A rectifier

Abstract

This invention relates to the field of integrated circuit chip manufacturing, specifically to a rectification device, comprising a cover, an air inlet distribution plate, a diffuser plate, an air inlet pipe, and an exhaust pipe. The air inlet distribution plate is disposed above the diffuser plate, and the air inlet pipe and exhaust pipe are disposed on the cover. A first chamber is formed between the upper surface of the air inlet distribution plate and the inner wall of the cover, a second chamber is formed between the lower surface of the diffuser plate and the substrate, and a third chamber is formed between the lower surface of the air inlet distribution plate and the upper surface of the diffuser plate. Both ends of the air inlet pipe are connected to an external air source and the first chamber, respectively, and one end of the exhaust pipe is connected to the third chamber. Multiple through holes are formed on the diffuser plate. External gas flows sequentially through the air inlet pipe through the first chamber, the second chamber, the through holes, and the third chamber before being discharged to the outside through the exhaust pipe. The depth of the through holes is set according to the flow velocity passing through them; the depth of through holes with higher flow velocities is greater than the depth of through holes with lower flow velocities. Through this design, uniform distribution of air volume above the substrate is achieved.

Description

Technical Field

[0001] This invention relates to the field of integrated circuit chip manufacturing, specifically to a rectifier device. Background Technology

[0002] Chip manufacturing includes photolithography, with resist coating and heating being indispensable steps in the photolithography process. During the heating of the substrate after resist coating, external gas is introduced into the heating device. It is crucial to ensure that the high-temperature external gas (e.g., N2) heated by the hot plate (HP) flows evenly across the substrate surface, uniformly carrying away organic gases volatilized during resist coating and preventing their accumulation above the resist, which could lead to uneven resist distribution along the substrate's radial direction. Therefore, the uniformity of gas flow rate above the substrate is extremely important. However, improving the uniformity of gas flow rate above the substrate is a pressing problem that needs to be solved. Summary of the Invention

[0003] In view of the problems existing in the prior art, the purpose of the present invention is to provide a rectifier for improving the uniformity of gas distribution above a substrate.

[0004] To achieve the above objectives, the present invention provides the following technical solution:

[0005] A rectifier includes a cover, an air intake distribution plate, a diffuser plate, an air intake pipe, and an exhaust pipe. The air intake distribution plate is disposed above the diffuser plate, and a substrate is placed below the diffuser plate. The air intake pipe and the exhaust pipe are disposed on the cover.

[0006] A first chamber is formed between the upper surface of the air intake distribution plate and the inner wall of the cover; a second chamber is formed between the lower surface of the diffuser plate and the substrate; and a third chamber is formed between the central region of the lower surface of the air intake distribution plate and the upper surface of the diffuser plate.

[0007] One end of the air intake pipe is used to connect to an external air source, and the other end is connected to the first chamber. One end of the exhaust pipe is used to connect to an external air extraction device, and the other end is connected to the third chamber.

[0008] The air intake distribution plate is provided with multiple air intake holes, and the diffuser plate is provided with multiple through holes. External gas flows through the air intake pipe sequentially through the first chamber, the air intake holes, the second chamber, the through holes, and the third chamber, and is then discharged to the outside through the exhaust pipe.

[0009] The depth of the through hole is set according to the flow velocity through the through hole, and the depth of the through hole with a high gas flow velocity is greater than the depth of the through hole with a low gas flow velocity.

[0010] The present invention also provides a heating device, which includes the aforementioned rectifier and a heating assembly of five components. The rectifier covers the heating assembly to form a sealed space for mounting the substrate.

[0011] The heating component is used to heat the substrate.

[0012] Compared with the prior art, the present invention has the following beneficial effects:

[0013] The rectifier device provided by this invention includes an intake distribution plate, a diffuser plate, a cover, an intake pipe, and an exhaust pipe.

[0014] The diffuser plate has multiple through holes. External gas flows through the intake pipe, through the intake distribution plate, and towards the surface of the substrate. The gas flowing above the substrate surface then exits through the multiple through holes to the substrate.

[0015] The depth of the through-hole in the exhaust pipe is set according to the gas flow velocity passing through it; the depth of the through-hole is greater for higher gas flow velocities than for lower gas flow velocities. A deeper through-hole can, to some extent, impede the discharge of external gases and volatile gases, while increasing the depth of the through-hole for higher gas flow velocities reduces the inflow of external gases.

[0016] This through-hole. Correspondingly, the reduced portion of external gas will accumulate in the shallow through-hole and escape. The shallow depth of the through-hole is more conducive to the escape of external gas and volatile gas, thereby balancing the external gas flow above the substrate.

[0017] The distribution of gases. Through this structural design, a uniform distribution of external gases above the substrate is achieved throughout the entire process, with external gases and volatile gases being discharged relatively evenly from the diffuser plate. Attached Figure Description

[0018] 0 To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the implementation will be described below.

[0019] The accompanying drawings used in the example or prior art description are briefly introduced. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the heating device of the present invention;

[0021] 5 Figure 2 This is a partial cross-sectional view of the heating device of the present invention;

[0022] Figure 3 This is a cross-sectional schematic diagram of a rectifier device according to an embodiment of the present invention;

[0023] Figure 4 This is a cross-sectional schematic diagram of a rectifier device according to another embodiment of the present invention;

[0024] Figure 5 This is a cross-sectional schematic diagram of a rectifier device according to yet another embodiment of the present invention;

[0025] Figure 6 A top view of the diffuser plate provided in an embodiment of the present invention;

[0026] Figure 7 This is a top view of the air intake distribution plate provided in an embodiment of the present invention;

[0027] Figure 8 This is a cross-sectional schematic diagram of a rectifier device according to another embodiment of the present invention;

[0028] Figure 9 for Figure 8 A magnified schematic diagram of part A in the middle;

[0029] Figure 10 for Figure 8 A magnified schematic diagram of part B in the middle;

[0030] Figure 11 A comparison diagram of flow velocity distribution on the diffuser plate.

[0031] [Drawing Number Explanation]: Cover 1, Air Intake Distribution Plate 2, Diffuser Plate 3, Base Plate 4, Air Intake Pipe 5, Exhaust Pipe 6, Heating Plate 7, Guide Ring 8, Fitting Part 9, First Chamber 11, Second Chamber 12, Third Chamber 13, Air Intake Hole 21, Connecting Post 22, Through Hole 31. Detailed Implementation

[0032] To make the objectives, features, and advantages of this invention more apparent and understandable, the technical solutions of the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the embodiments described below are only some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this invention.

[0033] In the description of this invention, it should be understood that when a component is considered to be "connected" to another component, it can be directly connected to the other component or there may be an intermediate component present simultaneously. When a component is considered to be "set" on another component, it can be directly set on the other component or there may be an intermediate component present simultaneously.

[0034] The technical solution of the present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0035] Example 1

[0036] Please see Figure 1-3 An embodiment of the present invention provides a heating device, which includes a rectifier and a heating component. The rectifier covers the heating component to form a sealed space, and the substrate 4 is located in the sealed space. The heating component is used to heat the substrate 4.

[0037] The rectifier includes a cover 1, an intake distribution plate 2, a diffuser plate 3, an intake pipe 5, and an exhaust pipe 6. The intake pipe 5 and exhaust pipe 6 are mounted on the cover 1. Further, the intake distribution plate 2, diffuser plate 3, and cover 1 are connected together by a connector. Optionally, the connector is a bolt or screw. Multiple screws are used to connect the three components by passing through the edges of the diffuser plate 3, the edges of the intake distribution plate 2, and the upper part of the cover 1. (Reference) Figure 6 The diffuser plate 3 has multiple through holes 31 evenly distributed on it.

[0038] The intake distribution plate 2 is provided with a connecting post 22, and the diffuser plate 3 and the intake distribution plate 2 are connected by the connecting post 22. (Reference) Figure 7 The air intake distribution plate 2 includes an edge region and a central region. The edge region surrounds the outer periphery of the central region, and multiple air intake holes 21 are provided in the edge region of the air intake distribution plate 2. In this embodiment, the edge region of the air intake distribution plate 2 is defined by the connecting post 22 to the inner wall of the cover 1, and the remaining region of the air intake distribution plate 2 is the central region of the air intake distribution plate 2. Of course, the connecting post 22 is not limited to the arrangement of this embodiment; the connecting post 22 can be arranged towards the center of the air intake distribution plate 2.

[0039] The heating assembly includes a heating plate 7, a guide ring 8, and a bonding portion 9. The outer periphery of the heating plate 7 is secured to the guide ring 8, and the substrate 4 is located above the heating plate 7. The cover 1 covers the bonding portion 9 to form a sealed space. The air intake distribution plate 2, the diffuser plate 3, and the substrate 4 are all located within this sealed space.

[0040] A first chamber 11 is formed between the upper surface of the air intake distribution plate 2 and the inner wall of the cover 1. A second chamber 12 is formed between the lower surface of the diffuser plate 3 and the substrate 4. A third chamber 13 is formed between the central region of the lower surface of the air intake distribution plate 2 and the upper surface of the diffuser plate 3.

[0041] One end of the intake pipe 5 is connected to an external air source to transmit external gas to the rectifier. The other end of the intake pipe 5 is connected to the first chamber 11. The exhaust pipe 6 extends out of the intake distribution plate 2 and is positioned above the diffuser plate 3. One end of the exhaust pipe 6 is connected to an external air extraction device, and the other end is connected to the third chamber 13. Furthermore, the outlet of the exhaust pipe 6 is positioned correspondingly to the center of the diffuser plate 3.

[0042] When the external suction device is working, the exhaust pipe 6 exerts a strong suction force on the third chamber 13. External gas flows sequentially through the intake pipe 5, passing through the first chamber 11, the intake port 21, the second chamber 12, the through hole 31, and the third chamber 13, finally being discharged to the outside through the exhaust pipe 6. When the external gas passes through the second chamber 12, it carries volatile gases with it to the third chamber 13, removing the volatile gases outside the rectifier. Optionally, in this embodiment, the external gas is N2.

[0043] The diffuser plate 3 includes an edge region and a central region. The central region of the diffuser plate 3 is correspondingly positioned with the exhaust pipe 6, and the edge region surrounds the periphery of the central region. The exhaust pipe 6 exerts a greater suction force on the central region of the diffuser plate 3 than on the edge region, thus causing most of the N2 to accumulate in the central region of the diffuser plate 3 and carrying away volatile gases from the through-holes 31 in the central region of the diffuser plate 3. This makes it difficult to remove volatile gases present above the edge region of the substrate 4. The greater suction force created by the corresponding positioning of the exhaust pipe 6 with the central region of the diffuser plate 3 results in a higher gas flow rate in the through-holes 31 in the central region of the diffuser plate 3 than in the through-holes 31 in the edge region.

[0044] Therefore, in this embodiment of the invention, the depth of the through hole 31 increases from the edge region to the center region of the diffuser plate 3. That is, the depth of the through hole 31 with a high gas flow rate is greater than the depth of the through hole 31 with a low gas flow rate. The resistance of the through hole 31 with different depths to gas discharge is different, so that the gas flow rate in the through hole 31 in the edge region and the center region of the diffuser plate 3 tends to be consistent, and the flow rate through the through hole 31 at each location tends to be consistent. N2 will be uniformly carried away from the organic gas volatilized from the adhesive, so that the adhesive is uniformly distributed radially along the substrate 4.

[0045] The multiple through holes 31 of the diffuser plate 3 are set to different depths. The through holes 31 in the central region are deeper, which can hinder the discharge of volatile gases and some N2 to a certain extent, causing N2 to accumulate in the edge region. The through holes 31 in the edge region are shallower, which is conducive to the discharge of N2 and volatile gases, and improves the uniformity of N2 distribution in the second chamber 12. The gas flow rate in the through holes 31 in the edge region and the central region of the diffuser plate 3 tends to be consistent.

[0046] Optionally, a full ring of air intake holes 21 is formed around the edge region of the air intake distribution plate 2. Optionally, the air intake holes 21 are not limited to the edge region of the air intake distribution plate 2; the air intake holes 21 can be located in the central region of the air intake distribution plate 2. The relative position between the outlet of the exhaust pipe 6 and the diffuser plate 3 is not limited to the above; optionally, the outlet of the exhaust pipe 6 and the edge of the diffuser plate 3 are correspondingly positioned.

[0047] In this embodiment of the invention, the depth of the through-hole 31 increases linearly from the edge region to the center region of the diffuser plate 3. Further, the depth of the through-hole 31 in the edge region also increases linearly along the direction from the edge region to the center region, and the depth of the through-hole 31 in the center region also increases linearly along the direction from the center region to the center of the diffuser plate 3. The coefficients of linear increase are the same in both cases, and the cross-section of the diffuser plate 3 is similar to a frustum shape. Optionally, the depth of the through-hole 31 can be adjusted according to changes in flow velocity, and the coefficients of linear increase in the two cases may be different.

[0048] For details, please refer to [link / reference]. Figure 3 , Figure 3 This is a cross-sectional view of the rectifier through the center point of the diffuser plate 3. The distance between the upper surface of the diffuser plate 3 and the intake distribution plate 2 is Gap1, and all through holes 31 have the same Gap1 with the intake distribution plate 2. The distance between the lower surface of the diffuser plate 3 and the substrate 4 in the edge region is Gap21, and the distance between the lower surface of the diffuser plate 3 and the substrate 4 in the center region is Gap22. The distance between the through holes 31 on the diffuser plate 3 and the substrate 4 varies linearly. In this embodiment, Gap21 is 2–10 mm, and Gap22 is 1–5 mm.

[0049] The depth of the through-holes 31 in the edge region of the diffuser plate 3 is smaller than that in the center region, and the distance Gap21 between the lower surface of the diffuser plate 3 and the substrate 4 in the edge region is greater than the distance Gap22 between the lower surface of the diffuser plate 3 and the substrate 4 in the center region. The larger Gap21 results in a greater amount of N2 remaining above the edge region of the substrate 4, further promoting the discharge of volatile gases from the edge region. The smaller Gap22 reduces the amount of N2 remaining above the center region to some extent, thereby further balancing the amount of N2 remaining in the center and edge regions. This further improves the uniformity of N2 flow rate at various locations above the substrate 4 throughout the entire process.

[0050] In one alternative implementation, such as Figure 4 As shown, Figure 4 This is a cross-sectional view of the diffuser plate 3 at its center point. The distance between the upper surface of the diffuser plate 3 and the intake distribution plate 2 in the edge region is greater than the distance between the upper surface of the diffuser plate 3 and the intake distribution plate 2 in the center region. Optionally, the distance between the lower surface of the diffuser plate 3 and the substrate 4 is the same in both the edge and center regions.

[0051] In an optional embodiment, such as Figure 5 As shown, Figure 5This is a cross-sectional view of the rectifier through the center point of the diffuser plate 3. The distance between the edge region of the upper surface of the diffuser plate 3 and the intake distribution plate 2 is greater than the distance between the center region of the upper surface of the diffuser plate 3 and the intake distribution plate 2. At the same time, the distance between the lower surface of the diffuser plate 3 at the edge region and the substrate 4 is greater than the distance between the lower surface of the diffuser plate 3 at the center region and the substrate 4.

[0052] In one alternative implementation, such as Figure 6 As shown, the through holes 31 on the diffuser plate 3 are evenly distributed, with the same distance between adjacent through holes 31. Three adjacent through holes 31 are arranged in an equilateral triangle.

[0053] The layout of the through holes 31 is not limited to the above. Optionally, the multiple through holes 31 on the diffuser plate 3 are arranged in the form of multiple virtual concentric circles. The depth of each through hole 31 on a concentric circle is the same, while the depth of the through holes 31 on different concentric circles is different. Optionally, according to the flow velocity distribution in each region, the aperture size of each through hole 31 on a concentric circle is the same, while the aperture size of each through hole 31 on different concentric circles is set differently.

[0054] Example 2

[0055] Please see Figure 8-10 The difference between this embodiment and Embodiment 1 is that the depth of the through holes 31 in the diffuser plate 3 increases in a stepped manner from the edge region to the center region. The depth of the through holes 31 is the same at all points in the edge region.

[0056] The distance between the upper surface of the diffuser plate 3 and the air intake distribution plate 2 is Gap1, and all through holes 31 are at the same distance Gap1 from the air intake distribution plate 2.

[0057] Since the edge region is farther from the outlet of exhaust pipe 6, the position of exhaust pipe 6 has a smaller impact on the edge region. The gas flow velocity of the through holes 31 is roughly the same at all points in the edge region, so the depth of the through holes 31 at all points in the edge region is set to be the same. However, the position of exhaust pipe 6 has a greater impact on the central region, and the gas flow velocity of the through holes 31 at all points in the central region varies significantly. Therefore, it is necessary to further improve the uniformity of the through holes 31 at all points in the central region.

[0058] The central region of the diffuser plate 3 includes a first central region, a second central region, a third central region, and a fourth central region arranged sequentially from the inside to the outside around the center of the diffuser plate 3. The depth of the through hole 31 corresponding to the fourth central region, the third central region, the second central region, and the first central region increases sequentially.

[0059] like Figure 8-10As shown, the second, third, and fourth central regions are all annular regions. The radius of the first central region is R1, which is the length from the farthest boundary of the first central region to the center of the diffuser plate 3. The length from the farthest boundary of the second central region to the center of the diffuser plate 3 is R2, the length from the farthest boundary of the third central region to the center of the diffuser plate 3 is R3, and the length from the farthest boundary of the fourth central region to the center of the diffuser plate 3 is R4. The distance between the lower surface of the diffuser plate 3 and the substrate 4 in the first central region is Gap221, the distance between the lower surface of the diffuser plate 3 and the substrate 4 in the third central region is Gap222, and the distance between the lower surface of the diffuser plate 3 and the substrate 4 in the edge region with a radius greater than R4 is Gap223. The distance between the lower surface of the diffuser plate 3 and the substrate 4 remains consistent throughout the first central region, and the distance between the lower surface of the diffuser plate 3 and the substrate 4 remains consistent throughout the third central region.

[0060] Along the direction from the edge region to the center region, the distance between the lower surface of the diffuser plate 3 and the substrate 4 in the second and fourth center regions decreases linearly, and the depth of the through hole 31 in the second and fourth center regions increases linearly.

[0061] Furthermore, the distance between the through-hole 31 in the second central region and the center of the diffuser plate 3 is linearly related to the depth of the through-hole 31, such as... Figure 10 As shown, the angle of inclination between the lower surface of the diffuser plate 3 in the second central region and the horizontal plane is θ1.

[0062]

[0063] The distance between the through-hole 31 and the center of the diffuser plate 3 in the fourth central region is linearly related to the depth of the through-hole 31, such as... Figure 9 The angle of inclination between the lower surface of diffuser plate 3 and the horizontal plane in the fourth central region is θ2.

[0064]

[0065] refer to Figure 11 , Figure 11 The diagram shows a comparison of flow velocity distribution in diffuser plate 3. The X-axis represents the position of each through-hole on the cross-section passing through the center of the diffuser plate, and the Y-axis represents the flow velocity in the through-hole. New scheme 1 is the flow velocity distribution curve of the rectifier in embodiment one, new scheme 2 is the flow velocity distribution curve of the rectifier in embodiment two, and the existing scheme is the flow velocity distribution curve of an existing rectifier. In the figure, in the existing rectifier, the flow velocity in the through-hole 31 in the central region of diffuser plate 3 is much higher than that in the edge region, while the flow velocity uniformity of the through-hole 31 in the diffuser plate 3 of the present invention is better. Among them, the flow velocity uniformity in the rectifier in embodiment two is the best.

[0066] To further improve the uniformity of flow velocity across the diffuser plate 3, the depth of the through-hole 31 is set according to the flow velocity passing through it; the depth of the through-hole 31 with higher flow velocity is greater than that with lower flow velocity. By further increasing the depth of the through-hole 31 at locations with higher flow velocity and decreasing the depth of the through-hole 31 at locations with lower flow velocity, the flow velocity in each through-hole 31 is ultimately aligned on a horizontal line, resulting in higher flow velocity uniformity across the diffuser plate 3.

[0067] Furthermore, by comparing existing diffuser plates with the frustum-shaped diffuser plate 3 mentioned in this invention, the flow velocity uniformity of the existing diffuser plate and the diffuser plate of this invention is analyzed under given flow conditions, and uniformity is judged using 3σ. 3σ is a mathematical statistical concept, meaning three times the standard deviation, representing the degree of dispersion of the data, and is used to represent uniformity. Compared with existing diffuser plates, the frustum-shaped diffuser plate 3 of this invention has a smaller calculated 3σ value, indicating better uniformity.

[0068] Gap1 Gap21 Gap22 3σ Existing solutions 8mm 8.2mm 8.2mm 1.2108 New Plan 1 8mm 8.2mm 2.2mm 0.9245

[0069] In an optional embodiment, when the total intake flow rate of N2 increases, the distance between the lower surface of the diffuser plate 3 and the substrate 4 is further reduced to stabilize the uniformity of the flow rate in the diffuser plate 3. Furthermore, reducing the aperture of the through-hole 31 can further improve the uniformity of the flow rate in the diffuser plate 3.

[0070] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A rectifier, characterized in that, It includes a cover (1), an air intake distribution plate (2), a diffuser plate (3), an air intake pipe (5), and an exhaust pipe (6). The air intake distribution plate (2) is disposed above the diffuser plate (3), and the base plate (4) is placed below the diffuser plate (3). The air intake pipe (5) and the exhaust pipe (6) are disposed on the cover (1). A first chamber (11) is formed between the upper surface of the air intake distribution plate (2) and the inner wall of the cover (1), a second chamber (12) is formed between the lower surface of the diffuser plate (3) and the substrate (4), and a third chamber (13) is formed between the lower surface of the air intake distribution plate (2) and the upper surface of the diffuser plate (3). One end of the air inlet pipe (5) is used to connect to an external air source, and the other end is connected to the first chamber (11). One end of the exhaust pipe (6) is used to connect to an external air extraction device, and the other end is connected to the third chamber (13). The air intake distribution plate (2) is provided with multiple air intake holes (21), and the diffuser plate (3) is provided with multiple through holes (31). External gas flows through the air intake pipe (5) in sequence through the first chamber (11), the air intake hole (21), the second chamber (12), the through hole (31), and the third chamber (13), and is then discharged to the outside through the exhaust pipe (6). The depth of the through hole (31) is set according to the gas flow rate through the through hole (31), and the depth of the through hole (31) with a high gas flow rate is greater than the depth of the through hole (31) with a low gas flow rate. The edge region of the air intake distribution plate (2) is provided with a plurality of air intake holes (21), wherein external gas flows through the air intake pipe (5) through the air intake holes (21) and flows to the surface of the substrate (4).

2. The rectifier according to claim 1, characterized in that, The outlet of the exhaust pipe (6) is correspondingly disposed to the center of the diffuser plate (3). The diffuser plate (3) includes an edge region and a central region. The edge region surrounds the periphery of the central region. The depth of the through hole (31) in the edge region is less than the depth of the through hole (31) in the central region.

3. The rectifier according to claim 2, characterized in that, The depth of the through hole (31) increases linearly from the edge region to the center region.

4. The rectifier according to claim 3, characterized in that, The depth of the through hole (31) in both the edge region and the center region increases linearly along the direction from the edge region to the center region.

5. The rectifier according to claim 2, characterized in that, The depth of the through hole (31) increases in a stepped manner from the edge region to the center region.

6. The rectifier according to claim 3 or 5, characterized in that, The distance between the upper surface of the diffuser plate (3) and the air intake distribution plate (2) in the edge region is greater than the distance between the upper surface of the diffuser plate (3) and the air intake distribution plate (2) in the center region.

7. The rectifier according to claim 6, characterized in that, The distance between the lower surface of the diffuser plate (3) and the substrate (4) in the edge region is greater than or equal to the distance between the lower surface of the diffuser plate (3) and the substrate (4) in the center region.

8. The rectifier according to claim 3 or 5, characterized in that, The distance between the lower surface of the diffuser plate (3) and the substrate (4) in the edge region is greater than the distance between the lower surface of the diffuser plate (3) and the substrate (4) in the center region.

9. The rectifier according to claim 8, characterized in that, The distance between the upper surface of the diffuser plate (3) in the edge region and the air intake distribution plate (2) in the center region is consistent.

10. The rectifier according to claim 5, characterized in that, The central region includes a first central region, a second central region, a third central region and a fourth central region arranged sequentially from the inside to the outside around the center of the diffuser plate (3); The depths of the through holes (31) in the fourth central region, the third central region, the second central region, and the first central region increase in a stepwise manner.

11. The rectifier according to claim 10, characterized in that, Along the direction from the edge region to the center region, the depth of the through hole (31) corresponding to the second center region and the fourth center region both increase linearly.

12. The rectifier according to claim 10, characterized in that, The depth of the through holes (31) is the same at all locations in the first central region, and the depth of the through holes (31) is the same at all locations in the third central region.

13. The rectifier according to claim 12, characterized in that, The distance between the lower surface of the diffuser plate (3) and the substrate (4) remains consistent in the first central region, and the distance between the lower surface of the diffuser plate (3) and the substrate (4) remains consistent in the third central region.

14. The rectifier according to claim 11, characterized in that, Along the direction from the edge region to the center region, the distance between the lower surface of the diffuser plate (3) and the substrate (4) at the second center region and the fourth center region both decrease linearly.

15. The rectifier according to claim 10, characterized in that, The depth of the through holes (31) is the same at all points in the edge region.

16. The rectifier according to claim 10, characterized in that, The distance between the upper surface of the diffuser plate (3) and the air intake distribution plate (2) is the same at all points.

17. The rectifier according to claim 1, characterized in that, The adjacent through holes (31) are spaced by the same distance.

18. The rectifier according to claim 17, characterized in that, The three adjacent through holes (31) are arranged in an equilateral triangle.

19. The rectifier according to claim 17, characterized in that, The multiple through holes (31) are arranged in the form of multiple virtual concentric circles.

20. The rectifier according to claim 19, characterized in that, The depth of each of the through holes (31) on a concentric circle is the same, while the depth of the through holes (31) on different concentric circles is different.

21. The rectifier according to claim 20, characterized in that, The diameter of each through hole (31) on a concentric circle is the same, while the diameter of the through holes (31) on different concentric circles is different.

22. A heating device, characterized in that, The device includes the rectifier as described in any one of claims 1-21 and a heating assembly, wherein the rectifier covers the heating assembly to form a sealed space for mounting the substrate (4), and the heating assembly is used to heat the substrate (4).

23. The heating device according to claim 22, characterized in that, The heating assembly includes a heating plate (7), a guide ring (8), and a fitting part (9). The outer periphery of the heating plate (7) is fitted onto the guide ring (8). The substrate (4) is adapted to be disposed above the heating plate (7). The cover (1) covers the fitting part (9) to form the sealed space. The air intake distribution plate (2) and the diffuser plate (3) are both inside the sealed space.

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