] In a display substrate provided in this disclosure, by providing a notch in the first annular defining structure to avoid the first electrode, interference of the first annular defining structure with the position of the first electrode of the light-emitting element can be prevented.

[0141] For example, such as Figure 7A As shown, the edge of the limiting structure 300 is only used to disconnect at least a portion of the film layer of the light-emitting functional layer in the light-emitting element, without disconnecting the second electrode of the light-emitting element. Setting at least one first annular limiting structure 320 as a closed ring around the sub-pixel 10 is beneficial to completely disconnect the charge generation layer in different sub-pixels 10 to avoid crosstalk between adjacent sub-pixels, while achieving the continuity of the second electrode to improve display uniformity.

[0142] In the display substrate provided in this disclosure, by setting the position and size of the first annular limiting structure, a closed annular structure is adopted to avoid the first electrode, thereby reducing crosstalk between adjacent sub-pixels and avoiding brightness uniformity problems caused by the breakage of the second electrode.

[0143] In some examples, such as Figure 2 , Figure 3 , Figure 6 and Figure 7BAs shown, the second electrode 120 of at least one sub-pixel 10 and the second electrode 120 of the sub-pixel 10 adjacent to it in a first sub-direction (such as one of the row direction and column direction, such as one of the third direction and fourth direction) are continuously arranged, and the second electrode 120 of the at least one sub-pixel 10 and the second electrode 120 of the sub-pixel 10 adjacent to it in a second sub-direction (such as the other of the row direction and column direction, such as the other of the third direction and fourth direction) are disconnected, and the first sub-direction and the second sub-direction intersect.

[0144] In some examples, such as Figure 2 , Figure 3 , Figure 6 and Figure 7B As shown, the second electrode 120 of at least one sub-pixel 10 and the second electrode 120 of the sub-pixel 10 adjacent to it in the first sub-direction are continuously arranged, and the second electrode 120 of the at least one sub-pixel 10 and the second electrode 120 of the sub-pixel 10 adjacent to it in the second sub-direction are continuously arranged, and the first sub-direction and the second sub-direction intersect.

[0145] For example, such as Figure 2 , Figure 3 , Figure 6 and Figure 7B As shown, the second electrode 120 of any sub-pixel 10 can be continuously arranged with the second electrodes 120 of the sub-pixels 10 adjacent to it in any direction to improve the conductivity of the second electrode. For example, the second electrode 120 of any sub-pixel 10 can be continuously arranged with the second electrodes 120 of the sub-pixels 10 adjacent to it in at least one direction to at least ensure the conductivity of the second electrode of the sub-pixel.

[0146] In some examples, such as Figure 2 , Figure 3 , Figure 6 and Figure 7B As shown, the defined structure 300 surrounds more than 50% of the contour of at least one sub-pixel 10.

[0147] For example, the defined structure 300 surrounds more than 55% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 60% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 65% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 70% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 75% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 80% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 85% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 90% of the contour of at least one sub-pixel 10. For example, the defined structure 300 surrounds more than 95% of the contour of at least one sub-pixel 10.

[0148] In some examples, such as Figure 2 , Figure 3 , Figure 6 and Figure 7B As shown, the second electrode 120 of at least one sub-pixel 10 and the second electrode 120 of its adjacent sub-pixel 10 are continuously arranged, and the minimum width of the second electrode 120 between the two adjacent sub-pixels 10 in the direction perpendicular to their arrangement is greater than 1 micrometer. For example, the minimum width can be greater than 2 micrometers. For example, the minimum width can be greater than 3 micrometers. For example, the minimum width can be greater than 4 micrometers. For example, the minimum width can be greater than 5 micrometers. For example, the minimum width can be greater than 6 micrometers. For example, the minimum width can be greater than 7 micrometers. For example, the minimum width can be greater than 8 micrometers. For example, the minimum width can be greater than 9 micrometers. For example, the minimum width can be greater than 10 micrometers.

[0149] For example, such as Figure 6 As shown, the first dimension D1 is greater than 1 micrometer. For example, as... Figure 6 As shown, D5 is greater than 1 micrometer.

[0150] In some examples, such as Figure 2 , Figure 3 , Figure 6 and Figure 7B As shown, the orthographic projection of the center line connecting the two adjacent sub-pixels 10 onto the plane where the second electrode 120 is located is within the second electrode 120.

[0151] For example, the orthogonal projection of the aforementioned center line on the substrate is located within the orthogonal projection of the second electrode 120 on the substrate, and the second electrode 120 at the location of the aforementioned center line is continuously arranged.

[0152] In some examples, such as Figure 2 , Figure 6 and Figure 7B As shown, the outline of at least partially defining structure 300 is the same as the outline of the light-emitting area of ​​the sub-pixel 10 surrounded by the at least partially defining structure 300, and the ratio of the distance between the adjacent edges of the different defining structures 300 and the light-emitting areas of the sub-pixel 10 surrounded by the different defining structures 300 is 0.9 to 1.1. For example, the distance is the same.

[0153] For example, the spacing can be 7 to 10 micrometers. For example, the spacing can be 8 to 9 micrometers.

[0154] For example, the ratio of the distance between the light-emitting area of ​​a sub-pixel surrounded by the same defining structure and the adjacent edges of the defining structure at different locations is 0.9 to 1.1. Alternatively, the distance between the light-emitting area of ​​a sub-pixel surrounded by the same defining structure and the adjacent edges of the defining structure at different locations is equal.

[0155] Figure 8 For along Figure 2 A schematic diagram of the local cross-sectional structure intercepted by line DD' is shown. In some examples, such as... Figure 2 and Figure 8 As shown, each sub-pixel 10, at least in some of the sub-pixels 10, further includes a pixel circuit 140. The first electrode 110 of the light-emitting element 100 of at least one sub-pixel 10 includes a main electrode 111 and a connecting electrode 112. In a direction perpendicular to the substrate 01, the main electrode 111 overlaps with the light-emitting region 001 of the light-emitting element 100, while the connecting electrode 112 does not overlap with the light-emitting region 001 of the light-emitting element 100. For example, the orthographic projection of the light-emitting region 001 of the light-emitting element 100 onto the substrate 01 lies entirely within the orthographic projection of the main electrode 111 onto the substrate 01. For example, the shape of the main electrode 111 is substantially the same as the shape of the light-emitting region 001. For example, the main electrode 111 and the connecting electrode 112 in the same first electrode 110 are integrally formed. For example, the first electrode 110 of the light-emitting element 100 of each sub-pixel 10 includes a main electrode 111 and a connecting electrode 112.

[0156] In some examples, such as Figure 2 and Figure 8 As shown, the pixel circuit 140 is electrically connected to the connection electrode 112. For example, the first electrode 110 can be connected to one of the source and drain electrodes of the thin-film transistor in the pixel circuit 140 through a via penetrating a film layer such as the first insulating layer 200.

[0157] For example, such as Figure 8As shown, the pixel circuit may include multiple transistors and at least one capacitor. For example, the pixel circuit may include a light-emitting control transistor, such as an active layer 261, a gate 264, a source 262, and a drain 263, with the drain 263 electrically connected to the first electrode 110 of the light-emitting element 100. For example, the display substrate may also include gate insulating layers 02 and 03, an interlayer insulating layer 04, and a passivation layer 05. For example, the pixel circuit may also include a storage capacitor. For example, a gate insulating layer, an interlayer insulating layer, various film layers in the pixel circuit, data lines, gate lines, power signal lines, reset power signal lines, reset control signal lines, and light-emitting control signal lines may be disposed between the first insulating layer 200 and the substrate 01.

[0158] For example, the pixel circuit can be an 8T1C (i.e., eight transistors and one capacitor) structure, or a 7T1C structure, or a 7T2C structure, or a 6T1C structure, or a 6T2C structure, or a 9T2C structure, and the embodiments disclosed herein are not limited to this.

[0159] In some examples, such as Figure 2 and Figure 8 As shown, the first annular defining structure 320 surrounding at least one sub-pixel 10 includes a notch 321 that overlaps with the connecting electrode 112 in a direction perpendicular to the substrate 01. For example, in a direction perpendicular to the substrate 01, the notch 321 does not overlap with the main electrode 111.

[0160] In some examples, such as Figure 1 As shown, the substrate 01 further includes a second region A2, and a first region A1 is located around the second region A2. For example, the first region A1 surrounds at least a portion of the second region A2. Figure 1 The second region A2 shown is located at the top center of the substrate 01. For example, the four sides of the rectangular first region A1 can all surround the second region A2, meaning the second region A2 can be surrounded by the first region A1. Alternatively, the second region A2 may not be located at... Figure 1 The second region A2 is not located at the exact center of the top of the substrate 01 shown, but at other locations. For example, the second region A2 can be located at the upper left or upper right corner of the substrate 01. For example, the first region A1 can include a display area, and the second region A2 can be a display area or a non-display area, such as a hole area, where a photosensitive sensor or other necessary hardware structures can be installed. For example, the first region A1 can include a display area away from the second region A2 and a non-display area surrounding the second region A2. For example, the first annular defining structure is located in the display area.

[0161] For example, the shape of the second region A2 can be a circle or an ellipse. However, it is not limited to this; the shape of the second region A2 can be a polygon, such as a quadrilateral, hexagon, or octagon. For example, the shape of the first region A1 can be a quadrilateral, such as a rectangle. However, it is not limited to this; the shape of the first region A1 can also be a circle or other polygons besides quadrilaterals, such as hexagons or octagons.

[0162] Figure 9A For along Figure 1 A schematic diagram of a partial cross-sectional structure intercepted by line EE' is shown. In some examples, such as... Figure 1 , Figure 8 and Figure 9A As shown, the display substrate also includes a second insulating layer 500, located between the defining structure 300 and the substrate 01.

[0163] In some examples, such as Figure 1 , Figure 8 and Figure 9A As shown, the second insulating layer 500 is located on the side of the first insulating layer 200 facing the substrate 01. For example, in Figure 9A In areas other than the area shown, the second insulating layer 500 may be stacked with the first insulating layer 200. For example, Figure 9A The area shown does not have a first insulating layer 200. For example, Figure 9A The area shown is the non-display area included in the first area A1.

[0164] In some examples, such as Figure 1 , Figure 8 and Figure 9A As shown, the material of the second insulating layer 500 includes an inorganic non-metallic material, and the material of the second insulating layer 500 is different from the material of the defining structure 300. For example, the material of the defining structure 300 includes silicon nitride, while the material of the second insulating layer 500 includes silicon oxide.

[0165] In some examples, such as Figure 1 and Figure 9A As shown, the second insulating layer 500 includes at least one annular insulating portion 510 surrounding the second region A2, and the defining structure 300 also includes a second annular defining structure 330 that contacts the surface of the annular insulating portion 510 away from the substrate 01. The light-emitting functional layer 130 and the second electrode 120 are both disconnected at the edge of the second annular defining structure 330. Figure 1 The second annular defining structure 330 is shown only schematically; the annular insulating portion 510 is not shown. For example, no sub-pixels for displaying images are provided between the annular insulating portion and the edge of the second region A2.

[0166] For example, such as Figure 1As shown, the second annular defining structure 330 is located in the first region A1 and surrounds the second region A2. For example, the number of the second annular defining structures 330 can be three, but it is not limited to this. The number of the second annular defining structures can be one, two, four or more, which can be set according to product requirements.

[0167] The second region does not have a light-emitting element. By providing at least one second annular defining structure around the second region to disconnect the light-emitting functional layer and the second electrode, the light-emitting element located in the first region can be separated from the second region.

[0168] For example, the material of the second annular defining structure 330 includes inorganic non-metallic materials, such as silicon nitride.

[0169] Compared to the design of a typical display substrate where a metal isolation pillar is set around the hole area and the isolation pillar is electrically connected to the second electrode of the light-emitting element, the display substrate provided in this disclosure uses an inorganic material for the second annular limiting structure surrounding the second region. This second annular limiting structure is not electrically connected to the second electrode, which can avoid the problem of black spots (GDS) appearing in the display area around the hole area due to impurities generated during the manufacturing process affecting the signal of the second electrode through the second annular limiting structure after the second electrode is energized.

[0170] For example, at least a portion of the light-emitting functional layer 130 may cover the edge of the annular insulating portion 510. For example, at least a portion of the light-emitting functional layer 130 may cover at least a portion of the edge of the second annular defining structure 330.

[0171] For example, such as Figure 3 , Figure 7A as well as Figure 9A As shown, the ratio of the thickness of the first annular defining structure 320 to the thickness of the second annular defining structure 330 is 0.8 to 1.2. For example, the ratio is 0.9 to 1. For example, the ratio is 0.95 to 1.1. For example, the ratio is 0.85 to 1.

[0172] In some examples, such as Figure 1 and Figure 9A As shown, the orthographic projection of the second annular limiting structure 330 on the substrate 01 is located within the orthographic projection of the annular insulating portion 510 on the substrate 01.

[0173] For example, such as Figure 9AAs shown, the orthographic projection of the surface of the second annular defining structure 330 on the substrate side is completely within the orthographic projection of the surface of the second annular defining structure 330 on the substrate side away from the substrate.

[0174] In some examples, such as Figure 9A As shown, the cross-section of the second annular defining structure 330 includes a second trapezoid 340, and the length of the bottom edge 341 of the second trapezoid 340 away from the substrate is greater than the length of the bottom edge 342 of the second trapezoid 340 close to the substrate.

[0175] In some examples, such as Figure 3 , Figure 7A as well as Figure 9A As shown, the ratio of the dimension of the first trapezoid 310 in the direction perpendicular to the substrate 01 to the dimension of the second trapezoid 340 in the direction perpendicular to the substrate 01 is 0.8 to 1.2, and the ratio of the angle between the waist of the first trapezoid 310 and the second base 312 to the angle between the waist of the second trapezoid 340 and the base of the second trapezoid 340 on the side closer to the substrate 01 is 0.8 to 1.2.

[0176] For example, such as Figure 3 , Figure 7A as well as Figure 9A As shown, the ratio of the angle between the leg and the base 342 of the second trapezoid 340 to the angle between the leg and the second base 312 of the first trapezoid 310 can be 0.9 to 1. For example, the ratio of the angle between the leg and the base 342 of the second trapezoid 340 to the angle between the leg and the second base 312 of the first trapezoid 310 can be 0.95 to 1.1.

[0177] For example, such as Figure 9A As shown, the angle between the legs and the base 342 of the second trapezoid 340 is 110–150 degrees. For example, the angle between the legs and the base 342 of the second trapezoid 340 is 115–130 degrees. For example, the angle between the legs and the base 342 of the second trapezoid 340 is 112–140 degrees. For example, the angle between the legs and the base 342 of the second trapezoid 340 is 120–148 degrees. For example, the angle between the legs and the base 342 of the second trapezoid 340 is 118–135 degrees. For example, the angle between the legs and the base 342 of the second trapezoid 340 is 122–145 degrees. For example, the angle between the legs and the base 342 of the second trapezoid 340 is 135–146 degrees.

[0178] The second trapezoid in this embodiment includes a standard trapezoid and a general trapezoid. In the standard trapezoid, the legs and two bases are straight sides, while in the general trapezoid, at least one of the legs and two bases is a curved side. For example, when the legs of the second trapezoid are curved sides, the curved side can bend towards the midpoint of the base or away from the midpoint of the base.

[0179] For example, such as Figure 4A and Figure 9A As shown, the thickness of the annular insulating portion 510 is greater than the thickness of the protrusion 210. For example, the thickness of the annular insulating portion 510 is greater than the thickness of the second annular defining structure 320.

[0180] For example, such as Figure 2 , Figure 3 as well as Figure 9A As shown, the step difference between the second electrode 120 on the first annular limiting structure 320 and the second electrode 120 at a position outside the first annular limiting structure 320 is smaller than the step difference between the second electrode 120 on the second annular limiting structure 330 and the second electrode 120 at a position outside the second annular limiting structure 330. This allows the second electrode at the edge of the first annular limiting structure to be continuously set while the second electrode at the edge of the second annular limiting structure is disconnected.

[0181] For example, Figure 9A The illustration schematically shows that no second insulating layer 500 is provided between adjacent annular insulating portions 510, but it is not limited to this. A second insulating layer with a small thickness may also be provided between multiple annular insulating portions 510, and the multiple annular insulating portions 510 may be integrally formed. For example, Figure 9A In the region shown, the thickness of the second insulating layer 500 at the position where it overlaps with the second annular defining structure 320 is greater than the thickness of the second insulating layer 500 at the position where it does not overlap with the second annular defining structure 320, so that an annular insulating portion 510 is formed at the position where it overlaps with the second annular defining structure 320.

[0182] The display substrate provided in this embodiment can set the thickness and other parameters of the limiting structure at each position to be the same, while adjusting the thickness of the annular insulating portion to achieve continuous setting of the second electrode at the edge position of the first annular limiting structure, and disconnecting the second electrode at the edge position of the second annular limiting structure.

[0183] In the display substrate provided in this disclosure, the limiting structure located between adjacent sub-pixels and the limiting structure surrounding the second region are respectively disposed in a first insulating layer and a second insulating layer made of different materials. The second electrode can be disconnected from the edge of the limiting structure between adjacent sub-pixels while the second electrode is disconnected from the edge of the limiting structure surrounding the second region using the same process.

[0184] For example, such as Figure 1 and Figure 9A As shown, along the direction from the center of the second region A2 to the edge, the maximum size of the annular insulating portion 510 is greater than the maximum size of the second annular limiting structure 330.

[0185] For example, such as Figure 9A As shown, the orthographic projection of the second annular limiting structure 330 on the substrate is completely within the orthographic projection of the annular insulating portion 510 on the substrate.

[0186] For example, such as Figure 9A As shown, the cross-section of the annular insulating portion 510 can be rectangular, and the length of the side of the rectangle parallel to the substrate is greater than the length of the bottom side of the second trapezoid 340 away from the substrate. For example, the distance between adjacent annular insulating portions 510 is less than the distance between adjacent second annular defining structures 330. Of course, the embodiments disclosed herein are not limited to this; the cross-section of the annular insulating portion 510 can be trapezoidal, such as an upright trapezoid or an inverted trapezoid.

[0187] like Figures 1 to 8 As shown, this disclosure provides a display substrate, including a substrate 01 and a plurality of sub-pixels 10 located on the substrate 01. The substrate 01 includes at least a first region A1; the plurality of sub-pixels 10 are located on the first region A1 on the substrate 01, and each of at least some of the sub-pixels 10 includes a light-emitting element 100. The light-emitting element 100 includes a light-emitting functional layer 130 and a first electrode 110 and a second electrode 120 located on both sides of the light-emitting functional layer 130 along a direction perpendicular to the substrate 01. The first electrode 110 is located between the light-emitting functional layer 130 and the substrate 01, and the light-emitting functional layer 130 includes a plurality of film layers. The display substrate also includes a defining structure 300, and at least one defining structure 300 is disposed between at least two adjacent sub-pixels 10. The plurality of sub-pixels 10 includes a first sub-pixel, a second sub-pixel, and a third sub-pixel. For example, the first sub-pixel, the second sub-pixel, and the third sub-pixel can be three different color sub-pixels, such as a first color sub-pixel 101, a second color sub-pixel 102, and a third color sub-pixel 103, respectively. Taking the first sub-pixel as the first color sub-pixel 101, the second sub-pixel as the second color sub-pixel 102, and the third sub-pixel as the third color sub-pixel 103 as an example, the second sub-pixel 102 and the third sub-pixel 103 are both adjacent to the first sub-pixel 101.

[0188] like Figure 6As shown, both the second sub-pixel 102 and the third sub-pixel 103 are adjacent to the first sub-pixel 101. The maximum size of the limiting structure 300 between the first sub-pixel 101 and the second sub-pixel 102 in the arrangement direction of these two sub-pixels is a first size D1, and the maximum size of the limiting structure 300 between the first sub-pixel 101 and the third sub-pixel 103 in the arrangement direction of these two sub-pixels is a second size D2. The first size D1 and the second size D2 are different. For example, the arrangement direction of the first sub-pixel 101 and the second sub-pixel 102 can be the U direction or the V direction, and the arrangement direction of the first sub-pixel 101 and the third sub-pixel 103 can be the X direction or the Z direction. The phrase "both the second sub-pixel 102 and the third sub-pixel 103 are adjacent to the first sub-pixel 101" can mean that there are no other sub-pixels between the first sub-pixel and the second sub-pixel in their respective arrangement directions.

[0189] By adjusting the size of the limiting structure between different adjacent sub-pixels, the matching between the limiting structure and the sub-pixel arrangement can be improved, thereby enhancing the conductivity of the second electrode.

[0190] For example, such as Figure 6 As shown, the first size D1 is larger than the second size D2. Of course, the size relationship between the first and second sizes may change depending on the selection of different color sub-pixels based on the first, second, and third sub-pixels.

[0191] In some examples, such as Figure 6 As shown, a plurality of sub-pixels 10 are arranged in an array along a first direction and a second direction, and some of the sub-pixels 10 are arranged in an array along a third direction and a fourth direction. The first direction is perpendicular to the second direction, the third direction is perpendicular to the fourth direction, and the first direction and the third direction intersect. For example, in an embodiment of this disclosure, one of the first direction and the second direction is shown to be the U direction and the other is the V direction; one of the third direction and the fourth direction is the X direction and the other is the Z direction. For example, a plurality of second-color sub-pixels 102 are arranged in an array along the third direction and the fourth direction. For example, first-color sub-pixels 101 and third-color sub-pixels 103 are arranged alternately in the third direction and also alternately in the fourth direction, thereby arranging a plurality of first-color sub-pixels and a plurality of third-color sub-pixels in an array along the third direction and the fourth direction.

[0192] In some examples, such as Figure 6As shown, the maximum size of the limiting structure 300 between two adjacent sub-pixels 10 arranged along the first or second direction is the third size D3 in the arrangement direction of the two sub-pixels 10, and the maximum size of the limiting structure 300 between two adjacent sub-pixels 10 arranged along the third or fourth direction is the fourth size D4 in the arrangement direction of the two sub-pixels 10, where the third size D3 is smaller than the fourth size D4.

[0193] For example, such as Figure 6 As shown, the third dimension D3 can be the dimension of the limiting structure 300 set between two parallel sides of two adjacent sub-pixels 10 in the direction perpendicular to the side, and the fourth dimension D4 can be the dimension of the limiting structure 300 set between two opposite corners of two adjacent sub-pixels in the direction parallel to the line connecting the two corners.

[0194] In some examples, such as Figure 6 As shown, the multiple sub-pixels 10 include multiple green sub-pixels 102, multiple blue sub-pixels 103, and multiple red sub-pixels 101. The maximum size of the limiting structure 300 set between two adjacent green sub-pixels 102 in the arrangement direction of the two green sub-pixels 102 is greater than the maximum size of the limiting structure 300 set between other adjacent sub-pixels 10 in the arrangement direction of the adjacent sub-pixels 10.

[0195] For example, the maximum size of the limiting structure 300 between two adjacent green sub-pixels 102 in the arrangement direction of the two green sub-pixels 102 can be D5, and the maximum size of the limiting structure 300 between other adjacent sub-pixels 10 in the arrangement direction of the adjacent sub-pixels 10 can be D3 or D4. For example, the aforementioned other adjacent sub-pixels 10 can refer to adjacent red sub-pixels and green sub-pixels, adjacent blue sub-pixels and red sub-pixels, or adjacent blue sub-pixels and green sub-pixels.

[0196] In some examples, such as Figure 2 , Figure 6 and Figure 8 As shown, each sub-pixel 10 in at least a portion of the sub-pixels 10 further includes a pixel circuit 140. The first electrode 110 of the light-emitting element 100 of at least one sub-pixel 10 includes a main electrode 111 and a connecting electrode 112. In a direction perpendicular to the substrate, the main electrode 111 overlaps with the light-emitting area of ​​the light-emitting element 100, and the connecting electrode 112 does not overlap with the light-emitting area of ​​the light-emitting element 100. The pixel circuit 140 is electrically connected to the connecting electrode 112. In at least a portion of the first region A1, at least one of the light-emitting functional layers 130 is broken at the edge of the defining structure 300, and the second electrode 120 is at least partially continuous at the position where it overlaps with the connecting electrode 112.

[0197] For example, such as Figure 6 and Figure 8 As shown, the first electrode 110 is electrically connected to the pixel circuit 140 through an anode via 201 that penetrates the first insulating layer 200, and the second electrode 120 is continuously disposed at the location of the anode via 201.

[0198] In some examples, such as Figure 2 , Figure 6 and Figure 8 As shown, in the direction perpendicular to the substrate, at least a portion of the defining structure 300 does not overlap with the connecting electrode 112. For example, in the direction perpendicular to the substrate, the defining structure 300 does not overlap with the anode via 201.

[0199] In some examples, such as Figure 2 and Figure 6 As shown, at least some of the second electrodes 120 in the sub-pixels 10 include planar structures or mesh structures.

[0200] Figure 7B This is a plan view of the second electrode covering and defining structure provided according to an embodiment of the present disclosure. For example, the second electrode 120 is a transparent electrode. Figure 7B A pattern filled with semi-transparent material is used for illustration. For example, as shown... Figure 7B As shown, the second electrode 120 can be a planar structure covering multiple sub-pixels 10, meaning that multiple sub-pixels 10 share the planar structure of the second electrode 120. The second electrode 120 is continuous at all locations, especially at the edges of the defining structure 300, such as the entire screen cathode being continuous. Of course, the embodiments disclosed herein are not limited to this. Due to issues of process stability and uniformity, if it is not possible to ensure that the second electrode remains continuous in certain areas, an overlap channel RO of the second electrode is required to ensure that a mesh structure is formed in that area. For example, the second electrode can be continuous at the anode via location to form an overlap channel RO. For example, the overlap channel RO includes a portion extending along the U direction and a portion extending along the V direction, in which case the second electrode can be formed into a mesh structure.

[0201] For example, the location of the barrier (PS) on the display panel can also be the location through which the second electrode overlaps. For example, in a direction perpendicular to the substrate, the structure is defined to not overlap with the barrier.

[0202] For example, the mesh-overlapping method of the second electrode can be flexibly designed according to the shape of the sub-pixel, such as reserving at least one notch around the sub-pixel as a passage for the mesh-overlapping second electrode.

[0203] For example, such as Figure 6 As shown, the dimension D3 of the defined structure 300 can be 2.2 to 2.7 micrometers, such as 2.5 micrometers.

[0204] For example, such as Figure 6 As shown, the ratio of the distance between the limiting structure 300 and the opening of the light-emitting area of ​​the different color sub-pixels 10 defined by the pixel limiting pattern is 0.9 to 1.1, such as 1. For example, the distance between the limiting structure 300 and the opening of the light-emitting area of ​​the green sub-pixel 102 defined by the pixel limiting pattern can be 8 to 10 micrometers, such as 8.5 micrometers. For example, the distance between the limiting structure 300 and the opening of the light-emitting area of ​​the blue sub-pixel 103 defined by the pixel limiting pattern can be 8 to 10 micrometers, such as 8.5 micrometers. For example, the distance between the limiting structure 300 and the opening of the light-emitting area of ​​the red sub-pixel 101 defined by the pixel limiting pattern can be 8 to 10 micrometers, such as 8.5 micrometers.

[0205] For example, such as Figure 6 As shown, the dimension D4 of the defined structure 300 can be 10 to 14 micrometers, such as 12.5 micrometers. For example, the dimension D5 of the defined structure 300 can be 18 to 20 micrometers, such as 19.5 micrometers.

[0206] For example, such as Figure 6 As shown, the spacing between the light-emitting areas of two adjacent sub-pixels 10 arranged in the U or V direction can be 18 to 22 micrometers, such as 20 micrometers. For example, the distance between two adjacent openings of a pixel-defining pattern arranged in the U or V direction can be 20 micrometers.

[0207] Figure 9B This is a schematic cross-sectional view of a portion of the first region near the second region, provided as an example of an embodiment of this disclosure. Figure 9B As shown, a buffer layer and a shielding layer 021, an active layer 026 on the buffer layer and the shielding layer 021, a gate insulating layer 022 on the active layer 026, a metal layer 028 on the gate insulating layer 022, a gate insulating layer 023 on the metal layer 028, a metal layer 027 on the gate insulating layer 023, an interlayer insulating layer 024 on the metal layer 027, a metal layer 031 on the interlayer insulating layer 024, a planarization layer 025 on the metal layer 031, and a planarization layer 200 on the planarization layer 025 are disposed on the planarization layer 025. Region A11 is the region where sub-pixels 100 are disposed, and region A12 is the region surrounding the second region and where a second annular defining structure 330 is disposed.

[0208] For example, such as Figures 8 to 9B As shown, the annular insulating portion 510 and the second insulating layer 500 may include a gate insulating layer 022, a gate insulating layer 023, and an interlayer insulating layer 024.

[0209] For example, such as Figure 9BAs shown, while etching the interlayer insulating layer 024, gate insulating layer 022, and gate insulating layer 023 in region A11 to form via 041, the interlayer insulating layer 024, gate insulating layer 022, and gate insulating layer 023 in region A12 are etched to form spacing 042. Subsequently, the metal layer 031, planarization layer 025, and planarization layer 200 formed in region A12 are patterned and removed to simultaneously form a limiting structure 300 in regions A11 and A12. This allows for the formation of a limiting structure around the second region while simultaneously forming a limiting structure between adjacent pixels. By merging and making compatible masks for forming limiting structures at the two locations, the number of masks can be reduced, thereby reducing the cost of manufacturing the display substrate.

[0210] Figure 10 This is a schematic block diagram of a display device provided according to another embodiment of the present disclosure. Figure 10 As shown, an embodiment of this disclosure provides a display device comprising any of the above-described display substrates.

[0211] In the display device provided in this disclosure, the first annular limiting structure isolates at least one layer of the light-emitting functional layer while realizing the continuous arrangement of the second electrode. This can reduce crosstalk between adjacent sub-pixels and avoid brightness uniformity problems caused by large-area breakage of the second electrode.

[0212] In the display device provided in this disclosure, by providing at least one second annular defining structure around the second region for disconnecting the light-emitting functional layer and the second electrode, the light-emitting element located in the first region can be separated from the second region.

[0213] For example, the display device also includes a cover plate located on the light-emitting side of the display substrate.

[0214] For example, the display device can be an organic light-emitting diode display device or other display device, as well as any product or component with display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, or navigator that includes the display device. This embodiment is not limited to this.

[0215] Figures 11A to 11E This is a schematic process flow diagram illustrating a method for manufacturing a portion of a display substrate according to embodiments of the present disclosure. Figures 11A to 11E The manufacturing method shown can form Figure 1 In the A11 area shown Figure 3 The display substrate shown. Figures 12A to 12C This is a schematic process flow diagram illustrating a method for fabricating another portion of a display substrate according to an embodiment of the present disclosure. Figures 12A to 12C The manufacturing method shown can form Figure 9A The display substrate shown.

[0216] like Figure 11A As shown, the method for manufacturing a display substrate includes providing a substrate 01 and forming an inorganic non-metallic material layer 610 on the substrate 01.

[0217] In some examples, such as Figure 11A As shown, before forming the inorganic non-metallic material layer 610, the fabrication method further includes forming a first insulating layer 200 on a substrate 01. In a portion of the first region, the inorganic non-metallic material layer 610 is formed on the surface of the first insulating layer 200.

[0218] In some examples, such as Figure 12A , Figure 8 as well as Figure 9A As shown, before forming the first insulating layer 200, the fabrication method further includes: forming a second insulating layer 500 on the substrate 01 (e.g., ...). Figure 8 (As shown in the interlayer insulation layer 04). In another part of the first region, an inorganic non-metallic material layer 610 is formed on the surface of the second insulation layer 200.

[0219] For example, such as Figure 11A and Figure 12A As shown, an inorganic non-metallic material layer 610 is deposited on the surfaces of the first insulating layer 200 and the second insulating layer 500. For example, the thickness of the inorganic non-metallic material layer 610 can be 300–550 angstroms. For example, the thickness of the inorganic non-metallic material layer 610 can be 500 angstroms. For example, the material of the inorganic non-metallic material layer 610 can be silicon nitride (SiNx).

[0220] In some examples, such as Figure 11A and Figure 11B As shown, a masking structure 700 is formed on the side of the inorganic non-metallic material layer 610 away from the substrate 01. For example, a mask layer is coated on the inorganic non-metallic material layer 610. For example, the material of the mask layer includes photoresist. For example, the masking structure 700 is formed by patterning the mask layer.

[0221] In some examples, such as Figure 11A and Figure 11B As shown, the shielding structure 700 is used as a mask, and the inorganic non-metallic material layer 610 is etched with a first gas to form a defined pattern 620.

[0222] For example, the first gas includes a mixture of carbon tetrafluoride (CF4) and oxygen. For example, during the process of etching the inorganic non-metallic material layer 610 with the first gas to form the defined pattern 620, the first gas will etch the first insulating layer 200 outside the defined pattern 620 to a certain extent to form a recess, such as a loss. As a result, the first insulating layer 200 directly below the defined pattern 620 has a protrusion, and the thickness of the first insulating layer 200 at this location is greater than the thickness of the first insulating layer 200 at other locations (where the recess is located).

[0223] For example, during post-processing, the thickness of the first insulating layer 200 directly below the defined pattern 620 can be adjusted to minimize the difference in thickness between the first insulating layer 200 at other locations. Alternatively, post-processing of the film layers on the display substrate can be omitted to further reduce the difference in thickness between the first insulating layer directly below the defined pattern and other locations.

[0224] In some examples, such as Figures 11A to 11C As shown, the shielding structure 700 is used as a mask, and the second gas is used to etch the defined pattern 620 to form the defined structure 300.

[0225] For example, after the defined pattern 620 is formed, the occluding structure 700 remains on the defined pattern 620 and is not peeled off.

[0226] For example, the second gas includes a mixture of sulfur hexafluoride (SF6) and oxygen. For example, SF6 can chemically react with silicon nitride to etch the sidewalls of the silicon nitride, resulting in an inverted trapezoidal morphology in the cross-section of the defined structure 300. For example, the second gas does not etch the second insulating layer 200, and the protrusions 210 formed in the previous etching process of the second insulating layer 200 are not further etched.

[0227] like Figures 1 to 3 , Figures 11A to 11E As shown, the method for manufacturing a display substrate includes forming a plurality of sub-pixels 10 in at least a first region A1 of a substrate 01. At least one defining structure 300 is disposed between at least two adjacent sub-pixels 10. Each sub-pixel 10 includes a light-emitting element 100. Forming the light-emitting element 100 includes sequentially forming a first electrode 110, a light-emitting functional layer 130, and a second electrode 120 in a direction perpendicular to the substrate 01. The first electrode 110 is located between the second electrode 120 and the substrate 01. The light-emitting functional layer 130 includes a plurality of film layers.

[0228] For example, before forming the first insulating layer 200, the fabrication method may also include forming other film layers on the substrate 01, such as a gate insulating layer, a buffer layer, a passivation layer, and a multilayer conductive layer.

[0229] In some examples, such as Figure 3 and Figure 11C As shown, the first orthographic projection 301 of the surface of the limiting structure 300 located between adjacent sub-pixels 10 on the substrate 01 is completely located within the second orthographic projection 302 of the surface of the limiting structure 300 located away from the substrate 01 on the substrate 01. Along the light-emitting area arrangement direction of the adjacent sub-pixels 10, the maximum size S2 of the second orthographic projection 302 is greater than the maximum size S1 of the first orthographic projection 301.

[0230] In some examples, such as Figure 3 As shown, in at least a portion of the first region, at least one of the light-emitting functional layers 130 is broken at the edge of the defining structure 300, and the second electrode 120 is continuously disposed at the edge of the defining structure 300.

[0231] This embodiment uses a light-shielding structure as a mask and employs a two-step etching process with two different gases on the non-metallic material layer to form a defined structure with an undercut structure. While isolating at least one layer of the light-emitting functional layer, it achieves continuous setting of the second electrode. This can reduce crosstalk between adjacent sub-pixels and avoid brightness uniformity problems caused by large-area breakage of the second electrode.

[0232] In some examples, such as Figure 11B and Figure 11C As shown, the cross-sectional shape of the defined pattern 620 cut by the plane containing the center line of the adjacent sub-pixels on both sides of the defined pattern 620 includes a rectangle, and the cross-sectional shape of the defined structure 300 cut by the aforementioned plane includes a first trapezoid. The length of the base of the first trapezoid away from the substrate 01 is greater than the length of the base of the first trapezoid close to the substrate 01. The aforementioned plane is perpendicular to the substrate 01.

[0233] For example, the first orthographic projection of the defining structure 300 is completely located within the orthographic projection of the protrusion 210 on the substrate 01.

[0234] For example, such as Figure 11CAs shown, the distance between the orthographic projection of the edge of the protrusion 210 and the edge of the shielding structure 700 on the substrate is less than 0.5 micrometers. For example, the distance between the orthographic projection of the edge of the protrusion 210 and the edge of the shielding structure 700 on the substrate is less than 0.4 micrometers. For example, the distance between the orthographic projection of the edge of the protrusion 210 and the edge of the shielding structure 700 on the substrate is less than 0.3 micrometers. For example, the distance between the orthographic projection of the edge of the protrusion 210 and the edge of the shielding structure 700 on the substrate is less than 0.2 micrometers. For example, the distance between the orthographic projection of the edge of the protrusion 210 and the edge of the shielding structure 700 on the substrate is less than 0.1 micrometers.

[0235] For example, such as Figure 11C As shown, the edge of the protrusion 210 is flush with the edge of the shielding structure 700.

[0236] For example, such as Figure 11C As shown, the distance between the edge of protrusion 210 and the orthographic projection of the edge of the surface of the defining structure 300 on the side away from the substrate 01 on the substrate is less than 0.5 micrometers. For example, the distance between the edge of protrusion 210 and the orthographic projection of the edge of the surface of the defining structure 300 on the side away from the substrate 01 on the substrate is less than 0.4 micrometers. For example, the distance between the edge of protrusion 210 and the orthographic projection of the edge of the surface of the defining structure 300 on the side away from the substrate 01 on the substrate is less than 0.3 micrometers. For example, the distance between the edge of protrusion 210 and the orthographic projection of the edge of the surface of the defining structure 300 on the side away from the substrate 01 on the substrate is less than 0.2 micrometers. For example, the distance between the edge of protrusion 210 and the orthographic projection of the edge of the surface of the defining structure 300 on the side away from the substrate 01 on the substrate is less than 0.1 micrometers.

[0237] For example, such as Figure 11C As shown, the edge of the protrusion 210 is flush with the edge of the surface of the defining structure 300 on the side away from the substrate 01. For example, a straight line extending in a direction perpendicular to the substrate 01 passes through the edge of the protrusion 210 and the edge of the surface of the defining structure 300 on the side away from the substrate 01. For example, the second orthographic projection completely coincides with the orthographic projection of the protrusion 210 on the substrate 01.

[0238] In some examples, such as Figure 11D As shown, after forming the defined structure 300, the manufacturing method also includes removing the obstructing structure 300.

[0239] In some examples, such as Figure 11D As shown, the first electrode 110 is patterned after the definition structure 300 is formed.

[0240] For example, such as Figure 11C As shown, after removing the shielding structure 300, a conductive layer is formed on the first insulating layer 200, and the conductive layer is patterned to form the first electrode 110. For example, the first electrode 110 is patterned using a wet etching process, during which the conductive layer at the inclined sidewall of the defining structure can be completely removed.

[0241] For example, such as Figure 11E As shown, after forming the first electrode 110, an organic material layer is formed on the first electrode 110, and the organic material layer is patterned to form a pixel defining pattern 400. For example, the pixel defining pattern 400 includes a plurality of first openings 410, and each sub-pixel 10 corresponds to at least one first opening 410, the first opening 410 being configured to expose the first electrode 110.

[0242] For example, such as Figure 11E As shown, the pixel-defined pattern 400 also includes a second opening 420, through which at least a portion of the defining structure 300 is exposed. Figure 11E The illustration shows that the defining structure 300 is fully exposed by the second opening 420, but is not limited thereto; the defining structure 300 may also be as follows: Figure 5 As shown, only a portion is exposed by the second opening 420. For example, at least one layer of the light-emitting functional layer 130 is broken at the edge of the defining structure 300 exposed by the second opening 420, and the second electrode 120 is continuously disposed at that edge.

[0243] In some examples, such as Figures 11A to 12C As shown, etching the inorganic non-metallic material layer 610 with a first gas to form a defined pattern 620 includes simultaneously etching the inorganic non-metallic material layer 610 on the first insulating layer 200 and the inorganic non-metallic material layer 610 on the second insulating layer 500 to form the defined pattern 620; etching the defined pattern 620 with a second gas to form a defined structure 300 includes simultaneously etching the defined pattern 620 on the first insulating layer 200 and the defined pattern 620 on the second insulating layer 500 to form the defined structure 300.

[0244] For example, such as Figure 12A As shown, after forming the inorganic layer, a second insulating layer 500 is formed by patterning the inorganic layer. The second insulating layer 500 includes components located away from the inorganic layer. Figure 1 The continuous film layer in the second region A2 shown and near Figure 1 The annular insulating portion 510 of the second region A2 shown. For example, the annular insulating portion 510 may be integrally formed with the continuous film layer, or the annular insulating portion 510 may be spaced apart from the continuous film layer.

[0245] For example, such as Figure 12BAs shown, after the annular insulating portion 510 is formed, the first insulating layer or other film layer formed thereon is etched away so that the subsequent inorganic non-metallic material layer 610 is formed on the surface of the annular insulating portion 510. For example, a defined pattern 620 is patterned and formed on the annular insulating portion 510.

[0246] For example, it can be formed Figure 11B The pattern 620 shown is formed simultaneously Figure 12B The defined pattern 620 is shown. Formation Figure 12B The method and formation of the defined pattern 620 shown Figure 12B The method for defining pattern 620 shown is the same, and will not be repeated here.

[0247] Figures 12B to 12C Omitted Figures 11B to 11C The occlusion structure 700 shown.

[0248] For example, such as Figure 12C As shown, after forming the defined pattern 620, a second gas is used to etch the defined pattern 620 to form a second annular defined structure 330. For example, SF6 can chemically react with silicon nitride to etch the sidewalls of the silicon nitride so that the cross-section of the second annular defined structure 330 forms an inverted trapezoidal morphology.

[0249] For example, it can be formed Figure 11C The defined structure 300 shown, such as the first annular defined structure, simultaneously forms Figure 12C The second annular limiting structure 330 is shown.

[0250] The method for manufacturing a display substrate disclosed herein forms a limiting structure around a second region while simultaneously forming a limiting structure between adjacent pixels. By merging and making compatible masks that form limiting structures at the two locations, it is beneficial to reduce the number of masks and thus reduce the cost of manufacturing the display substrate.

[0251] In the method for manufacturing a display substrate provided in this disclosure, the limiting structure located between adjacent sub-pixels and the limiting structure surrounding the second region are respectively formed in a first insulating layer and a second insulating layer made of different materials. This facilitates the compatibility of manufacturing methods for limiting structures that are formed at different positions and play different roles, thereby reducing the number of masks.

[0252] The following points need to be explained:

[0253] (1) The accompanying drawings of the embodiments of this disclosure only involve the structures involved in the embodiments of this disclosure, and other structures can be referred to the general design.

[0254] (2) Where there is no conflict, features of the same embodiment and different embodiments of this disclosure may be combined with each other.

[0255] The above description is merely an exemplary embodiment of this disclosure and is not intended to limit the scope of protection of this disclosure, which is determined by the appended claims.

Claims

1. A display substrate, comprising: The substrate includes at least a first region; A plurality of sub-pixels are located in a first region on the substrate. At least some of the sub-pixels include a light-emitting element. The light-emitting element includes a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate. The light-emitting functional layer includes multiple film layers. The display substrate further includes a defining structure, wherein at least one defining structure is disposed between at least two adjacent sub-pixels, and the first orthographic projection of the surface of the defining structure located between the adjacent sub-pixels on the substrate is completely located within the second orthographic projection of the surface of the defining structure on the substrate away from the substrate. Along the light-emitting area arrangement direction of the adjacent sub-pixels, the maximum size of the second orthographic projection is greater than the maximum size of the first orthographic projection, and the defining structure includes an inorganic non-metallic material. In at least a portion of the first region, at least one of the light-emitting functional layers is broken at the edge of the defined structure, and the second electrodes of adjacent sub-pixels are at least partially continuous; The cross-sectional shape of the defined structure cut by the plane containing the center line connecting adjacent sub-pixels includes a first trapezoid, the length of the first base away from the substrate is greater than the length of the second base of the first trapezoid close to the substrate, the plane is perpendicular to the substrate, and the angle between at least a portion of at least one side of the first trapezoid and the second base is 110 to 150 degrees. The display substrate further includes a first insulating layer located between the defining structure and the substrate. In at least a portion of the first region, the first insulating layer is in contact with the surface of the defining structure facing the substrate. The first insulating layer is located between the first electrode and the substrate. The surface of the first electrode is in contact with the surface of the first insulating layer. The material of the first insulating layer includes an organic material. The first insulating layer includes a protrusion in contact with the surface of the defining structure. The light-emitting functional layer covers the sidewalls of the protrusion.

2. The display substrate according to claim 1, wherein, The second electrode is continuously disposed at the edge of the defined structure.

3. The display substrate according to claim 1, wherein, The second electrode of at least one sub-pixel and the second electrode of the sub-pixel adjacent to it in the first sub-direction are continuously disposed, and the second electrode of the at least one sub-pixel and the second electrode of the sub-pixel adjacent to it in the second sub-direction are disconnected, wherein the first sub-direction and the second sub-direction intersect. And / or, The second electrode of at least one sub-pixel and the second electrode of a sub-pixel adjacent to it in a first sub-direction are continuously disposed, and the second electrode of the at least one sub-pixel and the second electrode of a sub-pixel adjacent to it in a second sub-direction are continuously disposed, wherein the first sub-direction and the second sub-direction intersect.

4. The display substrate according to claim 1, wherein, The defined structure surrounds more than 50% of the contour of at least one sub-pixel.

5. The display substrate according to claim 1, wherein, The second electrode of at least one sub-pixel and the second electrode of its adjacent sub-pixel are arranged continuously, and the minimum width of the second electrode between the two adjacent sub-pixels is greater than 1 micrometer in the direction perpendicular to their arrangement.

6. The display substrate according to claim 5, wherein, The orthographic projection of the center line connecting the two adjacent sub-pixels onto the plane where the second electrode is located lies within the second electrode.

7. The display substrate according to claim 1, wherein, The outline of at least a partially defined structure is the same as the outline of the light-emitting area of ​​the sub-pixel surrounded by the at least partially defined structure, and the ratio of the distance between the adjacent edges of the different defined structures and the light-emitting areas of the sub-pixels surrounded by the different defined structures is 0.9 to 1.

1.

8. The display substrate according to claim 1, wherein, The thickness of the defined structure is 300~550 angstroms.

9. The display substrate according to claim 1, wherein, The first orthographic projection lies entirely within the orthographic projection of the protrusion on the substrate.

10. The display substrate according to claim 9, wherein, The distance between the edge of the protrusion and the orthographic projection of the edge of the defined structure on the side of the substrate away from the substrate on the substrate is less than 0.5 micrometers.

11. The display substrate according to claim 9, wherein, The distance between the surface of the first electrode away from the substrate and the substrate is less than the distance between the surface of the defined structure away from the substrate and the substrate.

12. The display substrate according to any one of claims 1-8, further comprising: A pixel-defined pattern is located on the side of the first electrode away from the substrate. The pixel-defined pattern, at least in the first region, includes a plurality of first openings. Each sub-pixel corresponds to at least one first opening. The light-emitting element of the sub-pixel is at least partially located in the corresponding first opening, and the first opening is configured to expose the first electrode. The pixel-defined pattern further includes a second opening, through which at least a portion of the defined structure is exposed.

13. The display substrate according to claim 12, wherein, At least one layer of the light-emitting functional layer is broken at at least a portion of the edge of the defining structure exposed by the second opening, and the second electrode is continuously disposed at that edge of the defining structure.

14. The display substrate according to any one of claims 1-8, wherein, At least one film layer of the light-emitting functional layer includes a charge-generating layer. The light-emitting functional layer includes a first light-emitting layer, the charge-generating layer and a second light-emitting layer stacked together. The charge-generating layer is located between the first light-emitting layer and the second light-emitting layer, and the charge-generating layer is broken at the edge of the defined structure.

15. The display substrate according to any one of claims 1-8, wherein, The plurality of sub-pixels includes a plurality of first-color sub-pixels, a plurality of second-color sub-pixels, and a plurality of third-color sub-pixels. The defining structure includes a plurality of first annular defining structures, the first annular defining structures surrounding at least one of the plurality of first color sub-pixels, the plurality of second color sub-pixels, and the plurality of third color sub-pixels.

16. The display substrate according to claim 15, wherein, Each sub-pixel, at least in some sub-pixels, further includes pixel circuitry. The first electrode of the light-emitting element of at least one sub-pixel includes a main electrode and a connecting electrode. In a direction perpendicular to the substrate, the main electrode overlaps with the light-emitting area of ​​the light-emitting element, while the connecting electrode does not overlap with the light-emitting area of ​​the light-emitting element. The pixel circuit is electrically connected to the connection electrode, and the first annular defining structure surrounding the at least one sub-pixel includes a notch. In a direction perpendicular to the substrate, the first annular defining structure does not overlap with the connection electrode.

17. The display substrate according to claim 1, further comprising: A second insulating layer is located between the defined structure and the substrate. The substrate further includes a second region, and the first region is located around the second region; The second insulating layer includes at least one annular insulating portion surrounding the second region. The defining structure further includes a second annular defining structure that contacts the surface of the annular insulating portion away from the substrate. The second insulating layer is located on the side of the first insulating layer facing the substrate. The material of the second insulating layer includes an inorganic non-metallic material, and the material of the second insulating layer is different from the material of the defining structure. The light-emitting functional layer and the second electrode are both disconnected at the edge of the second annular defining structure.

18. The display substrate according to claim 17, wherein, The cross-section of the second annular defining structure includes a second trapezoid, wherein the length of the base of the second trapezoid away from the substrate is greater than the length of the base of the second trapezoid close to the substrate.

19. The display substrate according to claim 17, wherein, The orthographic projection of the second annular defining structure on the substrate is located within the orthographic projection of the annular insulating portion on the substrate.

20. The display substrate according to claim 18, wherein, The cross-sectional shape of the defined structure cut by the plane containing the center line includes a first trapezoid, wherein the length of the first base of the first trapezoid away from the substrate is greater than the length of the second base of the first trapezoid close to the substrate, and the plane is perpendicular to the substrate. The ratio of the dimension of the first trapezoid in the direction perpendicular to the substrate to the dimension of the second trapezoid in the direction perpendicular to the substrate is 0.8 to 1.2, and the ratio of the angle between the waist of the first trapezoid and the second base to the angle between the waist of the second trapezoid and the base of the second trapezoid closer to the substrate is 0.8 to 1.

2.

21. A display substrate, comprising: The substrate includes at least a first region; A plurality of sub-pixels are located in a first region on the substrate. At least some of the sub-pixels include a light-emitting element. The light-emitting element includes a light-emitting functional layer and a first electrode and a second electrode located on both sides of the light-emitting functional layer along a direction perpendicular to the substrate. The first electrode is located between the light-emitting functional layer and the substrate. The light-emitting functional layer includes multiple film layers. The display substrate further includes a defining structure, wherein at least one defining structure is disposed between at least two adjacent sub-pixels. The plurality of sub-pixels includes a first sub-pixel, a second sub-pixel, and a third sub-pixel. The second sub-pixel and the third sub-pixel are both adjacent to the first sub-pixel. The distance between the first sub-pixel and the second sub-pixel is different from the distance between the first sub-pixel and the third sub-pixel. The maximum size of the defining structure disposed between the first sub-pixel and the second sub-pixel in the arrangement direction of the two sub-pixels is a first size. The maximum size of the defining structure disposed between the first sub-pixel and the third sub-pixel in the arrangement direction of the two sub-pixels is a second size. The first size and the second size are different.

22. The display substrate according to claim 21, wherein, The plurality of sub-pixels are arranged in an array along a first direction and a second direction, and some of the sub-pixels are arranged in an array along a third direction and a fourth direction. The first direction is perpendicular to the second direction, the third direction is perpendicular to the fourth direction, and the first direction intersects the third direction. The maximum size of the defining structure between two adjacent sub-pixels arranged along the first direction or the second direction in the arrangement direction of the two sub-pixels is the third size, and the maximum size of the defining structure between two adjacent sub-pixels arranged along the third direction or the fourth direction in the arrangement direction of the two sub-pixels is the fourth size, wherein the third size is smaller than the fourth size.

23. The display substrate according to claim 21, wherein, The plurality of sub-pixels includes a plurality of green sub-pixels, a plurality of blue sub-pixels, and a plurality of red sub-pixels. The maximum size of the limiting structure set between two adjacent green sub-pixels in the arrangement direction of the two green sub-pixels is greater than the maximum size of the limiting structure set between other adjacent sub-pixels in the arrangement direction of the adjacent sub-pixels.

24. The display substrate according to any one of claims 21-23, wherein, Each sub-pixel in at least some of the sub-pixels also includes a pixel circuit. The first electrode of the light-emitting element of at least one sub-pixel includes a main electrode and a connecting electrode. In a direction perpendicular to the substrate, the main electrode overlaps with the light-emitting area of ​​the light-emitting element, and the connecting electrode does not overlap with the light-emitting area of ​​the light-emitting element. The pixel circuit is electrically connected to the connecting electrode. In at least a portion of the first region, at least one of the light-emitting functional layers is broken at the edge of the defining structure, and the second electrode is at least partially continuous at the position where it overlaps with the connecting electrode.

25. The display substrate according to claim 24, wherein, In a direction perpendicular to the substrate, the defining structure does not overlap with at least a portion of the connecting electrode.

26. The display substrate according to any one of claims 21-23, wherein, The second electrode in at least some of the sub-pixels includes a planar structure or a mesh structure.

27. A display device comprising the display substrate according to any one of claims 1-26.

28. A method for manufacturing a display substrate, comprising: Provide substrates; An inorganic non-metallic material layer is formed on the substrate. A shielding structure is formed on the side of the inorganic non-metallic material layer away from the substrate. Using the shielding structure as a mask, the inorganic non-metallic material layer is etched with a first gas to form a defined pattern; Using the shielding structure as a mask, and employing a second gas to etch the defined pattern to form a defined structure, wherein the cross-sectional shape of the defined pattern cut by the plane includes a rectangle, and the cross-sectional shape of the defined structure cut by the plane includes a first trapezoid, wherein the length of the base of the first trapezoid away from the substrate is greater than the length of the base of the first trapezoid close to the substrate, and the plane is perpendicular to the substrate. A plurality of sub-pixels are formed in at least a first region of the substrate. Wherein, at least two adjacent sub-pixels are provided with at least one limiting structure, and each sub-pixel in at least some of the sub-pixels includes a light-emitting element. The light-emitting element includes a first electrode, a light-emitting functional layer and a second electrode that are sequentially formed in a direction perpendicular to the substrate. The first electrode is located between the second electrode and the substrate, and the light-emitting functional layer includes multiple film layers. The first orthographic projection of the surface of the defining structure located between adjacent sub-pixels on the substrate is completely within the second orthographic projection of the surface of the defining structure located away from the substrate on the substrate. Along the light-emitting area arrangement direction of the adjacent sub-pixels, the maximum size of the second orthographic projection is greater than the maximum size of the first orthographic projection. In at least a portion of the first region, at least one of the light-emitting functional layers is broken at the edge of the defined structure, and the second electrodes of adjacent sub-pixels are at least partially continuous.

29. The manufacturing method according to claim 28, wherein, After forming the defined structure, the manufacturing method further includes: removing the obstructing structure.

30. The manufacturing method according to any one of claims 28-29, wherein, Before forming the inorganic non-metallic material layer, the fabrication method further includes: forming a first insulating layer on the substrate, wherein, in a portion of the first region, the inorganic non-metallic material layer is formed on the surface of the first insulating layer; Before forming the first insulating layer, the fabrication method further includes: forming a second insulating layer on the substrate, wherein, in another portion of the first region, the inorganic non-metallic material layer is formed on the surface of the second insulating layer. Etching the inorganic non-metallic material layer with a first gas to form a defined pattern includes simultaneously etching the inorganic non-metallic material layer on the first insulating layer and the inorganic non-metallic material layer on the second insulating layer to form the defined pattern; Etching the defined pattern with a second gas to form the defined structure includes simultaneously etching the defined pattern on the first insulating layer and the defined pattern on the second insulating layer to form the defined structure.

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