Cleaning device and method for cleaning a substrate mounted on a dome-shaped substrate holder

Abstract

A cleaning device (10) is provided, which is adapted to clean a substrate (40) of an eyeglass lens mounted on a dome-shaped substrate holder (14), wherein the substrate holder (14) is rotatable in an azimuth direction (102) around a central axis (100) of the dome-shaped substrate holder (14). The cleaning device (10) is characterized in that the cleaning device (10) comprises a first cleaning arm (16), at which one or more nozzles (18) and one or more suction nozzles (20) are arranged, wherein the first cleaning arm (16) has an arc shape with a radius of curvature between 0.5 m and 2 m and a length in a height direction (106) in the range of 0.5 m to 2 m.

Description

[0001] Embodiments of a cleaning device adapted for cleaning a substrate mounted on a dome-shaped substrate holder, embodiments of a system for cleaning and coating a substrate, and embodiments of a method for cleaning a plurality of substrates mounted on a dome-shaped substrate holder are provided. Embodiments are therefore related to processes for cleaning and coating substrates, optionally substrates for eyeglass lenses.

[0002] Some substrates, in particular optical substrates, such as eyeglass lenses, often undergo a coating process during their manufacture. In some cases, for example, an antireflective coating may be applied to the substrate. For the coating process, the substrate may be mounted on a dome-shaped substrate holder, which is then inserted into a coating device to arrange the substrate in a predetermined position and predetermined orientation relative to a particle source in the coating device. Examples of coating devices and dome-shaped substrate holders are described, for example, in WO 2022 / 012955 A1 and WO 2004 / 108977 A2.

[0003] Before the actual coating process, the substrate may need a cleaning process, thereby removing dust and other contaminants that may exist on the substrate installed at the dome-shaped substrate holder. Conventional devices for cleaning ophthalmic components are described in US2003041883A1, US6783603B2, US2013117963A1, US9085017B2, US2011258807A1, CN204148193U and CN208866076U. However, these devices are not suitable for cleaning the substrate installed on the dome-shaped substrate holder. Therefore, generally in a manual process, a cleaning process is carried out, including taking out substrates one by one from its corresponding mounting grooves on the substrate holder, applying a cleaning process to the substrate, and replacing the substrate at its initial mounting groove by hand, which is regarded as the most recent prior art. This requires a lot of time and energy to carry out a cleaning process and bear the major risk of replacing these substrates due to accidentally replacing different substrates on different mounting grooves used as the initial mounting groove.

[0004] Therefore, it is desirable to provide a method and apparatus that overcomes the disadvantages of conventional cleaning processes. Therefore, the objective technical problem to be solved by the present invention is to provide a substrate cleaning method and apparatus that requires less time and effort and bears less risk of replacing the substrate.

[0005] This problem is solved by a cleaning device, a system for cleaning and coating a substrate, and a method suitable for cleaning a plurality of substrates for eyeglass lenses according to the invention.In the description alternative embodiments are provided.

[0006] In a first aspect, a cleaning device adapted for cleaning a substrate of an eyeglass lens mounted on a dome-shaped substrate holder is provided, wherein the substrate holder is rotatable around a central axis of the dome-shaped substrate holder in an azimuth direction. The cleaning device is characterized in that the cleaning device comprises a first cleaning arm, at which one or more nozzles and one or more suction nozzles are arranged. The first cleaning arm has an arc shape with a radius of curvature in the range of 0.5 m to 2 m and a length in the height direction in the range of 0.5 m to 2 m.

[0007] In another aspect, a system for cleaning and coating a substrate of an eyeglass lens is provided. The system includes a dome-shaped substrate holder suitable for holding the substrate during the cleaning and coating process. The system is characterized in that the system further includes a cleaning device according to the present disclosure.

[0008] On the other hand, a method for cleaning multiple substrates of eyeglass lenses is provided. The method includes mounting these substrates at mounting grooves on a dome-shaped substrate holder, wherein these mounting grooves are arranged on the dome-shaped substrate holder in one or more rows extending concentrically around the central axis of the dome-shaped substrate holder. The method further includes arranging an arcuate first cleaning arm of a cleaning device above or below the dome-shaped substrate holder so that the arcuate first cleaning arm of the cleaning device extends above at least some of these rows of mounting grooves in the height direction of the dome-shaped substrate holder. In addition, the method includes spraying a cleaning fluid onto the substrate holder through one or more nozzles arranged at the first cleaning arm and sucking at least a portion of the sprayed cleaning fluid into one or more suction nozzles arranged at the first cleaning arm and providing a rotational movement of the dome-shaped substrate holder around the central axis relative to the first cleaning arm in the azimuth direction to clean these substrates.

[0009] In yet another aspect, a method suitable for manufacturing a spectacle lens from a substrate for a spectacle lens is provided. The method is characterized in that the method comprises a step of cleaning the substrate for the spectacle lens using the method for cleaning a plurality of substrates for a spectacle lens disclosed above.

[0010] The substrate of a spectacle lens may be an optical substrate for a spectacle lens manufactured from the substrate. The substrate may have a size suitable for manufacturing one spectacle lens from one substrate. The substrate may form a precursor of an optical product. Alternatively, the substrate may be an (uncut) almost finished optical product, which will be finished after completing the coating process. The substrate may be a spectacle lens blank, a semi-finished spectacle lens product or a finished spectacle lens product, and may in particular meet the requirements specified in EN ISO 13666:2012. "Multiple substrates of spectacle lenses" may refer to multiple substrates, each of which is intended to be used for manufacturing one spectacle lens based on the corresponding substrate. Throughout this disclosure, unless otherwise expressly indicated, the term "substrate" may generally relate to the substrate of a spectacle lens.

[0011] Substrate is cleaned and can relate to and comprise the processing of removing pollutants and / or moisture and / or any other undesirable object (if not removed, may affect coating result) from substrate.Clean process can comprise and make substrate stand clean fluid flow to remove such pollutants, wherein clean fluid can comprise gaseous fluid and / or liquid fluid.Clean fluid can comprise air and / or nitrogen especially or be made up of air and / or nitrogen.Clean fluid can be sprayed on substrate by one or more nozzles, and can be collected by one or more suction nozzles after contacting with at least one surface of substrate.Clean fluid can spray in pulsating mode.In addition, clean fluid can be ionized due to previous ionization unit.This can allow to improve cleaning based on level and type of pollution.

[0012] The suction nozzle and the nozzle can be connected with suitable hoses and / or tubes for supplying cleaning fluid and / or vacuum to the suction nozzle and / or nozzle. The tubes and / or hoses and / or connected valves can be attached at the first cleaning arm and / or the second cleaning arm.

[0013] The dome-shaped substrate holder can be referred to as the substrate holder for short. The substrate holder is dome-shaped, which means that the shape of the substrate holder follows the shape of the dome. Therefore, the substrate holder can be dome-shaped, wherein the dome can have the shape of a hemisphere or the shape of any other part of a sphere with a spherical cap or spherical dome shape. The dome-shaped substrate holder can have the appearance of a spherical cap, but can be deviated from the strict mathematical shape of the spherical cap. The dome-shaped substrate holder can be rotationally symmetric about the central axis, wherein the central axis can form the central axis of the sphere of the dome or spherical cap that defines the shape of the substrate holder. The dome-shaped substrate holder can have a radius of curvature in the range of 0.5m to 2m, particularly a radius of curvature in the range of 0.5m to 1m, i.e. the sphere describing the shape of the dome-shaped holder can have a radius of curvature in the range of 0.5m to 2m, particularly a radius of curvature in the range of 0.5m to 1.2m or 0.8m to 1.2m. If the radius of curvature of the different height positions of the dome-shaped substrate holder is different, the radius of curvature at any position can be within the specified range. In other words, any radius of curvature that the dome-shaped substrate holder shows can be within the specified range completely. The azimuth direction and the height direction can be related to the horizontal coordinate system. The azimuth direction, the height direction and the radial direction used in the whole disclosure can correspond to this sphere describing the shape of the dome-shaped substrate holder, wherein the azimuth direction and the height direction extend on the surface of this sphere, and the radial direction is perpendicular to the surface of such sphere and therefore extends towards the center of the sphere. The height direction of the substrate holder can correspond to the height direction of the cleaning arm. The rotational motion of the substrate holder around its central axis can be provided by the motor unit that makes the dome-shaped substrate holder rotate around its central axis. The dome-shaped substrate holder can include several parts, such as four segments, and these parts can form the dome-shaped substrate holder together.

[0014] The arc of the first and / or second cleaning arm can relate to a spherical arc, that is, the shape of the first and / or second cleaning arm can extend according to the arc forming a part of the surface of a mathematical sphere. The sphere can correspond to the sphere describing the shape of the dome-shaped substrate holder or can have a larger or smaller radius of curvature. The arc can have the appearance of a sphere, but can be deviated from the strict mathematical shape of the spherical cap. Accordingly, the first cleaning arm can have an arc shape. The radius of curvature of the arc of the first cleaning arm and / or the second cleaning arm can be identical with the radius of curvature of the dome-shaped substrate holder or can be no more than 20%, optionally no more than 10% with the radius of curvature deviation of the dome-shaped substrate holder. However, the dome-shaped substrate holder and / or the first and / or second cleaning arm can have a shape with a deviation from a sphere. In particular, the radius of curvature can change along the height position of the dome-shaped substrate holder and / or along the height position of the first and / or second cleaning arm. The radius of curvature of the lower height position of the dome-shaped substrate holder and / or the first and / or second cleaning arm can be reduced respectively. However, the dome-shaped substrate holder and / or the first and / or second cleaning arms may be adapted such that at any height position of the dome-shaped substrate holder and / or the first and / or second cleaning arms the radius of curvature is in the range of 0.5 m to 2 m.

[0015] The first cleaning arm is arranged above the round cap-shaped substrate holder and means that when the round cap-shaped substrate holder is arranged to make the opening of the round cap-shaped substrate holder towards the downward orientation, the first cleaning arm is arranged to be adjacent to the outer surface of the round cap-shaped substrate holder. This can correspond to the typical orientation of the round cap-shaped substrate holder of the intended use of the substrate that is installed to the round cap-shaped substrate holder for coating. However, in principle, other orientations of the round cap-shaped substrate holder are also possible. Equally, the first cleaning arm is arranged below the round cap-shaped substrate holder and means that when the round cap-shaped substrate holder is arranged to make the opening of the round cap-shaped substrate holder towards the downward orientation, the first cleaning arm is arranged to be adjacent to the inner surface of the round cap-shaped substrate holder.

[0016] The mounting slot is a slot formed in a domed substrate holder that is adapted to receive substrates in a manner that exposes at least one surface of the substrate to carry out a coating process. Each mounting slot may include a hole on the domed substrate holder that the substrate may be placed on so that the coating may be applied to the surface as a whole through the hole on the substrate holder. The hole of the mounting slot may be adapted to support the substrate at the edge or margin of the substrate while exposing the central region of the substrate so that the coating process can be carried out.

[0017] The present disclosure provides the advantage that the cleaning process of cleaning the substrate prior to the coating process can be performed in an at least partially automated manner. This can allow for a reduction in the time, effort and manual labor required to clean the substrate, thereby reducing the cost of the cleaning and coating process. In addition, the present invention can provide the advantage of being able to clean multiple substrates simultaneously, thereby further reducing the time required for the cleaning process.

[0018] In addition, the present disclosure provides the advantage that the cleaning process can be at least partially performed while the substrate is installed in the mounting slot. In other words, the cleaning process can be at least partially performed without removing the substrate from the mounting slot. This can reduce the risk of inadvertently replacing the substrate during the cleaning process, and thus can allow for a reduction in substrate rejection in a manufacturing process that includes a cleaning and coating process.

[0019] In addition, the present disclosure can provide the following advantages, i.e., can carry out the cleaning process while substrate is installed in a manner ready for possible subsequent coating processes. Therefore, the time between the cleaning process and the subsequent coating process can be reduced, which can reduce the risk that the cleaned substrate is further contaminated between the cleaning process and the coating process. In addition, the cleaning process can be optionally carried out at least partially in the coating device, that is, when the round cap-shaped substrate holder is arranged inside the coating device, the subsequent coating process can be carried out in the coating device. This can make any movement of the round cap-shaped substrate holder on which substrate is installed after the cleaning process be eliminated. Instead, it can be allowed to start the coating process immediately after the cleaning process, and thus the risk of any further contamination of the substrate that is affected after the cleaning process is minimized.

[0020] At least one of the one or more nozzles can move in the height direction along the first cleaning arm. This can allow one or more nozzles to be moved to different height positions of the first cleaning arm and correspondingly to different height positions of the dome-shaped substrate holder. In combination with several full-circle rotations of the substrate holder around the central axis, even if only one or several mounting slots are addressed at each position of the one or more movable nozzles and each rotational position of the substrate holder, all mounting slots can be addressed by one or more nozzles. In other words, this can allow a large area of ​​the dome-shaped substrate holder to be subsequently covered by providing only one or more nozzles that cover a small part of the substrate holder. This also applies to the suction nozzle. That is, it may be sufficient to set one or more nozzles that can move in the height direction along the first cleaning arm. The movement of one or more nozzles and one or more movable suction nozzles can be synchronized. Accordingly, the method for cleaning multiple substrates can further include moving at least one of the one or more nozzles in the height direction while providing the dome-shaped substrate holder to rotate around the central axis in the azimuth direction.

[0021] One or more nozzles can be oriented in a radial direction relative to the first cleaning arm. In particular, the nozzle can point to the side of the cleaning arm where the substrate is arranged during the cleaning process. The nozzle and / or the suction nozzle can be oriented at an angle of about 45° relative to the surface of the substrate, which provides a suitable cleaning fluid flow from the nozzle to the suction nozzle above the substrate. In the case where the cleaning arm is arranged above the round cap-shaped substrate holder, the nozzle can point to the radially inward direction. If the cleaning arm points to the round cap-shaped substrate holder below, the nozzle can point to the radially outward direction. The cleaning arm can be arranged in a predetermined position and orientation relative to the round cap-shaped substrate holder. The cleaning arm can be adapted so that one or more movable nozzles can be oriented in a radial direction or in a direction with a predetermined angle relative to the substrate at any height position along the cleaning arm. However, one or more movable nozzles can be adapted to have a variable orientation, which can allow adjustment of the orientation of one or more nozzles relative to the mounting slot to be addressed or the substrate. Similarly, one or more suction nozzles can point to a radial direction and / or can be adapted to have a variable position. The orientation of one or more nozzles and one or more suction nozzles can be selected according to the distance between one or more nozzles and one or more suction nozzles. According to some embodiments, the nozzle and / or the suction nozzle can be oriented to have an angle of 45° relative to the surface of the substrate to which they are directed. In addition, the variable orientation of the one or more nozzles and the one or more suction nozzles can be flexibly adjustable. This can allow an adjustable angle between 10° and 85° relative to the surface of the substrate to which the one or more nozzles and the one or more suction nozzles are directed.

[0022] The one or more nozzles may include a plurality of nozzles distributed in the height direction on the cleaning arm. The plurality of nozzles may be arranged so that the fluid streams ejected by the plurality of nozzles cover the entire section of the dome-shaped substrate holder covered by the corresponding cleaning arm. This may allow the cleaning fluid streams ejected by the plurality of nozzles to cover multiple rows of mounting slots and thus may eliminate the movement of the one or more nozzles.

[0023] The cleaning device may further comprise a second cleaning arm, and one or more nozzles and one or more suction nozzles are arranged at the second cleaning arm. The two cleaning arms may have an arc, and their radius of curvature is in the range of 0.5m to 2m, and the length along the height direction is in the range of 0.5m to 2m. The second cleaning arm may be adapted in the same or similar manner as the first cleaning arm. However, the orientation or direction of the nozzle and / or suction nozzle may be different compared to the first cleaning arm, so that when being arranged on the opposite side of the dome-shaped substrate holder compared to the first substrate holder, the nozzle and suction nozzle are pointed to the dome-shaped substrate holder. Generally speaking, all features and characteristics described about the first cleaning arm may also be applicable to the second cleaning arm, and vice versa. In addition, the disclosure generally relating to cleaning arms may be applicable to the first cleaning arm and the second cleaning arm in the same manner.

[0024] The first cleaning arm and the second cleaning arm are parallel to each other and arranged at intervals from each other in the vertical direction. This can allow the domed substrate holder to be arranged between the first cleaning arm and the second cleaning arm so that the inner surface of the domed substrate holder can be exposed to the second cleaning arm, and the outer surface of the domed substrate holder can be exposed to the first cleaning arm, and vice versa. In other words, the first cleaning arm and the second cleaning arm can be adapted and arranged to at least partially surround the cross section of the jacket wall of the domed substrate holder. Accordingly, the nozzle of the first cleaning arm and the nozzle of the second cleaning arm can at least partially point to each other. This can allow the front surface and the rear surface of the substrate to be cleaned simultaneously.

[0025] The vertical spacing between the first cleaning arm and the second cleaning arm can be in the range of 0.01m to 0.5m, optionally in the range of 0.05m to 0.2m. Alternatively, the vertical spacing between the first cleaning arm and the second cleaning arm can be adjustable. This can facilitate the domed substrate holder to be arranged between the cleaning arms. Alternatively or additionally, the vertical spacing between the first cleaning arm and the second cleaning arm can be set to make the distance between the first cleaning arm and the surface facing the first cleaning arm of the substrate installed on the domed substrate holder in a predetermined range, such as in the range of 0.01m to 0.1m. This can leave enough space between the first cleaning arm and the second cleaning arm for arranging the domed substrate holder, and can allow the distance between the cleaning arm and the substrate installed in the mounting groove of the domed substrate holder to be small enough to realize the suitable cleaning fluid flow from the nozzle to clean the substrate.

[0026] In the method disclosed above, providing the domed substrate holder with a rotational movement in the azimuth direction around the central axis relative to the first cleaning arm may include rotating the domed substrate holder around the central axis by at least 360°. This may allow the cleaning fluid stream ejected by the nozzles in the first and / or second cleaning arms to be applied to the entire surface of the domed substrate holder along the height direction of the domed substrate holder. Therefore, although the nozzles may be arranged only at the cleaning arms that only cover a small portion of the entire domed substrate holder, the entire domed substrate holder and all mounting slots arranged in the domed substrate holder in one or more rows extending along concentric circles at the domed substrate holder may be subjected to the cleaning process.

[0027] The arcuate first cleaning arm of the cleaning device can be arranged above the round cap-shaped substrate holder. In this case, the method further includes arranging the arcuate second cleaning arm of the cleaning device below the round cap-shaped substrate holder so that the arcuate second cleaning arm of the cleaning device extends above at least some of these rows of mounting grooves along the height direction of the round cap-shaped substrate holder. Accordingly, the step of cleaning the substrate can further include spraying the cleaning fluid onto the substrate holder by one or more nozzles arranged at the second cleaning arm and sucking at least a portion of the sprayed cleaning fluid into one or more suction nozzles arranged at the second cleaning arm and providing the round cap-shaped substrate holder with respect to the second cleaning arm in the azimuth direction around the central axis. This can allow the upper and lower surfaces of the substrate to be cleaned simultaneously by applying the cleaning fluid from one side via the first cleaning arm and applying the cleaning fluid from the other side via the second cleaning arm. This can eliminate the additional steps for flipping the substrate, and therefore can reduce the time and cost required for the cleaning process. In addition, the risk of contaminating or accidentally replacing the substrate during the flipping process can be avoided or reduced. However, according to other embodiments, the method can further include the step of flipping all or some of the substrates in the substrate mounted on the substrate holder. The flipping can be performed manually or in an at least partially automated manner. The flipping process can optionally be performed using magnetic forces. The flipping step may be advantageous for such embodiments of the cleaning device that do not provide for cleaning the substrate from both sides simultaneously.

[0028] The method may include arranging the domed substrate holder in the coating device and arranging the first and second cleaning arms of the arc of the cleaning device above or below the domed substrate and may include arranging the cleaning device to be adjacent to the coating device. In addition, the method may further include taking out the cleaning device from the coating device after cleaning these substrates. This allows the domed substrate holder to be at least partially arranged in the coating device while the cleaning process is carried out. This can make the rearrangement of the substrate holder between the completion of the cleaning process and the beginning of the coating process be eliminated, and therefore the time required for the cleaning and coating process and the risk of pollution between the cleaning process and the coating process can be reduced. In addition, this can avoid the need for providing a cleaning device that can accommodate the entire domed substrate holder in the cleaning process. Instead, the cleaning device can be arranged to abut the coating device that accommodates the domed substrate holder. For example, the opening provided for inserting the domed substrate holder into the coating device can be used by the cleaning device to approach the domed substrate holder arranged inside the coating device. In addition, this can have the following advantages: the cleaning device can be used in combination with different coating devices subsequently. Therefore, the cleaning device can be used for several coating devices. This may allow only a smaller number of cleaning devices to be provided than the number of coating devices.

[0029] The coating device and / or the cleaning device may comprise a rubber lip to seal the interface between the opening of the coating device and the cleaning device arranged beside the opening of the cleaning device. This may at least partially prevent the entry of contaminants from the outside.

[0030] The rotational movement of the dome-shaped substrate holder relative to the cleaning arm or vice versa can be achieved by providing at least one of the following movements: rotating the dome-shaped substrate holder in an azimuthal direction about the central axis and moving the first cleaning arm in the azimuthal direction about the dome-shaped substrate holder. The mounting for holding the dome-shaped substrate holder within the coating device can be motorized with a motor unit to provide the desired rotational movement.

[0031] The present disclosure further includes a system for cleaning and coating substrates. The system for cleaning and coating substrates includes a domed substrate holder suitable for holding substrates during cleaning and coating. The domed substrate holder can rotate around the central axis of the domed substrate holder in an azimuth direction, wherein the domed substrate holder provides one or more rows of mounting grooves for mounting substrates, wherein these rows extend concentrically around the central axis of the domed substrate holder on the domed substrate holder. The system for cleaning and coating is characterized in that the system further includes a cleaning device, which includes an arcuate first cleaning arm, and one or more nozzles and one or more suction nozzles are arranged at the arcuate cleaning arm. The cleaning device can be arranged to extend above the entire height length of the domed substrate holder relative to the domed substrate holder, at a distance of no more than 0.2m from the domed substrate holder, and one or more nozzles and one or more suction nozzles are pointed to the domed substrate holder. All the above disclosed features and characteristics presented about the cleaning device can also be applied to this cleaning and coating system.

[0032] Those skilled in the art should understand that the above features and the features in the following description and drawings are not only disclosed in the explicitly disclosed embodiments and combinations, but also other technically feasible combinations and isolated features are included in the present disclosure. Hereinafter, several optional embodiments and specific examples are described with reference to the drawings to illustrate the present disclosure, but the present disclosure is not limited to the described embodiments.

[0033] Further optional embodiments will be described below with reference to the accompanying drawings.

[0034] The accompanying drawings show:

[0035] Figure 1A and Figure 1B : A perspective view and a side view of a cleaning device according to an optional embodiment;

[0036] Figure 2A and Figure 2B : Figure 1A and Figure 1B enlarged views of some portions of the cleaning arm of the cleaning device presented;

[0037] Figure 3A : Schematic diagram of a conventional coating device;

[0038] Figure 3B : An exemplary photo of a conventional coating device;

[0039] Figure 3C :like Figure 1B A schematic diagram showing a cleaning device according to an embodiment arranged next to an opened coating device is presented in FIG.

[0040] Figure 4 : Methods for cleaning multiple substrates.

[0041] In the drawings, the same reference numerals are used for corresponding or similar features in different drawings.

[0042] Figure 1A and Figure 1B A perspective view of a cleaning device 10 according to an alternative embodiment is shown ( Figure 1A ) and side view. The cleaning device 10 is adapted to be used for cleaning a Figure 3A 1 and 2 ), wherein the dome-shaped substrate holder 14 can be rotated around the central axis 100 of the dome-shaped substrate holder 14 in an azimuth direction 102. The cleaning device 10 includes a first cleaning arm 16, at which one or more nozzles 18 and one or more suction nozzles 20 are arranged. The first cleaning arm 16 has an arc shape, a radius of curvature of which is in the range of 0.5 m to 2 m, and a length in a height direction 106 of which is in the range of 0.5 m to 2 m.

[0043] In addition, the cleaning device 10 includes a second cleaning arm 22, at which one or more nozzles 18 and one or more suction nozzles 20 are arranged, wherein the second cleaning arm 22 also has an arc shape with a radius of curvature in the range of 0.5m to 2m and a length in the height direction 106 in the range of 0.5m to 2m. The shape of the second cleaning arm 22 corresponds to the shape of the first cleaning arm 16. The second cleaning arm 22 further includes a valve 23 for connecting a hose or a tube to provide suction at the suction nozzle 20.

[0044] The cleaning device 10 includes one or more columns 24 extending in a vertical direction 104, on which the first cleaning arm 16 and the second cleaning arm 22 are mounted. The first cleaning arm 16 and the second cleaning arm 22 can move in a vertical direction along the one or more columns 24. In addition, the cleaning device 10 includes a frame structure 26 to support and stabilize the cleaning device 10. According to some embodiments, the frame structure 26 can be adapted to allow the coating device 32 (see Figure 3C ) is arranged in a manner that the cleaning device 10 can at least partially accommodate the dome-shaped substrate holder 14.

[0045] The frame structure 26 can be closed with plate elements extending between the frame elements to form a closed housing of the cleaning device 10. This can prevent contaminants from entering the cleaning device 10 and / or the coating device 32 when the cleaning device 10 is arranged at the opening of the coating device 32. In addition, this can protect the user from interfering with the moving dome-shaped substrate holder 14.

[0046] According to the presented embodiment, the first cleaning arm 16 and the second cleaning arm 22 are parallel to each other and are arranged spaced apart from each other along the vertical direction 104. This may allow arranging the side wall of the dome-shaped substrate holder 14 to extend between the first cleaning arm 16 and the second cleaning arm 22, so that the distance between the first cleaning arm 16 and the dome-shaped substrate holder 14 and between the second cleaning arm 22 and the dome-shaped substrate holder 14 is optionally constant over the entire overlapping area of ​​the dome-shaped substrate holder 14 and the first cleaning arm 16 and the second cleaning arm 22, respectively. According to some embodiments, the vertical spacing (i.e., along the vertical direction 104) between the first cleaning arm 16 and the second cleaning arm 22 may be in the range of 0.01 m to 0.5 m, in particular in the range of 0.1 m to 0.2 m. This can provide suitable space for arranging the dome-shaped substrate holder 14 therebetween and provide suitable distances between the first cleaning arm 16 and the second cleaning arm 22 and the dome-shaped substrate holder 14 to ensure sufficient cleaning fluid flow to reliably clean the substrate 40 mounted on the dome-shaped substrate holder 14.

[0047] The first cleaning arm 16 and the second cleaning arm 22 are directed toward each other so that the substrate 40 mounted on the dome-shaped substrate holder 14 can be cleaned from both sides (i.e., from the top and from below) at the same time. For this purpose, the nozzles 18 of the first cleaning arm 16 and / or the second cleaning arm 22 and the nozzles 18 of the first cleaning arm 16 and the second cleaning arm 22 are at least partially directed toward each other.

[0048] The second cleaning arm 22 further comprises a valve 23 for connecting a hose or tube to provide suction at the suction nozzle 20 .

[0049] Figure 2A and Figure 2BShows Figure 1A and Figure 1B An enlarged view of some parts of the cleaning arm of the cleaning device is presented. In particular, Figure 2A and Figure 2B The perspective view presented in shows the nozzle 18 mounted at the respective cleaning arm. The configuration of the cleaning arms presented differs from one another. Figure 2A The first cleaning arm 16 shown includes three nozzles 18 and three suction nozzles 20 mounted on a sled 28 that can move along the first cleaning arm 16. A linear actuator may be provided for moving the sled 28 along the first cleaning arm 16. In order to mount a plurality of substrates 40 in a plurality of concentric rows 38 of mounting slots 36 mounted on a dome-shaped substrate holder 14 (see Figure 3A ) for cleaning, the sled 28 can move along the first cleaning arm 16 to rearrange the nozzles 18 and the suction nozzles 20 relative to these rows 38 of mounting slots 36 so as to cover all rows 38 of mounting slots 36 in sequence. The movement of the sled 28 can be combined with the rotational movement of the dome-shaped substrate holder 14 around its central axis 100 so as to cover all mounting slots 36 in each row 38. The rotational movement of the dome-shaped substrate holder 14 and the movement of the sled 28 along the first cleaning arm 16 (corresponding to the height movement relative to the dome-shaped substrate holder 14) can be effectively combined into a spiral movement. Alternatively or additionally, when a full rotation of the dome-shaped substrate holder 14 is completed, the sled 28 can move in a step-by-step manner to arrange the nozzles 18 at the next row of mounting slots 36. The sled 28 can move along the first cleaning arm 16 by a rack that follows the shape of the first cleaning arm 16. The interface 30 for connecting a cleaning fluid source and / or for suction can be arranged at the side of the sled 28, which can avoid undesired interference with the cleaning fluid flow and allow possible hoses connected to the sled 28 to follow the movement of the sled 28 undisturbed. According to other embodiments, the number of nozzles 18 and suction nozzles 20 arranged on the sled 28 can be different from each other. Thus, according to some embodiments, at least one of the one or more nozzles 18 can be moved along the first cleaning arm 16 in the height direction 106.

[0050] Figure 2B The second cleaning arm 22 is presented with a plurality of nozzles 18 and suction nozzles 20 arranged along the second cleaning arm 22. The nozzles 18 and suction nozzles 20 may be spaced equidistantly from one another and may be distributed over a sufficient length of the second cleaning arm 22 to extend over all rows 38 of mounting slots 36 disposed in the corresponding dome-shaped substrate holder 14 in the height direction 106. This may allow all substrates 40 mounted in the dome-shaped substrate holder 14 to be cleaned within one rotation of the substrate holder 14 without moving the nozzles 18 and suction nozzles 20 in the height direction 106. Accordingly, the first cleaning arm 16 according to the present embodiment does not require the nozzles 18 and / or suction nozzles 20 mounted on the sled 28 (as opposed to the dome-shaped substrate holder 14). Figure 2A Therefore, the one or more nozzles 18 include a plurality of nozzles 18 distributed on the second cleaning arm 22 in the height direction 106 .

[0051] In general, the cleaning device 10 may include a first cleaning arm 16 and a second cleaning arm 22. Each of these first cleaning arm 16 and second cleaning arm 22 may be formed according to any of the presented embodiments. The first cleaning arm 16 and second cleaning arm 22 may have the same construction or be different from each other.

[0052] The one or more nozzles 18 and / or the one or more suction nozzles 20 may be directed in a radial direction relative to the first cleaning arm 16. This may allow the flow of cleaning fluid to be directed directly onto the substrate 40 mounted at the substrate holder 14. However, the directions of the nozzles 18 and suction nozzles 20 may be tilted relative to the radial direction in order to achieve a continuous flow of cleaning fluid from the nozzles 18 to the suction nozzles 20 over the substrate 40.

[0053] Figure 3A A schematic diagram of a conventional coating device 32 is exemplarily depicted, in which a conventional dome-shaped substrate holder 14 is arranged, as described, for example, in WO 2022 / 012955 A1. The dome-shaped substrate holder 14 is dome-shaped and provides a plurality of mounting slots 36, which are arranged in several rows 38 (two rows according to the exemplary dome-shaped substrate holder 14 presented) extending concentrically around a central axis 100. Each mounting slot 36 can receive a substrate 40 and hold the substrate 40 so that the lower surface can be exposed to the particle vapor provided by the evaporation source 42. The dome-shaped substrate holder 14 can rotate around the central axis 100. The rotational movement can be affected by a motor unit 44.

[0054] Figure 3B An exemplary photograph of a conventional coating device 32 is shown. The coating device 32 can be opened through a corresponding opening (such as a door 46), which can allow access to the interior of the coating device 32 and thus access to the dome-shaped substrate holder 14. In particular, according to an embodiment of the present disclosure, when the opening of the coating device 32 is opened, for example by opening the door 46, at least a portion of the dome-shaped substrate holder 14 can protrude outside the coating device 32 and can be accessed by the cleaning device 10.

[0055] Figure 3C It shows that Figure 1B, a schematic diagram of a cleaning device 10 according to an embodiment being arranged next to an opened coating device 32 is presented. The portion of the dome-shaped substrate holder 14 protruding from the coating device 32 extends in a height direction 106 between the first cleaning arm 16 and the second cleaning arm 22, so that the first cleaning arm 16 and the second cleaning arm 22 extend in the height direction 106 above all rows 38 of mounting slots 36 provided on the dome-shaped substrate holder 14. By rotating the dome-shaped substrate holder 14 in an azimuth direction 102, all substrates 40 mounted in the mounting slots 36 on the dome-shaped substrate holder 14 can be cleaned. When the cleaning process is completed, the cleaning device 10 can be removed from the coating device 32, and the coating device 32 can be closed to carry out the process of coating the mounted and cleaned substrates 40. Therefore, Figure 3C A system 48 for cleaning and coating a substrate 40 is depicted, wherein the system 48 comprises a dome-shaped substrate holder 14 suitable for holding the substrate 40 during the cleaning and coating process and a cleaning device 10 according to the present invention. Furthermore, the system 48 may comprise the entire coating device 32.

[0056] refer to Figure 4 , a method 400 for cleaning a plurality of substrates 40 is presented.

[0057] The method 400 includes step 402 of mounting the substrates 40 in mounting slots 36 on the dome-shaped substrate holder 14 , wherein the mounting slots 36 are arranged on the dome-shaped substrate holder 14 in one or more rows 38 extending concentrically around a central axis 100 of the dome-shaped substrate holder 14 .

[0058] The method 400 further includes step 404 of arranging the arcuate first cleaning arm 16 of the cleaning device 10 above or below the dome-shaped substrate holder 14 so that the arcuate first cleaning arm 16 of the cleaning device 10 extends above at least some of the rows 38 of mounting slots 36 along the height direction 106 of the dome-shaped substrate holder 14. The arcuate first cleaning arm 16 of the cleaning device 10 may be arranged above the dome-shaped substrate holder 14. In addition, the arcuate second cleaning arm 22 of the cleaning device 10 may be arranged below the dome-shaped substrate holder 14 so that the arcuate second cleaning arm 22 of the cleaning device 10 extends above at least some of the rows 38 of mounting slots 36 along the height direction 106 of the dome-shaped substrate holder 14.

[0059] The method 400 further includes step 406 of cleaning the substrate 40 by spraying a cleaning fluid onto the dome-shaped substrate holder 14 through one or more nozzles 18 disposed at the first cleaning arm 16 and sucking at least a portion of the sprayed cleaning fluid into one or more suction nozzles 20 disposed at the first cleaning arm 16 and providing a rotational movement of the dome-shaped substrate holder 14 relative to the first cleaning arm 16 along the azimuthal direction 102 about the central axis 100. Providing a rotational movement of the dome-shaped substrate holder 14 relative to the first cleaning arm 16 along the azimuthal direction 102 about the central axis 100 may include rotating the dome-shaped substrate holder 14 about the central axis 100 by at least 360°. Step 406 may further include spraying a cleaning fluid onto the substrate holder 14 through one or more nozzles 18 disposed at the second cleaning arm 22 and sucking at least a portion of the sprayed cleaning fluid into one or more suction nozzles 20 disposed at the second cleaning arm 22. The provided rotational movement of the dome-shaped substrate holder 14 in the azimuthal direction 102 about the central axis 100 also applies with respect to the second cleaning arm 22 .

[0060] The method 400 may further include step 408 of moving at least one of the one or more nozzles 18 in the height direction 106 while providing rotational movement of the dome-shaped substrate holder 14 about the central axis 100 in the azimuthal direction 102 .

[0061] The method 400 may further include a step 410 of arranging the dome-shaped substrate holder 14 in the coating device 32. This step may be performed before or after steps 404 and 406. If the method includes step 410, the step 404 of arranging the arcuate first cleaning arm 16 of the cleaning device 10 above or below the dome-shaped substrate holder 14 may include arranging the cleaning device 10 adjacent to the coating device 32. In addition, the method may include a step 412 of removing the cleaning device 10 from the coating device 32 after cleaning the substrate 40 and coating the substrate 40 in the coating device 32.

[0062] The method 400 may form part of a method 500 suitable for manufacturing an eyeglass lens from an eyeglass lens substrate 40. The method 500 for manufacturing an eyeglass lens may use a cleaning device 10 according to the present disclosure to clean the substrate 40, wherein cleaning the substrate 40 may be part of a process of cleaning a plurality of substrates 40. The manufacturing method 500 may further include a step of coating the eyeglass lens substrate using a coating device according to the present disclosure.

[0063] List of Reference Numerals

[0064] 10. Cleaning device

[0065] 14 Dome-shaped substrate holder

[0066] 16 First cleaning arm

[0067] 18 Nozzle

[0068] 20 nozzle

[0069] 22 Second cleaning arm

[0070] 23 valve

[0071] 24 Columns

[0072] 26 Frame structure

[0073] 28 Sled

[0074] 30 Interface

[0075] 32 Coating device

[0076] 36 Mounting slots

[0077] 38 Mounting slots

[0078] 40 Base material

[0079] 42 Evaporation source

[0080] 44 Motor unit

[0081] 46 Door for coating unit

[0082] 48 Systems for cleaning and coating substrates

[0083] 100 Center axis

[0084] 102 Azimuth direction

[0085] 104 vertical direction

[0086] 106 Height direction

[0087] 400 Method for cleaning substrates for eyeglass lenses

[0088] 402-412 Methods and Steps

[0089] 500 Method for manufacturing spectacle lenses

Claims

1. A cleaning device (10) adapted for cleaning a substrate (40) of an eyeglass lens mounted on a dome-shaped substrate holder (14), the dome-shaped substrate holder (14) being rotatable in an azimuthal direction (102) around a central axis (100) of the dome-shaped substrate holder (14), in, The cleaning device (10) comprises a first cleaning arm (16), wherein the first cleaning arm has one or more nozzles (18) and one or more suction nozzles (20) arranged at the first cleaning arm (16); It is characterized in that The first cleaning arm (16) has an arc shape with a radius of curvature ranging from 0.5m to 2m and a length in a height direction (106) ranging from 0.5m to 2m.

2. The cleaning device (10) according to claim 1, wherein: The first cleaning arm (16) has an arc shape.

3. The cleaning device (10) according to claim 1 or 2, wherein: At least one of the one or more nozzles (18) is movable in a height direction (106) along the first cleaning arm (16).

4. The cleaning device (10) according to claim 1 or 2, wherein: The one or more nozzles (18) are directed in a radial direction relative to the first cleaning arm (16).

5. The cleaning device (10) according to claim 1 or 2, wherein: The one or more nozzles (18) include a plurality of nozzles (18) distributed on the first cleaning arm (16) in the height direction (106).

6. The cleaning device (10) according to claim 1 or 2, further comprising a second cleaning arm (22), the second cleaning arm having one or more nozzles (18) and one or more suction nozzles (20) arranged at the second cleaning arm (22), wherein: The second cleaning arm (22) has an arc shape with a curvature radius ranging from 0.5m to 2m and a length along a height direction (106) ranging from 0.5m to 2m.

7. The cleaning device (10) according to claim 6, wherein: The first cleaning arm (16) and the second cleaning arm (22) are parallel to each other and are spaced apart from each other in a vertical direction (104).

8. The cleaning device (10) according to claim 7, wherein: The vertical distance between the first cleaning arm (16) and the second cleaning arm (22) is in the range of 0.01 m to 0.5 m.

9. The cleaning device (10) according to claim 6, wherein: The nozzle (18) of the first cleaning arm (16) and the nozzle (18) of the second cleaning arm (22) are at least partially directed toward each other.

10. A system (48) for cleaning and coating substrates (40), the system (48) comprising a dome-shaped substrate holder (14) adapted for holding the substrates (40) during the cleaning and coating process; in, The system (48) is characterized in that the system further comprises a cleaning device (10) having the features as claimed in claim 1.

11. A method (400) for cleaning a plurality of substrates (40) suitable for use in eyeglass lenses, the method comprising: - mounting (402) the substrates (40) at mounting grooves (36) on a dome-shaped substrate holder (14), wherein the mounting grooves (36) are arranged on the dome-shaped substrate holder (14) in one or more rows (38) extending concentrically around a central axis (100) of the dome-shaped substrate holder (14); The method (400) further comprises the following steps: - arranging (404) an arcuate first cleaning arm (16) of the cleaning device (10) above or below the dome-shaped substrate holder (14) so ​​that the arcuate first cleaning arm (16) of the cleaning device (10) extends above at least some of the rows (38) of mounting slots (36) in a height direction (106) of the dome-shaped substrate holder (14), wherein the first cleaning arm (16) has an arcuate shape with a radius of curvature in the range of 0.5 m to 2 m and a length in the height direction (106) in the range of 0.5 m to 2 m; and - Cleaning (406) the substrates (40) by spraying a cleaning fluid onto the substrate holder (14) through one or more nozzles (18) disposed at the first cleaning arm (16) and sucking at least a portion of the sprayed cleaning fluid into one or more suction nozzles (20) disposed at the first cleaning arm (16) and providing the dome-shaped substrate holder (14) with a rotational movement along an azimuth direction (102) around the central axis (100) relative to the first cleaning arm (16).

12. The method (400) of claim 11, wherein: Providing rotational movement of the dome-shaped substrate holder (14) relative to the first cleaning arm (16) along the azimuthal direction (102) about the central axis (100) includes rotating the dome-shaped substrate holder (14) about the central axis (100) by at least 360 degrees.

13. The method (400) according to claim 11 or 12, wherein: The arc-shaped first cleaning arm (16) of the cleaning device (10) is arranged above the round cap-shaped substrate holder (14), and wherein: - the method (400) further comprises arranging the arcuate second cleaning arm (22) of the cleaning device (10) below the dome-shaped substrate holder (14) so ​​that the arcuate second cleaning arm (22) of the cleaning device (10) extends above at least some of the rows (38) of mounting slots (36) in a height direction (106) of the dome-shaped substrate holder (14); and -The step of cleaning (406) the substrates (40) further includes spraying a cleaning fluid onto the substrate holder (14) through one or more nozzles (18) disposed at the second cleaning arm (22) and sucking at least a portion of the sprayed cleaning fluid into one or more suction nozzles (20) disposed at the second cleaning arm (22) and providing a rotational movement of the dome-shaped substrate holder (14) relative to the second cleaning arm (22) along an azimuthal direction (102) around the central axis (100).

14. The method (400) according to claim 11 or 12 further includes moving at least one of the one or more nozzles (18) along the height direction (106) while providing the dome-shaped substrate holder (14) with rotational movement around the central axis (100) along the azimuthal direction (102).

15. The method (400) according to claim 11 or 12, wherein: - the method (400) further comprises arranging the dome-shaped substrate holder (14) in a coating device (32); - the step of arranging (404) the arcuate first cleaning arm (16) of the cleaning device (10) above or below the dome-shaped substrate holder (14) comprises arranging the cleaning device (10) adjacent to the coating device (32); and The method (400) further comprises removing the cleaning device (10) from the coating device (32) after cleaning the substrates (40).

16. A method (500) suitable for manufacturing a spectacle lens from a spectacle lens substrate (40), characterized in that the method comprises a step of cleaning the spectacle lens substrate (40) using a method (400) according to any one of claims 11 to 14.

Images