A low-reflection black screen panel and coating method thereof

Abstract

The present invention relates to a low-reflection black screen panel and a coating method thereof, belonging to the coating technical field. In order to solve the existing problems of uneven ink printing and heterochromaticity, a low-reflection black screen panel is provided, wherein the screen panel comprises a glass substrate, a low-reflection black film is coated on the surface of the glass substrate, and the low-reflection black film comprises a layered structure film layer, wherein the layered structure film layer is formed by alternately stacking a film layer coated with titanium oxide and a film layer coated with SiO2 from the side of the glass substrate outward, wherein the titanium oxide is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:2.5-3.5. The layered structure film layer has an absorption effect on visible light, so that the layered structure film layer formed after alternate coating can present a black characteristic, and has a low reflectivity effect as a whole, the reflectivity reaches ≤0.3%, and has a good light transmittance, which is about 70%.

Description

Technical Field

[0001] The invention relates to a low-reflection black screen panel and a coating method thereof, belonging to the technical field of coating. Background Art

[0002] With the development of electronic products such as cars, mobile phones, and wearables, as well as the improvement of consumer aesthetics, the requirements for the appearance of display screens are getting higher and higher. However, when the screen is off, the display screens of most smart products currently have color differences between the display area and the black area at the edge, such as the ink area, which affects the visual effect. In order to improve the user experience, the requirements for the one-piece black of car screens, mobile phone screens, and wearable watch display screens are getting higher and higher. The reason is that the one-piece black can make the color difference between the display area and the black area at the edge difficult to distinguish with the naked eye when the screen is off, creating a visually integrated effect, making the product appearance more high-end, atmospheric, and beautiful. However, the consistency between the panel and the ink color of the display screen is the key factor in forming one-piece black. In order to achieve this one-piece black and improve the one-piece black effect of the display screen when the screen is off, most of them are achieved by adjusting the color difference of the printing ink, and printing with black ink. However, this method reduces the transmittance of the glass cover too much, and the effect of forming one-piece black is not good, and the consistency is poor. At the same time, due to the use of ink printing, there will be problems of uneven printing during the printing process, especially printing a large area of ​​semi-transparent ink layer will be more prone to printing color problems, and the reflectivity cannot be met, resulting in poor quality of the display screen. Summary of the invention

[0003] In view of the problems existing in the above prior art, the present invention provides a low-reflection black screen panel and a coating method thereof, which solves the problem of how to avoid the uneven film layer, easy occurrence of different colors and failure to meet the reflectivity when using ink.

[0004] One of the purposes of the present invention is achieved through the following technical scheme: a low-reflective black screen panel, the screen panel comprising a glass substrate, a low-reflective black film is coated on the surface of the glass substrate, characterized in that the low-reflective black film comprises a layered structure film layer, the layered structure film layer is formed by alternatingly stacking a film layer coated with titanium oxide and a film layer coated with SiO2 from the glass substrate side to the outside, the titanium oxide is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:2.5~3.5.

[0005] The present invention forms a layered structure film layer on the surface of a glass substrate by coating, which can ensure the uniformity and consistency of the formed film layer, and there is no heterochromatic phenomenon, thereby avoiding the defects of poor light transmittance and local heterochromatic printing in the existing ink printing. At the same time, in order to make the formed film layer present a black visual effect and meet the requirements of low reflection, the layered structure film layer is formed by alternately stacking titanium oxide and SiO2 film layers, which is equivalent to a layered structure film layer formed by alternately stacking titanium oxide film layers and SiO2 film layers by alternately coating the above materials to form a combination of several layers of films, forming a layered structure system of titanium oxide film layer / SiO2 film layer / titanium oxide film layer / SiO2 film layer / titanium oxide film layer / SiO2 film layer from the glass substrate side to the outside, and the thickness of each layer is controlled to form at least 6 layers of structural film layers to achieve black and low reflection performance. More importantly, by making the content of TiO2 and TiO in each layer of the titanium oxide film layer targeted and proportionally controlled so that the mass ratio of TiO2 to TiO is 1:2.5-3.5, a system of two components is formed. Compared with the conventional TiO2 film layer, which cannot achieve the characteristics of low reflection and black color, the above-mentioned system of the present invention can effectively achieve the effect of low reflection and making it black with absorption characteristics; at the same time, the content of TiO formed by oxygen loss in the components of the same film layer of the titanium oxide film layer is much higher than the content of TiO2 therein, but the content of the component in the film layer will not be too high or all of it will be TiO, so that the formed film layer can have absorption characteristics and have an absorption effect on visible light, so that the layered structure film layer formed after alternating plating can show black characteristics, and has the effect of low reflectivity as a whole, and the reflectivity can be controlled at ≤0.3%, and has a good light transmittance, which can be controlled at about 70%, and is not too high, thereby avoiding the use of a black ink layer to reflect the effect of integrated black.

[0006] In the above-mentioned low-reflective black screen panel, preferably, the layered structure film layers include, from the glass substrate side to the outside, a titanium oxide film layer 1 with a thickness of 15nm to 16nm, a SiO2 film layer 1 with a thickness of 31nm to 32nm, a titanium oxide film layer 2 with a thickness of 52nm to 54nm, a SiO2 film layer 2 with a thickness of 11nm to 13nm, a titanium oxide film layer 3 with a thickness of 36nm to 38nm and a SiO2 film layer 3 with a thickness of 96nm to 100nm. By alternately plating the titanium oxide film layer and the SiO2 film layer to form the above-mentioned 6-layer film structure, and adjusting the thickness of each layer, the layered film structure has excellent absorption characteristics, and the formed film has a black visual effect. At the same time, it can better ensure the effect of low reflectivity, and the transmittance can be controlled within the required requirements, with the advantages of low color difference value, the a value of the color difference value (Lab value) can reach -3±3, the b value is -3±3, △E is less than 1, and the reflectivity is ≤0.3%. As a further preference, the layered structure film layer includes a titanium oxide film layer 1 with a thickness of 15.08nm, a SiO2 film layer 1 with a thickness of 31.31nm, a titanium oxide film layer 2 with a thickness of 53.72nm, a SiO2 film layer 2 with a thickness of 12.1nm, a titanium oxide film layer 3 with a thickness of 37.72nm, and a SiO2 film layer 3 with a thickness of 96.37nm from the glass substrate side to the outside.

[0007] In the above-mentioned low-reflection black screen panel, as a preference, the reflectivity of the screen panel is ≤0.3%, and the transmittance is 67% to 75%. The structural combination of the film layer formed by plating ensures that the low reflectivity is achieved while having a good transmittance, but the advantage is not too high. Specifically, for transmittance, the transmittance of the film layer formed by alternating plating of silicon dioxide and titanium dioxide will generally reach more than 90%, while for the glass panel used for the integrated black display screen, this transmittance is too high, which will reduce the effect of the integrated black. The present invention selectively controls the transmittance and combines the design of the above-mentioned layered film structure to control the transmittance within the above-mentioned range, so that the effect of the formed black is more excellent, forming a black effect similar to smoke.

[0008] In the above low-reflection black screen panel, preferably, the outer surface of the layered structure film layer is plated with an anti-fingerprint film. By forming the anti-fingerprint film on the surface, the anti-fingerprint and anti-fouling effects of the glass panel can be better improved.

[0009] The second object of the present invention is achieved by the following technical solution: a coating method for a low-reflection black screen panel, characterized in that the method comprises the following steps:

[0010] A. Cleaning: Place the glass substrate to be coated into the vacuum coating chamber of the coating machine for ion source cleaning;

[0011] B. Coating a low-reflection black film: after evacuating the vacuum coating chamber, open the oxygen channel, introduce oxygen and control the oxygen flow rate to be 10sccm~13sccm, turn on the titanium oxide target source, and perform coating treatment on the surface of one side of the glass substrate to form a film layer containing titanium oxide. After the end, turn off the titanium oxide target source and stop the introduction of oxygen, and introduce inert gas and turn on the silicon dioxide target source to perform coating treatment on the surface of the titanium oxide-containing film layer to form a film layer containing SiO2; turn off the silicon dioxide target source and stop the introduction of inert gas, and repeat the above-mentioned coating treatment of the titanium oxide-containing film layer and the SiO2-containing film layer alternately to form a layered structure film layer on the surface of one side of the glass substrate; the titanium oxide in the titanium oxide-containing film layer is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:2.5~3.5, so as to obtain the above-mentioned low-reflection black screen panel.

[0012] When the present invention is used to plate a low-reflection black film, during the coating process of the titanium oxide-containing film layer, the flow rate of oxygen introduced is controlled to be 10 sccm to 13 sccm, and there is no need to introduce an inert gas. In this way, when the titanium oxide target source is used for coating, the formed film layer system will partially exist in the form of titanium monoxide (TiO) due to oxygen loss, so that the mass ratio of TiO2 to TiO in the titanium oxide-containing film layer is in the range of 1:2.5 to 3.5, so that the formed film layer has absorption characteristics and has excellent light absorption for visible light, so that the glass panel after coating has a black effect, and also has a low reflectivity effect, and the reflectivity can meet the requirement of being within ≤0.3%. Compared with the conventional titanium oxide coating process, the conventional oxygen flow rate is often controlled at more than 40sccm for coating. The reason is that the existing conventional SiO2 / TiO2 alternately coated film system is for the purpose of increasing transmittance, and its oxygen flow rate is required to be high to ensure that there is a sufficient oxygen source to completely form TiO2. Therefore, in order to make the titanium oxide film layer formed with a higher content of titanium monoxide (TiO), the present invention controls the oxygen flow rate to a very low range, far lower than the conventional oxygen flow rate, so that the oxygen content in the coating chamber is not enough to ensure that the titanium target will not be completely converted into TiO2 after evaporation, and can also effectively control the TiO2 titanium monoxide (TiO) content, so as to achieve the effect of low reflection and black appearance of the formed film layer. At the same time, since the present invention is a layered film structure formed by vacuum coating, it has the advantages of good coating uniformity and consistency, and also effectively avoids the existing printing unevenness and local color difference changes caused by ink printing. As a better preference, it is best to set the flow rate of the oxygen gas to 11 sccm to 12 sccm.

[0013] In the above-mentioned method for coating a low-reflection black screen panel, preferably, after step B, the method further includes coating an anti-fingerprint film on the surface of the low-reflection black film. By coating the anti-fingerprint film on the surface, the panel can have good anti-fingerprint and anti-fouling effects.

[0014] In the above-mentioned coating method for a low-reflection black screen panel, preferably, the flow rate of the inert gas in step B is 22 sccm to 25 sccm, so that the silicon dioxide film layer can be effectively coated and the uniformity and consistency of the film layer can be ensured.

[0015] In the above-mentioned coating method for a low-reflection black screen panel, preferably, the coating treatment temperature in step B is 45° C. to 60° C., and the coating treatment vacuum degree is 8.0E-6 torr to 9.0E-6 torr.

[0016] In the above-mentioned coating method for a low-reflection black screen panel, preferably, the inert gas in step B is selected from nitrogen or argon.

[0017] In summary, compared with the prior art, the present invention has the following advantages:

[0018] 1. By making targeted improvements and proportional control on the contents of TiO2 and TiO in each titanium oxide film layer, the mass ratio of TiO2 to TiO is 1:2.5-3.5. In this way, the TiO content formed in the film layer due to oxygen loss is much higher than the TiO2 content, so that the formed film layer has absorption characteristics and has an absorption effect on visible light, so that the layered structure film layer formed after alternating plating can present black characteristics and has a low reflectivity effect as a whole, with a reflectivity of ≤0.3%, and has a good light transmittance of about 70%.

[0019] 2. During the coating process, the flow rate of oxygen is controlled at 10sccm to 13sccm, so that the formed film system will lose oxygen and exist more in the form of titanium monoxide (TiO), so that the formed film has absorption characteristics and has excellent light absorption for visible light, making the coated glass panel appear black and also have the effect of low reflectivity. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a partial structural schematic diagram of the low-reflection black screen panel of the present invention.

[0021] In the figure, 1. glass substrate; 2. layered structure film layer; 21. titanium oxide film layer one; 22. SiO2 film layer one; 23. titanium oxide film layer two; 24. SiO2 film layer two; 25. titanium oxide film layer three; 26. SiO2 film layer three; 3. anti-fingerprint film layer. DETAILED DESCRIPTION

[0022] The technical solution of the present invention is further specifically described below through specific embodiments and drawings, but the present invention is not limited to these embodiments.

[0023] Embodiment 1

[0024] Combination Figure 1As shown, the low-reflection black screen panel includes a glass substrate 1, and a low-reflection black film is coated on the surface of the glass substrate 1. More importantly, the low-reflection black film includes a layered structure film layer 2, and the layered structure film layer 2 is formed by alternately stacking a film layer coated with titanium oxide and a film layer coated with SiO2 from the side of the glass substrate 1 to the outside. The titanium oxide is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:2.5-3.5. A better way to control the content is to make the mass ratio of TiO2 to TiO 1:3. By making the TiO content in the titanium oxide film layer higher than the TiO2 content, the layered structure film layer 2 formed can have good absorption characteristics, so that the coated screen panel presents a black visual effect, and at the same time, the structural system formed by overlapping and stacking with the SiO2 coated film layer has the effect of low reflectivity. The above-mentioned glass substrate 1 is made of general glass materials, and can also be made of materials such as PMMA or PC. In order to better make the above-mentioned low-reflection black screen panel have both low-reflection and black visual effects, it is best to make the above-mentioned layered structure film layer 2 include titanium oxide film layer 1 21 with a thickness of 15nm to 16nm, SiO2 film layer 1 22 with a thickness of 31nm to 32nm, titanium oxide film layer 2 23 with a thickness of 52nm to 54nm, SiO2 film layer 2 24 with a thickness of 11nm to 13nm, titanium oxide film layer 3 25 with a thickness of 36nm to 38nm and SiO2 film layer 3 26 with a thickness of 96nm to 100nm. Through the structural design and thickness control of the film layer system, the effect of combining low reflectivity and having absorption characteristics to present black can be better achieved. The distribution of the layered structure film layer 2 is equivalent to the distribution of each film layer from the inside to the outside, that is, the layered structure film layer 2 is formed by alternatingly plating titanium oxide film layer 1 21 / SiO2 film layer 1 22 / titanium oxide film layer 2 23 / SiO2 film layer 2 24 / titanium oxide film layer 3 25 / SiO2 film layer 3 26. In a further embodiment, the layered structure film layer 2 includes titanium oxide film layer 1 21 with a thickness of 15.08 nm, SiO2 film layer 1 22 with a thickness of 31.31 nm, titanium oxide film layer 2 23 with a thickness of 53.72 nm, SiO2 film layer 2 24 with a thickness of 12.1 nm, titanium oxide film layer 3 25 with a thickness of 37.72 nm, and SiO2 film layer 3 26 with a thickness of 96.37 nm. Through the design and improvement of the above film layer structure, the above low-reflection black screen panel can present a black visual effect, so that the formed black shows a smoky black effect. The color difference value is low. In the Lab value, the a value is within -3±3, the b value is within -3±3, and △E is less than 1. The reflectivity of the above screen panel is ≤0.3%, and the transmittance is 67% to 75%.

[0025] In order to better improve the user experience of the screen panel, an anti-fingerprint film layer 3 can be further plated on the surface of the layered film layer 2. The anti-fingerprint and anti-fouling effects can be improved, and the thickness of the anti-fingerprint film layer 3 is preferably controlled to be 20nm to 30nm. The surface of the low-reflection black film on the glass substrate 1 side can also include an anti-glare AG film layer (not shown in the figure), so that the anti-glare AG film layer is located between the glass substrate 1 and the layered film layer 2, and the layered film layer 2 and the anti-glare AG film layer together form the overall film layer of the above-mentioned low-reflection black film.

[0026] Embodiment 2

[0027] Combination Figure 1 As shown, the low-reflective black screen panel of this embodiment includes a glass substrate 1, and a layered structure film layer 2 is coated on the surface of the glass substrate 1, that is, the layered structure film layer 2 is formed by alternatingly stacking a film layer coated with titanium oxide and a film layer coated with SiO2 from the side of the glass substrate 1 to the outside, and the above-mentioned titanium oxide is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:3.0. The layered film layer 2 formed by the coating includes, from the glass substrate 1 side to the outside, a titanium oxide film layer 1 21 with a thickness of 15.08 nm, a SiO2 film layer 1 22 with a thickness of 31.31 nm, a titanium oxide film layer 2 23 with a thickness of 53.72 nm, a SiO2 film layer 2 24 with a thickness of 12.1 nm, a titanium oxide film layer 3 25 with a thickness of 37.72 nm, and a SiO2 film layer 3 26 with a thickness of 96.37 nm; at the same time, after the above-mentioned layered film layer 2 is plated, an anti-fingerprint film layer 3 is further plated on the surface. The low-reflection black screen panel here can be used for car screens, etc.

[0028] The specific coating method of the low-reflection black screen panel in this embodiment can be completed in the following manner.

[0029] Cleaning: Place the glass substrate 1 to be coated in the vacuum coating chamber of the coating machine (2050 coating machine) for ion source cleaning. More specifically, the vacuum coating chamber is evacuated. After the vacuum value reaches 8.0E-6torr to 9.0E-6torr, the ion source is started for plasma cleaning, that is, the power is turned on, the power is controlled at about 5kw, the argon gas channel is opened to allow argon gas to flow in, and the ion source is turned on to convert argon gas into plasma through the ion source to form an ion beam. The ion beam hits one side of the glass substrate 1 for ion source cleaning for 5 minutes. After the cleaning is completed, the argon gas is stopped from flowing in, and the ion source is stopped synchronously. Here, the glass substrate 1 to be coated is a transparent white glass sheet, and the white glass sheet can be made of organic glass.

[0030] Plating low-reflection black film: After the above cleaning is completed, wait for about 5 minutes, and then keep the vacuum coating chamber evacuated to make the vacuum value of the vacuum coating chamber reach 8.0E-6torr~9.0E-6torr. After stabilization, control the temperature at 45°C~60°C, close the above-mentioned argon gas channel to stop the introduction of argon gas, and open the oxygen channel to introduce oxygen. The flow rate of oxygen is controlled at 10sccm~13sccm. In this embodiment, it is best to control it at 12sccm. At the same time, the ion source is synchronously turned on and the power is controlled at about 5kw, so that oxygen is converted into plasma to form an ion beam that hits the surface of the glass substrate 1. The rotation speed of the umbrella frame on which the glass substrate 1 is placed in the coating machine is controlled at 24r / min~25r / min, and the vacuum state is maintained. The target source of titanium oxide is turned on. Here, the target source titanium oxide uses Ti3O5, so that the evaporated titanium oxide is synchronously deposited on the glass substrate 1 in the form of nanometers and acts together with the ion beam formed by the introduced oxygen to hit the surface of the glass substrate 1, so that the desired After the completion, the titanium oxide target source is turned off and the oxygen is stopped; the vacuum is maintained and the inert gas argon is turned on, the flow rate of the argon is controlled at 22sccm-25sccm, and in this embodiment, it is preferably controlled at 24sccm, the ion source is turned on synchronously, the power is controlled at about 5kw, the argon is converted into plasma to form an ion beam to hit the surface of the titanium oxide film layer of the glass substrate 1, the umbrella frame speed is controlled at 24r / min-25r / min, the silicon dioxide target source is turned on, The evaporated silicon dioxide is synchronously deposited in the form of nano-scale molecules on the surface of the titanium oxide film layer formed by the previous coating step to form a SiO2-containing film layer, that is, a film layer containing SiO2 components, and the film thickness is controlled according to the required film layer thickness; after completion, the silicon dioxide target source is turned off and the argon gas is stopped; the coating treatment of the titanium oxide-containing film layer and the SiO2-containing film layer is repeated alternately in sequence to finally form a layered structure film layer 2; that is, after the above repeated alternating coating, a layered structure film layer 2 with titanium oxide film layer 1 21 / SiO2 film layer 1 22 / titanium oxide film layer 2 23 / SiO2 film layer 2 24 / titanium oxide film layer 3 25 / SiO2 film layer 3 26 is formed. According to the thickness requirements of each film layer in this embodiment, the required thickness of each layer is controlled; by controlling the oxygen flow rate and using Ti3O5 as the target source, the titanium oxide-containing film layer of each layer formed is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:3.0. After the above-mentioned layered film layer 2 is completely plated, the anti-fingerprint film 3 can be further plated on the surface of the layered film layer 2. The obtained low-reflection black screen panel is tested for indicators, and the results show that the low-reflection black screen panel can present a black and low-reflection effect, with a reflectivity of less than 0.2% and a transmittance of 65% to 70%.Test Lab value, a value is within -3±2, b value is within -3±2, and the color difference value △E is less than 1.

[0031] Comparative Example 1

[0032] In order to illustrate the effect of controlling the oxygen flow rate on the composition of the formed film during the coating of a titanium oxide film, this comparative example is specifically implemented and compared by controlling the oxygen flow rate at 40 sccm to 48 sccm.

[0033] The specific coating method of the screen panel of this comparative example is basically the same as that of Example 2, that is, the cleaning process is the same as that of Example 2, and the coating operation process is also basically the same as that of Example 2, except that when coating the titanium oxide film layer, the oxygen flow rate is controlled at 40 sccm to 48 sccm. That is, the specific coating operation is as follows:

[0034] Coating: After cleaning, wait for about 5 minutes, and then keep the vacuum coating chamber evacuated to 8.0E-6torr~9.0E-6torr. After stabilization, control the temperature at 45℃~60℃, close the argon channel to stop the introduction of argon, and open the oxygen channel to introduce oxygen. The flow rate of oxygen is controlled at 40sccm~48sccm. The ion source is started synchronously and the power is controlled at about 5kw to convert oxygen into plasma to form an ion beam that hits the surface of the glass substrate 1. The speed of the umbrella stand on which the glass substrate 1 is placed in the coating machine is controlled at 24r / min~25r / min, and the vacuum state is maintained. The Ti3O5 target source is turned on to form a nanometer-scale synchronous deposition on the surface of the glass substrate 1 and work together with the ion beam formed by the oxygen introduced to hit the surface of the glass substrate 1 to form a TiO2 film layer on the surface of the glass substrate 1. After completion, the Ti3O5 target source is turned off , stop the oxygen introduction; maintain vacuum, and open the introduction of inert gas argon, the flow rate of argon is controlled at 22sccm~25sccm, the ion source is started synchronously, the power is controlled at about 5kw, the argon is converted into plasma to form an ion beam to hit the surface of the TiO2 film layer of the glass substrate 1, the umbrella frame speed is controlled at 24r / min~25r / min, the silicon dioxide target source is turned on, and the evaporated silicon dioxide is deposited in the form of nano-scale molecules on the surface of the TiO2-containing film layer formed by the previous step of coating to form a SiO2-containing film layer, that is, a film layer containing SiO2 components, and the film thickness is controlled according to the required film layer thickness; after the end, the silicon dioxide target source is closed and the argon introduction is stopped; the above-mentioned TiO2-containing film layer and the SiO2-containing film layer are alternately plated one after another, and finally a corresponding film layer system is formed; that is, after the above-mentioned repeated alternating plating, a film layer of TiO2 / SiO2 / TiO2 / SiO2 / TiO2 / SiO2 is formed. And according to the thickness requirements of each film layer in this embodiment, the required thickness of each layer is controlled; that is, the obtained film layers are TiO2 with a thickness of 15.08nm / SiO2 with a thickness of 31.31nm / TiO2 with a thickness of 53.72nm / SiO2 with a thickness of 12.1nm / TiO2 with a thickness of 37.72nm / SiO2 with a thickness of 96.37nm. By analyzing the composition of the formed film layers, it can be seen that the titanium oxide here is a TiO2 component. Observation shows that when the flow rate of oxygen is high, a TiO2 film layer is formed, and a mixed film layer of TiO2 and TiO will not be formed. More importantly, the screen panel finally obtained does not present a black visual effect, that is, a black film layer system cannot be formed, and it cannot be used for products of an integrated black screen display panel.

[0035] The specific embodiments described in the present invention are merely examples of the spirit of the present invention. Those skilled in the art may make various modifications or additions to the specific embodiments described or replace them in similar ways, but they will not deviate from the spirit of the present invention or exceed the scope defined by the attached claims.

[0036] Although the present invention has been described in detail and some specific embodiments have been cited, it is obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the present invention.

Claims

1. A low-reflection black screen panel, the screen panel comprising a glass substrate (1), the surface of the glass substrate (1) being coated with a low-reflection black film, characterized in that: The low-reflection black film comprises a layered structure film layer (2), wherein the layered structure film layer (2) is formed by alternately stacking a film layer plated with titanium oxide and a film layer plated with SiO2 in order from the side of the glass substrate (1) to the outside, wherein the titanium oxide is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:2.5-3.5; the layered structure film layer (2) comprises, in order from the side of the glass substrate (1) to the outside, a titanium oxide film layer 1 (21) with a thickness of 15nm-16nm, a SiO2 film layer 1 (22) with a thickness of 31nm-32nm, a titanium oxide film layer 2 (23) with a thickness of 52nm-54nm, a SiO2 film layer 2 (24) with a thickness of 11nm-13nm, a titanium oxide film layer 3 (25) with a thickness of 36nm-38nm, and a SiO2 film layer 3 (26) with a thickness of 96nm-100nm.

2. The low-reflection black screen panel according to claim 1, characterized in that: The layered structure film layer (2) includes, from the side of the glass substrate (1) to the outside, a titanium oxide film layer 1 (21) with a thickness of 15.08 nm, a SiO2 film layer 1 (22) with a thickness of 31.31 nm, a titanium oxide film layer 2 (23) with a thickness of 53.72 nm, a SiO2 film layer 2 (24) with a thickness of 12.1 nm, a titanium oxide film layer 3 (25) with a thickness of 37.72 nm, and a SiO2 film layer 3 (26) with a thickness of 96.37 nm.

3. The low-reflection black screen panel according to claim 1 or 2, characterized in that: The reflectivity of the screen panel is ≤0.3%, and the transmittance is 67% to 75%.

4. The low-reflection black screen panel according to claim 1 or 2, characterized in that: The outer surface of the layered structure film layer (2) is plated with an anti-fingerprint film layer (3).

5. A coating method for a low-reflection black screen panel, characterized in that: The method comprises the following steps: A. Cleaning: placing the glass substrate (1) to be coated into the vacuum coating chamber of the coating machine for ion source cleaning; B. Coating a low-reflection black film: after evacuating the vacuum coating chamber, open the oxygen channel, introduce oxygen and control the oxygen flow rate to be 10 sccm to 13 sccm, open the titanium oxide target source, and perform coating treatment on the surface of one side of the glass substrate (1) to form a film layer containing titanium oxide. After completion, close the titanium oxide target source and stop the introduction of oxygen, introduce inert gas and open the silicon dioxide target source, and perform coating treatment on the surface of the titanium oxide-containing film layer to form a film layer containing SiO2; close the silicon dioxide target source and stop the introduction of inert gas, and repeat the above-mentioned coating treatment of the titanium oxide-containing film layer and the SiO2-containing film layer alternately, so that a layered structure film layer (2) is formed on the surface of one side of the glass substrate (1); the titanium oxide in the titanium oxide-containing film layer is a mixture of TiO and TiO2, and the mass ratio of TiO2 to TiO in the mixture is 1:2.5-3.5, so as to obtain the low-reflection black screen panel according to any one of claims 1 to 2.

6. The coating method for a low-reflection black screen panel according to claim 5, characterized in that: After step B, the method further comprises coating an anti-fingerprint film (3) on the surface of the layered structure film layer (2).

7. The coating method for a low-reflection black screen panel according to claim 5, characterized in that: The flow rate of the inert gas introduced in step B is 22 sccm to 25 sccm.

8. The coating method of low-reflection black screen panel according to claim 5, 6 or 7, characterized in that: The temperature of the coating treatment in step B is 45° C. to 60° C., and the vacuum degree of the vacuum pumping is 8.0E-6torr to 9.0E-6torr.

9. The coating method of low-reflection black screen panel according to claim 5, 6 or 7, characterized in that: The inert gas in step B is selected from nitrogen or argon.

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