A fluororesin for fabricating a pixel bank layer, its synthesis process, and a fluororesin composition

Abstract

The present invention discloses a fluororesin for fabricating a pixel bank layer. The present invention also discloses a fluororesin composition containing a fluororesin for fabricating a pixel bank layer. The fluororesin and its composition in the present invention form a pixel bank layer structure with the characteristics of high liquid repellency, high resolution, and high slope angle of the product, which can effectively improve defects such as bleeding, color mixing, and white defects that are likely to occur during the subsequent ink printing process; the formed pixel bank layer structure has good adhesion and heat resistance, meeting the reliability requirements of the final display panel product.

Description

Technical Field

[0001] The present invention relates to the field of photosensitive chemical materials, and particularly to a fluororesin for fabricating a pixel Bank layer, a synthesis process thereof, and a fluororesin composition. Background Art

[0002] Processing and fabricating OLED and QD-LED displays using solution processes have the advantages of low cost, high production capacity, and easy implementation of large sizes, and are an important direction for the development of display technologies. Among them, printing technology is considered the most effective way to achieve low-cost and large-size displays for OLED and QD-LED. For example, when manufacturing large-size OLED panels, inkjet printing is sometimes used to fabricate the organic light-emitting layer to improve production efficiency and reduce costs; when manufacturing QD-LED panels, inkjet printing is often used to fabricate the QD layer; such inkjet printing processes all require a highly precise pixel Bank layer to be formed on the substrate first to control the printing positions of subsequent inks of different colors, thereby forming a designed pattern.

[0003] During the development of the printing process, the pixel Bank layer has a very important influence on the printing yield and film-forming uniformity. The surface of the Bank layer needs to have high liquid repellency characteristics, thereby preventing ink overflow during printing to form color mixing or mura phenomena, and contributing to improving the film-forming uniformity of the ink.

[0004] Currently, the materials used to fabricate the Bank layer generally have problems such as poor liquid repellency, low resolution, low shape slope angle, poor heat resistance, and many volatiles, resulting in color mixing, white defects, foreign objects, mura, and poor reliability during the subsequent fabrication of the color layer. Summary of the Invention

[0005] The object of the present invention is to provide a fluororesin for fabricating a pixel Bank layer.

[0006] The present invention also provides a synthesis process of a fluororesin for fabricating a pixel Bank layer.

[0007] The present invention also provides a fluororesin composition for fabricating a pixel Bank layer.

[0008] The innovation of the present invention lies in that the pixel Bank layer structure formed by the fluororesin and its composition in the present invention has the characteristics of high liquid repellency, high resolution, and high slope angle of the product, which can effectively improve the color bleeding, color mixing, white defects, and other defects that are likely to occur during the subsequent ink printing process; the formed pixel Bank layer structure has good adhesion and heat resistance, meeting the reliability requirements of the final display panel product.

[0009] To achieve the above-mentioned invention object, the technical solution of the present invention is as follows:

[0010] A fluororesin for fabricating a pixel bank layer, the general formula of its molecular formula is:

[0011]

[0012] R 1 、R 2 、R 3 、R 4 are respectively methyl or hydrogen atoms,

[0013] R 5 is a structure in which H atoms in a C1-C15 alkyl chain are completely or partially replaced by F atoms,

[0014] R 6 is a structure containing a glycidyl ester group,

[0015] R 7 is an auxiliary group, which is one or more of an alkyl group, an aromatic group, and an alicyclic group,

[0016] a, b, c, and d are respectively integers from 1 to 500;

[0017] The molecular weight of the fluororesin is 2000-35000.

[0018] Furthermore, it includes the following steps:

[0019] (1) Mix monomers and a radical initiator to obtain a mixed solution. The monomers include fluorine-containing monomers, carboxyl-containing monomers, epoxy group-containing monomers, and other monomers. The molar proportion of fluorine-containing monomers in the monomers is

[0020] 5-40%, the molar proportion of carboxyl-containing monomers is 5-20%, the molar proportion of epoxy group-containing monomers is 20-60%,

[0021] the proportion of other monomers is 0-30%; the mass of the radical initiator is 0.5-2.5% of the total mass of the monomers;

[0022] (2) Slowly drop the mixed solution into an ether ester solvent for radical polymerization reaction to obtain the finished product.

[0023] Furthermore, the fluorine-containing monomer is one or more of tetrafluoropropyl acrylate, tetrafluoropropyl methacrylate, hexafluorobutyl acrylate, hexafluorobutyl methacrylate, octafluoropentyl acrylate, octafluoropentyl methacrylate, dodecafluoroheptyl acrylate, dodecafluoroheptyl methacrylate, tridecafluorooctyl acrylate, tridecafluorooctyl methacrylate, trifluoro-hydroxyethyl acrylate, or trifluoro-hydroxyethyl methacrylate.

[0024] Further, the carboxyl group-containing monomer is one or more of acrylic acid and methacrylic acid.

[0025] Further, the epoxy group-containing monomer is one or more of glycidyl methacrylate, glycidyl acrylate, methyl 3,4-epoxycyclohexylmethacrylate, and methyl 3,4-epoxycyclohexylacrylate.

[0026] Further, the other monomers are auxiliary monomers, including one or more of methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, n-octyl acrylate, n-octyl methacrylate, isooctyl acrylate, isooctyl methacrylate, dodecyl acrylate, dodecyl methacrylate, tetradecyl acrylate, tetradecyl methacrylate, hexadecyl acrylate, hexadecyl methacrylate, n-decyl acrylate, n-decyl methacrylate, isodecyl acrylate, isodecyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, benzyl acrylate, benzyl methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentanyl acrylate, dicyclopentanyl methacrylate, or maleic anhydride.

[0027] A fluororesin composition for fabricating a pixel Bank layer using a fluororesin, comprising raw materials in the following mass percentages: 20 - 80% of a fluororesin, 10 - 70% of a photopolymerizable compound, and 5 - 15% of a photoinitiator.

[0028] Further, the raw materials are dissolved in a polar solvent or a diluent monomer to form a composition solution with a solid mass fraction of 5 - 60%.

[0029] Further, the photopolymerizable compound is one or more of methyl acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 1,2-ethanediyl diacrylate, ethylene glycol dimethacrylate, triethylene glycol diacrylate, diethylene glycol dimethacrylate, tetraethylene glycol diacrylate, triethylene glycol dimethacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, trimethylolpropane triacrylate, tetra(trimethylolpropane) tetraacrylate, tetra(trimethylolpropane) tetramethacrylate, pentaerythritol monoacrylate, pentaerythritol monomethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate,

[0030] and 1,6-hexanediol diacrylate.

[0031] Further, the photoinitiator is an oxime ester photoinitiator, and its general formula is:

[0032]

[0033] The molecular formula of X is

[0034]

[0035] R 8 is phenyl, a C1-C20 alkyl group, -CN, -NO2 or a C1-C4 haloalkyl group, R 9 is a C2-C12 alkyl group or a C4-C8 acyl group, R 10 -R 14 is H, a halogen atom, a C1-C12 alkyl group, phenyl or C6H5S-, R 15 and R 16 are H, a halogen atom, a C1-C12 alkyl group or phenyl.

[0036] The beneficial effects of the present invention are:

[0037] 1. The fluororesin and its composition in the present invention form a pixel Bank layer structure with high liquid repellency, high resolution and high slope angle of the product, which can effectively improve the defects such as color bleeding, color mixing and white defect that are likely to occur in the subsequent ink printing process; the formed pixel Bank layer structure has good adhesion and heat resistance, meeting the reliability requirements of the final display panel product. Specific embodiments

[0038] The technical solutions in the embodiments of the present invention will be clearly and completely described below.

[0039] Example 1: A fluororesin for making a pixel Bank layer, the general formula of its molecular formula is:

[0040]

[0041] R 1 and R 2 and R 3 and R 4 are methyl or hydrogen atom respectively,

[0042] R 5 is a structure in which all or part of the H atoms in the C1-C15 alkyl chain are replaced by F atoms,

[0043] R 6 is a structure containing a glycidyl ester group,

[0044] R 7 is an auxiliary group, which is one or more of an alkyl group, an aromatic group and an alicyclic group,

[0045] a, b, c, and d are integers from 1 to 500 respectively;

[0046] The molecular weight of the fluororesin is from 2000 to 35000.

[0047] Example 2: A synthesis process of a fluororesin for fabricating a pixel Bank layer is free radical copolymerization: Heat the solvent propylene glycol monomethyl ether acetate to 75 °C; Mix monomers and a free radical initiator to obtain a mixed solution, where the monomers include 22.5 mol% of hexafluorobutyl methacrylate, 12.5 mol% of methacrylic acid, 40 mol% of glycidyl methacrylate, and 25 mol% of benzyl methacrylate, and the free radical initiator is azobisisobutyronitrile with a mass of 1.0% of the total mass of the above monomers; Slowly drop the mixed solution into the propylene glycol monomethyl ether acetate solvent. After the dropping is completed, raise the temperature to 95 °C and react fully for 3 hours to obtain fluororesin 1 with a solid content of 20%. Test its weight average molecular weight by GPC, which is 6519, and the PDI is 2.0.

[0048] Example 3: A synthesis process of a fluororesin for fabricating a pixel Bank layer is free radical copolymerization: Heat the solvent methyl 3-methoxypropionate to 75 °C; Mix monomers and a free radical initiator to obtain a mixed solution, where the monomers include 5 mol% of octafluoropentyl methacrylate, 20 mol% of methacrylic acid, 60 mol% of glycidyl acrylate, and 15 mol% of cyclohexyl methacrylate, and the free radical initiator is benzoyl peroxide with a mass of 0.5% of the total mass of the above monomers; Slowly drop the mixed solution into the methyl 3-methoxypropionate solvent. After the dropping is completed, raise the temperature to 95 °C and react fully for 6 hours to obtain fluororesin 2 with a solid content of 30%. Test its weight average molecular weight by GPC, which is 8136, and the PDI is 1.9.

[0049] Example 4: A synthesis process of a fluororesin for fabricating a pixel Bank layer is free radical copolymerization: Heat the solvent diethylene glycol dimethyl ether to 75 °C; Mix monomers and a free radical initiator to obtain a mixed solution, where the monomers include 40 mol% of dodecafluoroheptyl methacrylate, 10 mol% of methacrylic acid, 20 mol% of 3,4-epoxycyclohexylmethyl methacrylate, and 30 mol% of cyclohexyl methacrylate, and the free radical initiator is azobisisobutyronitrile with a mass of 1.5% of the total mass of the above monomers; Slowly drop the mixed solution into the diethylene glycol dimethyl ether solvent. After the dropping is completed, raise the temperature to 95 °C and react fully for 4.5 hours to obtain fluororesin 3 with a solid content of 35%. Test its weight average molecular weight by GPC, which is 5869, and the PDI is 1.9.

[0050] Example 5: A synthetic process of a fluororesin for fabricating a pixel bank layer is free radical copolymerization: Heat the solvent diethylene glycol diethyl ether to 75 °C; mix monomers and a radical initiator to obtain a mixed solution, where the monomers include 40 mol% of hexafluorobutyl acrylate, 5 mol% of methacrylic acid, 40 mol% of glycidyl acrylate, and 15 mol% of cyclohexyl methacrylate, and the radical initiator is azobisisobutyronitrile with a mass of 1.0% of the total mass of the above monomers; slowly drop the mixed solution into the diethylene glycol diethyl ether solvent, and after the dropping is completed, raise the temperature to 95 °C and react fully for 5 hours to obtain a fluororesin 4 with a solid content of 40%. Its weight average molecular weight is 6406 and the PDI is 2.0 by GPC testing.

[0051] Example 6: Refer to Example 1: The fluorinated monomer can also be one or more of tetrafluoropropyl acrylate, tetrafluoropropyl methacrylate, hexafluorobutyl acrylate, hexafluorobutyl methacrylate, octafluoropentyl acrylate, octafluoropentyl methacrylate, dodecafluoroheptyl acrylate, dodecafluoroheptyl methacrylate, tridecafluorooctyl acrylate, tridecafluorooctyl methacrylate, trifluoro-hydroxyethyl acrylate, or trifluoro-hydroxyethyl methacrylate.

[0052] The carboxyl group-containing monomer can also be one or more of acrylic acid and methacrylic acid.

[0053] The epoxy group-containing monomer can also be one or more of glycidyl methacrylate, glycidyl acrylate, methyl 3,4-epoxycyclohexylmethacrylate, or methyl 3,4-epoxycyclohexylacrylate.

[0054] Other monomers can also be auxiliary monomers, including one or more of methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, n-octyl acrylate, n-octyl methacrylate, isooctyl acrylate, isooctyl methacrylate, dodecyl acrylate, dodecyl methacrylate, tetradecyl acrylate, tetradecyl methacrylate, hexadecyl acrylate, hexadecyl methacrylate, n-decyl acrylate, n-decyl methacrylate, isodecyl acrylate, isodecyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, benzyl acrylate, benzyl methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentyl acrylate, dicyclopentyl methacrylate, or maleic anhydride.

[0055] Comparative Example 1: Refer to Example 1, replace 22.5% of hexafluorobutyl methacrylate with methyl methacrylate and react to obtain a fluorine-free resin. Its weight average molecular weight is 6874 and the PDI is 2.0 by GPC testing.

[0056] Example 7: A fluororesin composition for fabricating a pixel Bank layer using a fluororesin, comprising raw materials in the following mass percentages: 20% of the fluororesin of Example 1, 70% of a photopolymerizable compound, and 10% of a photoinitiator; the raw materials are dissolved in the polar solvent diethylene glycol methyl ethyl ether to form a composition solution with a solid mass fraction of 5%.

[0057] The photopolymerizable compound is pentaerythritol tetraacrylate;

[0058] The photoinitiator is an oxime ester photoinitiator, and its general formula is:

[0059]

[0060] The molecular formula of X is

[0061]

[0062] R 8 is phenyl, R 9 is an alkyl group with C2-C12, R 10 -R 14 is H.

[0063] Example 8: A fluororesin composition for fabricating a pixel Bank layer using a fluororesin, comprising raw materials in the following mass percentages: 80% of the fluororesin of Example 2, 15% of a photopolymerizable compound, and 5% of a photoinitiator; the raw materials are dissolved in the diluent monomer 1,6-hexanediol diacrylate,

[0064] to form a composition solution with a solid mass fraction of 30%.

[0065] The photopolymerizable compound is dipentaerythritol hexaacrylate;

[0066] The photoinitiator is an oxime ester photoinitiator, and its general formula is:

[0067]

[0068] The molecular formula of X is

[0069]

[0070] R 8 is an alkyl group with C1-C20, R 9 is an acyl group with C4-C8, R 10 -R 14 is a halogen atom.

[0071] Example 9: A fluororesin composition for fabricating a pixel Bank layer using a fluororesin, comprising raw materials in the following mass percentages: 75% of the fluororesin of Example 3, 10% of a photopolymerizable compound, and 15% of a photoinitiator. The raw materials are dissolved in the polar solvent diethylene glycol dimethyl ether to form a composition solution with a solid mass fraction of 60%.

[0072] The photopolymerizable compound is trimethylolpropane triacrylate.

[0073] The photoinitiator is an oxime ester photoinitiator, and its general formula is:

[0074]

[0075] The molecular formula of X is

[0076]

[0077] R 8 is -CN group, R 9 is an acyl group of C4-C8, R 15 , R 16 are H.

[0078] Example 10: A fluororesin composition for fabricating a pixel Bank layer using a fluororesin, comprising raw materials in the following mass percentages: 50% of the fluororesin of Example 4, 43% of a photopolymerizable compound, and 7% of a photoinitiator.

[0079] The raw materials are dissolved in the diluent monomer diethylene glycol diacrylate to form a composition solution with a solid mass fraction of

[0080] 45%;

[0081] The photopolymerizable compound is dipentaerythritol hexaacrylate;

[0082] The photoinitiator is an oxime ester photoinitiator, and its general formula is:

[0083]

[0084] The molecular formula of X is

[0085]

[0086] R 8 is -NO2, R 9 is an alkyl group of C2-C12, and R15, R16 are halogen atoms.

[0087] Example 11: Referring to Example 7, the photopolymerizable compound is one or more of methyl acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 1,2-ethanediyl diacrylate, ethylene glycol dimethacrylate, triethylene glycol diacrylate, diethylene glycol dimethacrylate, tetraethylene glycol diacrylate, triethylene glycol dimethacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, trimethylolpropane triacrylate, tetra(trimethylolpropane) tetraacrylate, tetra(trimethylolpropane) tetramethacrylate, pentaerythritol monoacrylate, pentaerythritol monomethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, 1,6-hexanediyl diacrylate.

[0088] The photoinitiator is an oxime ester photoinitiator, and its general formula is:

[0089]

[0090] The molecular formula of X is

[0091]

[0092] R 8 is phenyl, C1-C20 alkyl, -CN, -NO2 or C1-C4 haloalkyl, R 9 is C2-C12 alkyl or C4-C8 acyl, R 10 -R 14 is H, a halogen atom, C1-C12 alkyl, phenyl or C6H5S-, and R15, R16 are H, a halogen atom, C1-C12 alkyl or phenyl.

[0093] Comparative Example 2: Referring to Example 10, 50% of the fluororesin in Example 4 was replaced with 50% of the non-fluororesin in Comparative Example 1.

[0094] <Liquid repellency evaluation>

[0095] Using a spin coater (1H-36S: manufactured by Mitsuwa), the above-mentioned fluororesin composition was coated on a glass substrate, dried on a hot plate at 90 °C for 2 min to form a coating film, and a scanning mercury lamp exposure machine (MPA-400: manufactured by Canon, Japan) was used for full film exposure at an irradiation dose of 50 mj / cm 2 Then, it was baked in an oven at 230 °C for 30 min to form a cured film with a film thickness of 2 μm.

[0096] The contact angle tester (DM-901, manufactured by Kyowa) was used to drop PGMEA (propylene glycol methyl ether acetate, the same below) on the above-mentioned cured film for contact angle measurement. The dropping amount was 2 μL. Pictures were taken 30 seconds after dropping and contact angle measurement was carried out. The PGMEA liquid contact angle value was obtained. The higher the PGMEA contact angle value, the better the liquid repellency of the coating film.

[0097] <Open hole resolution evaluation>

[0098] The above-mentioned fluororesin composition was coated on a glass substrate using a spin coater (1H-36S, manufactured by Mikasa), and dried on a 90°C hot plate for 2 minutes to form a coating film. A scanning mercury lamp exposure machine (MPA-400, manufactured by Canon, Japan) was used for maskless exposure. The mask included circular light-shielding areas with pore diameters of 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, and 20 μm, so as to form circular openings with corresponding diameters on the substrate; with an exposure energy of 50 mj / cm 2 Exposure was carried out; after exposure, a 2.38% TMAH (tetramethylammonium hydroxide) developer was used for spraying development for 60 seconds, and then baked in an oven at 230°C for 30 minutes.

[0099] An optical microscope (BX51TRF, manufactured by Olympus) was used to observe the circular hole area of the substrate. The pore diameters were observed from small to large. When the circular opening shape was observed to be circular and there was no residue in the hole, the smallest diameter circular hole corresponded to the pore diameter value of the mask, which was the open hole resolution value. The lower the open hole resolution, the easier it was for the composition to prepare a finer pattern.

[0100] <Slope angle evaluation>

[0101] The above-mentioned fluororesin composition was coated on a glass substrate using a spin coater (1H-36S, manufactured by Mikasa), and dried on a 90°C hot plate for 2 minutes to form a coating film. A scanning mercury lamp exposure machine (MPA-400, manufactured by Canon, Japan) was used for maskless exposure. The mask included a 20-μm-wide line light-shielding area; with an exposure energy of 50 mj / cm 2 Exposure was carried out; after exposure, a 2.38% TMAH (tetramethylammonium hydroxide) developer was used for spraying development for 60 seconds, and then baked in an oven at 230°C for 30 minutes.

[0102] A scanning electron microscope (SU8010, manufactured by Hitachi) was used to observe the cross-section of the line. A trapezoidal or approximately trapezoidal cross-section could be observed, and the bottom angle of the trapezoid was measured, which was the slope angle.

[0103] <Adhesion evaluation>

[0104] The above fluororesin composition was coated on a glass substrate using a spin coater (1H-36S, manufactured by Mikasa), and dried on a hot plate at 90°C for 2 minutes to form a coating film. A scanning mercury lamp exposure machine (MPA-400, manufactured by Canon, Japan) was used for full-film exposure at an exposure dose of 50 mj / cm 2 Then, it was baked in an oven at 230°C for 30 minutes to form a cured film with a film thickness of 2 μm.

[0105] After cutting a cross-hatch pattern on the cured film using a cross-hatch cutter, it was placed in a high-temperature and high-humidity chamber (EHS-211M, manufactured by ESPEC) for testing. The test conditions were 120°C / RH100% / 2 atm, and the test time was 24 hours. After the test was completed, the cross-hatch cutter adhesion test was carried out in accordance with GBT9286-1998, and the test result grade was the adhesion evaluation result.

[0106] <Heat resistance evaluation>

[0107] The above fluororesin composition was coated on a glass substrate using a spin coater (1H-36S, manufactured by Mikasa), and dried on a hot plate at 90°C for 2 minutes to form a coating film. A scanning mercury lamp exposure machine (MPA-400, manufactured by Canon, Japan) was used for full-film exposure at an exposure dose of 50 mj / cm 2 Then, it was baked in an oven at 230°C for 30 minutes to form a cured film with a film thickness of 2 μm.

[0108] Thermogravimetric-differential thermal analysis (TG-DTA, TG8121, manufactured by Rigaku) was used for heat resistance evaluation. After scraping the coating film into powder, it was loaded into a TGA device. Under a nitrogen atmosphere, the temperature was raised to 400°C at a heating rate of 10°C / min. The temperature at which a 5% mass loss was measured was used as the heat resistance evaluation standard. The higher the 5% thermal weight loss temperature, the better the heat resistance of the coating film.

[0109] Using the above evaluation methods, the evaluation results of the examples and comparative examples are shown in the following table:

[0110]

[0111] As can be seen from the above table, the Bank layer prepared by the examples has better advantages in terms of liquid repellency, slope angle, and heat resistance. At the same time, it can also maintain high adhesion and fine opening resolution. After comparison, by increasing the amount of fluorinated monomer during resin synthesis or increasing the addition amount of fluororesin in the composition, the liquid repellency of the material can be improved to a certain extent.

[0112] The described embodiments are only a part of the embodiments of the present invention, rather than all embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present invention without creative efforts shall fall within the protection scope of the present invention.

Claims

1. A fluorine-containing resin for making a pixel bank layer, characterized in that: Its molecular formula is: ; R 1 , R 2 , R 3 , R 4 are methyl or hydrogen atoms, R 5 It is a structure in which the H atoms in the C1~C15 alkyl chain are completely or partially replaced by F atoms. R 6 is a structure containing a glycidyl ester group, R 7 is an auxiliary group, which is one or more of an alkyl group, an aromatic group, and an alicyclic group, a, b, c, d are integers from 1 to 500 respectively; The molecular weight of the fluorine-containing resin is 2000-35000.

2. A synthesis process of fluorine-containing resin for making pixel bank layer as claimed in claim 1, characterized in that: The following steps are involved: (1) Mixing monomers and free radical initiators to obtain a mixed solution, wherein the monomers include fluorine-containing monomers, carboxyl-containing monomers, epoxy-containing monomers and other monomers, wherein the molar proportion of the fluorine-containing monomer in the monomers is 5-40%, the molar proportion of the carboxyl-containing monomer is 5-20%, the molar proportion of the epoxy-containing monomer is 20-60%, and the molar proportion of other monomers is 15-30%; the mass of the free radical initiator is 0.5-2.5% of the total amount of the monomers; (2) The mixed solution is slowly added dropwise into an ether ester solvent to carry out a free radical polymerization reaction to obtain a finished product.

3. The synthesis process of fluorine-containing resin for making pixel bank layer according to claim 2, characterized in that: The fluorine-containing monomer is one or more of tetrafluoropropyl acrylate, tetrafluoropropyl methacrylate, hexafluorobutyl acrylate, hexafluorobutyl methacrylate, octafluoropentyl acrylate, octafluoropentyl methacrylate, dodecafluoroheptyl acrylate, dodecafluoroheptyl methacrylate, tridecafluorooctyl acrylate, tridecafluorooctyl methacrylate, trifluorohydroxyethyl acrylate or trifluorohydroxyethyl methacrylate.

4. The synthesis process of fluorine-containing resin for making pixel bank layer according to claim 2, characterized in that: The carboxyl group-containing monomer is one or more of acrylic acid and methacrylic acid.

5. The synthesis process of fluorine-containing resin for making pixel bank layer according to claim 2, characterized in that: The epoxy group-containing monomer is one or more of glycidyl methacrylate, glycidyl acrylate, 3,4-epoxycyclohexyl methyl methacrylate, and 3,4-epoxycyclohexyl methyl acrylate.

6. The synthesis process of fluorine-containing resin for making pixel bank layer according to claim 2, characterized in that: The other monomers are auxiliary monomers, including one or more of methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, n-octyl acrylate, n-octyl methacrylate, isooctyl acrylate, isooctyl methacrylate, dodecyl acrylate, dodecyl methacrylate, tetradecyl acrylate, tetradecyl methacrylate, hexadecyl acrylate, hexadecyl methacrylate, n-decyl acrylate, n-decyl methacrylate, isodecyl acrylate, isodecyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, benzyl acrylate, benzyl methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentanyl acrylate, dicyclopentanyl methacrylate or maleic anhydride.

7. A fluorine-containing resin composition for making a pixel bank layer containing the fluorine-containing resin according to claim 1, characterized in that: The invention comprises the following raw materials in percentage by weight: 20-80% of fluorine-containing resin, 10-70% of photopolymerizable compound, and 5-15% of photopolymerization initiator.

8. The fluorine-containing resin composition for making a pixel bank layer according to claim 7, characterized in that: The raw materials are dissolved in a polar solvent or a diluent monomer to form a composition solution with a solid mass fraction of 5 to 60%.

9. The fluorine-containing resin composition for making a pixel bank layer according to claim 7, characterized in that: The photopolymerizable compound is one or more of methyl acrylate, methyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-1,2-ethylene glycol acrylate, ethylene glycol methacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, triethylene glycol dimethacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, trimethylolpropane triacrylate, tetra(trimethylolpropane)tetraacrylate, tetra(trimethylolpropane)tetramethacrylate, pentaerythritol monoacrylate, pentaerythritol monomethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, polydipentaerythritol pentaacrylate, polydipentaerythritol pentamethacrylate, polydipentaerythritol hexaacrylate, polydipentaerythritol hexamethacrylate, and 1,6-hexanediol diacrylate.

10. The fluorine-containing resin composition for making a pixel bank layer according to claim 7, characterized in that: The photopolymerization initiator is an oxime ester photoinitiator, and its general formula is: ； The molecular formula of X is or , R 8 is phenyl, C1-C20 alkyl, -CN, -NO2 or C1-C4 haloalkyl, R 9 is a C2-C12 alkyl group or a C4-C8 acyl group, R 10 -R 14 is H, a halogen atom, a C1-C12 alkyl group, a phenyl group or C6H5S-, R 15 , R 16 is H, a halogen atom, a C1-C12 alkyl group or a phenyl group.

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